JP2006222222A - 投影光学系及びそれを有する露光装置 - Google Patents

投影光学系及びそれを有する露光装置 Download PDF

Info

Publication number
JP2006222222A
JP2006222222A JP2005033424A JP2005033424A JP2006222222A JP 2006222222 A JP2006222222 A JP 2006222222A JP 2005033424 A JP2005033424 A JP 2005033424A JP 2005033424 A JP2005033424 A JP 2005033424A JP 2006222222 A JP2006222222 A JP 2006222222A
Authority
JP
Japan
Prior art keywords
optical system
projection optical
field stop
wafer
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005033424A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006222222A5 (enExample
Inventor
Yoshiyuki Sekine
義之 関根
Akiyoshi Suzuki
章義 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005033424A priority Critical patent/JP2006222222A/ja
Priority to US11/349,897 priority patent/US20060176461A1/en
Publication of JP2006222222A publication Critical patent/JP2006222222A/ja
Publication of JP2006222222A5 publication Critical patent/JP2006222222A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005033424A 2005-02-09 2005-02-09 投影光学系及びそれを有する露光装置 Withdrawn JP2006222222A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005033424A JP2006222222A (ja) 2005-02-09 2005-02-09 投影光学系及びそれを有する露光装置
US11/349,897 US20060176461A1 (en) 2005-02-09 2006-02-09 Projection optical system and exposure apparatus having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005033424A JP2006222222A (ja) 2005-02-09 2005-02-09 投影光学系及びそれを有する露光装置

Publications (2)

Publication Number Publication Date
JP2006222222A true JP2006222222A (ja) 2006-08-24
JP2006222222A5 JP2006222222A5 (enExample) 2008-03-27

Family

ID=36779570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005033424A Withdrawn JP2006222222A (ja) 2005-02-09 2005-02-09 投影光学系及びそれを有する露光装置

Country Status (2)

Country Link
US (1) US20060176461A1 (enExample)
JP (1) JP2006222222A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007052659A1 (ja) * 2005-11-01 2007-05-10 Nikon Corporation 露光装置、露光方法、及びデバイス製造方法
JP2008270568A (ja) * 2007-04-20 2008-11-06 Canon Inc 露光装置及びデバイス製造方法
US7714985B2 (en) 2006-06-21 2010-05-11 Canon Kabushiki Kaisha Projection optical system
JP2010541264A (ja) * 2007-10-02 2010-12-24 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の投影対物系
JP2014099615A (ja) * 2005-05-12 2014-05-29 Nikon Corp 投影光学系、露光装置、および露光方法
US10451973B2 (en) 2005-05-03 2019-10-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10495980B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4646575B2 (ja) * 2004-08-31 2011-03-09 キヤノン株式会社 半導体装置の製造方法
KR101590743B1 (ko) * 2005-06-02 2016-02-01 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
US20070127135A1 (en) * 2005-11-01 2007-06-07 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
WO2007132862A1 (ja) * 2006-05-16 2007-11-22 Nikon Corporation 投影光学系、露光方法、露光装置、及びデバイス製造方法
DE102008001800A1 (de) * 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
US8467032B2 (en) * 2008-04-09 2013-06-18 Nikon Corporation Exposure apparatus and electronic device manufacturing method
IN2012DN01825A (enExample) * 2009-08-24 2015-06-05 Life Technologies Corp
USD719277S1 (en) 2010-08-24 2014-12-09 Life Technologies Corporation Electrophoresis wedge-well comb
USD698037S1 (en) 2012-06-01 2014-01-21 Life Technologies Corporation Electrophoresis tank
USD794823S1 (en) 2010-08-24 2017-08-15 Life Technologies Corporation Electrophoresis tank with a base and cassette inserted in
USD667134S1 (en) 2011-04-01 2012-09-11 Life Technologies Corporation Electrophoresis apparatus
JP6401510B2 (ja) * 2014-06-12 2018-10-10 キヤノン株式会社 露光装置及び物品の製造方法
US10446728B2 (en) * 2014-10-31 2019-10-15 eLux, Inc. Pick-and remove system and method for emissive display repair
CN113050381B (zh) * 2019-12-27 2022-04-26 上海微电子装备（集团）股份有限公司 一种拼接物镜的剂量控制装置、方法和曝光设备

