SG175671A1 - Exposure method and apparatus, maintenance method and device manufacturing method - Google Patents

Exposure method and apparatus, maintenance method and device manufacturing method Download PDF

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Publication number
SG175671A1
SG175671A1 SG2011077435A SG2011077435A SG175671A1 SG 175671 A1 SG175671 A1 SG 175671A1 SG 2011077435 A SG2011077435 A SG 2011077435A SG 2011077435 A SG2011077435 A SG 2011077435A SG 175671 A1 SG175671 A1 SG 175671A1
Authority
SG
Singapore
Prior art keywords
substrate
liquid
exposure
cleaning
immersion area
Prior art date
Application number
SG2011077435A
Other languages
English (en)
Inventor
Katsushi Nakano
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of SG175671A1 publication Critical patent/SG175671A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG2011077435A 2006-05-18 2007-05-18 Exposure method and apparatus, maintenance method and device manufacturing method SG175671A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006139614 2006-05-18
JP2006140957 2006-05-19
JP2007103343 2007-04-10

Publications (1)

Publication Number Publication Date
SG175671A1 true SG175671A1 (en) 2011-11-28

Family

ID=38723302

Family Applications (1)

Application Number Title Priority Date Filing Date
SG2011077435A SG175671A1 (en) 2006-05-18 2007-05-18 Exposure method and apparatus, maintenance method and device manufacturing method

Country Status (8)

Country Link
US (2) US8514366B2 (enExample)
EP (1) EP2037486A4 (enExample)
JP (2) JP5217239B2 (enExample)
KR (1) KR20090018024A (enExample)
CN (2) CN101410948B (enExample)
SG (1) SG175671A1 (enExample)
TW (1) TW200805000A (enExample)
WO (1) WO2007135990A1 (enExample)

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Also Published As

Publication number Publication date
US20130301019A1 (en) 2013-11-14
CN101410948B (zh) 2011-10-26
JP2008283156A (ja) 2008-11-20
WO2007135990A1 (ja) 2007-11-29
CN102298274A (zh) 2011-12-28
US20090066922A1 (en) 2009-03-12
EP2037486A1 (en) 2009-03-18
JP2012164992A (ja) 2012-08-30
EP2037486A4 (en) 2012-01-11
TW200805000A (en) 2008-01-16
JP5217239B2 (ja) 2013-06-19
US8514366B2 (en) 2013-08-20
CN101410948A (zh) 2009-04-15
KR20090018024A (ko) 2009-02-19

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