JP2005286026A5 - - Google Patents

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Publication number
JP2005286026A5
JP2005286026A5 JP2004096429A JP2004096429A JP2005286026A5 JP 2005286026 A5 JP2005286026 A5 JP 2005286026A5 JP 2004096429 A JP2004096429 A JP 2004096429A JP 2004096429 A JP2004096429 A JP 2004096429A JP 2005286026 A5 JP2005286026 A5 JP 2005286026A5
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JP
Japan
Prior art keywords
lens
exposed
exposure apparatus
convex
plano
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2004096429A
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English (en)
Japanese (ja)
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JP4510494B2 (ja
JP2005286026A (ja
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Priority to JP2004096429A priority Critical patent/JP4510494B2/ja
Priority claimed from JP2004096429A external-priority patent/JP4510494B2/ja
Priority to US11/093,097 priority patent/US7215410B2/en
Publication of JP2005286026A publication Critical patent/JP2005286026A/ja
Priority to US11/687,386 priority patent/US7408620B2/en
Publication of JP2005286026A5 publication Critical patent/JP2005286026A5/ja
Application granted granted Critical
Publication of JP4510494B2 publication Critical patent/JP4510494B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004096429A 2004-03-29 2004-03-29 露光装置 Expired - Fee Related JP4510494B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004096429A JP4510494B2 (ja) 2004-03-29 2004-03-29 露光装置
US11/093,097 US7215410B2 (en) 2004-03-29 2005-03-28 Exposure apparatus
US11/687,386 US7408620B2 (en) 2004-03-29 2007-03-16 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004096429A JP4510494B2 (ja) 2004-03-29 2004-03-29 露光装置

Publications (3)

Publication Number Publication Date
JP2005286026A JP2005286026A (ja) 2005-10-13
JP2005286026A5 true JP2005286026A5 (enExample) 2008-08-21
JP4510494B2 JP4510494B2 (ja) 2010-07-21

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ID=34989411

Family Applications (1)

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JP2004096429A Expired - Fee Related JP4510494B2 (ja) 2004-03-29 2004-03-29 露光装置

Country Status (2)

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US (2) US7215410B2 (enExample)
JP (1) JP4510494B2 (enExample)

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US7405805B2 (en) * 2004-12-28 2008-07-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7491661B2 (en) * 2004-12-28 2009-02-17 Asml Netherlands B.V. Device manufacturing method, top coat material and substrate
US20060147821A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US8692973B2 (en) 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
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US7224431B2 (en) * 2005-02-22 2007-05-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US7428038B2 (en) 2005-02-28 2008-09-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
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US7684010B2 (en) * 2005-03-09 2010-03-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US7944628B2 (en) * 2005-03-09 2011-05-17 Carl Zeiss Smt Gmbh Optical element unit
US7330238B2 (en) * 2005-03-28 2008-02-12 Asml Netherlands, B.V. Lithographic apparatus, immersion projection apparatus and device manufacturing method
US7411654B2 (en) 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7291850B2 (en) * 2005-04-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100555568C (zh) * 2005-04-28 2009-10-28 株式会社尼康 曝光方法及曝光装置、以及元件制造方法
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317507B2 (en) * 2005-05-03 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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KR101504765B1 (ko) 2005-05-12 2015-03-30 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7435528B2 (en) * 2005-06-09 2008-10-14 E.I. Du Pont De Nemours And Company Processes and devices using polycyclic fluoroalkanes in vacuum and deep ultraviolet applications
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JP2009009954A (ja) * 2005-10-18 2009-01-15 Nikon Corp 露光装置及び露光方法
US7864292B2 (en) * 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US7633073B2 (en) * 2005-11-23 2009-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007152235A (ja) * 2005-12-05 2007-06-21 Nomura Micro Sci Co Ltd 液浸露光装置用超純水の製造方法及び装置
US7420194B2 (en) * 2005-12-27 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
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US9477158B2 (en) * 2006-04-14 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
EP2062098B1 (en) 2006-09-12 2014-11-19 Carl Zeiss SMT GmbH Optical arrangement for immersion lithography
DE102006050653A1 (de) * 2006-10-24 2008-04-30 Carl Zeiss Smt Ag Verfahren und Vorrichtung zum stoffschlüssigen Verbinden eines optischen Elementes mit einer Fassung
US8045135B2 (en) 2006-11-22 2011-10-25 Asml Netherlands B.V. Lithographic apparatus with a fluid combining unit and related device manufacturing method
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9632425B2 (en) 2006-12-07 2017-04-25 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
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US7969555B2 (en) * 2007-03-16 2011-06-28 Industry-Academic Cooperation Foundation, Yonsei University Lens structure, optical system having the same, and lithography method using the optical system
US7841352B2 (en) * 2007-05-04 2010-11-30 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US7866330B2 (en) * 2007-05-04 2011-01-11 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
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US8947629B2 (en) * 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
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