AU2002224059A1 - Method and apparatus for measuring aberration of projection optical system, and method and apparatus for exposure - Google Patents

Method and apparatus for measuring aberration of projection optical system, and method and apparatus for exposure

Info

Publication number
AU2002224059A1
AU2002224059A1 AU2002224059A AU2405902A AU2002224059A1 AU 2002224059 A1 AU2002224059 A1 AU 2002224059A1 AU 2002224059 A AU2002224059 A AU 2002224059A AU 2405902 A AU2405902 A AU 2405902A AU 2002224059 A1 AU2002224059 A1 AU 2002224059A1
Authority
AU
Australia
Prior art keywords
exposure
optical system
projection optical
measuring aberration
aberration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002224059A
Inventor
Naomasa Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2002224059A1 publication Critical patent/AU2002224059A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G01M11/0264—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested by using targets or reference patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
AU2002224059A 2000-11-27 2001-11-21 Method and apparatus for measuring aberration of projection optical system, and method and apparatus for exposure Abandoned AU2002224059A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-359388 2000-11-27
JP2000359388 2000-11-27
PCT/JP2001/010154 WO2002042728A1 (en) 2000-11-27 2001-11-21 Method and apparatus for measuring aberration of projection optical system, and method and apparatus for exposure

Publications (1)

Publication Number Publication Date
AU2002224059A1 true AU2002224059A1 (en) 2002-06-03

Family

ID=18831157

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002224059A Abandoned AU2002224059A1 (en) 2000-11-27 2001-11-21 Method and apparatus for measuring aberration of projection optical system, and method and apparatus for exposure

Country Status (3)

Country Link
JP (1) JPWO2002042728A1 (en)
AU (1) AU2002224059A1 (en)
WO (1) WO2002042728A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW550377B (en) 2000-02-23 2003-09-01 Zeiss Stiftung Apparatus for wave-front detection
JP2004061515A (en) 2002-07-29 2004-02-26 Cark Zeiss Smt Ag Method and device for determining influence onto polarization state by optical system, and analyzer
US7268891B2 (en) 2003-01-15 2007-09-11 Asml Holding N.V. Transmission shear grating in checkerboard configuration for EUV wavefront sensor
US6867846B2 (en) 2003-01-15 2005-03-15 Asml Holding Nv Tailored reflecting diffractor for EUV lithographic system aberration measurement
US7027164B2 (en) 2003-01-15 2006-04-11 Asml Holding N.V. Speckle reduction method and system for EUV interferometry
US7289223B2 (en) 2003-01-31 2007-10-30 Carl Zeiss Smt Ag Method and apparatus for spatially resolved polarimetry
AU2003304304A1 (en) 2003-07-05 2005-01-21 Carl Zeiss Smt Ag Device for the polarization-specific examination of an optical system
JP4387359B2 (en) 2003-09-26 2009-12-16 カール・ツァイス・エスエムティー・アーゲー Optical characteristic measurement method and projection exposure system provided with wavefront detection system
JP4590181B2 (en) * 2003-11-28 2010-12-01 キヤノン株式会社 Measuring method and apparatus, exposure apparatus, and device manufacturing method
KR101257960B1 (en) 2004-06-04 2013-04-24 칼 짜이스 에스엠테 게엠베하 System for measuring the image quality of an optical imaging system
JP4769448B2 (en) * 2004-10-08 2011-09-07 キヤノン株式会社 Exposure apparatus having interferometer and device manufacturing method
JP5503193B2 (en) * 2009-06-08 2014-05-28 キヤノン株式会社 Wavefront aberration measuring apparatus, exposure apparatus, and device manufacturing method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764139A (en) * 1980-10-08 1982-04-19 Nippon Kogaku Kk <Nikon> Interferometer
JP4117585B2 (en) * 1997-08-26 2008-07-16 株式会社ニコン Optical apparatus inspection method and apparatus, exposure apparatus, and exposure apparatus manufacturing method

Also Published As

Publication number Publication date
JPWO2002042728A1 (en) 2004-04-02
WO2002042728A1 (en) 2002-05-30

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