AU2003221102A1 - Projection optical system, exposure system and exposure method - Google Patents

Projection optical system, exposure system and exposure method

Info

Publication number
AU2003221102A1
AU2003221102A1 AU2003221102A AU2003221102A AU2003221102A1 AU 2003221102 A1 AU2003221102 A1 AU 2003221102A1 AU 2003221102 A AU2003221102 A AU 2003221102A AU 2003221102 A AU2003221102 A AU 2003221102A AU 2003221102 A1 AU2003221102 A1 AU 2003221102A1
Authority
AU
Australia
Prior art keywords
exposure
projection optical
optical system
exposure method
exposure system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003221102A
Inventor
Yasuhiro Omura
Toshihiko Ozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003221102A1 publication Critical patent/AU2003221102A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
AU2003221102A 2002-04-03 2003-03-31 Projection optical system, exposure system and exposure method Abandoned AU2003221102A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-101096 2002-04-03
JP2002101096A JP2003297729A (en) 2002-04-03 2002-04-03 Projection optical system, exposure apparatus, and method of exposure
PCT/JP2003/004142 WO2003088330A1 (en) 2002-04-03 2003-03-31 Projection optical system, exposure system and exposure method

Publications (1)

Publication Number Publication Date
AU2003221102A1 true AU2003221102A1 (en) 2003-10-27

Family

ID=29241644

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003221102A Abandoned AU2003221102A1 (en) 2002-04-03 2003-03-31 Projection optical system, exposure system and exposure method

Country Status (4)

Country Link
JP (1) JP2003297729A (en)
AU (1) AU2003221102A1 (en)
TW (1) TW200402603A (en)
WO (1) WO2003088330A1 (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
US6683710B2 (en) 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US7453641B2 (en) 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6995908B2 (en) 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
US6970232B2 (en) 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US7075720B2 (en) 2002-08-22 2006-07-11 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in optical systems
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20180078354A (en) 2004-05-17 2018-07-09 칼 짜이스 에스엠티 게엠베하 Catadioptric projection objective with intermediate images
JP2008532273A (en) * 2005-02-25 2008-08-14 カール ツァイス エスエムテー アクチエンゲゼルシャフト Optical system for microlithographic projection exposure apparatus
JP2008016516A (en) 2006-07-03 2008-01-24 Canon Inc Exposure apparatus
US7525640B2 (en) * 2006-11-07 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2008104192A1 (en) 2007-02-28 2008-09-04 Carl Zeiss Smt Ag Catadioptric projection objective with pupil correction
JP2010097986A (en) * 2008-10-14 2010-04-30 Nikon Corp Projection optical system, exposure apparatus, and device manufacturing method
JP2012004465A (en) * 2010-06-19 2012-01-05 Nikon Corp Illumination optical system, exposure equipment, and device manufacturing method
JP5567098B2 (en) * 2012-10-31 2014-08-06 カール・ツァイス・エスエムティー・ゲーエムベーハー Catadioptric projection objective with pupil correction
JP2013102177A (en) * 2012-12-25 2013-05-23 Nikon Corp Projection optical system
US10732336B2 (en) * 2017-02-02 2020-08-04 Corning Incorporated Method of assembling optical systems and minimizing retardance distortions in optical assemblies

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3089955B2 (en) * 1994-10-06 2000-09-18 株式会社ニコン Optical member for optical lithography and projection optical system
JP3413067B2 (en) * 1997-07-29 2003-06-03 キヤノン株式会社 Projection optical system and projection exposure apparatus using the same
KR20010088279A (en) * 1999-01-06 2001-09-26 시마무라 테루오 Projection optical system, method for producing the same, and projection exposure apparatus using the same
JP2000331927A (en) * 1999-03-12 2000-11-30 Canon Inc Projection optical system and projection aligner using the same
JP2000356701A (en) * 1999-06-15 2000-12-26 Tsuguo Fukuda Optical member for vacuum ultraviolet region comprising colquiriite type fluoride mixed crystal and coating material for optical member
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
KR20010113527A (en) * 2000-06-19 2001-12-28 시마무라 테루오 Projection optical system and manufacturing method thereof, and projection exposure apparatus

Also Published As

Publication number Publication date
JP2003297729A (en) 2003-10-17
TW200402603A (en) 2004-02-16
WO2003088330A1 (en) 2003-10-23

Similar Documents

Publication Publication Date Title
AU2003289126A1 (en) Illumination optical system, exposure system, and exposure method
SG10201405231YA (en) Projection optical system, exposure apparatus, and exposure method
AU2003221102A1 (en) Projection optical system, exposure system and exposure method
AU2003211559A1 (en) Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method, exposure device, program, and device manufacturing method
AU2003256081A1 (en) Projection optical system and method for photolithography and exposure apparatus and method using same
AU2003289239A1 (en) Exposure system and device producing method
AU2002352977A1 (en) Solid state system and method for generating ultraviolet light
AU2002344559A1 (en) Projection optical system, exposure device, and exposure method
IL181136A0 (en) Projection optical system, exposure apparatus, and exposure method
EP1835527A4 (en) Projection optical system, exposure apparatus, exposure system, and exposure method
AU2003235124A1 (en) Exposure system and device manufacturing method
AU2003267688A1 (en) Projection system
AU2003265176A1 (en) Exposure method, exposure mask, and exposure apparatus
AU2003294179A1 (en) Projection device, projection system, and image obtainment method
AU2003224088A1 (en) Projection method and projection system comprising an optical filtering process
AU2003269456A1 (en) Tight focusing method and system
AU2003289427A1 (en) Aberration measuring method, exposure method and exposure system
AU2003229725A1 (en) Projection optical system
AU2003242268A1 (en) Exposure system and exposure method
AU2003242477A1 (en) Optical unit and x-ray exposure system
AU2003284540A1 (en) Exposure system, exposure method, and device fabricating method
AU2003281312A1 (en) Shearing interferometer calibrating method, production method for projection optical system, projection opticalsystem, and projection exposure system
AU2003261800A1 (en) Projection optical system and exposure device
AU2003252250A1 (en) Diffractive optics, illumiinating optical system, exposure system and exposure method
AU2003229692A1 (en) Optical system, method of altering retardances therein and photolithography tool

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase