AU2003261800A1 - Projection optical system and exposure device - Google Patents

Projection optical system and exposure device

Info

Publication number
AU2003261800A1
AU2003261800A1 AU2003261800A AU2003261800A AU2003261800A1 AU 2003261800 A1 AU2003261800 A1 AU 2003261800A1 AU 2003261800 A AU2003261800 A AU 2003261800A AU 2003261800 A AU2003261800 A AU 2003261800A AU 2003261800 A1 AU2003261800 A1 AU 2003261800A1
Authority
AU
Australia
Prior art keywords
optical system
projection optical
exposure device
exposure
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003261800A
Inventor
Jin Nishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003261800A1 publication Critical patent/AU2003261800A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
AU2003261800A 2002-08-29 2003-08-28 Projection optical system and exposure device Abandoned AU2003261800A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-252186 2002-08-29
JP2002252186 2002-08-29
PCT/JP2003/010956 WO2004021419A1 (en) 2002-08-29 2003-08-28 Projection optical system and exposure device

Publications (1)

Publication Number Publication Date
AU2003261800A1 true AU2003261800A1 (en) 2004-03-19

Family

ID=31972722

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003261800A Abandoned AU2003261800A1 (en) 2002-08-29 2003-08-28 Projection optical system and exposure device

Country Status (4)

Country Link
JP (1) JP4363328B2 (en)
AU (1) AU2003261800A1 (en)
TW (1) TWI232969B (en)
WO (1) WO2004021419A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5065031B2 (en) 2004-10-08 2012-10-31 カール・ツァイス・エスエムティー・ゲーエムベーハー Projection optical system
JP4765297B2 (en) * 2004-11-09 2011-09-07 株式会社ニコン Lens barrel support apparatus, exposure apparatus, and device manufacturing method
WO2006128613A1 (en) * 2005-06-02 2006-12-07 Carl Zeiss Smt Ag Microlithography projection objective
JP2010080754A (en) * 2008-09-26 2010-04-08 Nikon Corp Illumination optical system and exposure system
JP7293698B2 (en) * 2019-02-07 2023-06-20 株式会社リコー Optical system, imaging system and imaging device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999027570A1 (en) * 1997-11-25 1999-06-03 Nikon Corporation Projection exposure system
JP2000323386A (en) * 1999-05-11 2000-11-24 Nikon Corp Lens tube support device and aligner
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
CN1440512A (en) * 2000-03-31 2003-09-03 株式会社尼康 Method and device for holding optical member, optical device, exposure apparatus and device manufacturing method
KR20010113527A (en) * 2000-06-19 2001-12-28 시마무라 테루오 Projection optical system and manufacturing method thereof, and projection exposure apparatus
EP1326114A1 (en) * 2000-08-25 2003-07-09 Nikon Corporation Optical element holding device

Also Published As

Publication number Publication date
TWI232969B (en) 2005-05-21
JP4363328B2 (en) 2009-11-11
TW200406602A (en) 2004-05-01
WO2004021419A1 (en) 2004-03-11
JPWO2004021419A1 (en) 2005-12-22

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase