AU2003213455A1 - Shape measuring method, interference measuring device, porduction method for projection optical system, and porjectionj aligner - Google Patents

Shape measuring method, interference measuring device, porduction method for projection optical system, and porjectionj aligner

Info

Publication number
AU2003213455A1
AU2003213455A1 AU2003213455A AU2003213455A AU2003213455A1 AU 2003213455 A1 AU2003213455 A1 AU 2003213455A1 AU 2003213455 A AU2003213455 A AU 2003213455A AU 2003213455 A AU2003213455 A AU 2003213455A AU 2003213455 A1 AU2003213455 A1 AU 2003213455A1
Authority
AU
Australia
Prior art keywords
porjectionj
porduction
aligner
optical system
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003213455A
Inventor
Shigeru Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003213455A1 publication Critical patent/AU2003213455A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
AU2003213455A 2002-03-12 2003-03-11 Shape measuring method, interference measuring device, porduction method for projection optical system, and porjectionj aligner Abandoned AU2003213455A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-67224 2002-03-12
JP2002067224A JP2003269909A (en) 2002-03-12 2002-03-12 Method of measuring shape, instrument for measuring interference, method of manufacturing projection optical system, and projection exposure unit
PCT/JP2003/002842 WO2003076872A1 (en) 2002-03-12 2003-03-11 Shape measuring method, interference measuring device, porduction method for projection optical system, and porjectionj aligner

Publications (1)

Publication Number Publication Date
AU2003213455A1 true AU2003213455A1 (en) 2003-09-22

Family

ID=27800277

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003213455A Abandoned AU2003213455A1 (en) 2002-03-12 2003-03-11 Shape measuring method, interference measuring device, porduction method for projection optical system, and porjectionj aligner

Country Status (3)

Country Link
JP (1) JP2003269909A (en)
AU (1) AU2003213455A1 (en)
WO (1) WO2003076872A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1682851B1 (en) * 2003-10-20 2013-02-06 Zygo Corporation Reconfigureable interferometer system
CN100341260C (en) * 2003-11-12 2007-10-03 大连理工大学 Laser receiving device for laser alignment system with zone plate
DE102005056914A1 (en) 2005-11-29 2007-05-31 Carl Zeiss Smt Ag Projection illumination system for use with production of e.g. integrated circuit, has interferometer arrangement examining optical components by measuring radiation that strikes on optical surface at specific angle of incidence
DE102006035022A1 (en) * 2006-07-28 2008-01-31 Carl Zeiss Smt Ag Method for producing an optical component, interferometer arrangement and diffraction grating
KR101124018B1 (en) 2009-12-15 2012-03-23 인하대학교 산학협력단 apparatus for measurement of aspheric surface
DE102011004376B3 (en) * 2011-02-18 2012-06-21 Carl Zeiss Smt Gmbh Method for determining shape of optical test surface, involves determining influence of optics on interferometric measurement result from wavefront measured by single angle of incidence measurement beam on optical test surface
DE102012217800A1 (en) * 2012-09-28 2014-04-03 Carl Zeiss Smt Gmbh Diffractive optical element and measuring method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6312373B1 (en) * 1998-09-22 2001-11-06 Nikon Corporation Method of manufacturing an optical system
JP2001091227A (en) * 1999-07-22 2001-04-06 Nikon Corp Measuring device for lens and measuring method for lens
JP2001174233A (en) * 1999-12-20 2001-06-29 Ricoh Co Ltd Interferometer for measuring surface shape, etc., and measuring method
JP2003035526A (en) * 2001-05-18 2003-02-07 Nikon Corp Transmissive zone plate, reflective zone plate, shape measuring method, interference measuring device, and manufacturing method for projection optical system

Also Published As

Publication number Publication date
JP2003269909A (en) 2003-09-25
WO2003076872A1 (en) 2003-09-18

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase