JP2008533709A5 - - Google Patents

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Publication number
JP2008533709A5
JP2008533709A5 JP2008500101A JP2008500101A JP2008533709A5 JP 2008533709 A5 JP2008533709 A5 JP 2008533709A5 JP 2008500101 A JP2008500101 A JP 2008500101A JP 2008500101 A JP2008500101 A JP 2008500101A JP 2008533709 A5 JP2008533709 A5 JP 2008533709A5
Authority
JP
Japan
Prior art keywords
use area
optical system
projection optical
microlithographic projection
aperture stop
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008500101A
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English (en)
Japanese (ja)
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JP2008533709A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2006/002005 external-priority patent/WO2006094729A2/en
Publication of JP2008533709A publication Critical patent/JP2008533709A/ja
Publication of JP2008533709A5 publication Critical patent/JP2008533709A5/ja
Pending legal-status Critical Current

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JP2008500101A 2005-03-08 2006-03-04 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系 Pending JP2008533709A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65966005P 2005-03-08 2005-03-08
PCT/EP2006/002005 WO2006094729A2 (en) 2005-03-08 2006-03-04 Microlithography projection system with an accessible diaphragm or aperture stop

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012137567A Division JP5793470B2 (ja) 2005-03-08 2012-06-19 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系

Publications (2)

Publication Number Publication Date
JP2008533709A JP2008533709A (ja) 2008-08-21
JP2008533709A5 true JP2008533709A5 (enExample) 2009-04-30

Family

ID=36282861

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2008500101A Pending JP2008533709A (ja) 2005-03-08 2006-03-04 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系
JP2012137567A Expired - Fee Related JP5793470B2 (ja) 2005-03-08 2012-06-19 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2012137567A Expired - Fee Related JP5793470B2 (ja) 2005-03-08 2012-06-19 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系

Country Status (6)

Country Link
US (3) US7999913B2 (enExample)
EP (2) EP2192446B1 (enExample)
JP (2) JP2008533709A (enExample)
KR (1) KR101176686B1 (enExample)
DE (1) DE602006014368D1 (enExample)
WO (1) WO2006094729A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2192446B1 (en) 2005-03-08 2011-10-19 Carl Zeiss SMT GmbH Microlithography projection system with an accessible aperture stop
DE102006059024A1 (de) * 2006-12-14 2008-06-19 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
WO2009052932A1 (en) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Imaging optical system and projection exposure installation for micro-lithography with an imaging optical system of this type
DE102007051671A1 (de) * 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
WO2010099899A1 (en) 2009-03-06 2010-09-10 Carl Zeiss Smt Ag Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
KR101739579B1 (ko) * 2011-01-04 2017-05-24 에스케이 텔레콤주식회사 코딩 유닛 단위 병렬 인트라예측을 이용한 부호화/복호화 방법 및 장치
DE102011077784A1 (de) 2011-06-20 2012-12-20 Carl Zeiss Smt Gmbh Projektionsanordnung
WO2013118615A1 (ja) 2012-02-06 2013-08-15 株式会社ニコン 反射結像光学系、露光装置、およびデバイス製造方法
WO2014019617A1 (en) 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Imaging optical unit for a projection exposure apparatus
DE102012218221A1 (de) 2012-10-05 2014-04-10 Carl Zeiss Smt Gmbh Monitorsystem zum Bestimmen von Orientierungen von Spiegelelementen und EUV-Lithographiesystem
JP7459523B2 (ja) * 2020-01-23 2024-04-02 セイコーエプソン株式会社 投写光学系およびプロジェクター

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US5686728A (en) 1996-05-01 1997-11-11 Lucent Technologies Inc Projection lithography system and method using all-reflective optical elements
US5956192A (en) * 1997-09-18 1999-09-21 Svg Lithography Systems, Inc. Four mirror EUV projection optics
US6199991B1 (en) * 1997-11-13 2001-03-13 U.S. Philips Corporation Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US5973826A (en) * 1998-02-20 1999-10-26 Regents Of The University Of California Reflective optical imaging system with balanced distortion
EP0955641B1 (de) 1998-05-05 2004-04-28 Carl Zeiss Beleuchtungssystem insbesondere für die EUV-Lithographie
US6859328B2 (en) 1998-05-05 2005-02-22 Carl Zeiss Semiconductor Illumination system particularly for microlithography
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US6142641A (en) * 1998-06-18 2000-11-07 Ultratech Stepper, Inc. Four-mirror extreme ultraviolet (EUV) lithography projection system
US6213610B1 (en) 1998-09-21 2001-04-10 Nikon Corporation Catoptric reduction projection optical system and exposure apparatus and method using same
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US6985210B2 (en) * 1999-02-15 2006-01-10 Carl Zeiss Smt Ag Projection system for EUV lithography
US6600552B2 (en) 1999-02-15 2003-07-29 Carl-Zeiss Smt Ag Microlithography reduction objective and projection exposure apparatus
EP1035445B1 (de) 1999-02-15 2007-01-31 Carl Zeiss SMT AG Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
EP1093021A3 (en) * 1999-10-15 2004-06-30 Nikon Corporation Projection optical system as well as equipment and methods making use of said system
JP2001185480A (ja) * 1999-10-15 2001-07-06 Nikon Corp 投影光学系及び該光学系を備える投影露光装置
KR100787525B1 (ko) * 2000-08-01 2007-12-21 칼 짜이스 에스엠티 아게 6 거울-마이크로리소그래피 - 투사 대물렌즈
DE10052289A1 (de) * 2000-10-20 2002-04-25 Zeiss Carl 8-Spiegel-Mikrolithographie-Projektionsobjektiv
TW573234B (en) 2000-11-07 2004-01-21 Asml Netherlands Bv Lithographic projection apparatus and integrated circuit device manufacturing method
JP2002162566A (ja) 2000-11-27 2002-06-07 Nikon Corp 光学系の設計方法，光学系および投影露光装置
JP2003015040A (ja) * 2001-07-04 2003-01-15 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP4134544B2 (ja) 2001-10-01 2008-08-20 株式会社ニコン 結像光学系および露光装置
JP2003233005A (ja) 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
JP2003233001A (ja) 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
JP2003233002A (ja) 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
JP2004138926A (ja) 2002-10-21 2004-05-13 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP3938040B2 (ja) 2002-12-27 2007-06-27 キヤノン株式会社 反射型投影光学系、露光装置及びデバイス製造方法
JP2004325649A (ja) * 2003-04-23 2004-11-18 Canon Inc 反射型投影光学系、露光装置及びデバイスの製造方法
JP2004140390A (ja) * 2003-12-01 2004-05-13 Canon Inc 照明光学系、露光装置及びデバイス製造方法
KR100918335B1 (ko) * 2004-06-23 2009-09-22 가부시키가이샤 니콘 투영 노광 장치
US7312851B2 (en) 2004-06-23 2007-12-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method in which a reflective projection optical system has a non-circular aperture stop
DE102005042005A1 (de) * 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
WO2006087978A1 (ja) * 2005-02-15 2006-08-24 Nikon Corporation 投影光学系、露光装置、およびデバイスの製造方法
EP2192446B1 (en) 2005-03-08 2011-10-19 Carl Zeiss SMT GmbH Microlithography projection system with an accessible aperture stop

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