JP2006032750A5 - - Google Patents

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Publication number
JP2006032750A5
JP2006032750A5 JP2004211031A JP2004211031A JP2006032750A5 JP 2006032750 A5 JP2006032750 A5 JP 2006032750A5 JP 2004211031 A JP2004211031 A JP 2004211031A JP 2004211031 A JP2004211031 A JP 2004211031A JP 2006032750 A5 JP2006032750 A5 JP 2006032750A5
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JP
Japan
Prior art keywords
exposure apparatus
immersion agent
substrate
cleaning
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004211031A
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English (en)
Japanese (ja)
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JP2006032750A (ja
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Publication date
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Priority to JP2004211031A priority Critical patent/JP2006032750A/ja
Priority claimed from JP2004211031A external-priority patent/JP2006032750A/ja
Publication of JP2006032750A publication Critical patent/JP2006032750A/ja
Publication of JP2006032750A5 publication Critical patent/JP2006032750A5/ja
Pending legal-status Critical Current

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JP2004211031A 2004-07-20 2004-07-20 液浸型投影露光装置、及びデバイス製造方法 Pending JP2006032750A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004211031A JP2006032750A (ja) 2004-07-20 2004-07-20 液浸型投影露光装置、及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004211031A JP2006032750A (ja) 2004-07-20 2004-07-20 液浸型投影露光装置、及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2006032750A JP2006032750A (ja) 2006-02-02
JP2006032750A5 true JP2006032750A5 (enExample) 2007-09-06

Family

ID=35898712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004211031A Pending JP2006032750A (ja) 2004-07-20 2004-07-20 液浸型投影露光装置、及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP2006032750A (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101124179B1 (ko) 2003-04-09 2012-03-27 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI628698B (zh) 2003-10-28 2018-07-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI389174B (zh) 2004-02-06 2013-03-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
US20090225286A1 (en) * 2004-06-21 2009-09-10 Nikon Corporation Exposure apparatus, method for cleaning member thereof , maintenance method for exposure apparatus, maintenance device, and method for producing device
JP4772306B2 (ja) 2004-09-06 2011-09-14 株式会社東芝 液浸光学装置及び洗浄方法
KR101559621B1 (ko) 2004-12-06 2015-10-13 가부시키가이샤 니콘 메인터넌스 방법, 메인터넌스 기기, 노광 장치, 및 디바이스 제조 방법
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR20170089028A (ko) 2005-05-12 2017-08-02 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 디바이스 제조 방법
CN102298274A (zh) 2006-05-18 2011-12-28 株式会社尼康 曝光方法及装置、维护方法、以及组件制造方法
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
CN101385124B (zh) * 2006-05-23 2011-02-09 株式会社尼康 维修方法、曝光方法及装置、以及组件制造方法
CN101390194B (zh) * 2006-06-30 2011-04-20 株式会社尼康 维修方法、曝光方法及装置、以及元件制造方法
WO2008026593A1 (en) * 2006-08-30 2008-03-06 Nikon Corporation Exposure apparatus, device production method, cleaning method, and cleaning member
KR20090060270A (ko) * 2006-09-08 2009-06-11 가부시키가이샤 니콘 클리닝용 부재, 클리닝 방법, 그리고 디바이스 제조 방법
US8947629B2 (en) 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US8011377B2 (en) 2007-05-04 2011-09-06 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
US7900641B2 (en) * 2007-05-04 2011-03-08 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
KR20100031694A (ko) 2007-05-28 2010-03-24 가부시키가이샤 니콘 노광 장치, 디바이스 제조 방법, 세정 장치, 및 클리닝 방법 그리고 노광 방법
JP5018277B2 (ja) * 2007-07-02 2012-09-05 株式会社ニコン 露光装置、デバイス製造方法、及びクリーニング方法
NL1035942A1 (nl) * 2007-09-27 2009-03-30 Asml Netherlands Bv Lithographic Apparatus and Method of Cleaning a Lithographic Apparatus.
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
NL1036709A1 (nl) 2008-04-24 2009-10-27 Asml Netherlands Bv Lithographic apparatus and a method of operating the apparatus.
US20110199591A1 (en) * 2009-10-14 2011-08-18 Nikon Corporation Exposure apparatus, exposing method, maintenance method and device fabricating method
NL2005610A (en) 2009-12-02 2011-06-06 Asml Netherlands Bv Lithographic apparatus and surface cleaning method.

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG2013077797A (en) * 2003-04-11 2017-02-27 Nippon Kogaku Kk Cleanup method for optics in immersion lithography
JP2005277363A (ja) * 2003-05-23 2005-10-06 Nikon Corp 露光装置及びデバイス製造方法
JP4770129B2 (ja) * 2003-05-23 2011-09-14 株式会社ニコン 露光装置、並びにデバイス製造方法
EP1524558A1 (en) * 2003-10-15 2005-04-20 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101440746B1 (ko) * 2004-06-09 2014-09-17 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법

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