JP2010096866A5 - - Google Patents

Download PDF

Info

Publication number
JP2010096866A5
JP2010096866A5 JP2008265715A JP2008265715A JP2010096866A5 JP 2010096866 A5 JP2010096866 A5 JP 2010096866A5 JP 2008265715 A JP2008265715 A JP 2008265715A JP 2008265715 A JP2008265715 A JP 2008265715A JP 2010096866 A5 JP2010096866 A5 JP 2010096866A5
Authority
JP
Japan
Prior art keywords
lens
optical system
projection optical
intersection
center position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008265715A
Other languages
English (en)
Japanese (ja)
Other versions
JP5253081B2 (ja
JP2010096866A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008265715A priority Critical patent/JP5253081B2/ja
Priority claimed from JP2008265715A external-priority patent/JP5253081B2/ja
Priority to US12/577,635 priority patent/US8432532B2/en
Publication of JP2010096866A publication Critical patent/JP2010096866A/ja
Publication of JP2010096866A5 publication Critical patent/JP2010096866A5/ja
Application granted granted Critical
Publication of JP5253081B2 publication Critical patent/JP5253081B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2008265715A 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法 Expired - Fee Related JP5253081B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008265715A JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法
US12/577,635 US8432532B2 (en) 2008-10-14 2009-10-12 Projection optical system with rarefaction compensation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008265715A JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2010096866A JP2010096866A (ja) 2010-04-30
JP2010096866A5 true JP2010096866A5 (enExample) 2011-12-01
JP5253081B2 JP5253081B2 (ja) 2013-07-31

Family

ID=42098605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008265715A Expired - Fee Related JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法

Country Status (2)

Country Link
US (1) US8432532B2 (enExample)
JP (1) JP5253081B2 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3134151B1 (en) 2014-04-25 2021-04-14 Bayer Healthcare LLC Syringe with rolling diaphragm
EP3285649B1 (en) 2015-04-24 2025-12-24 Bayer Healthcare LLC Syringe with rolling diaphragm
EP3512581B1 (en) 2016-09-16 2023-10-25 Bayer Healthcare LLC Pressure jacket having syringe retaining element
CA3040480C (en) 2016-10-17 2024-01-23 Bayer Healthcare Llc Fluid injector with syringe engagement mechanism
US11207462B2 (en) 2016-10-17 2021-12-28 Bayer Healthcare Llc Fluid injector with syringe engagement mechanism
AU2018334143B2 (en) 2017-09-13 2024-03-21 Bayer Healthcare Llc Sliding syringe cap for separate filling and delivery
EP3755400B1 (en) 2018-02-19 2023-12-20 Bayer Healthcare LLC Syringe rolling apparatus and method
CN112912119A (zh) 2018-09-11 2021-06-04 拜耳医药保健有限责任公司 流体注入器系统的注射器固定特征
EP4656218A2 (en) 2019-09-10 2025-12-03 Bayer HealthCare LLC Pressure jackets and syringe retention features for angiography fluid injectors
WO2021168076A1 (en) 2020-02-21 2021-08-26 Bayer Healthcare Llc Fluid path connectors for medical fluid delivery
CR20220391A (es) 2020-02-28 2022-09-15 Bayer HealthCare LLC Juego de mezcla de fluidos
WO2021188460A1 (en) 2020-03-16 2021-09-23 Bayer Healthcare Llc Stopcock apparatus for angiography injector fluid paths
JP7648661B2 (ja) 2020-06-18 2025-03-18 バイエル・ヘルスケア・エルエルシー 血管造影注入器流体経路のためのインライン気泡懸濁装置
CR20230084A (es) 2020-08-11 2023-03-23 Bayer Healthcare Llc Características para jeringa de angiografía
CN116547022A (zh) 2020-12-01 2023-08-04 拜耳医药保健有限责任公司 用于保持流体注入器系统的流体路径部件的盒
US12239818B2 (en) 2021-06-17 2025-03-04 Bayer Healthcare Llc System and method for detecting fluid type in tubing for fluid injector apparatus

