JP2007502019A5 - - Google Patents

Download PDF

Info

Publication number
JP2007502019A5
JP2007502019A5 JP2006522918A JP2006522918A JP2007502019A5 JP 2007502019 A5 JP2007502019 A5 JP 2007502019A5 JP 2006522918 A JP2006522918 A JP 2006522918A JP 2006522918 A JP2006522918 A JP 2006522918A JP 2007502019 A5 JP2007502019 A5 JP 2007502019A5
Authority
JP
Japan
Prior art keywords
objective lens
mirrors
curved mirror
lens
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006522918A
Other languages
English (en)
Japanese (ja)
Other versions
JP5036311B2 (ja
JP2007502019A (ja
Filing date
Publication date
Priority claimed from US10/639,780 external-priority patent/US7085075B2/en
Application filed filed Critical
Publication of JP2007502019A publication Critical patent/JP2007502019A/ja
Publication of JP2007502019A5 publication Critical patent/JP2007502019A5/ja
Application granted granted Critical
Publication of JP5036311B2 publication Critical patent/JP5036311B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2006522918A 2003-08-12 2004-07-16 ミラーｍ３の前にレンズを伴う複数のミラーを含む投影対物レンズ Expired - Fee Related JP5036311B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/639,780 US7085075B2 (en) 2003-08-12 2003-08-12 Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
US10/639,780 2003-08-12
PCT/EP2004/007910 WO2005015283A1 (en) 2003-08-12 2004-07-16 Projection objectives including a plurality of curved mirrors with lenses ahead of the last but one mirror

Publications (3)

Publication Number Publication Date
JP2007502019A JP2007502019A (ja) 2007-02-01
JP2007502019A5 true JP2007502019A5 (enExample) 2007-08-16
JP5036311B2 JP5036311B2 (ja) 2012-09-26

Family

ID=34135943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006522918A Expired - Fee Related JP5036311B2 (ja) 2003-08-12 2004-07-16 ミラーｍ３の前にレンズを伴う複数のミラーを含む投影対物レンズ

Country Status (5)

Country Link
US (2) US7085075B2 (enExample)
EP (1) EP1654577A1 (enExample)
JP (1) JP5036311B2 (enExample)
TW (1) TW200508818A (enExample)
WO (1) WO2005015283A1 (enExample)

