JP4476101B2 - Substrate processing apparatus and flat flow type substrate transfer apparatus - Google Patents

Description

  The present invention relates to a substrate processing apparatus that performs a predetermined process on a substrate to be processed by a flat flow method.

  In a resist coating and developing processing system in FPD (flat panel display) manufacturing, as a processing method that can advantageously cope with an increase in the size of a substrate to be processed, on a transport path in which transport bodies such as rollers and belts are laid horizontally. A so-called flat-flow method in which development processing, cleaning processing, and the like are performed while a substrate is being transported is widely used.

In the conventional flat flow method, the substrate to be processed is transported in a horizontal state from the upstream loading section to the downstream unloading section on the transport path, and a plurality of tools arranged above, below or beside the transport path are on the transport path. Thus, each stage of the process is performed on the moving or temporarily stopped substrate. For example, in the scrubber cleaning processing unit, scrubbing, rinsing, and drying are sequentially performed on the substrate on the conveyance path that passes by the roll brush, the rinse nozzle, the air knife, and the like arranged along the conveyance path. . At that time, the foreign matter scraped off from the substrate surface by the scrubbing process is immediately washed off from the substrate by the rinse liquid sprayed from the rinse nozzle, and the liquid remaining on the substrate by the rinse process is immediately sprayed from the air knife. It is removed from the substrate by air.
JP 2003-83675 A

  Since the conventional substrate processing apparatus performs a flat flow process on a horizontally oriented substrate, in order to remove foreign matter and liquid remaining on the substrate in a short time, the amount of rinsing liquid and air flow must be sufficiently large. There is a problem that consumption of utility is large. In particular, in scrubbing cleaning, there is a concern that particles will re-adhere to the substrate surface unless the cleaning liquid or rinsing liquid supplied onto the substrate is quickly poured off.

  The present invention has been made in view of the above-described problems of the prior art, and a flat flow for improving processing efficiency and processing quality by allowing unnecessary liquid on the substrate to be processed to flow quickly during transport. An object of the present invention is to provide a substrate processing apparatus of the type.

  Another object of the present invention is to provide a flat-flow-type substrate transport apparatus capable of transferring a substrate to be processed between an inclined transport path and a horizontal transport path without causing complication of the transport system, and It is to provide a substrate processing apparatus.

  Another object of the present invention is to provide a flat-flow-type substrate transfer apparatus and a substrate processing apparatus capable of transferring a substrate to be processed between an inclined transfer path and a horizontal transfer path with a short transfer tact. There is to do.

In order to achieve the above object, a first substrate transport apparatus according to the present invention has a first transport path in which a first roller is laid at a predetermined pitch from a predetermined start point to a switching section. A first transport unit that roller-rolls the processed substrate on the first transport path in a posture inclined at a predetermined angle with respect to a horizontal line orthogonal to a horizontal transport direction; and the first roller within the switching section A second transport path formed by laying a second roller offset in the transport direction at a predetermined pitch to a predetermined end point, and transporting the substrate on the second transport path in a horizontal posture; of; and a transport unit, said first roller in said switching zone pivotably configured in a vertical plane about an end thereof, the substrate to the switching in the interval in the first transport path In the loaded state, the first roller in the switching section is moved to the first transport path. The substrate is placed from a first position higher than the second transport path to form and swiveled to a second position lower than the second transport path, and the substrate is moved during the swivel motion. The first transfer path is changed to the second transfer path, and the fulcrum is provided in the vicinity of a first bearing that rotatably supports one end of the first roller. A pivot driving actuator connected to one roller via a second bearing, and the actuator is individually connected to each of the first rollers in the switching section, and the moving forward movement In the operation, the first rollers are swung together at the same timing in one direction between the first and second positions, and in the backward operation after the transfer is completed, the first rollers are moved in the direction. Different timing in the other direction between the first and second positions Pivoting movement individually.

The second substrate transport apparatus of the present invention has a first transport path in which a first roller is laid at a predetermined pitch from a switching section to a predetermined end point, and the substrate to be processed is orthogonal to the horizontal transport direction. A first transport unit that transports the roller on the first transport path in a posture inclined at a predetermined angle with respect to the horizontal line to be moved, and a second roller that is offset in the transport direction with respect to the first roller in the switching section. A second transport path that is laid at a predetermined pitch from a predetermined start point to the switching section, and a second transport section that rolls the substrate on the second transport path in a horizontal posture. Comprising the first roller in the switching section so that it can be swiveled in a vertical plane with one end thereof as a fulcrum, and the substrate is carried into the switching section on the second transport path, The first roller in the switching section forms the first transport path Swivel from a second position lower than the second transport path to a first position higher than the second transport path, and the substrate is moved from the second transport path in the middle of the swivel motion. Transfer to the first conveyance path, the fulcrum is provided in the vicinity of a first bearing that rotatably supports one end of the first roller, and a second bearing is provided on the first roller in the switching section. Are connected to each of the first rollers in the switching section, and in the forward movement of the transfer, the first rollers are connected. Between the first and second positions at the same time in the same timing at the same timing, and in the backward movement after the completion of the transfer, the first rollers are moved between the first and second positions. Rotate individually in different directions at different timings.

  In the substrate transfer apparatus according to the present invention, the first roller constituting the first (inclined) transfer path and the second roller forming the second (horizontal) transfer path have a predetermined offset in the switching section. Alternatingly arranged in the transport direction. The first roller is driven by a drive unit in the first transport unit, and the second roller is driven by a drive unit in the second transport unit. This eliminates the need for a dedicated transport drive unit in the switching section, and simplifies the transport mechanism and transport control for switching the transport path.

Substrate transfer apparatus of the present invention, a second position below the first roller to the first (slope) for forming a conveying path first position and a second (horizontal) conveying path as described above It can be determined promptly by using an was transferred substrate (transfer) by more the structure to swivel exercise, minimum switching mechanism to operate between.

According to a preferred aspect of the present invention, in the backward movement operation after the transfer is completed , the first roller in the switching section is constant in the other direction between the first and second positions in accordance with the arrangement order in the transport direction. Can be swiveled sequentially with a time difference of.

  According to this configuration, in the first substrate transfer device, when the transfer of the substrate is completed and the roller transfer of the second (horizontal) transfer path is started, the substrate does not go out of the switching section. In addition, the first roller is returned to the position where the first (inclined) conveyance path is formed individually in order from the upstream side, that is, from the upstream side, and the first (inclined) conveyance path is moved from the upstream side. The next substrate that is being transported can be welcomed into the switching section. As a result, the distance interval between the two substrates that are continuously roller-conveyed on the first and second conveyance paths (before and after) can be made as small as possible, and the conveyance tact can be shortened. In the second substrate transfer device, when the transfer of the substrate is completed and the roller transfer on the first (inclined) transfer path is started, the substrate is not moved out of the switching section. The first rollers are individually returned to a position lower than the second (horizontal) conveyance path in order from the upstream side, that is, in order from the upstream side, and are roller-conveyed on the second (horizontal) conveyance path from the upstream side. The next board to come can be accepted into the switching section. As a result, the distance interval between the two substrates that are continuously roller-conveyed on the second and first conveyance paths (before and after) can be made as small as possible, and the conveyance tact can be shortened.

  As another aspect of the present invention, the actuator is commonly connected to all the first rollers in the switching section, and the first rollers are bidirectionally connected at the same timing between the first and second positions. It is also possible to swivel all at once.

  According to a preferred aspect of the present invention, the first transport unit includes a rotary drive shaft extending in the transport direction along the first transport path, an electric motor that rotationally drives the rotary drive shaft, and a switching section. The first roller is connected to the rotary drive shaft so as to be able to transmit power in the first position, and has a cross shaft gear which is separated from the rotary drive shaft so as not to be able to transmit power in the second position. This cross shaft gear is preferably a non-contact magnet type.

The substrate processing apparatus of the present invention includes the flat-flow type substrate transport apparatus according to the present invention and a processing unit that performs a predetermined process on the substrate on the first transport path or the second transport path. The processing unit typically includes a nozzle for supplying a processing liquid to the substrate on the first (tilted) transport path. In this device structure, in addition to the action effect of the planar flow type substrate transport device is obtained, the first transport unit transports by tilting the substrate in the conveying path, the processing unit is given to the substrate inclined posture Therefore, it is possible to improve the processing efficiency and the processing quality by allowing unnecessary liquid on the substrate to flow off quickly during transportation.