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US6339505B1 (en) * 2000-06-26 2002-01-15 International Business Machines Corporation Method for radiation projection and lens assembly for semiconductor exposure tools
JP2004511092A (ja) * 2000-10-03 2004-04-08 コーニング インコーポレイテッド フォトリソグラフィの方法およびフォトリソグラフィ装置
US7190527B2 (en) * 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
KR20040104691A (ko) * 2002-05-03 2004-12-10 칼 짜이스 에스엠테 아게 높은 개구를 갖는 투영 대물렌즈
JP4174400B2 (ja) * 2003-09-24 2008-10-29 信越石英株式会社 シリカガラスの選別方法
JP2005114881A (ja) * 2003-10-06 2005-04-28 Nikon Corp 投影光学系、露光装置、および露光方法
US6992753B2 (en) * 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
CN102207609B (zh) 2004-01-14 2013-03-20 卡尔蔡司Smt有限责任公司 反射折射投影物镜
TWI395069B (zh) 2004-02-18 2013-05-01 尼康股份有限公司 投影光學系統、曝光裝置以及曝光方法
JP2006073687A (ja) 2004-09-01 2006-03-16 Nikon Corp 投影光学系、投影光学系の製造方法、露光装置、および露光方法
JP4868209B2 (ja) 2004-11-10 2012-02-01 株式会社ニコン 投影光学系、露光装置、および露光方法
TW200616043A (en) 2004-11-10 2006-05-16 Nikon Corp Optical projection system, exposure apparatus, exposure method and method of fabricating devices
DE102006027787A1 (de) * 2005-07-05 2007-01-18 Carl Zeiss Smt Ag Projektionsbelichtungsanlage und Betriebsmethode dieser
JP2008063181A (ja) 2006-09-07 2008-03-21 Shin Etsu Chem Co Ltd エキシマレーザー用合成石英ガラス基板及びその製造方法

Similar Documents

Publication Publication Date Title
JP2010096866A5 (enExample)
JP6927348B2 (ja) パターン形成方法
KR102074476B1 (ko) 결상 광학계, 노광 장치 및 디바이스 제조 방법
TWI328719B (en) A sensor for use in a lithographic apparatus
JP2010541292A5 (enExample)
CN105549327B (zh) 曝光装置的调整装置及调整方法
JP2012168543A5 (ja) 投影光学系、露光装置、露光方法、およびデバイス製造方法
US20180059475A1 (en) Optics component with double-layered micro-lens array
ATE529781T1 (de) Beleuchtungssystem mit zoomobjetiv
JP2016001308A5 (ja) 露光装置、およびデバイス製造方法
JP6245342B2 (ja) デバイス製造方法
CN113608400B (zh) 一种图案投影设备
TW200530766A (en) Exposure apparatus, supply method and recovery method, exposure method, and component producing method
CN102854756B (zh) 曝光方法及曝光装置
TW201022855A (en) Correction unit, illumination optical system, exposure apparatus and device manufacturing method
TW201126200A (en) Catadioptric system, aberration measuring apparatus, method of adjusting optical system, exposure apparatus, and device manufacturing method
TW200727335A (en) Method for forming resist pattern, and method for manufacturing semiconductor device
CN102645730B (zh) 一种实验型浸没式投影光刻物镜
KR20080023338A (ko) 마이크로리소그래피 노출 장치용 펠리클
WO2012033230A1 (en) Reflective imaging optical system, exposure apparatus, and method for producing device
CN101551600A (zh) 曝光系统和曝光方法
TW200931198A (en) Reflective projection optical system, exposure apparatus, device manufacturing method, projection method, and exposure method
CN104520771B (zh) 处理装置以及器件制造方法
JP2018092116A5 (enExample)
CN102981375A (zh) 一种极紫外光刻照明系统中中继镜组的设计方法