JP4765297B2 - Lens barrel support apparatus, exposure apparatus, and device manufacturing method - Google Patents

Description

  The present invention relates to a mirror that supports a lens barrel of an exposure apparatus used in a lithography process in a manufacturing process of a device such as a semiconductor element, a liquid crystal display element, an imaging element, a thin film magnetic head, or a mask such as a reticle or a photomask. The present invention relates to a tube support device. The present invention also relates to an exposure apparatus provided with the lens barrel support device. Furthermore, the present invention relates to a device manufacturing method using the exposure apparatus.

In an exposure apparatus, a reticle such as a reticle or a photomask on which a predetermined pattern is formed is illuminated with predetermined exposure light, and an image of the predetermined pattern is coated with a photosensitive resin such as a photoresist via a projection optical system. Exposure is performed on a substrate such as a wafer or a glass plate. In such an exposure apparatus, the wavelength of exposure light has been shortened to cope with the recent miniaturization of circuit patterns. Recently, far ultraviolet light, for example, KrF excimer laser (λ = 248 nm), vacuum ultraviolet ArF excimer laser (λ = 193 nm), F ₂ laser (λ = 157 nm) and the like have been developed. Yes.

  A projection optical system in this type of exposure apparatus includes optical elements such as a plurality of lenses arranged so that their optical axes coincide with each other. Each optical element is accommodated in the lens barrel in a state of being held almost horizontally (so-called horizontal type) via the optical element holding device. In general, this type of lens barrel has a flange that protrudes in the outer peripheral direction at the center thereof, and is attached as an exposure apparatus by being fastened by, for example, a bolt with the lower surface of the flange supported by a support frame. Has been.

  However, normally, the lens barrel is made of, for example, stainless steel, and the support frame is made of, for example, invar with little thermal expansion, and is made of different materials. Therefore, when the environmental temperature changes during transportation between the exposure apparatus manufacturing factory and the device manufacturing factory where the exposure apparatus is installed, or after the device manufacturing factory is installed, the lens barrel and the support frame are heated by the heat of each forming material. The expansion and contraction differs by the difference in expansion. In this case, if the lens barrel and the support frame are only fixed by bolts, internal stress (vertical and horizontal distortion) is generated in the lens barrel, and the optical element held inside the lens barrel by this internal stress. There is a risk that the optical performance will deteriorate.

  Therefore, in order to solve such a problem, for example, a lens barrel support device as described in Patent Document 1 has been proposed. FIG. 11 is a plan view showing the lens barrel support device 51. As shown in FIG. 11, the lens barrel support device 51 in Patent Document 1 restrains the flange portion 53 and the support frame 54 of the lens barrel 52 in the optical axis AX1 direction (direction passing through the paper surface in FIG. 11), It has a bolt 55 provided with its longitudinal direction substantially coincident with the optical axis AX1, and an anchor rod 56 having one end fixed to the flange 53 and the other end fixed to the support frame 54. The anchor rod 56 is disposed such that the axial direction of the anchor rod 56 is substantially along the tangential direction of the flange portion 53, and the rigidity of the flange portion 53 in the radial direction is weak. On the other hand, similarly to the anchor rod 56, the bolt 55 has a weak rigidity in the radial direction of the flange portion 53.

According to this configuration, even if the lens barrel 52 and the support frame 54 expand and contract by different amounts due to environmental changes (temperature changes), the anchor rod 56 and the bolt 55 are displaced in the horizontal direction (the radial direction of the flange portion 53). Since this expansion / contraction difference is absorbed by (bending), it is said that internal stress is prevented from being generated in the lens barrel 52 and deterioration of optical characteristics can be suppressed.
JP-A-2004-79737 (Claim 1, FIG. 2)

  However, the lens barrel support device 51 of Patent Document 1 also has the following problems. In the above structure, the three anchor rods 56 are arranged at equal intervals in the circumferential direction of the flange portion 53, and the axial directions of the three anchor rods 56 are arranged so as to substantially coincide with the tangential direction of the flange portion 53. There is a need. This is because the movement of the lens barrel 52 in the horizontal rotation direction (the tangential direction of the flange portion 53) is constrained by the synergistic action of the three anchor rods 56 arranged in the tangential direction.

Accordingly, there are problems that the structure of the apparatus is complicated and that the assembly is troublesome and not easy.
The present invention has been made paying attention to such problems existing in the prior art. An object of the present invention is to provide a lens barrel support device that suppresses the occurrence of internal stress in the lens barrel due to environmental changes, suppresses deterioration of optical characteristics, and has a simple device configuration and easy assembly. Another object of the present invention is to provide an exposure apparatus capable of improving exposure accuracy. A further object of the present invention is to provide a device manufacturing method capable of producing a highly integrated device with a high yield.

In order to achieve the above object, the invention described in claim 1 is a lens barrel support device that supports a lens barrel having a flange portion on a support frame via the flange portion, and is provided on the flange portion. A plurality of elongated holes penetrating in a direction substantially parallel to the optical axis direction of the lens barrel and having a radial direction of the lens barrel as a longitudinal direction, and fitted into each of the elongated holes, and one end portion of the support anchored to the frame, while restricting the displacement of the barrel with respect to the circumferential direction of the lens barrel, a first displacement-regulating member that allows displacement of the barrel with respect to the radial direction of the lens barrel, the in the flange portion An insertion hole provided at a position different from the plurality of long holes and penetrating in a direction substantially parallel to the optical axis direction of the lens barrel, and the displacement of the lens barrel inserted in the insertion hole and in the optical axis direction of the lens barrel wherein a second displacement-regulating member for regulating the To.

Therefore, according to the first aspect of the present invention, even when the lens barrel and the support frame expand or contract by different amounts due to environmental temperature changes, the first displacement regulating member moves the lens barrel in the radial direction (for example, heat (When inflated) is allowed. Therefore, it is possible to suppress the occurrence of internal stress (distortion) in the lens barrel even when the environmental temperature changes. Further, the movement of the lens barrel in the circumferential direction, that is, around the optical axis (rotation direction) can be regulated by the first displacement regulating member. Furthermore, the movement of the lens barrel in the optical axis direction can be regulated by the second displacement regulating member. Therefore, in order to restrict the movement of the lens barrel in the direction around the optical axis (circumferential direction of the lens barrel) with the first displacement regulating member and to regulate the movement of the lens barrel in the optical axis direction with the second displacement regulating member, The lens barrel can be supported in a stable state.

  According to a second aspect of the present invention, in the lens barrel support device according to the first aspect, the flange portion is placed on the support frame via a plurality of seats provided on opposing surfaces facing the support frame. The elongated holes are provided in each of the plurality of seats.

  Therefore, according to the second aspect of the present invention, since the lens barrel is placed on the support frame via the seat, the assembly of the lens barrel to the support frame becomes easy, and the support frame and the lens barrel after the assembly are installed. Stress due to vibration, temperature change, etc. can be effectively reduced. Furthermore, since the first displacement restricting member is provided at the seat where the flange portion and the support frame abut, the first displacement restricting member can be provided more stably than when provided at a location other than the seat. Further, the rigidity of the entire apparatus is increased.

  According to a third aspect of the present invention, in the lens barrel support device according to the first or second aspect, the first displacement regulating member includes a first rod member having the one end and a gap between the first rod member. And an eccentric bush that is externally fitted and abuts against each of the circumferential surfaces of the inner circumferential surface of the elongated hole.

  Therefore, according to the third aspect of the invention, since the eccentric bush is inserted into the eccentric position, the position of the first rod member in the long hole is the position of the long hole when assembled. Even when it deviates from the central axis, correction according to the amount of eccentricity of the eccentric bush becomes possible.

  According to a fourth aspect of the present invention, in the lens barrel support device according to the third aspect of the present invention, the lens barrel support device further includes a bush presser that restricts the eccentric bushing from rotating with respect to the first rod member. .

Therefore, according to the fourth aspect of the invention, the eccentric bush can be regulated so as not to rotate with respect to the first rod member, and can be integrated with the first rod member.
According to a fifth aspect of the present invention, in the lens barrel support device according to the fourth aspect, the bush presser allows the displacement of the lens barrel with respect to a direction substantially parallel to the optical axis direction of the lens barrel. And

  Therefore, according to the fifth aspect of the present invention, since the displacement of the lens barrel in a direction substantially parallel to the optical axis direction of the lens barrel is allowed, the first displacement regulating member does not move the lens barrel in the circumferential direction. It is possible to suppress generation of unnecessary internal stress in the lens barrel only by regulating.

  According to a sixth aspect of the present invention, in the lens barrel support device according to any one of the third to fifth aspects, at least one of the inner surface of the elongated hole and the outer surface of the eccentric bush is lubricated to reduce friction. It is characterized by being processed.

    Therefore, according to the invention described in claim 6, since at least one of the inner surface of the long hole and the outer surface of the eccentric bush is lubricated, even if the eccentric bush is fitted into the long hole, Can easily expand and contract in the radial direction of the lens barrel, so that the difference in expansion and contraction between the lens barrel and the support frame can be satisfactorily absorbed when the environmental temperature changes.

The invention according to claim 7, in the lens barrel supporting device according to any one of claims 1 to 6, wherein the second displacement-regulating member before Ki挿 entry apertures, so as not to contact with the inner surface A second rod member whose one end is fixed to the flange portion, and is attached to the other end portion of the second rod member and is in contact with the flange portion, and the flange portion is attached to the lens barrel. wherein the of Ru and a regulating member for regulating a direction substantially parallel to the optical axis.

Therefore, according to the seventh aspect of the present invention, the second rod regulating member and the regulating member constitute the second displacement regulating member, and the movement of the lens barrel in the optical axis direction can be regulated.
According to an eighth aspect of the present invention, in the lens barrel support device according to the seventh aspect , the second rod member bends in a direction perpendicular to the optical axis of the lens barrel as compared with the first rod member. It is characterized by being configured to be easily rigid.

Therefore, according to the eighth aspect of the present invention, since the second rod member is inserted so as not to contact the inner surface of the insertion hole, the second rod member is easily bent in the radial direction of the lens barrel. In FIG. 5, expansion and contraction in the radial direction of the lens barrel (radial direction of the flange portion) can be allowed and absorbed, and even if the environmental temperature changes, it is possible to further suppress the occurrence of internal stress in the lens barrel.

A ninth aspect of the present invention is the lens barrel support device according to the seventh or eighth aspect , wherein the gap between the insertion hole and the second rod member is relatively displaced in the longitudinal direction of the long hole. It is characterized by being larger than the movable range of the rod member.

Therefore, according to the ninth aspect of the present invention, a gap larger than the movable range of the first rod member in the long hole is formed between the second rod member and the insertion hole. The movement of the lens barrel in the radial direction can be effectively utilized in the second displacement regulating member.

The exposure apparatus according to claim 10 is an exposure apparatus that exposes an image of a predetermined pattern formed on a mask on a substrate under exposure light. The image is transferred onto the substrate via a projection optical system in a lens barrel supported by the lens barrel support device according to any one of items 9 .

Therefore, according to the invention described in claim 10 , since the deterioration of the optical characteristics of the projection optical system is suppressed, an exposure apparatus having stable optical characteristics can be obtained.
A device manufacturing method according to an eleventh aspect of the invention is a device manufacturing method including a lithography step, wherein the exposure is performed using the exposure apparatus according to the tenth aspect in the lithography step.

Therefore, according to the invention described in claim 11 , a high-quality device can be manufactured with a high yield by using an exposure apparatus with stable optical characteristics.

  As described above in detail, according to the present invention, it is possible to suppress the occurrence of internal stress in the lens barrel due to environmental changes, to suppress deterioration of optical characteristics, and to have a simple apparatus configuration and easy assembly. A support device can be provided. In addition, an exposure apparatus with high exposure accuracy can be provided. Furthermore, it is possible to provide a device manufacturing method capable of producing a highly integrated device with a high yield.

  FIG. 1 to FIG. 10 show an embodiment in which the lens barrel support device and the exposure apparatus of the present invention are embodied as a lens barrel support device for a lens barrel that accommodates an exposure device for manufacturing a semiconductor element and its projection optical system. Therefore, it explains.

  FIG. 1 shows a schematic configuration of the exposure apparatus 11 with the projection optical system 15 as the center. As shown in FIG. 1, an exposure apparatus 11 of this embodiment includes a light source 12, an illumination optical system 13, a reticle stage 14 that holds a reticle Rt as a mask, a projection optical system 15, and a wafer W as a substrate. And a wafer stage 16 for holding the wafer.

In the present embodiment, the light source 12 oscillates an F ₂ laser having a wavelength of 157 nm. In addition, a KrF excimer laser with a wavelength of 248 nm, an ArF excimer laser with a wavelength of 193 nm, or the like can also be used.

  The illumination optical system 13 includes an optical integrator (not shown) such as a fly-eye lens and a rod lens, various lens systems such as a relay lens and a condenser lens, an aperture stop, and the like. The exposure light EL emitted from the light source 12 passes through the illumination optical system 13 and is adjusted so as to uniformly illuminate the pattern on the reticle Rt.

  In the reticle stage 14, on the exit side of the illumination optical system 13, that is, on the object plane side (incident side of the exposure light EL) of the projection optical system 15 described later, the mounting surface of the reticle Rt is the optical axis of the projection optical system 15. They are arranged so as to be substantially orthogonal to the AX direction.

  The projection optical system 15 includes a plurality of optical elements 17 such as lenses. In the projection optical system 15, an optical element 17 is accommodated in a lens barrel 19 formed by stacking a plurality of lens barrel modules 19a so that the optical axes AX coincide with each other. Each of the plurality of lens barrel modules 19 a holds one or more optical elements 17.

  The wafer stage 16 is arranged on the image plane side of the projection optical system 15 (exposing side of the exposure light EL) so that the mounting surface of the wafer W intersects the optical axis direction of the projection optical system 15. Then, the pattern image on the reticle Rt illuminated by the exposure light EL is projected and transferred onto the wafer W on the wafer stage 16 in a state of being reduced to a predetermined reduction magnification through the projection optical system 15. ing.

  Next, a detailed configuration of the lens barrel support device 22 that supports the lens barrel 19 having the flange portion 21 will be described. FIG. 2 is a schematic perspective view showing the lens barrel support device 22, and FIG. 3 is a plan view of FIG. 2 showing the lens barrel support device 22. FIG. 4 is a bottom view of the lens barrel 19.

  As shown in FIG. 2, the lens barrel support device 22 includes a support frame 25 having a mounting surface 24 (facing surface) facing the lower surface 23 (supported surface, see FIG. 4) of the flange portion 21 of the lens barrel 19. A plurality of (in the present embodiment, three locations at equal angular intervals) provided between the lower surface 23 (see FIG. 4) of the flange portion 21 and the mounting surface 24, and a support portion 26 that supports the flange portion 21; It is comprised including. The support portion 26 is formed with a rotation restricting portion 27 that restricts the rotation of the lens barrel 19 around the optical axis AX, and an optical axis direction restricting portion 28 that restricts the movement of the lens barrel 19 in the optical axis direction.

  The lens barrel 19 having the flange portion 21 and the support frame 25 are formed of different materials. The support frame 25 is made of a low thermal expansion material, for example, Invar (inver; nickel 36%, manganese 0.25%, and a low expansion alloy made of iron containing a small amount of carbon and other elements). As the support frame 25, a ceramic material having high rigidity and low thermal expansion may be used. On the other hand, the lens barrel 19 having the flange portion 21 is formed of stainless steel having good workability. Degassing from the lens barrel 19 can be suppressed by forming the lens barrel 19 from stainless steel.

  FIG. 5 is a cross-sectional view taken along the line AA in FIG. 3 and shows the configuration of the rotation restricting portion 27. As shown in FIG. 5, a hole 31 having a stepped shape in cross section is formed at a position corresponding to the support portion 26 of the flange portion 21 so as to penetrate the flange portion 21. The shape of the hole 31 is changed in three stages, and in order from the top, the first perfect circular hole portion 32 having a circular shape in plan view and the first circular shape having the same circular shape in plan view. A second round hole 33 having a smaller diameter than the hole and a long hole 34 (long hole) having a substantially oval shape in plan view (an oval shape formed by a straight side facing a part of the outline). It is configured. The longitudinal direction of the long hole portion 34 coincides with the radial direction of the flange portion 21 (lens barrel 19) (see FIG. 4), and the length in the longitudinal direction is substantially the same as the diameter of the second round hole portion 33. It is formed (see FIG. 3). Further, the inner surface of the long hole portion 34 is subjected to a lubrication process for reducing friction so that an outer surface of an eccentric bush 36 described later and an inner surface of the long hole portion 34 can slide relative to each other.

