JP2007532937A5 - - Google Patents
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- JP2007532937A5 JP2007532937A5 JP2007506723A JP2007506723A JP2007532937A5 JP 2007532937 A5 JP2007532937 A5 JP 2007532937A5 JP 2007506723 A JP2007506723 A JP 2007506723A JP 2007506723 A JP2007506723 A JP 2007506723A JP 2007532937 A5 JP2007532937 A5 JP 2007532937A5
- Authority
- JP
- Japan
- Prior art keywords
- projection objective
- image
- mirror
- group
- plane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US56026704P | 2004-04-08 | 2004-04-08 | |
| US60/560,267 | 2004-04-08 | ||
| PCT/EP2005/003645 WO2005098505A1 (en) | 2004-04-08 | 2005-04-07 | Catadioptric projection objective with mirror group |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007532937A JP2007532937A (ja) | 2007-11-15 |
| JP2007532937A5 true JP2007532937A5 (enExample) | 2008-05-08 |
| JP4801047B2 JP4801047B2 (ja) | 2011-10-26 |
Family
ID=34962386
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007506723A Expired - Fee Related JP4801047B2 (ja) | 2004-04-08 | 2005-04-07 | 鏡群を有するカタジオプトリック投影対物レンズ |
| JP2007506724A Pending JP2007532938A (ja) | 2004-04-08 | 2005-04-07 | カタジオプトリック投影対物レンズ |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007506724A Pending JP2007532938A (ja) | 2004-04-08 | 2005-04-07 | カタジオプトリック投影対物レンズ |
Country Status (6)
| Country | Link |
|---|---|
| US (4) | US7712905B2 (enExample) |
| EP (2) | EP1733272A1 (enExample) |
| JP (2) | JP4801047B2 (enExample) |
| KR (1) | KR100991584B1 (enExample) |
| CN (1) | CN1965259B (enExample) |
| WO (3) | WO2005098504A1 (enExample) |
Families Citing this family (108)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9482966B2 (en) | 2002-11-12 | 2016-11-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10503084B2 (en) | 2002-11-12 | 2019-12-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| SG121819A1 (en) | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| DE10261775A1 (de) | 2002-12-20 | 2004-07-01 | Carl Zeiss Smt Ag | Vorrichtung zur optischen Vermessung eines Abbildungssystems |
| WO2004086468A1 (ja) | 2003-02-26 | 2004-10-07 | Nikon Corporation | 露光装置、露光方法及びデバイス製造方法 |
| KR20180054929A (ko) | 2003-04-11 | 2018-05-24 | 가부시키가이샤 니콘 | 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법 |
| EP2161620A1 (en) | 2003-04-11 | 2010-03-10 | Nikon Corporation | Cleanup method for optics in immersion lithography |
| SG194246A1 (en) | 2003-04-17 | 2013-11-29 | Nikon Corp | Optical arrangement of autofocus elements for use with immersion lithography |
| EP2672307A3 (en) | 2003-05-06 | 2014-07-23 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
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| TWI503865B (zh) | 2003-05-23 | 2015-10-11 | 尼康股份有限公司 | A method of manufacturing an exposure apparatus and an element |
| TW201515064A (zh) | 2003-05-23 | 2015-04-16 | 尼康股份有限公司 | 曝光方法及曝光裝置以及元件製造方法 |
| KR20150036794A (ko) | 2003-05-28 | 2015-04-07 | 가부시키가이샤 니콘 | 노광 방법, 노광 장치, 및 디바이스 제조 방법 |
| US7213963B2 (en) | 2003-06-09 | 2007-05-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| KR101242815B1 (ko) | 2003-06-13 | 2013-03-12 | 가부시키가이샤 니콘 | 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조방법 |
| TWI482200B (zh) | 2003-06-19 | 2015-04-21 | 尼康股份有限公司 | An exposure apparatus, an exposure method, and an element manufacturing method |
| US7236232B2 (en) | 2003-07-01 | 2007-06-26 | Nikon Corporation | Using isotopically specified fluids as optical elements |
| EP2466383B1 (en) | 2003-07-08 | 2014-11-19 | Nikon Corporation | Wafer table for immersion lithography |
| EP2264531B1 (en) | 2003-07-09 | 2013-01-16 | Nikon Corporation | Exposure apparatus and device manufacturing method |
| ATE489724T1 (de) | 2003-07-09 | 2010-12-15 | Nikon Corp | Belichtungsvorrichtung und verfahren zur bauelementherstellung |
| KR101296501B1 (ko) | 2003-07-09 | 2013-08-13 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| WO2005010960A1 (ja) | 2003-07-25 | 2005-02-03 | Nikon Corporation | 投影光学系の検査方法および検査装置、ならびに投影光学系の製造方法 |
| EP1653501B1 (en) | 2003-07-28 | 2012-09-19 | Nikon Corporation | Exposure apparatus, device producing method, and exposure apparatus controlling method |
| EP1503244A1 (en) | 2003-07-28 | 2005-02-02 | ASML Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
| US7779781B2 (en) | 2003-07-31 | 2010-08-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| TWI263859B (en) | 2003-08-29 | 2006-10-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| CN101303536B (zh) | 2003-08-29 | 2011-02-09 | 株式会社尼康 | 曝光装置和器件加工方法 |
| EP3223053A1 (en) | 2003-09-03 | 2017-09-27 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
| JP4444920B2 (ja) | 2003-09-19 | 2010-03-31 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
| US8208198B2 (en) * | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| KR101335736B1 (ko) | 2003-09-29 | 2013-12-02 | 가부시키가이샤 니콘 | 노광장치, 노광방법 및 디바이스 제조방법 |
| WO2005036623A1 (ja) | 2003-10-08 | 2005-04-21 | Zao Nikon Co., Ltd. | 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法 |
| JP2005136364A (ja) | 2003-10-08 | 2005-05-26 | Zao Nikon Co Ltd | 基板搬送装置、露光装置、並びにデバイス製造方法 |
| KR101111364B1 (ko) | 2003-10-08 | 2012-02-27 | 가부시키가이샤 자오 니콘 | 기판 반송 장치 및 기판 반송 방법, 노광 장치 및 노광방법, 디바이스 제조 방법 |
| TW201738932A (zh) | 2003-10-09 | 2017-11-01 | 尼康股份有限公司 | 曝光裝置及曝光方法、元件製造方法 |
| US7411653B2 (en) | 2003-10-28 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus |
| CN102163005B (zh) | 2003-12-03 | 2014-05-21 | 株式会社尼康 | 投影曝光装置、器件制造方法以及光学部件 |
| US7466489B2 (en) | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
| KR101345443B1 (ko) | 2003-12-15 | 2013-12-27 | 가부시키가이샤 니콘 | 스테이지 장치, 노광 장치, 및 노광 방법 |
| JP5102492B2 (ja) | 2003-12-19 | 2012-12-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結晶素子を有するマイクロリソグラフィー投影用対物レンズ |
| US20080151365A1 (en) * | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| CN1910494B (zh) | 2004-01-14 | 2011-08-10 | 卡尔蔡司Smt有限责任公司 | 反射折射投影物镜 |
| US7463422B2 (en) | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| EP1713114B1 (en) | 2004-02-03 | 2018-09-19 | Nikon Corporation | Exposure apparatus and device manufacturing method |
| EP1747499A2 (en) | 2004-05-04 | 2007-01-31 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
| KR101213831B1 (ko) | 2004-05-17 | 2012-12-24 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| US7616383B2 (en) | 2004-05-18 | 2009-11-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7796274B2 (en) | 2004-06-04 | 2010-09-14 | Carl Zeiss Smt Ag | System for measuring the image quality of an optical imaging system |
| CN105467775B (zh) | 2004-06-09 | 2018-04-10 | 株式会社尼康 | 曝光装置及元件制造方法 |
| US7463330B2 (en) | 2004-07-07 | 2008-12-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| DE602005016429D1 (de) | 2004-07-12 | 2009-10-15 | Nippon Kogaku Kk | Hren |
| US8305553B2 (en) | 2004-08-18 | 2012-11-06 | Nikon Corporation | Exposure apparatus and device manufacturing method |
| US7701550B2 (en) | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7397533B2 (en) | 2004-12-07 | 2008-07-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP2506289A3 (en) | 2005-01-31 | 2013-05-22 | Nikon Corporation | Exposure apparatus and method for manufacturing device |
