TWI232969B - Projection optical system and exposure device - Google Patents

Abstract

A projection optical system (25) for holding an optical element without degrading the precision tolerance includes an upper lens barrel (32), a lateral lens barrel (33), a lower lens barrel (34), a connection body (54), and a flange (55). The upper lens barrel (32), the lateral lens barrel (33), and the lower lens barrel (34) are connected to the connection body (54) without contacting with each other. The connection body (54) is supported by the flange (55), and the flange (55) is supported by a lower mounting base (14).

Description

1232969 Description of the invention: [Technical field to which the invention belongs] The present invention relates to light microscopy in the manufacturing process of devices such as semiconductor elements, liquid crystal display elements, photographic elements, thin film magnetic heads, or mask films such as reticle and photomask An exposure device used in the shadowing step, and a projection optical system provided in the exposure device. [Prior Art] In order to accurately project a conventional pattern image formed on a photomask onto a substrate, the Baizhi projection optical system is a refractive projection optical system mainly composed of a plurality of lenses arranged along the optical axis direction. The so-called refractive optical system is an optical system that does not include a mirror with a magnification (concave or convex) and only includes a transmission optical member such as a lens. These lens systems are held inside the lens barrel. A flange portion is formed on the outer surface of the lens barrel. Therefore, the conventional projection optical system is supported on the stage of the exposure apparatus body through the flange portion of the lens barrel. As the degree of integration of semiconductor elements and the like improves, the resolution (resolution) required for the projection optical system of the exposure device is further increased. As a result, in order to meet the resolution requirements of the projection optical system, it is necessary to shorten the wavelength of the illumination light (exposure light) while increasing the numerical aperture (NA) of the projection optical system. However, Tian Ru and Ming Guang's absorption tends to be significant when the wavelength of the light becomes shorter. Therefore, the types of glass materials (optical materials) that T practically uses are limited. In particular, when the wavelength of the moonlight is below 80nm, the practical glass materials are limited to fluorite. In conclusion, it is difficult to correct the aberrations of the refractive projection optical system. As described above, the refractive projection optical system 1232969 made of a single glass material has a limited allowable aberration, and the laser light source emitting the illumination light must be extremely narrow Frequency. However, if the laser light source is extremely narrowed, the cost and output of the laser light source will inevitably be increased. Therefore, a catadioptric projection optical system having a reflective optical element that does not cause aberration is proposed. In the refracting-type optical system, as a reflecting optical element, an optical path zigzag mirror and a concave mirror are provided. The optical path zigzag mirror deflects the light for exposure through the circuit pattern on the reticle. Exposure light deflected by the optical path zigzag mirror. In the conventional refracting-type projection optical system, the lens barrel has at least a part of a barrel (vertical barrel) whose optical axis extends in a vertical direction, and a second part of a barrel (horizontal optical axis extending horizontally). Lens barrel). If the horizontal lens barrel is simply mounted on one side of the vertical lens barrel, there is a possibility that a partial load may be applied to the vertical lens barrel due to the weight of the horizontal lens barrel. An eccentric load will cause the vertical lens barrel to skew. When the vertical lens barrel is skewed, the surface accuracy of the optical elements stored in the vertical lens barrel deteriorates, and there is a possibility that unpredictable aberrations occur in the projection optical system. The occurrence of this unpredictable aberration causes deterioration in exposure accuracy. It is also possible to reduce the weight of the horizontal lens barrel by supporting the horizontal lens barrel on the stand of the exposure device, or to set up another support device that supports the horizontal lens barrel: the effect of the vertical lens barrel. This method requires the horizontal lens barrel to be operated in a vertical position relative to the vertical lens barrel, and will cause a new problem of large-sized exposure devices. [Summary of the Invention] The invention is a technology proposed focusing on the problems of the conventional technology, and aims to provide a projection optical system that does not deteriorate the surface accuracy of the optical element and can maintain the optical element. In addition, the present invention provides a 1232969 exposure device. In addition, another object of the present invention is to provide a method for manufacturing a device capable of exposing the exposure accuracy. According to one aspect of the present invention, a projection optical system is provided which is supported by Tai Ping and projects a shape pattern image on a predetermined surface. , No. and Bao: Structure: Keep the configuration at No.! At least one second holding member on the optical axis: / 2 holding member, which holds at least one second optical element disposed on the optical axis that intersects the i-th optical axis. The connection member includes an i-th connection portion connected to the first holding member and a second connection portion connected to the second holding member. Projection light ^ 彳 ',, the component «in the platform fashion structure :: includes the first holding member used to connect the coupling to the first connection portion, preferably not to contact the second connection portion The second holding member connected.

# 在 此 第! The connecting part is connected to the U-holding member—the younger 2 connecting part is connected to one end of the second holding member # A = and the second holding member is connected to the connecting member = The anterior axis of the second optical element ^^ held by the first light holding member and the second security direction. The optical axis of each piece is preferably oriented differently. In one embodiment, the safety member and the connecting member are integrally formed. The projection optical system of the embodiment further includes: holding: a member is provided through the connecting member, and is disposed in the first or the first member. On the axis parallel to the optical axis, or on the third axis, at least one third optical element, and the third holding member, the connecting structure 1232969 has the first holding member connected to the third holding member. It is better not to be in contact with the 2 'and the 2nd. The third link. Holding member and the third holding member 3 Holding member and the third connecting portion In one embodiment, the Anmenggei female clothing member is provided on the third holding member, and the remote connecting member is supported on the third holding member. In an embodiment, the first holding member includes a small holding frame for holding the at least one first optical element, and the second holding member holds and holds the at least one second optical element. Separate & preform and at least one retaining frame of concave mirror. In an embodiment, the at least _ ^ 1 optical element system constitutes a first imaging optical system, the at least one / figchu1 ^ 2 optical element and the concave mirror system constitute a second imaging Optical system. The holding frame of the first holding member is preferably the same holding material. A projection optical system according to an embodiment of the present invention includes a first imaging optical system including the at least one flute! The plurality of t ^ first optical elements form a plurality of intermediate optical elements of the pattern, and the tt A ^ τ image, the first optical path zigzag mirror, is arranged near the formation position of the first intermediate image. Deflecting the light beam toward the fi intermediate image or the light beam from the β first intermediate image; 帛 2 imaging optical system, which includes the at least one f 2 optical ㈣ and a concave mirror, using a light beam from the / first intermediate image, The second intermediate image is formed on the second! Near the opening / forming position of the intermediate image, the f 2 optical path zigzag mirror is arranged near the formation position of the second intermediate image, and the light beam directed toward the second intermediate image or the light beam from the 1232969 second intermediate image is deflected; And the third imaging optical system, the package: the plurality of optical elements of the at least one 3% optical element, using the light beam from the second intermediate image to form a reduced image of the pattern on the substrate. / In the embodiment, the first holding member includes a plurality of holding frames for holding a plurality of optical elements containing the at least one first optical element, and the second holding member includes a plurality of holding frames for use in The first optical path inflection mirror, the at least one second optical element, the concave mirror, and the second optical path inflection mirror are held; the third holding member includes a plurality of holding frames for holding the at least one 帛3% of the number of optical elements. The connecting member is preferably an optical element replacement mechanism, which is held in at least one of the first, second, and third holding members for replacing at least one optical element contained in the connecting member. In a herringbone shape, the second optical element includes a reflective optical element, and the reflective optical element has a first optical path inflection mirror and a second optical path inflection mirror, and the first optical path inflection mirror is from the i-th middle The light beam of the image or the light beam toward the first intermediate image is deflected, and the second optical path zigzag mirror is used to deflect the light beam from the second intermediate image or the light beam toward the second intermediate image. At least a part of the optical element is formed, and the second intermediate image is formed by the second optical element based on the fi intermediate image; the optical element replacement mechanism is used to replace the reflective optical element. The connecting member is preferably made of a ceramic material. It is preferable that at least one of the first, second, and third holding members and the pedestal is formed of a line of two materials made of a material having a coefficient of linear expansion different from that of the material constituting the connecting member 1232969. The expansion coefficient difference is greater than a predetermined value, and the first, second, and third holding members, at least one of the stands, and the connecting member are connected by a flexible mechanism. The above-mentioned projection optical system is provided in an exposure device. This exposure device is used in a lithography process in which a pattern image formed on a photomask is exposed on a substrate to manufacture a component. [Embodiment] Hereinafter, a projection optical system and an exposure apparatus according to a first embodiment of the present invention will be described. As shown in Fig. 1, the projection optical system 25 of the first embodiment is a reflection type and is provided on a so-called step-scan type scanning projection exposure apparatus i i. In Fig. 1, the X axis is perpendicular to the paper surface of Fig. 1, the z axis is parallel to the first optical axis AX of the projection optical system 25, and the γ axis is parallel to the paper surface of the i image and perpendicular to the first optical axis AX. The exposure device 11 includes, for example, a laser (oscillation center wavelength, 157.624 nm) as a light source for supplying an exposure light EL having a vacuum ultraviolet wavelength. The exposure light el emitted from the light source 21 passes through the illumination optical system 22 and uniformly irradiates the reticle R, which is a photomask formed with a predetermined circuit pattern. A light beam matching unit (BMU) is provided between the light source 21 and the illumination optical system 22. The light source 21 and the exposure device main body 12 are optically connected by the BMU 23. The exposure light emitted from the light source 21 is guided to the exposure device 12 through the BMU 23. The space from the light source 21 to the optical element closest to the reticle R side in the illumination optical system 22 is 10 1232969. It is replaced with a gas having a low absorptivity of the exposure light EL, for example, helium-krypton gas, or maintained in a vacuum. status. x 3 nitrogen and other inert exposure device body 12, including upper stage 1

The lower platform lifts M and the platform 13 supporting the platforms 14,15. The reticle is mounted on the stage 15 and the reticle 15, and the reticle R is maintained on the reticle 2: two above: and flat. Form the to-be-transferred on the reticle R: slightly): The pattern area is sequentially illuminated by a rectangular exposure light EL with a long side in the X direction and Θ "', and a short direction in the child / mouth direction. The line sheet σ 24 can move two-dimensionally along the line (or “^ plane”) along the marked line by a driving system (not shown). The position (coordinates) of the radiographic stage 24 is measured with an interferometer. The light that has passed through the reticle R passes through the projection optical system and is then invested in the wafer% coated with a photosensitive material as a substrate, and the pattern image formed on the rod = r is formed on the crystal i] W ±. The wafer w is held on the wafer 26 through the wafer holding and (not shown) by the platform 13 arranged on the exposure device main body 12 and is held in a rectangular irradiation area on the wafer w. On the other hand, a pattern image is formed in a rectangular region having long sides in the X direction and short sides in the Y direction. The wafer carrier 26 can be quasi-moved along the wafer surface (that is, the χγ plane) by a driving system (not shown). The position (coordinates) of the wafer stage 26 is measured with an interferometer (not shown). As shown in FIG. 2, in the projection optical system 25, the cover glass 27 as the third optical element is disposed closest to the non-linear sheet R, and the third optical element is disposed as the third optical element closest to the W side. The inner space of the cover glass 28 of the element is kept in an airtight state. It is preferable that the inner sigma chamber of the projection optical system 1232969 5 can be replaced with an inert gas such as helium or nitrogen or can be maintained in a vacuum state. The reticle R and the reticle stage 24 are disposed between the illumination optical system 22 and the projection optical system 25 and are surrounded by a sealed housing (not shown). The inner space of the enclosure is filled with an inert gas such as helium or nitrogen, or is kept substantially in a vacuum state. △ The wafer W and the wafer stage 26 are arranged between the projection optical system 25 and the stage 13 and are surrounded by another sealed case (not shown). The inner space of the enclosure is filled with an inert gas such as helium or nitrogen, or is kept substantially vacuum. In this way, as described above, the ambient atmosphere that receives the exposure light EL in the optical path from the light source 21 to the wafer W is as described above, and the exposure area on the reticle r defined by the illumination optical system 22 and the exposure area on the crystal BW are Rectangle with short sides in the γ direction. Therefore, use ★ 玄 纸 私 会

Fen said. Use the drive system and the interferometer to control the position of the reticle R and the Japanese yen W. The short side of the s-stop, + -shaped exposure area and the irradiation area ', that is, move the dance green in the Y direction. # 线 片… Η: and wafer stage 26 to synchronize the target, wafer R, and wafer W; Shiri &gt; move (scan) in the same direction, and on the wafer w, expose the reticle pattern to the ancient h ^, N ^ have an area that is equal to the width of the long side of the exposed area and has a length corresponding to the scan amount of wafer w (ri <ri). The human projection optical system 25 will be described. As shown in Fig. 1 and Fig. 2 as the center, there are as follows: == series: 25 series with a structured lens barrel) 32, as a second holding, and :: 1 lens barrel module (top Brother 2 mirror group (horizontal lens barrel) 33 1232969 and 3rd lens barrel module (lower lens barrel) 34 made as a holding member of the 3rd projection optical system (CaF, crystal) 34. All refractive optical elements of 25 (Lens) is a fluorite tube 32, which is attached to the projection optical system.

F, x. ^ 0... ~ Mouth v shows that the first pregnancy is from AX = on the side closest to the reticle. The upper lens barrel 32 has a slightly cylindrical shape and a refracting light system 35 that holds the second image of the pattern of the reticle R. The imaging optical system 35 has a plurality of jealousies: 70. The upper lens barrel 32 'system It is formed by laminating a plurality of (the first holding frame 37u in the present embodiment (a lens or a plurality of lenses 36a and cover glass 27 as the "first ... cows") and holding them together. Each holding frame 37u is, for example, made of It is not made of metal materials such as steel and titanium alloy. In the plurality of holding frames 37u, the holding portion located on the side far from the reticle R (that is, the lower end of the upper mirror M 32) is only 37uw. A holding frame 37u has a small outer end portion 32a. The end portion 32a is inserted into the connection member ^, and the upper lens barrel 32 is connected to the connection member 3. A recess (cutout portion) is provided in a part of the end portion 32a. 32b to prevent the horizontal lens barrel 33 and the upper lens barrel 32 connected to the connecting member 干涉 from interfering with each other. The horizontal lens barrel 33 holds a second imaging optical system 39 for forming a second intermediate image. The horizontal lens barrel 33 is arranged so The two axes (the second optical axis AX,) of the second imaging optical system 39 are orthogonal to the first optical axis Ax. The second imaging The academic system 39 includes a right-angle mirror 44 as a reflecting optical element described later, a negative lens 40 as a second optical element, and a concave mirror 41. The negative lens 40 and the concave mirror 41 are arranged vertically so that the first 2 optical axis Αχ, 13 1232969 faces the horizontal direction. The right-angle mirror 44 includes the first optical path inflection mirror 38 and the second optical path inflection mirror 42. The horizontal lens barrel 33 holds the right-angle mirror 44 and the negative lens. 40 and a plurality of holding frames 37b, 37c of the concave mirror 41 are connected and formed. A first optical path inflection mirror 38 is disposed near the intermediate image of 帛 i formed by the first imaging optical system 35. The first optical path is The exposure light EL deflected by the zigzag mirror 38 is guided to the concave mirror 41 through the negative lens 4 (), and then reflected by the concave mirror 41. The exposure light reflected by the concave mirror 41 passes through the negative lens 40 again, In the vicinity of the formation position of the first! Intermediate image, in the present embodiment, it is near the 帛 2 optical path zigzag mirror 42 to form the second intermediate image. The second intermediate image is approximately equal to the i-th intermediate image, which is the second of the pattern. Secondary image: P 2 optical path zigzag mirror 42 series In the vicinity of the second intermediate image formed by the second imaging optical system 39, the exposure light EL toward the second intermediate image or the exposure &amp; el from the second intermediate image is biased toward the refractive third imaging system 43. Right angle The reflecting mirror material is formed of a base material made of metal scrap (stainless steel, etc.), low thermal expansion ceramics (such as carbon cutting, etc.), etc. The right-angle reflecting mirror 44 has two inclined planes orthogonal to each other, and a known zigzag mirror is formed on one inclined plane. The reflecting surface of 38 forms the 另 2 optical path zigzag mirror々 reflecting surface on the other-slope. When the base material is made of carbide, it is shaped after the carbonization second flows into the mold to form a right-angle mirror 44. The reflection surfaces of the first optical path meandering mirror 38 and the second optical path meandering mirror 42 are metal reflecting surfaces. Metal reflective surfaces, such as CVD, are used to coat Si and other materials suitable for grinding on the slope of the base material. 14 1232969 Metal film (Aluminum film, also gold 45, 46, etc.) The inclined surfaces 45, 46 are subjected to mirror polishing, etc.) or a fluoride film is coated on the mirror-polished surface to form a metal film to form an I compound film. The coating of the material used to provide the mirror surface is not limited to the inclined surfaces 45, 46 of the base material 1, so that all surfaces of the base material, such as the support feet 44a of the right-angle mirror 44 described later, are also coated. In this way, by coating the entire surface of the base material, it is possible to reduce the volatilization of light-absorbing substances (oxygen, water vapor, organic substances, etc. that absorb light used for exposure) from the base material. Also, when coating the reflective surface and other parts of the basin, the reflective surface must be mirror-finished, so it is best to

The other part of the car b is thick. In addition, the ancient # r £ L · J-4- ΛΑ L, in terms of the processing accuracy of the base material, is within 5 seconds of soil with a right angle of the two reflecting surfaces 1 and the accuracy is within 3.5 to 7 / 10000rms. The reflecting surface of the X 'concave φ mirror 41 can also be a metal reflecting surface like the right-angle mirror 44. In addition to the accuracy of the right angle, other processing is preferably performed like the right-angle mirror 44. The two inclined surfaces 45 and 46 of the right-angle mirror 44 are optically separated. Therefore, the light beam from the first imaging optical system 35 will not enter the second light: the tortuous mirror 42 and the light beam from the second imaging optical system 39 will not enter the first optical path tortuous mirror 38. The horizontal lens barrel 33 includes a first holding frame 37a holding a concave mirror 41, a second holding frame 37b holding a negative lens 40, and a third holding frame 37c holding a right-angle mirror. The first holding frame 37a holding the concave mirror 41 is cylindrical with a bottom. The first holding frame 37a, the second holding frame 37b, and the third holding frame 37c are connected to each other by a knife. That is, the inside end portion of the first holding frame 37a is connected to the outside end portion of the 15th 1232969 = ⑽37b, and the inside end portion of the 帛 2 holding frame m is connected to the outside 鳊 portion. Furthermore, the second holding frame = the inner end portion 33 a is connected to the connecting member 31. The outer shape of the second cymbal is smaller than the outer diameter of the outer end. A connecting member η αι is inserted into the inner end portion 33 a and connected to the connecting member. . The inner end portion 33a has a function as an end portion of the second holding member ::: the third holding frame 37 as shown in the figure. The system is formed as a bottom quadrangular columnar right-angle mirror 44 held at the bottom M of the third holding frame 37, and formed into two inclined surfaces 45 46 of the right-angle mirror 44 in the state #f a. In addition, right-angle mirrors: 4, ’4, support is formed at a position away from the two reflecting surfaces! 1443, through the support frame ... is held on the third holding frame 37c. Shi Erdi 3 holds the bottom 48 of the frame 37c, and a guide 49 is formed as a part of the optical element replacement mechanism. The gear g can be reflected by the supporting feet 44a, 44a of the mirror 44 at a right angle to the guide rail. The ridge lines of the corner mirror 44 are parallel to each other. The side wall of the third holding frame 37c on the extension line of the guide rail 49 is provided with an opening (not shown). Through this opening, the right-angle mirror 44 ^ can be inserted into the connecting body 54 from the third holding frame 37C. State 'So the connecting body 5 4 is also shaped like a red umbrella with-^ 烕 as a part of the prior 7 ^ replacement mechanism of the mirror replacement opening 67 (see below for details). An opening portion 50a is formed on the side wall 51a 'of the third holding frame 37c of the reflecting surface of the first optical path meandering mirror 38 of the right-angle mirror 44. The size of the mouth portion and the operation is passed through The exposure light EL from the first imaging optical system 35 is incident on the mu body and the first light path zigzag mirror of the right-angle mirror 44 38 16 1232969 = When the reflecting surface, the EL for exposure * EL does not occur. Gloomy. " An opening 50b is formed on the side wall of the third holding frame 37c facing the reflecting surface of the j-th optical path meandering mirror 42. The size of this opening part 50b is at the second optical path meandering mirror of the right-angle mirror 44. When the exposure light reflected by the reflecting surface of 42 is deflected toward the 2 3 imaging optical system 43, 'the exposure light does not cause darkening. ^ 3 The side wall 51a of the holding frame 37c is provided to shield the imaging light beam from the first stage, and the first 35 shots are not transmitted through the first! The optical path zigzag mirror 38 t functions as a shielding plate for the scattered light of the system- and second optical path zigzag mirror 42 which directly enters the third imaging image optical system 43. The lower lens barrel 34 is arranged on the i-th optical axis 1 of the projection optical system 25. That is, the lower lens barrel 34 is closer to the wafer% side on the same optical axis as the upper lens barrel 32. The third tube 34 is substantially cylindrical, and is used to form a reduced image (second intermediate = 3, final image) of the pattern of the reticle R based on the light beam from the silly gate image of the image. The third imaging light φ, the third imaging optical system 43 has a plurality of refractive optical elements under the frame 3 ;: the mirror is laminated with a plurality of M-series (four in this embodiment). . Spoon lens 36b and cover glass 28 and hold it