Families Citing this family (136)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
SG2010050110A (en) * 2002-11-12 2014-06-27 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7372541B2 (en) * 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI251127B (en) 2002-11-12 2006-03-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN1723541B (zh) * 2002-12-10 2010-06-02 株式会社尼康 曝光装置和器件制造方法
US7948604B2 (en) * 2002-12-10 2011-05-24 Nikon Corporation Exposure apparatus and method for producing device
US7242455B2 (en) * 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
EP1571698A4 (en) * 2002-12-10 2006-06-21 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD FOR PRODUCING COMPONENTS
JP4352874B2 (ja) * 2002-12-10 2009-10-28 株式会社ニコン 露光装置及びデバイス製造方法
CN101872135B (zh) * 2002-12-10 2013-07-31 株式会社尼康 曝光设备和器件制造法
SG171468A1 (en) * 2002-12-10 2011-06-29 Nikon Corp Exposure apparatus and method for producing device
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
JP4223936B2 (ja) 2003-02-06 2009-02-12 株式会社リコー 投射光学系、拡大投射光学系、拡大投射装置及び画像投射装置
KR101506408B1 (ko) * 2003-02-26 2015-03-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
EP1610361B1 (en) 2003-03-25 2014-05-21 Nikon Corporation Exposure system and device production method
KR101176817B1 (ko) * 2003-04-07 2012-08-24 가부시키가이샤 니콘 노광장치 및 디바이스 제조방법
WO2004093159A2 (en) 2003-04-09 2004-10-28 Nikon Corporation Immersion lithography fluid control system
WO2004093160A2 (en) 2003-04-10 2004-10-28 Nikon Corporation Run-off path to collect liquid for an immersion lithography apparatus
JP4656057B2 (ja) * 2003-04-10 2011-03-23 株式会社ニコン 液浸リソグラフィ装置用電気浸透素子
EP3062152B1 (en) * 2003-04-10 2017-12-20 Nikon Corporation Environmental system including vaccum scavenge for an immersion lithography apparatus
KR20180089562A (ko) * 2003-04-10 2018-08-08 가부시키가이샤 니콘 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템
JP4315198B2 (ja) * 2003-04-11 2009-08-19 株式会社ニコン 液浸液体を光学アセンブリ下に維持するリソグラフィ装置及び液浸液体維持方法並びにそれらを用いるデバイス製造方法
KR101324818B1 (ko) * 2003-04-11 2013-11-01 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
JP4582089B2 (ja) 2003-04-11 2010-11-17 株式会社ニコン 液浸リソグラフィ用の液体噴射回収システム
CN1774667A (zh) 2003-04-17 2006-05-17 株式会社尼康 用在浸没式平版印刷方法中自动聚焦部件的光学配置
EP2722703A3 (en) 2003-05-06 2014-07-23 Nikon Corporation Projection optical system, and exposure apparatus and exposure method
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
WO2004102646A1 (ja) * 2003-05-15 2004-11-25 Nikon Corporation 露光装置及びデバイス製造方法
TWI511181B (zh) * 2003-05-23 2015-12-01 尼康股份有限公司 Exposure method and exposure apparatus, and device manufacturing method
TWI518742B (zh) * 2003-05-23 2016-01-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
KR20180122033A (ko) * 2003-05-28 2018-11-09 가부시키가이샤 니콘 노광 방법, 노광 장치, 및 디바이스 제조 방법
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2261742A3 (en) * 2003-06-11 2011-05-25 ASML Netherlands BV Lithographic apparatus and device manufacturing method.
US7317504B2 (en) * 2004-04-08 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI409853B (zh) 2003-06-13 2013-09-21 尼康股份有限公司 An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method
DE602004024782D1 (de) * 2003-06-19 2010-02-04 Nippon Kogaku Kk Belichtungseinrichtung und bauelementeherstellungsverfahren
WO2005006026A2 (en) * 2003-07-01 2005-01-20 Nikon Corporation Using isotopically specified fluids as optical elements
EP3179309A1 (en) * 2003-07-08 2017-06-14 Nikon Corporation Wafer table for immersion lithography
WO2005006418A1 (ja) * 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
DE602004030247D1 (de) * 2003-07-09 2011-01-05 Nippon Kogaku Kk Belichtungsvorrichtung und verfahren zur bauelementherstellung
WO2005006415A1 (ja) 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
EP1650787A4 (en) 2003-07-25 2007-09-19 Nikon Corp INVESTIGATION METHOD AND INVESTIGATION DEVICE FOR AN OPTICAL PROJECTION SYSTEM AND METHOD OF MANUFACTURING AN OPTICAL PROJECTION SYSTEM
US7175968B2 (en) * 2003-07-28 2007-02-13 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a substrate
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
KR101641011B1 (ko) * 2003-07-28 2016-07-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법
US7326522B2 (en) 2004-02-11 2008-02-05 Asml Netherlands B.V. Device manufacturing method and a substrate
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101419192B1 (ko) * 2003-08-29 2014-07-15 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101288140B1 (ko) * 2003-09-03 2013-07-19 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
WO2005029559A1 (ja) * 2003-09-19 2005-03-31 Nikon Corporation 露光装置及びデバイス製造方法
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
KR101743378B1 (ko) * 2003-09-29 2017-06-15 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
JP2005136364A (ja) * 2003-10-08 2005-05-26 Zao Nikon Co Ltd 基板搬送装置、露光装置、並びにデバイス製造方法
KR101111364B1 (ko) 2003-10-08 2012-02-27 가부시키가이샤 자오 니콘 기판 반송 장치 및 기판 반송 방법, 노광 장치 및 노광방법, 디바이스 제조 방법
WO2005036623A1 (ja) 2003-10-08 2005-04-21 Zao Nikon Co., Ltd. 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法
TWI553701B (zh) 2003-10-09 2016-10-11 尼康股份有限公司 Exposure apparatus and exposure method, component manufacturing method
US7411653B2 (en) * 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
US7352433B2 (en) 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4295712B2 (ja) 2003-11-14 2009-07-15 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及び装置製造方法
TWI605315B (zh) 2003-12-03 2017-11-11 尼康股份有限公司 Exposure device, exposure method, and device manufacturing method
KR101941351B1 (ko) 2003-12-15 2019-01-22 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 및 노광 방법
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
US20070081133A1 (en) * 2004-12-14 2007-04-12 Niikon Corporation Projection exposure apparatus and stage unit, and exposure method
KR101111363B1 (ko) * 2003-12-15 2012-04-12 가부시키가이샤 니콘 투영노광장치 및 스테이지 장치, 그리고 노광방법
JP5102492B2 (ja) * 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
US7394521B2 (en) * 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5420821B2 (ja) 2004-01-14 2014-02-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射屈折投影対物レンズ
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
WO2005071491A2 (en) * 2004-01-20 2005-08-04 Carl Zeiss Smt Ag Exposure apparatus and measuring device for a projection lens
US7589822B2 (en) * 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR101276392B1 (ko) 2004-02-03 2013-06-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101504445B1 (ko) 2004-03-25 2015-03-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
WO2005098504A1 (en) 2004-04-08 2005-10-20 Carl Zeiss Smt Ag Imaging system with mirror group
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8054448B2 (en) * 2004-05-04 2011-11-08 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7616383B2 (en) * 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7796274B2 (en) 2004-06-04 2010-09-14 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
KR101162128B1 (ko) * 2004-06-09 2012-07-03 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US20080273185A1 (en) * 2004-06-16 2008-11-06 Nikon Corporation Optical System, Exposing Apparatus and Exposing Method
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8384874B2 (en) * 2004-07-12 2013-02-26 Nikon Corporation Immersion exposure apparatus and device manufacturing method to detect if liquid on base member
US7511798B2 (en) * 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
US8305553B2 (en) * 2004-08-18 2012-11-06 Nikon Corporation Exposure apparatus and device manufacturing method
US7701550B2 (en) * 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) * 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7880860B2 (en) * 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE602006012746D1 (de) 2005-01-14 2010-04-22 Asml Netherlands Bv Lithografische Vorrichtung und Herstellungsverfahren
SG124351A1 (en) 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US8692973B2 (en) * 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
EP3079164A1 (en) * 2005-01-31 2016-10-12 Nikon Corporation Exposure apparatus and method for producing device
US20060198018A1 (en) * 2005-02-04 2006-09-07 Carl Zeiss Smt Ag Imaging system
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
KR101890082B1 (ko) * 2005-06-02 2018-08-20 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
US7666226B2 (en) * 2005-08-16 2010-02-23 Benvenue Medical, Inc. Spinal tissue distraction devices
TWI451125B (zh) * 2005-09-13 2014-09-01 卡爾蔡司Ｓｍｔ有限公司 顯微蝕刻投影光學系統、包含此一光學系統之顯微蝕刻工具、使用此一顯微蝕刻工具於顯微蝕刻生產微結構元件之方法、藉此一方法所生產之微結構元件以及於此一光學系統中設計一光學表面的方法
US7357768B2 (en) * 2005-09-22 2008-04-15 William Marshall Recliner exerciser
US20070124987A1 (en) * 2005-12-05 2007-06-07 Brown Jeffrey K Electronic pest control apparatus
KR100768849B1 (ko) * 2005-12-06 2007-10-22 엘지전자 주식회사 계통 연계형 연료전지 시스템의 전원공급장치 및 방법
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102006014380A1 (de) 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
WO2007115597A1 (en) 2006-04-07 2007-10-18 Carl Zeiss Smt Ag Microlithography projection optical system, tool and method of production
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
US8817226B2 (en) 2007-02-15 2014-08-26 Asml Holding N.V. Systems and methods for insitu lens cleaning using ozone in immersion lithography
US8654305B2 (en) * 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
TWI389551B (zh) * 2007-08-09 2013-03-11 晨星半導體股份有限公司 迦瑪校正裝置
KR101448152B1 (ko) * 2008-03-26 2014-10-07 삼성전자주식회사 수직 포토게이트를 구비한 거리측정 센서 및 그를 구비한입체 컬러 이미지 센서
US9176393B2 (en) 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
CA2784148A1 (en) * 2009-12-28 2011-07-28 Pioneer Hi-Bred International, Inc. Sorghum fertility restorer genotypes and methods of marker-assisted selection
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
TW201348689A (zh) * 2012-05-23 2013-12-01 Altek Corp 遠景檢測裝置及其遠景檢測方法
CN103424979A (zh) * 2012-05-23 2013-12-04 华晶科技股份有限公司 远景检测装置及其远景检测方法
US10139595B1 (en) 2014-03-16 2018-11-27 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio
US9316820B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low astigmatism
US9316808B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US9494772B1 (en) 2014-03-16 2016-11-15 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low field curvature
US9091843B1 (en) 2014-03-16 2015-07-28 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low track length to focal length ratio
US10545314B1 (en) 2014-03-16 2020-01-28 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration
US9995910B1 (en) 2014-03-16 2018-06-12 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with high MTF
US9726859B1 (en) 2014-03-16 2017-08-08 Navitar Industries, Llc Optical assembly for a wide field of view camera with low TV distortion
US10386604B1 (en) 2014-03-16 2019-08-20 Navitar Industries, Llc Compact wide field of view digital camera with stray light impact suppression
CN104062746B (zh) * 2014-06-23 2016-08-24 中国科学院光电技术研究所 一种大数值孔径的折反射浸没投影光学系统
CN105807410B (zh) * 2014-12-31 2018-11-09 上海微电子装备（集团）股份有限公司 一种基于高数值孔径的折反射式投影物镜
US9835835B1 (en) 2015-04-10 2017-12-05 Navitar Industries, Llc Projection zoom lens and camera
DE102016209847A1 (de) 2016-06-03 2016-07-28 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit optischer Korrekturenanordnung und Verfahren zum Betrieb einer Projektionsbelichtungsanlage
JP6882053B2 (ja) * 2016-12-05 2021-06-02 キヤノン株式会社 カタディオプトリック光学系、照明光学系、露光装置および物品製造方法
US11043239B2 (en) 2019-03-20 2021-06-22 Kla Corporation Magneto-optic Kerr effect metrology systems
US11650487B2 (en) * 2020-01-28 2023-05-16 Daniel Joseph Reiley Front converter optical assembly for camera
CN113627344B (zh) * 2021-08-11 2025-02-25 上海乐闪闪智能科技有限公司 双重生物特征检测系统、安全识别方法、应用及电子设备

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0023231B1 (de) 1979-07-27 1982-08-11 Tabarelli, Werner, Dr. Optisches Lithographieverfahren und Einrichtung zum Kopieren eines Musters auf eine Halbleiterscheibe
US4346164A (en) 1980-10-06 1982-08-24 Werner Tabarelli Photolithographic method for the manufacture of integrated circuits
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
US4469414A (en) * 1982-06-01 1984-09-04 The Perkin-Elmer Corporation Restrictive off-axis field optical system
US4695464A (en) * 1984-10-09 1987-09-22 The Dow Chemical Company Sustained release dosage form based on highly plasticized cellulose ether gels
JPS61156737A (ja) * 1984-12-27 1986-07-16 Canon Inc 回路の製造方法及び露光装置
US5052763A (en) * 1990-08-28 1991-10-01 International Business Machines Corporation Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
US5537260A (en) * 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
US5323263A (en) * 1993-02-01 1994-06-21 Nikon Precision Inc. Off-axis catadioptric projection system
US5592329A (en) * 1993-02-03 1997-01-07 Nikon Corporation Catadioptric optical system
JP3690819B2 (ja) * 1993-02-03 2005-08-31 株式会社ニコン 投影光学系、それを用いた露光装置及び露光方法
JPH06235863A (ja) * 1993-02-12 1994-08-23 Nikon Corp 反射屈折光学系
US5515207A (en) * 1993-11-03 1996-05-07 Nikon Precision Inc. Multiple mirror catadioptric optical system
JP3395801B2 (ja) * 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
DE4417489A1 (de) * 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
US5815310A (en) * 1995-12-12 1998-09-29 Svg Lithography Systems, Inc. High numerical aperture ring field optical reduction system
JPH103041A (ja) * 1996-06-14 1998-01-06 Nikon Corp 反射屈折縮小光学系
JPH1020195A (ja) * 1996-06-28 1998-01-23 Nikon Corp 反射屈折光学系
US6169627B1 (en) * 1996-09-26 2001-01-02 Carl-Zeiss-Stiftung Catadioptric microlithographic reduction objective
DE19639586A1 (de) * 1996-09-26 1998-04-02 Zeiss Carl Fa Katadioptrisches Mikrolithographie-Reduktionsobjektiv
DE10002626A1 (de) 2000-01-22 2001-07-26 Zeiss Carl Katadioptrisches Objektiv mit Asphären
US6631036B2 (en) 1996-09-26 2003-10-07 Carl-Zeiss-Stiftung Catadioptric objective
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
EP1293830A1 (en) * 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
EP1772775B1 (de) * 1999-02-15 2008-11-05 Carl Zeiss SMT AG Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
EP1242843B1 (de) * 1999-12-29 2006-03-22 Carl Zeiss SMT AG Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
JP2001228401A (ja) * 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
KR20010113527A (ko) 2000-06-19 2001-12-28 시마무라 테루오 투영 광학계, 그 제조 방법 및 투영 노광 장치
JP4245286B2 (ja) * 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
JP2004514943A (ja) * 2000-11-28 2004-05-20 カール・ツアイス・エスエムテイ・アーゲー １５７ｎｍリソグラフィ用の反射屈折投影系
US7333245B2 (en) * 2001-07-16 2008-02-19 Hewlett-Packard Development Company, L.P. System and method for printing retained print jobs
JP2003114387A (ja) 2001-10-04 2003-04-18 Nikon Corp 反射屈折光学系および該光学系を備える投影露光装置
US20040075894A1 (en) * 2001-12-10 2004-04-22 Shafer David R. Catadioptric reduction objective
EP2722703A3 (en) 2003-05-06 2014-07-23 Nikon Corporation Projection optical system, and exposure apparatus and exposure method

