JP2006024706A5 - - Google Patents

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Publication number
JP2006024706A5
JP2006024706A5 JP2004200917A JP2004200917A JP2006024706A5 JP 2006024706 A5 JP2006024706 A5 JP 2006024706A5 JP 2004200917 A JP2004200917 A JP 2004200917A JP 2004200917 A JP2004200917 A JP 2004200917A JP 2006024706 A5 JP2006024706 A5 JP 2006024706A5
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JP
Japan
Prior art keywords
optical surface
substrate
protection member
exposure apparatus
surface protection
Prior art date
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Application number
JP2004200917A
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English (en)
Japanese (ja)
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JP4444743B2 (ja
JP2006024706A (ja
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Application filed filed Critical
Priority to JP2004200917A priority Critical patent/JP4444743B2/ja
Priority claimed from JP2004200917A external-priority patent/JP4444743B2/ja
Publication of JP2006024706A publication Critical patent/JP2006024706A/ja
Publication of JP2006024706A5 publication Critical patent/JP2006024706A5/ja
Application granted granted Critical
Publication of JP4444743B2 publication Critical patent/JP4444743B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004200917A 2004-07-07 2004-07-07 露光装置及びデバイス製造方法 Expired - Fee Related JP4444743B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004200917A JP4444743B2 (ja) 2004-07-07 2004-07-07 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004200917A JP4444743B2 (ja) 2004-07-07 2004-07-07 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006024706A JP2006024706A (ja) 2006-01-26
JP2006024706A5 true JP2006024706A5 (enExample) 2007-08-23
JP4444743B2 JP4444743B2 (ja) 2010-03-31

Family

ID=35797772

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004200917A Expired - Fee Related JP4444743B2 (ja) 2004-07-07 2004-07-07 露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP4444743B2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101547077B1 (ko) 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI511179B (zh) 2003-10-28 2015-12-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI494972B (zh) 2004-02-06 2015-08-01 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
KR101342303B1 (ko) * 2004-06-21 2013-12-16 가부시키가이샤 니콘 노광 장치 및 그 부재의 세정 방법, 노광 장치의 메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조 방법
JP4961709B2 (ja) * 2004-10-13 2012-06-27 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
US7583357B2 (en) 2004-11-12 2009-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101559621B1 (ko) 2004-12-06 2015-10-13 가부시키가이샤 니콘 메인터넌스 방법, 메인터넌스 기기, 노광 장치, 및 디바이스 제조 방법
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101524964B1 (ko) 2005-05-12 2015-06-01 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US20110199591A1 (en) * 2009-10-14 2011-08-18 Nikon Corporation Exposure apparatus, exposing method, maintenance method and device fabricating method
JP2012078439A (ja) * 2010-09-30 2012-04-19 Olympus Corp 液浸対物レンズ及びそれを用いた倒立顕微鏡
US9720331B2 (en) * 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

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