The retaining frame 371r, which is arranged on the upper end of the lower lens barrel 34 and on the earth side of Yehangshi, is placed near the standing portion 3 4 a of the reticle R, and has a smaller outer diameter than the lower adjacent frame with the μ holding frame 371. # ^ 1 乂 下 钱 请 34 的 保 保 保 的 直】。 A connection member 31 is inserted into the end portion 3 粍, and is connected to the continuous material 31. Here's another thing—the function of the tip. At one end 34a part of the concave portion provided 171,232,969 (d 4b_ Free ⑽ material source μ interfere with each other. Secluded J1, Yu Shu Bian barrel Next, the connecting member 3 J. FIG. 2 as the third FIG. As shown in the figure, the tube ... the horizontal lens barrel 33 and the lower mirror BJ member 31 include a connecting body 54 that connects the upper mirror and the connecting body 54, and is used as a mounting member for the garment under the main body 12 of the exposure device. Flange 55. It is made of ceramics such as silicon made of Miao wood 14. &amp; and flange 55 is, for example, carbonized. Fig. 4 shows the upper surface of the connecting portion 31 along Fig. 4-4. The cross-sectional view of the tube 32 is shown in Figs. 3 and 4. The connecting body 54 is substantially octagonal. As shown in Figs. 2 and 3, the hall is not formed on the connecting body 54 to form a lens barrel. The end portion 32a of 32 is inserted as the first connecting portion. At the connecting portion, a lens barrel 3 = ^ is formed as the third connecting portion of the lower lens barrel mounting recess 57. Upper _ mounting recess 56 and lower 及衿 6 Zhuangkou 丨 The mirror two steam 32 and the lower part 57 are formed so that the upper mirror 32 and the lower lens barrel 34 are arranged on one side of the upper optical axis ^ to form The flute body 54 u ^ T is inserted into the lens barrel 33 and inserted into the third holding frame 37c and the inside end of the second holding frame 37b. The horizontal lens barrel mounting hole μ is formed on the outer peripheral side of the connecting body 54 and is fixed to A plurality of (three in this embodiment) fixing portions 5 of the flange 55. A concave portion and a lower barrel are installed to separate the upper lens barrel, and a partition wall 59 containing the concave portion 57 is formed to mount the horizontal lens barrel. The continuous cutout portion 60 of the hole 58. The third holding frame of the horizontal lens barrel 33 is housed in the cutout portion 60. 18 1232969 The upper mirror Jing 3 2 is connected to the upper mirror south mounting recess 5 6 and the horizontal mirror barrel 33 is connected to The horizontal lens barrel mounting hole 58 is fixed to the coupling body 54 with bolts 61. One surface (upper surface) of the fixing portion 54b of the coupling body 54 and the flange 55 is fixed by the bolt 62, so that the coupling body 54 and the flange 55 are integrated. The edge 55 has a shape larger than the outside diameter of the connecting body 54 in a plane orthogonal to the first optical axis AX, and has an opening portion 63 that can be inserted into the lower lens barrel 34. The opening portion 63 is formed on the flange 55 is a substantially central portion. The lower lens barrel 34 is an opening 63 inserted into the flange 55, and is formed in a holding frame 371 of the lower lens barrel 34. The bolt mounting portion 65 is fixed to the other side (lower side) of the flange 55 by a bolt 64. The upper lens barrel 32, the lateral lens barrel 33, and the lower lens barrel 34 are connected to the connecting body 51 of the connecting member 31 in the manner described above. The upper lens barrel 32 and the transverse lens barrel 33 are fixed to the coupling body 54 and the lower lens barrel 34 is fixed to the flange 55. The lens barrels 32 to 34 are not in contact with each other. The flange 55 is disposed through a predetermined interval. A plurality of (for example, three) gaskets having a predetermined thickness are placed on the lower stage 14 of the exposure apparatus body 12. In addition, when the exposure light EL is irradiated to the lenses 36a '36b and the cover glasses 27, 28' of the projection optical system 25, the lenses 36a, 36b and the cover glasses 27, 28 may generate heat. The heat of the lenses 36a, 36b and the cover glass 27, 28 is transmitted to the connecting body 54 and the convex through the holding frames 3 ^, 3 &amp; W, 3 7a, 3 7b, 3 71r, 3 71 constituting the lens barrels 32 to 34.缘 55。 Edge 55. In the present embodiment, the lens barrels 32 to 34 are made of a metal material, and the connecting body 54 and the flange 55 are made of ceramics. Therefore, the linear expansion coefficient of the upper lens barrel% 19 1232969 and the coupling body 54 is different, and the amount of thermal deformation may be different. In addition, the linear expansion coefficient of the horizontal lens barrel 33 and the coupling body 54 are different, and the amount of thermal deformation is different. Furthermore, the coefficients of linear expansion of the lower lens barrel 34 and the flange 55 are different, and there is a difference in the amount of thermal deformation. Therefore, as shown in FIGS. 4 and 5, a plurality of (three in this embodiment) screw inspections are formed on the peripheral surface of the riding frame 37 at the upper frame 32 at equal angular intervals. Mounting section 65. In the bolt mounting portion 65, a pair of slits M having a substantially ω shape are formed around a screw hole (not shown) formed in the center. By—quilting 66 forms a flexible structure. With this pull structure, it is allowed to be inserted: the screw holes of the bolt mounting portion 65 and the screw holes of the coupling body 54%: "upper bolt mounting portion 65 of the holding frame 37uw of the lens barrel 32, two lens barrels 32 Straight to obtain a small relative movement in the 仏 direction in σ. By this relative movement, the upper lens barrel 3 9 is absorbed; the difference between the thermal deformation in the diameter direction and the thermal deformation of the connecting body. The second holding frame ⑽ outer perimeter 34 of the holding frame 371r々k 田 rr々 is also formed on the peripheral surface of the mirror, and bolt holes 65 are formed on the peripheral surface of the upper lens barrel 32, and the screw holes of the lingering portion 65 are the same. , Screwed to, sloping valley. Inserting bolts at noon ”is screwed into the screw holes of the connecting body 54 (refer to bolt 61, 3 picture with the horizontal lens barrel 33 V) 3, the bolts of the holding frame 3 7b are installed_ Along the 33-diameter square of the horizontal lens barrel &amp; he 4 Wen Yi Lin 35, ^ + moves to a slight relative. And by this phase &amp; movement, to absorb the difference in the relative displacement and deformation of the horizontal lens barrel 33 kg. Thermal deformation in the direction, and heat between the connection body 54 In addition, the screw of the screw hole (figure omitted) of the screw hole 5 5 of the bolt mounting portion &amp; is allowed to pass through the flange η h and the lower lens barrel 34 Hold 桓 37 20 1232969 screw = L65, and move relatively slightly along the diameter of the lower lens barrel 34. Due to this relative movement, the difference between the thermal deformation in the diameter direction of the lower mirror pan 34 and the thermal deformation in the flange 55 is absorbed. 々: 81 mirrors 67 are formed on the connecting body 54 corresponding to the right-angle mirror 44 in the long-side direction & one of the sides of the mirror 44 to form a mirror replacement opening 67 that is continuous to the guide 49 of the third holding frame 7 of the lateral lens barrel 33, This opening π is used as part of an optical element replacement device that allows the right angle reflection 44 to pass. The mirror replacement opening π 67 is sealed with a plug 68 to ensure the airtightness in the projection optical system 25. On the other hand, at the 44th Temple where the right-angle reflector needs to be replaced, the plug 68 is removed, and the right-angle reflector 44 along the guide rail 49 is used to replace the right-angle reflector with the opening 67 for mirror replacement. According to the embodiment of the first embodiment, the following advantages can be obtained. (a) In the projection optical system 25, the upper lens barrel 32 for supporting the first imaging optical system 5 arranged on the first optical axis Ax is connected to the lens barrel mounting recess 56 on the upper portion of the coupling body 54. The lower lens barrel 34 for holding the third imaging optical system 43 disposed on the first optical axis AX is connected to the lower lens barrel mounting recess 57 of the lower portion of the coupling body 54. The horizontal lens barrel 33 for holding the second imaging optical system 39 disposed on the second optical axis AX 'is connected to the horizontal lens barrel mounting hole 58 of the coupling body 54. The lens barrels 32 to 34 are held on the lower stage 14 of the exposure device 12 through the connecting body 54 and the flange 55. Therefore, the upper lens barrel 32 and the horizontal lens barrel 33 having optical axes orthogonal to each other are connected to the connecting body 54 independently of each other. The lower lens barrel 34 and the horizontal lens barrel 33 'having optical axes orthogonal to each other are connected to the connecting body 54 independently of each other. In addition, the lens barrels 32 to 34 are supported by the lower stage 14 independently of each other through the connecting body 54 and the flange 55. Thereby, the weight of the other lens barrels does not act on the lens barrels 32 to 34 between the lens barrels 3 to 34, and it is possible to suppress the distortion caused by the eccentric load in each of the lens barrels 32 to 34. Therefore, the surface conditions of the cover glass 27, 28, the lenses 36a, 36b, the i-th and second optical path inflection mirrors 38, 42, the negative lens 40, and the concave mirror 41 in the lens barrels 32 to 34 can be well maintained. The connecting member 31 has a simple structure including a connecting body 54 and a flange 55. By providing the connecting member 31, the lens barrels 32 to 34 can maintain the cover glass 27, 28, the lenses 36a, 36b, the first and second optical paths of the imaging optical systems 35, 39, 43 without deteriorating the surface accuracy. The meandering mirrors 38 and 42, the negative lens 40 and the concave mirror 41. Therefore, the imaging performance of the projection optical system 25 can be improved, and the exposure accuracy can be improved. In addition, since the structure of the connecting member 31 is simple, by mounting the connecting member 31 on the projection optical system 25, the weight of the projection optical system is not greatly increased, and even if the projection optical system 25 is increased in size and weight, Can still be suppressed to a very small extent. The exposure device body 12 does not need to increase the size of the lower stage 14 of the exposure device body 12 in order to directly support the horizontal lens barrel 33, or a support device for supporting the horizontal lens barrel 33 is required. Therefore, the size of the exposure apparatus main body 12 can also be suppressed. By placing on the first optical axis AX! The imaging optical system M and the third imaging optical system 43 are divided into upper lens barrels 32 and lower lens barrels 34 and held respectively, and the lengths of the respective lens barrels 32 and 34 can be shortened. Since the distance from the support points of the mirrors 32 and 34 to the front end is shortened, the vibration of the projection optical system 25 can be further reduced, and the resolution of the projection optical system can be further improved. (b) The projection optical system 25 includes a refractive first imaging optical system 35 and a third imaging optical system 43 and a second imaging optical system 39 including a concave mirror 41 between the two imaging optical systems 35 and 43. That is, each of the imaging optical systems 35, 43, 39 of the projection optical system 25 has an imaging point. Therefore, the aberration state can be adjusted in each of the imaging optical systems 35, 43, 39. In addition, since the first and third imaging optical systems 35 and 43 do not include reflective optical elements such as the concave mirror 41, the lenses 36a, 36b and the cover held by the upper lens barrel 32 and the lower lens barrel 34 can be covered. The alignment directions of the difference glasses 27 and 28 are the same. Therefore, the structures of the upper lens barrel 32 and the lower lens barrel 34 can be simplified. (In the cH optical system 25, the connecting body 54 is connected to the upper adjacent lens barrel 32 in a state where the end portion 32a of the upper lens barrel 32 is inserted into the upper lens barrel mounting recess%, and to the inner end of the horizontal lens barrel 33. The part 33 &amp; is inserted into the lens barrel mounting hole 58 from a direction different from that of the upper lens barrel 32 and is connected to the horizontal lens tube μ. Therefore, the upper mirror and the horizontal lens tube can be borrowed from two directions by 'boring @ 单 结构' 33 is connected to the coupling body 54. Furthermore, by inserting the inner end portion 33a of the transverse mirror M 33 into the transverse lens barrel mounting hole 58 of the coupling body 54, the transverse lens barrel 33 can be easily aligned with the upper lens barrel 32 &amp; The lower lens barrel ㈣ is positioned. ⑷ In the projection optical system 25, the upper lens barrel 32 has a combination of three or more optical elements (covering glass 27, lens ⑽ and holding frames 37U, 37uw ... transverse lens barrel 33 It has a holding frame that combines one or two or more optical elements # (i and second optical path zigzag mirrors cut from 42, negative lens, and concave mirror 41) ^ ~ W. Jin-cattle 23 1232969, The lower mirror 34 has a combination of one or more optical elements (lens 36b, cover glass 28) and The holding frames 371r, 37b are held in each of the lens barrels 32 to 34, and the relative positions of the optical elements are finely and precisely adjusted. With A, higher-precision aberration adjustment can be performed, and 4 high projection optics Resolution of the system 25. 乂 raft shadow optics, ，, identification, and connection 54 and right guide 49 and mirror replacement opening σ 67, which are used to replace the state maintained in the horizontal lens barrel 33 The right-angle reflecting mirror material accommodated in the connecting body M .. The connection is made of a material with extremely high rigidity ... 4, and a mirror replacement opening P for replacing the right-angle reflecting mirror 44 is formed. The question of "Ingu Valley is on the shovel tube" is also asked. Therefore, it is possible to maintain and maintain the optical elements of "32 ~ 34 (covering« 27, 28, lenses 36a, 36b, i and second optical lenses called The surface accuracy of the / 5 heart mirrors 38, 42, the negative lens 40, and the concave mirror 41). Also, maintenance of the system 25.-Easy-to-order projection optical system, projection optical system and 鼾 浐 ^ you can Installation of right angles by way of exchange: Don't make the emission wavelength pole _: = ': formed by right angle reflection 44 is the reflection path of the optical path zigzag mirror M. In order to maintain the reflection performance, it is best to not be separated from the regular period ~ two = change * Therefore, 'this projection optical system h is particularly suitable for making moon' ,;: And the empty ultraviolet rays are used as the exposure device for exposure. 54 and the optical system 25, the connection 'supporting the lens barrels 3 ... 4' f =: 55 is composed of ceramics. Therefore, while "and the flange 55 is highly rigid, borrow The connection body 54 and the flange 5 ”24 1232969 are provided to suppress the weight increase of the entire projection optical system. Here, especially when a silicon carbide having excellent thermal conductivity among ceramic materials is used, it can pass through the lens barrel 32 to 34, and the connection The body 54 and the flange 55 quickly dissipate the heat generated by the exposure light el to the lower stage I # of the exposure apparatus body 12. In this way, the optical elements (covering the glass 27, 28, the lenses 36a, 36b, the first and second optical path inflection mirror%, 42, the negative lens 40, and the concave mirror 41) under the exposure light EL can be kept well. Surface status. (h) In the projection optical system 25, the lens barrels 32 to 34 are made of a metal material, and the coupling body 54 and the flange 55 are made of a ceramic material having a linear expansion coefficient different from that of the lens barrels 32 to 34. A flexible mechanism including a pair of slits 66 is formed in the bolt mounting portion 65 of each of the lens barrels 32 to 34. Therefore, the deformation of the bolt mounting portion 65 can absorb the thermal deformation of each of the lens barrels 32 to 34 accompanying the exposure of the exposure light EL. Therefore, the optical elements (cover glass, 28 lenses 36a, 36b, 1st and 2nd optical path tortuosity mirrors 38, 42, negative, and negative) of the lens barrels 32 to 34 with good positive tilt can be suppressed. The surface state of the lens 40 and the concave mirror 41). In the ⑴-projection optical system 25, the connecting body 54 and the flange 55 are formed separately. Therefore, by forming the side surface on the opposite side of the lateral lens barrel mounting hole 58 of the coupling body 54 to form a planar shape, the lateral lens barrel 33 can be coupled to the coupling body 54 and the lateral lens barrel 33 can be temporarily arranged as the second optical axis Aχ. , Standing upright. Then, the second imaging optical system 39 held in the horizontal lens barrel 33 is adjusted in a state where the horizontal lens barrel 33 is erected, so that the adjustment can be easily performed. ⑴ In the projection optical system 25, the holding frames 37u 25 1232969 37uw, 37a to 37c, 371i: 5 371 of the lens barrels 32 to 34 are made of the same material in one lens barrel 32 to 34. Therefore, it is possible to suppress the difference in thermal deformation of each of the holding frames 37u, 37uw, 37a to 37c, 371r, 3 71 during the irradiation of the exposure light EL within each of the quotients 32 to 34. Therefore, the surfaces of the optical elements (the cover glass 27, 28, the lenses 36a, 36b, the first and second optical path inflection mirrors 38, 42, the negative lens 40, and the concave mirror 41) can be well maintained under the exposure light el. Precision. The projection optical system and exposure apparatus according to the second embodiment of the present invention will be described below, focusing on parts different from the first embodiment. As shown in Fig. 6, the projection optical system 81 of the second embodiment is different from the first embodiment in the structure of the vertical lens barrel 82 and the connecting member 83 as the first holding member. That is, a cylindrical structure in the projection optical system 81. The vertical lens barrel 82 β holds a first imaging optical system 35 disposed on the first optical axis AX and a third imaging optical system 43 disposed on the first optical axis AX. On the side of the vertical lens barrel 82, near the long axis =, a branch lens barrel receiving hole 82a is formed to allow the third holding frame 37c of the horizontal lens barrel 33 to be inserted. Is the connecting force Λ of the connecting member 83 used to connect the vertical lens barrel 82 and the horizontal mirror U to install the connecting portion 84 on the lower portion of the exposure device body 12 :: The flange portion 85 serving as the safety member is formed as- body. Company: Erniu Guangxi uses metal material #yingwa, which has a small linear expansion coefficient, as its trading platform. Second, it is composed of gold. The connecting portion 84 of the connecting member 83 is in the plane orthogonal to the octagonal column 〃 and the optical axis AX of the brother 1 to form an outer dimension larger than the outer 26 of the longitudinal lens tube μ 12 12969. Among them, the upper and lower sides of the center are formed. A] The vertical lens barrel insertion hole 86 in the mouth and mouth. Also, the surname…, ° Link 84 is in the bathroom? u Αχ, the outer surface is larger than the horizontal lens tube in the orthogonal plane. At the center of one side, a through-hole connecting hole for the vertical lens barrel is formed. The mounting hole 58 for the horizontal lens barrel is made as a connecting part. ~ The mirror 33 is made of stainless steel and titanium alloy with respect to the vertical lens barrel 82 and 楛 锫 锊 u. The isoform ° member 83 is made of Invar alloy. Therefore, the linear expansion coefficient of the longitudinal mirror steam 82 and the connection structure # 83 is different, and the amount of thermal deformation will be different. The linear expansion coefficients are different, and the amount of 孰 deformation will be different.… 'On the other hand, a pair of slits M are formed on the outer peripheral surface of the vertical lens barrel 82 slightly above the center of the vertical lens barrel at equal angular intervals. A plurality of (three in this embodiment) bolt mounting portions 65. In addition, in a state where the vertical lens barrel 82 penetrates the vertical lens barrel insertion hole% of the connecting member 83, γ is installed as a horizontal lens barrel to accommodate The hole 82a corresponds to the horizontal lens barrel mounting hole 58 of the connection member 83. In a state where the vertical lens barrel 82 is inserted into the connection member 83, the bolt mounting portion 65 of the vertical lens barrel 82 is engaged with the upper surface of the connection member 83, and the bolt 61 Bolt mounting portion 65 is screwed to the connecting member 83. Thereby, the vertical cylinder 82 and the connecting member 83 The flexible structure is connected by a pair of slits 66. This allows the bolt 61 fixed to the connection member 83 and the bolt mounting portion 65 of the vertical lens barrel 82 to move relatively slightly in the diameter direction of the vertical lens barrel 82. 'As a result of this relative movement, the difference between the thermal deformation in the radial direction of the vertical lens barrel 82 and the thermal deformation between the connection member 83 is absorbed. The third mirror holder 33c of the horizontal lens barrel 33 is inserted into the horizontal mirror of the vertical lens barrel 82. 27 Ϊ232969 In the state of the tube receiving hole 82a, the side end 33a of the horizontal lens barrel is inserted and inserted into the holding frame 37b connected to the second lens. In this state, it is formed in the horizontal lens barrel: 3 horizontal lens tube mounting holes. ... on the side of the member 83 on the outer peripheral surface of the plurality of screw holding frames 37b having a pair of slits 66. Furthermore, ^ 6 ^ is engaged with the connecting structural member 83. By this, the transverse lens barrel 33: tired talent king 6 The screw 83 is connected to the flexible structure formed by the connecting slit 66, and the connecting member 83 'is connected through the-to thereby allow the screw bolt of the second holding frame m fixed to the connecting structure 33 to be accumulated. 61. A slight relative movement with the direction of the horizontal lens barrel. In addition, the dream: 65 'changes in the direction of the diameter of the horizontal lens barrel 33 Fish: This relative movement absorbs transverse differences.… When the difference ul'r? ㈣33 between the thermal deformation of the connection member 83 and the connection member 83 is connected to the connection member 83, the vertical mirror 82 and the horizontal mirror tube 33 are separated from each other without contact. In other words, according to the second embodiment, the following effects can be obtained: (1) In the projection optical system 81, the first imaging optical system 35 disposed on the first optical axis AX and the vertical lens barrel holding the third imaging optical system 43 82, in a state of being inserted into the vertical lens barrel insertion hole% of the connecting member 83, the dream is connected by the engagement of the bolt mounting section 65 and the upper surface of the connecting section 84. Also, to keep the arrangement at the first position] The second light beam orthogonal to the optical axis AX is formed by the lateral lens barrel 33 of the second imaging optical system on the axis AX, and is connected to the connecting member 83 Koya and the lens barrel women's hole 58. In addition, the two lens barrels 82 and 33 are held on the lower stage 14 of the exposure apparatus main body 12 through the flange portion 85 of the connecting member 83. 28 1232969 Therefore, the vertical lens barrel 82 and the horizontal lens barrel 33 having mutually orthogonal optical axes are connected to the connecting member 83 in a separate state, and are supported by the lower part in a separate state. The platform 14 is thus used to prevent the weight of one of the lens barrels 32 to 34 from acting between the two lens barrels 32 to 34, and to suppress the skew caused by the eccentric load in the lens barrels 82 and 33. . Therefore, the cover glass 27, M, the blades 36a, 36b, the i-th and second optical path inflection mirrors 38, and the negative lens 40 in the lens barrels 82 and 33 can be well maintained: the surface state of the concave mirror 41. In this way, by providing the connecting structure member 83 having a simple structure, each of the lens barrels 82 and 33 can maintain each imaging optical system 35 39 43 in a good state. Therefore, the imaging performance of the projection optical system 81 can be improved, and the exposure accuracy can be improved. In Yicaiyouying Optical System 81, the two barrel lenses 82, 33 are made of metal materials such as non-steel and Chin alloy, which have a large linear expansion coefficient, and the connecting member 83 is made of linear lens 82, 33. Made of small metal materials. The bolt mounting portion 65 of each of the lens barrels 82 and 33 forms a flexible mechanism including a pair of slits 66. Therefore, the deformation of the bolt mounting portion 65 can absorb the thermal deformation of each of the lens barrels 82 and 33 caused by the exposure of the exposure light EL αα ^, ▲. Therefore, it is possible to suppress long-time money, and the distortion of each of the lens manufacturers 82, 33. It is also good to keep the exposure light EL irradiated with EL light (cover glass 27, 28, lens 36 36b, first and second The surface states of the two optical path curved mirrors 38, 42, the negative lens 40, and the concave mirror 41). (m) The connecting member 83 connecting the projection optical system 81 82 and the horizontal lens barrel 33 to the flange portion 8 of the lower stage 14 of the horizontal lens barrel 33 includes the vertical lens barrel 84 and the system engaged with the exposure device body 12 as a whole. . Therefore, even for 29 1232969 even ,,,. The lens barrels 82 and 33 are held on the lower stage 4 and the connection member 83 is provided to keep the increase in the number of parts to a minimum. The above-mentioned implementation form can also be changed as follows. 1 The dipping method is a structure in which the upper lens barrel 32 is fixed to the coupling body 4 and the lower lens barrel 34 is fixed to the flange 55. On the other hand, a structure in which the upper lens barrel 32 and the lower lens barrel W are fixed to the coupling body M can be 20%, or the coupling member 31 can be made to hang down with respect to the lower stage 14 of the exposure apparatus body 12. The structure that engages and fixes the upper lens barrel 32 and the I part, and the tube 34 to the connection body 54. Since the linking member η: when lowered ', the flange 55 is arranged above and the coupling body Η is arranged below, so that the upper lens barrel 54 can be fixed. Θ is attached to the flange 55, and the lower lens barrel 34 is fixed to the first embodiment. The upper lens barrel 54 is fixed, and the connecting body 54 is fixed to the flange. I In contrast, the example η is not formed on the outer periphery of the lower lens barrel 34 and μ is formed on the outer peripheral surface of the holding frame 371r and the like arranged on the opposite end of the crystal W on the outer peripheral surface as a mounting member. The hibiscus 1 and L of the connection body 54 are fixed to the 50H flange 91 and have a structure M. This constitutes plus. ，〗 Increase in the number of control parts At this time, if the holding frame 3 of the lower lens barrel 34 is different, it is better to be able to face the flange on the connecting body 54:, ...,. The material of the body 54 is, for example, a flexible structure formed by the fixing portion 65 of the upper mirror /: 1 of the embodiment. In the first embodiment of the bolt mounting portion, the flange 55 that can be “connected” can be integrated. 30 1232969 In the second embodiment, the connecting portion and the flange portion 85 can be separately formed. Also, the first embodiment And in the second embodiment, although the first optical path zigzag mirror 38 and the second optical path zigzag mirror 42 are composed of a single member, 'the optical path zigzag @ 38 and the second optical path can also be formed independently. Zigzag mirror 42. In each embodiment, it is attached to the holding frames 37u, 37uw, 37b, 37k, and 371 ', respectively # 1 lens 36a, 36b (including cover glass 27, 28 as appropriate) or negative lens 40. Compared to In this case, each of the holding frames 37u, 37uw, 37b, 371r, and 371 may hold a plurality of lenses 36a, 36b, or a negative lens. In each embodiment, the cross-barrel 33 is held and arranged at the first orthogonal to the first optical axis AX. The two-light car is the second imaging optical system 39 on AX. On the other hand, the optical system disposed diagonally on the optical axis of the fi optical axis Ax can be held in the horizontal lens barrel 33. At this time ' At least one of the upper lens barrel 32, the horizontal lens barrel 33, and the lower lens barrel 34 may be diagonally connected to the connecting body 54. In each embodiment, although the first! Imaging optical system 35 and the third imaging optical system 43 are arranged on the i-th optical axis AXji ′, the third imaging optical system 43 may be arranged on the other side. The optical axis AX is coaxial, and intersects with the (optical axis AX (or the second optical axis AX,) or is parallel to the i-th optical axis AX, the third optical axis. In general, d is arranged in different counties. The lens barrels of the plurality of optical systems on the front axis that are successively crossed as long as they are not in contact with each other and are independently connected to the connecting member, and the supporting member is supported on the lower stage M of the exposure device body 透过 through the connecting member. 'The first optical path meandering mirror π and the second optical path meandering mirror 42 can be formed as separate and different reflection optics 31 1232969 elements. In the first and second embodiments, the right-angle mirror 44 is held by the transverse mirror. Tube 33, but the right-angle mirror 44 can also be separated from the horizontal mirror tube 33. In the example shown in FIG. 8, the accessory 100 provided with the right-angle mirror 44 at its front end is detachably mounted on the The side wall of the connecting body 54. At this time, the right-angle mirror 44 is held on the connecting member 31. The replacement of the right-angle mirror 44 is not necessary because the procedure of removing the horizontal lens barrel 33 is needed, so the replacement of the right-angle mirror 44 is easy. The right-angle mirror 44 can also be other components that can be removed from the accessory 100. 〃 As a light source 21. Not only ^ lasers that supply pulsed light with a wavelength of 157nm, but also krF excimer lasers that supply light with a wavelength of 248nm, ArF excimer lasers that supply light with a wavelength of 193nm, and Ah lasers that supply light with a wavelength of 126nm. In addition, single-wavelength laser light from infrared bands or visible bands emitted by DFB semiconductor lasers or fiber lasers can also be used, such as fiber amplifiers doped with a dopant (or both chirped and mirrored) to amplify, Further, a higher harmonic wave whose wavelength is converted into ultraviolet light using a non-linear optical crystal is used. The present invention is not limited to an exposure device for manufacturing a micro-device such as a semiconductor device. That is, the present invention can also be applied to reticle or photomask used for manufacturing light exposure device, EUV (extreme extreme ultraviolet light) exposure device, x-ray exposure device, and electron beam exposure device, etc. The reticle master is transferred to an exposure device such as a glass substrate or a silicon wafer. Among them, exposure devices using DUV (deep ultraviolet), vuv (vacuum ultraviolet) light, etc., generally use transmissive reticles, and the reticle substrates are quartz glass, 32 1232969 fluorine-doped quartz glass, and fluorite. , Magnesium fluoride or crystal. In addition, in the proximity X-ray exposure apparatus and electron beam exposure apparatus, a reflective mask (stencil musk, membrane musk, etc.) is used, and a silicon wafer or the like is used as the mask. Photomask substrate. The present invention is also applicable to an exposure apparatus other than an exposure apparatus for manufacturing a semiconductor element. For example, the present invention can also be applied to an exposure device used to manufacture a display including a liquid crystal display element (LCD), a device pattern transferred to a glass plate, and a thin film magnetic head to transfer a device pattern onto a ceramic wafer. Exposure devices and exposure devices for manufacturing imaging elements such as CCDs (charge coupled devices). Although the above embodiment has described the case where the present invention is applicable to a scanning stepper, the present invention can also be applied to transferring a photomask pattern to a substrate while the photomask and the substrate are stationary ^ Exposure device in a step-and-repeat manner for moving a substrate. Although the projection magnifications of the projection optical systems 25 and 81 in the above embodiment are reduction magnifications, the projection magnification is not limited to reduction, and may be equal magnification or magnification. For example, when the projection magnification is a magnification, it is arranged from the first magnification. 3 imaging optical system 43 shoots human light on the side, and uses the third imaging optical system to "come: to form a reticle or reticle to form a primary image, and uses the second imaging optical system 39 to form a second image, using the first imaging optical system It is sufficient to form the tertiary image (final image) on the substrate such as the wafer W by the wind turbine subsystem 35. The exposure device η ′ of the present invention is manufactured, for example, in the following manner. That is, each of the lens barrels 32 to 34, 82 Hold 70 optical elements such as the rear lens 36a, 36b, 4G, mirror material, and cover glass am 33 1232969, which constitute the projection optical system 25, 81. The lens barrels 32 to 34, 82 are connected by connecting members 31, 83. JI, shoes ° &quot; Exposure device body 12 and optical adjustment. Then a wafer stage 26 (including a reticle stage 24 if it is a scanning type exposure device) composed of most mechanical components is mounted on the exposure device body 12 And connect the wiring and then 'connect the gas After supplying to the gas supply line in the optical path of the exposure light EL, further comprehensive adjustments (electric adjustment and operation confirmation) are performed. The components constituting the lens barrels 32 to 34, 82 are washed away by ultrasonic cleaning, etc. Add impurities such as oil or metal materials, and assemble them. X. The production of the exposure device 11 should preferably be performed in a clean room where temperature, humidity, and air pressure are controlled and maintained at an appropriate degree of cleanliness. Take fluorite as an example, but quartz, lithium fluoride, magnesium fluoride, gill fluoride, lithium-calcium-fluorite, and lithium-aluminum-aluminum-fluorite can also be used, or hafnium-barium-lanthanum- Fluorinated glass made of aluminum, quartz glass doped with fluorine, quartz glass doped with hydrogen in addition to fluorine, quartz glass containing 0 1 ί base, and quartz glass containing 0 Η base in addition to fluorine. The above-mentioned exposure device u is described in an embodiment of a method of manufacturing a device in a photolithography step. Fig. 9 shows the manufacture of a display device (IC or LSI # semiconductor crystal #, a liquid crystal panel, a CCD, a thin film magnetic head, a micromachine, etc.) Example flow chart As shown in Figure 帛 9, first, in step 101 (design step), the function and performance design of the device (micro-device) (such as the circuit design of the semiconductor device) is performed, and the pattern design to realize its function is performed). Next, in step si02 (photomask making step), a photomask (marking line 34 3432969 piece, photomask, etc.) is formed to form the designed circuit pattern. On the other hand, in step s103 (substrate manufacturing) In step), the substrate (wafer w, glass plate, etc.) is manufactured using glass and other materials. In step S1G4 (substrate processing step), the photomask and substrate prepared in "S1 (H to S103) are used as described later. Generally, an actual circuit or the like is formed on a substrate by a photolithography technique or the like. In step 1 () 5 (component assembly step), the substrate processed in step circle is used for component assembly. If necessary, the step includes a cutting step, a bonding step, and a packaging step (wafer encapsulation). Finally, in step 6 (inspection step), check the operation confirmation, endurance test, etc. in step si05. When the inspected brother 10 is shown as a semiconductor element, step 9104 in FIG. 9-a detailed flowchart example is shown. In the first step, the surface of the wafer W (substrate) is oxidized in step 8111 (oxidation step). An insulating film is formed on the surface of the yen and w in step S1. In step 3 (electrode In the forming step), an electrode is formed on the wafer by steaming. In step sn4 (ion implantation step), ions are implanted into the wafer W. Each of the above steps S111 to S 2 4 constitutes a wafer process. The pre-process of each stage of the process is selected in each stage depending on the processed product. In each stage of the wafer processing, when the above-mentioned pre-process is ended, the post-process is performed in the following manner: In the post-process, first In step sn5 (photoresist layer formation step), the spleen umbrella ΠB # ^ 4 where) τ will first apply the photoresist to the wafer W. Then,

