AU2003224088A8 - Projection method and projection system comprising an optical filtering process - Google Patents
Projection method and projection system comprising an optical filtering processInfo
- Publication number
- AU2003224088A8 AU2003224088A8 AU2003224088A AU2003224088A AU2003224088A8 AU 2003224088 A8 AU2003224088 A8 AU 2003224088A8 AU 2003224088 A AU2003224088 A AU 2003224088A AU 2003224088 A AU2003224088 A AU 2003224088A AU 2003224088 A8 AU2003224088 A8 AU 2003224088A8
- Authority
- AU
- Australia
- Prior art keywords
- projection
- filtering process
- optical filtering
- projection system
- projection method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10218989A DE10218989A1 (en) | 2002-04-24 | 2002-04-24 | Projection method and projection system with optical filtering |
DE10218989.7 | 2002-04-24 | ||
PCT/EP2003/004012 WO2003092256A2 (en) | 2002-04-24 | 2003-04-17 | Projection method and projection system comprising an optical filtering process |
Publications (2)
Publication Number | Publication Date |
---|---|
AU2003224088A1 AU2003224088A1 (en) | 2003-11-10 |
AU2003224088A8 true AU2003224088A8 (en) | 2003-11-10 |
Family
ID=28798877
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003224088A Abandoned AU2003224088A1 (en) | 2002-04-24 | 2003-04-17 | Projection method and projection system comprising an optical filtering process |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU2003224088A1 (en) |
DE (1) | DE10218989A1 (en) |
WO (1) | WO2003092256A2 (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007515803A (en) * | 2003-12-22 | 2007-06-14 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Lithographic projection apparatus, method and substrate for manufacturing an electronic device, and resulting electronic device |
WO2005069078A1 (en) * | 2004-01-19 | 2005-07-28 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus with immersion projection lens |
KR101248328B1 (en) | 2004-06-04 | 2013-04-01 | 칼 짜이스 에스엠티 게엠베하 | Projection system with compensation of intensity variations and compensation element therefor |
JP4599936B2 (en) † | 2004-08-17 | 2010-12-15 | 株式会社ニコン | Illumination optical apparatus, adjustment method of illumination optical apparatus, exposure apparatus, and exposure method |
DE102005015627A1 (en) | 2005-04-06 | 2006-10-12 | Carl Zeiss Smt Ag | Optical imaging device |
KR20080023338A (en) * | 2005-07-18 | 2008-03-13 | 칼 짜이스 에스엠테 아게 | Pellicle for use in a microlithographic exposure apparatus |
DE102005042496A1 (en) * | 2005-09-05 | 2007-03-08 | Carl Zeiss Sms Gmbh | Method of correcting apodization in microscopic imaging systems |
WO2007051574A1 (en) * | 2005-11-03 | 2007-05-10 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus |
KR101164460B1 (en) * | 2006-04-07 | 2012-07-18 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Pellicle for lithography |
JP5299937B2 (en) | 2006-05-18 | 2013-09-25 | カール・ツァイス・エスエムティー・ゲーエムベーハー | How to correct the optical proximity effect |
EP1906251A1 (en) | 2006-09-26 | 2008-04-02 | Carl Zeiss SMT AG | Projection exposure method and projection exposure system |
WO2009018911A1 (en) | 2007-08-03 | 2009-02-12 | Carl Zeiss Smt Ag | Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate |
WO2012041341A1 (en) | 2010-09-30 | 2012-04-05 | Carl Zeiss Smt Gmbh | Projection exposure system and projection exposure method |
DE102017208340A1 (en) | 2017-05-17 | 2018-11-22 | Carl Zeiss Smt Gmbh | Projection exposure method and projection objective with adjustment of the pupil transmission |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2995820B2 (en) * | 1990-08-21 | 1999-12-27 | 株式会社ニコン | Exposure method and method, and device manufacturing method |
JP3245882B2 (en) * | 1990-10-24 | 2002-01-15 | 株式会社日立製作所 | Pattern forming method and projection exposure apparatus |
JPH08316124A (en) * | 1995-05-19 | 1996-11-29 | Hitachi Ltd | Method and apparatus for projection exposing |
JP2785757B2 (en) * | 1995-08-30 | 1998-08-13 | 日本電気株式会社 | Photo mask |
DE19929403A1 (en) * | 1999-06-26 | 2000-12-28 | Zeiss Carl Fa | Objective, in particular objective for a semiconductor lithography projection exposure system and manufacturing method |
EP1203264A4 (en) * | 1999-07-01 | 2004-09-15 | Apparatus and method of image enhancement through spatial filtering | |
JP2001085315A (en) * | 1999-09-16 | 2001-03-30 | Nikon Corp | Illumination optical apparatus and aligner having illumination optical apparatus |
-
2002
- 2002-04-24 DE DE10218989A patent/DE10218989A1/en not_active Withdrawn
-
2003
- 2003-04-17 WO PCT/EP2003/004012 patent/WO2003092256A2/en not_active Application Discontinuation
- 2003-04-17 AU AU2003224088A patent/AU2003224088A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
AU2003224088A1 (en) | 2003-11-10 |
WO2003092256A2 (en) | 2003-11-06 |
DE10218989A1 (en) | 2003-11-06 |
WO2003092256A3 (en) | 2004-09-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |