JP2010521814A5 - - Google Patents

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JP2010521814A5
JP2010521814A5 JP2009553605A JP2009553605A JP2010521814A5 JP 2010521814 A5 JP2010521814 A5 JP 2010521814A5 JP 2009553605 A JP2009553605 A JP 2009553605A JP 2009553605 A JP2009553605 A JP 2009553605A JP 2010521814 A5 JP2010521814 A5 JP 2010521814A5
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immersion liquid
optical assembly
insertion member
substrate
projection apparatus
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JP2009553605A
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JP5282255B2 (ja
JP2010521814A (ja
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Priority claimed from US11/976,898 external-priority patent/US8237911B2/en
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JP2009553605A 2007-03-15 2008-03-12 液浸リソグラフィマシンにおける基板交換の間に、液浸流体を光学アセンブリに隣接して保持する装置および方法 Expired - Fee Related JP5282255B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US91805707P 2007-03-15 2007-03-15
US60/918,057 2007-03-15
US11/976,898 US8237911B2 (en) 2007-03-15 2007-10-29 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US11/976,898 2007-10-29
PCT/US2008/003224 WO2008115372A1 (en) 2007-03-15 2008-03-12 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine

Related Child Applications (1)

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JP2013032858A Division JP5327768B2 (ja) 2007-03-15 2013-02-22 液浸リソグラフィマシンにおける基板交換の間に、液浸流体を光学アセンブリに隣接して保持する装置および方法

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JP2010521814A JP2010521814A (ja) 2010-06-24
JP2010521814A5 true JP2010521814A5 (enExample) 2011-06-16
JP5282255B2 JP5282255B2 (ja) 2013-09-04

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Application Number Title Priority Date Filing Date
JP2009553605A Expired - Fee Related JP5282255B2 (ja) 2007-03-15 2008-03-12 液浸リソグラフィマシンにおける基板交換の間に、液浸流体を光学アセンブリに隣接して保持する装置および方法
JP2013032858A Expired - Fee Related JP5327768B2 (ja) 2007-03-15 2013-02-22 液浸リソグラフィマシンにおける基板交換の間に、液浸流体を光学アセンブリに隣接して保持する装置および方法
JP2013139931A Active JP5510600B2 (ja) 2007-03-15 2013-07-03 リソグラフィック投影装置及び液浸露光方法
JP2014065131A Active JP5725227B2 (ja) 2007-03-15 2014-03-27 液浸リソグラフィマシンにおける基板交換の間に、液浸流体を光学アセンブリに隣接して保持する装置および方法

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Application Number Title Priority Date Filing Date
JP2013032858A Expired - Fee Related JP5327768B2 (ja) 2007-03-15 2013-02-22 液浸リソグラフィマシンにおける基板交換の間に、液浸流体を光学アセンブリに隣接して保持する装置および方法
JP2013139931A Active JP5510600B2 (ja) 2007-03-15 2013-07-03 リソグラフィック投影装置及び液浸露光方法
JP2014065131A Active JP5725227B2 (ja) 2007-03-15 2014-03-27 液浸リソグラフィマシンにおける基板交換の間に、液浸流体を光学アセンブリに隣接して保持する装置および方法

Country Status (5)

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US (4) US8237911B2 (enExample)
JP (4) JP5282255B2 (enExample)
KR (4) KR20160003326A (enExample)
TW (2) TWI545407B (enExample)
WO (1) WO2008115372A1 (enExample)

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