KR20090018024A - 노광 방법 및 장치, 메인터넌스 방법, 그리고 디바이스 제조 방법 - Google Patents

노광 방법 및 장치, 메인터넌스 방법, 그리고 디바이스 제조 방법 Download PDF

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Publication number
KR20090018024A
KR20090018024A KR1020087024125A KR20087024125A KR20090018024A KR 20090018024 A KR20090018024 A KR 20090018024A KR 1020087024125 A KR1020087024125 A KR 1020087024125A KR 20087024125 A KR20087024125 A KR 20087024125A KR 20090018024 A KR20090018024 A KR 20090018024A
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South Korea
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liquid
substrate
cleaning
exposure
stage
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KR1020087024125A
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Korean (ko)
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가츠시 나카노
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가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020087024125A 2006-05-18 2007-05-18 노광 방법 및 장치, 메인터넌스 방법, 그리고 디바이스 제조 방법 Ceased KR20090018024A (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JPJP-P-2006-139614 2006-05-18
JP2006139614 2006-05-18
JP2006140957 2006-05-19
JPJP-P-2006-140957 2006-05-19
JPJP-P-2007-103343 2007-04-10
JP2007103343 2007-04-10

Publications (1)

Publication Number Publication Date
KR20090018024A true KR20090018024A (ko) 2009-02-19

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KR1020087024125A Ceased KR20090018024A (ko) 2006-05-18 2007-05-18 노광 방법 및 장치, 메인터넌스 방법, 그리고 디바이스 제조 방법

Country Status (8)

Country Link
US (2) US8514366B2 (enExample)
EP (1) EP2037486A4 (enExample)
JP (2) JP5217239B2 (enExample)
KR (1) KR20090018024A (enExample)
CN (2) CN102298274A (enExample)
SG (1) SG175671A1 (enExample)
TW (1) TW200805000A (enExample)
WO (1) WO2007135990A1 (enExample)

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KR101476347B1 (ko) * 2011-02-25 2014-12-24 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 리소그래피 장치를 제어하는 방법 및 디바이스 제조 방법

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JP2012164992A (ja) 2012-08-30
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EP2037486A1 (en) 2009-03-18
US20090066922A1 (en) 2009-03-12
SG175671A1 (en) 2011-11-28
US8514366B2 (en) 2013-08-20
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