| US8692973B2 (en) | 2005-01-31 | 2014-04-08 | Nikon Corporation | Exposure apparatus and method for producing device |
| US7282701B2 (en) | 2005-02-28 | 2007-10-16 | Asml Netherlands B.V. | Sensor for use in a lithographic apparatus |
| USRE43576E1 (en) | 2005-04-08 | 2012-08-14 | Asml Netherlands B.V. | Dual stage lithographic apparatus and device manufacturing method |
| WO2007071569A1 (en) * | 2005-12-23 | 2007-06-28 | Carl Zeiss Smt Ag | Projection objective of a microlithographic projection exposure apparatus |
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| US7649612B2 (en) * | 2006-01-27 | 2010-01-19 | Chartered Semiconductor Manufacturing Ltd. | Phase shifting photolithography system |
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| EP1852745A1 (en) | 2006-05-05 | 2007-11-07 | Carl Zeiss SMT AG | High-NA projection objective |
| DE102006028222A1 (de) * | 2006-06-14 | 2007-12-27 | Carl Zeiss Smt Ag | Verfahren zum Betreiben von Projektionsbelichtungsanlagen und Verwendung eines Projektionsobjektivs |
| EP1890191A1 (en) * | 2006-08-14 | 2008-02-20 | Carl Zeiss SMT AG | Catadioptric projection objective with pupil mirror |
| EP1906251A1 (en) | 2006-09-26 | 2008-04-02 | Carl Zeiss SMT AG | Projection exposure method and projection exposure system |
| EP1950594A1 (de) | 2007-01-17 | 2008-07-30 | Carl Zeiss SMT AG | Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik |
| DE102007033967A1 (de) * | 2007-07-19 | 2009-01-29 | Carl Zeiss Smt Ag | Projektionsobjektiv |
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| US9205734B1 (en) | 2011-10-06 | 2015-12-08 | XL Hybrids | Motor integration assembly |
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| US9651872B2 (en) | 2013-03-13 | 2017-05-16 | Carl Zeiss Smt Gmbh | Projection lens with wavefront manipulator |
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| TWI831849B (zh) * | 2018-12-07 | 2024-02-11 | 日商索尼股份有限公司 | 圖像顯示裝置及投射光學系統 |
| DE102021202847A1 (de) | 2021-03-24 | 2022-09-29 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für eine Projektionsbelichtungsanlage für die Lithografie |
| US12253804B2 (en) | 2021-12-13 | 2025-03-18 | Changxin Memory Technologies, Inc. | Method of forming photoresist pattern and projection exposure apparatus |
| CN116263565A (zh) * | 2021-12-13 | 2023-06-16 | 长鑫存储技术有限公司 | 光刻胶图案的形成方法和投影式曝光装置 |
| DE102022205272A1 (de) * | 2022-05-25 | 2023-11-30 | Carl Zeiss Smt Gmbh | Katadioptrisches Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren |
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-
2005
- 2005-03-22 WO PCT/EP2005/003032 patent/WO2005098504A1/en not_active Ceased
- 2005-03-22 US US11/578,098 patent/US7712905B2/en not_active Expired - Fee Related
- 2005-04-07 US US11/578,100 patent/US7446952B2/en not_active Expired - Lifetime
- 2005-04-07 WO PCT/EP2005/003646 patent/WO2005098506A1/en not_active Ceased
- 2005-04-07 EP EP05736862A patent/EP1733272A1/en not_active Withdrawn
- 2005-04-07 KR KR1020067023338A patent/KR100991584B1/ko not_active Expired - Fee Related
- 2005-04-07 WO PCT/EP2005/003645 patent/WO2005098505A1/en not_active Ceased
- 2005-04-07 CN CN200580018858XA patent/CN1965259B/zh not_active Expired - Fee Related
- 2005-04-07 US US11/578,101 patent/US8363315B2/en not_active Expired - Fee Related
- 2005-04-07 EP EP05730864A patent/EP1733271A1/en not_active Withdrawn
- 2005-04-07 JP JP2007506723A patent/JP4801047B2/ja not_active Expired - Fee Related
- 2005-04-07 JP JP2007506724A patent/JP2007532938A/ja active Pending
-
2012
- 2012-12-17 US US13/717,439 patent/US20130120728A1/en not_active Abandoned
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