JP2004525527A5 - - Google Patents

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Publication number
JP2004525527A5
JP2004525527A5 JP2002589877A JP2002589877A JP2004525527A5 JP 2004525527 A5 JP2004525527 A5 JP 2004525527A5 JP 2002589877 A JP2002589877 A JP 2002589877A JP 2002589877 A JP2002589877 A JP 2002589877A JP 2004525527 A5 JP2004525527 A5 JP 2004525527A5
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JP
Japan
Prior art keywords
projection
projection lens
lens
birefringence
image plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002589877A
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English (en)
Japanese (ja)
Other versions
JP2004525527A (ja
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Publication date
Priority claimed from DE10123725A external-priority patent/DE10123725A1/de
Application filed filed Critical
Publication of JP2004525527A publication Critical patent/JP2004525527A/ja
Publication of JP2004525527A5 publication Critical patent/JP2004525527A5/ja
Pending legal-status Critical Current

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JP2002589877A 2001-05-15 2002-05-04 マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法 Pending JP2004525527A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10123725A DE10123725A1 (de) 2001-05-15 2001-05-15 Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
PCT/EP2002/004900 WO2002093257A2 (de) 2001-05-15 2002-05-04 Projektionsbelichtungsanlage der mikrolithographie,

Publications (2)

Publication Number Publication Date
JP2004525527A JP2004525527A (ja) 2004-08-19
JP2004525527A5 true JP2004525527A5 (enExample) 2005-12-22

Family

ID=7684936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002589877A Pending JP2004525527A (ja) 2001-05-15 2002-05-04 マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法

Country Status (7)

Country Link
US (3) US6879379B2 (enExample)
EP (1) EP1390813A2 (enExample)
JP (1) JP2004525527A (enExample)
KR (1) KR20030019577A (enExample)
DE (1) DE10123725A1 (enExample)
TW (1) TWI266149B (enExample)
WO (1) WO2002093257A2 (enExample)

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DE10324477A1 (de) * 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
DE10328938A1 (de) * 2003-06-27 2005-01-20 Carl Zeiss Smt Ag Korrektureinrichtung zur Kompensation von Störungen der Polarisationsverteilung sowie Projektionsobjektiv für die Mikrolithografie
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TWI612338B (zh) 2003-11-20 2018-01-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
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US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
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WO2005059645A2 (en) 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
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TWI614795B (zh) 2004-02-06 2018-02-11 Nikon Corporation 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
DE102004011733A1 (de) 2004-03-04 2005-09-22 Carl Zeiss Smt Ag Transmissionsfiltervorrichtung
US8212988B2 (en) * 2004-08-06 2012-07-03 Carl Zeiss GmbH Projection objective for microlithography
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DE102006021334B3 (de) * 2006-05-05 2007-08-30 Carl Zeiss Smt Ag Polarisationsbeeinflussendes optisches Element sowie Verfahren zu dessen Herstellung sowie optisches System und mikrolithographische Projektionsbelichtungsanlage mit einem solchen Element
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DE102006034755A1 (de) * 2006-07-24 2008-01-31 Carl Zeiss Smt Ag Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung
DE102006047665A1 (de) * 2006-09-28 2008-04-03 Carl Zeiss Smt Ag Optisches System für eine Mikrolithographieanlage mit verbesserten Abbildungseigenschaften und Verfahren zum Verbessern der Abbildungseigenschaften des optischen Systems
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DE102008054818A1 (de) 2008-01-29 2009-07-30 Carl Zeiss Smt Ag Verfahren zum Manipulieren eines optischen Systems, sowie optisches System
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DE102016215540A1 (de) * 2016-08-18 2018-02-22 Carl Zeiss Smt Gmbh Optisches system, lithographieanlage sowie verfahren
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