  As shown in FIG. 5, the first rod member 35 is inserted into the long hole portion 34, and the lower end of the first rod member 35 is screwed and fixed to the mounting surface 24 of the support frame 25. On the outer periphery of the first rod member 35, an eccentric bush 36 that fits on the outer periphery of the intermediate portion of the first rod member 35 is mounted. A through hole 37 is formed in the eccentric bush 36 at a position eccentric from the center of the eccentric bush 36 (see FIG. 8), and the first rod member 35 is fitted into the through hole 37. . Further, the outer shape of the eccentric bush 36 is a perfect circle, and its diameter is formed to be substantially the same as the shorter width of the long hole portion 34 (the width in the circumferential direction of the flange portion 21). Of the inner circumferential surface of the portion 34, the circumferential surface is abutted and fitted. A hexagonal nut 38 is fitted from above the eccentric bush 36 and screwed into the outer periphery of the first rod member 35.

  Thereby, the eccentric bush 36 is regulated so as not to rotate with respect to the first rod member 35, and the support frame 25, the first rod member 35, the eccentric bush 36, and the hexagon nut 38 are respectively integrated. As described above, the eccentric bush 36 that is externally fitted to the first rod member 35 fixed to the support frame 25 is fitted into the long hole portion 34 in the circumferential direction of the flange portion 21, and thus the rotation direction of the lens barrel 19. Movement is regulated.

  The outer surface of the hexagon nut 38 is not in contact with the flange portion 21 (the inner surface of the hole 31), and the upper end position of the eccentric bush 36 is slightly higher than the bottom surface of the second round hole portion 33. . For this reason, the eccentric bush 36 allows the displacement of the lens barrel 19 in a direction substantially parallel to the optical axis direction of the lens barrel 19.

  6 is a cross-sectional view taken along the line BB in FIG. 3 and shows the configuration of the optical axis direction regulating portion 28. As shown in FIG. 6, a hole 42 through which the second rod member 41 is inserted is formed in the flange portion 21 at a position corresponding to the support portion 26 of the flange portion 21 and in the vicinity of each rotation restricting portion 27. Has been. The inner diameter of the hole 42 is formed larger than the diameter of the portion inserted into the hole 42 of the second rod member 41, and when the second rod member 41 is inserted into the hole 42, the inner surface of the hole 42 is formed. And the outer surface of the 2nd rod member 41 does not contact | abut, it has the clearance gap S and is in the state slightly spaced apart.

  Further, the lower end of the second rod member 41 is fixed by screwing to the mounting surface 24 of the support frame 25. A hexagonal nut 43 is fitted into the head of the second rod member 41 from the upper surface of the flange portion 21 and is screwed with a male screw formed on the outer periphery of the second rod member 41.

The second rod member 41 has a high rigidity against a load applied in a direction parallel to the longitudinal direction (that is, a direction parallel to the optical axis AX), and a direction intersecting the longitudinal direction (the optical axis AX of the lens barrel). The rigidity with respect to the circumferential direction of the flange portion 21 is weaker than that of the first rod member 35, for example. For this reason, the lens barrel 19 (flange portion 21) and the support frame 25 are fixed in a direction substantially parallel to the optical axis direction, and movement of the lens barrel 19 in the optical axis direction is restricted. In addition, since the gap S is provided between the second rod member 41 and the hole 42 as described above, when a force in the circumferential direction (around the optical axis) of the flange portion 21 is applied to the lens barrel 19. The second rod member 41 bends in the circumferential direction of the flange portion 21.

(Function)
In the lens barrel support device 22 configured as described above, when the environmental temperature changes, the lens barrel 19 and the support frame 25 thermally expand in accordance with the respective forming materials. A difference in expansion and contraction due to a difference in expansion occurs. In the lens barrel support device 22 of the present embodiment, the expansion / contraction difference between the lens barrel 19 and the support frame 25 caused by the change in the environmental temperature is absorbed by the actions of the rotation restricting portion 27 and the optical axis direction restricting portion 28. It has become. This will be described in detail below.

  As described above, the lens barrel 19 is formed of a material that is more easily thermally expanded than the support frame 25, while the support frame 25 is made of ceramic with high rigidity and low thermal expansion. Therefore, when the environmental change of temperature rise is received, the flange portion 21 of the lens barrel 19 thermally expands so as to expand mainly in the radial direction of the flange portion 21, but the support frame 25 does not expand as much as the lens barrel 19.

  At this time, in the present embodiment, the first rod whose lower end is fixed to the support frame 25 in the rotation restricting unit 27 (see FIG. 5), which is a place where the flange portion 21 (lens barrel 19) and the support frame 25 are connected. The member 35 is provided with an eccentric bush 36 on its outer periphery without a gap. Further, the eccentric bush 36 is internally fitted in a long hole portion 34 penetratingly formed in the flange portion 21 in contact with each of the circumferential surfaces of the inner circumferential surface thereof. Therefore, the flange portion 21 is a long hole in each member (the first rod member 35, the eccentric bush 36, and the hexagon nut 38) that is completely fixed to the support frame 25 that hardly changes in thermal expansion even when the lens barrel 19 is thermally expanded. It is connected through the unit 34. However, the inner surface of the long hole portion 34 is lubricated, and the longitudinal direction of the long hole portion 34 coincides with the radial direction of the flange portion 21 (lens barrel 19). A predetermined gap S1 (see FIG. 7) with the eccentric bush 36 is formed in the longitudinal direction. For this reason, the lens barrel 19 does not generate any extra internal stress other than a slight frictional force between the outer surface of the eccentric bush 36 and the inner surface of the long hole portion 34 at the time of thermal expansion at a coefficient of thermal expansion unique to the lens barrel 19. .

  That is, the position of the optical axis AX of the lens barrel 19 remains the same, and the lens barrel 19 is allowed to thermally expand in the radial direction of the flange portion 21 without causing distortion or the like on a plane orthogonal to the optical axis AX. If the change at the time of thermal expansion is viewed in plan view, the first rod member 35, the eccentric bush 36, the hexagon nut 38 and the like move in the radial inward direction of the flange portion 21 as the flange portion 21 expands in the radial direction. It looks as if it slides in the long hole portion 34. As described above, in the rotation restricting portion 27, the clearance B1 between the eccentric bush 36 and the long hole portion 34 is restricted while the movement of the lens barrel 19 around the optical axis is restricted by the fitting of the eccentric bush 36 and the long hole portion 34. Due to the fitting relationship, the difference in expansion and contraction between the lens barrel 19 and the support frame 25 is absorbed.

  Further, the outer surface of the hexagon nut 38 is not in contact with the flange portion 21 (the inner surface of the hole 31), and the upper end position of the eccentric bush 36 is slightly higher than the bottom surface of the second round hole portion 33. In the restricting portion 27, displacement of the lens barrel 19 with respect to a direction substantially parallel to the optical axis direction of the lens barrel 19 is allowed during thermal expansion. Therefore, the rotation restricting portion 27 can only suppress the movement of the lens barrel 19 in the circumferential direction, and can suppress the occurrence of unnecessary internal stress in the lens barrel 19.

  On the other hand, in the optical axis direction regulating portion 28 (see FIG. 6), which is a location where the flange portion 21 (lens barrel 19) and the support base 25 are connected, the second rod member 41 is made of, for example, aluminum. As described above, the longitudinal direction of the flange portion 21 is substantially aligned with the direction parallel to the optical axis direction, and the rigidity of the flange portion 21 in the circumferential direction (that is, the bending direction) is weak. Furthermore, since the gap is provided between the hole 42 as described above, when the lens barrel 19 is thermally expanded and a load in the circumferential direction (around the optical axis) of the flange portion 21 is applied, The two-rod member 41 is bent in the circumferential direction of the flange portion 21.

  That is, similar to the operation of the rotation restricting portion 27, the lens barrel 19 is allowed to thermally expand in the radial direction of the flange portion 21 without causing distortion or the like on a plane orthogonal to the optical axis AX. As described above, the optical axis direction restricting portion 28 regulates the movement of the lens barrel 19 in the optical axis direction by the second rod member 41 and the hexagon nut 43 (see FIG. 6), and the rigidity characteristics of the lens barrel 19 and The expansion / contraction difference with the support base 25 is absorbed. If the clearance S between the second rod member 41 and the hole 42 is larger than the movable range of the first rod member 35 in the long hole portion 34, the radius of the lens barrel 19 in the rotation restricting portion 27 is set. The movement in the direction can be effectively utilized also in the optical axis direction regulating unit 28.

  As described above, due to the action of both the rotation restricting portion 27 and the optical axis direction restricting portion 28, it is possible to suppress the internal stress from being generated in the lens barrel 19 due to the expansion / contraction difference between the lens barrel 19 and the support frame 25. The optical characteristics of the projection optical system 15 held inside the lens barrel 19 are not affected.

  Next, an assembly procedure mainly in the rotation restricting portion 27 when the lens barrel 19 is supported on the support frame 25 will be described. First, the lens barrel 19 is placed so that the support portion 26 of the flange portion 21 of the lens barrel 19 is brought into contact with the placement surface 24 of the support frame 25. At this time, a hole 31 (a hole through which the first rod member 35 is inserted) and a hole 42 (a hole through which the second rod member 41 is inserted) formed in the support portion 26 of the flange portion 21 are supported by the support frame 25. The first rod member 35 and the second rod member 41 formed in the above are placed so as to correspond to the positions of screw portions (not shown) for connection. In the optical axis direction restricting portion 28 (see FIG. 6), the second rod member 41 is inserted from the upper surface side of the flange portion 21 and fixed to the support frame 25 by screws, and further the hexagonal shape is formed from the upper surface side of the flange portion 21. The nut 43 is fitted and fixed with a male screw formed on the outer periphery of the second rod member 41.

  On the other hand, in the rotation restricting portion 27 (see FIG. 5), the first rod member 35 is inserted into the hole 31 from the upper surface side of the flange portion 21 and fixed to the support frame 25 by screws, and further from the upper surface side of the flange portion 21. The eccentric bush 36 is fitted to the outer periphery of the first rod member 35. FIG. 7 is an enlarged plan view (partially simplified plan view in FIG. 5) showing a fitting portion between the eccentric bush 36 and the first rod member 35, and FIG. 8 is a plan view of the eccentric bush 36. . Here, as shown in FIG. 8, the through hole 37 through which the first rod member 35 formed in the eccentric bush 36 is inserted has a center C1 slightly shifted from the center C of the eccentric bush 36 as a center. It is formed as. The distance (deviation) from the center C of the eccentric bush 36 to the center C1 of the through hole 37 is defined as an eccentric amount e. In this case, when the eccentric bush 36 is fitted to the outer periphery of the first rod member 35, as shown by a two-dot chain line in FIG. Can be fitted to the first rod member 35.

  Therefore, as shown in FIG. 7, the first rod member 35 is not positioned on the central axis P of the long hole portion 34 during assembly, and an error e1 from the central axis P (the center axis P and the through hole 37 The eccentric bush 36 can be fitted to the outer periphery of the first rod member 35 even when the distance from the center C1 is generated. That is, if the error e1 is equal to or less than the eccentric amount e, the outer shape of the eccentric bush 36 is fitted into the elongated hole portion 34 at any position of the outer periphery 360 degrees of the first rod member 35. The eccentric bush 36 can be attached with the error eliminated.

As described above, the configuration of the present embodiment is easy, and once it is incorporated as a device, subsequent troublesome maintenance is not necessary.
Note that the exposure apparatus 11 shown in FIG. 1 using the lens barrel 19 supported by the lens barrel supporting apparatus configured as described above is manufactured, for example, as follows.

  First, a plurality of optical elements 17 constituting the projection optical system 15 are held by an optical element holding device 18, and the projection optical system 15 accommodated in the lens barrel 19 is passed through the lens barrel support device 22 described in detail above. It is incorporated in the main body of the exposure apparatus 11 and optical adjustment is performed.

Next, a wafer stage 16 (including a reticle stage 14 in the case of a scan type exposure apparatus) made up of a large number of mechanical parts is attached to the main body of the exposure apparatus 11 to connect wiring. After the gas supply pipe for supplying gas is connected to the optical path of the exposure light, the inside of the lens barrel is purged. In this case, N ₂ is filled after thoroughly removing O ₂ and moisture in the lens barrel. Furthermore, comprehensive adjustment (electric adjustment, operation check, etc.) is performed.

  Here, each component constituting the optical element holding device 18 and a sealing member such as an O-ring are processed by ultrasonic cleaning or the like so that impurities such as processing oil and metal substances are dropped and do not become an outgas emission source. Done and assembled. The exposure apparatus 11 is preferably manufactured in a clean room in which the temperature, humidity, and atmospheric pressure are controlled and the cleanness is adjusted.

Next, an embodiment of a device manufacturing method using the above-described exposure apparatus 11 in a lithography process will be described.
FIG. 9 is a flowchart showing a manufacturing example of a device (a semiconductor element such as an IC or LSI, a liquid crystal display element, an image pickup element (CCD or the like), a thin film magnetic head, a micromachine, or the like). As shown in FIG. 9, first, in step S101 (design step), function / performance design (for example, circuit design of a semiconductor device) of a device (micro device) is performed, and pattern design for realizing the function is performed. Do. Subsequently, in step S102 (mask manufacturing step), a mask (such as a reticle Rt) on which the designed circuit pattern is formed is manufactured. On the other hand, in step S103 (substrate manufacturing step), a substrate (wafer W when silicon material is used) is manufactured using a material such as silicon or glass plate.

  Next, in step S104 (substrate processing step), using the mask and substrate prepared in steps S101 to S103, an actual circuit or the like is formed on the substrate by lithography or the like, as will be described later. Next, in step S105 (device assembly step), device assembly is performed using the substrate processed in step S104. Step S105 includes processes such as a dicing process, a bonding process, and a packaging process (chip encapsulation or the like) as necessary.

  Finally, in step S106 (inspection step), inspections such as an operation confirmation test and a durability test of the device manufactured in step S105 are performed. After these steps, the device is completed and shipped.

  FIG. 10 is a diagram showing an example of a detailed flow of step S104 of FIG. 9 in the case of a semiconductor device. In FIG. 10, in step S111 (oxidation step), the surface of the wafer W is oxidized. In step S112 (CVD step), an insulating film is formed on the surface of the wafer W. In step S113 (electrode formation step), an electrode is formed on the wafer W by vapor deposition. In step S114 (ion implantation step), ions are implanted into the wafer W. Each of the above steps S111 to S114 constitutes a pretreatment process at each stage of the wafer processing, and is selected and executed according to a necessary process at each stage.

  At each stage of the wafer process, when the above pre-process is completed, the post-process is executed as follows. In this post-processing process, first, a photosensitive agent is applied to the wafer W in step S115 (resist formation step). Subsequently, in step S116 (exposure step), the circuit pattern of the mask (reticle Rt) is transferred onto the wafer W by the lithography system (exposure apparatus 11) described above. Next, in step S117 (developing step), the exposed wafer W is developed, and in step S118 (etching step), the exposed members other than the portion where the resist remains are removed by etching. In step S119 (resist removal step), the resist that has become unnecessary after the etching is removed.

Multiple circuit patterns are formed on the wafer W by repeatedly performing these pre-processing and post-processing steps.
If the device manufacturing method of the present embodiment described above is used, the exposure apparatus 11 is used in the exposure step (step S116), the resolution can be improved by the exposure light EL of the F ₂ laser, and the exposure amount can be controlled. It can be performed with high accuracy. Therefore, as a result, a highly integrated device having a minimum line width of 0.1 μm can be produced with a high yield.

In the above embodiment, the following effects can be obtained.
(1) In the above embodiment, the longitudinal direction of the long hole portion 34 coincides with the radial direction of the flange portion 21 (lens barrel 19), and a predetermined gap S1 with the eccentric bush 36 in the longitudinal direction in the long hole portion 34. (See FIG. 7). Therefore, the lens barrel 19 is thermally expanded without generating an extra internal stress other than the frictional force between the eccentric bush 36 and the long hole portion 34 at the time of thermal expansion. Therefore, the difference in expansion and contraction between the lens barrel 19 and the support frame 25 can be absorbed, and the optical characteristics of the projection optical system 15 held inside the lens barrel 19 are not affected.

  (2) Further, in the above embodiment, since the inner surface of the long hole portion 34 is lubricated, the lens barrel 19 is easily moved relative to the eccentric bush 36 and can be easily expanded and contracted. A difference in expansion / contraction between the lens barrel 19 and the support frame 25 can be absorbed even better.

  (3) Further, since the eccentric bush 36 is fitted to the long hole portion 34 in the circumferential direction of the flange portion 21 of the long hole portion 34, the circumferential direction of the flange portion 21 of the lens barrel 19 (that is, around the optical axis). (Movement in the rotation direction) can be restricted. At this time, since the long hole portion 34 is formed in the radial direction centering on the optical axis AX, even if the flange portion 21 is thermally expanded, the position of the optical axis AX of the lens barrel 19 is not shifted.

  (4) In the above embodiment, since the hexagon nut 38 does not contact the flange portion 21, the lens barrel 19 does not interfere with the lens barrel 19 when the lens barrel 19 expands and contracts in the radial direction of the flange portion 21. Can expand and contract more smoothly.

  (5) Furthermore, the upper end position of the eccentric bush 36 is slightly higher than the bottom surface of the second round hole 33, and the rotation restricting portion 27 is a direction substantially parallel to the optical axis direction of the lens barrel 19 during thermal expansion. The lens barrel 19 is allowed to be displaced with respect to. Therefore, the rotation restricting portion 27 can only suppress the movement of the lens barrel 19 in the circumferential direction, and can suppress the occurrence of unnecessary internal stress in the lens barrel 19.

  (6) In the said embodiment, the 2nd rod member 41 is arrange | positioned, making the longitudinal direction substantially correspond to the direction parallel to an optical axis direction, and the rigidity with respect to the circumferential direction (namely, bending direction) of the flange part 21. Is getting weaker. Further, since the gap S is provided between the hole 42 and the lens barrel 19 when it thermally expands, the second rod member bends and allows the lens barrel 19 to move in the radial direction, thereby allowing internal stress. Is not generated. Similar to the effect in (1), the expansion / contraction difference between the lens barrel 19 and the support frame 25 can be absorbed.

  (7) Further, the lower end of the second rod member 41 is screwed and fixed to the mounting surface 24 of the support frame 25, and a hexagonal nut 43 is fitted to the head and formed on the outer periphery of the second rod member 41. Since the eccentric bush 36 is restricted from rotating with respect to the first rod member 35 because it is screwed with the male screw, the eccentric bush can be integrated with the first rod member member in the rotation direction.

  (8) In the above embodiment, the through hole 37 through which the first rod member 35 formed in the eccentric bush 36 is inserted is formed eccentric from the center C of the eccentric bush 36. Therefore, even when the first rod member 35 is displaced from the central axis P of the long hole portion 34 and an error occurs during assembly, if the error is equal to or less than the eccentricity e, the outer circumference of the first rod member 35 is 360 degrees. Since the outer shape of the eccentric bush 36 fits inside the elongated hole 34 at any position, the eccentric bush 36 can be fitted to the outer periphery of the first rod member 35.

In addition, you may change the said embodiment as follows.
In the above embodiment, the rotation restricting portion 27 and the optical axis direction restricting portion 28 may not be provided corresponding to the support portion 26 of the flange portion 21. It is good also as a structure provided in positions other than the support part 26 of the flange part 21. FIG.

  In addition, although the rotation restricting portion 27 and the optical axis direction restricting portion 28 are provided at three locations with an equiangular interval in the circumferential direction, they may not be equiangular intervals. Moreover, it is good also as a structure provided in two places or more than four places. Furthermore, you may comprise in the aspect from which the number of installation of the rotation control part 27 and the optical axis direction control part 28 mutually differs.

  In the above embodiment, the inner surface of the long hole portion 34 is lubricated. However, the outer surface of the eccentric bush 36 may be lubricated, and this configuration also has the same effect as the above embodiment. Can be played.

  In the above embodiment, the eccentric bush 36 is provided at a position where the through hole 37 of the first rod member 35 is eccentric, but may be configured as a normal bush that is not eccentric. Even in this case, the effects (1) to (7) can be obtained, and there is no problem if the first rod member is on the central axis P of the long hole portion 34 during assembly.

Further, the exposure apparatus of the present invention is not limited to a reduction exposure type exposure apparatus, and may be, for example, an equal exposure type exposure apparatus or an enlargement exposure type exposure apparatus.
○ Also, from a reticle to a glass substrate, not only for microdevices such as semiconductor elements, but also for manufacturing reticles or masks used in light exposure equipment, EUV exposure equipment, X-ray exposure equipment, electron beam exposure equipment, etc. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern to a silicon wafer or the like. Here, in an exposure apparatus using DUV (deep ultraviolet) or VUV (vacuum ultraviolet) light, a transmission type reticle is generally used. As a reticle substrate, quartz glass, quartz glass doped with fluorine, fluorite, fluoride, and the like are used. Magnesium or quartz is used. In proximity type X-ray exposure apparatuses and electron beam exposure apparatuses, a transmission type mask (stencil mask, membrane mask) is used, and a silicon wafer or the like is used as a mask substrate.

  Further, the exposure apparatus may be an exposure apparatus that uses an immersion method in order to ensure a wide depth of focus. In this immersion method, a space between the lower surface of the projection optical system and the substrate surface is filled with a predetermined liquid (such as water or an organic solvent) to form an immersion region, and the wavelength of exposure light in the liquid is air. The resolution is improved by utilizing 1 / n (n is the refractive index of the liquid, usually about 1.2 to 1.6), and the depth of focus is expanded about n times.

  Of course, the present invention is applied not only to an exposure apparatus used for manufacturing a semiconductor element but also to an exposure apparatus used for manufacturing a display including a liquid crystal display element (LCD) to transfer a device pattern onto a glass plate. can do. The present invention can also be applied to an exposure apparatus used for manufacturing a thin film magnetic head or the like and transferring a device pattern onto a ceramic wafer or the like, and an exposure apparatus used for manufacturing an image pickup device such as a CCD.

