569288 A7 B7 五、發明説明（1) 本發明是關於，水平方向運送被處理基板，進行單一 或一連串的液體處理工程的基板處理裝置。 (請先閲讀背面之注意事項再填寫本頁) 本發明是關於，例如，對液晶顯示裝置（L C D )玻 璃基板等的基板，進行顯像處理等液體處理的液體處理裝 置及液體處理方法。 最近，在製造L C D (液晶顯示裝置）的塗抹抗蝕劑 顯像處理系統，有一種被認爲能夠有利因應L C D基板的 大型化的顯像方式，亦即，在水平方向鋪設運送輥或運送 帶構成的運送路上運送L C D基板，而在運送中進行顯像 、洗淨、乾燥等一連串顯像處理過程的所謂水平流動方式 ，受到注意。這種水平流動方式較之使基板旋轉運動的旋 轉方式，基板的處理或運送系統及驅動系統的架構簡單， 很少產生霧氣或發生再附著於基板的現象等，有很多優點 〇 經濟部智慧財產局員工消費合作社印製 一般，水平流動方式的顯示處理裝置，是在沿著運送 路從上游側至下游側依序設定的顯像製程、洗淨製程、的 各液體處理部，分別配設用以承接集中掉落運送路下的液 體的碟狀容器或盤子，各盤子的排液口是連接至個別的排 液系統。 然而，在傳統的水平流動方式，因爲是在運送路上保 持水平姿勢的狀態，將基板從上游側的液體處理部運送到 下游側的液體處理部，因此，以上游側的液體處理部使用 的處理液體殘留在基板上的狀態，將基板運送到下游側的 液體處理部，使其掉落甚至於混進下游側的盤子內，各處 -----------=,4 : 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（2) 理液體很難分別回收。 (請先閲讀背面之注意事項再填寫本頁) 在製造L C D時，是採用在L C D玻璃基板（以下稱 作「L C D基板」）形成抗蝕劑膜後，對應電路圖案將此 抗鈾劑模曝光，再進行顯像處理的所謂光平版印刷技術， 在L C D基板形成一定的電路圖案。例如在日本特開平 1 1 - 8 72 1 0號公報揭示有，在水平方向單一方向運 送的基板表面塗抹顯像液，在基板上形成液體層，保持一 定時間使其進行顯像反應，然後抬高垂直於基板的運送方 向的端面的一方，將基板變換成傾斜姿勢使顯像液掉落， 再以傾斜姿勢運送，向基板供應洗淨液的處理方法及處理 裝置。 但是，近年來對L C D基板的大型化的要求強烈，已 經出現一邊達1公尺的巨大基板。在L C D基板的顯像處 理時，藉由使L C D基板成傾斜姿勢，從L C D基板澄乾 顯像液時，如果不能迅速向L C D基板供應純水洗淨顯像 液殘渣，停止顯像反應，便會產生顯像不均或線寬均一性 惡化的問題。 經濟部智慧財產局員工消費合作社印製 爲了要向這種大型L C D基板供應洗淨液，而以傾斜 姿勢高速運送L C D基板，卻因加在l C D基板的機械性 負荷或運送裝置的負荷，高速運送L C D基板時L C D基 板的停止條件等各種理由，而十分困難。例如，高速運送 L C D基板時，有可能發生L C D基板無法在一定位置停 下來，衝出規定位置而破損，或者令L C D基板急速停下 來而在L C D基板加上很大負荷使l C D基板破損。另一 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（3) 方面，使L C D基板的速度慢慢降低時，顯像裝置的軌跡 (footprint)必然會變大而有問題。 (請先閲讀背面之注意事項再填寫本頁) 本發明是有鑑於上述傳統技術的問題點而完成者，其 目的在提供，能在水平方向鋪設的運送路上，從被處理基 板上短時間內有效率澄乾供給基板的處理液體的基板處理 裝置。 本發明的另一問題在提供，能在水平方向鋪設的運送 路上，以高純度分別回收供給被處理基板的處理液體的基 板處理裝置。 本發明是有鑑於上述實情而完成者，其目的在提供， 縱使是大型基板，仍可以在整個基板進行均一的液體處理 的液體處理裝置及液體處理方法。 經濟部智慧財產局員工消費合作社印製 爲了達成上述目的，本發明的基板處理裝置具備有： 水平敷設能以大致上成水平狀載置被處理基板加以運送的 運送體而成的運送路；爲了在上述運送路上運送上述基板 ，而驅動上述運送體的運送驅動構件；用以向上述運送路 上的上述基板的被處理面供應一定處理液體的包含一個或 多數噴嘴的處理液體供應構件；以及，爲了使液體從上述 基板上以重力掉落，而在上述運送路上，令上述基板傾斜 的基板傾斜構件。 在上述架構，由處理液體供應構件向水平姿勢的基板 的被處理面供應一定的處理液體，進行一定的液體處理， 處理後基板上仍有液體殘留。但在運送路的下游側，基板 傾斜構件會使基板傾斜，藉此，附著或殘留在基板上的液 -；----R - _ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（4) 體會因重力滑落基板傾斜面迅速掉落基板外。令基板傾斜 的方向以前方或後方較佳。 (請先閲讀背面之注意事項再填寫本頁) 在本發明的基板處理裝置，基板傾斜構件的可取的一 個形態是，具備有：令基板在運送路上的第1位置與其上 方的第2位置間移動的昇降構件；以及，在第2位置以傾 斜狀態保持上述基板的傾斜狀態保持構件的架構。在這種 架構，爲了要使基板在運送路上方的第2位置傾斜，昇降 構件將基板從第1位置提高到第2位置。最好是配設，可 以在第2位置，於水平位置及傾斜位置間切換基板的姿勢 的基板姿勢切換構件。 基板傾斜構件的可取的另一形態是，具備有：在運送 路上的設定區間，令運送體在運送路上的大致水平的第3 位置與掉落液體用的傾斜的第4位置間移動的運送體傾斜 構件；以及，在第4位置的運送體上以傾斜狀態保持基板 的傾斜狀態保持構件的架構。在這種架構，最好是配設， 可以將屬於上述區間的上述運送體可裝卸狀連結在上述運 送驅動構件的離合機構。 經濟部智慧財產局員工消費合作社印製 本發明的基板處理裝置爲了收回處理液體，可以配設 用以收集掉落運送路下的液體的集液構件。要分別回收處 理液體，集液構件最好採，包含相鄰配設在運送路上的前 後的第1及第2區間，分別用以承接集中掉落運送路下的 液體的第1及第2集液部的架構，或處理液體供應構件採 ，含有分別配置在第1及第2區間的第1及第2噴嘴的架 構。這時，爲了提高分別在第1及第2區間回收的液體的 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（5) (請先閱讀背面之注意事項再填寫本頁) 純度，基板傾斜構件可以含有，爲了令在第1區間供給的 基板上的液體在進入第2區間前，掉落在第1集液部，而 使基板傾斜的第1基板傾斜部。 依據本發明的第1觀點時，可提供，用以對基板施力口 一定的液體處理的液體處理裝置，具備有： 對保持成略成水平姿勢的基板塗抹處理液體的第1液 體處理部；從上述塗抹有處理液體的基板，去除上述處理 液的第2液體處理部；以及，將基板以略成水平姿勢從上 述第1液體處理部單方向運送至上述第2液體處理部的基 板運送機構； 上述第1液體處理部備有，從上述基板運送機構的基 板運送方向的前方向後方，在上述基板塗抹上述處理液體 的處理液體供應機構， 上述第2液體處理部備有，抬高塗抹上述處理液體的 基板的運送方向的前方，將上述基板變換成傾斜姿勢，藉 此澄乾塗抹在上述基板的處理液體的基板傾斜機構。 經濟部智慧財產局員工消費合作社印製 此依據第1觀點的液體處理裝置，由於使在基板塗抹 處理液體的方向，與澄乾塗抹在基板的處理液體時處理液 體從基板流下的方向相同，藉此將整個基板的處理液體接 觸在基板的時間均等化，因此可以在整個基板進行均一的 液體處理。 依據本發明的第2觀點時，可提供，用以對基板施加 一定的液體處理的液體處理裝置，具備有： 對保持成略成水平姿勢的基板塗抹第1處理液體的第 本紙張尺度適用中國國家標準（CNS ) A4規格（210X：297公釐） 569288 A7 B7 五、發明説明（6) (請先閲讀背面之注意事項再填寫本頁) 1液體處理部；從上述塗抹有第1處理液體的基板，去除 上述第1處理液的第2液體處理部；以及，將上述塗抹有 上述第1處理液體的基板以略成水平姿勢從上述第丨液體 處理部單方向運送至上述第2液體處理部的基板運送機構 上述第2液體處理部備有：抬高塗抹有上述第1處理 液體的基板的一端，將上述基板變換成傾斜姿勢，藉此澄 乾塗抹在上述基板的第1處理液體的基板傾斜機構；可向 由上述基板傾斜機構保持成傾斜姿勢的基板吐出，用以沖 掉上述第1處理液體的殘渣的第2處理液體的處理液體吐 出用噴嘴；以及’令上述處理液體吐出用噴嘴沿著由上述 基板傾斜機構保持在傾斜姿勢的基板表面斜向移動的噴嘴 移動機構。 經濟部智慧財產局員工消費合作社印製 此依據第2觀點的液體處理裝置，是從處理液體吐出 用噴嘴向基板吐出第2處理液體，同時令基板以一定速度 ，最好是以高速移動，藉此從基板去除第1處理液體的殘 渣。如此，可以使整個基板的第1處理液體接觸在基板的 時間均等化，因此，可以藉第1處理液體對基板進行均一 的處理。 依據本發明的第3觀點時，可提供，用以對基板施加 一定的液體處理的液體處理裝置，具備有： 對保持成略成水平姿勢的基板塗抹第1處理液體的第 1液體處理部；從上述塗抹有第1處理液體的基板，去除 上述第1處理液的第2液體處理部；以及， 本紙張尺度適用中國國家標準（CNS ) A4規格（210'〆297公釐） 569288 A7 B7 五、發明説明（7) (請先閲讀背面之注意事項再填寫本頁) 將上述塗抹有上述第1處理液體的基板以略成水平姿 勢從上述第1液體處理部單方向運送至上述第2液體處理 部的基板運送機構； 上述第1液體處理部備有，從上述基板運送機構的基 板運送方向的前方向後方，在上述基板塗抹第1處理液體 的第1處理液體供應機構， 上述第2液體處理部備有：抬高塗抹有上述第1處理 液體的基板的運送方向前方側，將上述基板變換成傾斜姿 勢，藉此澄乾塗抹在上述基板的第1處理液體的基板傾斜 機構；可由上述基板傾斜機構保持成傾斜姿勢的基板的上 方端至下方端，一面移動用以沖掉上述第1處理液體的殘 渣的第2處理液體的供給位置，同時將第2處理液體供給 上述基板的第2處理液體供應機構。 經濟部智慧財產局員工消費合作社印製 此依據第3觀點的液體處理裝置，因爲塗抹在基板的 第1處理液體是從開始塗抹第1處理液體的部分開始去除 ，因此，可以使整個基板的第1處理液體接觸在基板的時 間均等化，因此，可以藉第1處理液體對基板進行均一的 處理。 依據本發明的第4觀點時，可提供，用以對略成水平 姿勢單方向運送的基板施加一定的液體處理的液體處理方 法、含有： 以略成水平姿勢將基板運送至對基板塗抹第1處理液 體的第1液體處理領域的第1製程；在上述基板塗抹上述 第1處理液體的第2製程；以略成水平姿勢將塗抹上述第 __________- in - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（8) 1處理液體的基板運送至從上述基板去除第1處理液體的 第2液體處理領域的第3製程；抬高上述基板的運送方向 前方側，使上述基板傾斜一定角度，藉此從上述基板澄乾 上述第1處理液體的第4製程；以及，將上述基板傾斜機 構保持成傾斜一定角度的狀態，從上述基板的上方端至下 方端’移動用以從上述基板沖掉上述第1處理液體的第2 處理液體的供給位置，同時將其供給上述基板的第5製程 〇 依據本發明的第5觀點時，可提供，用以對施加曝光 處理的基板施加顯像處理的液體處理裝置，具備有： 在保持成略爲水平狀的基板塗抹顯像液的第1液體處 理部；從塗抹有上述顯像液的基板去除上述顯像液的第2 液體處理部；以及，以略成水平姿勢單方向將基板從上述 第1液體處理部運送至第2液體處理部的基板運送機構； 上述第2液體處理部備有：抬高塗抹有上述顯像液體 的基板的運送方向前方側，將上述基板變換成傾斜姿勢， 藉此澄乾塗抹在上述基板的顯像液體的基板傾斜機構；用 以吐出沖洗上述顯像液體的洗淨用液體的洗淨用噴嘴；以 及，令上述洗淨用噴嘴沿著上述基板表面斜向以一定速度 移動，使上述第2處理液體的供給位置移動，將上述洗淨 液體從由上述基板傾斜機構保持在傾斜姿勢的基板的上方 端至下方端吐出在上述基板的洗淨用噴嘴移動機構。 此依據第5觀點的液體處理方法，因爲塗抹在基板的 第1處理液體是從開始塗抹第1處理液體的部分開始去除 _!___-11 - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) 裝- 訂 經濟部智慧財產局員工消費合作社印製 569288 A7 B7 五、發明説明（9) ，因此，可以使整個基板的第1處理液體接觸在基板的時 間均等化，如此，可以防止發生顯像不均，獲得很高的線 寬均一性。 依據本發明的第6觀點時，可提供，用以對施加曝光 處理的基板施加顯像處理的液體處理方法，含有： 以略成水平姿勢將基板運送至對基板塗抹顯像液體的 第1液體處理領域的第1製程；在上述基板塗抹顯像液體 的第2製程；以略成水平姿勢將塗抹上述顯像液體的基板 運送至從上述基板去除顯像液體的第2液體處理領域的第 3製程； 抬高上述基板的運送方向前方側，使上述基板傾斜一 定角度，藉此從上述基板澄乾上述顯像液體的第4製程； 以及，將上述基板傾斜機構保持成傾斜一定角度的狀態， 從上述基板的上方端至下方端，移動用以從上述基板沖掉 上述顯像液體的洗淨用液體的供給位置，同時將上述洗淨 用液體供給上述基板的第5製程。 依據如上述的本發明的液體處理裝置及液體處理方法 時，由於可以使整個基板的處理液體接觸在基板的時間均 等化，因此，可以對基板進行均一的液體處理。藉此可以 獲得高品質的基板。同時，由於不會高速運送基板，可以 提高處理安全性，抑制基板的破損或損傷，要停止運送基 板時也不會佔用很大空間。而且，在將第1處理液體塗抹 在第1基板時；以第2處理液體沖洗第2處理液體時；或 者以洗淨液洗淨顯像液時等，只要令向基板供應處理液體 ______- 19 - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) 裝. 、11 經濟部智慧財產局員工消費合作社印製 569288 A7 B7 五、發明説明（π 的噴嘴移動，便能夠在短時間內完成在第1液體處理部與 第2液體處理部的液體處理，可以提高產能。 (請先閲讀背面之注意事項再填寫本頁) 可取實施形態 (實施形態1 ) 第1圖是表示可適用本發明的顯像處理裝置的塗抹顯 像處理系統。此塗抹顯像處理系統1 〇是設置在無塵室內 ，而例如以L C D基板作爲被處理基板，進行L C D製造 過程的光平版印刷製程中的洗淨、塗抹抗蝕劑、預烘烤、 顯像及後烘烤等的各項處理。曝光處理是以鄰接此系統設 置的外部的曝光裝置1 2爲之。 此塗抹顯像處理系統1 0在中心部配置橫方向較長的 處理站（P / S ) 1 6 ，其長度方向（X方向）的兩端部 配置卡匣站（C/S) 14及界面站（I/F) 18。 經濟部智慧財產局員工消費合作社印製 卡匣站（C/S) 14是系統10的運進運出卡匣用 口，備有，可在水平方向，例如Y方向排列載置能以堆疊 多層方式收容多片基板G的4個卡匣C的卡匣台2 0，及 可在此卡匣台2 0上的卡匣C取出放進基板G的運送機構 2 2。運送機構2 2備有可保持基板G的構件，例如運送 臂2 2 a，能以X、Y、Z、Θ的4軸動作，可以將基板G 移交給相鄰接的處理站（P / S ) 1 6側。 處理站（P / S ) 1 6將各處理部按處理流程或製程 順序配置在系統長度方向（X方向）延伸的平行但反方向 的一對線A、B。詳述之，在從卡匣站（C / S ) 1 4側 — _- - 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公釐） 569288 A7 B7 五、發明説明（ 向界面站（I / F ) 1 8側的上游部的處理線a，成橫方 (請先閲讀背面之注意事項再填寫本頁) 向一列配置有洗淨處理部2 4、第1熱處理部2 6、塗抹 處理部28、及第2熱處理部30。另一方面，從界面站 (I / F ) 1 8側至卡匣站（C / S ) 1 4測的下游部的 處理線B，則成橫方向一列配置有第2熱處理部3 0、顯 像處理部3 2、脫色處理部3 4、及第3熱處理部3 6。 在此處理線形態，第2熱處理部3 0是位於上游側的處理 線A的最末尾，同時是位於下游側的處理線B的最前頭， 跨在兩處理線A、B的間。 在兩處理線A、B間設有輔助運送空間3 8。能以1 片單位水平方向載置基板G的穿梭構件4 0，由未圖示的 驅動機構驅動使其在處理線方法（X方向）雙方向移動。 在上游側的處理線A，洗淨處理部2 4含有沖刷洗淨 單元（S C R ) 4 2。此沖刷洗淨單元（S C R ) 4 2內 的鄰接卡匣站（C / S ) 1 4的部位，配置有激元U V照 經濟部智慧財產局員工消費合作社印製 射單元（e - U V ) 4 1。雖省略未圖示，但沖刷洗淨單 元（S CR) 4 2內的洗淨部可以藉由滾筒運送或輸送帶 運送，以水平姿勢將L C D基板G向處理線A方向運送， 同時在基板G上面（被處理面）施加刷洗或沖洗。 在鄰接洗淨處理部2 4的下游側的第1熱處理部2 6 ，沿處理線A在中心部設縱型的運送機構4 6，在其前後 兩側堆疊配置多層的單元。例如第2圖所示，在上游側的 多層單元部（TB)44從下方依序堆疊有，移交基板用 的傳遞單元（PASS) 50 ;脫水烘烤用的加熱單元（ --- 14:_一- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（苹 DHP) 52、54及附著單元（AD) 56。在此’傳 遞單元（P A S S ) 5 0是用以將基板G移交給沖刷洗淨 單元（SCR) 42時使用。而，多層單元部（TB) 4 8則從下方依序堆疊有，移交基板用的傳遞單元（ PASS) 60 ;冷卻單元（CL) 62、64及附著單 元（AD) 66。在此，傳遞單元（PASS) 60是用 以將基板G移交給塗抹處理部2 8時使用。 如第2圖所示，運送機構4 6備有：可沿著垂直方向 延伸的導軌6 8昇降移動的昇降運送體7 0 ;可在此昇降 運送體70上向0方向旋轉的旋轉運送體72;及可在此 旋轉運送體7 2上支持基板G而前後方向進退或伸縮的運 送臂或夾鉗7 4。在垂直導軌6 8的基端側設有昇降驅動 昇降運送體70的驅動部76;在昇降運送體70安裝旋 轉驅動旋轉運送體7 2的驅動部7 8 ;在旋轉運送體7 2 安裝進退驅動運送臂7 4的驅動部8 0。各驅動部7 6、 78、80可以用電氣馬達構成。 如上述方式構成的運送機構4 6可以高速昇降或旋轉 運動，擷取兩鄰的多層單元部（TB) 44、48中的任 意單元，亦可以移交基板G給輔助運送空間3 8側的穿梭 構件4 0。 如第1圖所示，在鄰接第1熱處理部2 6的下游側的 塗抹處理部2 8，沿著處理線A成一列配置：抗蝕劑塗抹 單元（CT) 82、減壓乾燥單元（VD) 84、去除邊 緣單元（ER) 86。雖未圖示，但在塗抹處理部28內 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） I-------fW 裝-- (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 569288 Α7 Β7 五、發明説明（卬 (請先閲讀背面之注意事項再填寫本頁) 設有可以依製程順序將基板G各1片運進、運出此等3個 單元（CT) 82、 （VD) 84、 （ER) 86的運送 裝置，各單元（CT) 82、（VD) 84、（ER) 8 6內則以1片單位處理基板G。 鄰接塗抹處理部2 8的下游側的第2熱處理部3 0具 有與上述第1熱處理部2 6同樣的架構，在兩處理線A、 B間配設縱型的運送機構9 〇，在處理線A側（最末尾） 設一方的多層單元部（T B ) 8 8，在處理線B側（前頭 )設另一方的多層單元部（TB) 9 2。 雖省略未圖示，但可以，例如在處理線A側的多層單 元部（TB) 8 8，於其最下層配置傳遞單元（PASS )，在其上堆疊例如3層的預烘烤用的加熱單元（ PREBAKE)。同時，在處理線B側的多層單元部（T B ) 9 2，於其最下層配置移交基板用的傳遞單元（PAS S )，在其上堆疊例如1層的冷卻單元（COL)，再於其 上堆疊例如2層的預烘烤用的加熱單元（PREBAKE )。 經濟部智慧財產局員工消費合作社印製 第2熱處理部3 0的運送機構9 0不僅可以介由兩多 層單元部（TB) 88、9 2的各傳遞單元（PASS) ，與塗抹處理部2 8及顯像處理部3 2以1片單位移交基 板G，也可以與輔助運送空間3 8內的穿梭構件4 0或後 述的界面站（I / F ) 1 8以1片單位移交基板G。 在下游側的處理線B，顯像處理部3 2含有，以水平 姿勢運送基板G同時進行一連串的製程’所謂水平流通方 式的顯像單元（D E V ) 9 4。此顯像單元（D E v ) _____. -_ 本紙張尺度適用中國國家標準（CNS ) A4規格（21 O X 297公釐） 569288 A7 B7 五、發明説明（％ 9 4的架構與作用以後詳述。 (請先閲讀背面之注意事項再填寫本頁) 在顯像處理部3 2的下游側夾著脫色處理部3 4配置 有第3熱處理部3 6。脫色處理部3 4備有，對基板G 的被處理面照射i線（波長3 6 5 n m )進行脫色處理的 i線U V照射單元（i — u V ) 9 6。 第3熱處理部3 6的架構與上述第1熱處理部2 6或 第2熱處理部3 0的架構相同，沿處理線B配設縱型的運 送機構1 0 0，並在其前後兩側配設一對多層單元部（ τ B ) 9 8、1 0 2。 雖省略未圖示，但可以，例如上游側的多層單元部（ TB) 9 8，於其最下層配置傳遞單元（PASS)，在 其上堆疊例如3層的後烘烤用的加熱單元（POBAKE )。同 時，在下游側的多層單元部（T B ) 1 〇 2，於其最下層 配置後烘烤用的加熱單元（POBAKE )，在其上堆疊1層移 交基板及冷卻用的傳遞·冷卻單元（PASS · COL) ，再於其上堆疊2層的後烘烤用的加熱單元（POBAKE )。 經濟部智慧財產局員工消費合作社印製 第3熱處理部3 6的運送機構1 0 0不僅可以介由兩 多層單元部（TB) 98、102的各傳遞單元（PAS S )，與傳遞.冷卻單元（PASS · C0L)分別與i線UV照 射單元（i - UV) 96及卡匣站（C/ S) 14以1片單位移交基 板G，也可以與輔助運送空間3 8內的穿梭構件4 0以1 片單位移交基板G。 界面站（I / F ) 1 8備有可以與鄰接的曝光裝置 1 2交接基板G的運送裝置1 0 4，在其周圍配置緩衝台 _______- 17 - 本紙張尺度適用中國國家標準（CNS ) A4規格（21〇X297公釐） 569288 A7 B7 五、發明説明（垆 (B U F ) 106、擴充冷卻台（EXT、COL) (請先閲讀背面之注意事項再填寫本頁) 108及周邊裝置110。緩衝台（BUF) 106配置 有定置型的緩衝匣（未圖示）。擴充冷卻臺（EXT、 C〇L ) 1 〇 8是備有冷卻功能的移交基板用的工作臺， 向處理站（P/S)16側移交基板G時使用。周邊裝置 1 1 0可以是例如上下堆疊字幕攝影機（TITLER)與周邊 曝光裝置（EE)的架構。運送裝置104具有可以保持 基板G的構件例如運送臂1 〇 4 a，可以與鄰接的曝光裝 置 12 或各單元（BUF) 106、（EXT、C〇L) 1 0 8、（ TITLER/EE) 110進行基板G的移交。 第3圖表示此塗抹顯像處理系統的處理程序。首先， 在卡匣站（C/S) 1 4，由運送機構2 2從卡匣台2 0 上的一定的卡匣C中取出1片基板G，運進處理站（ P / S ) 1 6的洗淨處理部2 4的激元U V照射單元（e — UV) 41 (步驟 S1)。 經濟部智慧財產局員工消費合作社印製 在激元U V照射單元（e — U V ) 4 1內，基板g被 施加照射紫外線的乾式洗淨（步驟S 2 )。此紫外線洗淨 主要是用以去除基板表面的有機物。結束紫外線洗淨後， 基板G由卡匣站（c/S ) 1 4的運送機構2 2移送至洗 淨處理部2 4的沖刷洗淨單元（S C R ) 4 2。 在沖刷洗淨單元（S C R ) 4 2，如上述，以滾筒運 送或輸送帶運送方式以水平姿勢將基板G水平流通方式運 送向處理線A方向，同時在基板G上面（被處理面）施加 刷洗或沖洗，從基板表面上去除粒子狀的污染（步驟 --—---- 1ft- 本紙張尺度適用中國國家標準（CNS ) Μ規格（210X297公釐） 一 '-- 569288 A7 B7 五、發明説明（仴 S3)。再者，洗淨後仍以水平流動方式運送基板G，而 以空氣刀刃等澄乾液體，再乾燥基板G。 在沖刷洗淨單元（S C R ) 4 2內完成洗淨處理的基 板G則被運進第1熱處理部2 6的上游側多層單元部（ TB) 44內的傳遞單元（PASS) 50。 在第1熱處理部2 6，基板G由運送機構4 6以一定 的程序移至一定的單元。例如，基板G最初從傳遞單元（ PASS) 50移至加熱單元（D HP) 52、54中的 1個單元，在此接受脫水處理（步驟S 4 )。接著，基板 G被移至冷卻單元（CL) 62、64中的1個單元，在 此被冷卻到一定的基板溫度（步驟S 5 )。然後，基板G 被移至附著單元（A D ) 5 6，在此接受疏水（不沾水） 化處理（步驟S 6 )。結束此疏水化處理後，基板G在冷 卻單元（CL) 62、64的1個單元冷卻到一定的基板 溫度（步驟S 7 )。然後，基板G被移至屬於下游側多層 單元部（TB) 48的傳遞單元（PASS) 50。 如此，在第1熱處理部2 6內，基板G可以經由運送 機構4 6在上游側的多層單元部（T B ) 4 4與下游側的 多層單元部（TB)48的間任意來回。再者，第2及第 3熱處理部3 0、3 6也可以進行同樣的基板運送動作。 在第1熱處理部2 6接受到上述一連串的熱處理或熱 系統處理的基板G將從下游側多層單元部（T B ) 4 8內 的傳遞單元（P A S S ) 6 0移至下游側近鄰的塗抹處理 部2 8的抗蝕劑塗抹單元（C T ) 8 2。 ----- - 1Q - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) -裝·569288 A7 B7 V. Description of the invention (1) The present invention relates to a substrate processing apparatus that transports a substrate to be processed horizontally and performs a single or a series of liquid processing projects. (Please read the precautions on the back before filling this page.) The present invention relates to, for example, a liquid processing device and a liquid processing method for performing liquid processing such as development processing on a substrate such as a liquid crystal display device (LCD) glass substrate. Recently, a resist development processing system for manufacturing an LCD (liquid crystal display device) is known as a development method that can favorably increase the size of an LCD substrate, that is, by laying a transport roller or a transport belt in a horizontal direction. The so-called horizontal flow method, in which the LCD substrate is transported on a configured transport path, carries out a series of development processes such as development, washing, and drying during transport, has attracted attention. This horizontal flow method has many advantages compared with the rotation method that makes the substrate rotate, the substrate processing or conveying system and the drive system have a simple structure, and there is little fog or re-attachment to the substrate. It has many advantages. The employee processing cooperatives of the Bureau generally print and display the processing equipment in the horizontal flow mode. Each liquid processing unit is set in the development process, the cleaning process, and the liquid processing unit in order from the upstream side to the downstream side along the transport path. A dish-shaped container or tray for receiving liquids under the transport path is collected, and the drain outlet of each tray is connected to an individual drain system. However, in the conventional horizontal flow method, the substrate is transported from the liquid processing section on the upstream side to the liquid processing section on the downstream side because the substrate is maintained in a horizontal posture on the transport path. In the state where the liquid remains on the substrate, the substrate is transported to the liquid processing section on the downstream side, and it is dropped or even mixed into the plate on the downstream side, everywhere ----------- =, 4: This paper size is in accordance with Chinese National Standard (CNS) A4 (210X297 mm) 569288 A7 B7 V. Description of the invention (2) It is difficult to recycle physical liquids separately. (Please read the precautions on the back before filling in this page.) When manufacturing LCDs, a resist film is formed on the LCD glass substrate (hereinafter referred to as the "LCD substrate"), and the uranium resist mold is exposed according to the circuit pattern. Then, the so-called photolithography technology, which is then subjected to development processing, forms a certain circuit pattern on the LCD substrate. For example, Japanese Patent Application Laid-Open No. 1 1-8 72 10 discloses that a developing liquid is applied to the surface of a substrate that is transported in a single direction in a horizontal direction, a liquid layer is formed on the substrate, and a development reaction is maintained for a certain period of time. A processing method and a processing device for converting the substrate into an inclined posture such that the developing liquid is dropped on one of the end surfaces that is perpendicular to the substrate conveyance direction, and the developing liquid is transported in the inclined posture. However, in recent years, there has been a strong demand for the enlargement of the LCD substrate, and a huge substrate with a side of 1 meter has appeared. During the development process of the LCD substrate, when the LCD substrate is tilted, when the developing solution is dried from the LCD substrate, if the purified substrate residue is not quickly supplied with pure water to wash the developing solution, and the developing reaction is stopped, This may cause problems such as uneven development or deterioration of line width uniformity. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs in order to supply cleaning liquid to such large LCD substrates, the LCD substrates are transported at a high speed in an inclined posture. It is difficult for various reasons, such as the stopping conditions of the LCD substrate when the LCD substrate is transported. For example, when the L C D substrate is transported at a high speed, the L C D substrate may not stop at a certain position and may break out of a predetermined position to be damaged, or the L C D substrate may be stopped suddenly and a large load may be applied to the L C D substrate to damage the L C D substrate. Another paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 569288 A7 B7 V. Description of the invention (3) When the speed of the LCD substrate is slowly reduced, the footprint of the display device is inevitable Can get bigger and more problematic. (Please read the precautions on the back before filling in this page) The present invention was made in view of the problems of the above-mentioned conventional technology, and its purpose is to provide a transport path that can be laid in a horizontal direction from the substrate to be processed in a short time. A substrate processing apparatus for efficiently drying a processing liquid supplied to a substrate. Another problem of the present invention is to provide a substrate processing apparatus capable of recovering a processing liquid supplied to a substrate to be processed, respectively, with high purity on a transport path laid horizontally. The present invention has been made in view of the above-mentioned circumstances, and an object thereof is to provide a liquid processing apparatus and a liquid processing method capable of performing uniform liquid processing on the entire substrate even with a large substrate. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs In order to achieve the above-mentioned object, the substrate processing apparatus of the present invention is provided with: A transport driving means for transporting the substrate on the transport path to drive the transport body; a processing liquid supply means including one or a plurality of nozzles for supplying a certain processing liquid to a processing surface of the substrate on the transport path; and A substrate tilting member that causes the liquid to drop from the substrate by gravity and tilts the substrate on the transport path. In the above-mentioned structure, a certain processing liquid is supplied from the processing liquid supply member to the surface to be processed of the substrate in a horizontal posture, and a certain liquid processing is performed. After the processing, a liquid remains on the substrate. However, on the downstream side of the conveying path, the substrate tilting member will tilt the substrate, thereby, the liquid adhered or left on the substrate-; R-_ This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 (Mm) 569288 A7 B7 V. Description of the invention (4) You will experience that the inclined surface of the substrate will fall quickly outside the substrate due to gravity. It is preferable to tilt the substrate forward or backward. (Please read the precautions on the back before filling in this page.) In the substrate processing apparatus of the present invention, one preferred form of the substrate tilting member is to have a position between the first position of the substrate on the transportation path and the second position above the substrate. A moving elevating member; and a structure for holding the inclined state holding member of the substrate in the inclined state at the second position. In this structure, in order to tilt the substrate at the second position above the transport path, the elevating member raises the substrate from the first position to the second position. It is preferable to provide a substrate posture switching member that can switch the posture of the substrate between the second position, the horizontal position, and the inclined position. Another preferred form of the substrate tilting member includes a transporting body that moves the transporting body between a substantially horizontal third position on the transporting path and a tilted fourth position for dropping liquid on the transporting path. A tilting member; and a structure of a tilted state holding member that holds the substrate in a tilted state on the carrier at the fourth position. In such a structure, it is preferable to provide a clutch mechanism that can removably connect the transport body belonging to the section to the transport drive member. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs The substrate processing apparatus of the present invention may be provided with a liquid collecting member for collecting the liquid under the transport path in order to recover the processing liquid. To collect and process the liquid separately, it is best to collect the liquid collection components, including the first and second sections located adjacent to each other on the conveying path, and used to receive the first and second sets of liquids that are concentrated under the conveying path, respectively. The structure of the liquid part, or the processing liquid supply means, includes a structure of first and second nozzles arranged in the first and second sections, respectively. At this time, in order to improve the paper size of the liquid recovered in the first and second intervals, the Chinese National Standard (CNS) A4 specification (210X297 mm) is applied. 569288 A7 B7 V. Description of the invention (5) (Please read the notes on the back first Please fill in this page again.) Purity, the substrate tilting member may contain the first substrate that tilts the substrate in order to make the liquid on the substrate supplied in the first section fall into the first liquid collecting part before entering the second section. Inclined part. According to a first aspect of the present invention, there can be provided a liquid processing apparatus for liquid processing with a constant force applied to a substrate, comprising: a first liquid processing unit for applying a processing liquid to a substrate held in a slightly horizontal posture; A second liquid processing unit that removes the processing liquid from the substrate to which the processing liquid is applied; and a substrate transfer mechanism that transports the substrate from the first liquid processing unit in one direction to the second liquid processing unit in a slightly horizontal posture. The first liquid processing unit is provided with a processing liquid supply mechanism for applying the processing liquid to the substrate from front to rear of the substrate transporting direction of the substrate transporting mechanism, and the second liquid processing unit is provided to lift and apply the processing liquid. A substrate tilting mechanism of the processing liquid applied to the substrate is converted forward of the substrate in which the processing liquid is transported in a tilted posture. The employee's cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs printed this liquid processing device according to the first aspect, because the direction in which the processing liquid is applied to the substrate is the same as the direction in which the processing liquid flows from the substrate when the processing liquid is applied to the substrate. This equalizes the time during which the processing liquid of the entire substrate is in contact with the substrate, so that uniform liquid processing can be performed on the entire substrate. According to a second aspect of the present invention, there can be provided a liquid processing apparatus for applying a predetermined liquid treatment to a substrate, comprising: a first paper scale for applying a first processing liquid to a substrate held in a slightly horizontal posture, applicable to China National Standard (CNS) A4 specification (210X: 297 mm) 569288 A7 B7 V. Description of the invention (6) (Please read the precautions on the back before filling this page) 1Liquid processing department; apply the first processing liquid from above The second liquid processing unit from which the first processing liquid is removed; and the substrate to which the first processing liquid is applied is transported from the first liquid processing unit to the second liquid processing in a single horizontal direction in a unidirectional manner. The second liquid processing part of the substrate transport mechanism includes: raising one end of the substrate to which the first processing liquid is applied, and converting the substrate into an inclined posture, thereby drying the first processing liquid applied to the substrate. Substrate tilt mechanism; second processing liquid that can be ejected to a substrate held in an inclined posture by the substrate tilt mechanism to flush out residues of the first processing liquid A treatment liquid discharge nozzle; and a 'so that the above-described treatment liquid ejection nozzle along the nozzle moving mechanism holding moving obliquely inclined posture on the substrate surface of the substrate by the tilt mechanism. The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs printed this liquid processing device according to the second aspect, which discharges the second processing liquid from the nozzle for processing liquid discharge to the substrate, and at the same time moves the substrate at a certain speed, preferably at high speed. This removes the residue of the first processing liquid from the substrate. In this way, the time during which the first processing liquid of the entire substrate is in contact with the substrate