AU2003281312A1 - Shearing interferometer calibrating method, production method for projection optical system, projection opticalsystem, and projection exposure system - Google Patents

Shearing interferometer calibrating method, production method for projection optical system, projection opticalsystem, and projection exposure system

Info

Publication number
AU2003281312A1
AU2003281312A1 AU2003281312A AU2003281312A AU2003281312A1 AU 2003281312 A1 AU2003281312 A1 AU 2003281312A1 AU 2003281312 A AU2003281312 A AU 2003281312A AU 2003281312 A AU2003281312 A AU 2003281312A AU 2003281312 A1 AU2003281312 A1 AU 2003281312A1
Authority
AU
Australia
Prior art keywords
projection
opticalsystem
optical system
shearing interferometer
production method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003281312A
Inventor
Zhigiang Liu
Kazuya Ota
Katsumi Sugisaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003281312A1 publication Critical patent/AU2003281312A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02097—Self-interferometers
    • G01B9/02098—Shearing interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J9/0215—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods by shearing interferometric methods

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2003281312A 2002-07-08 2003-07-07 Shearing interferometer calibrating method, production method for projection optical system, projection opticalsystem, and projection exposure system Abandoned AU2003281312A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002198901A JP2004037429A (en) 2002-07-08 2002-07-08 Method for calibrating shearing interferometer, method for manufacturing projection optical system, projection optical system, and projection exposure apparatus
JP2002-198901 2002-07-08
PCT/JP2003/008588 WO2004005846A1 (en) 2002-07-08 2003-07-07 Shearing interferometer calibrating method, production method for projection optical system, projection opticalsystem, and projection exposure system

Publications (1)

Publication Number Publication Date
AU2003281312A1 true AU2003281312A1 (en) 2004-01-23

Family

ID=30112438

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003281312A Abandoned AU2003281312A1 (en) 2002-07-08 2003-07-07 Shearing interferometer calibrating method, production method for projection optical system, projection opticalsystem, and projection exposure system

Country Status (3)

Country Link
JP (1) JP2004037429A (en)
AU (1) AU2003281312A1 (en)
WO (1) WO2004005846A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4769448B2 (en) * 2004-10-08 2011-09-07 キヤノン株式会社 Exposure apparatus having interferometer and device manufacturing method
JP4600047B2 (en) * 2005-01-13 2010-12-15 株式会社ニコン Wavefront aberration measuring method, wavefront aberration measuring apparatus, projection exposure apparatus, and projection optical system manufacturing method
JP2006324311A (en) 2005-05-17 2006-11-30 Canon Inc Wavefront aberration measuring device and exposing device therewith
US7518703B2 (en) * 2005-06-28 2009-04-14 Asml Netherlands B.V. Lithographic apparatus and method
FR2890461B1 (en) * 2005-09-05 2008-12-26 Sagem Defense Securite SHUTTER AND ILLUMINATOR OF A PHOTOLITHOGRAPHY DEVICE
JP5725874B2 (en) * 2011-01-14 2015-05-27 キヤノン株式会社 Shearing interference measuring apparatus and calibration method thereof
CN103674493B (en) * 2013-12-04 2016-02-10 中国科学院上海光学精密机械研究所 The removing method of the systematic error that grating shearing interferometer wave aberration detects

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0789043B2 (en) * 1985-12-02 1995-09-27 京セラ株式会社 Shear ring interferometer
US6312373B1 (en) * 1998-09-22 2001-11-06 Nikon Corporation Method of manufacturing an optical system

Also Published As

Publication number Publication date
JP2004037429A (en) 2004-02-05
WO2004005846A1 (en) 2004-01-15

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase