JP2006222222A5 - - Google Patents

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Publication number
JP2006222222A5
JP2006222222A5 JP2005033424A JP2005033424A JP2006222222A5 JP 2006222222 A5 JP2006222222 A5 JP 2006222222A5 JP 2005033424 A JP2005033424 A JP 2005033424A JP 2005033424 A JP2005033424 A JP 2005033424A JP 2006222222 A5 JP2006222222 A5 JP 2006222222A5
Authority
JP
Japan
Prior art keywords
optical system
projection optical
optical element
projection
object side
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005033424A
Other languages
English (en)
Japanese (ja)
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JP2006222222A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005033424A priority Critical patent/JP2006222222A/ja
Priority claimed from JP2005033424A external-priority patent/JP2006222222A/ja
Priority to US11/349,897 priority patent/US20060176461A1/en
Publication of JP2006222222A publication Critical patent/JP2006222222A/ja
Publication of JP2006222222A5 publication Critical patent/JP2006222222A5/ja
Withdrawn legal-status Critical Current

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JP2005033424A 2005-02-09 2005-02-09 投影光学系及びそれを有する露光装置 Withdrawn JP2006222222A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005033424A JP2006222222A (ja) 2005-02-09 2005-02-09 投影光学系及びそれを有する露光装置
US11/349,897 US20060176461A1 (en) 2005-02-09 2006-02-09 Projection optical system and exposure apparatus having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005033424A JP2006222222A (ja) 2005-02-09 2005-02-09 投影光学系及びそれを有する露光装置

Publications (2)

Publication Number Publication Date
JP2006222222A JP2006222222A (ja) 2006-08-24
JP2006222222A5 true JP2006222222A5 (enExample) 2008-03-27

Family

ID=36779570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005033424A Withdrawn JP2006222222A (ja) 2005-02-09 2005-02-09 投影光学系及びそれを有する露光装置

Country Status (2)

Country Link
US (1) US20060176461A1 (enExample)
JP (1) JP2006222222A (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4646575B2 (ja) * 2004-08-31 2011-03-09 キヤノン株式会社 半導体装置の製造方法
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101762083B1 (ko) 2005-05-12 2017-07-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
KR101590743B1 (ko) * 2005-06-02 2016-02-01 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
WO2007052659A1 (ja) * 2005-11-01 2007-05-10 Nikon Corporation 露光装置、露光方法、及びデバイス製造方法
US20070127135A1 (en) * 2005-11-01 2007-06-07 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
WO2007132862A1 (ja) * 2006-05-16 2007-11-22 Nikon Corporation 投影光学系、露光方法、露光装置、及びデバイス製造方法
TW200801578A (en) 2006-06-21 2008-01-01 Canon Kk Projection optical system
JP4310349B2 (ja) 2007-04-20 2009-08-05 キヤノン株式会社 露光装置及びデバイス製造方法
DE102008001800A1 (de) * 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
KR101510493B1 (ko) * 2007-10-02 2015-04-08 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피용 투사 대물렌즈
US8467032B2 (en) * 2008-04-09 2013-06-18 Nikon Corporation Exposure apparatus and electronic device manufacturing method
IN2012DN01825A (enExample) * 2009-08-24 2015-06-05 Life Technologies Corp
USD719277S1 (en) 2010-08-24 2014-12-09 Life Technologies Corporation Electrophoresis wedge-well comb
USD698037S1 (en) 2012-06-01 2014-01-21 Life Technologies Corporation Electrophoresis tank
USD794823S1 (en) 2010-08-24 2017-08-15 Life Technologies Corporation Electrophoresis tank with a base and cassette inserted in
USD667134S1 (en) 2011-04-01 2012-09-11 Life Technologies Corporation Electrophoresis apparatus
JP6401510B2 (ja) * 2014-06-12 2018-10-10 キヤノン株式会社 露光装置及び物品の製造方法
US10446728B2 (en) * 2014-10-31 2019-10-15 eLux, Inc. Pick-and remove system and method for emissive display repair
CN113050381B (zh) * 2019-12-27 2022-04-26 上海微电子装备（集团）股份有限公司 一种拼接物镜的剂量控制装置、方法和曝光设备

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60196335A (ja) * 1984-03-21 1985-10-04 富士写真フイルム株式会社 積層フイルム
JP3747958B2 (ja) * 1995-04-07 2006-02-22 株式会社ニコン 反射屈折光学系
US5642183A (en) * 1993-08-27 1997-06-24 Sharp Kabushiki Kaisha Spatial filter used in a reduction-type projection printing apparatus
JPH08106043A (ja) * 1994-10-05 1996-04-23 Fuji Photo Optical Co Ltd 内視鏡用対物レンズ
JP3459773B2 (ja) * 1998-06-24 2003-10-27 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JP3658209B2 (ja) * 1998-10-08 2005-06-08 キヤノン株式会社 円弧照明光学系及びそれを用いた露光装置
JP2001264626A (ja) * 2000-03-15 2001-09-26 Canon Inc 回折光学素子を有する光学系
JP3710724B2 (ja) * 2001-05-14 2005-10-26 大日本スクリーン製造株式会社 結像光学装置
US6791668B2 (en) * 2002-08-13 2004-09-14 Winbond Electronics Corporation Semiconductor manufacturing apparatus and method
TWI249082B (en) * 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
DE10258715B4 (de) * 2002-12-10 2006-12-21 Carl Zeiss Smt Ag Verfahren zur Herstellung eines optischen Abbildungssystems
TWI282487B (en) * 2003-05-23 2007-06-11 Canon Kk Projection optical system, exposure apparatus, and device manufacturing method
US6954256B2 (en) * 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
US7460206B2 (en) * 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
JP2005191381A (ja) * 2003-12-26 2005-07-14 Canon Inc 露光方法及び装置

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