JP2006270057A5 - - Google Patents

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Publication number
JP2006270057A5
JP2006270057A5 JP2006026249A JP2006026249A JP2006270057A5 JP 2006270057 A5 JP2006270057 A5 JP 2006270057A5 JP 2006026249 A JP2006026249 A JP 2006026249A JP 2006026249 A JP2006026249 A JP 2006026249A JP 2006270057 A5 JP2006270057 A5 JP 2006270057A5
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JP
Japan
Prior art keywords
processed
liquid
contact angle
exposure apparatus
holding unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006026249A
Other languages
English (en)
Japanese (ja)
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JP2006270057A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006026249A priority Critical patent/JP2006270057A/ja
Priority claimed from JP2006026249A external-priority patent/JP2006270057A/ja
Priority to US11/276,382 priority patent/US20060192930A1/en
Publication of JP2006270057A publication Critical patent/JP2006270057A/ja
Publication of JP2006270057A5 publication Critical patent/JP2006270057A5/ja
Withdrawn legal-status Critical Current

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JP2006026249A 2005-02-28 2006-02-02 露光装置 Withdrawn JP2006270057A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006026249A JP2006270057A (ja) 2005-02-28 2006-02-02 露光装置
US11/276,382 US20060192930A1 (en) 2005-02-28 2006-02-27 Exposure apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005054814 2005-02-28
JP2006026249A JP2006270057A (ja) 2005-02-28 2006-02-02 露光装置

Publications (2)

Publication Number Publication Date
JP2006270057A JP2006270057A (ja) 2006-10-05
JP2006270057A5 true JP2006270057A5 (enExample) 2009-03-19

Family

ID=36931657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006026249A Withdrawn JP2006270057A (ja) 2005-02-28 2006-02-02 露光装置

Country Status (2)

Country Link
US (1) US20060192930A1 (enExample)
JP (1) JP2006270057A (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101242815B1 (ko) 2003-06-13 2013-03-12 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조방법
CN102163005B (zh) 2003-12-03 2014-05-21 株式会社尼康 投影曝光装置、器件制造方法以及光学部件
JP2006269942A (ja) * 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法
JP4858062B2 (ja) * 2005-04-27 2012-01-18 株式会社ニコン 露光方法、露光装置、デバイス製造方法、及び膜の評価方法
EP1879219A4 (en) * 2005-04-27 2012-08-08 Nikon Corp EXPOSURE METHOD, EXPOSURE DEVICE, METHOD FOR MANUFACTURING COMPONENTS AND FILM EVALUATION METHOD
JP4708876B2 (ja) * 2005-06-21 2011-06-22 キヤノン株式会社 液浸露光装置
US7468779B2 (en) * 2005-06-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8111374B2 (en) * 2005-09-09 2012-02-07 Nikon Corporation Analysis method, exposure method, and device manufacturing method
US20070177119A1 (en) * 2006-02-02 2007-08-02 Keiko Chiba Exposure apparatus and device manufacturing method
CN100590173C (zh) * 2006-03-24 2010-02-17 北京有色金属研究总院 一种荧光粉及其制造方法和所制成的电光源
US8134685B2 (en) * 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US7673278B2 (en) * 2007-11-29 2010-03-02 Tokyo Electron Limited Enhanced process yield using a hot-spot library
JP2010098172A (ja) * 2008-10-17 2010-04-30 Canon Inc 液体回収装置、露光装置及びデバイス製造方法
JP2010251745A (ja) 2009-04-10 2010-11-04 Asml Netherlands Bv 液浸リソグラフィ装置及びデバイス製造方法
JP6751759B2 (ja) * 2015-12-08 2020-09-09 エーエスエムエル ネザーランズ ビー．ブイ． 基板テーブル、リソグラフィ装置、及びリソグラフィ装置を操作する方法
CN113189849B (zh) 2021-04-22 2023-08-11 中国科学院光电技术研究所 一种近场光刻浸没系统及其浸没单元和接口模组

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5121256A (en) * 1991-03-14 1992-06-09 The Board Of Trustees Of The Leland Stanford Junior University Lithography system employing a solid immersion lens
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
SG121819A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
DE60335595D1 (de) * 2002-11-12 2011-02-17 Asml Netherlands Bv Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
US7110081B2 (en) * 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
AU2003289271A1 (en) * 2002-12-10 2004-06-30 Nikon Corporation Exposure apparatus, exposure method and method for manufacturing device
US7528929B2 (en) * 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN102163005B (zh) * 2003-12-03 2014-05-21 株式会社尼康 投影曝光装置、器件制造方法以及光学部件
KR100759654B1 (ko) * 2004-05-31 2007-09-17 마츠시타 덴끼 산교 가부시키가이샤 고분자 전해질형 연료 전지용 세퍼레이터, 고분자 전해질형연료 전지, 고분자 전해질형 연료 전지용 세퍼레이터의평가방법 및 고분자 전해질형 연료 전지용 세퍼레이터의제조방법
JP2006269942A (ja) * 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法
JP4708876B2 (ja) * 2005-06-21 2011-06-22 キヤノン株式会社 液浸露光装置

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