  According to the substrate processing apparatus of the present invention, the processing efficiency and the processing quality can be improved by causing the unnecessary liquid on the substrate to be quickly washed away during the transfer by the above configuration and operation.

  In addition, according to the flat flow type substrate transfer apparatus or the substrate processing apparatus of the present invention, the above-described configuration and operation cause a complicated transfer system between the inclined transfer path and the horizontal transfer path. The substrate to be processed can be transferred without any problem. Furthermore, the transfer of the substrate to be processed between the inclined transport path and the horizontal transport path can be performed with a short transport tact.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

  FIG. 1 shows a coating and developing processing system as one configuration example to which the substrate processing apparatus and the flat flow type substrate transfer apparatus of the present invention can be applied. This coating / development processing system 10 is installed in a clean room. For example, a glass substrate for LCD (liquid crystal display) is used as a substrate to be processed, and cleaning, resist coating, pre-baking, development, and post in a photolithography process in the LCD manufacturing process. A series of processing such as baking is performed. The exposure process is performed by an external exposure apparatus 12 installed adjacent to the processing system.

  In the coating and developing system 10, a horizontally long process station (P / S) 16 is disposed at the center, and a cassette station (C / S) 14 and an interface station (I / F) are disposed at both ends in the longitudinal direction (X direction). ) 18.

  The cassette station (C / S) 14 is a cassette loading / unloading port of the system 10, and up to four cassettes C can be accommodated in a horizontal direction, for example, in the Y direction by stacking square glass substrates G in multiple stages. A cassette stage 20 that can be placed side by side and a transport mechanism 22 that puts and removes the substrate G to and from the cassette C on the stage 20 are provided. The transport mechanism 22 has a means for holding the substrate G, for example, a transport arm 22a, and can be operated with four axes of X, Y, Z, and θ. Delivery is now possible.

  In the process station (P / S) 16, the processing units are arranged in the order of the process flow or process on a pair of parallel and opposite lines A and B extending in the system longitudinal direction (X direction). More specifically, the upstream process line A from the cassette station (C / S) 14 side to the interface station (I / F) 18 side includes a cleaning process unit 24, a first thermal processing unit 26, and The coating process section 28 and the second thermal processing section 30 are arranged in a horizontal row. On the other hand, in the downstream process line B from the interface station (I / F) 18 side to the cassette station (C / S) 14 side, a second thermal processing unit 30, a development processing unit 32, and a decolorization process are provided. The unit 34 and the third thermal processing unit 36 are arranged in a horizontal row. In this line configuration, the second thermal processing unit 30 is located at the end of the upstream process line A and at the beginning of the downstream process line B, and straddles between both lines A and B. ing.

  An auxiliary transfer space 35 is provided between the process lines A and B, and a shuttle 38 on which a substrate G can be horizontally placed in units of one sheet is bidirectional in the line direction (X direction) by a drive mechanism (not shown). Can be moved to.

  In the upstream process line A, the cleaning process unit 24 is a flat-flow type substrate cleaning apparatus, and along the line A, a carry-in unit (IN) 40, an excimer UV irradiation unit (e-UV) 41, and a scrubber cleaning unit. (SCR) 42 are arranged in a line. The excimer UV irradiation unit (e-UV) 41 and the scrubber cleaning unit (SCR) 42 perform dry cleaning and scrubbing cleaning on the substrate G while carrying the substrate G in the direction of line A in a flat flow. .

  The first thermal processing unit 26 adjacent to the downstream side of the cleaning process unit 24 is provided with a vertical transfer mechanism 46 in the center along the process line A, and a plurality of single-wafer oven units are provided on both front and rear sides thereof. A multi-stage unit section or oven towers (TB) 44 and 48 are provided which are stacked in multiple stages together with a substrate transfer pass unit.

For example, as shown in FIG. 2, an upstream oven tower (TB) 44 includes a substrate carrying pass unit (PASS _L ) 50, dehydrating baking heating units (DHP) 52 and 54, and an adhesion unit. (AD) 56 are stacked in order from the bottom. Here, the pass unit (PASS _L ) 50 provides a space for carrying the substrate G after the cleaning process from the scrubber cleaning unit (SCR) 42 into the first thermal processing unit 26. The oven tower (TB) 48 on the downstream side includes a pass unit (PASS _R ) 60 for carrying out the substrate, cooling units (CL) 62 and 64 for adjusting the substrate temperature, and an adhesion unit (AD) 66 in order from the bottom. Stacked. Here, pass unit (PASS _R) 60 provides a space for unloading the substrate G having undergone the required heat treatment at a first thermal processing unit 26 to the downstream side of the coating process portion 28.

  In FIG. 2, the transport mechanism 46 includes a lift transport body 70 that can be moved up and down along a guide rail 68 that extends in the vertical direction, and a swivel transport body 72 that can rotate or turn in the θ direction on the lift transport body 70. And a transport arm or tweezers 74 that can move back and forth or extend and retract in the front-rear direction while supporting the substrate G on the revolving transport body 72. A drive unit 76 for driving the lifting and lowering conveyance body 70 up and down is provided on the base end side of the vertical guide rail 68, and a driving unit 78 for driving the swiveling conveyance body 72 to rotate is attached to the lifting and lowering conveyance body 70. A drive unit 80 for advancing and retracting 74 is attached to the rotary transport body 72. Each drive part 76,78,80 may be comprised by the electric motor etc., for example.

  The transport mechanism 46 configured as described above can access any unit in the oven towers (TB) 44 and 48 adjacent to each other by moving up and down at high speed, and the shuttle 40 on the auxiliary transport space 38 side. In both cases, the substrate G can be delivered.

  The coating process unit 28 adjacent to the downstream side of the first thermal processing unit 26 includes a resist coating unit (CT) 82 and a vacuum drying unit (VD) 84 along the process line A as shown in FIG. Arranged in a row. The configuration in the coating process unit 28 will be described in detail later.

  The second thermal processing unit 30 adjacent to the downstream side of the coating process unit 28 has the same configuration as that of the first thermal processing unit 26, and a vertical type between the process lines A and B. The transfer mechanism 90 is provided, one oven tower (TB) 88 is provided on the process line A side (last), and the other oven tower (TB) 92 is provided on the process line B side (lead).

Although not shown, for example, in the oven tower (TB) 88 on the process line A side, a substrate loading pass unit (PASS _L ) is disposed at the bottom, and a pre-baking heating unit (PREBAKE) is disposed thereon. For example, they may be stacked in three stages. Further, in the oven tower (TB) 92 on the process line B side, a pass unit (PASS _R ) for carrying out the substrate is disposed at the lowest stage, and a cooling unit (COL) for adjusting the substrate temperature is provided thereon, for example, one stage. The heating unit (PREBAKE) for pre-baking may be stacked thereon, for example, in a two-stage stack.

The transport mechanism 90 in the second thermal processing unit 30 includes the coating process unit 28 and the development process unit 32 via the pass units (PASS _L ) and (PASS _R ) of both oven towers (TB) 88 and 92. Not only can the substrates G be transferred in units of one sheet, but also the substrates G can be transferred in units of sheets to the shuttle 40 in the auxiliary transport space 38 and the interface station (I / F) 18 described later.

  In the downstream process line B, the development process unit 32 includes a so-called flat-flow development unit (DEV) 94 that performs a series of development processing steps while transporting the substrate G in a horizontal posture.

  A third thermal processing unit 36 is disposed downstream of the development process unit 32 with the decolorization process unit 34 interposed therebetween. The decoloring process unit 34 includes an i-ray UV irradiation unit (i-UV) 96 for performing a decoloring process by irradiating the surface to be processed of the substrate G with i-line (wavelength 365 nm).

  The third thermal processing unit 36 has the same configuration as that of the first thermal processing unit 26 and the second thermal processing unit 30, and the vertical transport mechanism 100 along the process line B. A pair of oven towers (TB) 98 and 102 are provided on both the front and rear sides.

Although not shown, for example, in the upstream oven tower (TB) 98, a pass unit (PASS _L ) for carrying a substrate is placed at the lowest stage, and a heating unit (POBAKE) for post-baking is placed thereon, for example. May be stacked in three stacks. Further, in the oven tower (TB) 102 on the downstream side, a post baking unit (POBAKE) is placed at the lowermost stage, and a pass cooling unit (PASS _R · COL) for carrying out and cooling the substrate is placed on the post baking unit (POSBAKE). The heating unit (POBAKE) for post-baking may be stacked in two layers.

The transport mechanism 100 in the third thermal processing unit 36 irradiates with i-line UV via the pass units (PASS _L ) and pass cooling units (PASS _R · COL) of both multi-stage unit parts (TB) 98 and 102. Not only can the unit (i-UV) 96 and cassette station (C / S) 14 and the substrate G be transferred in units of one sheet, but also the substrate G can be transferred in units of one unit to the shuttle 40 in the auxiliary transport space 38. ing.

  The interface station (I / F) 18 includes a transfer device 104 for exchanging the substrate G with the adjacent exposure device 12, and a buffer stage (BUF) 106 and an extension / cooling stage (EXT / COL) around the transfer device 104. ) 108 and peripheral device 110 are arranged. A stationary buffer cassette (not shown) is placed on the buffer stage (BUF) 106. The extension / cooling stage (EXT / COL) 108 is a stage for transferring a substrate having a cooling function, and is used when the substrate G is exchanged with the process station (P / S) 16 side. For example, the peripheral device 110 may have a configuration in which a titler (TITLER) and a peripheral exposure device (EE) are stacked vertically. The transfer device 104 has a means for holding the substrate G, for example, a transfer arm 104a, and transfers the substrate G to and from the adjacent exposure device 12, each unit (BUF) 106, (EXT / COL) 108, (TITLER / EE) 110. Can be done.

FIG. 3 shows a processing procedure in this coating and developing processing system. First, in the cassette station (C / S) 14, the transport mechanism 22 takes out one substrate G from any of the cassettes C on the stage 20, and sends it to the cleaning process unit 24 of the process station (P / S) 16. Carry in (step S ₁ ).

In the cleaning process section 24, the substrate G is transported in the process line A direction from the carry-in section (IN) 40 to the carry-out section (OUT) 43 by roller transport, and an excimer UV irradiation unit (e-UV) 41 and A scrubber cleaning unit (SCR) 42 performs a cleaning process. That is, in the excimer UV irradiation unit (e-UV) 41, ultraviolet rays are irradiated on the upper surface of the substrate G (surface to be processed), organic matter is removed by ultraviolet ozone cleaning (step S _2). Also, the scrubber cleaning units (SCR) 42, the surface of the substrate G are rubbed with a roll brush, the foreign matter on the substrate surface are removed by scrubbing washing (Step S _3). Then, after the scrubbing cleaning, the substrate G is cleaned with a rinsing liquid, and finally liquid draining (drying) is performed with an air knife or the like.

The substrate G that has been cleaned in the scrubber cleaning unit (SCR) 42 is carried into the pass unit (PASS _L ) 50 in the upstream oven tower (TB) 44 of the first thermal processing section 26 in a flat flow. The

In the first thermal processing unit 26, the substrate G is sequentially transferred to a predetermined oven unit in a predetermined sequence by the transport mechanism 46. For example, the substrate G is first transferred from the pass unit (PASS _L ) 50 to one of the heating units (DHP) 52 and 54, where it is subjected to dehydration (step S ₄ ). Next, the substrate G is transferred to one of the cooling units (COL) 62 and 64 where it is cooled to a constant substrate temperature (step S ₅ ). Thereafter, the substrate G is transferred to an adhesion unit (AD) 56 where it is subjected to a hydrophobic treatment (step S ₆ ). After completion of the hydrophobic treatment, the substrate G is cooled to a constant substrate temperature by one of the cooling units (COL) 62 and 64 (step S ₇ ). Finally, the substrate G is transferred to the pass unit (PASS _R ) 60 in the downstream oven tower (TB) 48.

  As described above, in the first thermal processing unit 26, the substrate G is arbitrarily transferred between the upstream multi-stage oven tower (TB) 44 and the downstream oven tower (TB) 48 via the transport mechanism 46. You can come and go. The second and third thermal processing units 30 and 36 perform the same substrate transfer operation.

The substrate G that has undergone a series of thermal or thermal processing as described above in the first thermal processing unit 26 is applied from the pass unit (PASS _R ) 60 in the downstream oven tower (TB) 48 to the coating process unit. It is moved to 28 resist coating units (CT) 82.

In the resist coating unit (CT) 82, the substrate G is coated with a resist solution on the upper surface (surface to be processed) by a spinless method using a long resist nozzle as will be described later. Next, the substrate G is subjected to a drying process by a reduced pressure drying unit (VD) 84 adjacent to the downstream side (step S ₈ ).

The substrate G subjected to the resist coating process as described above is transferred from the reduced pressure drying unit (VD) 84 to the pass unit (PASS _L ) in the upstream oven tower (TB) 88 of the adjacent second thermal processing unit 30. It is brought in.

Within the second thermal processing unit 30, the substrate G is sequentially transferred to a predetermined unit by the transport mechanism 90 in a predetermined sequence. For example, the substrate G is first transferred from the pass unit (PASS _L) to one of the heating units (PREBAKE), where it undergoes a heat treatment of pre-baking (Step S _9). Next, the substrate G is transferred to one of the cooling units (COL), where it is cooled to a constant substrate temperature (step S ₁₀ ). Thereafter, the substrate G passes through the pass unit (PASS _R ) on the downstream oven tower (TB) 92 side or without the extension cooling stage (EXT COL) on the interface station (I / F) 18 side. ) 108.

In the interface station (I / F) 18, the substrate G is transferred from the extension / cooling stage (EXT / COL) 108 to the peripheral exposure device (EE) of the peripheral device 110, where the resist adhering to the peripheral portion of the substrate G is removed. After receiving an exposure for removal during development, the image is sent to the adjacent exposure apparatus 12 (step S ₁₁ ).

In the exposure device 12, a predetermined circuit pattern is exposed to the resist on the substrate G. Then, when the substrate G that has undergone pattern exposure is returned from the exposure apparatus 12 to the interface station (I / F) 18 (step S ₁₁ ), it is first carried into a titler (TITLER) of the peripheral device 110, where it is placed on the substrate. Predetermined information is written in a predetermined part (step S ₁₂ ). Thereafter, the substrate G is returned to the extension / cooling stage (EXT / COL) 108. Transfer of the substrate G in the interface station (I / F) 18 and exchange of the substrate G with the exposure apparatus 12 is performed by the transfer device 104.

In the process station (P / S) 16, the transport mechanism 90 receives the exposed substrate G from the extension / cooling stage (EXT / COL) 108 in the second thermal processing unit 30, and the oven tower ( TB) is transferred to the developing process section 32 via the pass unit (PASS _R ) in the 92.

In the development process unit 32, the substrate G received from the pass unit (PASS _R ) in the oven tower (TB) 92 is carried into the development unit (DEV) 94. Substrate G in the developing unit (DEV) 94 is conveyed by the flat flow manner toward the downstream process line B, developing during the transport, rinse, a series of development processing step drying is performed (step S _13).

The substrate G that has undergone the development process in the development process unit 32 is flattened as it is and is carried into the decolorization process unit 34 adjacent to the downstream side, where it is subjected to a decolorization process by i-line irradiation (step S ₁₄ ). The substrate G that has been subjected to the decoloring process is carried into the pass unit (PASS _L ) in the upstream oven tower (TB) 98 of the third thermal processing unit 36.

In the third thermal processing unit 36, the substrate G is transferred to the first one of the heating units (POBAKE) from the pass unit (PASS _L), where it undergoes a heat treatment of the post-baking (Step S _15). Next, the substrate G is transferred to a path cooling unit (PASS _R · COL) in the downstream oven tower (TB) 102, where it is cooled to a predetermined substrate temperature (step S ₁₆ ). The transport mechanism 100 transports the substrate G in the third thermal processing unit 36.

On the cassette station (C / S) 14 side, the transport mechanism 22 receives the substrate G that has completed all the steps of the coating and developing process from the pass cooling unit (PASS _R COL) of the third thermal processing unit 36, The received substrate G is accommodated in one of the cassettes C on the stage 20 (step S ₁ ).

  In the coating and developing treatment system 10, the present invention can be applied to the cleaning process section 24, for example. Hereinafter, an embodiment in which the present invention is applied to the cleaning process unit 24 will be described with reference to FIGS.

FIG. 4 shows the overall configuration of the cleaning process unit 24 according to an embodiment of the present invention, and FIG. 5 shows the configuration of main processing units on the transport path. The cleaning process section 24 is an inclined conveyance path formed by inclining a rod-shaped roller 112 by a predetermined angle φ with respect to the horizontal Y direction and laying it at a predetermined pitch in the X direction (the direction of the process line A). 114, and six blocks or modules M _{1 to} M ₆ are arranged in a row along the conveyance path 114 via a partition wall 116. The partition wall 116 is formed with a slit 118 through which the conveyance path 114 passes.

These six of the modules M ₁ ~M _6, 1-th module M ₁ located at the most upstream end of the conveyance path 114 constitutes a loading unit (IN) 40, 2 th module M ₂ excimer UV irradiation unit (E-UV) 41 is constituted, and the remaining four modules M ₃ , M ₄ , M ₅ , M ₆ constitute a scrubber cleaning unit (SCR) 42.

  The carry-in unit (IN) 40 receives the substrate G in a horizontal state from the transport mechanism 22 of the cassette station (C / S) 14, converts the posture of the substrate G from a horizontal posture to an inclined posture, and then conveys the substrate G in an inclined manner. It is configured to be mounted or loaded on the path 114, and includes a substrate attitude changing mechanism 120 and the like which will be described later.

  The excimer UV irradiation unit (e-UV) 41 is provided with a lamp chamber 124 containing an ultraviolet lamp 122 above the conveyance path 114. As shown in FIG. 5A, the lamp chamber 124 is also inclined by a predetermined angle φ with respect to the horizontal line (Y direction) and faces the roller 112 or the conveyance path 114 in parallel. The ultraviolet lamp 122 is composed of, for example, a dielectric barrier discharge lamp, and irradiates the substrate G on the conveyance path 114 directly below the substrate G on the transport path 114 with a wavelength 172 nm suitable for cleaning organic contamination through the quartz glass window 126. It has become. A concave reflecting mirror 123 having a circular arc cross section is provided behind or above the ultraviolet lamp 122.

In scrubber cleaning units (SCR) 42, the module M ₃ are configured scrubbing cleaning chamber, solution supply nozzle 128 to the chamber along the conveying path 114, the roll brush 130, such as the cleaning spray pipe 132 is disposed. The module M ₄ constitutes a rinsing chamber, and a rinsing nozzle 134 is disposed above the conveyance path 114 in the chamber. The module M ₅ constitutes a drying chamber, and an air knife 136 is disposed above the conveyance path 114 in the chamber. As shown in FIGS. 5B and 5C, the roll brush 130 and the rinse nozzle 134 are also inclined in parallel with the roller 112 or the conveyance path 114 with a predetermined angle φ with respect to the horizontal line (Y direction). Although not shown, the chemical solution supply nozzle 128, the cleaning spray tube 132, the air knife 136, and the like are also formed in a long shape like the rinse nozzle 134, and are inclined by a predetermined angle φ with respect to the horizontal line (Y direction). Note that pans 138, 140, and 142 for collecting the liquid that has fallen under the conveyance path 114 are provided below the processing chambers M ₃ , M ₄ , and M ₅ , respectively. A recovery system or a drain system pipe is connected to a drain port provided at the bottom of each pan.

The last module M ₆ constitutes a conveyance path switching unit that switches the inclined conveyance path 114 to the horizontal conveyance path 144. A substrate posture changing mechanism 146 to be described later for converting the substrate G from the tilted posture to the horizontal posture is provided in the room. The horizontal conveyance path 144 is formed by laying horizontal rollers 148 at a predetermined pitch in the X direction, and is a path in a downstream adjacent unit, that is, an upstream oven tower (TB) 44 of the first thermal processing unit 26. It has been drawn into the unit 50 (FIG. 2).

  Here, the overall operation and action of the cleaning process section 24 will be described. The substrate G is carried into the carry-in unit (IN) 40 in a horizontal state from the adjacent carrying mechanism 22 to a predetermined carry-in position set just above the inclined carrying path 114. The substrate posture conversion mechanism 120 converts the posture of the substrate G from a horizontal posture to an inclined posture while lowering the substrate G from the carry-in position, and places the substrate G at the loading position set in the transport path 114 in the inclined posture. To do.

  The rollers 112 constituting the transport path 114 rotate in a direction in which the substrate G is advanced by a driving force of an electric motor via a transmission mechanism such as a rotational drive shaft or a gear. Thus, the substrate G placed on the transport path 114 is immediately transported toward the adjacent excimer UV irradiation unit (e-UV) 41. Usually, the substrate G for LCD is formed in a rectangular shape, and is transported on the transport path 114 in a direction in which the longitudinal direction is parallel to the transport direction.

In the excimer UV irradiation unit (e-UV) 41, as shown in FIG. 5A, ultraviolet rays emitted from the ultraviolet lamp 122 in the lamp chamber 124 pass through the quartz glass window 126 and irradiate the substrate G on the transport path 114. Is done. Oxygen in the vicinity of the substrate surface is excited by the ultraviolet rays to generate ozone, and organic substances on the substrate surface are oxidized and vaporized and removed by the ozone. After leaving an excimer UV irradiation unit (e-UV) 41, then the substrate G is carried into the scrubbing washing chamber M ₃ scrubber cleaning units (SCR) 42.

In the scrubbing cleaning chamber M ₃ , the substrate G is first sprayed with, for example, an acid or alkaline chemical solution from the chemical solution nozzle 128. Next, the substrate G passes through while being rubbed under the roll brush 130. The roll brush 130 is rotated in a direction opposite to the conveying direction by a rotational driving force of a brush driving unit (not shown), and scrapes foreign matters (dust, debris, contaminants, etc.) on the substrate surface. Immediately after that, the cleaning spray tube 132 sprays a cleaning liquid such as pure water on the substrate G to wash away foreign substances floating on the substrate. Since the substrate G is inclined on the transfer path 114, the foreign matter scraped off from the substrate surface moves to the lower side of the substrate G due to gravity together with the chemical solution and the cleaning solution. Fall from the edge to the lower pan 138.

Subsequent to the scrubbing cleaning chamber M ₃ , the substrate G passes through the rinsing chamber M ₄ . In the rinse treatment chamber M ₄ , the rinse nozzle 134 supplies a rinse liquid such as pure water to the substrate G on the transport path 114. Thus, the liquid on the substrate G which is brought in from the scrubbing cleaning chamber M ₃ (liquid foreign matters floating) is replaced with the rinse liquid. Even in this scene, since the substrate G is in an inclined posture, the liquid on the substrate G flows downward due to gravity and falls from the lower edge of the substrate G to the lower pan 140.

Subsequent to the rinse treatment chamber M ₄ , the substrate G is sent to the drying treatment chamber M ₅ . In the drying processing chamber M ₅ , the air knife 136 applies a knife-like sharp gas flow, such as air, to the substrate G transported in an inclined posture on the transport path 114. As a result, the liquid attached to the substrate G is wiped off by the wind of air and falls to the lower pan 142.

The substrate G that has been drained in the drying chamber M ₅ rides on the transport path 114 as it is and is sent to the transport path switching unit M ₆ . In the transfer path switching unit M ₆ , the substrate G is transferred from the inclined transfer path 114 to the horizontal transfer path 144 at the same time as the attitude of the substrate G is changed from the tilted attitude to the horizontal attitude by the substrate attitude changing mechanism 146. The rollers 148 constituting the horizontal transport path 144 rotate in the direction in which the substrate G is advanced by the driving force of the transport drive unit independent of the transport drive system of the inclined transport path 114. In this way, the substrate G transferred to the horizontal transfer path 144 is transferred toward the downstream side unit, that is, the pass unit 50 (FIG. 2) in the upstream oven tower (TB) 44 of the first thermal processing unit 26. The

  As described above, the cleaning process unit 24 of this embodiment forms the inclined transport path 114 by arranging the rollers 112 inclined at a constant angle φ at a constant pitch, and the substrate G in an inclined posture that moves on the inclined transport path 114. In contrast, ultraviolet ozone cleaning, scrubbing cleaning, rinsing, and drying are sequentially performed. In scrubbing cleaning and rinsing, foreign matter and liquid are quickly washed away from the inclined substrate G by gravity, which not only shortens processing time but also prevents re-adhesion of particles. It can save a lot of usage. In addition, since the liquid film remaining on the substrate after the rinsing process becomes thin, the air force used in the drying process can be greatly reduced.

