JP2007529881A5 - - Google Patents
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- Publication number
- JP2007529881A5 JP2007529881A5 JP2006552572A JP2006552572A JP2007529881A5 JP 2007529881 A5 JP2007529881 A5 JP 2007529881A5 JP 2006552572 A JP2006552572 A JP 2006552572A JP 2006552572 A JP2006552572 A JP 2006552572A JP 2007529881 A5 JP2007529881 A5 JP 2007529881A5
- Authority
- JP
- Japan
- Prior art keywords
- immersion
- exposure
- photoresist layer
- immersion medium
- immersion lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000007654 immersion Methods 0.000 claims 9
- 238000000034 method Methods 0.000 claims 9
- 238000000671 immersion lithography Methods 0.000 claims 8
- 229920002120 photoresistant polymer Polymers 0.000 claims 8
- 239000000463 material Substances 0.000 claims 3
- 239000013067 intermediate product Substances 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical group [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims 2
- 230000001419 dependent effect Effects 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Claims (5)
- 露光時間中フォトレジスト層を露光するのに露光光学系を用い、該露光光学系と露光されるべき該フォトレジスト層(20)との間に浸漬媒体を挿入し、露光後、現像液を用いて該フォトレジスト層を現像する浸漬リソグラフィー方法であって、該フォトレジスト層(20)に該フォトレジスト層(20)と該浸漬媒体との接触を防ぐためのシールド層(30)を提供する工程を備え、該シールド層は前記露光波長で透明であり且つ該浸漬媒体を通さないことを特徴とする、浸漬リソグラフィー方法。
- 前記シールド層(30)は、前記露光時間中、前記浸漬媒体が前記フォトレジスト層(20)と接触することを防ぐのに十分な程度に前記浸漬媒体に不溶性である材料で形成される、請求項1に記載の浸漬リソグラフィー方法。
- 前記シールド層(30)は、前記現像液によって除去される材料で形成される、請求項1又は2に記載の浸漬リソグラフィー方法。
- 前記浸漬媒体は水であり、前記現像液はテトラメチルアンモニウムヒドロキシドであり、前記シールド層(30)はpH依存性の溶解性を有する材料で形成される、請求項3に記載の浸漬リソグラフィー方法。
- 特定の浸漬媒体を用いる浸漬リソグラフィープロセスでの露光に適した中間体製品であって、フォトレジスト層(20)を有する基板(10)から成り、該基板(10)から離れた前記フォトレジスト層(20)の表面が、前記浸漬リソグラフィープロセスで用いられる前記露光波長で透明であり且つ前記特定の浸漬媒体を通さないシールド層(30)で覆われていることを特徴とする、特定の浸漬媒体を用いる浸漬リソグラフィープロセスでの露光に適した中間体製品。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04290429A EP1564592A1 (en) | 2004-02-17 | 2004-02-17 | Protection of resist for immersion lithography technique |
PCT/EP2005/001511 WO2005078525A2 (en) | 2004-02-17 | 2005-02-15 | Immersion lithography technique and product using a protection layer covering the resist |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007529881A JP2007529881A (ja) | 2007-10-25 |
JP2007529881A5 true JP2007529881A5 (ja) | 2008-04-03 |
Family
ID=34684792
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006552572A Withdrawn JP2007529881A (ja) | 2004-02-17 | 2005-02-15 | 浸漬リソグラフィー技法及び製品 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20080171285A1 (ja) |
EP (2) | EP1564592A1 (ja) |
JP (1) | JP2007529881A (ja) |
KR (1) | KR20060133976A (ja) |
CN (1) | CN101558357A (ja) |
TW (1) | TW200538881A (ja) |
WO (1) | WO2005078525A2 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI259319B (en) | 2004-01-23 | 2006-08-01 | Air Prod & Chem | Immersion lithography fluids |
US20050161644A1 (en) | 2004-01-23 | 2005-07-28 | Peng Zhang | Immersion lithography fluids |
JP4551701B2 (ja) | 2004-06-14 | 2010-09-29 | 富士フイルム株式会社 | 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法 |
US7914972B2 (en) | 2004-07-21 | 2011-03-29 | Nikon Corporation | Exposure method and device manufacturing method |
JP4696558B2 (ja) * | 2005-01-07 | 2011-06-08 | Jsr株式会社 | フォトレジストパターン形成方法、及びフォトレジストパターン形成用基板 |
US20070084793A1 (en) * | 2005-10-18 | 2007-04-19 | Nigel Wenden | Method and apparatus for producing ultra-high purity water |
JP2009117832A (ja) * | 2007-11-06 | 2009-05-28 | Asml Netherlands Bv | リソグラフィの基板を準備する方法、基板、デバイス製造方法、密封コーティングアプリケータ及び密封コーティング測定装置 |
JP6400161B1 (ja) * | 2017-08-08 | 2018-10-03 | キヤノン株式会社 | 成膜方法、ドライフィルムの製造方法、および液体吐出ヘッドの製造方法 |
PT117491B (pt) * | 2021-09-30 | 2024-03-12 | Univ De Coimbra | Copolímero cromogénico, seu método de obtenção, produtos que o incorporam e método de deteção de contrafação e autenticaçao de produtos |
CN116263564A (zh) * | 2021-12-13 | 2023-06-16 | 长鑫存储技术有限公司 | 光刻胶图案的形成方法和光刻胶结构 |
CN115047728A (zh) * | 2022-07-01 | 2022-09-13 | 中国科学院光电技术研究所 | 等离子体共振腔透镜光刻的成像结构保护方法及其结构 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4346164A (en) * | 1980-10-06 | 1982-08-24 | Werner Tabarelli | Photolithographic method for the manufacture of integrated circuits |
JPH06130657A (ja) * | 1991-08-20 | 1994-05-13 | Mitsubishi Rayon Co Ltd | ドライフィルムレジスト |
JP3281053B2 (ja) * | 1991-12-09 | 2002-05-13 | 株式会社東芝 | パターン形成方法 |
JP3158710B2 (ja) * | 1992-09-16 | 2001-04-23 | 日本ゼオン株式会社 | 化学増幅レジストパターンの形成方法 |
US6727047B2 (en) * | 1999-04-16 | 2004-04-27 | Applied Materials, Inc. | Method of extending the stability of a photoresist during direct writing of an image upon the photoresist |
US20010044077A1 (en) * | 1999-04-16 | 2001-11-22 | Zoilo Chen Ho Tan | Stabilization of chemically amplified resist coating |
US6788477B2 (en) * | 2002-10-22 | 2004-09-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for method for immersion lithography |
US7432042B2 (en) * | 2003-12-03 | 2008-10-07 | United Microelectronics Corp. | Immersion lithography process and mask layer structure applied in the same |
US20060008746A1 (en) * | 2004-07-07 | 2006-01-12 | Yasunobu Onishi | Method for manufacturing semiconductor device |
-
2004
- 2004-02-17 EP EP04290429A patent/EP1564592A1/en not_active Withdrawn
-
2005
- 2005-02-15 JP JP2006552572A patent/JP2007529881A/ja not_active Withdrawn
- 2005-02-15 EP EP05707399A patent/EP1716453A2/en not_active Withdrawn
- 2005-02-15 CN CNA2005800013797A patent/CN101558357A/zh active Pending
- 2005-02-15 US US10/595,762 patent/US20080171285A1/en not_active Abandoned
- 2005-02-15 WO PCT/EP2005/001511 patent/WO2005078525A2/en not_active Application Discontinuation
- 2005-02-15 KR KR1020067009317A patent/KR20060133976A/ko not_active Application Discontinuation
- 2005-02-17 TW TW094104674A patent/TW200538881A/zh unknown
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