AU2001280121A1 - Optical element holding device - Google Patents

Optical element holding device

Info

Publication number
AU2001280121A1
AU2001280121A1 AU2001280121A AU8012101A AU2001280121A1 AU 2001280121 A1 AU2001280121 A1 AU 2001280121A1 AU 2001280121 A AU2001280121 A AU 2001280121A AU 8012101 A AU8012101 A AU 8012101A AU 2001280121 A1 AU2001280121 A1 AU 2001280121A1
Authority
AU
Australia
Prior art keywords
optical element
holding device
element holding
optical
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001280121A
Inventor
Jin Nishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2001280121A1 publication Critical patent/AU2001280121A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/022—Mountings, adjusting means, or light-tight connections, for optical elements for lenses lens and mount having complementary engagement means, e.g. screw/thread
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/026—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using retaining rings or springs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
AU2001280121A 2000-08-25 2001-08-23 Optical element holding device Abandoned AU2001280121A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-256203 2000-08-25
JP2000256203 2000-08-25
PCT/JP2001/007214 WO2002016992A1 (en) 2000-08-25 2001-08-23 Optical element holding device

Publications (1)

Publication Number Publication Date
AU2001280121A1 true AU2001280121A1 (en) 2002-03-04

Family

ID=18744847

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001280121A Abandoned AU2001280121A1 (en) 2000-08-25 2001-08-23 Optical element holding device

Country Status (6)

Country Link
US (1) US20030147155A1 (en)
EP (1) EP1326114A1 (en)
KR (1) KR20030038686A (en)
CN (1) CN1471650A (en)
AU (1) AU2001280121A1 (en)
WO (1) WO2002016992A1 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4363328B2 (en) * 2002-08-29 2009-11-11 株式会社ニコン Projection optical system and exposure apparatus
FR2851827B1 (en) * 2003-02-27 2005-04-01 Commissariat Energie Atomique SYSTEM FOR QUICKLY PLACING AND FASTENING AN OPTICAL COMPONENT BARREL.
JP4152806B2 (en) * 2003-05-28 2008-09-17 株式会社半導体エネルギー研究所 Laser beam irradiation device
JP4140463B2 (en) * 2003-06-27 2008-08-27 株式会社ニコン Optical element polishing apparatus and polishing method
EP1695148B1 (en) * 2003-11-24 2015-10-28 Carl Zeiss SMT GmbH Immersion objective
US6966657B2 (en) 2004-02-19 2005-11-22 Barco N.V. Projection lens fixation and adjustment mechanism
WO2007017013A2 (en) * 2005-07-01 2007-02-15 Carl Zeiss Smt Ag Arrangement for mounting an optical component
JP2007025390A (en) * 2005-07-19 2007-02-01 Fanuc Ltd Optical element holding mechanism and laser apparatus
DE102006038455A1 (en) * 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optical system for semiconductor lithography, has adjusting unit positioning optical component, where contact points of adjusting unit at optical component is selected, such that no moments develop at optical component
WO2009024192A1 (en) * 2007-08-23 2009-02-26 Carl Zeiss Smt Ag Optical element module with minimized parasitic loads
DE102010022934A1 (en) * 2010-06-04 2011-12-08 Carl Zeiss Ag Optical assembly has optical element with rotational-symmetrical cross-section that is approximately perpendicular to symmetrical axis, where lamp holder is provided for optical element with three holding assemblies
DE102011075316A1 (en) * 2011-05-05 2012-11-08 Carl Zeiss Smt Gmbh Optical module with a measuring device
JP5695011B2 (en) * 2012-10-31 2015-04-01 カール・ツァイス・エスエムティー・ゲーエムベーハー Parasitic load minimizing optical element module
DE102014218969A1 (en) * 2014-09-22 2016-04-28 Carl Zeiss Smt Gmbh Optical arrangement of a microlithographic projection exposure apparatus
JP5848470B2 (en) * 2015-02-05 2016-01-27 カール・ツァイス・エスエムティー・ゲーエムベーハー Parasitic load minimizing optical element module
CN112068403A (en) * 2020-09-09 2020-12-11 咸宁恒舟信息科技有限公司 Rotatory spacing wafer sucking disc in turn

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS603828U (en) * 1983-06-21 1985-01-12 ソニー株式会社 camera
JPS61249011A (en) * 1985-04-26 1986-11-06 Olympus Optical Co Ltd Optical element having adhesive agent injecting hole
US4726671A (en) * 1986-06-19 1988-02-23 The Perkin-Elmer Corporation High resonance adjustable mirror mount
JP3359292B2 (en) * 1998-07-31 2002-12-24 キヤノン株式会社 Optical element and optical system
JP2000187150A (en) * 1998-12-22 2000-07-04 Mitsubishi Electric Corp Movable mirror controller

Also Published As

Publication number Publication date
US20030147155A1 (en) 2003-08-07
KR20030038686A (en) 2003-05-16
CN1471650A (en) 2004-01-28
WO2002016992A1 (en) 2002-02-28
EP1326114A1 (en) 2003-07-09

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