In step S 11 6 (exposure step), the shape of the circuit pattern of the reticle R is transferred onto the wafer w by using a photolithography system (exposure set 1) described in another aspect, w A like 1ΐλ. Next, 35 1232969: step SU · shadow step), in the exposed step Sll8 (money carving step), _ ’. At the step, the component is exposed. After the deletion, in step S119 (photoresist removal step) other than removing the remaining photoresist portion, the unnecessary photoresist is removed. Elbow etching Pre-process and post-process circuit patterns are performed repeatedly. A multi-layered exposure device U is formed on the sun column W to be used for the exposure step (step SU6, the exposure light E of the empty UV light band E is warm and fresh, and this is performed with high accuracy. According to the above-mentioned component manufacturing method, as a result, (high-volume components with a minimum line width of G1 // ma degrees can be produced. [Schematic description] (a) Schematic part 21 The figure is the first of the present invention A schematic view of an exposure apparatus according to an embodiment. FIG. 2 is a cross-sectional view of the projection optical system of FIG. 1. FIG. 3 is a partial cross-sectional perspective view of the horizontal lens barrel and the connecting body of FIG. 1. FIG. 2 is a cross-sectional view taken along line 4_ 4. Xin FIG. 5 is a partially enlarged cross-sectional view of a bolt mounting portion of FIG. 4. FIG. 6 is a cross-sectional view of a projection optical system according to a second embodiment of the present invention. FIG. 8 is a cross-sectional view of a projection optical system according to a third embodiment of the present invention. FIG. 8 is a cross-sectional view of a projection optical system according to a fourth embodiment of the present invention. 1232969 Figure 10 is the detailed flow chart of Figure 9. (II) Component Representative 11 Scanning projection exposure device 12 Exposure device body 13 Platform 14 Lower stage 15 Upper stage 21 Light source 22 Illumination optical system 23 Beam matching unit (BMU) 24 Graticule stage 25, 81 Projection optics 26 Wafer stage 27 , 28 Cover glass 31 Connecting member 32 First lens barrel module (upper lens barrel) 32a, 34a End portion 32b, 34b Concave portion 33 Second lens barrel module (transverse lens barrel) 34 Third lens barrel module (lower lens) Tube) 35 First imaging optical system 36a, 36b Lens 37a, 37b, 37c, 371, 371r, 37u, 37uw Holding frame 38 First optical path meandering mirror 37 1232969 39 Second imaging optical system 40 Negative lens 41 Concave mirror 42 Second optical path zigzag mirror 43 Third imaging optical system 44 Right-angle mirror 44a Supporting feet 45, 46 Bevel of base material 48 Bottom 49 Guide rail 50a, 50b Opening 5 1 a, 5 lb Side wall 54 Connecting body 54a Screw hole 54b Fixing Part 55 Flange 56 Upper lens barrel mounting recess 57 Lower lens barrel mounting recess 58 Cross lens barrel mounting hole 59 Partition wall 60 Cutout 61, 62, 64 Bolt 63 Opening 65 Bolt mounting

38 1232969

66 Slit 67 Mirror replacement opening 68 Plug 82 Longitudinal lens barrel 82a Longitudinal lens housing hole 83 Connecting member 84 Connecting portion 85, 91 Flange portion 86 Vertical lens barrel insertion hole 100 Accessories

39

Claims (1)

Application No. 1232969 No. 92123904, [Shen Lu * 4] Scope Amendment 11 1 ··························································································································································································· It is equipped with: ® a case-like shirt on a predetermined surface, which is characterized by the first]: 1 holding member, which holds at least one brother 1 optical element arranged on the first optical axis; Wang Xi's brother 2 holding member, is held At least one second optical element disposed on the second optical axis that intersects the first optical axis; and the first Qiulian and ° members have a first company that connects the first holding member. B: The second connection part connecting the second holding member and the second connection part; the 5th connection part is connected to the flange part. The first holding member of two Γ does not contact the second holding member that is connected to the second company .... Chapter 3 · If the scope of the patent application is the first, the projection optical system in item 1 or 2 of m and *, wherein the connecting portion is connected to the first holding structure 2 and the connecting portion is connected to one end of the second holding member '= I: In the state where the holding member is connected with the connecting member, = the second light two held by the fourth brother and the one held by the holding member =: the completion of the 1st and 2nd rounds of the light wheel and the second holding structure Name book and more ^ The flange portion and the connecting member are configured as a body. The center of the system 5. If the scope of the patent application is applied, the dry-type knives are independently formed, and the flange portion and the 1232969 connecting member are fixed by a fixing member. Further one: The projection optical system applying for the first and second items in the scope of the patent of the first month, wherein the holding member is used to maintain the arrangement on the first optical axis through the connecting member and the first, or less The third optical element; or the "to-be / he connection member on the axis of the first axis and the third axis, which has a third connection to the 保持 3 holding member. 7. The projection optical system as claimed in the scope of patent application 帛 6, where The contact member, the second holding member, and the third holding member are not each other. The third holding member is connected to the third connecting part. In the installation optics of the item "Projection Optics ... = ^ ㈣ member, the material structure is supported by the second, such as the projection optical system of the scope of application for patent No. 1 "2, wherein the Li / retaining member includes a holding frame holding the at least one first optical element. The second holding member includes at least one holding frame that holds at least one second light and concave mirror.丄 0. For example, the projection optical system according to item 9 of the patent, wherein the 1 optical element constitutes a $ 1 imaging optical system, the at least one academic system and the concave mirror constitute a second imaging optical system. In addition, if the projection optical system of the first or second item of the patent application scope, wherein “has: The first imaging optical system is a plurality of optical elements including the at least one first optical 1232969 element, which is used to form the tenth first Intermediate image; the first optical path zigzag mirror is arranged near the formation position of the first intermediate image to deflect a light beam directed toward or from the first intermediate image, a second imaging optical system, The system includes the at least one optical element and a concave mirror, and the use is from the first! The light beam of the intermediate image forms a second intermediate image near the position where the first intermediate image is formed; a second optical path zigzag mirror is arranged near the position where the second intermediate image is formed so as to be directed toward the second intermediate image. The light beam or the light beam from the second intermediate image is deflected; and a third imaging optical system is a plurality of optical elements including the at least one third optical element, and uses the light beam from the second intermediate image to form a reduced image of the pattern On the substrate. 12. The projection optical system according to item n of the patent application scope, wherein the first holding member includes a plurality of holding frames for holding a plurality of optical elements containing the first optical element to the first optical element; the second holding member Containing a plurality of holding frames, which are used to hold the first optical path zigzag mirror, the at least one second first i i _ _ a special element, the concave mirror and the second optical path zigzag mirror, ° 玄The third holding member includes a plurality of holding frames for holding a plurality of optical elements including the third optical element. The above 1 3 'If the projection optical system of item 1 or 2 of the patent application scope, wherein the ^ ,, &quot; member has an optical element replacement mechanism, which is held in the first, second and Chu α ^ Le 3 At least one of the members is used to replace at least one optical element contained in the connecting member. 42 l232969 ^ l4. The projection optical system according to item 13 of the scope of patent application, wherein = the second optical element includes a reflective optical element having a = 1 optical path tortuosity mirror and a second optical path tortuosity mirror, The optical path zigzag mirror deflected the light beam from the first intermediate image or the light beam toward the i-th intermediate image, and the second optical path zigzag mirror deflected the light beam from the "2 intermediate image" or toward the second intermediate image. The beam is deflected. The first intermediate image is formed by the first optical element, and the second intermediate image is formed by the second optical element based on the first intermediate image. The optical element replacement mechanism is Those who replace the reflective optical element ii i5. The projection optical system such as the item i A 2 of the patent application scope, wherein the connecting member is made of a ceramic material. 6 · If you declare the scope of patents! Or 2 projection optical systems, in which the second and third holding members and at least one of the pedestal are formed by a line &amp; expansion coefficient different from the line expansion coefficient of the material constituting the connecting member = material 'The difference in linear expansion coefficient of the two materials is greater than a predetermined value, and the second and third holding members, at least one of the stage, and the connecting member are connected by a flexible mechanism. 17. An "exposure farming" is a method in which a pattern image formed on a photomask is exposed on a substrate, and is characterized in that it has a projection optical system in any one of the scope of application patents 1 to 16. 18 · —A method for manufacturing an element, which is characterized in that it comprises the step of exposing using an exposure device with a scope of application patent No. 17 to 43 1232969 light lithography. Yu M's exposure device is a device that exposes a pattern image formed on the light army on a substrate. It is characterized by: a stand, and a projection optical system that is supported by a flange and is supported by the projection type; The projection optical system has a holding member for holding a first optical element, and at least a second holding member for holding a second optical element on the first axis of the holding lens, and a second optical element. The axis is at least formed as = 1: the optical axis of the first holding member and the second holding member intersects with the second optical axis, and the second holding member is separated from each other; ^ 保 # of the member and the connecting member , Is provided on the flange portion. ^ The exposure device according to item 19 of the scope of patent application, wherein the holding member and the second holding member are attached to the connecting member. ', Y', and this independent Ann. 21. If the exposure range of the patent application 帛 19 items is equipped with reflective optical element Gan ^ Bazhong, further into the 1st, the 8th series is housed in the connecting member, the Shanghai :, The direction of the light incident on the projection optical system is changed to: the direction of the optical axis. Further, the 2nd 22 · If the radiation optical element of the 21st item in the scope of the patent application has an opposite direction # 从 城 置 中'The anti-, ten-mu ... parts for assembly and disassembly. 44