JP4444743B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4444743B2
JP4444743B2 JP2004200917A JP2004200917A JP4444743B2 JP 4444743 B2 JP4444743 B2 JP 4444743B2 JP 2004200917 A JP2004200917 A JP 2004200917A JP 2004200917 A JP2004200917 A JP 2004200917A JP 4444743 B2 JP4444743 B2 JP 4444743B2
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Japan
Prior art keywords
exposure apparatus
optical surface
liquid
substrate
immersion
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Expired - Fee Related
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JP2004200917A
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Japanese (ja)
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JP2006024706A5 (enExample
JP2006024706A (ja
Inventor
裕久 太田
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Canon Inc
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Canon Inc
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Priority to JP2004200917A priority Critical patent/JP4444743B2/ja
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Publication of JP2006024706A5 publication Critical patent/JP2006024706A5/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004200917A 2004-07-07 2004-07-07 露光装置及びデバイス製造方法 Expired - Fee Related JP4444743B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004200917A JP4444743B2 (ja) 2004-07-07 2004-07-07 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

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JP2004200917A JP4444743B2 (ja) 2004-07-07 2004-07-07 露光装置及びデバイス製造方法

Publications (3)

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JP2006024706A JP2006024706A (ja) 2006-01-26
JP2006024706A5 JP2006024706A5 (enExample) 2007-08-23
JP4444743B2 true JP4444743B2 (ja) 2010-03-31

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JP2004200917A Expired - Fee Related JP4444743B2 (ja) 2004-07-07 2004-07-07 露光装置及びデバイス製造方法

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Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101484435B1 (ko) 2003-04-09 2015-01-19 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI628698B (zh) 2003-10-28 2018-07-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI612338B (zh) 2003-11-20 2018-01-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
TWI614795B (zh) 2004-02-06 2018-02-11 Nikon Corporation 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
KR101245070B1 (ko) * 2004-06-21 2013-03-18 가부시키가이샤 니콘 노광 장치 및 그 부재의 세정 방법, 노광 장치의 메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조 방법
JP4961709B2 (ja) * 2004-10-13 2012-06-27 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
US7583357B2 (en) 2004-11-12 2009-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4784513B2 (ja) * 2004-12-06 2011-10-05 株式会社ニコン メンテナンス方法、メンテナンス機器、露光装置、及びデバイス製造方法
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2660853B1 (en) 2005-05-12 2017-07-05 Nikon Corporation Projection optical system, exposure apparatus and exposure method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US20110199591A1 (en) * 2009-10-14 2011-08-18 Nikon Corporation Exposure apparatus, exposing method, maintenance method and device fabricating method
JP2012078439A (ja) * 2010-09-30 2012-04-19 Olympus Corp 液浸対物レンズ及びそれを用いた倒立顕微鏡
US9720331B2 (en) * 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

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Publication number Publication date
JP2006024706A (ja) 2006-01-26

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