AU2003224088A1 - Projection method and projection system comprising an optical filtering process - Google Patents

Projection method and projection system comprising an optical filtering process

Info

Publication number
AU2003224088A1
AU2003224088A1 AU2003224088A AU2003224088A AU2003224088A1 AU 2003224088 A1 AU2003224088 A1 AU 2003224088A1 AU 2003224088 A AU2003224088 A AU 2003224088A AU 2003224088 A AU2003224088 A AU 2003224088A AU 2003224088 A1 AU2003224088 A1 AU 2003224088A1
Authority
AU
Australia
Prior art keywords
projection
filtering process
optical filtering
projection system
projection method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003224088A
Other versions
AU2003224088A8 (en
Inventor
Martin Brunotte
Volker Graschus
Paul Graupner
Christian Wagner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of AU2003224088A8 publication Critical patent/AU2003224088A8/en
Publication of AU2003224088A1 publication Critical patent/AU2003224088A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
AU2003224088A 2002-04-24 2003-04-17 Projection method and projection system comprising an optical filtering process Abandoned AU2003224088A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10218989A DE10218989A1 (en) 2002-04-24 2002-04-24 Projection method and projection system with optical filtering
DE10218989.7 2002-04-24
PCT/EP2003/004012 WO2003092256A2 (en) 2002-04-24 2003-04-17 Projection method and projection system comprising an optical filtering process

Publications (2)

Publication Number Publication Date
AU2003224088A8 AU2003224088A8 (en) 2003-11-10
AU2003224088A1 true AU2003224088A1 (en) 2003-11-10

Family

ID=28798877

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003224088A Abandoned AU2003224088A1 (en) 2002-04-24 2003-04-17 Projection method and projection system comprising an optical filtering process

Country Status (3)

Country Link
AU (1) AU2003224088A1 (en)
DE (1) DE10218989A1 (en)
WO (1) WO2003092256A2 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070103658A1 (en) * 2003-12-22 2007-05-10 Koninklijke Philips Electronic, N.V. Lithographic projection device, method an substrate for manufacturing electronic devices, and obtained electronic device
WO2005069078A1 (en) * 2004-01-19 2005-07-28 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus with immersion projection lens
KR101199076B1 (en) * 2004-06-04 2012-11-07 칼 짜이스 에스엠티 게엠베하 Projection system with compensation of intensity variations and compensation element therefor
JP4599936B2 (en) 2004-08-17 2010-12-15 株式会社ニコン Illumination optical apparatus, adjustment method of illumination optical apparatus, exposure apparatus, and exposure method
DE102005015627A1 (en) 2005-04-06 2006-10-12 Carl Zeiss Smt Ag Optical imaging device
EP1904894A1 (en) * 2005-07-18 2008-04-02 Carl Zeiss SMT AG Pellicle for use in a microlithographic exposure apparatus
DE102005042496A1 (en) 2005-09-05 2007-03-08 Carl Zeiss Sms Gmbh Method of correcting apodization in microscopic imaging systems
JP5097119B2 (en) 2005-11-03 2012-12-12 カール・ツァイス・エスエムティー・ゲーエムベーハー Microlithography projection exposure apparatus
KR101164460B1 (en) * 2006-04-07 2012-07-18 신에쓰 가가꾸 고교 가부시끼가이샤 Pellicle for lithography
JP5299937B2 (en) 2006-05-18 2013-09-25 カール・ツァイス・エスエムティー・ゲーエムベーハー How to correct the optical proximity effect
EP1906251A1 (en) 2006-09-26 2008-04-02 Carl Zeiss SMT AG Projection exposure method and projection exposure system
WO2009018911A1 (en) 2007-08-03 2009-02-12 Carl Zeiss Smt Ag Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate
WO2012041341A1 (en) * 2010-09-30 2012-04-05 Carl Zeiss Smt Gmbh Projection exposure system and projection exposure method
DE102017208340A1 (en) 2017-05-17 2018-11-22 Carl Zeiss Smt Gmbh Projection exposure method and projection objective with adjustment of the pupil transmission

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2995820B2 (en) * 1990-08-21 1999-12-27 株式会社ニコン Exposure method and method, and device manufacturing method
JP3245882B2 (en) * 1990-10-24 2002-01-15 株式会社日立製作所 Pattern forming method and projection exposure apparatus
JPH08316124A (en) * 1995-05-19 1996-11-29 Hitachi Ltd Method and apparatus for projection exposing
JP2785757B2 (en) * 1995-08-30 1998-08-13 日本電気株式会社 Photo mask
DE19929403A1 (en) * 1999-06-26 2000-12-28 Zeiss Carl Fa Objective, in particular objective for a semiconductor lithography projection exposure system and manufacturing method
EP1203264A4 (en) * 1999-07-01 2004-09-15 Apparatus and method of image enhancement through spatial filtering
JP2001085315A (en) * 1999-09-16 2001-03-30 Nikon Corp Illumination optical apparatus and aligner having illumination optical apparatus

Also Published As

Publication number Publication date
WO2003092256A3 (en) 2004-09-16
WO2003092256A2 (en) 2003-11-06
DE10218989A1 (en) 2003-11-06
AU2003224088A8 (en) 2003-11-10

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase