JP2006523029A5 - - Google Patents

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JP2006523029A5
JP2006523029A5 JP2006509591A JP2006509591A JP2006523029A5 JP 2006523029 A5 JP2006523029 A5 JP 2006523029A5 JP 2006509591 A JP2006509591 A JP 2006509591A JP 2006509591 A JP2006509591 A JP 2006509591A JP 2006523029 A5 JP2006523029 A5 JP 2006523029A5
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fluid
workpiece
exposure area
nozzles
nozzle
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JP2006509591A
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JP4582089B2 (ja
JP2006523029A (ja
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Priority claimed from PCT/US2004/010071 external-priority patent/WO2004092830A2/en
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JP2006509591A 2003-04-11 2004-04-01 液浸リソグラフィ用の液体噴射回収システム Expired - Fee Related JP4582089B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46278603P 2003-04-11 2003-04-11
PCT/US2004/010071 WO2004092830A2 (en) 2003-04-11 2004-04-01 Liquid jet and recovery system for immersion lithography

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JP2006523029A JP2006523029A (ja) 2006-10-05
JP2006523029A5 true JP2006523029A5 (enExample) 2007-07-19
JP4582089B2 JP4582089B2 (ja) 2010-11-17

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JP2006509591A Expired - Fee Related JP4582089B2 (ja) 2003-04-11 2004-04-01 液浸リソグラフィ用の液体噴射回収システム

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US (9) US7443482B2 (enExample)
JP (1) JP4582089B2 (enExample)
WO (1) WO2004092830A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8817231B2 (en) 2004-11-12 2014-08-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a liquid confinement structure

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* Cited by examiner, † Cited by third party
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