can be equalized. Therefore, the substrate can be uniformly processed by the first processing liquid. According to a third aspect of the present invention, there may be provided a liquid processing apparatus for applying a predetermined liquid treatment to a substrate, comprising: a first liquid processing unit that applies a first processing liquid to a substrate held in a slightly horizontal posture; Remove the second liquid processing section of the first processing liquid from the substrate on which the first processing liquid is applied; and, this paper size applies the Chinese National Standard (CNS) A4 specification (210'〆297 mm) 569288 A7 B7 5 7. Description of the invention (7) (Please read the precautions on the back before filling in this page.) The substrate coated with the first processing liquid is transported from the first liquid processing unit to the second liquid in a single horizontal direction. A substrate transfer mechanism of a processing unit; the first liquid processing unit is provided with a first processing liquid supply mechanism for applying a first processing liquid to the substrate from front to rear of the substrate transfer direction of the substrate transfer mechanism, and the second liquid The processing unit is provided with a method of raising the front side of the substrate to which the first processing liquid is applied in the conveyance direction, and changing the substrate to an inclined posture to dry the coating. A substrate tilting mechanism for the first processing liquid of the substrate; a second processing liquid supply for moving the residue of the first processing liquid from the upper end to the lower end of the substrate held by the substrate tilting mechanism in an inclined posture. To the second processing liquid supply mechanism for supplying the second processing liquid to the substrate. The employee's cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs printed this liquid processing device according to the third aspect, because the first processing liquid applied to the substrate is removed from the portion where the first processing liquid is applied, so that the first substrate 1 The time during which the processing liquid contacts the substrate is equalized. Therefore, the substrate can be uniformly processed by the first processing liquid. According to a fourth aspect of the present invention, there is provided a liquid processing method for applying a predetermined liquid treatment to a substrate transported in one direction in a slightly horizontal posture, and the method includes: transporting the substrate in a slightly horizontal posture to the substrate coating first step The first process in the first liquid processing field for processing liquids; the second process in which the first processing liquid is applied to the substrate; the above-mentioned __________- in-is applied in a slightly horizontal posture-This paper size applies Chinese national standards (CNS ) A4 size (210X297 mm) 569288 A7 B7 V. Description of the invention (8) 1 The third process of transporting the substrate of the processing liquid to the second liquid processing field in which the first processing liquid is removed from the substrate; raising the transportation of the substrate 4th process of inclining the substrate by a certain angle toward the front side to dry the first processing liquid from the substrate; and maintaining the substrate tilting mechanism at a certain angle from the upper end of the substrate to The lower end 'moves a second processing liquid supply position for flushing the first processing liquid from the substrate, and simultaneously supplies it to the substrate. A fifth process of the invention. According to the fifth aspect of the present invention, there is provided a liquid processing apparatus for applying a development process to a substrate to which an exposure process is applied, comprising: applying a developing solution to a substrate held in a substantially horizontal state; The first liquid processing unit; the second liquid processing unit that removes the developing liquid from the substrate to which the developing liquid is applied; and transports the substrate from the first liquid processing unit to the second in a single horizontal direction in one direction The substrate transfer mechanism of the liquid processing unit; the second liquid processing unit includes: raising the front side of the substrate to which the imaging liquid is applied in the transporting direction, converting the substrate to an inclined posture, and applying the substrate to the substrate. A substrate tilting mechanism for a developing liquid; a cleaning nozzle for discharging a cleaning liquid for flushing the developing liquid; and the cleaning nozzle is moved obliquely along the surface of the substrate at a constant speed to make the first (2) The supply position of the processing liquid is moved, and the cleaning liquid is discharged from the upper end to the lower end of the substrate held by the substrate tilting mechanism in an inclined posture at the above. Nozzle moving mechanism for cleaning substrates. This liquid processing method according to the fifth aspect is because the first processing liquid applied to the substrate is removed from the part where the first processing liquid is applied. _! ___- 11-This paper size applies the Chinese National Standard (CNS) A4 specification ( 210X297 mm) (Please read the notes on the back before filling out this page) Binding-Order printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 569288 A7 B7 V. Invention Description (9) The time during which the processing liquid comes into contact with the substrate is equalized, so that development unevenness can be prevented and high line width uniformity can be obtained. According to a sixth aspect of the present invention, there is provided a liquid processing method for applying a developing process to a substrate to which an exposure process is applied, comprising: transporting the substrate in a slightly horizontal posture to a first liquid to which a developing liquid is applied to the substrate; The first process in the processing field; the second process in which a developing liquid is applied to the substrate; the substrate to which the developing liquid is applied is transported in a slightly horizontal position to the third in the second liquid processing field in which the developing liquid is removed from the substrate. A fourth process of raising the front side of the substrate in the conveying direction and tilting the substrate by a certain angle, thereby drying the developing liquid from the substrate; and maintaining the substrate tilting mechanism at a certain angle, The fifth process of moving the supply position of the cleaning liquid for flushing the developing liquid from the substrate from the upper end to the lower end of the substrate and supplying the cleaning liquid to the substrate. According to the liquid processing apparatus and the liquid processing method of the present invention as described above, since the time during which the entire processing liquid of the substrate contacts the substrate can be equalized, the substrate can be processed uniformly. This makes it possible to obtain a high-quality substrate. At the same time, since substrates are not transported at high speed, processing safety can be improved, breakage or damage to the substrates can be suppressed, and a large amount of space is not taken up when the substrates are stopped. When the first processing liquid is applied to the first substrate; when the second processing liquid is rinsed with the second processing liquid; or when the developing solution is washed with the cleaning liquid, etc., the processing liquid is simply supplied to the substrate ______- 19-This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling out this page). 11 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 569288 A7 B7 5 Explanation of the invention (moving the nozzle of π can complete the liquid processing in the first liquid processing section and the second liquid processing section in a short time, which can increase the productivity. (Please read the precautions on the back before filling this page) Embodiment (Embodiment 1) FIG. 1 shows a coating development processing system to which the development processing apparatus of the present invention can be applied. This coating development processing system 10 is installed in a clean room, and an LCD substrate is used as a substrate, for example. The substrate is processed and subjected to various processes such as cleaning, resist application, pre-baking, development, and post-baking in the photolithography process of the LCD manufacturing process. The exposure process is adjacent to this system The external exposure device 12 provided by the system is the same. This smear developing processing system 10 is provided with a processing station (P / S) 1 6 which is longer in the horizontal direction at the center, and has both ends in the longitudinal direction (X direction). Configure the cassette station (C / S) 14 and interface station (I / F) 18. The print station (C / S) 14 for the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is used for the loading and unloading of cassettes into and out of the system 10. It is equipped with a cassette table 20 that can be arranged in a horizontal direction, for example, the Y direction, to accommodate four cassettes C that can accommodate a plurality of substrates G in a multilayer manner, and the cassette table 20 that can be placed on this cassette table 20 The cassette C is taken out into the transport mechanism 22 of the substrate G. The transport mechanism 22 is provided with a member capable of holding the substrate G, for example, the transport arm 2 2 a, which can move in four axes of X, Y, Z, and Θ, and The substrate G is transferred to the adjacent processing station (P / S) 16 side. The processing station (P / S) 16 arranges each processing unit in parallel with the length of the system (X direction) according to the processing flow or process sequence. But in the opposite direction, a pair of lines A and B. In detail, on the side from the cassette station (C / S) 1 4 — _--This paper size applies the Chinese National Standard (CNS) Α4 regulations (210X297 mm) 569288 A7 B7 5. Description of the invention (to the interface station (I / F) 1 8 upstream side of the processing line a, into a horizontal square (please read the precautions on the back before filling this page) to a column The cleaning treatment section 24, the first heat treatment section 26, the application treatment section 28, and the second heat treatment section 30 are arranged. On the other hand, from the interface station (I / F) 1 8 side to the cassette station (C / S) The processing line B of the downstream portion measured at 14 is arranged in a horizontal direction with a second heat treatment portion 30, a development treatment portion 3 2, a decolorization treatment portion 34, and a third heat treatment portion 36. In this processing line configuration, the second heat treatment section 30 is the last end of the processing line A located on the upstream side, and is the forefront of the processing line B located on the downstream side, and spans between the two processing lines A and B. An auxiliary transport space 38 is provided between the two processing lines A and B. The shuttle member 40 capable of placing the substrate G horizontally in a unit of one unit is driven by a driving mechanism (not shown) so as to move in both directions of the processing line method (X direction). In the processing line A on the upstream side, the cleaning processing section 2 4 includes a scouring and washing unit (S C R) 4 2. This scouring and washing unit (SCR) 4 2 is adjacent to the cassette station (C / S) 1 4 and is equipped with an exciton UV photo printing unit (e-UV) 4 1. Although not shown, the cleaning unit in the scouring and washing unit (S CR) 4 2 can be transported by a roller or a conveyor belt, and the LCD substrate G is transported in a horizontal posture toward the processing line A, while the substrate G Brush or rinse the top surface. In the first heat treatment section 2 6 downstream of the washing treatment section 24, a vertical transport mechanism 46 is provided at the center along the treatment line A, and a plurality of units are stacked on the front and back sides. For example, as shown in Figure 2, the upstream multi-layer unit (TB) 44 is stacked in order from below, and the transfer unit (PASS) 50 for transferring substrates; the heating unit for dehydration baking (--- 14: _ I. This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 569288 A7 B7 5. Description of the invention (Apple DHP) 52, 54 and Attachment Unit (AD) 56. Here 'Pass Unit (PASS) 5 0 is used to transfer the substrate G to the scouring and washing unit (SCR) 42. The multi-layer unit (TB) 48 is stacked in order from below, and the transfer unit (PASS) 60 for transferring the substrate is cooled; Units (CL) 62, 64 and attachment units (AD) 66. Here, the transfer unit (PASS) 60 is used to transfer the substrate G to the application processing unit 28. As shown in FIG. 2, the transport mechanism 4 6 is provided with: a guide rail 68 that can extend in the vertical direction; a lifting and lowering carrier 7 0 that can be moved up and down; a rotating carrier 72 that can rotate in the 0 direction on the lifting and lowering carrier 70; and a rotating carrier 7 2 Support arm or clamp 7 4 supporting the substrate G and advancing or retracting in the forward and backward direction. 4 on the vertical guide 6 8 The base end side is provided with a driving part 76 for driving the lifting and lowering carrier 70; a driving part 7 8 for rotating and driving the rotary carrier 7 2 is mounted on the lifting and lowering body 70; and a drive for advancing and retracting the driving arm 7 4 is mounted on the rotary carrier 7 2 Unit 80. Each of the drive units 7, 6, 78, 80 can be constituted by an electric motor. The transport mechanism 46 constructed as described above can be lifted or rotated at high speed to capture two adjacent multi-level unit units (TB) 44 and 48. It is also possible to transfer the substrate G to the shuttle member 40 on the side of the auxiliary conveying space 3 to 8 as shown in Fig. 1. At the application processing portion 28 adjacent to the downstream side of the first heat treatment portion 26, along the processing, Line A is arranged in a row: a resist application unit (CT) 82, a decompression drying unit (VD) 84, and an edge removal unit (ER) 86. Although not shown, the paper size is applicable to China in the application treatment unit 28 National Standard (CNS) A4 Specification (210X297mm) I ------- fW Pack-(Please read the precautions on the back before filling this page) Order Printed by the Intellectual Property Bureau Employee Consumer Cooperative of the Ministry of Economic Affairs 569288 Α7 Β7 5. Description of the invention (卬 (Please read the note on the back first) Please fill in this page again.) There are three units (CT) 82, (VD) 84, (ER) 86, and each unit (CT) ) 82, (VD) 84, (ER) 8 6 processes the substrate G in one unit. The second heat treatment section 30 adjacent to the downstream side of the application treatment section 28 has the same configuration as the first heat treatment section 26. The structure is provided with a vertical transport mechanism 9 between the two processing lines A and B. One multi-level unit (TB) 8 8 is provided on the processing line A side (the end), and the B side (front) of the processing line is provided. The other multilayer unit (TB) 9 2. Although not shown, it is possible to arrange, for example, a multilayer unit (TB) 8 8 on the processing line A side, arrange a transfer unit (PASS) at the lowermost layer, and stack, for example, three layers of pre-baking heating on it. Unit (PREBAKE). At the same time, in the multi-layer unit section (TB) 92 on the processing line B side, a transfer unit (PAS S) for handing over a substrate is arranged at the bottom layer, and a cooling unit (COL), for example, 1 layer is stacked thereon, and then For example, two layers of prebaking heating units (PREBAKE) are stacked on top of each other. Printed by the Consumer Property Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, the second heat treatment section 3, the transport mechanism 9 0 can not only pass through the two multi-level unit sections (TB) 88, 92, each of the transfer units (PASS), and the application processing section 2 8 The substrate G is transferred by the imaging processing unit 32 in one unit, and may be transferred in one unit with the shuttle member 40 in the auxiliary transport space 38 or an interface station (I / F) 18 described later. In the processing line B on the downstream side, the development processing unit 32 includes a development unit (D E V) 9 4 which transports the substrate G in a horizontal posture while performing a series of processes. This development unit (DE v) _____. -_ This paper size is applicable to the Chinese National Standard (CNS) A4 specification (21 OX 297 mm) 569288 A7 B7 V. Description of the invention (% 9 4 The structure and function will be described in detail later. (Please read the precautions on the back before filling in this page.) The third heat treatment section 36 is arranged on the downstream side of the development processing section 32 and the decolorization treatment section 34 is provided. The decolorization treatment section 34 is provided for the substrate G. I-line UV irradiation unit (i — u V) for irradiating the processed surface with i-rays (wavelength 3 65 nm) 9 6. The structure of the third heat treatment section 36 is the same as that of the first heat treatment section 26 or the first 2 The structure of the heat treatment section 30 is the same, and a longitudinal transport mechanism 100 is arranged along the processing line B, and a pair of multi-layer unit sections (τ B) 9 8 and 102 are arranged on the front and rear sides. Although omitted Although it is not shown in the figure, for example, an upstream multi-layer unit (TB) 9 8 may be provided with a transfer unit (PASS) at the lowermost layer and a three-layer post-baking heating unit (POBAKE) may be stacked thereon. At the same time, the downstream multi-layer unit (TB) 1 〇2, the heating unit for baking after the bottom layer POBAKE), on which 1 layer of hand-over substrates and cooling transfer and cooling units (PASS · COL) are stacked, and 2 layers of post-baking heating units (POBAKE) are stacked thereon. Employees of Intellectual Property Bureau, Ministry of Economic Affairs The consumer cooperative prints the third heat treatment section 36. The transport mechanism 100 can not only pass through the two multi-level unit sections (TB) 98, 102 each of the transfer units (PAS S), and the transfer. Cooling unit (PASS · C0L) respectively The substrate G is transferred to the i-line UV irradiation unit (i-UV) 96 and the cassette station (C / S) 14 in 1 unit, and it can also be transferred to the shuttle member 40 in the auxiliary transport space 3 8 in 1 unit. G. Interface station (I / F) 1 8 is equipped with a conveying device 1 0 4 that can transfer the substrate G to the adjacent exposure device 1 2 and a buffer table is arranged around it _______- 17-This paper standard is applicable to Chinese national standards ( CNS) A4 specification (21 × 297 mm) 569288 A7 B7 V. Description of invention (垆 (BUF) 106, expansion cooling table (EXT, COL) (Please read the precautions on the back before filling this page) 108 and peripheral devices 110. The buffer table (BUF) 106 is provided with a fixed buffer box (not shown). Expansion cooling stage (EXT, COL) 1 08 is a table for transferring substrates with a cooling function, and is used when transferring substrate G to the processing station (P / S) 16 side. Peripheral devices 1 1 0 can be, for example, The structure of a TITLER and a peripheral exposure device (EE) stacked on top of each other. The conveying device 104 has a member that can hold the substrate G, such as a conveying arm 104a, and can be adjacent to the exposure device 12 or each unit (BUF) 106, (EXT, COL) 108, (TITLER / EE) 110 The substrate G is handed over. FIG. 3 shows a processing procedure of the smear developing processing system. First, at the cassette station (C / S) 1 4, the conveying mechanism 22 takes out one substrate G from a certain cassette C on the cassette table 20 and transports it to the processing station (P / S) 1 6 The exciton UV irradiation unit (e — UV) 41 of the cleaning processing unit 24 (step S1). Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs In the exciton U V irradiation unit (e — U V) 41, the substrate g is subjected to dry cleaning by irradiation with ultraviolet rays (step S 2). This ultraviolet cleaning is mainly used to remove organic matter on the surface of the substrate. After the ultraviolet cleaning is completed, the substrate G is transferred by the transport mechanism 2 2 of the cassette station (c / S) 1 4 to the scouring and cleaning unit (S C R) 4 2 of the cleaning processing unit 24. In the scouring and washing unit (SCR) 4 2, as described above, the substrate G is conveyed in a horizontal posture in a horizontal posture to the processing line A by a roller conveyer or a conveyor belt conveyer, and at the same time, a brush is applied on the substrate G (the treated surface). Or rinse to remove particulate contamination from the surface of the substrate (steps ------- 1ft- This paper size is applicable to Chinese National Standard (CNS) M specifications (210X297 mm) I '-569288 A7 B7 V. Invention Explanation (仴 S3). Furthermore, after cleaning, the substrate G is still conveyed in a horizontal flow manner, and the liquid is dried with an air blade, and then the substrate G is dried. The cleaning process is completed in the scouring cleaning unit (SCR) 4 2 The substrate G is transported into the transfer unit (PASS) 50 in the upstream multi-layer unit section (TB) 44 of the first heat treatment section 26. In the first heat treatment section 26, the substrate G is transported by the transport mechanism 46 to a certain level. The program moves to a certain unit. For example, the substrate G is initially moved from the transfer unit (PASS) 50 to one of the heating units (D HP) 52 and 54 and is subjected to a dehydration process (step S 4). Next, the substrate G is moved to the cooling unit (CL) 62, 64 One unit is cooled to a certain substrate temperature here (step S 5). Then, the substrate G is moved to the attachment unit (AD) 5 6 where it is subjected to a hydrophobic (non-stick) treatment (step S 6) After the hydrophobization treatment is completed, the substrate G is cooled to a certain substrate temperature in one of the cooling units (CL) 62 and 64 (step S 7). Then, the substrate G is moved to the downstream multi-layer unit (TB) ) 48 transfer unit (PASS) 50. In this way, in the first heat treatment section 26, the substrate G can pass through the transport mechanism 46 in the upstream multilayer unit (TB) 4 4 and the downstream multilayer unit (TB) ) 48 back and forth at random. In addition, the second and third heat treatment sections 30 and 36 can also perform the same substrate transport operation. The first heat treatment section 26 receives the above-mentioned series of heat treatment or thermal system substrates. G will move from the transfer unit (PASS) 60 in the downstream multi-layer unit section (TB) 4 8 to the resist application unit (CT) 8 2 in the coating treatment section 2 8 adjacent to the downstream side. ----- -1Q-This paper size is applicable to China National Standard (CNS) A4 (210X297 mm) ) (Please read the notes on the back before filling this page)
、1T 經濟部智慧財產局員工消費合作社印製 569288 A7 _____B7 五、發明説明（帘 基板G在抗蝕劑塗抹單元（c T ) 8 2以例如旋轉塗 敷法在基板上面（被處理面）塗抹抗蝕刻液，接著在下游 側近鄰的減壓乾燥單元（V D ) 8 4藉由減壓的乾燥處理 ，接著，在下游側近鄰的去除邊緣單元（E r ) 8 6去除 基板周緣部的多餘（不需要）的抗蝕劑（步驟S 8 )。 接受上述抗蝕劑塗抹處理的基板G則從減壓乾燥單元 (VD) 84移交給，屬於鄰近的第2熱處理部30的上 游側多層單元部（T B ) 8 8的傳遞單元（P A S S )。 在第2熱處理部3 0內，基板G由運送機構9 0以一 定的程序移送至一定的單元。例如。基板G最初從該傳遞 單元（PAS S )移至加熱單元（prebAKE )中的1個單 元，在此接受塗抹抗蝕液後的烘烤（步驟S 9 )。接著， 基板G被移至冷卻單兀（C〇L )的1個單元，在此被冷 卻到一定的基板溫度（步驟S 1 〇 ) 。·然後，基板G則經 由下游側多層單元部（T B ) 9 2側的傳遞單元（ PASS)，或不經由，而交付給界面站（I/F) 18 側的擴充冷卻臺（E X T、C〇L ) 1 〇 8。 在界面站（I/F) 1 8，基板G從擴充冷卻臺（ EXT、COL) 1 〇8運進周邊裝置1 1 0的周邊曝光 裝置（E E )，在此接受爲了在顯像時去除附著在基板G 周邊部的抗蝕劑的曝光後，送至鄰近的曝光裝置1 2 (步 驟 S 1 1 )。 由曝光裝置12在基板G上的抗蝕劑曝光一定的電路 圖案。而結束圖案曝光的基板G則從曝光裝置1 2送回界 _____- 9Π , 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝· 訂 經濟部智慧財產局員工消費合作社印製 569288 A7 B7 五、發明説明（項 面站（I/F) 18 (步驟S11) ’先運進周邊裝置 (請先閱讀背面之注意事項再填寫本頁) 1 1 0的字幕攝影機（TITLER )，至此，於基板上的一定 部位記錄一定的資訊（步驟S 1 2 )。然後’基板G則送 回擴充冷卻臺（EXT、C〇L) 108。在界面站（ I / F ) 1 8的基板G的運送及與曝光裝置1 2間的基板 G的交接是由運送裝置1 〇 4爲之。 處理站（P/S) 1 6是在第2熱處理部3 0，運送 機構9 0從擴充冷卻臺（E X τ、c〇L ) 1 〇 8接受已 曝光的基板G，經由處理線B的多層單元部（T B ) 9 2 內的傳遞單元（P A S S )，送交顯像處理部3 2。 在顯像處理部3 2，將從該多層單元部（T B ) 9 2 內的傳遞單元（P A S S )接受的基板G運進顯像單元（ D E V ) 9 4。在顯像單元（D E V ) 9 4，基板G以水 平流動方式向處理線B的下游以水平姿勢運送，在運送中 進行顯像、洗淨、乾燥的一連串顯像處理工程（步驟 S 1 3 )。 經濟部智慧財產局員工消費合作社印製 在顯像處理部3 2，已接受顯像處理的基板G被運進 下游側鄰近的脫色處理部3 4，在此接受藉由照射i線的 脫色處理（步驟S14)。完成脫色處理的基板G被運交 給第3熱處理部3 6的上游側多層單元部（T B ) 9 8內 的傳遞單元（P A S S )。 在多層單元部（TB) 9 8，基板G最初由該傳遞單 元（PASS)移至加熱單元（POBAKE)的1個單元，在 此接受後烘烤（步驟S 1 5 )。接著，基板G便被移送至 本紙張尺度適用中國國家標準（CNs ) A4規格（210X297公釐） -91 - 569288 Α7 Β7 五、發明説明（1)9 下游側多層單元部（τ B ) 1 〇 2內的傳遞冷卻單元（ (請先閱讀背面之注意事項再填寫本頁) PASSDCOL)，在此被冷卻到一定的基板溫度（步驟S 1 6 )。在第3熱處理部36的基板G的運送是由運送機構 1 0〇爲之。 在卡匣站（C/S)14側，運送機構22從第3熱 處理部3 6的傳遞冷卻單元（PASSDCOL)接受完成塗抹顯 像處理的全製程的基板G，將接受的基板G收容在任一卡 匣C (步驟S 1 )。 在此塗抹顯像處理系統1 0 0，可以在例如顯像處理 部3 2的顯像單元（D E V ) 9 4使用本發明。以下，參 照第4圖〜第1 8圖說明將本發明應用在顯像單元（ D E V ) 9 4的實施形態。 第4圖以模式方式表示本發明一實施形態的顯像單元 (D E V ) 9 4內的整體架構。此顯像單元（D E V ) 9 4是由形成沿著處理線B水平方向（X方向）延伸的連 續的運送路1 0 8的多數，例如8個模組Μ 1〜Μ 8連續 配置成一列而構成。 經濟部智慧財產局員工消費合作社印製 以此等模組Μ 1〜Μ 8中，位於最上游端的模組Μ 1 構成基板運入部1 1 〇，以連續在其後的4個模組Μ 2、 Μ 3、Μ 4、Μ 5構成顯像部1 1 2，以接下的模組Μ 6 構成洗淨部1 1 4，以其次的模組Μ 7構成乾燥部1 1 6 ，以最末尾的模組Μ 8構成基板運出部1 1 8。 在基板運入部1 1 0設有可以水平姿勢接受從隔壁的 基板運送機構（未圖示）移交過來的基板G，移載至運送 ____-99 - 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） 569288 A7 _ _ B7__ 五、發明説明（年 (請先閱讀背面之注意事項再填寫本頁) 路1 0 8上的可昇降的多數昇降梢1 2 0。基板運出部1 1 8也設有能以水平姿勢抬高基板G轉交給隔壁的基板運 送機構（未圖示）的可昇降的多數昇降梢1 2 2。 進一步詳述的，顯像部1 1 2在模組Μ 2設有預濕潤 部1 2 4 ;在模組Μ 3、Μ 4設有顯像液供應部1 2 6 ; 在模組Μ 5設有顯像液滴落部1 2 8。預濕潤部1 2 4設 有1個或多數個，將噴嘴口朝向運送路1 0 8，可以沿運 送路1 0 8雙方向移動，用以向基板供應預濕潤液例如純 水的預濕潤液供應噴嘴Ρ Ν。顯像液供應部1 2 6設有1 個或多數個，將噴嘴口朝向運送路1 0 8，可以沿運送路 1 0 8雙方向移動，用以向基板供應顯像液的顯像液供應 噴嘴D Ν。本架構例是按模組Μ 3、Μ 4配設可分別獨立 移動的顯像液供應噴嘴D N a、D N b。顯像液滴落部 1 2 8及預濕潤部1 2 4設有可使基板G傾斜的後述的基 板傾斜機構1 8 0 (第1 1圖、第1 2圖）。 經濟部智慧財產局員工消費合作社印製 在洗淨部1 1 4設有1個或多數個，將噴嘴口朝向運 送路1 0 8，可以沿運送路1 0 8雙方向移動，用以向基 板供應洗淨液，例如純水的洗淨液供應噴嘴R N。在乾燥 部1 1 6，夾著運送路1 0 8設有一對或多對用以沿運送 路1 0 8澄乾附著在基板G的液體（主要是洗淨液）的空 氣刀刃E N。 在顯像部1 1 2及洗淨部1 1 4分別設有用以承接掉 落運送路1 08下的液體的盤子1 30、1 3 2、1 34 。在顯像部1 1 2，詳情是，在預濕潤部1 2 4與顯像液 ___________23_- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（夺 供應部1 2 6以及顯像液滴落部1 2 8分別配有專用的盤 子 130、132。各盤子 130、132、134 的底 (請先閲讀背面之注意事項再填寫本頁} 部設有排液口，連接有不同排液系統的排液管1 3 1、 1 3 3、1 3 5 ° 第5圖〜第8圖表示基板運入部1 1 〇及預濕潤部 1 2 4的運送路1 〇 8周圍的架構。 運送路1 0 8是沿著處理線B水平鋪設分開一定間隔 固定在可轉動的轉軸1 3 6的一對運送輥1 3 8 A、 1 3 8 B而成的滾筒運送型的運送路。 經濟部智慧財產局員工消費合作社印製 進一步詳述之，在各模組Μ的左右兩側壁的上部或軸 腳構件1 4 0，沿處理線Β方向以一定間隔安裝軸承 142Α、142Β，令運送輥 138Α、138Β 位於 左右兩惻壁的內側，將轉軸1 3 6以可轉動狀架設在各〜 對軸承1 4 2 A、1 4 2 Β。而在各轉軸1 3 6的一側的 軸承1 4 2 A外側延伸的一端部固定螺旋齒輪1 4 4，而 在各轉軸1 3 6的各螺旋齒輪1 4 4，從垂直方向咬合處 理線B方向延伸的旋轉驅動軸1 4 6側的螺旋齒輪1 4 8 。旋轉驅動軸1 4 6結合在電氣馬達1 5 0的轉軸。電氣 馬達1 5 0向一定方向驅動旋轉驅動軸1 4 6令其轉動時 ，其轉動驅動力便從旋轉驅動軸1 4 6側的各螺旋齒輪 1 4 8傳動至轉軸1 3 6側的螺旋齒輪1 4 4，各轉軸 1 3 6的運送$昆1 3 8A、1 3 8B向一定方向（將基板 G運送至運送路1 〇 8前方的方向）轉動。 在基板運入部1 1 0，基板移交用的上昇梢1 2 0是 本紙張尺度適用中國國家標準（CNS ) A4規格（210'〆297公釐） -94- 569288 A 7 B7 五、發明説明（年 (請先閲讀背面之注意事項再填寫本頁) 以一定間隔分散豎設或植設在水平狀配置於運送路1 0 8 下的昇降板1 5 2。在昇降板1 5 2下配置有例如含有氣 缸（未圖示）的昇降驅動部1 5 4。 如第7圖所示，當昇降驅動部1 5 4將昇降板1 5 2 昇高至一定的高度時，上昇梢1 2 0通過轉軸1 3 6間的 空隙突出到運送路1 〇 8上，可以在其高度位置從旁邊的 基板運送機構（未圖示）以水平姿勢接受基板G ° 上昇梢1 2 0上的基板G移交後，則如第8圖所示’ 昇降驅動部1 5 4將昇降板1 5 2降低到原位置’而在其 下降途中，基板G的兩端部（運送路1 0 8的寬度方向兩 端部）載置於運送輥1 3 8 A、1 3 8 B，如此將基板G 水平姿勢移載於運送路1 0 8上。再者，各運送輥 1 3 8 A、1 3 8 B的外徑在內側（軸中心側）變細’基 板G的一端部則載置於此細徑部1 3 9。 經濟部智慧財產局員工消費合作社印製 在第4圖，預濕潤液供應用噴嘴P N、顯像液供應用 噴嘴D N a、D N b及洗淨液供應用噴嘴R N，是分別藉 由噴嘴掃描機構SCp、SCD及SCR在運送路108 上方與運送路108平行移動。 第9圖及第10圖表示一實施例的噴嘴掃描機構SC (C C p、S C D、S C R )的架構。此噴嘴掃描機構 SC備有，甩以支持可動噴嘴N (PN、DNa、 D N b、R N )的截面呈倒立 字狀的噴嘴支持體1 5 6 ;在運送路1 0 8上方與運送路1 0 8平行引導噴嘴支持 體156的導軌158 (第9圖）；驅動噴嘴支持體 -----25-- 本紙張尺度適用中國國家標準（CNS ) Μ規格（2丨〇X297公釐） 569288 A7 B7 ___ 五、發明説明（孕 1 5 6使其沿著導軌1 5 8移動的掃描驅動部1 6 0。 (請先閱讀背面之注意事項再填寫本頁) 如第1 0圖所示，掃描驅動部1 6 0是例如介由1條 或多條垂直支持構件1 6 1結合在噴嘴支持體1 5 6的1 條或多條的無端帶1 6 2，將其與導軌1 5 8 (第9圖） 平行（亦即，與運送路1 0 8平形）架設在驅動帶輪 1 6 4與游動帶輪1 6 6間，而將驅動帶輪1 6 4結合在 電氣馬達1 6 8的轉軸而成。電氣馬達1 6 8的轉動驅動 力經由驅動帶輪1 6 4、1 6 6及皮帶1 6 2變換成皮帶 長度方向（X方向）的噴嘴支持體1 5 6的直進運動。藉 由控制電氣馬達1 6 8的轉速，可將噴嘴支持體1 5 6的 直進移動速度調節成所希望的値，藉由切換電氣馬達 1 6 8的轉動方向，可切換噴嘴支持體1 5 6的直進移動 方向。再者，第1 〇圖是爲了簡化，導軌1 5 8並未圖示 〇 在噴嘴支持體1 5 6，左右兩側面的內壁分別安裝有 例如由氣缸等引動器構成 經濟部智慧財產局員工消費合作社印製 的昇降驅動部1 7 0，在該等左右一對昇降驅動部 1 7 0間架設有由例如空心管構成的水平支持桿1 7 2。 而，從此水平支持桿1 7 2的中心部延伸向垂直下方的例 如由空心管構成的垂直支持桿1 7 4的下端部，水平狀安 裝有吐出口 η朝下的筒狀可動噴嘴N。噴嘴N的吐出口 η 在噴嘴長度方向以一定間隔形成有多數，可以在運送路 1 0 8的寬度方向從基板G的一端至另一端大致上均一供 應處理液體。 ——______ 26 - 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） 569288 A7 B7 五、發明説明（印 (請先閱讀背面之注意事項再填寫本頁) 在噴嘴支持體1 5 6內，可動噴嘴N可以藉由昇降驅 動部1 7 0的昇降驅動，介由水平支持桿1 7 2及垂直支 持桿1 7 4昇降，通常是在，向運送路1 〇 8上的基板G 吐出處理液體的高度H a，與在不吐出處理液體期間從運 送路1 0 8退出的高度H b的間上下。在水平支持桿 1 7 2的一端部，從運送路1 〇 8外設置的處理液體供應 源（未圖示）引進可撓性的處理液供應管1 7 6。此處理 液供應管1 7 6是通過水平支持桿1 7 2及垂直支持桿 1 7 4內連接在噴嘴N的處理液體導入口。 經濟部智慧財產局員工消費合作社印製 如第9圖所示，最好是，沿著運送路1 0 8配設可以 從外部遮蔽運送路1 0 8上的可動噴嘴N的可動區（X方 向及Z方向）的截面倒立 字狀的蓋體178。圖示的架 構例子是令蓋體1 7 8的左右兩側面垂下到該模組Μ的左 右兩側壁的上端部或軸腳構件1 4 0，儘量縮小空隙。蓋 體1 7 8的上面或天板可以形成通過水平支持桿1 7 2的 開縫（開口）1 7 8 a。如此以蓋體1 7 8將噴嘴Ν從掃 描驅動系隔離或遮蔽，便能夠在蓋體1 7 8內側的很少有 異物的處理空間P S，由噴嘴N向運送路1 0 8上的基板 G供應處理液體。 在第5圖及第6圖，預濕潤部1 2 4設有一實施例的 基板傾斜機構1 8 0。此基板傾斜機構1 8 0具有：配置 在運送路1 0 8下的可昇降且可向前後方向傾斜的基座板 1 8 2 ;分開一定間隔分散豎設或植設在此基座板1 8 2 上的多根昇降梢1 8 4 ;及介由昇降軸1 8 6從下方支撐 ____^22-=. 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） 569288 A7 _____ B7 五、發明説明（年 (請先閲讀背面之注意事項再填寫本頁) 基座板1 8 2進行昇降驅動及傾斜驅動的驅動部1 8 8。 昇降軸1 8 6貫穿該模組Μ 2及顯像液盤子1 3 0底部形 成的開□ 1 9 0。顯像液盤子1 3 0的內底在開口 1 9 0 周圍形成有防止漏液的筒狀的壁部1 3 0 a。 在最末尾列的昇降梢1 8 4後方，在從昇降梢1 8 4 向後分支直立之分支梢1 9 2，成可轉動狀安裝有橡膠製 的筒狀停止構件1 9 4。 在此’參照第1 1圖及第1 2圖說明基板傾斜機構 1 8 0的作用。當在運送路1 〇 8，基板G來到基板傾斜 機構1 8 0上時，一定的位置感測器（未圖示）檢出基板 G ’運送驅動系的控制部則回應從該感測器輸出的信號， 至少使該模組內的所有運送輥1 3 8 A、1 3 8 B停止運 轉，使基板靜止下來。 經濟部智慧財產局員工消費合作社印製 之後’基板傾斜機構1 8 0的控制器（未圖示）動作 ，使驅動部1 8 8動作，令昇降軸1 8 6上昇。於是，如 第1 1圖所示，基座板1 8 2與昇降梢1 8 4也上昇，由 昇降梢1 8 4從下向上頂，將基板G頂向運送路1 〇 8的 上方。 接著，由該控制器控制驅動部1 8 8，使基座板 1 8 2以延伸於運送路1 〇 8寬度方向的軸1 9 6爲中心 前後方向，最好是如圖示向後轉動一定的角度（例如1 〇。 〜2 0 ° )。如此，便如第1 2圖所示，較基座板1 8 2爲 上方的部分，亦即，昇降梢1 9 2、停止構件1 9 4、基 板G也在運送路1 〇 8上向後傾斜相同角度。這時，基板 ____-7R-____ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） " 一 569288 A 7 B7 五、發明説明（竽 (請先閲讀背面之注意事項再填寫本頁) G只是在昇降梢1 8 4向向後方稍爲滑落便被停止構件 1 9 4阻擋。但堆在基板G上或附著其上的液體Q便因重 力而在基板傾斜面向後方滑落，掉落基板G外。從基板G 掉落的液體Q便由設置在該模組的盤子（預濕潤部1 2 4 是預濕潤液盤1 3 0 )承接集中。 維持上述傾斜姿勢一定時間後，在該控制器的控制下 ，驅動部1 8 8使基座板1 8 2向上述的反方向轉動與上 述相同角度，回到水平姿勢（第1 1圖的狀態），接著， 將昇降軸1 8 6降到原位置（第6圖的位置）。 再者，在預濕潤部1 2 4是將基板G傾斜向運送方向 ，而且使進行下一製程的顯像液供應部1 2 6側在上方， 因此在預濕潤部1 2 4傾斜基板G澄乾液體時，可以減少 掉落預濕潤液盤1 3 0而反跳的液體附著在進行下一製程 的顯像液供應部1 2 6側的基板G的可能性。 經濟部智慧財產局員工消費合作社印製 如上述，在基板傾斜機構1 8 0，由於在運送路 1 0 8上使基板G傾斜，利用重力使液體從基板上掉落， 可以在短時間澄乾液體。而且，不必特別利用外力，使基 板G受到傷害的可能性很低。 其次說明此顯像單元（D E V ) 9 4的作用。基板運 入部1 1 0是如第7圖及第8圖所示，從鄰近的基板運送 機構（未圖示）一次接受一片基板G而移載至運送路 1 0 8。構成運送路1 〇 8的運送用轉軸1 3 6的運送輥 1 3 8 A、1 3 8 B是如上述經由旋轉驅動軸1 4 6、螺 旋齒輪1 4 8、1 4 4等的傳動機構以電氣馬達1 5 0的 _____- 9Q - 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X297公釐） 569288 A7 _ B7 五、發明説明（习 轉動驅動力轉動，因此，載置在運送路1 〇 8之L CD基 板G將立即向旁邊之顯像部1 1 2運送。 (請先閲讀背面之注意事項再填寫本頁) 在顯像部1 1 2，基板G先被運入預濕潤部1 2 4， 在滾筒運送中，從預濕潤液供應用噴嘴P N噴灑例如純水 或低濃度的顯像液的預濕潤液體。本實施形態是如在第9 圖及第1 0圖所說明的噴嘴掃描機構S C P的掃描驅動 使噴嘴P N沿運送路1 〇 8水平移動，向運送中的基板G 上面（被處理面）噴灑預濕潤液體。碰到基板G而飛散到 基板外的預濕潤液或未碰到基板G的預濕潤液，是由設置 在運送路1 0 8下的預濕潤液用盤1 3 0承接集中。 如第1 3 A圖所示，如果將在運送路1 〇 8上向基板 G噴灑預濕潤液體同時使噴嘴P N掃描的方向設定成與基 板運送方向相反時，噴嘴N ( P N )則以噴嘴掃描速度 VN與基板運送速度VG相加的相對速度（VN+VG) 從基板G的前端掃描到後端，縱使基板G的尺寸很大，仍 能以短時間內用預濕潤液體使基板G的被處理面（抗鈾劑 表面）濕潤。 經濟部智慧財產局員工消費合作社印製 在預濕潤部1 2 4內，當基板G到達下游側的一定位 置時，如在第1 1圖及第1 2圖上述，基板傾斜機構 1 8 0會動作，從運送路1 〇 8上將基板G抬高，令其向 後傾斜。因爲此基板G的傾斜姿勢，殘留或附著在基板G 上的預濕潤液的大部分會流到基板後方，而由預濕潤液回 收盤子1 3 0回收。 在預濕潤部1 2 4接受上述預濕潤處理的基板G則乘 ____- - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 _ 五、發明説明（竽 (請先閲讀背面之注意事項再填寫本頁) 載於運送路1 0 8而運進顯像液供應部1 2 6。在顯像液 供應部1 2 6，最初的模組Μ 3通過期間從顯像液供應噴 嘴D N a噴灑顯像液，下一個模組μ 4通過期間由顯像液 供應噴嘴D N b噴灑顯像液。各顯像液供應噴嘴D N a、 DNb是由在第9圖及第10圖所說明的噴嘴掃描機構 S CD的掃描驅動，在運送路1 〇 8的上方沿著運送路 1 0 8水平移動，而朝滾筒運送中的基板G的被處理面噴 灑顯像液。因噴灑顯像液而掉落基板G外的液體則由設置 在運送路1 0 8下的顯像液回收盤子1 3 2承接集中。 如上述，在預濕潤部1 2 4使用的預濕潤液（純水） 中的殘留在基板G上者，其大部分由基板傾斜機構1 8 0 回收到預濕潤液回收盤子1 3 0，因此，被帶進顯像液供 應部1 2 6的比率很低，因此，混進顯像液回收盤子 1 3 2的比率也很低。 經濟部智慧財產局員工消費合作社印製 與上述的預濕潤部1 2 4同樣，在顯像液供應部 1 2 6也可以如第1 3圖所示，將在運送路1 〇 8上向基 板G噴灑預濕潤液體同時使噴嘴P N掃描的方向設定成與 基板運送方向相反時，噴嘴N ( P N )則以噴嘴掃描速度 VN與基板運送速度VG相加的相對速度（vn + VG) 從基板G的前端掃描到後端，縱使基板G的尺寸很大，仍 能以短時間內用向基板G的被處理面（抗蝕劑表面）供應 顯像液。 在本實施形態，因爲是按模組Μ 3、Μ 4配設個別的 顯像液供應噴嘴D N a、D N b及噴嘴掃描機構S c D， _______3.1 __ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（年 (請先閲讀背面之注意事項再填寫本頁) 因此，可以對運送路1 0 8上的基板G以分開時間上且空 間上的間隔，供應多次顯像液，也可以改變第1次與第2 次的顯像液的特性（濃度）。 在顯像液供應部1 2 6如上述向整個被處理面供應顯 像液的基板G則乘載於運送路1 〇 8而運進顯像液滴落部 1 2 8。而在顯像液滴落部1 2 8內到達下游側的一定位 置後，設置在此的基板傾斜機構1 8 0會動作，從運送路 1 0 8上將基板G抬筒，令基板G向運送方向，而且是向 前方，亦即進行前一製程的顯像液供應部1 2 6側成爲上 側的方向傾斜。因爲此基板G的傾斜姿勢，留在基板G上 的顯像液的大部分會流到基板前方，而由顯像液回收盤子 1 3 2回收。如此，令基板G以進行前一製程的顯像液供 應部1 2 6側成爲上側的方向傾斜，因此在顯像液滴落部 1 2 8將基板G傾斜澄乾液體時，可以降低在顯像液盤子 1 3 2跳回來的液體附著顯像液供應部1 2 6側的基板G 的可能性。 經濟部智慧財產局員工消費合作社印製 在顯像部1 1 2如上述完成顯像液的供應與回收的基 板G則乘載於運送路1 0 8運進洗淨部1 1 4。在洗淨部 1 1 4，由在第9圖及第1 0圖所說明的噴嘴掃描機構 S C D的掃描驅動，使洗淨液供應噴嘴R N沿著運送路 1 0 8水平移動，而朝運送中的基板G的上面（被處理面 )噴灑洗淨液，例如純水。掉落基板G外的洗淨液體則由 設置在運送路1 0 8下的洗淨液回收盤子1 3 4承接集中 〇 __- ^9 -_ 本紙張尺度適用中國國家標準（CNS )八4規格（210X297公釐） 569288 A7 B7 五、發明説明（芩 (請先閱讀背面之注意事項再填寫本頁) 如上述，在顯像液供應部1 2 6使用的顯像液中的殘 留在基板G上者，其大部分在顯像液滴落部1 2 8由基板 傾斜機構1 8 0回收到顯像液回收盤子1 3 2 ’因此’被 帶進洗淨部1 1 4的比率很低，因此，混進洗淨液回收盤 子1 3 4的比率也很低。 在洗淨部1 1 4也可以如第1 3 A圖所示’將在運送 路1 0 8上向基板G噴灑顯像液同時使噴嘴R N掃描的方 向設定成與基板運送方向相反。藉此，噴嘴R N則以噴嘴 掃描速度VN與基板運送速度VG相加的相對速度（VN + V G )從基板G的前端掃描到後端’縱使基板G的尺寸 很大，仍能以短時間內向基板G的整個被處理面（抗蝕劑 表面）供應洗淨液體，迅速置換成洗淨液（停止顯像）。 再者，也可以在運送路1 0 8下配設洗淨基板G的背面用 的洗淨液供應噴嘴（未圖示）。 經濟部智慧財產局員工消費合作社印製 在洗淨部1 1 4完成上述洗淨過程的基板G則乘載於 運送路1 0 8運進乾燥部1 1 6。乾燥部1 1 6是如第4 圖所示，對在運送路1 0 8上運送的基板G以設置在一定 位置的上下的空氣刀E N將刀刃狀的銳利的氣體噴吹在基 板G上面（被處理面）及背面，藉此將附著在基板G的液 體（主要是洗淨液體）吹落基板後方（澄乾液體）。 在乾燥部1 1 6澄乾液體的基板G則直接乘載於運送 路1 0 8送至基板運出部1 1 8。基板運出部1 1 8的架 構與基板運入部1 1 0相同，只是運入與運出的基板運送 方向相反，其動作與基板運入部1 1 0相同。亦即，令移 ____ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（孕 (請先閲讀背面之注意事項再填寫本頁) 交基板用的上昇梢1 2 2在較運送路1 0 8低的位置待機 ，等候基板G從上游側（乾燥部1 1 6 )移動過來，當基 板G來到上昇梢1 2 2直上的一定位置時，令上昇梢 1 2 2向上頂，將基板G以水平姿勢抬上，交給旁邊的基 板運送機構（未圖示）。 顯像單元（D E V ) 9 4是在預濕潤部1 2 4、顯像 液供應部1 2 6、洗淨部1 1 4分別配設個別的盤子 1 3 0、1 3 2、1 3 4，藉此分開回收處理液體（預濕 潤液、顯像液、洗淨液）。尤其是，在預濕潤部1 2 4與 顯像液滴落部1 2 8，藉由基板傾斜機構1 8 0在各項製 程（預濕潤製程、顯像製程）後從基板G上短時間內有效 率澄乾液體，同時，以高純度回收到各該盤子1 3 0、 1 3 2，可顯著提高分開回收率。 也可以在洗淨部1 1 4設基板傾斜機構1 8 0。這時 ，可以在洗淨過程後從基板G上在短時間有效率澄乾洗淨 液體，同時可以有效率回收到洗淨液體用盤子1 3 4，提 高洗淨液的分開回收率。 經濟部智慧財產局員工消費合作社印製 再者，在洗淨部1 1 4令基板G傾斜時，可以令基板 G向運送方向，例如使顯像部1 1 2側成爲上側狀令基板 G傾斜。因爲基板G傾斜時顯像部1 1 2成爲上側，可以 降低從洗淨液供應用噴嘴R N噴出的洗淨液在傾斜的基板 G上彈回，彈回的洗淨液附著在顯像部1 1 2側的基板G 的可能性。 同時，此顯像單元（DEV) 94是在運送路108 __________- 9.Λ ^ _ 本紙張尺度適用中國國家標準（CNS ) A4規格（210 x 297公釐） 569288 A7 B7 五、發明説明（李 (請先閱讀背面之注意事項再填寫本頁) 上分開一定間隔成一列運送多數基板G，同時由預濕潤部 1 2 4、顯像液供應部1 2 6、顯像液滴落部1 2 8、洗 淨部1 1 4及乾燥部1 1 6順序施加各項處理，可以實現 所謂管線方式的高效率或高產能的顯像處理製程。 尤其是，在預濕潤部1 2 4、顯像液供應部1 2 6及 洗淨部1 1 4，令向運送路1 0 8上的基板G供應處理液 體（預濕潤液、顯像液、洗淨液）的噴嘴P N、D N a、 DNb、RN在運送路1 0 8上方沿運送路1 0 8掃描， 因此可以在基板G的尺寸較大，運送路1 0 8的運送速度 不高時，仍可以在基板被處理面的整面短時間內迅速普遍 供應處理液體。尤其是’在顯像液供應過程，由於能夠儘 可能縮短基板G的運送方向的一端部（前端部）與另一端 部（後端部）間的處理液體的供應時間差’亦即開始顯像 的時間差，因此，可以提高基板上的顯像品質的面內均一 性。 經濟部智慧財產局員工消費合作社印製 再者，本實施形態的噴嘴掃描機構S C是令噴嘴N沿 運送路1 0 8向雙方向掃描的架構，因此也可以如第 1 3 B圖所示，令噴嘴N與基板運送方向反方向掃描而向 基板G的整個被處理面供應處理液體Q。這時，需要將噴 嘴掃描速度VN’設定成較基板運送速度VG大。 同時，本實施形態在預濕潤部1 2 4及顯像液供應部 1 2 6是進行噴霧方式的顯像。但是，要改變成閘門（ paddle )方式很簡單，只要在顯像液供應部1 2 6將顯像液 供應用噴嘴D N a、D N b從噴霧型改成塗液的吐出構造 ____-i:_ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（竽 便可以。同時，閘門方式不需要預濕潤部1 2 4。 (請先閲讀背面之注意事項再填寫本頁) 在顯像液供應部1 2 6也可以省略顯像液供應用噴嘴 DNa、DNb的一方（通常是下游側的DNb)。也可 以將運送路1 0 8上的各噴嘴N的可掃描區域設定成超過 1個模組Μ的範圍，採相鄰接的可動噴嘴可以相互跨進共 同的導軌的架構。 本實施形態是如上述，藉由配置在顯像部1 1 2下游 側的基板傾斜機構1 8 0，在運進洗淨部1 1 4前從基板 G上有效回收洗淨液體。如此，在運進洗淨部1 1 4前從 基板G上去除洗淨液體，便可以收到，在洗淨過程加速置 換成洗淨液或加速停止顯像的好處。 * 經濟部智慧財產局員工消費合作社印製 在顯像部1 1 2與洗淨部1 1 4的境界附近配設如第 1 4圖所示的空氣刀機構，與這種基板傾斜機構一倂使用 的架構也很有效。在第14圖，空氣刀FN備有在運送路 1 0 8的寬度方向從基板G的端至端延伸的無數空氣吐出 口或開縫狀的空氣吐出口，在一定位置對通過旁邊（下方 )的基板G噴射刀刃狀的銳利的氣體流（通常是空氣流或 氮氣流）。藉此，在基板G通過空氣刀刃F Ν期間，基板 上的顯像液體Q被掃到基板後端側，而被掃落基板外。 上述實施形態的基板傾斜機構1 8 0是先將基板G從 運送路1 0 8以水平姿勢抬高再令其傾斜的架構。但是， 也可以採其他方式，使用將一開始就是上端面傾斜的構件 從基板G下朝上頂的基板傾斜機構。 同時，也可以採，在一定區間使構成運送路1 0 8的 ___；____ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（妒 (請先閱讀背面之注意事項再填寫本頁) 運送輥（1 3 8 A、1 3 8 B )傾斜的方式。參照第1 5 圖〜第1 7圖表示依此運送路傾斜方式的基板傾斜機構 2 0 〇的一個構成例子。 此基板傾斜機構2 0 0採用’在運送路1 〇 8上的適 當處所，例如在設定於顯像液滴落部1 2 8的可傾斜區間 K，各運送用轉軸1 3 6被分成傳動齒輪1 4 4側的原動 軸1 3 6 a .，及運送輥（1 3 8 A、1 3 6 B )側的從動 軸136b，兩轉軸136a、136b介由離合器 2 0 2裝卸自如狀連結在一起的架構。 從動軸1 3 6 b是成可轉動狀支持在設於兩運送輥 1 3 8 A、1 3 8 B的軸方向外側的一對軸承2 0 4 A、 204B。各軸承204A、204B是介由垂直支持桿 2 0 8支持在橫設於運送路1 〇 8上方的支持板2 0 6。 詳情是，垂直支持桿2 0 8的下端部固定在各軸承 204A、204B，垂直支持桿208的上端部介由梢 2 1 〇可轉動狀軸支在支持板2 0 6的側面。 經濟部智慧財產局員工消費合作社印製 支持板2 0 6以運送方向的一端部，例如前端部（下 游側的端部），成可轉動狀軸支在樞軸2 1 2，以相反側 的端部（後端部）介由從設置在上方的線軸2 1 4垂直垂 下的繩索2 1 6結合在橫向汽缸2 1 8的活塞軸2 1 8 a 〇 在這種架構，藉由離合器驅動部（未圖示）使離合器 2 〇 2結合，連結原動軸1 3 6 a與從動軸1 3 6 b時， 電氣馬達1 5 0 (第5圖、第6圖）的轉動驅動力經由轉 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -^7 - 569288 A7 ____ B7 五、發明説明（麥 動驅動軸146、螺旋齒輪148、144、原動軸 (請先閲讀背面之注意事項再填寫本頁)1T printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 569288 A7 _____B7 V. Description of the invention (the curtain substrate G is applied on the substrate (processed surface) by the spin coating method (c T) 8 2 Anti-etching solution, followed by a reduced-pressure drying unit (VD) 8 4 in the vicinity of the downstream side, followed by a reduced-pressure drying process, and then, an edge unit (E r) 8 6 in the vicinity of the downstream side is used to remove the excess of the peripheral edge of the substrate ( (Not required) (step S 8). The substrate G subjected to the above-mentioned resist coating process is transferred from the reduced pressure drying unit (VD) 84 to the upstream multi-layer unit portion of the adjacent second heat treatment portion 30. (TB) A transfer unit (PASS) of 88. In the second heat treatment section 30, the substrate G is transferred by a transfer mechanism 90 to a certain unit. For example, the substrate G is initially transferred from the transfer unit (PAS S). ) Move to one unit of the heating unit (prebAKE), and accept baking after applying the resist solution (step S 9). Then, the substrate G is moved to one unit of the cooling unit (COL). Where it is cooled to a certain substrate temperature Step S 1 〇). Then, the substrate G is delivered to the expanded cooling on the interface station (I / F) 18 side via the downstream multi-layer unit (TB) 9 2 side transfer unit (PASS) or without passing through. Stage (EXT, COL) 1 08. At the interface station (I / F) 18, the substrate G is transported from the expansion cooling stage (EXT, COL) 1 08 to the peripheral exposure device 1EE of the peripheral device 1EE. ), After receiving exposure in order to remove the resist adhered to the peripheral portion of the substrate G during development, it is sent to the adjacent exposure device 1 2 (step S 1 1). A certain circuit pattern is exposed by the etchant, and the substrate G after the pattern exposure is sent back from the exposure device 12 to _____- 9Π, this paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read first Note on the back, please fill in this page again.) Binding and printing printed by the Intellectual Property Bureau Employee Consumer Cooperatives of the Ministry of Economic Affairs printed 569288 A7 B7 V. Description of the invention (noodle station (I / F) 18 (step S11) Please read the notes on the back before filling out this page) 1 1 0 subtitle camera (TITLER), Therefore, certain information is recorded at a certain position on the substrate (step S 1 2). Then the 'substrate G is returned to the expansion cooling stage (EXT, COL) 108. At the interface station (I / F) 1 8 substrate The transport of G and the transfer of the substrate G to and from the exposure device 12 are performed by the transport device 104. The processing station (P / S) 16 is in the second heat treatment section 30, and the transport mechanism 90 is cooled from the expansion. The stage (EX τ, coL) 1 08 receives the exposed substrate G and sends it to the imaging processing unit 32 via the transfer unit (PASS) in the multilayer unit unit (TB) 9 2 of the processing line B. In the development processing unit 32, the substrate G received from the transfer unit (P A S S) in the multilayer unit unit (T B) 9 2 is carried into the development unit (DE V) 9 4. In the development unit (DEV) 94, the substrate G is conveyed in a horizontal posture downstream of the processing line B in a horizontal flow manner, and a series of development processing processes of development, cleaning, and drying are carried out during the transportation (step S 1 3) . The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is printed in the development processing section 32, and the substrate G that has undergone the development processing is transported to the decolorization processing section 3 4 adjacent to the downstream side, where it is subjected to the decolorization processing by irradiation of the i-ray. (Step S14). The substrate G having undergone the decoloring process is delivered to the transfer unit (P A S S) in the upstream multi-layer unit section (T B) 98 of the third heat treatment section 36. In the multilayer unit section (TB) 98, the substrate G is initially moved from the transfer unit (PASS) to one unit of the heating unit (POBAKE), and is then baked after acceptance (step S 1 5). Then, the substrate G is transferred to the paper size applicable to Chinese National Standards (CNs) A4 specifications (210X297 mm) -91-569288 Α7 Β7 V. Description of the invention (1) 9 Multilayer unit section (τ B) on the downstream side 1 〇 Pass the cooling unit in 2 ((Please read the precautions on the back before filling in this page) PASSDCOL), and then it is cooled to a certain substrate temperature (step S 1 6). The transfer of the substrate G in the third heat treatment section 36 is performed by the transfer mechanism 100. At the cassette station (C / S) 14 side, the transport mechanism 22 receives the substrate G that has undergone the entire coating process from the transfer cooling unit (PASSDCOL) of the third heat treatment section 36, and stores the received substrate G in any one of them. Cassette C (step S 1). The development processing system 100 is applied here, and the present invention can be applied to, for example, a development unit (D E V) 9 4 of the development processing unit 32. Hereinafter, an embodiment in which the present invention is applied to a developing unit (D E V) 94 will be described with reference to FIGS. 4 to 18. Fig. 4 schematically shows the overall structure of a developing unit (DEV) 94 in an embodiment of the present invention. This developing unit (DEV) 94 is formed by a plurality of continuous transport paths 108 extending along the horizontal direction (X direction) of the processing line B. For example, eight modules M1 to M8 are continuously arranged in a row. Make up. Among the modules M 1 to M 8 printed by the employee's consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, the module M 1 located at the uppermost end constitutes the substrate carrying-in unit 1 1 10, so that the following four modules M 2 , M 3, M 4, and M 5 constitute the developing section 1 12; the succeeding module M 6 constitutes the washing section 1 1 4; the next module M 7 constitutes the drying section 1 1 6; The module M 8 constitutes the substrate carrying-out section 1 1 8. The substrate carrying-in section 1 10 is provided with a substrate G that can be transferred from the next-side substrate conveying mechanism (not shown) in a horizontal posture and transferred to the conveyance ____- 99-This paper standard applies Chinese National Standard (CNS) Α4 Specifications (210 × 297 mm) 569288 A7 _ _ B7__ 5. Description of the invention (year (please read the precautions on the back before filling in this page) Most lifting pins 1 2 0 on the road 1 0 8 1 1 8 is also provided with a plurality of lifting pins 1 2 2 that can raise and lower the substrate G and transfer it to a substrate conveyance mechanism (not shown) in the wall in a horizontal posture. Further, the display unit 1 1 2 is in the mold. The group M 2 is provided with a pre-wetting section 1 2 4; the module M 3 and M 4 are provided with a developing liquid supply section 1 2 6; the module M 5 is provided with a developing liquid dripping section 1 2 8. The pre-wetting The part 1 2 4 is provided with one or a plurality of nozzles, and the nozzle opening is directed toward the conveying path 108, and can be moved in both directions along the conveying path 108. The pre-humidifying liquid supply nozzle for supplying a pre-humidifying liquid such as pure water to the substrate ΡΝ. The developer supply unit 1 2 6 is provided with one or a plurality of nozzles. The developing liquid supply nozzle D N, which is moved in both directions to supply the developing liquid to the substrate, is provided in the structure example according to the modules M 3 and M 4 and the developing liquid supply nozzles DN a, which can be moved independently. DN b. The developing liquid dripping portion 1 2 8 and the pre-wetting portion 1 2 4 are provided with a substrate tilting mechanism 1 8 0 (see FIG. 11 and FIG. 12) to tilt the substrate G described later. Wisdom of the Ministry of Economic Affairs Printed by the Consumer Cooperative of the Property Bureau. One or more of them are installed in the cleaning department 1 4. The nozzle port is directed toward the conveying path 108 and can be moved in both directions along the conveying path 108 to supply cleaning to the substrate. A cleaning liquid supply nozzle RN, such as pure water, is provided in the drying section 1 16 with one or more pairs sandwiching the transport path 108 to dry the liquid attached to the substrate G along the transport path 108. Mainly the cleaning liquid) of the air blade EN. The imaging unit 1 12 and the cleaning unit 1 1 4 are respectively provided with a plate 1 30, 1 3 2, 1 34 for receiving liquids under the transport path 108. . In the development section 1 12, the details are in the pre-wet section 1 2 4 and the development solution ___________ 23_- This paper size applies the Chinese National Standard (CNS) A4 specification (210X29 7 mm) 569288 A7 B7 V. Description of the invention (Deal supply unit 1 2 6 and developing liquid drop unit 1 2 8 are equipped with special plates 130, 132 respectively. The bottom of each plate 130, 132, 134 (please first Read the notes on the back and fill in this page again.} There are drain ports in the section, and drain pipes connected to different drain systems. 1 3 1, 1, 3, 1 3 5 ° Figures 5 to 8 show the board carrying section 1 10 and the structure around the transport path 10 of the pre-wet section 1 2 4. The conveying path 108 is a roller conveying type conveying path formed by horizontally laying a predetermined interval along the processing line B and fixing a pair of conveying rollers 1 3 8 A and 1 3 8 B to a rotatable rotating shaft 1 3 6. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs in further detail. At the upper part of the left and right side walls of each module M or the foot member 1 40, bearings 142A, 142B are installed at a certain interval along the direction of the processing line B, so that the transportation The rollers 138A and 138B are located on the inner sides of the left and right side walls, and the rotating shafts 1 3 6 are rotatably mounted on each of the pair of bearings 1 2 2 A and 1 4 2 B. The helical gear 1 4 4 is fixed to one end of the bearing 1 4 2 A on one side of each of the rotating shafts 1 3 6, and each of the helical gears 1 4 4 of each of the rotating shafts 1 3 6 engages the processing line B from the vertical direction. The helical gear 1 4 8 on the side of the rotary drive shaft 1 4 6 extends in the direction. The rotary drive shaft 1 4 6 is coupled to the rotary shaft of the electric motor 150. The electric motor 1 50 drives the rotary drive shaft 1 4 6 in a certain direction, and when it rotates, its rotational driving force is transmitted from each helical gear 1 4 8 on the rotary drive shaft 1 4 6 side to the helical gear on the rotary shaft 1 3 6 side. 1 4 4. The conveyance of each of the rotating shafts 1 3 6 $ 1 3 8A, 1 3 8B rotates in a certain direction (the direction in which the substrate G is conveyed to the front of the conveying path 108). In the board carrying section 1 10, the rising tip 1 2 0 for the board transfer is the paper size applicable to the Chinese National Standard (CNS) A4 specification (210'〆297 mm) -94- 569288 A 7 B7 V. Description of the invention ( Years (please read the precautions on the back before filling this page). The lifting plates 1 5 2 arranged vertically or under the conveying path 1 5 2 are scattered at regular intervals. For example, a lifting drive unit 1 5 4 including a cylinder (not shown). As shown in FIG. 7, when the lifting drive unit 1 5 4 raises the lifting plate 1 5 2 to a certain height, the rising tip 1 2 0 passes The gap between the rotating shafts 1 3 and 6 protrudes onto the conveying path 108, and it can receive the substrate G from the substrate conveyance mechanism (not shown) in the horizontal position at a high position after the substrate G is transferred on the rising edge 1 2 0. Then, as shown in FIG. 8, 'the lifting driving unit 1 5 4 lowers the lifting plate 1 5 2 to the original position', and during the lowering process, both ends of the substrate G (the width direction both ends of the conveying path 108) ) Placed on the transport rollers 1 3 A, 1 3 8 B, so that the substrate G is horizontally transferred on the transport path 108. Further The outer diameter of each of the transport rollers 1 3 8 A and 1 3 8 B is tapered on the inner side (axis center side). One end of the substrate G is placed in this narrow diameter portion 1 3 9. Consumer Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs Printed in Figure 4. The nozzles PN for the pre-humidifying solution supply, the nozzles DN a and DN b for the supply of the developing solution, and the nozzle RN for the supply of the cleaning solution are provided on the transport path by the nozzle scanning mechanisms SCp, SCD, and SCR, respectively. The upper part 108 moves parallel to the conveying path 108. Figs. 9 and 10 show the structure of a nozzle scanning mechanism SC (CC p, SCD, SCR) according to an embodiment. This nozzle scanning mechanism SC is provided to support the movable nozzle N (PN, DNa, DN b, RN) The nozzle support body 156 having an inverted cross section; the guide rail 158 of the nozzle support body 156 is guided parallel to the conveyance path 108 above the conveyance path 108 (FIG. 9) ）; Driving nozzle support body ----- 25-- This paper size is applicable to Chinese National Standard (CNS) M specification (2 丨 〇297mm) 569288 A7 B7 ___ V. Description of invention (pregnant 1 5 6 Scanning drive unit 1 60 that moves along the guide rail 1 5 8. (Please read the precautions on the back before filling this page) As shown in FIG. 10, the scanning driving unit 160 is, for example, one or more endless belts 1 6 2 bonded to the nozzle support 1 5 6 through one or more vertical support members 1 6 1, and the Parallel to the guide rail 1 5 8 (Fig. 9) (that is, flat with the transport path 108), it is set up between the driving pulley 16 and the swimming pulley 16 and the driving pulley 1 6 4 is combined It is made on the electric motor's rotating shaft. The rotational driving force of the electric motor 1 6 8 is converted into a linear movement of the nozzle support body 1 6 in the belt length direction (X direction) via the driving pulleys 1 4 4, 1 6 6 and the belt 1 6 2. By controlling the rotation speed of the electric motor 1 6 8, the linear movement speed of the nozzle support 1 5 6 can be adjusted to a desired value. By switching the rotation direction of the electric motor 1 6 8, the nozzle support 1 5 6 can be switched. Direction of straight movement. In addition, Figure 10 is for simplification, and the guide rails 158 are not shown. On the nozzle support 156, the inner walls of the left and right sides are respectively equipped with actuators such as cylinders to constitute employees of the Intellectual Property Bureau of the Ministry of Economic Affairs. The lifting drive unit 170 printed by the consumer cooperative is provided with a horizontal support rod 1 72 made of, for example, a hollow tube between the left and right pair of lifting drive units 170. In addition, a cylindrical movable nozzle N having a discharge port η facing downward is mounted horizontally from the lower end of the vertical support rod 174 made of a hollow tube, for example, extending downward from the center portion of the horizontal support rod 172 vertically. A plurality of discharge ports η of the nozzle N are formed at a certain interval in the nozzle length direction, and the processing liquid can be supplied substantially uniformly from one end to the other end of the substrate G in the width direction of the transport path 108. ——______ 26-This paper size applies Chinese National Standard (CNS) A4 specification (210 × 297 mm) 569288 A7 B7 V. Description of invention (printed (please read the precautions on the back before filling this page) On the nozzle support 1 5 Within 6, the movable nozzle N can be driven by the lifting drive of the lifting driving unit 170, and can be moved up and down through the horizontal support rod 17 2 and the vertical support rod 1 74, usually on the substrate G on the transport path 108. The height H a at which the processing liquid is discharged is up and down from the height H b when the processing liquid is discharged from the transportation path 108. One end of the horizontal support rod 1 72 is provided outside the transportation path 108. The processing liquid supply source (not shown) introduces a flexible processing liquid supply pipe 1 7 6. This processing liquid supply pipe 1 7 6 is connected to the nozzle N through a horizontal support rod 1 7 2 and a vertical support rod 1 7 4 The processing liquid inlet is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. As shown in Figure 9, it is best to arrange a movable nozzle N along the transport path 108 to cover the transport path 108 from the outside. Cross section of the movable area (X direction and Z direction) Cover 178. The example of the architecture shown in the figure is to make the left and right sides of the cover 1 78 hang down to the upper ends of the left and right side walls of the module M or the foot members 1 40 to minimize the gap. The cover 1 7 The top or roof of 8 can form a slit (opening) 1 7 a through the horizontal support rod 1 7 2. In this way, the nozzle N can be isolated or shielded from the scanning drive system with the cover 1 7 8 and the cover 1 can be installed in the cover 1 The processing space PS with few foreign objects inside the 7 8 is supplied with the processing liquid from the nozzle N to the substrate G on the transport path 108. In FIGS. 5 and 6, the pre-wetting section 1 2 4 is provided with an embodiment The substrate tilting mechanism 180. The substrate tilting mechanism 180 has: a base plate 1 8 2 which can be raised and lowered and can be tilted forward and backward arranged under the conveying path 108; and can be erected or planted at intervals. A plurality of lifting pins 1 8 4 on this base plate 1 8 2; and support from below via the lifting shaft 1 8 6 ____ ^ 22- =. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 569288 A7 _____ B7 V. Description of the invention (year (please read the precautions on the back before filling this page) The base plate 1 8 2 for lifting The driving part of the driving and tilting driving 1 8 8. The lifting shaft 1 8 6 penetrates the opening of the module M 2 and the bottom of the developing liquid plate 130. The inner bottom of the developing liquid plate 1 30 is Around the opening 1 9 0 is formed a cylindrical wall portion 1 3 0 a for preventing liquid leakage. Behind the lifting pins 1 8 4 in the last row, the branch tips 1 9 2 which branch straight up from the lifting pins 1 8 4 backward, A rubber-like cylindrical stop member 194 is rotatably mounted. Here, the function of the substrate tilting mechanism 180 will be described with reference to FIGS. 11 and 12. When the conveyance path 108 is used, the substrate G When it comes to the substrate tilting mechanism 180, a certain position sensor (not shown) detects the control unit of the substrate G 'transport drive system and responds to the signal output from the sensor, so that at least the inside of the module All of the conveyor rollers 1 3 8 A and 1 3 8 B stopped running, and the substrate was brought to a standstill. After printing by the cooperative, the controller (not shown) of the substrate tilt mechanism 180 operates, causing the driving unit 18 to operate, and the lifting shaft 18 to rise. Therefore, as shown in FIG. 11, the base plate 1 8 2 and the lifting pin 1 8 4 also rise, and the lifting pin 1 8 4 lifts from the bottom to the top, and the substrate G is pushed upward to the conveying path 108. Then, the controller controls the driving unit 1 8 to make The base plate 1 8 2 is centered on the axis 196 extending in the width direction of the conveying path 108, and it is preferably rotated rearward by a certain angle (e.g., 10 ° to 20 °) as shown in the figure. As shown in FIG. 12, the upper part is higher than the base plate 1 8 2, that is, the lifting pin 1 9 2, the stop member 1 9 4, and the substrate G are also inclined backward at the same angle on the transport path 108. .At this time, the substrate ____- 7R -____ This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) " a 569288 A 7 B7 V. Description of the invention (竽 (Please read the precautions on the back before filling in (This page) G is only stopped by the stopping member 1 9 4 when the lifting tip 1 8 4 slides backwards slightly. However, it is stacked on the substrate G or The liquid Q attached to it slides downward due to gravity on the substrate inclined surface, and falls out of the substrate G. The liquid Q dropped from the substrate G is pre-wetted by the plate set on the module (pre-wet section 1 2 4 The liquid pan 1 3 0) receives the concentration. After maintaining the above-mentioned inclined posture for a certain period of time, under the control of the controller, the driving unit 1 8 rotates the base plate 1 8 2 in the opposite direction to the same angle as above and returns The horizontal posture (the state in FIG. 11), and then the lift shaft 1 8 6 is lowered to the original position (the position in FIG. 6). Furthermore, in the pre-wetting section 1 2 4, the substrate G is tilted in the conveying direction, and the developing solution supply section 1 2 6 side for the next process is upward, so the substrate G is tilted in the pre-wetting section 1 2 4. When the liquid is dried, the possibility of dropping the pre-humidifying liquid tray 130 and bounced liquid to the substrate G on the developing liquid supply part 1 2 6 side of the next process can be reduced. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs as described above. Since the substrate G is tilted on the conveying path 108 on the substrate tilting mechanism 180, the liquid can be dropped from the substrate by gravity, which can be dried in a short time. liquid. In addition, it is not necessary to use an external force in particular, and the possibility of causing damage to the substrate G is low. Next, the function of this imaging unit (D E V) 9 4 will be explained. As shown in FIG. 7 and FIG. 8, the substrate carrying-in section 1 10 receives one substrate G at a time from an adjacent substrate carrying mechanism (not shown) and transfers it to the carrying path 108. The conveying rollers 1 3 8 A, 1 3 8 B, which constitute the conveying shaft 1 36 of the conveying path 108, are driven by the transmission mechanisms such as the rotary drive shaft 1 4 6 and the helical gears 1 4 8 and 1 4 4 as described above. Electric motor 1 5 0 _____- 9Q-This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X297 mm) 569288 A7 _ B7 V. Description of the invention (Learn to rotate with driving force, so it is placed in the transport The CD substrate G of L 1 08 will be immediately delivered to the development section 1 1 2 next to it. (Please read the precautions on the back before filling out this page.) In the development section 1 1 2, the substrate G is first transported into the The wetting section 1 2 4 sprays a pre-wetting liquid such as pure water or a low-concentration developing solution from the pre-wetting liquid supply nozzle PN during the roller conveyance. This embodiment is as shown in FIGS. 9 and 10. The scanning drive of the illustrated nozzle scanning mechanism SCP causes the nozzle PN to move horizontally along the conveying path 108, and sprays a pre-wetting liquid on the substrate G (to-be-processed surface) being transported. The pre-humidity that is scattered outside the substrate when it hits the substrate G The pre-wetting liquid or the pre-wetting liquid that does not touch the substrate G is a pre-wetting liquid set under the transport path 108. The moisturizing plate 130 receives the concentration. As shown in FIG. 13A, if the pre-wetting liquid is sprayed onto the substrate G on the conveying path 108 and the nozzle PN scanning direction is set to be opposite to the substrate conveying direction The nozzle N (PN) is scanned from the front end to the rear end of the substrate G at the relative speed (VN + VG) of the nozzle scanning speed VN and the substrate conveying speed VG. Even if the size of the substrate G is large, it can be performed in a short time. An internal pre-wetting liquid is used to wet the treated surface (surface of the uranium-resistant agent) of the substrate G. The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is printed in the pre-wetting section 1 2 4 when the substrate G reaches a certain position on the downstream side. As described in FIG. 11 and FIG. 12, the substrate tilting mechanism 180 operates and raises the substrate G from the transport path 108 to tilt it backward. Because of the tilted posture of the substrate G, Most of the pre-humidifying liquid attached to the substrate G flows to the rear of the substrate, and is recovered by the pre-humidifying liquid recovery tray 130. The substrate G that has been subjected to the pre-wetting treatment in the pre-humidifying section 1 2 4 is multiplied by ____- -This paper size applies Chinese National Standard (CNS) A4 (210X297mm) 569288 A7 B7 _ V. Description of the invention (竽 (please read the precautions on the back before filling this page) is transported on the transport path 1 0 8 and transported to the developer supply unit 1 2 6. In the image liquid supply section 1 2, the first module M 3 sprays the developing liquid from the developing liquid supply nozzle DN a during the passage, and the next module μ 4 sprays the developing liquid from the developing liquid supply nozzle DN b during the passing of the next module μ 4. Each of the developing liquid supply nozzles DN a and DNb is driven by the scanning of the nozzle scanning mechanism S CD described in FIGS. 9 and 10, and moves horizontally along the transport path 108 along the transport path 108. On the other hand, the developing solution is sprayed onto the processing surface of the substrate G being transported by the drum. The liquid falling out of the substrate G by spraying the developing liquid is collected by the developing liquid recovery tray 1 3 2 provided under the transport path 108. As described above, most of the pre-wetting solution (pure water) used in the pre-wetting section 1 2 4 remains on the substrate G, and most of it is recovered by the substrate tilting mechanism 1 8 0 to the pre-wetting solution recovery plate 1 3 0. The ratio of being brought into the developer supply unit 1 2 6 is very low, so the ratio of being mixed into the developer recovery plate 1 2 2 is also very low. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs The same as the pre-humidification unit 1 2 4 described above, the developer supply unit 1 2 6 can also be placed on the substrate on the transport path 108 as shown in Figure 13 When spraying the pre-wetting liquid and setting the nozzle PN scanning direction to be opposite to the substrate conveying direction, the nozzle N (PN) is driven from the substrate G at a relative speed (vn + VG) where the nozzle scanning speed VN and the substrate conveying speed VG are added. The front end is scanned to the rear end, and even if the size of the substrate G is large, the developing solution can be supplied to the processed surface (resist surface) of the substrate G in a short time. In this embodiment, because the individual developing liquid supply nozzles D N a, D N b and the nozzle scanning mechanism S c D are arranged according to the modules M 3 and M 4, _______ 3. 1 __ This paper size is in accordance with Chinese National Standard (CNS) A4 (210X297 mm) 569288 A7 B7 V. Description of the invention (year (please read the precautions on the back before filling this page) Therefore, you can adjust the delivery route 1 0 8 The substrate G on the upper surface is divided into a plurality of developing liquids at different time and space intervals, and the characteristics (concentration) of the first and second developing liquids can be changed. In the developing liquid supply section 1 2 6 As described above, the substrate G that supplies the developing solution to the entire processing surface is carried on the transport path 108 and transported to the developing droplet dropping portion 1 2 8. The developer G reaches the downstream within the developing droplet dropping portion 1 2 8 After a certain position on the side, the substrate tilting mechanism 180 disposed there will act, and lift the substrate G from the conveying path 108, so that the substrate G is in the conveying direction and forward, that is, the previous process is performed. The side of the developer supply unit 1 2 6 becomes inclined in the upper direction. Because of the tilt posture of the substrate G, most of the developer remaining on the substrate G flows to the front of the substrate, and the developer recovery tray 1 is recovered by the developer. 3 2 recovery. In this way, the substrate G is subjected to the developing solution supply unit of the previous process 1 2 6 The side becomes inclined in the upper direction. Therefore, when the developing liquid dropping portion 1 2 8 tilts the substrate G to dry the liquid, the liquid adhering to the developing liquid supply portion 1 2 2 jumping back from the developing liquid plate 1 2 6 can be reduced. The substrate G on the side is printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The substrate G is printed in the imaging department 1 2 as described above. Cleaning section 1 1 4. The cleaning section 1 1 4 is driven by the scanning of the nozzle scanning mechanism SCD described in FIG. 9 and FIG. 10 to make the cleaning liquid supply nozzle RN level along the conveying path 108. Move and spray cleaning liquid, such as pure water, on the upper surface (processed surface) of the substrate G that is being transported. The cleaning liquid outside the falling substrate G is collected by the cleaning liquid set under the transport path 108 1 3 4 Undertaking concentration 0 __- ^ 9 -_ This paper size is applicable to China National Standard (CNS) 8 4 specifications (210X297 mm) 569288 A7 B7 V. Description of the invention (芩 (Please read the notes on the back before filling in (This page) As described above, the developing solution used in the developing solution supply section 1 2 6 remains on the substrate G. Most of them are recovered by the substrate tilting mechanism 1 80 to the developing liquid recovery tray 1 3 2 in the developing liquid dropping portion 1 2 'so that the ratio of being brought into the washing portion 1 1 4 is very low, therefore, The ratio of mixing into the cleaning liquid recovery tray 1 3 4 is also very low. In the cleaning section 1 1 4, as shown in FIG. 13 A, 'the developing solution will be sprayed onto the substrate G on the conveying path 108. The scanning direction of the nozzle RN is set to be opposite to the substrate conveyance direction. As a result, the nozzle RN scans from the front end to the rear end of the substrate G at a relative speed (VN + VG) where the nozzle scan speed VN and the substrate conveyance speed VG are added. Even if the size of the substrate G is large, a cleaning liquid can be supplied to the entire treated surface (resist surface) of the substrate G in a short time, and the cleaning liquid can be quickly replaced (stop development). Furthermore, a cleaning liquid supply nozzle (not shown) for cleaning the back surface of the substrate G may be disposed under the transport path 108. Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The substrate G, which has completed the above-mentioned cleaning process in the cleaning department 1 1 4, is carried on the transportation path 108 to the drying department 1 16. As shown in FIG. 4, the drying section 1 16 sprays a knife-shaped sharp gas on the substrate G on the substrate G conveyed on the conveying path 108 by an upper and lower air knife EN ( The surface to be processed) and the back surface, whereby the liquid (mainly the cleaning liquid) adhering to the substrate G is blown off the rear of the substrate (drying liquid). The substrate G, which clears the liquid in the drying section 1 1 6, is directly carried on the conveying path 108 to the substrate conveying section 1 1 8. The structure of the substrate carrying-out section 1 18 is the same as that of the substrate carrying-in section 110, except that the carrying direction of the substrate carrying-in and the carrying-out substrate is opposite, and the operation is the same as that of the substrate carrying-in section 110. In other words, order shift ____ This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 569288 A7 B7 V. Description of invention (pregnancy (please read the precautions on the back before filling this page) The rising tip 1 2 2 waits at a position lower than the conveying path 108, and waits for the substrate G to move from the upstream side (drying section 1 1 6). When the substrate G reaches a certain position where the rising tip 1 2 2 is straight up, let The rising tip 1 2 2 is lifted upward, and the substrate G is lifted up in a horizontal posture, and handed over to the substrate conveying mechanism (not shown) next to it. The developing unit (DEV) 9 4 is in the pre-wetting section 1 2 4 and the developing solution. The supply section 1 2 6 and the cleaning section 1 1 4 are respectively equipped with individual plates 1 30, 1 3 2, 1 3 4 to separately recover the processing liquid (pre-humid liquid, developing liquid, cleaning liquid). In particular, the substrate wetting portion 1 2 4 and the developing liquid droplet dropping portion 1 2 8 are removed from the substrate G for a short time after each process (pre-wetting process, developing process) by the substrate tilting mechanism 1 80. The liquid is efficiently dried, and at the same time, each of the plates 130 and 132 is recovered with high purity, which can significantly improve the separate recovery rate. A substrate tilting mechanism 1 80 can also be provided in the cleaning section 1 14. At this time, the cleaning liquid can be efficiently cleaned from the substrate G in a short time after the cleaning process, and the cleaning liquid can be efficiently recovered. Plates 1 3 4 increase the separation and recovery rate of the cleaning liquid. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. Furthermore, when the cleaning section 1 1 4 tilts the substrate G, the substrate G can be moved in the transport direction, such as The side of the imaging unit 1 1 2 becomes an upper side and the substrate G is inclined. Since the imaging unit 1 12 becomes the upper side when the substrate G is inclined, the cleaning liquid sprayed from the cleaning liquid supply nozzle RN can be reduced on the inclined substrate G. There is a possibility that the rebounded cleaning liquid adheres to the substrate G on the side of the developing section 1 1 2. At the same time, the developing unit (DEV) 94 is on the transportation path 108 __________- 9. Λ ^ _ This paper size is in accordance with Chinese National Standard (CNS) A4 (210 x 297 mm) 569288 A7 B7 V. Description of the invention (Li (please read the precautions on the back first and then fill out this page). Most substrates G are conveyed, and each processing is sequentially performed by the pre-wetting section 1 2 4, the developing solution supply section 1 2 6, the developing solution dripping section 1 2 8, the cleaning section 1 1 4, and the drying section 1 1 6. It can realize the so-called pipelined high-efficiency or high-capacity imaging processing process. In particular, in the pre-wetting section 1 2 4, the developing solution supplying section 1 2 6 and the cleaning section 1 1 4, the conveying path 1 The nozzles PN, DN a, DNb, and RN for supplying the processing liquid (pre-wetting liquid, developing liquid, and cleaning liquid) on the substrate G on 0.8 are scanned along the transportation path 108 above the transportation path 108, so The substrate G has a large size, and when the conveying speed of the conveying path 108 is not high, the processing liquid can be quickly and universally supplied throughout the entire surface of the substrate to be processed in a short time. Especially in the process of supplying the developing solution, since Minimize one end (front end) and the other end of the substrate G in the conveying direction The difference in the supply time of the processing liquid between the (back end portion), that is, the time difference between the start of development, can improve the in-plane uniformity of the development quality on the substrate. The nozzle scanning mechanism SC of this embodiment is a structure in which the nozzle N is scanned in both directions along the conveying path 108. Therefore, as shown in FIG. 13B, the nozzle N and the substrate conveying direction may be scanned in the opposite direction to the substrate. The entire processing surface of G is supplied with the processing liquid Q. At this time, the nozzle scanning speed VN ′ needs to be set to be higher than the substrate conveying speed VG. At the same time, in this embodiment, the pre-wetting section 1 2 4 and the developing liquid supply section 1 2 6 It is developed by the spray method. However, it is easy to change to the paddle method, as long as the developer supply nozzles 1 2 and 6 are used to change the developer supply nozzles DN a and DN b from the spray type to the coating solution. The ejection structure of ____- i: _ This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 569288 A7 B7 V. Description of the invention (you can do it. At the same time, the gate method does not require a pre-wetting section 1 2 4 . (Please read the precautions on the back before filling in this page) In the developer supply section 1 2 6 you can omit the developer supply nozzles DNa and DNb (usually the downstream DNb). You can also set the transport path. The scannable area of each nozzle N on 108 is set to exceed the range of one module M, and a structure in which adjacent movable nozzles can step into a common guide rail is adopted. This embodiment is as described above. The substrate tilting mechanism 180 on the downstream side of the developing section 1 12 effectively recovers the cleaning liquid from the substrate G before being transported to the cleaning section 1 1 4. In this way, the cleaning liquid is removed from the substrate G before being transported to the cleaning section 1 1 4 and the benefits of accelerating the replacement with the cleaning liquid or stopping the development during the cleaning process can be received. * The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs has printed an air knife mechanism as shown in Figure 14 near the boundary between the imaging department 1 12 and the cleaning department 1 1 4. The architecture used is also effective. In FIG. 14, the air knife FN is provided with numerous air outlets or slit-shaped air outlets extending from end to end of the substrate G in the width direction of the conveying path 108, and is positioned next to the passage (below). The substrate G sprays a blade-like sharp gas flow (usually an air flow or a nitrogen flow). Thereby, while the substrate G passes the air blade F N, the developing liquid Q on the substrate is swept to the rear end side of the substrate and is swept out of the substrate. The substrate tilting mechanism 180 of the above embodiment is a structure that first raises the substrate G from the transport path 108 in a horizontal posture, and then tilts it. However, other methods may be used, and a substrate tilting mechanism that tilts a member whose upper end surface is inclined from the bottom to the top of the substrate G may be used. At the same time, it is also possible to adopt ___ which constitutes the conveying path in a certain interval; ____ This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 569288 A7 B7 5. Description of the invention (jealous (please first Read the notes on the back and fill in this page again.) The tilting method of the transport rollers (1 3 8 A, 1 3 8 B). Refer to Figures 15 to 17 for the substrate tilting mechanism according to the tilting method of the transport path. 2 0 An example of the configuration of 〇. This substrate tilting mechanism 2000 employs a suitable place on the transport path 108, for example, in the tiltable section K set in the developing liquid drop portion 1 28, each transport rotation shaft 1 3 6 is divided into the driving gear 1 4 4 side of the driving shaft 1 3 6 a. And the structure of the driven shaft 136b on the side of the conveying roller (1 3 8 A, 1 3 6 B), the two rotating shafts 136a, 136b are detachably connected via the clutch 202. The driven shaft 1 3 6 b is a pair of bearings 2 0 4 A and 204B rotatably supported on the outer sides of the two rollers 1 3 8 A and 1 3 8 B in the axial direction. Each of the bearings 204A and 204B is a support plate 206 which is horizontally supported above the transport path 108 via a vertical support rod 208. The details are that the lower end portion of the vertical support rod 208 is fixed to each of the bearings 204A, 204B, and the upper end portion of the vertical support rod 208 is rotatably supported on the side of the support plate 206 through a pin 2 1〇. The consumer property cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs prints a support plate 2 06 to one end in the transport direction, such as the front end (downstream end), so that it can pivot on the pivot 2 1 2 and the opposite side The end portion (rear end portion) is coupled to a piston shaft 2 1 8 a of a horizontal cylinder 2 1 8 via a rope 2 1 4 which is vertically suspended from a bobbin 2 1 4 provided above. In this structure, a clutch driving portion is used. (Not shown) When the clutch 2 0 2 is connected and the driving shaft 1 3 6 a and the driven shaft 1 3 6 b are connected, the rotational driving force of the electric motor 1 50 (Fig. 5 and Fig. 6) is transmitted through the rotary shaft. Paper size applies to China National Standard (CNS) A4 specification (210X297 mm)-^ 7-569288 A7 ____ B7 V. Description of the invention (Mai moving drive shaft 146, helical gear 148, 144, driving shaft (please read the note on the back first) (Fill in this page again)
1 3 6 a、離合器2 0 2及從動軸1 3 6 b傳至運送輥 138A、138B。因此，在運送路1〇8上，基板G 可以順利進入可傾斜區間K，從可傾斜區間K順利運至下 游側。 但使離合器202成爲OFF，從原動軸1 36 a分 開從動軸1 3 6 b時，電氣馬達1 5 0的轉動驅動力被離 合器2 0 2截斷，不會傳至從動軸1 3 6 b。在此狀態下 ’驅動橫向汽缸2 1 8令活塞軸2 1 8 a前進一定距離時 ’支持板2 0 6則以前端部側的樞軸2 1 2爲中心使後端 部側下降狀向後轉動或傾斜。如此，支持板2 〇 6向後傾 斜時，介由垂直支持桿208及軸承204 (204A、 經濟部智慧財產局員工消費合作社印製 2 0 4 B )吊掛在支持板2 0 6的各從動軸1 3 6 b及兩 運送輥138A、138B也對應各位置下降，構成可傾 斜區間K的運送路1 〇 8的運送輥1 3 8列便如第1 7圖 所示，與支持板2 0 6平行向後傾斜相同角度。藉此，基 板G位於可傾斜區間K的運送路1 〇 8上時，基板G將與 運送路1 0 8 —起向後傾斜相同角度。此傾斜角度可藉由 汽缸2 1 8的活塞軸2 1 8 a的前進距離調整。 在接近支持板2 0 6的後端部的稍後（運送方向的上 游側）處，於運送路1 0 8的橫方向以垂直方向倒立狀設 置有一個或多數氣缸2 2 0，各活塞軸2 2 0 a的前端安 裝有例如橡膠製的筒狀停止構件2 2 2。配合如上述的支 持板2 0 6的從水平狀態向傾斜狀態的變換姿勢的定時， ______糾-__ 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） 569288 A 7 B7 五、發明説明（3；β (請先閲讀背面之注意事項再填寫本頁) 由各氣缸2 2 0使活塞軸2 2 0 a前進或下降，便如第 1 7圖所示，由停止構件2 2 2在區間K內承接在運送路 1 0 8上向後傾斜的基板G的後端。 如此，基板G與可傾斜區間K的運送輥1 3 8 A、 1 3 8 B列一體向後傾斜，且由停止構件2 2 2穩定保持 其傾斜姿勢，因此，盛在基板G上，或附著在基板G上的 液體Q (在顯像液滴落部1 2 8是顯像液）便因重力而 從基板傾斜面滑落後方，從基板端掉落，由該盤子1 3 2 承接集中。 經濟部智慧財產局員工消費合作社印製 要將上述傾斜姿勢恢復到水平姿勢時，可使兩汽缸 218、220的活塞軸218a、220a的定時相互 配合，分別恢復移動至原位置即可。而在可傾斜區間K內 的運送路1 0 8或運送輥1 3 8列回到水平狀態後，使離 合器2 0 2動作，將從動軸1 3 6 b連結到原動軸 1 3 6 a便可以。再者，原動軸1 36 a可以由設置在螺 旋齒輪1 4 4的軸方向外側的軸承2 2 4支持（第1 5圖 )。在此基板傾斜機構2 0 0，設在運送路1 0 8上方的 機構（206、214、218、220等）可以收容在 盒子或隔板226內。 要使在運送路1 0 8上從上游側運送過來的基板G在 可傾斜區間K停止下來時，可以與基板傾斜機構1 8 0同 樣，當基板G來到一定位置時由位置感測器將其檢出，回 應該感測器輸出信號由離合器驅動部截斷離合器2 0 2便 可以。這種基板到達檢測用的感測器可以使用例如第 ________- -_ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（3)7 1 8 A〜C圖所示的限制開關2 3 0。此限制開關2 3 0 在基板G即將到達運送路1 〇 8上的一定位置時（第 1 8 A圖），基板前端部抵接到設在此的輥子桿2 3 2的 前端部，而牽引輥子桿2 3 2，抗拒螺旋彈簧2 3 4的彈 力以軸2 3 6爲中心向一定方向（順時針方向）轉動而潛 入基板G下（第1 8 B圖）。於是，由光感測器2 3 8檢 出輥子桿2 3 2的另一端部，輸出一定的基板到達檢出信 號。光感測器2 3 8可以如第1 8 C圖所示，分開空隙 2 4 0配置相互面對面的發光元件2 3 8 a與受光元件 2 3 8 b者，當輥子桿2 3 2進入空隙2 4 0截斷從發光 元件2 3 8 a發出的光線L B時，從受光元件2 3 8 b獲 得的輸出信號作爲基板到達檢測信號。 上述實施形態的各部分的架構只是一個例子，基板傾 斜機構以外的部分也可以有各種的變形。例如，噴嘴掃描 機構s C的噴嘴支持體1 5 6或掃描驅動部1 6 0等的架 構也是可以任意變更。或者，將預濕潤噴嘴、顯像液供應 用噴嘴、洗淨液供應用噴嘴等構成爲定置型的噴嘴。 在上述實施形態，是構成水平方向鋪設與可轉動的轉 軸1 3 6分開一定間隔固定的一對運送輥1 3 8 A、 1 3 8 B而成的輥筒運送型的運送路1 〇 8。在如此的輥 筒運送型的運送路，在兩運送輥1 38A、1 38B的中 間位置也可以安裝基板運送用的滾筒。同時，也可以在運 送方向將運送路1 0 8的驅動系統分割成多數，以獨立方 式控制各分割運送路上的運送動作（速度、停止等）。同 ——____- 4Π -__ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝· 訂 569288 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（苹 時，也可以使用，水平方向鋪設分開一定間隔的一對輸送 帶而成的輸送帶運送型的運送路。 而當然可以在預濕潤部1 2 4、顯像液滴落部1 2 8 或洗淨部1 1 4，將傾斜基板的方向設定成與上述的方向 不同的方向，或以水平狀態或傾斜狀態處理基板。 上述實施形態是關於顯像裝置，但本發明也可適用於 顯像裝置以外的基板處理裝置，例如，在如上述的塗抹顯 像處理系統，也可以適用在沖刷洗淨單元（S C R ) 4 2 。亦即，在沖刷洗淨單元（S C R ) 4 2的運送路上，於 噴吹洗淨部的後段配設與上述實施形態相同的基板傾斜機 構1 8 0、2 0 0，則可以很有效率澄乾殘留在基板G上 的洗淨液，或加以回收。 本發明的被處理基板不限定爲L C D基板，而是包含 可適用顯像處理的任意的被處理基板。 如以上所說明，依據本發明的基板處理裝置時，可以 在短時間內有效率將在水平方向鋪設的運送路上供給被處 理基板的處理液體澄乾，並且，能夠以高純度分開回收。 (實施形態2 ) 茲參照附圖詳細說明本發明的實施形態如下。本實施 形態是，將本發明應用在對施加過曝光處理的L C D基板 進行顯像處理的顯像處理單元（D E V )爲例子進行說明 。第1 9圖是表示，具備本發明的一實施形態的顯像處理 單元（D E V )，連續進行從形成抗蝕劑膜至顯像的一連 -----—----41 - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝· 569288 A7 B7 五、發明説明（竽 串處理的抗蝕劑塗抹•顯像處理系統的槪略架構的平面圖 〇 (請先閲讀背面之注意事項再填寫本頁) 此抗鈾劑塗抹、處理系統4 0 0備有：載置有多數收 容L CD基板G的卡匣C的卡匣站（運進運出部）3 0 1 ;備有對L C D基板G施加包含塗抹抗蝕劑的一連串處理 的多數處理單元的處理站（處理部）302;移交LCD 基板G給曝光裝置304的界面站（界面部）303，在 處理站3 0 2的兩端分別配置卡匣站3 0 1及界面站 303。再者，在第19圖，抗蝕劑塗抹、處理系統 4 0 0的長度方向稱作X方向，在平面上與X方向垂直的 方向稱作Y方向。 經濟部智慧財產局員工消費合作社印製 卡匣站3 0 1備有：可以將卡匣C排列在Y方向載置 的載置台3 0 9 ;及在與處理站3 0 2間運進運出L CD 基板G的運送裝置3 1 1 ，而在此載置台3 0 9與外部間 運送卡匣C。同時，運送裝置3 1 1備有運送臂3 1 1 a ’可以在沿卡匣C的排列方向的Y方向配設的運送路 3 1 0上移動，藉運送臂3 1 1 a在卡匣C與處理站 3 0 2間運進運出L CD基板G。 處理站3 0 2具有基本上向X方向延伸的L CD基板 G運送用的平行的兩列運送線A、B，沿運送線A從卡匣 站3 0 1側向界面站3 0 3排列：沖刷洗淨單元（S C R )32 1、第1熱處理單元區326、抗蝕劑處理單元， 3 2 3及第2熱處理單元區3 2 7。同時，沿運送線B從 界面站3 0 3側向卡匣站3 0 1排列：第2熱處理單元區 本紙張尺度適用中國國家標準（CNS ) a4規格（210Χ297公釐） 569288 A7 ___ B7 五、發明説明（爷 3 2 7、顯像處理單元（D E V ) 3 2 4、i線U V照射 (請先閲讀背面之注意事項再填寫本頁) 單元（i — UV) 325及第3熱處理單元區328。在 沖刷洗淨單元（S C R ) 3 2 1上的一部分設有激元U V 照射單元（e — U V ) 3 2 2。再者，激元U V照射單元 (e _ U V ) 3 2 2是用以在沖刷洗淨前先去除L C D基 板G的有機物，而i線U V照射單元（i — U V ) 3 2 5 則用以進行顯像的脫色處理。 上述沖刷洗淨單元（S C R ) 3 2 1可以使L C D基 板G在其中以略呈水平姿勢被運送，並進行洗淨處理及乾 燥處理。顯像處理單元（D E V ) 3 2 4也如以後所詳述 ，能以略呈水平姿勢運送L C D基板G，並進行顯像液塗 抹，顯像後的顯像液洗淨及乾燥處理。在此等沖刷洗淨單 元（SCR) 321及顯像處理單元（DEV) 324， L C D基板G的運送是利用例如滾筒運送或輸送帶運送， L C D基板G的運進口及運出口是設在相對向的短邊。而 ，向i線U V照射單元（i — U V ) 3 2 5運送L C D基 經濟部智慧財產局員工消費合作社印製 板G的方式是藉由與顯像處理單元（D EV) 3 2 4的運 送機構相同的機構連續運送。 在抗蝕劑處理單元3 2 3依序配置：令抗蝕劑滴下保 持成略成水平的L C D基板G，而以一定的轉速使L C D 基板G轉動，藉此使抗蝕劑擴展到整個L C D基板G，形 成抗蝕劑膜的抗蝕劑塗抹處理裝置（C T ) 3 2 3 a ;將 形成在L C D基板G上的抗鈾劑膜減壓乾燥的減壓乾燥裝 置（VD) 323b ;藉由可以掃描LCD基板G的四邊 ____-4λ-_ 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） 569288 A7 B7 五、發明説明（, (請先閲讀背面之注意事項再填寫本頁) 的溶劑吐出頭去除附著在L C D基板G周緣的多餘的抗鈾 劑的周緣抗蝕劑去除裝置（E R ) 3 2 3 c。在抗蝕劑處 理單元3 2 3內設有可以在此等抗蝕劑塗抹處理裝置（ CT) 323a、減壓乾燥裝置（VD) 323b、周緣 抗蝕劑去除裝置（ER) 3 2 3 c間運送LCD基板G的 運送臂。 如第2 0圖的第1熱處理單元區3 2 6的側面圖所示 ，第1熱處理單元區3 2 6備有，堆疊對L C D基板G施 加熱處理的熱處理單元所構成的兩個熱處理單元塊（T B )331、332，熱處理單元塊（TB) 331設在沖 刷洗淨單元（S C R ) 3 2 1側，熱處理單元塊（T B ) 3 3 2設在抗蝕劑處理單元3 2 3側。此等兩個熱處理單 元塊（TB) 331、332間設有第1運送裝置333 〇 熱處理單元塊（TB ) 3 3 1的架構是，從下方依序 堆疊四層：送受L CD基板G的傳遞單元（PAS S) 3 6 1 ;對L C D基板G進行脫水烘烤處理的兩個脫水烘 經濟部智慧財產局員工消費合作社印製 烤單元（DHP) 362、363 ;對LCD基板G施加 疏水（不沾水）化處理的附著處理單元（A D ) 3 6 4等 單元，而熱處理單元塊（TB) 332的架構是，從下方 依序堆疊四層：送受LCD基板G的傳遞單元（PASS )365 ;冷卻LCD基板G的兩個冷卻單元（C〇L) 3 6 6、3 6 7 ;對L C D基板G施加疏水化處理的附著 處理單元（AD) 3 6 8等單元。 —----=^4.4..-. 本紙張尺度適用中國國家標準（CNS ) A4規格（210'〆297公釐） 569288 A7 _ B7 ____ 五、發明説明（爷 第1運送裝置3 3 3是經由傳遞單元（PASS) 3 6 1從沖刷洗淨單元（S C R ) 3 2 1接受L C D基板 (請先閱讀背面之注意事項再填寫本頁) G，進行在上述熱處理單元間的L CD基板G的運進運出 ，及經由傳遞單元（PASS) 365將LCD基板G移 交給抗鈾劑處理單元3 2 3。 第1運送裝置3 3 3具有：上下延伸的導軌3 9 1 ; 沿導軌3 9 1昇降的昇降構件3 9 2 ;配設成可以在昇降 構件3 9 2上迴旋的基座構件3 9 3 ;配設成可以在基座 構件3 9 3上前進後退，用以保持L C D基板G的基板保 持臂3 9 4。而，昇降構件3 9 2的昇降是由馬達3 9 5 驅動，基座構件3 9 3的迴旋是由馬達3 9 6驅動，基板 保持臂3 9 4的前後動作是由馬達3 9 7驅動。如此，第 1運送裝置3 3 3可以上下動、轉動、前後動，可以擷取 熱處理單元塊（TB) 331、332的任一單元。 經濟部智慧財產局員工消費合作社印製 第2熱處理單兀區3 2 7備有，堆疊對L CD基板G 施加熱處理的熱處理單元構成的兩個熱處理單元塊（T B )334、335，熱處理單元塊（TB) 334設在抗 蝕劑處理單元3 2 3側，熱處理單元塊（τ B ) 3 3 5設 在顯像處理單元（D EV) 3 2 4側。此等兩個熱處理單 元塊（TB) 334、335間設有第2運送裝置336 〇 如第2 1圖的第2熱處理單元區3 2 7之側面圖所示 ’熱處理單兀塊（TB) 3 3 4的架構是，從下方依序堆 疊四層：移交L CD基板G的傳遞單元（pa S S ) 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公着） 45. 569288 A7 _ B7 _ 五、發明説明（喫 3 6 9 ;對L C D基板G進行預烘烤處理的3個預烘烤單 元（PREBAKE ) 3 70、371、372等單元，而熱處 (請先閲讀背面之注意事項再填寫本頁) 理單元塊（TB) 3 3 5的架構是，從下方依序成堆疊4 層：移交LCD基板G的傳遞單元（PASS) 373 ; 冷卻L C D基板G的冷卻單元（C〇L ) 3 7 4 ;對 L CD基板G進行預烘烤處理的兩個預烘烤單元（ PREBAKE) 3 7 5、376 等單元。 第2運送裝置3 3 6是經由傳遞單元（PAS S) 3 6 9從抗蝕劑處理單元3 2 3接受L C D基板G，進行 在上述熱處理單元間的L C D基板G的運進運出，及經由 傳遞單元（P A S S ) 3 7 3將L C D基板G交給顯像處 理單元（DEV) 324，及與後述的界面站303的基 板移交部的擴充、冷卻台（EXT、COL) 344交接 L CD基板G。再者第2運送裝置3 3 6的構圖與第1運 送裝置3 3 3相同，可以擷取熱處理單元塊（TB ) 334、335中的任一單元。 經濟部智慧財產局員工消費合作社印製 第3熱處理單元區3 2 8備有，堆疊對L CD基板G 施加熱處理的熱處理單元構成的兩個熱處理單元塊（T B )337、338，熱處理單元塊（TB) 337設在顯 像處理單元（D E V ) 3 2 4側，熱處理單元塊（Τ B ) 3 3 8設在卡匣站3 0 1側。此等兩個熱處理單元塊（ TB) 337、338間設有第3運送裝置339。 如第2 2圖的第3熱處理單元區3 2 8的側面圖所示 ，熱處理單元塊（TB) 3 3 7的架構是，從下方依序堆 ___-___ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） 569288 經濟部智慧財產局員工消費合作社印製 A7 B7五、發明説明（平 疊四層：移交L CD基板G的傳遞單元（PAS S ) 3 7 7 ;對L C D基板G進行後烘烤處理的3個後烘烤（ P〇BAKE) 378、379、380等單元。而熱處 理單元塊（TB) 3 3 8的架構是，從下方依序堆疊四層 :後烘烤單元（P〇BAKE) 381 ;移交LCD基板 G及冷卻LCD基板G的傳遞、冷卻單元（PASS、 C〇L ) 3 8 2 ;對L C D基板G進行後烘烤處理的兩個 後烘烤單元（p〇BAKE) 383、384等單元。 第3運送裝置3 3 9是經由傳遞單元（PAS S) 3 7 7從i線U V照射單元（i 一 U V ) 3 2 5接受 L CD基板G，進行在上述熱處理單元間的L CD基板G 的運進運出，及經由傳遞、冷卻單元（PASS、C〇L )382將LCD基板G移交給卡匣站301。再者，第 3運送裝置3 3 9與第1運送裝置3 3 3具有相同構造， 可以擷取熱處理單元塊（TB) 3 3 7、3 3 8中的任一 單元。 在處理站3 0 2，基本上是依處理順序配置各處理單 元及運送裝置，以構成上述的兩列運送線A、B，在此等 A、B線間設有空間3 4 0。而以可來回運動狀在此空間 3 4 0設有基板載置構件3 4 1。此基板載置構件3 4 1 可保持L CD基板G，並可介由基板載置構件3 4 1在運 送線A、B間移交L C D基板G。對基板載置構件3 4 1 的L CD基板G的移交是由上述第1〜3運送裝置3 3 3 、336、339 爲之。 -^-— _-47 -__ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） —^^1- ^—>—1 nm m# 11>1 —^ϋ .tern ϋ_ϋ« ϋ^— —ϋ (請先閱讀背面之注意事項再填寫本頁) 訂 569288 A7 ___ B7 五、發明説明（年 (請先閲讀背面之注意事項再填寫本頁) 界面站3 0 3備有：在處理站3 0 2與曝光裝置 3 0 4間運出運進L CD基板G的運送裝置3 4 2 ;配置 緩衝卡匣的緩衝台（B U F ) 3 4 3 ;具有冷卻功能的基 板移交部的擴充、冷卻台（EXT、COL) 344 ’並 鄰接運送裝置3 4 2設有上下堆疊字幕攝影機（TITLER ) 及周邊曝光裝置（E E)的外部裝置塊3 4 5。運送裝置 3 4 2備有運送臂3 4 2 a，藉此運送臂3 4 2 a在處理 站3 0 2與曝光裝置3 0 4的間運進運出L CD基板G。 在如此構成的抗蝕劑塗抹、處理系統4 0 〇，首先， 配置在卡匣站3 0 1的載置台3 0 9的卡匣C內的LCD 基板G，由運送裝置3 1 1直接運進處理站3 0 2的激元 U V照射單元（e - U V ) 3 2 2，進行淸除前的處理。 接著，由運送裝置3 1 1將L C D基板G運進沖刷洗淨單 元（S C R ) 3 2 1，進行沖刷洗淨。沖刷洗淨處理後， L C D基板G則例如藉由滾筒運送運出到屬於第1熱處理 單元區3 2 6的熱處理單元塊（TB) 3 3 1的傳遞單元 (P A S S ) 3 6 1。 經濟部智慧財產局員工消費合作社印製1 3 6 a, clutch 202 and driven shaft 1 3 6 b are transmitted to the conveying rollers 138A, 138B. Therefore, on the transport path 108, the substrate G can smoothly enter the tiltable section K, and can be smoothly transported from the tiltable section K to the downstream side. However, when the clutch 202 is turned off and the driven shaft 1 3 6 b is separated from the driven shaft 1 36 a, the rotational driving force of the electric motor 150 is cut off by the clutch 2 0 2 and is not transmitted to the driven shaft 1 3 6 b. . In this state, when the horizontal cylinder 2 1 8 is driven and the piston shaft 2 1 8 a is advanced a certain distance, the support plate 2 0 6 rotates the rear end side downward with the pivot 2 1 2 at the front end side as the center and rotates backward. Or tilt. In this way, when the support plate 206 is tilted backwards, each of the followers of the support plate 206 is hung on the support plate 206 through the vertical support rod 208 and the bearing 204 (204A, printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, 2 0 4 B). The shafts 1 3 6 b and the two conveying rollers 138A and 138B are also lowered corresponding to each position, and the conveying rollers 1 3 and 8 constituting the conveying path 1 0 of the tiltable section K are shown in FIG. 17 and the supporting plate 2 0 6 Tilt backwards at the same angle in parallel. As a result, when the substrate G is positioned on the transport path 108 in the tiltable section K, the substrate G is tilted backward at the same angle from the transport path 108. This tilt angle can be adjusted by the advance distance of the piston shaft 2 1 8 a of the cylinder 2 1 8. One or a plurality of cylinders 2 2 0 are vertically arranged in the vertical direction in the lateral direction of the conveying path 108 near the rear end portion (upstream side of the conveying direction) of the rear end of the support plate 2 06, and each piston shaft A cylindrical stopper 2 2 2 made of, for example, rubber is attached to the tip of 2 2 0 a. In accordance with the timing of the posture change from the horizontal state to the inclined state of the support plate 2 0 6 as described above, ______ Correct -__ This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 569288 A 7 B7 V. Description of the invention (3; β (Please read the precautions on the back before filling in this page) Each cylinder 2 2 0 advances or lowers the piston shaft 2 2 a, as shown in Figure 17 by the stop member 2 2 2 receives the rear end of the substrate G tilted backward on the transport path 108 in the section K. In this way, the substrate G and the transport rollers 1 3 8 A and 1 3 8 B of the tiltable section K are tilted backward integrally, The stop member 2 2 2 keeps its inclined posture stably. Therefore, the liquid Q (which is the developing liquid at the developing liquid droplet dropping portion 1 2 8) contained on the substrate G or adhered to the substrate G is caused by gravity. It slides from the inclined surface of the substrate, falls from the substrate end, and is collected by the plate 1 3 2. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. To restore the inclined posture to the horizontal posture, the two cylinders 218, 220 The timing of the piston shafts 218a, 220a cooperate with each other, and they resume to move to The original position is sufficient. After the transport path 108 or transport rollers 138 in the tiltable section K return to the horizontal state, the clutch 202 is activated, and the driven shaft 1 3 6 b is connected to the driven shaft. 1 3 6 a. In addition, the driving shaft 1 36 a can be supported by a bearing 2 2 4 provided on the outer side of the helical gear 1 4 4 in the axial direction (FIG. 15). Here, the substrate tilting mechanism 2 0 0, A mechanism (206, 214, 218, 220, etc.) provided above the transport path 108 can be accommodated in a box or a partition 226. The substrate G transported from the upstream side on the transport path 108 can be tilted. When the interval K is stopped, it can be detected by the position sensor when the substrate G reaches a certain position in the same way as the substrate tilt mechanism 180. In response to the output signal of the sensor, the clutch driving unit interrupts the clutch 2 0 2 You can use this type of sensor for substrate arrival detection. For example, ________- -_ This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 569288 A7 B7 Employees ’Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs Printing 5. Description of the invention (3) 7 1 8 Limits shown in A to C Off 2 3 0. When the limit switch 2 3 0 is about to reach a certain position on the conveying path 1 08 (Fig. 18 A), the front end of the substrate abuts on the roller lever 2 3 2 provided there. The front end part, while the traction roller lever 2 3 2 and the resilient force of the coil spring 2 3 4 rotate around the shaft 2 3 6 in a certain direction (clockwise) and sneak into the substrate G (Figure 18B). Then, the other end of the roller lever 2 3 2 is detected by the light sensor 2 3 8 and a predetermined substrate arrival detection signal is output. The light sensor 2 3 8 can be separated from the gap 2 4 0 as shown in FIG. 1 C. The light emitting element 2 3 8 a and the light receiving element 2 3 8 b are arranged facing each other. When the roller rod 2 3 2 enters the gap 2 When 40 cuts the light LB emitted from the light-emitting element 2 38 a, the output signal obtained from the light-receiving element 2 3 8 b is used as a substrate arrival detection signal. The structure of each part of the above embodiment is just an example, and parts other than the substrate tilt mechanism may be variously modified. For example, the structure of the nozzle support 156 or the scanning drive unit 160 of the nozzle scanning mechanism s C can be arbitrarily changed. Alternatively, a pre-wetting nozzle, a developing solution supplying nozzle, a cleaning solution supplying nozzle, and the like are configured as fixed nozzles. In the above-mentioned embodiment, a roller-conveying type conveying path 108 is formed in which a pair of conveying rollers 1 3 A and 1 8 B are fixed and spaced apart from each other in a horizontal direction and a rotatable rotating shaft 1 3 6. In such a roller-conveying type conveying path, a roller for substrate conveyance may be installed at a middle position between the two conveying rollers 1 38A and 1 38B. At the same time, the drive system of the transportation path 108 can be divided into a plurality of in the transportation direction, and the transportation operations (speed, stop, etc.) on each divided transportation path can be controlled independently. Same as ____- 4Π -__ This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page) Binding and ordering 569288 A7 B7 Staff of Intellectual Property Bureau, Ministry of Economic Affairs Printed by the Consumer Cooperative. 5. Description of the invention (It can also be used by Ping Shi. It can be used as a conveyor belt conveying path formed by horizontally laying a pair of conveyor belts separated by a certain interval. Of course, it can be used in the pre-humidity section 1 2 4. Like the droplet dropping part 1 2 or the washing part 1 1 4, the direction of the inclined substrate is set to a direction different from the above-mentioned direction, or the substrate is processed in a horizontal state or an inclined state. The above-mentioned embodiment relates to a developing device, However, the present invention can also be applied to a substrate processing device other than a developing device. For example, in the application developing processing system described above, it can also be applied to a scouring and washing unit (SCR) 4 2. That is, the scouring and washing unit (SCR) On the conveying path of 42, the same substrate tilting mechanism 1 80, 2 0 as the above embodiment is arranged in the rear section of the spray cleaning section, and it can be dried on the substrate G with high efficiency. The cleaning substrate of the present invention is not limited to an LCD substrate, but includes any substrate to be processed to which imaging processing is applicable. As described above, when the substrate processing apparatus of the present invention is used, The processing liquid supplied to the substrate to be processed can be efficiently dried in a short period of time, and can be recovered separately with high purity. (Embodiment 2) An embodiment of the present invention will be described in detail with reference to the drawings. This embodiment is described below as an example in which the present invention is applied to a development processing unit (DEV) that performs development processing on an LCD substrate that has been subjected to exposure processing. Fig. 19 is a view showing an embodiment including the present invention. The development processing unit (DEV) in the form continuously performs a series of steps from the formation of a resist film to the development ----- ----- 41-This paper size applies the Chinese National Standard (CNS) A4 specification (210X297) ）) (Please read the precautions on the back before filling out this page.) 569288 A7 B7 V. Description of the invention (Skeleton-processed resist coating and development processing system) Plan view 〇 (Please read the precautions on the back before filling in this page) This uranium-resistant agent coating and processing system 4 0 0 has: a cassette station on which most cassettes C containing L CD substrates G are loaded (transported into (Exit section) 3 0 1; processing station (processing section) 302 having a plurality of processing units for applying a series of processes including application of resist to the LCD substrate G; interface station (interface section) that transfers the LCD substrate G to the exposure device 304 303, a cassette station 301 and an interface station 303 are respectively disposed at both ends of the processing station 300. Further, in FIG. 19, the length direction of the resist application and processing system 400 is referred to as the X direction. A direction perpendicular to the X direction on a plane is called a Y direction. Ministry of Economic Affairs, Intellectual Property Bureau, Employees' Cooperatives, Printing Card Cassette Station 3 0 1 has: a mounting table 3 0 9 where cassettes C can be arranged in the Y direction; and transported in and out of the processing station 3 02 The L CD substrate G is a transport device 3 1 1, and the cassette C is transported between the mounting table 309 and the outside. At the same time, the conveying device 3 1 1 is provided with a conveying arm 3 1 1 a ′, and can be moved on the conveying path 3 1 0 arranged in the Y direction along the arrangement direction of the cassette C, and the conveying arm 3 1 1 a can be moved to the cassette C The L CD substrate G is carried in and out of the processing station 302. The processing station 3 02 has two parallel rows of conveying lines A, B for conveying the L CD substrate G extending substantially in the X direction, and is arranged along the conveying line A from the cassette station 3 1 1 to the interface station 3 0 3: Scouring and washing unit (SCR) 32 1. First heat treatment unit area 326, resist treatment unit, 3 2 3 and second heat treatment unit area 3 2 7. At the same time, along the transport line B, it is arranged from the interface station 3 0 3 to the cassette station 3 01: the second heat treatment unit area. The paper size applies the Chinese National Standard (CNS) a4 specification (210 × 297 mm) 569288 A7 ___ B7 V. Description of the invention (Master 3 2 7, Development Processing Unit (DEV) 3 2 4, i-ray UV irradiation (please read the precautions on the back before filling this page) Unit (i — UV) 325 and the third heat treatment unit area 328 A part of the scouring and washing unit (SCR) 3 2 1 is provided with an exciton UV irradiation unit (e — UV) 3 2 2. Furthermore, an exciton UV irradiation unit (e_UV) 3 2 2 is used to The organic matter of the LCD substrate G is removed before washing and cleaning, and the i-ray UV irradiation unit (i — UV) 3 2 5 is used for decolorization of development. The above-mentioned washing and cleaning unit (SCR) 3 2 1 can make The LCD substrate G is transported in a slightly horizontal position, and is subjected to a washing process and a drying process. The development processing unit (DEV) 3 2 4 can also transport the LCD substrate G in a slightly horizontal position, as described in detail later. And apply the developer solution, wash and dry the developer solution after development. Here The scouring and washing unit (SCR) 321 and the development processing unit (DEV) 324. The LCD substrate G is transported using, for example, a roller conveyor or a conveyor belt. The LCD substrate G's inlet and outlet are located on the opposite short sides. And, the method of transporting the printed board G of the consumer cooperative of the employees of the Intellectual Property Bureau of the Ministry of Economics and LCD to the i-line UV irradiation unit (i — UV) 3 2 5 is through the development processing unit (D EV) 3 2 4 The same mechanism is used for continuous conveyance. The resist processing units 3 2 3 are sequentially arranged: the resist is dropped to maintain the LCD substrate G at a slightly horizontal level, and the LCD substrate G is rotated at a certain speed, so that The resist is extended to the entire LCD substrate G to form a resist coating treatment device (CT) for the resist film 3 2 3 a; a reduced-pressure drying device for drying the anti-uranium agent film formed on the LCD substrate G under reduced pressure (VD) 323b; By scanning the four sides of the LCD substrate G ____- 4λ-_ This paper size applies the Chinese National Standard (CNS) A4 specification (210 × 297 mm) 569288 A7 B7 V. Description of the invention (, (Please read first (Notes on the back, please fill out this page) A peripheral resist removal device (ER) 3 2 3 c for removing excess uranium-resistant agent attached to the peripheral edge of the LCD substrate G by the ejection head. The resist processing unit 3 2 3 is provided with a resist that can be applied to these A conveying arm for conveying the LCD substrate G between the processing device (CT) 323a, the reduced-pressure drying device (VD) 323b, and the peripheral resist removal device (ER) 3 2 3 c. As shown in the side view of the first heat treatment unit area 3 2 6 in FIG. 20, the first heat treatment unit area 3 2 6 includes two heat treatment unit blocks formed by stacking heat treatment units that apply heat treatment to the LCD substrate G ( TB) 331, 332, a heat treatment unit block (TB) 331 is provided on the scouring and washing unit (SCR) 3 2 1 side, and a heat treatment unit block (TB) 3 3 2 is provided on the resist processing unit 3 2 3 side. The two heat treatment unit blocks (TB) 331 and 332 are provided with a first conveying device 333. The heat treatment unit block (TB) 3 3 1 has a structure in which four layers are sequentially stacked from below: sending and receiving L CD substrate G Unit (PAS S) 3 6 1; Two dehydration baking dehydration baking processes for LCD substrate G Printed baking units (DHP) 362, 363 of the Intellectual Property Bureau staff of the Ministry of Economic Affairs, Consumer Cooperatives; Adhesion treatment unit (AD) 3 6 4 and other units, and the structure of the heat treatment unit block (TB) 332 is that four layers are sequentially stacked from below: the transfer unit (PASS) 365 that sends and receives the LCD substrate G; Two cooling units (COL) 3 6 6 and 3 6 7 for cooling the LCD substrate G; and an adhesion processing unit (AD) 3 6 8 for applying a hydrophobic treatment to the LCD substrate G. —---- = ^ 4.4 ..-. This paper size is applicable to Chinese National Standard (CNS) A4 specification (210 '公 297 mm) 569288 A7 _ B7 ____ 5. Description of the invention (Ye first conveying device 3 3 3 The LCD substrate is received from the scouring and washing unit (SCR) 3 6 1 through the transfer unit (PASS) (please read the precautions on the back before filling this page) G, and perform the L CD substrate between the heat treatment units G And in and out, and transfer the LCD substrate G to the uranium-resistant agent processing unit 3 through 3 through the transfer unit (PASS) 365. The first transfer device 3 3 3 has: a guide rail 3 9 1 extending up and down; and a guide rail 3 9 1Lifting member for lifting 3 9 2; Base member 3 9 3 configured to be rotatable on the lifting member 3 9 2; Equipped to be able to move forward and backward on the base member 3 9 3 for holding the LCD substrate G The substrate holding arm 3 9 4. The lifting of the lifting member 3 9 2 is driven by the motor 3 9 5, the rotation of the base member 3 9 3 is driven by the motor 3 9 6, and the substrate holding arm 3 9 4 moves forward and backward. It is driven by the motor 3 9 7. In this way, the first conveying device 3 3 3 can move up and down, rotate, and move forward and backward, and can retrieve heat treatment orders One of the units of TB (331) and 332. The 2nd heat treatment unit 3 printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 3 2 7 There are two heat treatment units stacked to apply heat treatment to the L CD substrate G. The heat treatment unit block (TB) 334, 335, the heat treatment unit block (TB) 334 is provided on the resist processing unit 3 2 3 side, and the heat treatment unit block (τ B) 3 3 5 is provided on the development processing unit (D EV) 3 2 4 side. These two heat treatment unit blocks (TB) 334 and 335 are provided with a second conveying device 336 〇 As shown in the side view of the second heat treatment unit area 3 2 7 in FIG. 21, 'The heat treatment unit block The structure of (TB) 3 3 4 is that four layers are stacked in order from below: the transfer unit (pa SS) that transfers the L CD substrate G. This paper size applies the Chinese National Standard (CNS) A4 specification (210X297) 45. 569288 A7 _ B7 _ V. Description of the invention (take 3 6 9; 3 pre-baking units (PREBAKE) 3 70, 371, 372 and other units for pre-baking the LCD substrate G, and hot places (please read the back first) (Notes to fill in this page again) The structure of the management unit block (TB) 3 3 5 is that it is stacked in order from the bottom 4 Layers: Pass-through unit (PASS) 373 that handed over the LCD substrate G; Cooling unit (C0L) that cools the LCD substrate G 3 7 4; Two pre-baking units (PREAKE) that pre-bake the L CD substrate G 3 7 5, 376 and other units. The second conveying device 3 3 6 receives the LCD substrate G from the resist processing unit 3 2 3 via the transfer unit (PAS S) 3 6 9, carries in and out the LCD substrate G between the heat treatment units, and Passing unit (PASS) 3 7 3 Transfers the LCD substrate G to the development processing unit (DEV) 324, and transfers the L CD substrate G to the expansion and cooling stage (EXT, COL) 344 of the substrate transfer section of the interface station 303 described later. . Furthermore, the composition of the second conveying device 3 3 6 is the same as that of the first conveying device 3 3 3, and any one of the heat treatment unit blocks (TB) 334 and 335 can be extracted. The third heat treatment unit area 3, 2 and 8 printed by the employee's consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs has two heat treatment unit blocks (TB) 337, 338 composed of heat treatment units that apply heat treatment to the L CD substrate G, and heat treatment unit blocks ( TB) 337 is provided on the development processing unit (DEV) 3 2 4 side, and the heat treatment unit block (T B) 3 3 8 is provided on the cassette station 301 side. A third transfer device 339 is provided between these two heat treatment unit blocks (TB) 337 and 338. As shown in the side view of the third heat treatment unit area 3 2 8 in FIG. 2, the structure of the heat treatment unit block (TB) 3 3 7 is stacked in order from below ___-___ This paper size applies Chinese national standards ( CNS) A4 specification (210X 297 mm) 569288 A7 B7 printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (four-layer stack: transfer unit (PAS S) of L CD substrate G 3 7 7; yes The LCD substrate G is subjected to three post-baking (POBAKE) 378, 379, 380 and other units. The structure of the heat-treating unit block (TB) 3 3 8 is that four layers are sequentially stacked from below: Baking unit (POBAKE) 381; transfer and cooling unit (PASS, COL) 3 8 2 for handing over the LCD substrate G and cooling the LCD substrate G; two post-baking processes for the LCD substrate G Units (p0BAKE) 383, 384, etc. The third conveying device 3 3 9 receives the L CD substrate G from the i-ray UV irradiation unit (i-UV) 3 2 5 via the transfer unit (PAS S) 3 7 7. The L CD substrate G is carried in and out between the heat treatment units, and the LCD substrate G is passed through the transfer and cooling unit (PASS, COL) 382. Handed over to the cassette station 301. In addition, the third conveying device 3 3 9 has the same structure as the first conveying device 3 3 3 and can pick up any of the heat treatment unit blocks (TB) 3 3 7, 3 3 8 In the processing station 302, each processing unit and transportation device are basically arranged in accordance with the processing order to constitute the above-mentioned two rows of transportation lines A and B, and a space 340 is provided between these A and B lines. A substrate mounting member 3 4 1 is provided in this space 3 4 0 in a back-and-forth motion. This substrate mounting member 3 4 1 can hold the L CD substrate G, and can pass through the substrate mounting member 3 4 1 on the transport line. The LCD substrate G is transferred between A and B. The L CD substrate G of the substrate mounting member 3 4 1 is transferred by the above-mentioned first to third transport devices 3 3 3, 336, and 339.-^ --- _-47 -__ This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) — ^^ 1- ^ — > —1 nm m # 11 > 1 — ^ ϋ .tern ϋ_ϋ «ϋ ^ — —ϋ (Please Read the notes on the back before filling this page) Order 569288 A7 ___ B7 V. Description of the invention (year (please read the notes on the back before filling this page) Interface Station 3 0 3 Available: At Processing Station 3 0 2 and exposure device 3 0 4 Conveying device 3 4 2 for carrying out L CD substrate G; buffer stage (BUF) equipped with buffer cassette 3 4 3; expansion and cooling stage of substrate transfer section with cooling function (EXT, COL) 344 'is adjacent to the conveying device 3 4 2 and is provided with an external device block 3 4 5 that stacks a caption camera (TITLER) and a peripheral exposure device (EE). The conveying device 3 4 2 is provided with a conveying arm 3 4 2 a by which the conveying arm 3 4 2 a is conveyed in and out between the processing station 3 2 and the exposure device 3 0 4. In the resist coating and processing system 400 configured as described above, first, the LCD substrate G placed in the cassette C of the cassette stand 3 0 9 of the cassette station 3 01 is directly transported by the transport device 3 1 1 The exciton UV irradiation unit (e-UV) 3 2 2 of the processing station 3 2 performs processing before eradication. Next, the L C D substrate G is transported into the scouring and washing unit (S C R) 3 2 1 by the conveying device 3 1 1 to be scoured and washed. After the scouring and washing process, the L C D substrate G is transported, for example, by a roller to the heat treatment unit block (TB) 3 3 1 which is the first heat treatment unit block 3 2 6 and the transfer unit (P A S S) 3 6 1. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs
配置在傳遞單元（PASS) 36 1的LCD基板G 最初運送至熱處理單元塊（T B ) 3 3 1的脫水烘烤單元 (DHP) 362、363的任一方，進行加熱處理，接 著，被運送至熱處理單元塊（TB) 332的冷卻單元（ C〇L) 366、367的任一方，進行冷卻後，爲了提 高抗鈾劑的固著性，運送到熱處理單元塊（T B ) 3 3 1 的附著處理單元（AD) 3 6 4，及熱處理單元塊（TB - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（年 (請先閱讀背面之注意事項再填寫本頁) )332的附著處理單元（AD) 368的任一方，在此 藉HMD S進行附著處理。然後，L C D基板G被運送到 冷卻單元（C〇L) 366、367的任一方，進一步運 送到熱處理單元塊（TB) 3 32的傳遞單元（PASS )3 6 5。如此進行一連串的處理時的L C D基板G的運 送處理全由第1運送裝置3 3 3擔任。 配置在傳遞單元（P AS S) 3 6 5的L CD基板G 由抗蝕劑處理單元3 2 3的運送臂運進抗蝕劑處理單元 3 2 3內。L CD基板G在抗蝕劑塗抹處理裝置（CT) 3 2 3 a迴旋塗抹抗鈾劑液後，運送至減壓乾燥裝置（ V D ) 3 2 3 b減壓乾燥，再運送至周緣抗蝕劑去除裝置 (E R ) 3 2 3 c去除L C D基板G周緣的多餘的抗蝕劑 。而在去除周緣的抗蝕劑後，L C D基板G則經運送臂從 抗蝕劑處理單元3 2 3移交給屬於第2熱處理單元區 3 2 7的熱處理單元塊（TB) 3 3 4的傳遞單元（ P A S S ) 3 6 9。 經濟部智慧財產局員工消費合作社印製 配置在傳遞單元（PASS) 369的LCD基板G 由第2運送裝置3 3 6運送至熱處理單元塊（TB ) 334 的預烘烤單元（PREBAKE) 370、371 、372，及熱處理單元塊（TB) 335的預烘烤單元 (PREBAKE ) 3 7 5、3 7 6的任一方，進行預烘烤，然 後，運送到熱處理單元塊（TB) 335的冷卻單元（ C〇L) 374，冷卻到一定溫度。而由第2運送裝置 3 3 6再運送至熱處理單元塊（TB) 3 3 5的傳遞單元 ___- 4Q -__ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（命 (P A S S ) 3 7 3。 (請先閲讀背面之注意事項再填寫本頁) 此後，L CD基板G則由第2運送裝置3 3 6運送至 界面站303的擴充、冷卻台（EXT、COL) 344 ，由界面站3 0 3的運送裝置3 4 2運送至外部裝置塊 345的周邊曝光裝置（EE)，進行去除周邊抗鈾劑的 曝光，接著，由運送裝置342運送至曝光裝置304， 在此對L C D基板G上的抗蝕劑膜進行曝光，形成一定的 圖案。有時是將LCD基板G收容在緩衝台（BUF) 3 4 3上的緩衝器卡匣後再運送至曝光裝置3 0 4。 完成曝光後，L CD基板G由界面站3 0 3的運送裝 置3 4 2運進至外部裝置塊3 4 5上層的字幕攝影機（ TITLER )，在L C D基板G記錄一定的資訊後，載置於擴 充、冷卻台（EXT、C〇L) 344。LCD基板G由 第2運送裝置3 36從擴充、冷卻台（EXT、COL) 3 4 4運送至屬於第2熱處理單元區3 2 7的熱處理單元 塊（TB) 335的傳遞單元（PASS) 373。 經濟部智慧財產局員工消費合作社印製 令從傳遞單元（PASS) 373延伸至顯像處理單 元（D E V ) 3 2 4的例如滾筒運送機構動作，將L C D 基板G從傳遞單元（P A S S ) 3 7 3運進顯像處理單元 (D E V ) 3 2 4，在此施加顯像處理。此項顯像處理製 程將詳述於後。 顯像處理後，L C D基板G則從連在顯像處理單元（ D E V ) 3 2 4的運送機構，例如滾筒運送機構運送至i 線U V照射單元（i 一 U V ) 3 2 5，對L C D基板G施 _____— - fin - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） 569288 A7 B7 五、發明説明（爷 加脫色處理。然後，L C D基板G則由i線u V照射單元 (i 一 U V ) 3 2 5內的滾筒運送機構運出到屬於第3熱 處理單元區3 2 8的第2熱處理單元區3 2 7的傳遞單元 (PASS) 3 7 7。 配置在傳遞單元（PASS) 377的LCD基板G 由第3運送裝置3 3 9運送到熱處理單元塊（TB) 337的後烘烤單元（P〇BAKE) 378、379、 380及熱處理單元塊（TB) 338的後烘烤單元（ POBAKE) 381、383、384的任一方，進行後烘烤 處理，然後，運送至熱處理單元塊（TB) 338的傳遞 、冷卻單元（PASS、COL) 3 8 2，冷卻至一定的 溫度後，由卡匣站3 0 1的運送裝置3 1 1收容於配置在 卡匣站3 0 1的一定的卡匣C。 其次，詳細說明顯像處理單元（D E V ) 3 2 4的構 造。第23圖是表示顯像處理單元（DEV) 324的槪 略構造的側面圖。第2 4圖是表示其槪略平面圖。顯像處 理單元（DEV) 324由：引進區324a 、第1顯像 液供應區3 2 4 b、第2顯像液供應區3 2 4 c、澄乾/ 洗淨區3 2 4 d、洗淨區3 2 4 e、乾燥區3 2 4 f所構 成’引進區324a鄰近熱處理單元塊（TB) 335的 傳遞單元（P A S S ) 3 7 3，乾燥區3 2 4 f鄰近i線 U V照射單元（i — u V ) 3 2 5。 在傳遞單元（P A S S ) 3 7 3與i線U V照射單元 (i 一 U V ) 3 2 5的間設有，藉由馬達等驅動使滾筒 --—____-51^___ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) 裝·The LCD substrate G disposed in the transfer unit (PASS) 36 1 is first transported to any of the dehydration baking units (DHP) 362 and 363 of the heat treatment unit block (TB) 3 3 1 and then heat-treated, and then is transported to the heat treatment Either the cooling unit (COL) 366 or 367 of the unit block (TB) 332 is cooled and then transported to the adhesion processing unit of the heat treatment unit block (TB) 3 3 1 in order to improve the adhesion of the uranium resistance agent. (AD) 3 6 4 and heat treatment unit block (TB-This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 569288 A7 B7 V. Description of invention (year (please read the notes on the back before filling Any one of the attachment processing unit (AD) 368 of 332), 332, is here attached by HMD S. Then, the LCD substrate G is transported to any of the cooling units (C0L) 366, 367, and further transported The transfer unit (PASS) 3 6 5 to the heat treatment unit block (TB) 3 32. The LCD substrate G is handled by the first transfer device 3 3 3 when a series of processes are performed in this manner. The transfer unit (P AS S) 3 6 5 L CD substrate G The transport arm of the etchant processing unit 3 2 3 is carried into the resist processing unit 3 2 3. The L CD substrate G is rotatably applied with the anti-uranium agent solution in the resist application processing device (CT) 3 2 3 a, and then transported to The reduced-pressure drying device (VD) 3 2 3 b is dried under reduced pressure, and then transported to the peripheral resist removal device (ER) 3 2 3 c to remove excess resist on the peripheral edge of the LCD substrate G. The resist on the peripheral edge is removed. After the application, the LCD substrate G is transferred from the resist processing unit 3 2 3 to the heat treatment unit block (TB) 3 3 4 and the transfer unit (PASS) 3 6 9 belonging to the second heat treatment unit area 3 2 7 via the transfer arm. The LCD substrate G installed in the pass-through unit (PASS) 369 is printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The second transfer device 3 3 6 is transported to the pre-baking unit (PREBAKE) 370, 371 of the heat treatment unit block (TB) 334. , 372, and the pre-baking unit (PREBAKE) 3 7 5 and 3 7 6 of the heat treatment unit block (TB) 335 are pre-baked, and then transported to the cooling unit of the heat treatment unit block (TB) 335 ( C0L) 374, cooled to a certain temperature, and then transported to the heat treatment by the second transport device 3 3 6 Element block (TB) transmission unit 335 of the present paper ___- 4Q -__ applicable China National Standard Scale (CNS) A4 size (210X297 mm) 569288 A7 B7 V. Description of the Invention (life (P A S S) 3 7 3. (Please read the precautions on the back before filling in this page.) Thereafter, the L CD substrate G is transported by the second transport device 3 3 6 to the expansion and cooling station (EXT, COL) 344 of the interface station 303 and from the interface station 3 0 3 transport device 3 4 2 is transported to the peripheral exposure device (EE) of the external device block 345 to perform exposure for removing the peripheral anti-uranium agent, and then transported by the transport device 342 to the exposure device 304, where the LCD substrate G The resist film is exposed to form a certain pattern. In some cases, the LCD substrate G is stored in a buffer cassette on a buffer stage (BUF) 3 4 3 and then transported to the exposure device 3 04. After the exposure is completed, the L CD substrate G is transported from the interface station 3 3 transport device 3 4 2 to the external device block 3 4 5 subtitle camera (TITLER). After recording certain information on the LCD substrate G, it is placed on the Expansion, cooling stage (EXT, COL) 344. The LCD substrate G is transported from the expansion / cooling stage (EXT, COL) 3 4 4 by the second transfer device 3 36 to the transfer unit (PASS) 373 of the heat treatment unit block (TB) 335 belonging to the second heat treatment unit zone 3 2 7. The Printing Order for Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs extends from the transfer unit (PASS) 373 to the development processing unit (DEV). 3 2 4 For example, the roller transport mechanism operates to remove the LCD substrate G from the transfer unit (PASS) 3 7 3 It is carried into a development processing unit (DEV) 3 2 4 and development processing is applied here. This development process will be detailed later. After the development process, the LCD substrate G is transported from a transport mechanism connected to the development processing unit (DEV) 3 2 4 such as a roller transport mechanism to the i-ray UV irradiation unit (i-UV) 3 2 5 to the LCD substrate G. _____ —-fin-This paper size is in accordance with Chinese National Standard (CNS) A4 (210X 297 mm) 569288 A7 B7 V. Description of the invention (Master plus decolorization treatment. Then, the LCD substrate G is illuminated by i-line u V The roller transport mechanism in the unit (i_UV) 3 2 5 is delivered to the transfer unit (PASS) 3 7 7 which belongs to the second heat treatment unit zone 3 2 7 of the third heat treatment unit zone 3 2 8. It is arranged in the transfer unit ( PASS) 377 LCD substrate G is transported by the third conveying device 3 3 9 to the post-baking unit (POBAKE) 378, 379, 380 of the heat treatment unit block (TB) 337 and the post-baking of the heat treatment unit block (TB) 338 One of the baking units (POBAKE) 381, 383, and 384 is subjected to post-baking treatment, and then transported to the transfer and cooling unit (PASS, COL) 3 8 2 of the heat treatment unit block (TB) 338 and cooled to a certain temperature Then, the transport device 3 1 1 at the cassette station 3 0 1 is accommodated in the cassette station 3 0 1 The fixed cassette C. Next, the structure of the development processing unit (DEV) 3 2 4 will be described in detail. FIG. 23 is a side view showing a schematic structure of the development processing unit (DEV) 324. FIG. Shows a schematic plan view. The development processing unit (DEV) 324 consists of: introduction area 324a, first developer supply area 3 2 4 b, second developer supply area 3 2 4 c, and drying / cleaning area. 3 2 4 d, washing zone 3 2 4 e, drying zone 3 2 4 f 'the introduction zone 324a is adjacent to the heat treatment unit block (TB) 335 transfer unit (PASS) 3 7 3, and the drying zone 3 2 4 f is adjacent The i-ray UV irradiation unit (i — u V) 3 2 5. It is provided between the transfer unit (PASS) 3 7 3 and the i-ray UV irradiation unit (i-UV) 3 2 5, and the drum is driven by a motor or the like ---____- 51 ^ ___ This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page)
、1T 經濟部智慧財產局員工消費合作社印製 569288 A7 B7 五、發明説明（爷 3 1 7轉動，將滾筒3 1 7上的L C D基板G運送到一定 方向的滾筒運送機構3 1 4。令此滾筒運送機構3 1 4動 作，便可以將L C D基板G從傳遞單元（P A S S ) 3 7 3通過顯像處理單元（D E V ) 3 2 4向i線U V照 射單元（i一UV) 325運送。滾筒317是在LCD 基板G的運送方向及垂直於此方向配設多數個，藉此使 L C D基板G不會在其上產生撓曲。 再者，第2 4圖未表示此滾筒運送機構3 1 4。同時 ，在顯像處理單元（D E V ) 3 2 4最好是將此滾筒運送 機構3 1 4分割成例如L C D基板G的運送速度不相同的 領域，分開各領域獨立驅動。例如，L C D基板G在傳遞 單元（PASS) 373與引進區324a由第1馬達驅 動運送；在第1顯像液供應區3 2 4 b與澄乾/洗淨區 3 2 4 d間以第2馬達驅動運送；在洗淨區3 2 4 e與乾 燥區3 2 4 f以第3馬達驅動運送。這種滾筒運送機構 3 1 4的分割驅動，可以例如按構成顯像處理單元（ DEV) 324的區域實施。 滾筒運送機構3 1 4在後示的第2 5A圖〜第2 5 C 圖表示有詳細的架構。第2 5A圖〜第2 5 C圖是表示設 在澄乾/洗淨區3 2 4 d的基板傾斜機構4 1 0 (以後詳 細說明）的架構的平面圖及側面圖。如第2 5 A圖〜第 2 5 C圖所示，滾筒運送機構3 1 4是延伸在L C D基板 G的運送方向（X方向），具備有：由馬達3 15使其在 X軸周圍轉動的樞軸318a ;固定在樞軸318a ，在 ___- R9 -___ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) -裝· 訂 經濟部智慧財產局員工消費合作社印製 569288 A7 B7 五、發明説明（竽 X軸周圍轉動的第1齒輪318b;在LCD基板G的寬 度方向（Y方向）較長’以一定間隔安裝有滾筒3 1 7的 樞軸3 1 9 a ;以咬合於第1齒輪3 1 8 b狀安裝於樞軸 3 1 9 a的一端，將第1齒輪3 1 8 b的X軸周圍的轉動 變換成Y軸周圍的轉動的第2齒輪3 1 9 b ;安裝在樞軸 3 1 9 a的另一端，藉由第2齒輪3 1 9 b的轉動而經由 樞軸3 19 a轉動的第3齒輪3 19b’ ：在X軸周圍轉 動自如的樞軸3 1 8 a ’ ：以咬合於第3齒輪3 1 9 b ’ 狀安裝於樞軸3 1 8 a ’ ，將第3齒輪3 1 9 b ’的Y軸 周圍的轉動變換成X軸周圍的轉動的第4齒輪3 1 8 b ’ 〇 在滾筒運送機構3 1 4，令樞軸3 1 9 a轉動的驅動 部由，樞軸3 1 8 a、桌1國輪3 1 8b、第2齒輪 3 1 9b、馬達3 1 5所構成。再者，第3齒輪 3 19b 第4齒輪318b’用以支持樞軸319a ， 以便使樞軸3 1 9 a順暢轉動。 傳遞單元（PASS) 373備有昇降自如的昇降梢 3 1 6。當以保持L C D基板G的第2運送裝置3 3 6的 基板保持臂394進入傳遞單元（PASS) 373內的 狀態下使昇降梢3 1 6上昇時，L C D基板G則由基板保 持臂3 9 4移交至昇降梢3 1 6。接著，令基板保持臂 3 9 4從傳遞單元（PASS) 3 7 3退出後使昇降梢 3 1 6下降’ L CD基板G便被載置於傳遞單元（ PASS) 373內的滾筒317上。由於驅動第1馬達 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) •裝· 訂 經濟部智慧財產局員工消費合作社印製 569288 A7 B7 五、發明説明（字 3 1 5 a，LCD基板G便從傳遞單元（PASS) 373運出到引進區324a。 (請先閲讀背面之注意事項再填寫本頁) 引進區3 2 4 a是當作緩衝領域設在傳遞單元（ P A S S ) 3 7 3與第1顯像液供應區3 2 4 b之間，此 引進區3 2 4 a可以防止顯像液從第1顯像液供應區 324b飛濺到傳遞單元（PASS) 373，污染到傳 遞單元（PASS) 373。 第1顯像液供應區3 2 4 b是對從引進區3 2 4 a運 送過來的L C D基板G進行最初的顯像液的盛液的區域， 具備有：對L C D基板G塗抹顯像液的主吐出顯像液用噴 嘴3 5 1 a及副吐出顯像液用噴嘴3 5 1 b (以下稱作「 顯像用噴嘴3 5 1 a、3 4 1 b」）的兩個噴嘴；X方向 延伸的導軌359 ;嵌合於導軌359的滑動臂358 ; 令滑動臂3 5 8沿導軌3 5 9向X方向移動的未圖示的驅 動機構；安裝在滑動臂3 5 8的未圖示的昇降機構’而顯 像用噴嘴3 5 1 a、3 5 1 b則安裝在此昇降機構。 顯像用噴嘴3 5 1 a、3 5 1 b由未圖示的顯像液供 經濟部智慧財產局員工消費合作社印製 應源供應顯像液，而在由昇降機構調整顯像用噴嘴 3 5 1 a、3 5 1 b與L C D基板G的間隔後，令顯像用 噴嘴351a、351b向與LCD基板G的運送方向相 反的方向移動，同時由顯像用噴嘴351a、351b向 L C D基板G吐出顯像液，將顯像液塗抹在L C D基板G 〇 顯像用噴嘴3 5 1 a、3 5 1 b可以使用在LCD基 _________: 54 ' 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（竽 板G的寬度方向（Y方向）較長（參照第2 4圖），其下 端沿長度方向形成有開縫狀的吐出口，可以從該吐出口吐 出略成帶狀的顯像液的構造者。顯像用噴嘴3 5 1 a、 3 5 1 b也可以使用，取代開縫狀的吐出口而以一定間隔 形成有多數圓形吐出口者。 將在第1顯像液供應區3 2 4 b塗抹過顯像液的 L CD基板G運送至澄乾/洗淨區3 2 4 d期間，有時會 從L C D基板G掉落顯像液。爲了防止如此在L C D基板 G的運送期間從L C D基板G掉落的顯像液使顯像反應無 法進行，在第2顯像液供應區3 2 4 c向L C D基板G補 充顯像液。 在第2顯像液供應區3 2 4 c以其長度方向成爲γ方 向的狀態固定配設有構造與顯像用噴嘴3 5 1 a、 3 5 1 b相同的顯像液補充用噴嘴3 5 1 c。從顯像液補 充用噴嘴3 5 1 c向由滾筒運送機構3 1 4運送的LCD 基板G上吐出Y方向較長的略成帶狀的顯像液。再者，此 第2顯像液供應區3 2 4 c並非必須。 在L C D基板G的顯像反應是在從第1顯像液供應區 3 2 4 b運送至澄乾/洗淨區3 2 4 d間進行。在澄乾/ 洗淨區3 2 4 d，將L C D基板G變換成傾斜姿勢，使 L C D基板G上的顯像液流至下方，再以將L C D基板G 保持在傾斜姿勢的狀態，從吐出洗淨液用噴嘴3 5 2向 L C D基板G的表面吐出洗淨用液體’例如純水，洗掉 L C D基板G上的顯像液。 ______- fif；. __ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閱讀背面之注意事項再填寫本頁) -裝_ 訂 經濟部智慧財產局員工消費合作社印製 569288 A7 B7 五、發明説明（竽 在澄乾/洗淨區3 2 4 d設有：藉由將L CD基板G 變換成傾斜姿勢，澄乾塗抹在L C D基板G上的顯像液的 基板傾斜機構4 1 0 ;向由基板傾斜機構4 1 0保持成傾 斜姿勢的L C D基板G的表面供應洗淨顯像液的洗淨用7jc (純水）的洗淨液供應機構3 6 0 ;回收從由基板傾斜機 構4 1 0保持成傾斜姿勢的L C D基板G掉落的顯像液的 顯像液回收容器3 4 7 ;回收從洗淨液供應機構3 6 0供 給的洗淨液等的洗淨液回收容器3 4 9。 第2 5 A圖是表示基板傾斜機構4 1 0的槪要構造的 平面圖，第2 5 B圖是表示未令基板傾斜機構4 1 0動作 的狀態的槪要側面圖，第2 5 C圖是表示令基板傾斜機構 4 1 0動作，將L C D基板G保持成傾斜姿勢的狀態的槪 要側面圖。 基板傾斜機構4 1 0具備有：抵接於L C D基板G背 面的一定位置的滾筒4 0 1與連結滾筒4 0 1的軸構件 4 0 2 a構成的支持構件；保持軸構件4 0 2 a的框架構 件4 0 3 ;令框架構件4 0 3的一端昇降的昇降機構 4 0 6 ;以及，令框架構件4 0 3的一端上昇時，防止由 滾筒4 0 1支持成斜方向的L C D基板G滑落而支持 L C D基板G的下端端面的導梢4 〇 4。在軸構件 4 0 2 a與框架構件4 0 3間，由安裝在軸構件4 0 2 a 的兩端部的連結工具4 0 2 b連結在一起。 沿Y方向以一定間隔在軸構件4 0 2 a安裝有多數滾 筒4 0 1 ，而安裝滾筒4 0 1的軸構件4 0 2 a則在X方 _______- fip;- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝· 訂 經濟部智慧財產局員工消費合作社印製 569288 A7 B7 五、發明説明（笋 (请先閲讀背面之注意事項再填寫本頁) 向以一定間隔安裝有框架構件4 0 3。如此，滾筒4 0 1 抵接在L C D基板G的背面支持L CD基板G時，不會使 LCD基板G撓曲。滾筒401在軸構件402a周圍成 轉動自如狀，L CD基板G變換姿勢時，L CD基板G與 滾筒4 0 1的摩擦力使滾筒4 0 1隨著L CD基板G的移 動而轉動。如此，可以防止在L C D基板G的背面生成擦 傷痕。 爲了以L C D基板G的背面接觸於滾筒3 1 7上端的 狀態下，由滾筒運送機構3 1 4將L C D基板G運進澄乾 /洗淨區324d，再運出至洗淨區324e ，而在澄乾 /洗淨區3 2 4 d運送L C D基板G時，避免滾筒4 0 1 阻礙L C D基板G的運送，滾筒4 0 1的上端保持在與滾 筒3 1 7的上端相同的位置，或較滾筒3 1 7的上端低。 經濟部智慧財產局員工消費合作社印製 框架構件4 0 3的未安裝昇降機構4 0 6的另一端是 由軸構件4 0 5加以支持。框架構件4 0 3在此軸構件 4 0 5周圍成轉動自如狀，藉由昇降機構4 0 6抬高框架 構件4 0 3的一端時，框架構件4 0 3可轉動，被保持成 以一定角度傾斜的狀態。令框架構件4 0 3傾斜時，由滾 筒3 1 7支持的L C D基板G則改由滾筒4 0 1支持而變 換成傾斜姿勢。 導梢4 0 4是配置成其上端位於運送中的L C D基板 G的背面的下方，以免在 澄乾/洗淨區3 2 4 d運送L C D基板G時，阻礙到 L CD基板G的運送。同時，導梢4 0 4在以昇降機構 ____-R7 -_ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 ____ B7 五、發明説明（荠 4 0 6使框架構件4 0 3傾斜時向上方突出以支持L C D 基板G的下方端面，防止L C D基板G滑落。 (請先閱讀背面之注意事項再填寫本頁} 昇降機構4 0 6以抬高L CD基板G的運送方向前方 側（洗淨區3 2 4 e側）的方式使框架構件4 0 3轉動。 在第1顯像液供應區3 2 4 b，從L C D基板G的運送方 向前方側在L C D基板G上塗抹顯像液時，抬高L C D基 板G的開始塗抹顯像液的端面側使顯像液從L C D基板G 流下，可以藉此使L C D基板G整體的顯像液接觸L C D 基板G的時間均一化。如此，可以抑制發生顯像不均，提 高線寬均一性。 如此，基板傾斜機構4 1 0造成的L C D基板G的傾 斜角度Θ以1 0度以上爲佳。傾斜角度Θ未滿1 〇度時顯像 液的澄乾時間會超過1秒，基板面內的顯像時間差太大， 有可能會產生顯像不均。另一方面，若傾斜角度Θ在1 〇度 以上時，則不會上述問題，但超過1 5度時，傾斜時的澄 乾速度在0 · 6〜0 · 7秒前後便穩定下來，效果會飽和 ，因此，1 5秒以下較佳。當然可以在1 5度以上。 經濟部智慧財產局員工消費合作社印製 藉基板傾斜機構4 1 0使L C D基板G傾斜時，從 L C D基板G流下的顯像液被回收到顯像液回收容器 3 4 7。回收到顯像液回收容器3 4 7的濃度高的顯像液 被送到回收線以供回收。顯像液回收容器3 4 7設有可移 動的蓋體3 4 8，可防止混合有洗淨液的濃度低的顯像液 或洗淨液混進顯像液回收容器3 4 7。 洗淨液供應機構3 6 0備有：可以噴出用以沖洗保持 _______- fiR - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（$6 (請先閲讀背面之注意事項再填寫本頁) 成傾斜姿勢的L C D基板G的顯像液殘渣的洗淨液例如純 水的吐出洗淨液用噴嘴3 5 2 ;可令吐出洗淨液用噴嘴 3 5 2沿著保持成傾斜姿勢的L C D基板G表面斜向以一 定速度移動的洗淨用噴嘴移動機構3 8 5。洗淨用噴嘴移 動機構3 8 5備有：與L C D基板G的傾斜角度Θ相同角度 配置的導軌3 8 6 ;嵌合於導軌3 8 6，且保持吐出洗淨 液用噴嘴3 5 2的噴嘴保持臂3 8 7 ;及使噴嘴保持臂 3 8 7沿著導軌3 8 6移動的驅動機構3 8 8。 可以令吐出洗淨液用噴嘴3 5 2，由基板傾斜機構 4 1 0保持成傾斜姿勢的L C D基板G的上方端至下方端 ，沿著L C D基板G的表面移動，同時從吐出洗淨液用噴 嘴3 5 2向L C D基板G吐出洗淨液，去除L C D基板G 的顯像液殘渣。因爲吐出洗淨液用噴嘴3 5 2可以高速， 例如以2 0 0 m m /秒以上的速度進行洗淨，藉此減輕基 板面內的尺寸參差不齊之影響，因此，能夠在短時間內去 除L C D基板G的顯像液殘渣。 經濟部智慧財產局員工消費合作社印製 爲了能有效率去除L C D基板G的顯像液殘渣，最好 使用能夠從吐出洗淨液用噴嘴3 5 2以一定的吐出壓力噴 出洗淨液者。同時，爲了要能使吐出洗淨液用噴嘴3 5 2 的1次移動在整個L C D基板G吐出洗淨液，吐出洗淨液 用噴嘴3 5 2最好使用可以在L CD基板G的寬度方向（ Y方向）較長，略成帶狀吐出洗淨液者。也可以從吐出洗 淨液用噴嘴3 5 2噴霧狀吐出洗淨液。 從吐出洗淨液用噴嘴3 5 2吐出的洗淨液的吐出壓力 __- 本紙張尺度適用中國國家標準（CNS ) A4規格（21〇'〆297公釐） 569288 A7 B7 五、發明説明（§7 (請先閲讀背面之注意事項再填寫本頁) 高，而且L C D基板G是保持成傾斜姿勢，因此，有可會g 使洗淨液從L C D基板0彈回飛濺到第2顯像液供應區 3 2 4 c。爲了防止此洗淨液的飛濺到第2顯像液供應區 3 2 4 c，在第2顯像液供應區3 2 4 c與澄乾/洗淨區 3 2 4 d間，最好能夠配置不會妨礙到L C D基板G的水 平運送高度的隔壁板3 4 6。從吐出洗淨液用噴嘴3 5 2 吐出的洗淨液由設在澄乾/洗淨區3 2 4 d的洗淨液回收 容器3 4 9回收，經由排液線廢棄。再者，吐出洗淨液用 噴嘴3 5 2也可以用液體刀刃構成。 經濟部智慧財產局員工消費合作社印製 在澄乾/洗淨區3 2 4 d，由於能夠以短時間完成從 利用基板傾斜機構4 1 0澄乾到使用洗淨液去除顯像液殘 渣的連串處理，因此可以使整體L C D基板G均等停止顯 像反應的進行。如此，可以抑制顯像不均，提高線寬度均 一性。同時，要進行從利用基板傾斜機構4 1 0澄乾到使 用洗淨液去除顯像液殘渣的連串處理時，可以考慮在第1 顯像液供應區3 2 4的顯像液的塗抹方向，而抬高L C D 基板G的開始塗抹顯像液的一側，使顯像液從L C D基板 G流下以澄乾液體，便可以進一步提高顯像精密度。 在洗淨區3 2 4 e安裝有可以向L CD基板G噴出純 水等的洗淨液的洗淨用噴嘴3 5 3。在洗淨區3 2 4 e ， 以一定速度運送L CD基板G，同時在L CD基板G的表 面及背面吐‘出洗淨液，澈底去除附著在L C D基板G的顯 像液及洗淨L C D基板G。再者，洗淨用噴嘴3 5 3具有 較L C D基板G的寬度長的形狀，可以在L C D基板G的 _______-fin - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） 569288 經濟部智慧財產局員工消費合作社印製 A7 B7__五、發明説明（羚 整個寬度方向吐出洗淨液。 運進通過洗淨區3 2 4 e的L C D基板G的乾燥區 3 2 4 f配設有，可以用一定的風壓噴射氮氣等乾燥氣體 的空氣噴嘴（空氣刀刃）354。在乾燥區324f ，以 一定速度運送L C D基板G同時在L C D基板G的表面及 背面噴射乾燥氣體，吹散附著在L C D基板G的洗淨液， 將L C D基板G乾燥。再者，空氣噴嘴3 5 4具有較 L C D基板G的寬度長的形狀，可以在L C D基板G的整 個寬度方向吐出乾燥氣體。結束乾燥處理的L C D基板G 則由滾筒運送機構3 1 4運送至i線U V照射單元（i - u V ) 3 2 5。 其次說明在顯像處理單元（D E V ) 3 2 4的顯像處 理工程。第2 6圖是表示顯像處理工程的槪要的說明圖（ 流程圖）。運進傳遞單元（PASS) 373的LCD基 板G由滾筒運送機構3 1 4通過引進區3 2 4 a運進第1 顯像液供應區3 2 4 b (步驟1 )。從傳遞單元（ P A S S ) 3 7 3至第1顯像液供應區3 2 4 b的L C D 基板G的運送速度爲，例如6 5 m m/秒。 在第1顯像液供應區3 2 4 b，使L C D基板G成爲 停止在一定位置的狀態（步驟2 )，而以例如2 4 0 m m /秒的高速使顯像用噴嘴3 5 1 a、3 5 1 b從基板運送 方向的前方向後方移動，同時在L C D基板G的表面塗抹 顯像液（步驟3 )。由於使L C D基板G成爲停止狀態， 顯像用噴嘴3 5 1 a、3 5 1 b的驅動會較容易。同時， _____-R1 -_ 本紙張尺度適用中國國家標準（CNS ) A4規格（210'〆297公釐） (請先閲讀背面之注意事項再填寫本頁) 569288 A7 B7 五、發明説明（今9 可以穩定將顯像液盛在L C D基板G上。 (請先閲讀背面之注意事項再填寫本頁) 在第1顯像液供應區3 2 4 b結束顯像液的塗抹後， 令滾筒運送機構3 1 4動作’以例如4 6 m m /秒的運送 速度將L C D基板G運送到第2顯像液供應區3 2 4 c ( 步驟4 )。在L C D基板G通過第2顯像液供應區3 2 4 c時，從顯像液補充用噴嘴3 5 1 c向L C D基板G上補 充顯像液，補充在運送L C D基板G時從L C D基板G掉 落的顯像液（步驟5 )。 運送到第2顯像液供應區3 2 4 c的L C D基板G貝ί] 進一步運送至澄乾/洗淨區3 2 4 d (步驟6 )，在此以 基板傾斜機構4 1 0使L C D基板G變換成傾斜姿勢，使 L C D基板G上的顯像液從L C D基板G流下（步驟7 ) 。如此，從L C D基板G上流下的顯像液則由顯像液回收 容器3 4 7回收，移送至回收線。 經濟部智慧財產局員工消費合作社印製 差不多與L C D基板G到達傾斜角度Θ的同時，從吐出 洗淨液用噴嘴3 5 2向L C D基板G吐出洗淨液例如純水 ，同時令吐出洗淨液用噴嘴3 5 2沿著L C D基板G的表 面，以例如5 0 0 m m /秒的速度移動（步驟8 )。這個 時候，爲了避免洗淨液混入顯像液回收容器3 4 7，以蓋 體3 4 8封閉顯像液回收容器3 4 7的開口部。 在此步驟7，最好能縮短使L C D基板G變換到傾斜 姿勢時的動作時間。同時，在L C D基板G被保持成一定 角度的傾斜姿勢後，最好能夠儘速開始從吐出洗淨液用噴 嘴3 5 2的洗淨液的供應，進行停止顯像反應的步驟8。 -R9 - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 B7 五、發明説明（妒 例如，如果在步驟7的L C D基板G的傾斜姿勢保持時間 較長，將會留下顯像液流下的痕跡或L C D基板G彈落顯 像液的部分，容易形成顯像不均。惟，若能在步驟7的後 迅速進行步驟8，便能夠防止發生顯像不均。 步驟7與步驟8的處理，可以由昇降機構4 0 6的動 作與吐出洗淨液用噴嘴3 5 2的高速移動，而在短時間內 完成，因此，能夠在L C D基板G整體使顯像反應均一停 止下來。在澄乾/洗淨區3 2 4 d的步驟7與步驟8的一 連串的處理，與第1顯像液供應區3 2 4 b的顯像液的塗 抹方向沒有關係，對抑制L C D基板G發生顯像不均及提 高線寬均一性有良好效果。此外，在步驟7的處理時，考 慮在第1顯像液供應區3 2 4 b的顯像液的塗抹方向，而 抬局L C D基板G的開始塗抹顯像液的一側，使顯像液從 L C D基板G流下，便可以進一步提高顯像精密度。 接著，L C D基板G被運送到洗淨區3 2 4 e (步驟 9)。在此，一面以一定速度運送LCD基板G，同時在 L C D基板G的表面及背面吐出洗淨液，澈底去除附著在 L C D基板G的顯像液並洗淨（步驟1 0 )。一面進行這 種洗淨處理同時通過洗淨區3 2 4 e的L C D基板G便被 運送到乾燥區3 2 4 f (步驟1 1 )。在乾燥區3 2 4 f ，則以一定速度運送L C D基板G，同時進行藉由空氣噴 嘴3 5 4的乾燥處理（步驟1 2 )。結束乾燥處理的 L C D基板G由滾筒運送機構3 1 4運送到i線U V照射 單元（i— UV) 325 (步驟13)，在此施加一定的 ___- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) -裝·Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, 1T, printed 569288 A7 B7 V. Description of the invention The roller conveyance mechanism 3 1 4 operates, and the LCD substrate G can be conveyed from the transfer unit (PASS) 3 7 3 through the development processing unit (DEV) 3 2 4 to the i-ray UV irradiation unit (i-UV) 325. The roller 317 A plurality of LCD substrates G are arranged in a direction perpendicular to the conveyance direction of the LCD substrate G, so that the LCD substrate G is not deflected. Note that the roller conveyance mechanism 3 1 4 is not shown in FIG. 24. At the same time, in the development processing unit (DEV) 3 2 4 it is better to divide this roller conveying mechanism 3 1 4 into areas where the conveying speed of the LCD substrate G is different, for example, and drive each area independently. For example, the LCD substrate G is The transfer unit (PASS) 373 and the introduction area 324a are driven by the first motor; they are driven by the second motor between the first developer supply area 3 2 4 b and the drying / washing area 3 2 4 d; The clean area 3 2 4 e and the dry area 3 2 4 f are driven by a third motor. This The divisional driving of the roller conveyance mechanism 3 1 4 can be performed, for example, in the area constituting the development processing unit (DEV) 324. The roller conveyance mechanism 3 1 4 is shown in detail in FIGS. 2A to 5C to 2C shown below. Framework. Figures 2A through 5C are plan and side views showing the framework of the substrate tilting mechanism 4 1 0 (described later in detail) provided in the drying / cleaning zone 3 2 4 d. See Figure 2 5 A to 2-5C, the roller conveyance mechanism 3 1 4 is a conveyance direction (X direction) extending in the LCD substrate G, and is provided with: a pivot 318a which is rotated by the motor 3 15 around the X axis; Fixed on pivot 318a, ___- R9 -___ This paper size applies Chinese National Standard (CNS) A4 (210X297 mm) (Please read the precautions on the back before filling this page) Printed by the Consumer Affairs Cooperative of the Property Bureau 569288 A7 B7 V. Description of the invention (竽 The first gear 318b rotating around the X axis; longer in the width direction (Y direction) of the LCD substrate G 'with the roller 3 1 7 installed at a certain interval Pivot 3 1 9 a; one that is fitted to the pivot 3 1 9 a in a shape that engages with the first gear 3 1 8 b The second gear 3 1 9 b is converted to the rotation around the X axis of the first gear 3 1 8 b; the second gear 3 1 9 b is mounted on the other end of the pivot 3 1 9 a; The third gear 3 19b 'which is rotated by the rotation of 1 9 b via the pivot 3 19 a: The pivot shaft 3 1 8 a' which rotates freely around the X-axis, and is attached to the third gear 3 1 9 b ' The pivot 3 1 8 a ′ converts the rotation around the Y-axis of the third gear 3 1 9 b ′ into the fourth gear 3 1 8 b ′ around the X-axis. The driving part for rotating the shaft 3 1 9 a is composed of a pivot 3 1 8 a, a table 1 national wheel 3 1 8b, a second gear 3 1 9b, and a motor 3 1 5. Furthermore, the third gear 3 19b and the fourth gear 318b 'are used to support the pivot 319a so that the pivot 3 1 9a can rotate smoothly. The pass-through unit (PASS) 373 is equipped with a free-lifting tip 3 1 6. When the substrate holding arm 394 of the second conveying device 3 3 6 holding the LCD substrate G is brought into the transfer unit (PASS) 373 and the lifting pin 3 1 6 is raised, the LCD substrate G is held by the substrate holding arm 3 9 4 Transfer to the lift pin 3 1 6. Next, the substrate holding arm 3 9 4 is withdrawn from the transfer unit (PASS) 3 7 3 and the lifter 3 1 6 is lowered. The CD substrate G is placed on a roller 317 inside the transfer unit (PASS) 373. Because the paper size of the first motor is driven by the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling out this page) A7 B7 V. Description of the invention (word 3 1 5 a, the LCD substrate G is carried out from the pass-through unit (PASS) 373 to the introduction area 324a. (Please read the precautions on the back before filling this page) Introduction area 3 2 4 a It is used as a buffer area between the transfer unit (PASS) 3 7 3 and the first developer supply area 3 2 4 b. The introduction area 3 2 4 a can prevent the developer from flowing from the first developer supply area. 324b splashed to the transfer unit (PASS) 373 and contaminated to the transfer unit (PASS) 373. The first developer supply area 3 2 4 b is the first development of the LCD substrate G transported from the introduction area 3 2 4 a. The liquid-receiving area includes a nozzle 3 5 1 a for the main discharge developer and a nozzle 3 5 1 b for the developer to apply the developer to the LCD substrate G (hereinafter referred to as "for development Nozzles 3 5 1 a, 3 4 1 b ″); two guides 359 extending in the X direction; fitted in the guide Sliding arm 358 of 359; driving mechanism (not shown) for moving the sliding arm 3 5 8 along the guide rail 3 5 9 in the X direction; lifting mechanism (not shown in the drawing) mounted on the sliding arm 3 5 8 and the imaging nozzle 3 5 1 a, 3 5 1 b are installed in this lifting mechanism. The imaging nozzles 3 5 1 a, 3 5 1 b are supplied by the developer solution of the Intellectual Property Bureau of the Ministry of Economic Affairs, and printed by Yingyuan. Developing liquid, and after the distance between the developing nozzles 3 5 1 a and 3 5 1 b and the LCD substrate G is adjusted by the lifting mechanism, the developing nozzles 351 a and 351 b are directed in a direction opposite to the conveying direction of the LCD substrate G While moving, the developing nozzles 351a and 351b eject the developing solution to the LCD substrate G, and apply the developing solution to the LCD substrate G. The developing nozzles 3 5 1 a, 3 5 1 b can be used on the LCD substrate _________ : 54 'This paper size is in accordance with Chinese National Standard (CNS) A4 (210X297 mm) 569288 A7 B7 5. Description of the invention (the width direction (Y direction) of the fascia G is longer (refer to Figure 24), and its lower end A slit-shaped discharge port is formed in the longitudinal direction, and a slightly band-shaped developing solution can be discharged from the discharge port. Manufacturers. The developing nozzles 3 5 1 a and 3 5 1 b can also be used. Instead of the slit-shaped discharge ports, a large number of circular discharge ports are formed at regular intervals. The first developer supply area 3 will be used. 2 4 b The L CD substrate G to which the developer is applied is transported to the clearing / washing area 3 2 4 d, the developer may drop from the LCD substrate G. In order to prevent the developing reaction from progressing due to the developing liquid dropped from the LCD substrate G during the transport of the LCD substrate G, the developing liquid is replenished to the LCD substrate G in the second developing liquid supply area 3 2 4 c. In the second developing solution supply area 3 2 4 c, the developing nozzles 3 5 1 a and 3 5 1 b having the same structure as those of the developing nozzles 3 5 4 are fixedly arranged so that the longitudinal direction becomes the γ direction. 1 c. From the developing solution replenishing nozzle 3 5 1 c, the developing solution in a slightly band shape with a long Y-direction is ejected onto the LCD substrate G conveyed by the roller conveying mechanism 3 1 4. The second developer supply area 3 2 4 c is not necessary. The development reaction on the L C D substrate G is carried out from the first developing solution supply area 3 2 4 b to the drying / cleaning area 3 2 4 d. In the drying / cleaning area 3 2 4 d, the LCD substrate G is changed to an inclined posture, so that the developing liquid on the LCD substrate G flows downward, and then the LCD substrate G is maintained in the inclined posture, and the liquid is washed out from the spit. The cleaning nozzle 3 5 2 discharges a cleaning liquid, such as pure water, onto the surface of the LCD substrate G to wash off the developing liquid on the LCD substrate G. ______- fif ;. __ This paper size applies to Chinese National Standard (CNS) A4 (210X297 mm) (Please read the precautions on the back before filling this page)-_ Order printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Consumption Cooperative 569288 A7 B7 V. Description of the invention (竽 In the Chenggan / cleaning area 3 2 4 d, it is provided that: by changing the L CD substrate G to a tilted posture, the substrate of the developer solution applied on the LCD substrate G is tilted. Mechanism 4 1 0; 7jc (pure water) cleaning liquid supply mechanism 3 6 0 for cleaning developer supply to the surface of the LCD substrate G held by the substrate tilting mechanism 4 1 0 in an inclined posture; 3 60; A developing solution recovery container 3 4 7 for the developing solution dropped from the LCD substrate G held by the substrate tilting mechanism 4 1 0 in an inclined posture, and the cleaning liquid, such as cleaning liquid, supplied from the cleaning liquid supply mechanism 360, is recovered. Liquid recovery container 3 4 9. Figure 2 5A is a plan view showing the essential structure of the substrate tilting mechanism 4 1 0, and Figure 2 5 B is a essential side view showing the state in which the substrate tilting mechanism 4 1 0 is not operated. Fig. 2 5C shows that the substrate tilting mechanism 4 1 0 is operated to hold the LCD substrate G. The main side view of the state of the tilt posture. The substrate tilting mechanism 4 1 0 is provided with a support of a roller 4 0 1 and a shaft member 4 0 2 a connecting the roller 4 0 1 at a fixed position on the rear surface of the LCD substrate G. A frame member 4 0 3 that holds the shaft member 4 0 2 a; a lifting mechanism 4 6 that raises and lowers one end of the frame member 4 0 3; and prevents the roller 40 from being lifted by one end of the frame member 4 3 1 A guide pin 4 that supports the LCD substrate G slanting in a slanting direction and supports the lower end surface of the LCD substrate G. Between the shaft member 4 0 2 a and the frame member 4 0 3, the shaft member 4 2 a The connecting tools 4 0 2 b at both ends are connected together. A plurality of rollers 4 0 1 are mounted on the shaft member 4 0 2 a at a certain interval in the Y direction, and the shaft member 4 0 2 a on which the roller 4 0 1 is mounted is at X Party _______- fip;-This paper size applies to China National Standard (CNS) A4 (210X297 mm) (Please read the precautions on the back before filling this page) System 569288 A7 B7 V. Description of the invention (bamboo shoots (please read the notes on the back first) (Fill in this page again.) The frame members 403 are mounted at regular intervals. In this way, when the roller 401 abuts against the back of the LCD substrate G and supports the L CD substrate G, the LCD substrate G is not deflected. The roller 401 is The periphery of the shaft member 402a is freely rotatable. When the L CD substrate G changes posture, the friction force between the L CD substrate G and the roller 401 causes the roller 401 to rotate as the L CD substrate G moves. In this way, it is possible to prevent the generation of scratches on the back surface of the L C D substrate G. In order to bring the LCD substrate G into the drying / cleaning area 324d by the roller conveying mechanism 3 1 4 in a state that the back surface of the LCD substrate G is in contact with the upper end of the roller 3 1 7, the LCD substrate G is transported out to the cleaning area 324e. When the LCD substrate G is transported in the drying / cleaning area 3 2 4 d, avoid the roller 4 0 1 from obstructing the conveyance of the LCD substrate G. The upper end of the roller 4 0 1 is kept at the same position as the upper end of the roller 3 1 7 or more than the roller. The upper end of 3 1 7 is low. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The other end of the frame member 4 0 3 without the lifting mechanism 4 6 is supported by a shaft member 4 5. The frame member 4 0 3 can rotate freely around the shaft member 4 0 5. When one end of the frame member 4 0 3 is raised by the lifting mechanism 4 0 6, the frame member 4 3 can be rotated and held at a certain angle. A tilted state. When the frame member 4 0 3 is tilted, the L C D substrate G supported by the roller 3 1 7 is changed to the tilted posture by the roller 4 0 1. The guide pins 4 0 4 are arranged so that their upper ends are located below the back surface of the L C D substrate G being transported, so as to prevent the L CD substrate G from being transported when the L C D substrate G is transported in the drying / cleaning area 3 2 4 d. At the same time, the guide pin 4 0 4 is in the lifting mechanism ____- R7 -_ This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 569288 A7 ____ B7 V. Description of the invention (荠 4 0 6 makes the frame member 4 0 3 Protrudes upward to support the lower end face of LCD substrate G when tilted to prevent LCD substrate G from slipping. (Please read the precautions on the back before filling this page} Lifting mechanism 4 6 6 to raise the transport of L CD substrate G The frame member 4 0 3 is rotated toward the front side (washing area 3 2 4 e side). In the first developing liquid supply area 3 2 4 b, the LCD substrate G is moved from the front side to the LCD substrate G in the conveying direction. When applying the developer, raise the end surface of the LCD substrate G where the developer is applied. This will cause the developer to flow down from the LCD substrate G. This allows the time during which the entire developer of the LCD substrate G contacts the LCD substrate G to be uniform. In this way, it is possible to suppress development unevenness and improve the uniformity of the line width. In this way, the tilt angle Θ of the LCD substrate G caused by the substrate tilt mechanism 4 10 is preferably 10 degrees or more. The tilt angle Θ is less than 10 degrees The drying time of the imaging solution will exceed 1 second. The development time difference is too large, which may cause uneven development. On the other hand, if the inclination angle Θ is more than 10 degrees, the above problem will not occur, but when it is more than 15 degrees, the drying speed at the time of inclination It stabilizes around 0 · 6 ~ 0 · 7 seconds, and the effect will be saturated. Therefore, it is better to be less than 15 seconds. Of course, it can be more than 15 degrees. 10 When the LCD substrate G is tilted, the developing solution flowing down from the LCD substrate G is recovered to the developing solution recovery container 3 4 7. The developing solution recovered to the developing solution recovery container 3 4 7 is sent to Recycling line for recycling. The developing solution recovery container 3 4 7 is provided with a removable cover 3 4 8 to prevent the low-concentration developing solution mixed with the cleaning solution or the cleaning solution from being mixed into the developing solution recovery container. 3 4 7. The cleaning liquid supply mechanism 3 6 0 has: can be sprayed for flushing and keeping _______- fiR-This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) 569288 A7 B7 V. Description of the invention ($ 6 (Please read the notes on the back before filling this page) The washing liquid for the developing liquid residue of the LCD substrate G in the posture is, for example, a nozzle 3 5 2 for discharging cleaning liquid of pure water; the nozzle 3 5 2 for discharging the cleaning liquid can be maintained along the surface of the LCD substrate G in an inclined posture. Washing nozzle moving mechanism 3 8 5 which moves obliquely at a constant speed. Washing nozzle moving mechanism 3 8 5 includes: a guide rail 3 8 6 arranged at the same angle as the inclination angle Θ of the LCD substrate G; fitted on the guide rail 3 8 6 and a nozzle holding arm 3 8 7 holding the nozzle 3 5 2 for discharging the cleaning solution; and a driving mechanism 3 8 8 for moving the nozzle holding arm 3 8 7 along the guide rail 3 8 6. The nozzle 3 5 2 for discharging the cleaning liquid can be moved along the surface of the LCD substrate G from the upper end to the lower end of the LCD substrate G held by the substrate tilting mechanism 4 1 0 in an inclined posture, and the cleaning liquid can be discharged from the same time. The nozzle 3 5 2 discharges the cleaning liquid to the LCD substrate G to remove the residue of the developing liquid of the LCD substrate G. The nozzle 352 for ejecting the cleaning solution can be cleaned at a high speed, for example, at a speed of 200 mm / sec or more, thereby reducing the effect of uneven size in the substrate surface, so it can be removed in a short time. Residue of the developing liquid of the LCD substrate G. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. In order to efficiently remove the residue of the developing liquid on the LCD substrate G, it is best to use a nozzle capable of ejecting the cleaning liquid from the cleaning liquid nozzle 3 5 2 at a constant discharge pressure. At the same time, in order to discharge the cleaning liquid nozzle 3 5 2 once, the cleaning liquid is discharged across the entire LCD substrate G, and the cleaning liquid nozzle 3 5 2 is preferably used in the width direction of the L CD substrate G. (Y direction) Long, spit out the washing liquid in a band. The cleaning solution may be sprayed from the nozzle 3 5 2 for discharging the cleaning solution. The discharge pressure of the cleaning liquid discharged from the nozzle 3 5 2 for discharging the cleaning liquid __- This paper size is applicable to the Chinese National Standard (CNS) A4 specification (21〇'〆297 mm) 569288 A7 B7 V. Description of the invention ( §7 (Please read the precautions on the back before filling this page) High, and the LCD substrate G is kept in an inclined posture, so there may be g so that the cleaning liquid rebounds from the LCD substrate 0 and splashes into the second developing liquid Supply area 3 2 4 c. In order to prevent the cleaning solution from splashing to the second developer supply area 3 2 4 c, the second developer supply area 3 2 4 c and the drying / cleaning area 3 2 4 Between d, it is desirable to arrange a partition wall 3 4 6 that does not hinder the horizontal conveyance height of the LCD substrate G. The cleaning liquid discharged from the nozzle 3 5 2 for cleaning liquid is provided in the drying / cleaning area 3 The 2 4 d washing liquid recovery container 3 4 9 was collected and discarded via the drain line. Furthermore, the nozzle 3 5 2 for discharging the washing liquid may also be constituted by a liquid blade. The clearing / cleaning area 3 2 4 d can be completed in a short time from the clearing using the substrate tilting mechanism 4 1 0 to the removal using the cleaning solution. A series of processing liquid residues can uniformly stop the development reaction of the entire LCD substrate G. In this way, it is possible to suppress development unevenness and improve line width uniformity. At the same time, the substrate tilt mechanism 4 1 is used. In the case of a series of processes ranging from 0-drying to the use of a cleaning solution to remove the developer residue, the application direction of the developer in the first developer supply area 3 2 4 may be considered, and the LCD substrate G may be lifted to start application. On the side of the image liquid, the development liquid can be drained from the LCD substrate G to dry the liquid, which can further improve the development accuracy. The cleaning area 3 2 4 e is equipped with a device that can spray pure water to the L CD substrate G. Cleaning nozzle for cleaning liquid 3 5 3. In the cleaning area 3 2 4 e, the L CD substrate G is conveyed at a certain speed, and at the same time, the cleaning liquid is ejected on the surface and the back of the L CD substrate G to remove the adhesion. The developing solution on the LCD substrate G and the LCD substrate G are cleaned. Furthermore, the cleaning nozzle 3 5 3 has a shape longer than the width of the LCD substrate G, and can be in the _______- fin of the LCD substrate G-this paper size Applicable to China National Standard (CNS) A4 specification (210X 297 mm) 569288 Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7__V. Description of the Invention (The cleaning solution is spit out across the entire width of the antelope. It is transported into the drying area 3 2 4 f of the LCD substrate G that passes through the cleaning area 3 2 4 e Yes, an air nozzle (air blade) 354 that can spray a dry gas such as nitrogen with a certain wind pressure. In the drying zone 324f, the LCD substrate G is transported at a certain speed while the dry gas is sprayed on the surface and back of the LCD substrate G to blow off the adhesion The LCD substrate G is dried in the washing liquid of the LCD substrate G. In addition, the air nozzle 3 5 4 has a shape longer than the width of the L C D substrate G, and can discharge the dry gas in the entire width direction of the L C D substrate G. The L C D substrate G after the drying process is transported to the i-line U V irradiation unit (i-u V) 3 2 5 by the roller transport mechanism 3 1 4. Next, the development processing process in the development processing unit (D E V) 3 2 4 will be described. Fig. 26 is a key explanatory diagram (flow chart) showing a development process. The LCD substrate G carried in the transfer unit (PASS) 373 is carried by the roller conveyance mechanism 3 1 4 through the introduction area 3 2 4 a into the first developer supply area 3 2 4 b (step 1). The conveyance speed of the L C D substrate G from the transfer unit (PASS) 3 7 3 to the first developer supply area 3 2 4 b is, for example, 6 5 m / s. In the first developing liquid supply region 3 2 4 b, the LCD substrate G is stopped at a certain position (step 2), and the developing nozzle 3 5 1 a is developed at a high speed of, for example, 240 mm / sec. 3 5 1 b While moving from the front to the rear of the substrate conveyance direction, apply a developing solution to the surface of the LCD substrate G (step 3). Since the L C D substrate G is stopped, driving of the developing nozzles 3 5 1 a and 3 5 1 b is easy. At the same time, _____- R1 -_ This paper size applies to Chinese National Standard (CNS) A4 specification (210'〆297 mm) (Please read the precautions on the back before filling this page) 569288 A7 B7 V. Description of the invention (now 9 The developer can be stably stored on the LCD substrate G. (Please read the precautions on the back before filling in this page.) In the first developer supply area 3 2 4 b, after the application of developer is finished, let the roller transport mechanism 3 1 4 action 'transports the LCD substrate G to the second developer supply area 3 2 4 c at a transport speed of 46 mm / sec, for example (step 4). The LCD substrate G passes through the second developer supply area 3 At 2 4 c, the developing liquid is replenished to the LCD substrate G from the developing liquid replenishing nozzle 3 5 1 c, and the developing liquid dropped from the LCD substrate G when the LCD substrate G is transported (step 5). The LCD substrate G of the second developing liquid supply area 3 2 4 c is further transported to the clearing / washing area 3 2 4 d (step 6), and the LCD substrate G is converted by the substrate tilting mechanism 4 1 0 here. In an inclined posture, the developing liquid on the LCD substrate G flows down from the LCD substrate G (step 7). In this way, the developing liquid flowing down from the LCD substrate G It will be recovered from the developer recovery container 3 4 7 and transferred to the recovery line. The employee cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs prints the LCD substrate G at approximately the same angle as the LCD substrate G, and the cleaning solution is ejected from the nozzle 3 5 2 The LCD substrate G discharges a cleaning liquid such as pure water, and at the same time, the nozzle 3 2 for discharging the cleaning liquid is moved along the surface of the LCD substrate G at a speed of, for example, 500 mm / sec (step 8). At this time, in order to Avoid mixing the cleaning solution in the developing solution recovery container 3 4 7 and closing the opening of the developing solution recovery container 3 4 7 with the lid 3 4 8. In this step 7, it is better to shorten the shift of the LCD substrate G to the inclined position. At the same time, after the LCD substrate G is held in a certain inclined position, it is desirable to start the supply of the cleaning liquid from the nozzle 3 5 2 for discharging the cleaning liquid as soon as possible to stop the development reaction. Step 8. -R9-This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 569288 A7 B7 V. Description of the invention (for example, if the tilting posture of the LCD substrate G in step 7 is maintained for a long time, Will leave significant Traces under the liquid flow or the portion of the LCD substrate G that bounces the developer liquid are liable to form development unevenness. However, if step 8 can be performed quickly after step 7, development unevenness can be prevented. Steps 7 and 7 The processing of 8 can be completed in a short period of time by the operation of the lifting mechanism 406 and the high-speed movement of the nozzle 3 2 for discharging the cleaning solution. Therefore, it is possible to uniformly stop the development reaction on the entire LCD substrate G. The series of processing in steps 7 and 8 in the clearing / washing zone 3 2 4 d has nothing to do with the application direction of the developing solution in the first developing solution supply zone 3 2 4 b, and it is effective to suppress the occurrence of the LCD substrate G. Uneven development and improvement of line width uniformity have good effects. In addition, in the process of step 7, the application direction of the developer in the first developer supply area 3 2 4 b is considered, and the side of the LCD substrate G where the developer starts to be applied is lifted so that the developer is applied. By flowing down from the LCD substrate G, the development precision can be further improved. Next, the L C D substrate G is transported to the cleaning area 3 2 4 e (step 9). Here, while the LCD substrate G is being transported at a certain speed, the cleaning solution is discharged on the front and back surfaces of the LCD substrate G, and the developing solution attached to the LCD substrate G is removed and washed (step 10). While performing this cleaning process, the L C D substrate G passing through the cleaning zone 3 2 4 e is transported to the drying zone 3 2 4 f (step 1 1). In the drying zone 3 2 4 f, the L C D substrate G is conveyed at a constant speed, and the drying process by the air nozzle 3 5 4 is performed at the same time (step 1 2). The LCD substrate G after the drying process is transported to the i-ray UV irradiation unit (i-UV) 325 by the roller transport mechanism 3 1 4 (step 13), and a certain ___- is applied here. This paper size applies the Chinese National Standard (CNS) A4 size (210X297 mm) (Please read the precautions on the back before filling this page)
、1T 經濟部智慧財產局員工消費合作社印製 569288 經濟部智慧財產局員工消費合作社印製 A7 B7五、發明説明（％ 紫外線照射處理。 以上，說明本發明的實施形態，但本發明並不限定於 上述實施形態。例如，在澄乾/洗淨區3 2 4 d的一連串 的處理，與在第1顯像液供應區3 2 4 b的顯像液的塗抹 方向無關，對抑制在L C D基板G發生顯像不均均有效果 ，因此，在第1顯像液供應區3 2 4 b的顯像液的塗抹方 向，並不一定要與基板運動方向相反。 而基板傾斜機構4 1 0是抬高基板運送方向的前方側 ，使L C D基板G成爲傾斜姿勢，但也可以抬高基板運送 方向的後方側，使L C D基板G成爲傾斜姿勢。這個時候 ’在第1顯像液供應區3 2 4 b則要從基板運送方向的後 方側向前方側塗抹顯像液，而不設第2顯像液供應區 3 2 4 c，以縮短運送路徑較佳。 昇降機構4 0 6也可以從澄乾/洗淨區3 2 4 d的上 方拉上框架構件4 0 3的一端，或可以從L C D基板G的 運送面的下方抬高。同時，可以使用能夠調整框架構件 4 0 3兩端的高度位置的昇降機構，以滾筒3 1 7支持 L C D基板G，以L C D基板G整體略成水平姿勢的狀態 抬高後，再令其傾斜一定角度。本發明不是限定適用於 L C D基板G，也可以適用於其他L c D以外的其他用途 使用的玻璃基板等或陶瓷基板等的液體處理。 如上述，依據本發明的液體處理裝置及處理方法時， 由於可以使處理液體接觸在整個基板的時間均等化，因此 ，可以對整個基板均一實施基板的液體處理。如此，可以 本紙張尺度適财關家料（CNS ) A4規格（21GX297公釐) (請先閲讀背面之注意事項再填寫本頁) 569288 A7 B7 五、發明説明（竽 (請先閱讀背面之注意事項再填寫本頁) 收到能夠獲得高品質的基板的優異效果。同時，由於不會 高速運送基板，可以提高處理安全性，可以抑制基板的破 損或損傷，停止運送用的空間也不大。而且，由於使向基 板供應處理液體的噴嘴移動，可以在短時間內完成第1液 體處理部與第2液體處理部的液體處理，可以提高產能。 圖式的簡單說明 第1圖是表示可適用本發明的顯像處理裝置的塗抹顯 像處理系統的架構的平面圖。 第2圖是表示上述塗抹顯像處理系統的熱處理部的架 構的側面圖。 第3圖是表示上述塗抹顯像處理系統的處理程序的流 程圖。 第4圖是表示實施形態的顯像單元的整體架構的正面 圖。 第5圖是表示上述顯像單元的基板運入部及預濕潤部 周圍的架構的平面圖。 經濟部智慧財產局員工消費合作社印製 第6圖是表示上述顯像單元的基板運入部及預濕潤部 周圍的架構的部分截面正面圖。 第7圖是表示上述顯像單元的基板運入部的架構及作 用（基板的交接）的部分截面正面圖。 第8圖是表示上述基板運入部的架構及作用（基板的 移載）的部分截面正面圖。 第9圖是表示上述顯像單元的噴嘴掃描機構的架構的 _______- _ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 569288 A7 _ B7 _ 五、發明説明（穸 部分截面正面圖。 第1 0圖是表示上述掃描機構的斜視圖。 (請先閲讀背面之注意事項再填寫本頁) 第1 1圖是表示實施形態的基板傾斜機構的架構及作 用（基板的抬高）的部分截面正面圖。 第1 2圖是表示實施形態的基板傾斜機構的架構及作 用（基板的傾斜）的部分截面正面圖。 第1 3 A圖及第1 3 B圖是表示實施形態的噴嘴掃描 作用的簡略側面圖。 第1 4圖是表示實施形態的空氣刀刃的作用的簡略側 面圖。 第1 5圖是表示另一實施形態的基板傾斜機構的架構 的部分截面正面圖。 第1 6圖是表示實施形態的基板傾斜機構的架構及作 用（基板水平姿勢）的部分截面正面圖。 第1 7圖是表示實施形態的基板傾斜機構的架構及作 用（基板傾斜姿勢）的部分截面正面圖。 經濟部智慧財產局員工消費合作社印製 第18A圖、第18B圖及第18C圖是表示可使用 在實施形態的基板傾斜機構的檢出基板到達用感測器的架 構例子的圖。 第1 9圖是具有本發明的液體處理裝置的一實施形態 的顯像處理單元的抗蝕劑塗抹•顯像處理系統的槪略平面 圖。 第2 0圖是表示第1 9圖所示的抗蝕劑塗抹•顯像處 理系統的第1熱處理單元區的側面圖。 -—___-RR - 本紙張尺度適用中國國家標準（CNS ) Μ規格（210 X 297公釐） 569288 A7 B7 五、發明説明（如 第2 1圖是表不第1 9圖所示的抗鈾劑塗抹•顯像處 £里系統的第2熱處理單元區的側面圖。 (請先閲讀背面之注意事項再填寫本頁) 第2 2圖是表示第1 9圖所示的抗蝕劑塗抹•顯像處 理系統的第3熱處理單元區的側面圖。 第2 3圖是表示本發明一實施形態的顯像處理單元的 槪略構造的側面圖。 第2 4圖是表示本發明的一實施形態的顯像處理單元 的槪略構造的平面圖。 第2 5A圖、第2 5 B圖及第2 5 C圖是表示顯像處 理單元所具有的設在澄乾/洗淨區的基板傾斜機構的說明 圖。 第2 6圖是表示顯像處理過程的槪略的說明圖（流程 圖）。 主要元件對照表· 10:塗抹顯像處理系統 1 2 :曝光裝置 經濟部智慧財產局員工消費合作社印製 14 :卡匣站（C/S) 1 6 :處理站（P / S ) 1 8 :界面站（I / F ) 2 0 :卡匣台 22、46、90、100:運送機構 2 2 a :運送臂 2 4 :洗淨處理部 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） :.67: 569288 A7 B7 五、發明説明（麥 2 6 :第1熱處理部 2 8 :塗抹處理部 (請先閲讀背面之注意事項再填寫本頁) 30:第2熱處理部 3 2 :顯像處理部 3 4 :脫色處理部 36 :第3熱處理部 4 0 :穿梭構件 4 1、3 2 2 :激元U V照射單元 4 2、3 2 1 :沖刷洗淨單元 44、48、88、92、98、102:多層單元 部（T B ) 50、60、361、365、369、373:傳 遞單元（PASS) 52、54:加熱單元（〇11?) 56、66、364、368 :附著單元（AD) 62、64:冷卻單元（（：1^) 6 8、1 5 8 :導軌 經濟部智慧財產局員工消費合作社印製 7 0 :昇降運送體 7 2 :旋轉運送體 7 4 :夾鉗 7 6、7 8、8 0 :驅動部 8 2 :抗鈾刻劑塗抹單元（C T ) 8 4 :減壓乾燥單元（V D ) 86:去除邊緣單元（ER) -RR - 本紙張尺度適用中國國家標準（CNS )八4規格（210X297公釐） 569288 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（荠 9 4 :顯像單元（D E V ) 9 6 : i線U V照射單元（i U V ) 1 0 4 :運送裝置 1 0 8 :運送路 110:基板運入部 1 1 2 :顯像部 1 1 4 :洗淨部 116:乾燥部 1 1 8 :基板運出部 122、184、192:上昇梢 1 2 4 :預濕潤部 1 2 6 :顯像液供應部 1 2 8 :顯像液滴落部 130、132、134:盤子 1 3 1、1 3 3、1 3 5 :排液管 138A、138B:運送輥 142A、142B、204A、204B、224 :軸承 1 4 4、1 4 8 :螺旋齒輪 150、168:電氣馬達 1 5 2 :昇降板 1 5 6 :噴嘴支持體 1 6 0 :掃描驅動部 1 6 1 :垂直支持構件 _- AQ - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) 569288 A7 B7 五、發明説明（穸 1 6 4、1 6 6 :帶輪 1 7 0 :昇降驅動部 (請先閲讀背面之注意事項再填寫本頁) 1 7 2 :水平支持桿 1 7 4 :垂直支持桿 1 7 6 :處理液供應管 1 7 8 a :開縫 1 8 0 :基板傾斜機構 1 8 6 :昇降軸 1 8 8 :驅動部 1 9 4、2 2 2 :停止構件 1 9 6、2 3 6 :軸 2 0 0 :基板傾斜機構 2 0 2 :離合器 2〇4A、204B、224:軸承 2 0 6 :支持板 2 0 8 :垂直支持桿 2 1 0 :梢 經濟部智慧財產局員工消費合作社印製 2 1 4 :線軸 2 1 6 :繩索 2 1 8、2 2 0 :汽缸 2 1 8 a、2 2 0 a :活塞軸 2 2 2 :停止構件 2 3 0 :限制開關 2 3 2 :輥子桿 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -70 569288 A7 B7 五、發明説明（穸 2 3 4 :螺旋彈簧 2 3 8 :光感測器 (請先閲讀背面之注意事項再填寫本頁) 2 3 8 a :發光元件 238b :受光元件 3 0 1 :卡匣站 3 0 2 :處理站 3 0 3 ·界面站 3 0 4 :曝光裝置 3 1 1 :運送裝置 3 1 1 a :運送臂 3 2 3 :抗蝕劑處理單元 3 2 4 :顯像處理單元（D E V ) 3 2 5 : i線U V照射單元（i U V ) 326:第1熱處理單元區 327:第2熱處理單元區 331、332、334、335、337、338 :熱處理單元塊（TB) 經濟部智慧財產局員工消費合作社印製 333:第1運送裝置 336:第2運送裝置 339:第3運送裝置 3 4 2 :運送裝置 344 :擴充、冷卻台（EXT、C〇L) 3 4 5 :外部裝置塊 3 4 7 :顯像液回收容器 ____ 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公釐） 569288 A7 經濟部智慧財產局員工消費合作社印製 B7五、發明説明（竽 3 4 8 :蓋體 3 4 9 :洗淨液回收容器 3 5 2 :吐出洗淨液用噴嘴 3 5 3 :洗淨用噴嘴 3 5 4 :空氣噴嘴 3 5 8 :滑動臂 359、386、39 1:導軌 362、363 :脫水烘烤單元（DHP) 366、367、374 :冷卻單元（C〇L) 370、371、372、375、376:預烘烤 單元(PREBAKE ) 378、379、380、381、383、384 :後烘烤單元（POBAKE) 382 :傳遞、冷卻單元（PASS、C〇L) 3 8 5 :洗淨用噴嘴移動機構 3 8 7 :噴嘴保持臂 3 9 2 :昇降構件 3 9 3 :基座構件 3 9 4 :基板保持臂 395、396、397:馬達 4 0 0 :抗蝕劑塗抹、處理系統 4 0 1 :滾筒 4 〇 2 a :軸構件 4 0 2 b :連結工具 __- 79 -_ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) 569288 A7 B7 五、發明説明（次 4 0 3 :框架構件 4 0 4 :導梢 4 0 5 :軸構件 4 0 6 :昇降機構 4 1 0 :基板傾斜機構 N :噴嘴 P N :洗淨液供應用噴嘴 D N a、D N b :顯像液供應用噴嘴 (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -731T Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 569288 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (% UV irradiation treatment. The above describes the embodiment of the invention, but the invention is not limited In the above embodiment, for example, a series of processes in the clearing / washing zone 3 2 4 d is not related to the application direction of the developer in the first developer supply zone 3 2 4 b, and has no influence on the suppression on the LCD substrate. G has an effect on development unevenness. Therefore, the application direction of the developer in the first developer supply area 3 2 4 b is not necessarily opposite to the substrate movement direction. The substrate tilt mechanism 4 1 0 is Raise the front side of the substrate transport direction to tilt the LCD substrate G, but you can raise the back side of the substrate transport direction to tilt the LCD substrate G. At this time, 'in the first developer supply area 3 2 4 b, it is necessary to apply the developing liquid from the rear side to the front side of the substrate conveying direction, instead of providing a second developing liquid supply area 3 2 4 c, it is better to shorten the conveying path. The lifting mechanism 4 0 6 can also be from Cheng Dry / wash area One end of the frame member 403 can be pulled up from 3 2 4 d, or it can be raised from below the conveying surface of the LCD substrate G. At the same time, a lifting mechanism capable of adjusting the height position of both ends of the frame member 403 can be used to The roller 3 1 7 supports the LCD substrate G, and raises the LCD substrate G in a state where the entire LCD substrate G is in a slightly horizontal posture, and then tilts it at a certain angle. The present invention is not limited to be applied to the LCD substrate G, and may also be applied to other LCDs. Liquid processing of glass substrates or ceramic substrates used in other applications. As described above, in the liquid processing apparatus and processing method according to the present invention, since the time during which the processing liquid contacts the entire substrate can be equalized, the entire liquid can be processed. The substrate is uniformly treated with the liquid of the substrate. In this way, the paper size can be adjusted to CNS A4 size (21GX297 mm) (Please read the precautions on the back before filling this page) 569288 A7 B7 V. Description of the invention (竽 (Please read the precautions on the back before filling out this page) I have received excellent results that can obtain high-quality substrates. At the same time, because the substrates are not transported at high speed The plate can improve the processing safety, can prevent the substrate from being damaged or damaged, and the space for stopping the transportation is not large. Moreover, the nozzle for supplying the processing liquid to the substrate can be moved, and the first liquid processing unit and the liquid processing unit can be completed in a short time. The liquid processing of the second liquid processing unit can increase the productivity. Brief Description of the Drawings Figure 1 is a plan view showing the structure of a coating development processing system to which the developing processing apparatus of the present invention can be applied. A side view of the architecture of the heat treatment section of the development processing system. Fig. 3 is a flowchart showing a processing procedure of the above-mentioned application development processing system. Fig. 4 is a front view showing the overall structure of the developing unit of the embodiment. Fig. 5 is a plan view showing the structure around the substrate carrying-in portion and the pre-wetting portion of the developing unit. Printed by the Intellectual Property Bureau, Ministry of Economic Affairs, Consumer Cooperatives. Figure 6 is a partial cross-sectional front view showing the structure around the substrate carrying-in section and pre-wetting section of the imaging unit. Fig. 7 is a partial cross-sectional front view showing the structure and function (substrate transfer) of the substrate carrying portion of the above-mentioned developing unit. Fig. 8 is a partial cross-sectional front view showing the structure and function of the substrate carrying-in section (substrate transfer). Figure 9 shows the structure of the nozzle scanning mechanism of the above-mentioned development unit. _______- _ This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 569288 A7 _ B7 _ V. Description of the invention (穸 Sectional section Front view. Figure 10 is a perspective view showing the above-mentioned scanning mechanism. (Please read the precautions on the back before filling out this page.) Figure 11 shows the structure and function of the substrate tilt mechanism (elevation of the substrate). ) Partial cross-section front view. Figures 12 and 12 are partial cross-sectional front views showing the structure and function of the substrate tilt mechanism (tilt of the substrate) according to the embodiment. Figures 1 A and 1 B show the embodiment. A schematic side view of the nozzle scanning action. Figs. 14 and 14 are schematic side views showing the action of the air blade of the embodiment. Fig. 15 is a front view showing a partial cross-section of the structure of a substrate tilting mechanism according to another embodiment. Fig. 6 is a partial cross-sectional front view showing the structure and function of the substrate tilt mechanism (horizontal posture of the substrate) according to the embodiment. Fig. 17 is a substrate tilt mechanism showing the embodiment. Partial cross-section front view of the structure and function (substrate tilt posture). Figures 18A, 18B, and 18C printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs show the detection substrate that can be used in the substrate tilt mechanism of the embodiment. A diagram showing an example of the structure of an arrival sensor. Fig. 19 is a schematic plan view of a resist application and development processing system provided with a development processing unit according to an embodiment of the liquid processing apparatus of the present invention. The figure is a side view showing the first heat treatment unit area of the resist application and development processing system shown in Fig. 19--___- RR-This paper size is in accordance with the Chinese National Standard (CNS) M specification (210 X 297 mm) 569288 A7 B7 V. Description of the invention (as shown in Figure 21 is the side view of the second heat treatment unit area of the uranium-resistant coating / development area shown in Figure 19, which is shown in Figure 19). (Please (Please read the precautions on the back before filling in this page.) Figure 22 shows a side view of the third heat treatment unit area of the resist application and development processing system shown in Figure 19. Figure 23 shows this Development process of one embodiment of the invention A side view of a schematic structure of the element. Figs. 24 and 4 are plan views showing a schematic structure of a development processing unit according to an embodiment of the present invention. Figs. 2A, 2B, and 2C are An explanatory diagram showing a substrate tilting mechanism provided in a clearing / cleaning area of the development processing unit. Figs. 26 and 6 are diagrams (flow diagrams) showing the outline of the development process. A comparison table of main components · 10: Smear image processing system 1 2: Exposure device Printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 14: Cassette station (C / S) 1 6: Processing station (P / S) 1 8: Interface station (I / F) 2 0: Cassette table 22, 46, 90, 100: Conveying mechanism 2 2 a: Conveying arm 2 4: Washing and processing department This paper applies the Chinese National Standard (CNS) A4 specification (210X 297 mm): .67: 569288 A7 B7 V. Description of the invention (mai 26: first heat treatment section 2 8: smear treatment section (please read the precautions on the back before filling this page) 30: second heat treatment section 3 2: development processing Section 3 4: Decolorization treatment section 36: Third heat treatment section 40: Shuttle member 4 1, 3 2 2: Exciton UV irradiation unit 4 2, 3 2 1: Scouring Net unit 44, 48, 88, 92, 98, 102: Multi-level unit section (TB) 50, 60, 361, 365, 369, 373: Passing unit (PASS) 52, 54: Heating unit (〇11?) 56, 66, 364, 368: Attachment unit (AD) 62, 64: Cooling unit ((: 1 ^) 6 8, 1 5 8: Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economy of the Rails 7 0: Lifting transport body 7 2: Rotating carrier 7 4: Clamp 7 6, 7 8, 8 0: Drive unit 8 2: Anti-uranium resist application unit (CT) 8 4: Decompression drying unit (VD) 86: Edge removal unit (ER)- RR-This paper size applies to China National Standard (CNS) 8-4 (210X297 mm) 569288 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (荠 9 4: Imaging Unit (DEV) 9 6 : i-ray UV irradiation unit (i UV) 1 0 4: Conveying device 1 0 8: Conveying path 110: Substrate carrying section 1 1 2: Development section 1 1 4: Washing section 116: Drying section 1 1 8: Substrate Carry-out sections 122, 184, and 192: rising tips 1 2 4: pre-wetting section 1 2 6: developer supply section 1 2 8: developer drop sections 130, 132, and 134: trays 1 3 1, 1 3 3, 1 3 5: drainage tube 138A, 138B: Conveying rollers 142A, 142B, 204A, 204B, 224: Bearing 1 4 4, 1 4 8: Helical gear 150, 168: Electric motor 1 5 2: Lifting plate 1 5 6: Nozzle support 1 6 0: Scan drive Department 1 6 1: Vertical Supporting Components _- AQ-This paper size applies to Chinese National Standard (CNS) A4 (210X297 mm) (Please read the precautions on the back before filling out this page) 569288 A7 B7 V. Description of the invention (穸 1 6 4, 1 6 6: Pulley 1 7 0: Lifting drive section (please read the precautions on the back before filling this page) 1 7 2: Horizontal support lever 1 7 4: Vertical support lever 1 7 6: Handling Liquid supply pipe 1 7 8 a: Slit 1 8 0: Substrate tilt mechanism 1 8 6: Lifting shaft 1 8 8: Drive section 1 9 4, 2 2 2: Stop member 1 9 6, 2 3 6: Shaft 2 0 0: Substrate tilt mechanism 2 0 2: Clutches 204A, 204B, 224: Bearing 2 0 6: Support plate 2 0 8: Vertical support rod 2 1 0: Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economy 2 1 4 : Spool 2 1 6: rope 2 1 8, 2 2 0: cylinder 2 1 8 a, 2 2 0 a: piston shaft 2 2 2: stop member 2 3 0: limit switch 2 3 2: roller lever Applicable for this paper size China Standard (CNS) A4 specification (210X297 mm) -70 569288 A7 B7 V. Description of the invention (穸 2 3 4: Coil spring 2 3 8: Light sensor (Please read the precautions on the back before filling this page) 2 3 8 a: Light-emitting element 238 b: Light-receiving element 3 0 1: Cassette station 3 0 2: Processing station 3 0 3 · Interface station 3 0 4: Exposure device 3 1 1: Transport device 3 1 1 a: Transport arm 3 2 3: resist processing unit 3 2 4: development processing unit (DEV) 3 2 5: i-ray UV irradiation unit (i UV) 326: first heat treatment unit area 327: second heat treatment unit area 331, 332, 334 , 335, 337, 338: Heat treatment unit block (TB) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 333: First conveying device 336: Second conveying device 339: Third conveying device 3 4 2: Conveying device 344: Expansion 、 Cooling table (EXT, COL) 3 4 5: External device block 3 4 7: Recycling container for developing solution ____ This paper size applies to China National Standard (CNS) Α4 specification (210X297 mm) 569288 A7 Wisdom of the Ministry of Economic Affairs Printed by B7, Consumer Cooperatives of the Property Bureau. V. Invention Description (竽 3 4 8: Lid 3 4 9: Washing liquid recovery container 3 5 2: Spit out Cleaning nozzle 3 5 3: Cleaning nozzle 3 5 4: Air nozzle 3 5 8: Sliding arms 359, 386, 39 1: Guide rails 362, 363: Dehydration baking unit (DHP) 366, 367, 374: Cooling Units (COL) 370, 371, 372, 375, 376: Pre-bake units (PREBAKE) 378, 379, 380, 381, 383, 384: Post-bake units (POBAKE) 382: Transfer and cooling units (PASS) (C0L) 3 8 5: Nozzle moving mechanism for cleaning 3 8 7: Nozzle holding arm 3 9 2: Lifting member 3 9 3: Base member 3 9 4: Substrate holding arm 395, 396, 397: Motor 4 0 0: resist application and processing system 4 0 1: roller 4 〇2 a: shaft member 4 0 2 b: linking tool __- 79 -_ This paper size applies to China National Standard (CNS) A4 (210X297) (Please read the notes on the back before filling this page) 569288 A7 B7 V. Description of the invention (time 4 0 3: frame member 4 0 4: guide pin 4 0 5: shaft member 4 0 6: lifting mechanism 4 1 0: substrate tilting mechanism N: nozzle PN: cleaning liquid supply nozzle DN a, DN b: developer liquid supply nozzle (please read the precautions on the back before filling this page) Printed by the Bureau ’s Consumer Cooperatives This paper is sized to the Chinese National Standard (CNS) A4 (210X297 mm) -73