  Further, the present invention can be applied to a scanning stepper that transfers a mask pattern to a substrate while the mask and the substrate are relatively moved, and sequentially moves the substrate in steps. The present invention can also be applied to a step-and-repeat stepper in which the mask pattern is transferred to the substrate while the mask and the substrate are stationary, and the substrate is sequentially moved stepwise.

As a light source of the exposure apparatus, in addition to the F ₂ laser (157 nm) described in the above embodiment, an ArF excimer laser (193 nm), for example, g-line (436 nm), i-line (365 nm), KrF excimer laser (248 nm) ), Kr ₂ laser (146 nm), Ar ₂ laser (126 nm), or the like may be used. In addition, a single wavelength laser beam in the infrared region or visible region oscillated from a DFB semiconductor laser or fiber laser is amplified by, for example, a fiber amplifier doped with erbium (or both erbium and ytterbium), and a nonlinear optical crystal is obtained. It is also possible to use harmonics that have been converted into ultraviolet light.

1 is a schematic block diagram showing an embodiment of an exposure apparatus provided with a lens barrel support device of the present embodiment. The schematic perspective view which shows one Embodiment of the lens-barrel support apparatus of this embodiment. The top view of a lens-barrel support apparatus. The bottom view of a lens-barrel. It is AA sectional drawing of FIG. 3, Comprising: The figure which shows the structure of a rotation control part. It is BB sectional drawing of FIG. 3, Comprising: The figure which shows the structure of an optical axis direction control part. The top view which expands and shows the fitting part of an eccentric bush and a 1st rod member. The top view of eccentric bushing. The figure which shows the flowchart of the manufacture example of devices (semiconductor elements, such as IC and LSI, a liquid crystal display element, an image pick-up element (CCD etc.), a thin film magnetic head, a micromachine, etc.). The figure which shows an example of the detailed flow of FIG.9 S104 in the case of a semiconductor device. The top view which shows the conventional lens-barrel support apparatus.

Explanation of symbols

  S, S1 ... Gap, AX ... Optical axis, C ... Center of eccentric bush, C1 ... Center of through-hole 37, e ... Eccentric amount, P ... Center axis, 11 ... Exposure device, 15 ... Projection optical system, 19 ... Mirror Cylinder, 21 ... Flange, 22 ... Lens barrel support device, 23 ... Supported surface, 24 ... Mounting surface (opposing surface), 25 ... Support frame, 26 ... Support, 27 ... Rotation restricting portion, 28 ... Optical axis Direction restricting portion, 31, 42 ... hole, 34 ... long hole portion (long hole), 35 ... first rod member (first displacement restricting member), 36 ... eccentric bush (first displacement restricting member), 37 ... Through hole, 38 ... hexagon nut (bush presser), 41 ... second rod member (second displacement regulating member), 43 ... hexagon nut (regulating member, second displacement regulating member).

Claims (11)

A lens barrel support device for supporting a lens barrel having a flange portion on a support frame via the flange portion,
A plurality of elongated holes provided in the flange portion, penetrating in a direction substantially parallel to the optical axis direction of the barrel, and having a radial direction of the barrel as a longitudinal direction;
The long tube is fitted into each of the long holes, and one end portion is fixed to the support frame, and the displacement of the lens barrel with respect to the circumferential direction of the lens barrel is restricted, and the displacement of the lens barrel with respect to the radial direction of the lens barrel a first displacement-regulating member to permit,
An insertion hole provided in a position different from the plurality of long holes in the flange portion, and penetrating in a direction substantially parallel to the optical axis direction of the lens barrel;
A lens barrel support device comprising: a second displacement regulating member that is inserted into the insertion hole and regulates displacement of the lens barrel in the optical axis direction of the lens barrel . The flange portion is placed on the support frame via a plurality of seats provided on opposing surfaces facing the support frame, and the elongated holes are provided in each of the plurality of seats. The lens barrel support device according to claim 1. The first displacement regulating member is
A first rod member having the one end;
An eccentric bush that is externally fitted to the first rod member without a gap and abuts against each of the circumferential surfaces of the inner circumferential surface of the elongated hole. 3. The lens barrel support device according to 2. The lens barrel support device according to claim 3, further comprising a bush presser that restricts the eccentric bushing from rotating with respect to the first rod member. The lens barrel support device according to claim 4, wherein the bush presser allows displacement of the lens barrel with respect to a direction substantially parallel to the optical axis direction of the lens barrel. The lens barrel support device according to any one of claims 3 to 5, wherein at least one of the inner surface of the elongated hole and the outer surface of the eccentric bush is subjected to a lubrication treatment to reduce friction. The second displacement regulating member is
A second rod member that is inserted into the insertion hole so as not to contact the inner surface thereof, and whose one end is fixed to the flange portion;
A restricting member that is attached to the other end of the second rod member and abuts on the flange, and restricts the flange in a direction substantially parallel to the optical axis of the barrel;
  The lens barrel support device according to any one of claims 1 to 6, further comprising: The said 2nd rod member is comprised so that it may become a rigidity easy to bend in the direction orthogonal to the optical axis of the said lens tube compared with the said 1st rod member. Lens barrel support device. The lens barrel support according to claim 7 or 8, wherein a gap between the insertion hole and the second rod member is larger than a movable range of the first rod member relatively displaced in a longitudinal direction of the long hole. apparatus. The lens barrel according to any one of claims 1 to 9, wherein an exposure apparatus that exposes an image of a predetermined pattern formed on a mask on a substrate under exposure light. An exposure apparatus for transferring onto the substrate via a projection optical system held by a lens barrel mounted by a support device. In a device manufacturing method including a lithography process,
A device manufacturing method, wherein exposure is performed using the exposure apparatus according to claim 10 in the lithography process.

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