  Further, in the cleaning process section 24, the loading unit (IN) 40 can safely load the substrate G loaded in the horizontal state from the adjacent transport mechanism 22 onto the inclined transport path 114 without being subjected to excessive stress. It has become. Hereinafter, the configuration and operation of the carry-in unit (IN) 40 will be described in detail with reference to FIGS.

  6 and 7 are a plan view and a side view showing the configuration of the main part in the carry-in unit (IN) 40, respectively. In the carry-in unit (IN) 40, a frame 150 fixed to the floor is vertically and horizontally assembled. The roller 150 of the inclined conveyance path 114, the substrate posture changing mechanism 120, the conveyance driving unit 152, and the in-buffer are arranged on the frame 150. 154 etc. are attached.

  More specifically, both ends of the roller 112 are rotatably supported by a pair of left and right bearings 156 fixed to the frame 150 in a posture inclined by a predetermined angle (φ). Further, the central portion of the roller 112 is also rotatably supported by a bearing 158 fixed to the frame 150. The roller 112 is formed of a rigid shaft having a constant thickness (diameter), and cylindrical roller portions 112a that support both side ends (long side edge portions) of the substrate G are attached to both ends of the shaft, and a shaft intermediate portion is attached. A plurality of cylindrical roller portions 112b that support the intermediate portion of the substrate G are attached to the substrate. The roller portions 112a at both ends, in particular, the roller portions 112a at the lower end, are integrally formed with a bowl-shaped large diameter portion that receives the side surface on the lower end side of the substrate G.

  The transport driving unit 152 includes an electric motor 160 fixed to the frame 150 and a transmission mechanism for transmitting the rotational driving force of the electric motor 160 to each roller 112. This transmission mechanism includes a rotary drive shaft 166 extending in the conveying direction (X direction) connected to the rotary shaft of the electric motor 160 via an endless belt 164, and an intersection for operatively coupling the rotary drive shaft 166 and each roller 112. It is composed of a shaft-type gear 168.

  The substrate attitude changing mechanism 120 includes a plurality of air cylinders 170 fixed upward to the frame 150, a plate-like lift base 172 coupled to the piston rods of these air cylinders 170, and a transfer direction to the lift base 172. And a plurality of pivoting or swiveling lifters 174 attached at predetermined intervals in the (X direction).

  Each lifter 174 includes a rod-like or plate-like flange 176 extending in the Y direction, a plurality of lift pins 178 attached to the flange 176 at an appropriate interval in the longitudinal direction, and a flange 176. It has a hinge part 180 for rotatably supporting in a vertical plane, and an air cylinder 186 for rotating or turning the collar part 176. Here, the hinge portion 180 is attached to the upper end of the support bar 175 extending vertically upward from the lift base 172 on the upper end portion side of the roller 112, and is coupled to one end portion of the flange portion 176. On the other hand, the air cylinder 186 has a hinge portion 182 between a lower end portion of a support rod or support plate 177 extending vertically downward from the lift base 172 on the lower end portion side of the roller 112 and an intermediate portion or the other end portion of the flange portion 176. It is attached upward via 184. The air cylinder 186 can be replaced with a linear actuator such as a silinoid (trade name).

  Each lifter 174 is also provided with a substrate side support portion 183 for receiving a lower side surface when the substrate G is supported in an inclined posture. The substrate side support portion 183 in this configuration example has a support rod 185 attached to the tip end portion of the flange portion 176 with substantially the same length (height) as the lift pin 178, and the transport direction ( It is composed of a cylindrical or cylindrical roller 187 which is mounted so as to be rotatable about a horizontal rotation axis parallel to the (X direction).

  FIG. 7 shows a state where the lifter 174 is retracted to the lowest position within the movable range, that is, the original position or the backward movement position. In this state, the piston rod of the air cylinder 170 for lifting the lift base is retracted, the piston rod of the air cylinder 186 for swiveling is also retracted, and the collar 176 is inclined in a substantially parallel posture with the roller 112. The tip of each lift pin 178 is under the roller 112 (conveying path 114).

  The in-buffer 154 carries the substrate G loaded on the transfer arm 22a in the horizontal state from the transfer mechanism 22 (FIG. 1) adjacent to the upstream side (left adjacent in FIG. 6), which is set right above the transfer path 114. The substrate G received at the position is supported in the horizontal posture temporarily, that is, until it is passed to the substrate posture changing mechanism 120. The in-buffer 154 in the illustrated configuration example includes a plurality of vertically extending rotating shafts 188 installed around the substrate ascending / descending region, and a rotary drive unit such as a rotary cylinder 190 coupled to the lower end of each rotating shaft 188. And a horizontal support arm 192 extending horizontally from the upper end of each rotating shaft 188 and a plurality of support pins 194 attached to each horizontal support arm 192 and extending vertically upward. Each horizontal support arm 192 rotates or pivots between an original position or a backward movement position outside the substrate lift area and an inner forward movement position by the rotational drive of each rotary cylinder 190 fixed to the frame 150. It has become. FIG. 7 shows a state in which each horizontal support arm 192 of the in-buffer 154 supports the substrate G horizontally at the forward movement position in the substrate lifting / lowering region.

  Next, the operation of the carry-in unit (IN) 40 will be described with reference to FIGS. When a new substrate G is loaded from the cassette station (C / S) 14, the in-buffer 154 causes the horizontal support arm 192 to wait in advance in the substrate lifting / lowering area in the loading unit (IN) 40. deep. Then, the transfer mechanism 22 inserts the transfer arm 22a from the upstream side (left side in FIG. 6), and transfers the substrate G onto the support pins 194 of the in-buffer 154 in a horizontal state. At this time, the substrate attitude changing mechanism 120 retracts the lifter 174 and the lift base 172 to the original position or the backward movement position as shown in FIG.

  When the transfer arm 22a of the transfer mechanism 22 passes the substrate G to the in-buffer 154 and exits from the carry-in unit (IN) 40, the substrate attitude conversion mechanism 120 thereafter moves the lift base 172 and the lifter 174 from the original position of FIG. 9 is moved up to the forward movement position of FIG. 10 through each step of FIG. As described above, since the plurality of lifters 174 are provided at predetermined intervals in the transport direction (X direction), all the lifters 174 are moved simultaneously at the same timing.

  Specifically, as shown in FIGS. 8 and 9, the lift base lifting air cylinder 170 advances or extends the piston rod so that the lift base 172 rises in a horizontal posture and is attached to the lift base 172. Each part (especially the lifter 174) that is lifted together. At the same time, each air cylinder 186 for swirling advances or extends the piston rod, so that in each lifter 174, the collar portion 176 centers on the uppermost hinge portion 180, that is, the bottom end portion, that is, the substrate side support portion 183. Swivels in a direction to raise the side edge. The hinge portions 182 and 184 at both ends of each air cylinder 186 are rotated following the turning motion of the flange portion 176.

  In this way, the flange portion 176 passes through between the rollers 112 of the transport path 114 while turning, and the lift pin 178 and the substrate side support portion 183 rise toward the height position of the in-buffer 154. When the forward movement position is reached, as shown in FIG. 10, the lift pins 178 of each lifter 174 rise to a level slightly above the support pins 194 of the in-buffer 154 and become horizontal, and support the substrate G in a horizontal state. Receive from pin 194. At this time, when one side edge of the substrate G contacts the roller 187 of the substrate side support portion 183, the roller 187 rotates to guide the substrate G onto the lift pins 178.

  When the transfer of the substrate G from the support pins 194 of the in-buffer 154 to the lift pins 178 of the lifter 174 is completed as described above, the in-buffer 154 rotates each horizontal support arm 192 to retract out of the substrate lift area. Immediately after that, the substrate attitude changing mechanism 120 moves the lift base 172 and the lifter 174 from the original position in FIG. 10 to the backward movement position in FIG. 14 through the respective steps in FIGS. 11, 12 and 13.

  More specifically, as shown in FIGS. 11 and 12, the lift base air cylinder 170 moves the piston rod backward or shortens so that the lift base 172 descends in a horizontal posture and is attached to the lift base 172. Each part (especially lifter 174) descends together. At the same time, the air cylinders 186 for swirling retreat or shorten the piston rod, so that in each lifter 174, the collar 176 descends the end on the substrate side support 183 side around the hinge 180. Make a swivel motion. Also at this time, the hinge portions 182 and 184 at both ends of each air cylinder 186 rotate following the turning motion of the flange portion 176. In this way, the flange 176 passes downwardly between the rollers 112 of the conveyance path 114 while turning, and the lift pins 178 and the substrate side support portions 183 move toward the height positions of the both end support portions 112a and the intermediate support portions 112b of the rollers 112. Descend. During this time, the substrate G changes from the horizontal posture to the inclined posture on the lift pins 178, and the side surface on the lower end side of the substrate G is supported and aligned by the roller 187 of the substrate side support portion 183. For this alignment, the substrate G may be slippery on the lift pins 178. For example, the tip of the pin may be made of a slippery material, or a sphere that can freely rotate is attached to the tip of the pin.

  Then, as shown in FIG. 13, the surface passing through the upper ends of the lift pins 178 of the lifter 174 (the substrate support surface of the lifter 174) passes through the upper ends of the roller portions 112 a and 112 b of the rollers 112 (rollers). The substrate G supported by the lift pins 178 of the lifter 174 is simultaneously supported by the roller portions 112a and 112b of the roller 112. Then, when the lifter 174 is further lowered from here, the lift pins 178 and the substrate side support portions 183 of the lifter 174 are separated from the substrate G, and instead, the roller portions 112a and 112b of the rollers 112 place and support the substrate G. Become. In this way, the substrate G is placed or loaded at the set position on the transport path 114 in a posture inclined at the same angle as the roller 112. The lifter 174 preferably stops or terminates the turning motion immediately before passing the substrate G to the roller 112 and takes an inclined posture parallel to the roller 112.

  After loading, the substrate G is sent to the downstream processing unit by roller conveyance on the conveyance path 114. It is also possible to divide the roller transport drive system into a plurality along the transport path 114. For example, a dedicated drive unit 152 may be provided in the carry-in unit (IN) 40, and the roller 112 in the unit may be kept stationary during loading and started (rotated) after loading is completed.

  As described above, in the carry-in unit (IN) 40, the in-buffer 154 receives the substrate G loaded from the transport mechanism 22 in the horizontal state above the inclined transport path 114. Then, the substrate attitude changing mechanism 120 raises the lifter 174 from below the inclined conveyance path 114 to the height position exceeding the in-buffer 154 through the rollers 112, and picks up the substrate G in a horizontal state. After the retreat, the lifter 174 is lowered to the original position, and the swinging movement is also performed in the middle of the lowering to convert the posture of the substrate G from the horizontal posture to the inclined posture of the substantially same angle as the inclined conveyance path 114 on the lifter 174, The substrate G is placed in parallel in the inclined posture on the inclined conveyance path 114 (roller 112). According to such a loading method, when the substrate G is transferred from the lifter 174 to the inclined transport path 114, it is not necessary to apply stress to the substrate G (without bending), and the circuit elements on the device formation surface of the substrate G And wiring can be kept safe.

  In the illustrated configuration example, as shown in FIGS. 7 and 14, the lifter 174 is retracted to the original position directly below the inclined conveyance path 114 in an inclined posture parallel to the inclined conveyance path 114 (roller 112). In this configuration, the movable range or occupied space of the lifter 174 can be minimized, and the lifting drive unit and the turning drive unit can be reduced in size and labor can be saved. However, the lifter 174 can be kept in the original position in an arbitrary posture, and can be directed to the in-buffer 154 in an arbitrary posture, for example, from the beginning in a horizontal posture. It is also possible for the lifter 174 to directly receive the substrate G in the horizontal state from the transport mechanism 22 without the in-buffer 154.

  In this configuration example, the side surface on the lower end side of the substrate G is supported on the inclined transport path 114 by the flanged roller portion 112 a of the roller 112. As another configuration example, as shown in FIG. 15, a configuration in which the lower end side surface of the substrate G is supported or guided by a cylindrical guide roller 192 arranged at a constant interval along the lower end line of the inclined conveyance path 114 is also possible. is there. In this case, it is preferable that the axis of the guide roller 192 is inclined from the vertical line N by an angle (φ) equal to the inclined conveyance path 114 so that the outer peripheral surface of the guide roller 192 is in parallel with the lower end side surface of the substrate G. Further, it is preferable that the upper end portion 192a of the guide roller 192 is tapered so that the substrate G can be smoothly guided (dropped) during loading as described above.

Next, the structure and operation of the conveyance path switching unit M ₆ in an embodiment of the present invention with reference to FIGS. 16 to 19.

16 and 17 are a plan view and a side view showing a major portion of the conveyance path switching unit M _6. A fixed frame 150 is also assembled vertically and horizontally in the conveyance path switching unit M ₆ , and a roller 112 of the inclined conveyance path 114, a roller 148 of the horizontal conveyance path 144, a substrate posture changing mechanism 146, and the like are attached to the frame 150. ing.

As shown in FIG. 16, the rollers 148 of the roller [112] and the horizontal conveying path 144 of the inclined transport path 114 in the conveying path switching unit M ₆ are alternately arranged in a half-pitch in the transport direction (X direction) ing. The roller 148 of the horizontal conveyance path 144 is rotatably supported in a horizontal posture by a pair of left and right bearings 200 fixed to the frame 150 and a central bearing 201. The horizontal roller 148 is formed of a rigid shaft having a constant thickness (diameter). Cylindrical roller portions 148a that support both side ends (long side edges) of the substrate G are attached to both ends of the shaft, and the shaft intermediate portion is attached. A plurality of cylindrical roller portions 148b that support the intermediate portion of the substrate G are attached to the substrate. The roller portions 148a at both ends are integrally formed with large-diameter flanges that support both side surfaces of the substrate G. As shown in FIG. 16, the roller 148 of the horizontal conveyance path 144 is also extended to the downstream side (right side) pass unit (PASS _L ) 50.

  The horizontal conveyance system drive unit 202 is disposed on the opposite side of the inclined conveyance system drive unit 152 across the conveyance paths 114 and 144, and the electric motor 204 fixed to the frame 150, and the rotational driving force of the electric motor 204 Is transmitted to each horizontal roller 148. This transmission mechanism includes a rotary drive shaft 210 extending in the conveying direction (X direction) connected to the rotary shaft of the electric motor 204 via an endless belt 208, and an intersection for operatively coupling the horizontal rollers 148 to the rotary drive shaft 210. It is composed of a shaft type gear 212.

Roller [112] of the inclined transport path 114 in the conveying path switching unit M ₆ is different from the tilt roller 112 in the other section has a configuration which can change the tilt angle within a certain range. More specifically, the bearing 156R at one end of the roller [112] is fixed to the frame 150, while the bearing 156L at the other end is coupled to the piston rod of the air cylinder 218 via the arm-like support member 214 and the hinge portion 216. Has been. The lower end portion of the air cylinder 218 is attached upward to the frame 150 via the hinge portion 220. When the air cylinder 218 expands and contracts the piston rod, the roller [112] rotates or turns in the vertical plane with a support portion provided in the vicinity of the bearing 156R as a fulcrum.

  According to one embodiment, a separate air cylinder 218 is connected to each roller [112] via a separate arm-like support member 214 and a hinge portion 216. In this case, all the rollers [112] can be swung simultaneously (in parallel) at the same timing, and each roller [112] can be swung individually at different timings. According to another embodiment, one air cylinder 218 is connected to all the rollers [112] via an arm-like support member 214 and one hinge portion 216 that are integral with each other. In this case, all the rollers [112] are always turned in parallel at the same timing.

Further, the rollers [112] in the transport path switching unit M _6, like the other sections are connected to cross shaft gear 168 of the inclined conveyor system in extension of the outside of the bearing 156R. The cross shaft gear 168 in the transport path switching unit M ₆ is preferably a non-contact magnet type.