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60196335A (ja) * 1984-03-21 1985-10-04 富士写真フイルム株式会社 積層フイルム
JP3747958B2 (ja) * 1995-04-07 2006-02-22 株式会社ニコン 反射屈折光学系
US5642183A (en) * 1993-08-27 1997-06-24 Sharp Kabushiki Kaisha Spatial filter used in a reduction-type projection printing apparatus
JPH08106043A (ja) * 1994-10-05 1996-04-23 Fuji Photo Optical Co Ltd 内視鏡用対物レンズ
JP3459773B2 (ja) * 1998-06-24 2003-10-27 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JP3658209B2 (ja) * 1998-10-08 2005-06-08 キヤノン株式会社 円弧照明光学系及びそれを用いた露光装置
JP2001264626A (ja) * 2000-03-15 2001-09-26 Canon Inc 回折光学素子を有する光学系
JP3710724B2 (ja) * 2001-05-14 2005-10-26 大日本スクリーン製造株式会社 結像光学装置
US6791668B2 (en) * 2002-08-13 2004-09-14 Winbond Electronics Corporation Semiconductor manufacturing apparatus and method
TWI249082B (en) * 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
DE10258715B4 (de) * 2002-12-10 2006-12-21 Carl Zeiss Smt Ag Verfahren zur Herstellung eines optischen Abbildungssystems
TWI282487B (en) * 2003-05-23 2007-06-11 Canon Kk Projection optical system, exposure apparatus, and device manufacturing method
US6954256B2 (en) * 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
US7460206B2 (en) * 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
JP2005191381A (ja) * 2003-12-26 2005-07-14 Canon Inc 露光方法及び装置

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10495981B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10495980B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10488759B2 (en) 2005-05-03 2019-11-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10451973B2 (en) 2005-05-03 2019-10-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2014099615A (ja) * 2005-05-12 2014-05-29 Nikon Corp 投影光学系、露光装置、および露光方法
WO2007052659A1 (ja) * 2005-11-01 2007-05-10 Nikon Corporation 露光装置、露光方法、及びデバイス製造方法
US7714985B2 (en) 2006-06-21 2010-05-11 Canon Kabushiki Kaisha Projection optical system
JP2008270568A (ja) * 2007-04-20 2008-11-06 Canon Inc 露光装置及びデバイス製造方法
US8035804B2 (en) 2007-04-20 2011-10-11 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
JP2010541264A (ja) * 2007-10-02 2010-12-24 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の投影対物系
JP2017194697A (ja) * 2007-10-02 2017-10-26 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の投影対物系
KR101510493B1 (ko) * 2007-10-02 2015-04-08 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피용 투사 대물렌즈
JP2014140060A (ja) * 2007-10-02 2014-07-31 Carl Zeiss Smt Gmbh マイクロリソグラフィ用の投影対物系
US8436982B2 (en) 2007-10-02 2013-05-07 Carl Zeiss Smt Gmbh Projection objective for microlithography

Also Published As

Publication number Publication date
US20060176461A1 (en) 2006-08-10

Similar Documents

Publication Publication Date Title
JP2006222222A (ja) 投影光学系及びそれを有する露光装置
KR100674045B1 (ko) 조명장치, 노광장치 및 디바이스 제조방법
EP1429190B1 (en) Exposure apparatus and method
US6930754B1 (en) Multiple exposure method
KR100681852B1 (ko) 조명광학계, 노광장치 및 디바이스의 제조방법
US6934009B2 (en) Illumination apparatus, illumination-controlling method, exposure apparatus, device fabricating method
JP3631094B2 (ja) 投影露光装置及びデバイス製造方法
JP3950732B2 (ja) 照明光学系、照明方法及び露光装置
KR100276797B1 (ko) 조명장치, 노광장치 및 디바이스제조방법
KR100823405B1 (ko) 노광장치 및 디바이스 제조 방법
US8085384B2 (en) Exposure apparatus
US7489387B2 (en) Exposure apparatus and device fabrication method
JP4332331B2 (ja) 露光方法
JP2008160072A (ja) 露光装置及びデバイス製造方法
US6738129B2 (en) Illumination apparatus, exposure apparatus, and device fabricating method using the same
JP4474121B2 (ja) 露光装置
JP2009141154A (ja) 走査露光装置及びデバイス製造方法
JP4684563B2 (ja) 露光装置及び方法
JP3997199B2 (ja) 露光方法及び装置
JP2008153401A (ja) 露光装置及びデバイス製造方法
US7292316B2 (en) Illumination optical system and exposure apparatus having the same
JP2009043933A (ja) 露光装置、調整方法、露光方法及びデバイス製造方法
JP2006245270A (ja) 露光装置及び露光方法
JP4336545B2 (ja) 光学部材、当該光学部材を有する照明装置及び露光装置
JP2005331651A (ja) ３次元構造形成方法および３次元構造形成方法を用いて製造された光学素子、光学系、装置、デバイスおよびデバイス製造方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080207

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080207

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20100412