JP2010541292A5 - - Google Patents

Download PDF

Info

Publication number
JP2010541292A5
JP2010541292A5 JP2010528290A JP2010528290A JP2010541292A5 JP 2010541292 A5 JP2010541292 A5 JP 2010541292A5 JP 2010528290 A JP2010528290 A JP 2010528290A JP 2010528290 A JP2010528290 A JP 2010528290A JP 2010541292 A5 JP2010541292 A5 JP 2010541292A5
Authority
JP
Japan
Prior art keywords
correction
light
plane
projection
intensity distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010528290A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010541292A (ja
JP5487110B2 (ja
Filing date
Publication date
Priority claimed from EP07019674A external-priority patent/EP2048540A1/en
Application filed filed Critical
Publication of JP2010541292A publication Critical patent/JP2010541292A/ja
Publication of JP2010541292A5 publication Critical patent/JP2010541292A5/ja
Application granted granted Critical
Publication of JP5487110B2 publication Critical patent/JP5487110B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010528290A 2007-10-09 2008-09-29 マイクロリソグラフィ投影露光装置 Expired - Fee Related JP5487110B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP07019674.6 2007-10-09
EP07019674A EP2048540A1 (en) 2007-10-09 2007-10-09 Microlithographic projection exposure apparatus
PCT/EP2008/008251 WO2009046895A1 (en) 2007-10-09 2008-09-29 Microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2010541292A JP2010541292A (ja) 2010-12-24
JP2010541292A5 true JP2010541292A5 (enExample) 2011-10-20
JP5487110B2 JP5487110B2 (ja) 2014-05-07

Family

ID=38988122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010528290A Expired - Fee Related JP5487110B2 (ja) 2007-10-09 2008-09-29 マイクロリソグラフィ投影露光装置

Country Status (7)

Country Link
US (1) US8773638B2 (enExample)
EP (2) EP2048540A1 (enExample)
JP (1) JP5487110B2 (enExample)
KR (1) KR101443421B1 (enExample)
CN (1) CN101821678B (enExample)
TW (1) TWI459160B (enExample)
WO (1) WO2009046895A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010040811A1 (de) * 2010-09-15 2012-03-15 Carl Zeiss Smt Gmbh Abbildende Optik
DE102010041298A1 (de) 2010-09-24 2012-03-29 Carl Zeiss Smt Gmbh EUV-Mikrolithographie-Projektionsbelichtungsanlage mit einer Heizlichtquelle
WO2012062858A1 (en) 2010-11-12 2012-05-18 Asml Netherlands B.V. Metrology method and apparatus, lithographic system and device manufacturing method
WO2012062501A1 (en) 2010-11-12 2012-05-18 Asml Netherlands B.V. Metrology method and apparatus, and device manufacturing method
DE102010062763A1 (de) * 2010-12-09 2012-06-14 Carl Zeiss Smt Gmbh Verfahren zum Vermessen eines optischen Systems
NL2008335A (en) * 2011-04-07 2012-10-09 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and method of correcting a mask.
JP6045588B2 (ja) * 2011-08-23 2016-12-14 エーエスエムエル ネザーランズ ビー．ブイ． メトロロジ方法及び装置並びにデバイス製造方法
JP5863974B2 (ja) 2011-09-29 2016-02-17 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の投影対物レンズ
CN102411264B (zh) * 2011-11-22 2014-07-16 上海华力微电子有限公司 光刻机投影物镜温度均衡装置及均衡方法
DE102012205096B3 (de) * 2012-03-29 2013-08-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
DE102014218474A1 (de) * 2014-09-15 2016-03-17 Carl Zeiss Smt Gmbh Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren für die EUV-Mikrolithographie
CN105068381A (zh) * 2015-07-27 2015-11-18 江苏影速光电技术有限公司 一种曝光机光阑承载结构及曝光机光阑更换方法
DE102016205619A1 (de) * 2016-04-05 2017-10-05 Carl Zeiss Smt Gmbh Abschwächungsfilter für Projektionsobjektiv, Projektionsobjektiv mit Abschwächungsfilter für Projektionsbelichtungsanlage und Projektionsbelichtungsanlage mit Projektionsobjektiv
DE102016225701A1 (de) 2016-12-21 2017-03-02 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer EUV-Lithographieanlage
TWI627440B (zh) * 2017-05-17 2018-06-21 力晶科技股份有限公司 影像亮度重配模組及影像亮度重配方法
DE102019208232A1 (de) * 2019-06-05 2020-12-10 Carl Zeiss Microscopy Gmbh Optische Anordnung und Verfahren zur Korrektur von Zentrierfehlern und/oder Winkelfehlern
CN112711163A (zh) 2019-10-25 2021-04-27 台达电子工业股份有限公司 投影装置
TWI709810B (zh) * 2019-10-25 2020-11-11 台達電子工業股份有限公司 投影裝置
DE102021210243A1 (de) 2021-09-16 2023-03-16 Carl Zeiss Smt Gmbh Optische Anordnung für die DUV-Lithographie