  In this embodiment, a roller turning mechanism (air cylinder 218, hinges 216, 220, arm-like support member 214) for turning the roller [112] and the movable roller 112 of the inclined conveyance path 114 and the horizontal conveyance path 144 are fixed. A (horizontal) roller 148 cooperates to constitute a substrate posture changing mechanism 146. In FIG. 16, the roller turning mechanism is omitted for convenience of illustration.

Next, the operation of the conveyance path switching unit M _6. As described above, the substrate G that has been drained in the preceding drying chamber M ₅ is sent to the transport path switching unit M ₆ by roller transport on the inclined transport path 114 (FIG. 4). In the transfer path switching unit M ₆ , as shown in FIG. 17, the rollers [112] of the inclined transfer path 114 are maintained in an inclined posture parallel to the rollers 112 of other sections, and the substrate G from the drying processing chamber M ₅ is held. Welcome. At this time, the cross shaft gear 168 of the inclined conveyance drive unit 152 is magnetically engaged, and connects the rotary drive shaft 166 to the roller [112] so that power can be transmitted. Further, in the roller turning mechanism, the air cylinder 218 extends the piston rod to hold the turning end portion (the end portion on the bearing 156L side) of the roller [112] at the highest position within the turning range. The roller 148 of the horizontal conveyance path 144 is at a position lower than the roller [112] of the inclined conveyance path 114 over the entire length.

When the substrate G arrives at a position overlying all of the rollers [112] in the transport path switching unit M _6, the drive unit 202 of the inclined conveyor system is stopped, the substrate G is positioned. Next, the roller turning mechanism is operated to turn the roller [112] from the position shown in FIG. 17 to the position shown in FIG. 19 through the stage shown in FIG.

  More specifically, the air cylinder 218 retracts (shortens) the piston rod by a fixed stroke. As a result, the rotation end (end on the bearing 156L side) of the roller [112] is lowered via the arm-shaped support member 214, and the roller [112] rotates or rotates in the vertical plane with the bearing 156R as a fulcrum. . During the turning motion of the roller [112], the substrate G gradually decreases in inclination integrally with the roller [112] from the inclined posture of FIG. Although illustration is omitted, when the substrate G is in a horizontal state on the roller [112], the roller [112] and the roller 148 of the horizontal conveyance path 144 are flush with each other, and the substrate G is a roller portion of the roller [112]. It is mounted not only on 112a and 112b but also on the roller portions 148a and 148b of the roller 148. From here, the roller [112] further pivots downward so that the roller [112] is separated from the substrate G, and the roller 148 exclusively supports the substrate G. When the roller [112] reaches the turning end point (the lowest position in the turning range), as shown in FIG. 19, the rotating end (end on the bearing 156L side) of the roller [112] The inclined posture is in the opposite direction lower than the end by a certain value or more, and the roller [112] is lower than the roller 148 of the horizontal conveyance path 144 over the entire length. At this time, the cross shaft gear 168 of the inclined conveyance drive unit 152 is not magnetically engaged (disengaged), and the power of the rotation drive shaft 166 cannot be transmitted to the roller [112].

When the transfer of the substrate G from the roller [112] of the inclined transfer path 114 to the roller 148 of the horizontal transfer path 144 is completed as described above, the drive unit 202 of the horizontal transfer system is activated and the substrate G is moved to the horizontal transfer path. It is sent to the subsequent pass unit (PASS _L ) 50 by roller transport on 144.

In this configuration example, laid horizontal conveying path 144 in the conveying path switching unit M ₆ is as an extension from the pass unit (PASS _L) 50, the horizontal roller 148 in the conveying path switching unit M ₆ downstream clogging path unit ( PASS _L ) 50 is driven by the horizontal roller 148 and the common drive unit 202 and transmission mechanism (164, 166, 168). Common Meanwhile, the inclined transport path 114 in the conveying path switching unit M ₆ is laid as an extension of the drying process unit M _5, the inclined roller in the transport path switching unit M ₆ [112] The tilt roller 112 on the upstream side Are driven by the driving unit 152 and the transmission mechanism (208, 210, 212). Thus, no need is transfer drive dedicated to the transport path switching unit M _6, it is possible to simplify the conveying mechanism and the conveying control for conveyance path switching. However, it is also possible configuration in which the transfer drive dedicated to the transport path switching unit M _6.

Further, as described above, according to each of the inclined rollers [112] in the transport path switching unit M ₆ in arrangement for independently pivoting movement in a separate air cylinder 218, it is possible to shorten the transport tact. That is, as schematically shown in FIG. 20, when the roller conveyor of the horizontal conveying path 144 is initiated done so transfer the substrate G _i, among which the substrate G _i is not go out of the transport path switching unit M ₆ to, from those substrate G _i left the overhead, ie the return from an upstream side position of the inclined roller [112] the individual inclined transport path 114 in order to (position of FIG. 17), on the inclined conveying path 114 from the upstream side the next substrate G _{i + 1} coming is roller transported can welcome the conveying path switching unit M _6. As a result, the distance between the two substrates G _i and G _{i + 1} that are continuously (rolled back and forth) on the transport paths 114 and 144 can be made as small as possible to shorten the transport tact time. it can.

  The preferred embodiment of the present invention has been described above, but the present invention is not limited to the above embodiment, and other embodiments and various modifications are possible within the scope of the technical idea.

For example, in the above-described embodiment, the transport path switching unit M ₆ of the cleaning process unit 24 switches the flat transport path from the inclined transport path 114 to the horizontal transport path 144. According to the present invention, as schematically shown in FIG. 21A, it is diverted or applied to the application to switch the transport path 114 of the inclined transport path switching unit M ₆ of the embodiment from the transport path 144 for horizontal it can.

In this case, the substrate G is sent from the upstream side to the transport path switching unit M ₆ by roller transport on the horizontal transport path 144. In the transport path switching unit M ₆ , the roller G [112] of the inclined transport path 114 is waited at a position lower than the horizontal roller 144 (position in FIG. 19), and the substrate G is greeted. When the substrate G is positioned arrived in the conveyance path switching unit M _6, pivoting motion roller rotation mechanism is actuated the rollers [112] from the position of FIG. 19 to the position shown in FIG. 17 through the steps of FIG. 18. More specifically, the air cylinder 218 advances (extends) the piston rod by a certain stroke. Accordingly, the rotating end (end on the bearing 156L side) of the roller [112] is raised via the arm-shaped support member 214, and the roller [112] rotates or rotates in the vertical plane with the bearing 156R as a fulcrum. . In this turning motion, the roller [112] gradually decreases its inclination angle from the downward inclination posture of FIG. Although not shown, when the roller [112] is in a horizontal state, the roller [112] and the roller 148 of the horizontal conveyance path 144 are flush with each other, and the substrate G is not only the roller portions 148a and 148b of the roller 148. It is also placed on the roller portions 112a and 112b of the roller [112]. From here, the roller [112] further pivots upward, so that the substrate G is separated from the roller 144 and supported by the roller [112] alone. In a state where the roller [112] has reached the turning end point (the highest position within the turning range) (FIG. 17), the roller [112] becomes flush with the inclined posture of the same angle as the roller 112 in the other section. At the same time, the cross shaft gear 168 of the inclined conveyance drive unit 152 comes into magnetic engagement, and the power of the rotation drive shaft 166 can be transmitted to the roller [112].

  When the transfer of the substrate G from the roller 148 of the horizontal transfer path 144 to the roller [112] of the inclined transfer path 114 is completed as described above, the driving unit 152 of the inclined transfer system is activated and the substrate G is moved to the inclined transfer path. 114 is transferred to a subsequent processing unit (not shown) by roller conveyance.

Also in this embodiment, the arrangement for independently pivoting movement of each of the inclined rollers [112] in the transport path switching unit M ₆ in a separate air cylinder 218, it is possible to shorten the transport tact. That is, as schematically shown in FIG. 21A, when the roller conveyor of the inclined transport path 114 is initiated done so transfer the substrate G _i, among which the substrate G _i is not go out of the transport path switching unit M ₆ to, from those substrate G _i left the right below, i.e. individually inclined rollers [112] in order from the upstream side back to the position lower than the horizontal transport path 144 (the position of FIG. 19), a horizontal conveying path from the upstream side 144 The next substrate G _{i + 1} that has been roller-transferred can be welcomed into the transfer path switching unit M ₆ . As a result, the distance between the two substrates G _i and G _{i + 1} that are continuously roller-conveyed on the conveyance paths 144 and 114 can be made as small as possible, and the conveyance tact time can be shortened. it can.

