JP5253081B2 - 投影光学系、露光装置及びデバイスの製造方法 - Google Patents

投影光学系、露光装置及びデバイスの製造方法 Download PDF

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Publication number
JP5253081B2
JP5253081B2 JP2008265715A JP2008265715A JP5253081B2 JP 5253081 B2 JP5253081 B2 JP 5253081B2 JP 2008265715 A JP2008265715 A JP 2008265715A JP 2008265715 A JP2008265715 A JP 2008265715A JP 5253081 B2 JP5253081 B2 JP 5253081B2
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Japan
Prior art keywords
lens
optical system
projection optical
intersection
center position
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Expired - Fee Related
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JP2008265715A
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English (en)
Japanese (ja)
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JP2010096866A5 (enExample
JP2010096866A (ja
Inventor
寛之 結城
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2008265715A priority Critical patent/JP5253081B2/ja
Priority to US12/577,635 priority patent/US8432532B2/en
Publication of JP2010096866A publication Critical patent/JP2010096866A/ja
Publication of JP2010096866A5 publication Critical patent/JP2010096866A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008265715A 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法 Expired - Fee Related JP5253081B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008265715A JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法
US12/577,635 US8432532B2 (en) 2008-10-14 2009-10-12 Projection optical system with rarefaction compensation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008265715A JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2010096866A JP2010096866A (ja) 2010-04-30
JP2010096866A5 JP2010096866A5 (enExample) 2011-12-01
JP5253081B2 true JP5253081B2 (ja) 2013-07-31

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JP2008265715A Expired - Fee Related JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法

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Country Link
US (1) US8432532B2 (enExample)
JP (1) JP5253081B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6752774B2 (ja) 2014-04-25 2020-09-09 バイエル・ヘルスケア・エルエルシーＢａｙｅｒ ＨｅａｌｔｈＣａｒｅ ＬＬＣ ローリングダイヤフラムを備えたシリンジ
CN107847192A (zh) 2015-04-24 2018-03-27 拜耳医药保健有限公司 具有卷动膜片的针筒
US11389585B2 (en) 2016-09-16 2022-07-19 Bayer Healthcare Llc Pressure jacket having syringe retaining element
CA3040480C (en) 2016-10-17 2024-01-23 Bayer Healthcare Llc Fluid injector with syringe engagement mechanism
AU2017345167B2 (en) 2016-10-17 2022-12-15 Bayer Healthcare Llc Fluid injector with syringe engagement mechanism
US11826541B2 (en) 2017-09-13 2023-11-28 Bayer Healthcare Llc Sliding syringe cap for separate filling and delivery
JP7440521B2 (ja) 2018-09-11 2024-02-28 バイエル・ヘルスケア・エルエルシー 液注入器システム用シリンジ保持特徴部
EP4656218A2 (en) 2019-09-10 2025-12-03 Bayer HealthCare LLC Pressure jackets and syringe retention features for angiography fluid injectors
CR20250123A (es) 2020-02-21 2025-06-04 Bayer Healthcare Llc CONECTORES PARA VÍA DE FLUIDO PARA SUMINISTRO DE FLUIDOS MÉDICOS (Divisional Expediente2022-0394)
DK4110452T3 (da) 2020-02-28 2025-01-13 Bayer Healthcare Llc Fluidblandingssæt
WO2021188460A1 (en) 2020-03-16 2021-09-23 Bayer Healthcare Llc Stopcock apparatus for angiography injector fluid paths
CN115697435A (zh) 2020-06-18 2023-02-03 拜耳医药保健有限责任公司 用于血管造影注入器流体路径的在线气泡悬浮装置
IL317812A (en) 2020-08-11 2025-02-01 Bayer Healthcare Llc Features for Angiography Syringe
US12023464B2 (en) 2020-12-01 2024-07-02 Bayer Healthcare Llc Cassette for retention of fluid path components for fluid injector system
BR112023023756A2 (pt) 2021-06-17 2024-01-30 Bayer Healthcare Llc Sistema e método para detecção de tipo de fluido em tubulação para aparelho de injeção de fluido

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69933973T2 (de) * 1998-07-29 2007-06-28 Carl Zeiss Smt Ag Katadioptrisches optisches system und damit ausgestattete belichtungsvorrichtung
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US6339505B1 (en) * 2000-06-26 2002-01-15 International Business Machines Corporation Method for radiation projection and lens assembly for semiconductor exposure tools
WO2002029492A1 (en) * 2000-10-03 2002-04-11 Corning Incorporated Photolithography methods and systems
US7190527B2 (en) * 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
KR20040104691A (ko) * 2002-05-03 2004-12-10 칼 짜이스 에스엠테 아게 높은 개구를 갖는 투영 대물렌즈
JP4174400B2 (ja) * 2003-09-24 2008-10-29 信越石英株式会社 シリカガラスの選別方法
JP2005114881A (ja) * 2003-10-06 2005-04-28 Nikon Corp 投影光学系、露光装置、および露光方法
US6992753B2 (en) * 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
KR101179350B1 (ko) 2004-01-14 2012-09-11 칼 짜이스 에스엠티 게엠베하 반사굴절식 투영 대물렌즈
TWI395069B (zh) 2004-02-18 2013-05-01 尼康股份有限公司 投影光學系統、曝光裝置以及曝光方法
JP2006073687A (ja) 2004-09-01 2006-03-16 Nikon Corp 投影光学系、投影光学系の製造方法、露光装置、および露光方法
JP4868209B2 (ja) 2004-11-10 2012-02-01 株式会社ニコン 投影光学系、露光装置、および露光方法
KR20070083543A (ko) * 2004-11-10 2007-08-24 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
DE102006027787A1 (de) * 2005-07-05 2007-01-18 Carl Zeiss Smt Ag Projektionsbelichtungsanlage und Betriebsmethode dieser
JP2008063181A (ja) * 2006-09-07 2008-03-21 Shin Etsu Chem Co Ltd エキシマレーザー用合成石英ガラス基板及びその製造方法

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Publication number Publication date
US8432532B2 (en) 2013-04-30
US20100091361A1 (en) 2010-04-15
JP2010096866A (ja) 2010-04-30

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