JPH09329742A5 - - Google Patents

Info

Publication number
JPH09329742A5
JPH09329742A5 JP1996170609A JP17060996A JPH09329742A5 JP H09329742 A5 JPH09329742 A5 JP H09329742A5 JP 1996170609 A JP1996170609 A JP 1996170609A JP 17060996 A JP17060996 A JP 17060996A JP H09329742 A5 JPH09329742 A5 JP H09329742A5
Authority
JP
Japan
Prior art keywords
optical system
aberration correction
power
correction optical
telecentric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996170609A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09329742A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8170609A priority Critical patent/JPH09329742A/ja
Priority claimed from JP8170609A external-priority patent/JPH09329742A/ja
Publication of JPH09329742A publication Critical patent/JPH09329742A/ja
Publication of JPH09329742A5 publication Critical patent/JPH09329742A5/ja
Pending legal-status Critical Current

Links

JP8170609A 1996-06-10 1996-06-10 光学系の収差補正方法および収差補正光学系を備えた投影露光装置 Pending JPH09329742A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8170609A JPH09329742A (ja) 1996-06-10 1996-06-10 光学系の収差補正方法および収差補正光学系を備えた投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8170609A JPH09329742A (ja) 1996-06-10 1996-06-10 光学系の収差補正方法および収差補正光学系を備えた投影露光装置

Publications (2)

Publication Number Publication Date
JPH09329742A JPH09329742A (ja) 1997-12-22
JPH09329742A5 true JPH09329742A5 (enExample) 2004-11-04

Family

ID=15908033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8170609A Pending JPH09329742A (ja) 1996-06-10 1996-06-10 光学系の収差補正方法および収差補正光学系を備えた投影露光装置

Country Status (1)

Country Link
JP (1) JPH09329742A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001023933A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
WO2001023935A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
JP2002287023A (ja) 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
WO2005001544A1 (ja) * 2003-06-26 2005-01-06 Nikon Corporation 光学ユニット、結像光学系、結像光学系の収差調整方法、投影光学系、投影光学系の製造方法、露光装置、および露光方法
EP2048540A1 (en) * 2007-10-09 2009-04-15 Carl Zeiss SMT AG Microlithographic projection exposure apparatus
CN113974957B (zh) * 2021-11-02 2023-11-17 北京鹰瞳科技发展股份有限公司 用于眼底按摩装置的镜筒和眼底按摩装置

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