Although the above-described embodiment relates to a cleaning processing apparatus that performs scrubbing cleaning, the present invention can also be applied to cleaning processing apparatuses that perform cleaning other than scrubbing, for example, blow cleaning, and substrates other than cleaning processing apparatuses. It can also be applied to a processing apparatus. For example, the coating and developing processing system as described above can be applied to the developing unit (DEV) 94. That is, in the development unit (DEV) 94, as described above, the substrate G is transported in a flat flow manner toward the downstream of the process line B, and a series of development processing steps such as development, rinsing, and drying are performed during the transport. Is done. Here, a horizontal conveyance path (144) is laid in the development processing section, and an inclined conveyance path (114) is laid in the rinsing processing section and the drying processing section, and the same conveyance path switching section (M ₆ ) as in the above embodiment. ) To switch from the horizontal conveyance path (144) to the inclined conveyance path (114). It is also possible to switch the inclined transport path (114) to a separate horizontal transport path (144) by a separate transport path switching section (M ₆ ) at the rear stage or downstream side of the drying processing section.

  The substrate to be processed in the present invention is not limited to an LCD substrate, and other FPD substrates, semiconductor wafers, CD substrates, glass substrates, photomasks, printed substrates and the like are also possible.

It is a top view which shows the structure of the application | coating development processing system which can apply this invention. It is a side view which shows the structure of the thermal process part in the application | coating development processing system of embodiment. It is a flowchart which shows the procedure of the process in the coating and developing treatment system of embodiment. It is a front view which shows the whole structure of the washing | cleaning process part in the application | coating development processing system of embodiment. It is a side view which shows the arrangement structure of the lamp chamber and a conveyance path in the washing | cleaning process part of embodiment. It is a side view which shows the arrangement structure of the roll brush and conveyance path in the washing | cleaning process part of embodiment. It is a side view which shows the arrangement structure of the rinse nozzle and conveyance path in the washing | cleaning process part of embodiment. It is a top view which shows the structure of the principal part in the carrying-in part in the scrubber washing | cleaning unit of embodiment. It is a side view which shows the structure (one state) of the principal part in the carrying-in part in embodiment. It is a side view which shows the structure (one step) of the principal part in the carrying-in part in embodiment. It is a side view which shows the structure (one step) of the principal part in the carrying-in part in embodiment. It is a side view which shows the structure (one step) of the principal part in the carrying-in part in embodiment. It is a side view which shows the structure (one step) of the principal part in the carrying-in part in embodiment. It is a side view which shows the structure (one step) of the principal part in the carrying-in part in embodiment. It is a side view which shows the structure (one step) of the principal part in the carrying-in part in embodiment. It is a side view which shows the structure (one step) of the principal part in the carrying-in part in embodiment. It is a schematic perspective view which shows the modification of the board | substrate side support part in embodiment. It is a top view which shows the structure of the principal part in the conveyance path switching part in embodiment. It is a side view which shows the structure (one state) of the principal part in the conveyance path switching part in embodiment. It is a side view which shows the structure (one step) of the principal part in the conveyance path switching part in embodiment. It is a side view which shows the structure (one state) of the principal part in the conveyance path switching part in embodiment. It is a schematic front view which shows typically one effect | action of the conveyance path switching part in embodiment. It is a schematic front view which shows the structure (one state) of the principal part in the conveyance path switching part in embodiment. It is a schematic front view which shows typically the effect | action of the conveyance path switching part in embodiment.

Explanation of symbols

10 Process Station 22 Transport Mechanism 24 Cleaning Process Section 40 Carry-in Section (IN)
42 Scrubber cleaning unit (SCR)
46 Transport mechanism 50 Pass unit (PASS _L )
112 Roller 114 (Inclined) Transfer path 120 Substrate posture changing mechanism (Horizontal → Inclined)
130 Roll Brush 134 Rinse Nozzle 136 Air Knife 144 (Horizontal) Transport Path
146 Substrate attitude conversion mechanism (tilt → horizontal)
148 Roller 150 Frame 152 Conveyance drive unit 154 In-buffer 156, 158 Bearing 160 Electric motor 168 Cross shaft gear 170 Air cylinder 172 Lift base 174 Lifter 176 Hook 178 Lift pin 180, 182, 184 Hinge unit 186 Air cylinder 192 Side support unit M ₆ transport path switching part

Claims (7)

A first transport path is formed by laying a first roller at a predetermined pitch from a predetermined start point to a switching section, and the substrate to be processed is inclined at a predetermined angle with respect to a horizontal line orthogonal to the horizontal transport direction. A first transport unit for roller transporting on the first transport path;
A second transport path formed by laying a second roller offset in the transport direction with respect to the first roller in the switching section at a predetermined pitch to a predetermined end point; said second transport path and a second transport unit for the roller conveyor in,
The first roller in the switching section is configured to be turnable in a vertical plane with one end thereof as a fulcrum, and the substrate is loaded into the switching section on the first transport path. The first roller is placed on the substrate from a first position higher than the second transport path for forming the first transport path, and the second roller is lower than the second transport path. Swiveling to a position, transferring the substrate from the first transport path to the second transport path in the middle of the swivel movement,
The fulcrum is provided in the vicinity of a first bearing that rotatably supports one end of the first roller,
An actuator for turning drive connected to the first roller in the switching section via a second bearing;
The actuator is individually connected to each of the first rollers in the switching section, and the first roller is identical in one direction between the first and second positions in the forward movement operation. In a reciprocating motion after completion of the transfer, the first rollers are individually swung in different directions between the first and second positions in different directions.
Flat flow type substrate transfer device. It has a first transport path in which the first roller is laid at a predetermined pitch from the switching section to a predetermined end point, and the substrate to be processed is inclined at a predetermined angle with respect to a horizontal line orthogonal to the horizontal transport direction. A first transport unit for roller transporting on the first transport path;
A second transport path formed by laying a second roller offset in the transport direction with respect to the first roller in the switch section at a predetermined pitch from a predetermined start point to the switch section; the said second conveying path and a second transport unit for the roller conveyor in a horizontal position,
The first roller in the switching section is configured to be turnable in a vertical plane with one end thereof as a fulcrum, and the substrate is loaded into the switching section on the second transport path. The first roller inside is swung from a second position lower than the second transport path to a first position higher than the second transport path for forming the first transport path. , The substrate is transferred from the second transport path to the first transport path in the middle of the turning movement,
The fulcrum is provided in the vicinity of a first bearing that rotatably supports one end of the first roller,
An actuator for turning drive connected to the first roller in the switching section via a second bearing;
The actuator is individually connected to each of the first rollers in the switching section, and the first roller is identical in one direction between the first and second positions in the forward movement operation. In a reciprocating motion after completion of the transfer, the first rollers are individually swung in different directions between the first and second positions in different directions.
Flat flow type substrate transfer device. In the backward movement operation after the completion of the transfer, the first rollers in the switching section are sequentially turned in a certain time difference in the other direction between the first and second positions in accordance with the arrangement order in the transport direction. the substrate transport apparatus of claim 1 or claim 2. The actuator was commonly connected to all of the first roller in the switching zone, simultaneously causing pivoted movement at the same timing their first roller in both directions between the first and second position, wherein Item 4. The substrate transfer apparatus according to any one of Items 1 to 3 . The first transport unit is
A rotary drive shaft extending in the transport direction alongside the first transport path;
An electric motor for rotationally driving the rotational drive shaft;
A cross shaft gear for connecting the first roller in the switching section to the rotary drive shaft at the first position so as to be able to transmit power, and to disconnect the first roller from the rotary drive shaft at the second position so as not to be able to transmit power; the a, a substrate conveying apparatus according to any one of claims 1-4. The board | substrate conveyance apparatus as described in any one of Claims 1-5 ,
And a processing unit for performing predetermined processing for the first transport path or the substrate of the second transport path, the substrate processing apparatus. Wherein the processing unit has a nozzle for supplying a processing liquid to the substrate of the first transport path, the substrate processing apparatus according to claim 6.

Images