JP2006514441A5 - - Google Patents

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Publication number
JP2006514441A5
JP2006514441A5 JP2005507696A JP2005507696A JP2006514441A5 JP 2006514441 A5 JP2006514441 A5 JP 2006514441A5 JP 2005507696 A JP2005507696 A JP 2005507696A JP 2005507696 A JP2005507696 A JP 2005507696A JP 2006514441 A5 JP2006514441 A5 JP 2006514441A5
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JP
Japan
Prior art keywords
grating
optical system
reflection
euv radiation
focal plane
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JP2005507696A
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English (en)
Japanese (ja)
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JP2006514441A (ja
JP4188370B2 (ja
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Priority claimed from US10/753,557 external-priority patent/US6867846B2/en
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Publication of JP2006514441A publication Critical patent/JP2006514441A/ja
Publication of JP2006514441A5 publication Critical patent/JP2006514441A5/ja
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Publication of JP4188370B2 publication Critical patent/JP4188370B2/ja
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JP2005507696A 2003-01-15 2004-01-14 Ｅｕｖリソグラフィシステムのために調整された反射型回折素子の収差測定方法および装置 Expired - Fee Related JP4188370B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US44005103P 2003-01-15 2003-01-15
US10/753,557 US6867846B2 (en) 2003-01-15 2004-01-09 Tailored reflecting diffractor for EUV lithographic system aberration measurement
PCT/US2004/000738 WO2004066366A2 (en) 2003-01-15 2004-01-14 Tailored reflecting diffractor for euv lithographic system aberration measurement

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008185161A Division JP5101419B2 (ja) 2003-01-15 2008-07-16 反射型回折格子

Publications (3)

Publication Number Publication Date
JP2006514441A JP2006514441A (ja) 2006-04-27
JP2006514441A5 true JP2006514441A5 (enExample) 2008-09-04
JP4188370B2 JP4188370B2 (ja) 2008-11-26

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JP2005507696A Expired - Fee Related JP4188370B2 (ja) 2003-01-15 2004-01-14 Ｅｕｖリソグラフィシステムのために調整された反射型回折素子の収差測定方法および装置
JP2008185161A Expired - Fee Related JP5101419B2 (ja) 2003-01-15 2008-07-16 反射型回折格子

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JP2008185161A Expired - Fee Related JP5101419B2 (ja) 2003-01-15 2008-07-16 反射型回折格子

Country Status (3)

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US (2) US6867846B2 (enExample)
JP (2) JP4188370B2 (enExample)
WO (1) WO2004066366A2 (enExample)

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DE102016212477A1 (de) * 2016-07-08 2018-01-11 Carl Zeiss Smt Gmbh Messverfahren und Messsystem zur interferometrischen Vermessung der Abbildungsqualität eines optischen Abbildungssystems
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CN108489930A (zh) * 2018-01-30 2018-09-04 中国科学院上海技术物理研究所 基于单元胞立体相位光栅的被动式THz光谱仪
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