JP2006270057A5 - - Google Patents
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- JP2006270057A5 JP2006270057A5 JP2006026249A JP2006026249A JP2006270057A5 JP 2006270057 A5 JP2006270057 A5 JP 2006270057A5 JP 2006026249 A JP2006026249 A JP 2006026249A JP 2006026249 A JP2006026249 A JP 2006026249A JP 2006270057 A5 JP2006270057 A5 JP 2006270057A5
- Authority
- JP
- Japan
- Prior art keywords
- processed
- liquid
- contact angle
- exposure apparatus
- holding unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000007788 liquid Substances 0.000 claims 10
- 230000003287 optical effect Effects 0.000 claims 3
Claims (3)
- レチクルのパターンを被処理体に投影する投影光学系を備え、前記被処理体の表面と前記投影光学系の最終光学素子との間に液体を満たし、前記投影光学系及び前記液体を介して前記被処理体を露光する露光装置であって、
前記被処理体の周囲に配置され、前記被処理体の表面と同じ高さの表面を持ち、前記液体を保持する液体保持部を有し、
前記液体保持部の表面は、前記液体と前記被処理体の表面との第１の接触角が前記液体と前記液体保持部の表面との第２の接触角以下であり、且つ、前記液体と前記被処理体の表面との第１の後退接触角が前記液体と前記液体保持部の表面との第２の後退接触角以下であることを特徴とする露光装置。 - 前記第２の後退接触角は、９０°以上であることを特徴とする請求項１に記載の露光装置。
- 請求項１又は２に記載の露光装置を用いて被処理体を露光するステップと、
露光された前記被処理体を現像するステップとを有することを特徴とするデバイス製造方法。
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006026249A JP2006270057A (ja) | 2005-02-28 | 2006-02-02 | 露光装置 |
| US11/276,382 US20060192930A1 (en) | 2005-02-28 | 2006-02-27 | Exposure apparatus |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005054814 | 2005-02-28 | ||
| JP2006026249A JP2006270057A (ja) | 2005-02-28 | 2006-02-02 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006270057A JP2006270057A (ja) | 2006-10-05 |
| JP2006270057A5 true JP2006270057A5 (ja) | 2009-03-19 |
Family
ID=36931657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006026249A Withdrawn JP2006270057A (ja) | 2005-02-28 | 2006-02-02 | 露光装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20060192930A1 (ja) |
| JP (1) | JP2006270057A (ja) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101520591B1 (ko) | 2003-06-13 | 2015-05-14 | 가부시키가이샤 니콘 | 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법 |
| TWI605315B (zh) | 2003-12-03 | 2017-11-11 | Nippon Kogaku Kk | Exposure device, exposure method, and device manufacturing method |
| JP2006269942A (ja) * | 2005-03-25 | 2006-10-05 | Canon Inc | 露光装置及びデバイス製造方法 |
| JP4858062B2 (ja) * | 2005-04-27 | 2012-01-18 | 株式会社ニコン | 露光方法、露光装置、デバイス製造方法、及び膜の評価方法 |
| CN102520592A (zh) * | 2005-04-27 | 2012-06-27 | 株式会社尼康 | 曝光方法、曝光装置、组件制造方法、以及膜的评估方法 |
| JP4708876B2 (ja) * | 2005-06-21 | 2011-06-22 | キヤノン株式会社 | 液浸露光装置 |
| US7468779B2 (en) * | 2005-06-28 | 2008-12-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8111374B2 (en) * | 2005-09-09 | 2012-02-07 | Nikon Corporation | Analysis method, exposure method, and device manufacturing method |
| US20070177119A1 (en) * | 2006-02-02 | 2007-08-02 | Keiko Chiba | Exposure apparatus and device manufacturing method |
| CN100590173C (zh) * | 2006-03-24 | 2010-02-17 | 北京有色金属研究总院 | 一种荧光粉及其制造方法和所制成的电光源 |
| US8134685B2 (en) * | 2007-03-23 | 2012-03-13 | Nikon Corporation | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method |
| US7673278B2 (en) * | 2007-11-29 | 2010-03-02 | Tokyo Electron Limited | Enhanced process yield using a hot-spot library |
| JP2010098172A (ja) * | 2008-10-17 | 2010-04-30 | Canon Inc | 液体回収装置、露光装置及びデバイス製造方法 |
| JP2010251745A (ja) | 2009-04-10 | 2010-11-04 | Asml Netherlands Bv | 液浸リソグラフィ装置及びデバイス製造方法 |
| US10317804B2 (en) * | 2015-12-08 | 2019-06-11 | Asml Netherlands B.V. | Substrate table, lithographic apparatus and method of operating a lithographic apparatus |
| CN113189849B (zh) * | 2021-04-22 | 2023-08-11 | 中国科学院光电技术研究所 | 一种近场光刻浸没系统及其浸没单元和接口模组 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5121256A (en) * | 1991-03-14 | 1992-06-09 | The Board Of Trustees Of The Leland Stanford Junior University | Lithography system employing a solid immersion lens |
| JP2753930B2 (ja) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | 液浸式投影露光装置 |
| DE60335595D1 (de) * | 2002-11-12 | 2011-02-17 | Asml Netherlands Bv | Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung |
| US7110081B2 (en) * | 2002-11-12 | 2006-09-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| TWI251127B (en) * | 2002-11-12 | 2006-03-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| KR101101737B1 (ko) * | 2002-12-10 | 2012-01-05 | 가부시키가이샤 니콘 | 노광장치 및 노광방법, 디바이스 제조방법 |
| JP4295712B2 (ja) * | 2003-11-14 | 2009-07-15 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置及び装置製造方法 |
| TWI605315B (zh) * | 2003-12-03 | 2017-11-11 | Nippon Kogaku Kk | Exposure device, exposure method, and device manufacturing method |
| EP1758185B1 (en) * | 2004-05-31 | 2018-10-17 | Panasonic Intellectual Property Management Co., Ltd. | Polyelectrolyte fuel cell-use separator and polyelectrolyte fuel cell |
| JP2006269942A (ja) * | 2005-03-25 | 2006-10-05 | Canon Inc | 露光装置及びデバイス製造方法 |
| JP4708876B2 (ja) * | 2005-06-21 | 2011-06-22 | キヤノン株式会社 | 液浸露光装置 |
-
2006
- 2006-02-02 JP JP2006026249A patent/JP2006270057A/ja not_active Withdrawn
- 2006-02-27 US US11/276,382 patent/US20060192930A1/en not_active Abandoned
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