Similar Documents

Publication Publication Date Title
US7006304B2 (en) Catadioptric reduction lens
JP5036311B2 (ja) ミラーｍ３の前にレンズを伴う複数のミラーを含む投影対物レンズ
US7834981B2 (en) Projection exposure apparatus, projection exposure method and projection objective
JP2007532937A5 (enExample)
JP2008033365A (ja) マイクロリソグラフィ用投影露光装置のｒｅｍａ対物レンズ
JP2003114387A5 (enExample)
KR960024506A (ko) 반사굴절 광학계
JP2004214242A5 (enExample)
JP2002277742A5 (enExample)
EP1059550A4 (en) REFRACTION REFLECTION IMAGE FORMING SYSTEM AND PROJECTION EXPOSURE APPARATUS INCLUDING THE OPTICAL SYSTEM
TW533322B (en) Catadioptric objective with physical beam splitter
US5303001A (en) Illumination system for half-field dyson stepper
JP2001297980A (ja) マイクロリソグラフィーの投影露光装置
JP2011517786A5 (enExample)
JP2003107354A (ja) 結像光学系および露光装置
US9146475B2 (en) Projection exposure system and projection exposure method
JP2014534643A5 (enExample)
JP2007531024A5 (enExample)
KR100328391B1 (ko) 투영광원
EP1983362A4 (en) CATADIOPRIC IMAGING SYSTEM, EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD
JP2002244046A5 (enExample)
US9733395B2 (en) Microlithographic projection exposure apparatus
CN216145078U (zh) 一种用于投影光刻机的透镜系统
JP2008533709A5 (enExample)
JP2024522609A5 (enExample)