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
ATE123885T1 (de) 1990-05-02 1995-06-15 Fraunhofer Ges Forschung Belichtungsvorrichtung.
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JP3368091B2 (ja) * 1994-04-22 2003-01-20 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JPH09329742A (ja) * 1996-06-10 1997-12-22 Nikon Corp 光学系の収差補正方法および収差補正光学系を備えた投影露光装置
JP3790833B2 (ja) * 1996-08-07 2006-06-28 株式会社ニコン 投影露光方法及び装置
JP3646757B2 (ja) * 1996-08-22 2005-05-11 株式会社ニコン 投影露光方法及び装置
EP0823662A2 (en) * 1996-08-07 1998-02-11 Nikon Corporation Projection exposure apparatus
JP2000019165A (ja) 1998-06-30 2000-01-21 Shimadzu Corp ガスクロマトグラフ装置
KR100584538B1 (ko) * 1999-11-04 2006-05-30 삼성전자주식회사 마이크로미러 가동장치를 채용한 반사형 프로젝터
DE19963587B4 (de) 1999-12-29 2007-10-04 Carl Zeiss Smt Ag Projektions-Belichtungsanlage
DE19963588C2 (de) * 1999-12-29 2002-01-10 Zeiss Carl Optische Anordnung
DE10000191B8 (de) * 2000-01-05 2005-10-06 Carl Zeiss Smt Ag Projektbelichtungsanlage der Mikrolithographie
TW519574B (en) * 2000-10-20 2003-02-01 Nikon Corp Multilayer mirror and method for making the same, and EUV optical system comprising the same, and EUV microlithography system comprising the same
DE10140208C2 (de) 2001-08-16 2003-11-06 Zeiss Carl Optische Anordnung
EP1480258A4 (en) * 2002-01-29 2005-11-09 Nikon Corp EXPOSURE DEVICE AND EXPOSURE METHOD
EP1483626A2 (de) 2002-03-01 2004-12-08 Carl Zeiss SMT AG Refraktives projektionsobjektiv
TW594431B (en) * 2002-03-01 2004-06-21 Asml Netherlands Bv Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods
US20030235682A1 (en) * 2002-06-21 2003-12-25 Sogard Michael R. Method and device for controlling thermal distortion in elements of a lithography system
JP2005536775A (ja) 2002-08-23 2005-12-02 株式会社ニコン 投影光学系、フォトリソグラフィ方法および露光装置、並びに露光装置を用いた方法
EP1670041A4 (en) * 2003-08-28 2007-10-17 Nikon Corp METHOD AND APPARATUS FOR EXPOSURE, AND METHOD FOR MANUFACTURING ASSOCIATED DEVICE
KR101179350B1 (ko) 2004-01-14 2012-09-11 칼 짜이스 에스엠티 게엠베하 반사굴절식 투영 대물렌즈
JP5069232B2 (ja) 2005-07-25 2012-11-07 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の投影対物レンズ

Similar Documents

Publication Publication Date Title
JP2010541292A5 (enExample)
JP5487110B2 (ja) マイクロリソグラフィ投影露光装置
US7663735B2 (en) Microlithographic projection exposure apparatus with immersion projection lens
JP5863974B2 (ja) マイクロリソグラフィ投影露光装置の投影対物レンズ
US7864296B2 (en) Exposure apparatus, setting method, and exposure method having the same
JP6221160B2 (ja) ミラーの配置
CN110987965B (zh) 基于非相干光源和波带片成像的掩模缺陷检测方法及系统
JP7003055B2 (ja) 投影レンズのための減衰フィルタ、投影露光装置のための減衰フィルタを有する投影レンズ、及び投影レンズを有する投影露光装置
JP2006514441A5 (enExample)
JP2013074299A5 (enExample)
JP2016001308A5 (ja) 露光装置、およびデバイス製造方法
JP2011517786A5 (enExample)
US20130182234A1 (en) Projection Exposure System and Projection Exposure Method
TWI572904B (zh) 對紫外線損傷具低感受性之Wynne-Dyson投射透鏡
JP2011501446A5 (enExample)
TW201333641A (zh) 曝光光學系統、曝光裝置以及曝光方法
JP2008533709A5 (enExample)
TWI554839B (zh) 微影投射曝光裝置之照明系統
US20130205265A1 (en) Optical proximity correction convergence control
JP5070316B2 (ja) マスク
JP4885241B2 (ja) ペリクルを用いて層をパターニングする方法
US20090027645A1 (en) Exposure apparatus and method thereof
TWI536113B (zh) Projection optical system and projection exposure device
TW202538369A (zh) 用於測量系統的光學系統以及具有該光學系統的測量系統
KR20250098986A (ko) 계측 시스템용 광학 시스템 및 이러한 광학 시스템을 구비한 계측 시스템