JP2002277742A5 - - Google Patents

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Publication number
JP2002277742A5
JP2002277742A5 JP2001309516A JP2001309516A JP2002277742A5 JP 2002277742 A5 JP2002277742 A5 JP 2002277742A5 JP 2001309516 A JP2001309516 A JP 2001309516A JP 2001309516 A JP2001309516 A JP 2001309516A JP 2002277742 A5 JP2002277742 A5 JP 2002277742A5
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JP
Japan
Prior art keywords
optical system
imaging optical
catadioptric
imaging
reflecting
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Granted
Application number
JP2001309516A
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English (en)
Japanese (ja)
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JP2002277742A (ja
JP4245286B2 (ja
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Priority claimed from JP2001309516A external-priority patent/JP4245286B2/ja
Priority to JP2001309516A priority Critical patent/JP4245286B2/ja
Priority to CNB018178618A priority patent/CN100460921C/zh
Priority to PCT/JP2001/009266 priority patent/WO2002035273A1/ja
Priority to US10/399,716 priority patent/US7030965B2/en
Priority to EP01976807A priority patent/EP1336887A4/en
Priority to AU2001295994A priority patent/AU2001295994A1/en
Priority to TW090126179A priority patent/TW529080B/zh
Priority to KR1020037005588A priority patent/KR100799418B1/ko
Publication of JP2002277742A publication Critical patent/JP2002277742A/ja
Publication of JP2002277742A5 publication Critical patent/JP2002277742A5/ja
Publication of JP4245286B2 publication Critical patent/JP4245286B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001309516A 2000-10-23 2001-10-05 反射屈折光学系および該光学系を備えた露光装置 Expired - Fee Related JP4245286B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2001309516A JP4245286B2 (ja) 2000-10-23 2001-10-05 反射屈折光学系および該光学系を備えた露光装置
TW090126179A TW529080B (en) 2000-10-23 2001-10-23 Reflection and refraction optical system and exposure device having this system
PCT/JP2001/009266 WO2002035273A1 (en) 2000-10-23 2001-10-23 Catadioptric system and exposure device having this system
US10/399,716 US7030965B2 (en) 2000-10-23 2001-10-23 Catadioptric system and exposure device having this system
EP01976807A EP1336887A4 (en) 2000-10-23 2001-10-23 CATADIOPTRIC SYSTEM AND EXPOSURE DEVICE PROVIDED WITH SAID SYSTEM
AU2001295994A AU2001295994A1 (en) 2000-10-23 2001-10-23 Catadioptric system and exposure device having this system
CNB018178618A CN100460921C (zh) 2000-10-23 2001-10-23 折射反射光学系统和具有该折射反射光学系统的曝光装置
KR1020037005588A KR100799418B1 (ko) 2000-10-23 2001-10-23 반사굴절광학계 및 이 광학계를 구비한 노광장치

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000-322068 2000-10-23
JP2000322068 2000-10-23
JP2001-3200 2001-01-11
JP2001003200 2001-01-11
JP2001309516A JP4245286B2 (ja) 2000-10-23 2001-10-05 反射屈折光学系および該光学系を備えた露光装置

Publications (3)

Publication Number Publication Date
JP2002277742A JP2002277742A (ja) 2002-09-25
JP2002277742A5 true JP2002277742A5 (enExample) 2005-08-04
JP4245286B2 JP4245286B2 (ja) 2009-03-25

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001309516A Expired - Fee Related JP4245286B2 (ja) 2000-10-23 2001-10-05 反射屈折光学系および該光学系を備えた露光装置

Country Status (8)

Country Link
US (1) US7030965B2 (enExample)
EP (1) EP1336887A4 (enExample)
JP (1) JP4245286B2 (enExample)
KR (1) KR100799418B1 (enExample)
CN (1) CN100460921C (enExample)
AU (1) AU2001295994A1 (enExample)
TW (1) TW529080B (enExample)
WO (1) WO2002035273A1 (enExample)

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EP1746463A2 (de) 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
US7738188B2 (en) * 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
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EP1852745A1 (en) * 2006-05-05 2007-11-07 Carl Zeiss SMT AG High-NA projection objective
EP1890191A1 (en) 2006-08-14 2008-02-20 Carl Zeiss SMT AG Catadioptric projection objective with pupil mirror
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US7929114B2 (en) 2007-01-17 2011-04-19 Carl Zeiss Smt Gmbh Projection optics for microlithography
WO2008104192A1 (en) * 2007-02-28 2008-09-04 Carl Zeiss Smt Ag Catadioptric projection objective with pupil correction
US20080259304A1 (en) * 2007-04-20 2008-10-23 Asml Netherlands B.V. Lithographic apparatus and method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
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CN105807410B (zh) * 2014-12-31 2018-11-09 上海微电子装备（集团）股份有限公司 一种基于高数值孔径的折反射式投影物镜
JP2015132843A (ja) * 2015-03-02 2015-07-23 株式会社ニコン 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP6358242B2 (ja) * 2015-11-30 2018-07-18 株式会社ニコン 露光装置、露光方法、デバイス製造方法およびパターン形成方法
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CN108152940B (zh) * 2016-12-05 2021-04-27 佳能株式会社 反射折射光学系统、照明光学系统、曝光装置
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