KR20030019577A - 마이크로리토그래피 투사 조명 시설, 광학 시스템,마이크로리토그래피-렌즈 시스템의 제조 방법 및마이크로리토그래픽 구조화 방법 - Google Patents

마이크로리토그래피 투사 조명 시설, 광학 시스템,마이크로리토그래피-렌즈 시스템의 제조 방법 및마이크로리토그래픽 구조화 방법 Download PDF

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Publication number
KR20030019577A
KR20030019577A KR10-2003-7000622A KR20037000622A KR20030019577A KR 20030019577 A KR20030019577 A KR 20030019577A KR 20037000622 A KR20037000622 A KR 20037000622A KR 20030019577 A KR20030019577 A KR 20030019577A
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KR
South Korea
Prior art keywords
force
optical
optical element
optical system
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR10-2003-7000622A
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English (en)
Korean (ko)
Inventor
마르틴 브루노테
쥐르겐 하르트마이어
후베르트 홀더러
윈프리드 카이저
알렉산더 콜
젠스 쿠글레르
만프레드 마울
크리스챤 바그너
Original Assignee
칼 짜이스 세미컨덕터 매뉴팩츄어링 테크놀로지즈 악티엔게젤샤프트
짜이스, 칼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 세미컨덕터 매뉴팩츄어링 테크놀로지즈 악티엔게젤샤프트, 짜이스, 칼 filed Critical 칼 짜이스 세미컨덕터 매뉴팩츄어링 테크놀로지즈 악티엔게젤샤프트
Publication of KR20030019577A publication Critical patent/KR20030019577A/ko
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Lens Barrels (AREA)
KR10-2003-7000622A 2001-05-15 2002-05-04 마이크로리토그래피 투사 조명 시설, 광학 시스템,마이크로리토그래피-렌즈 시스템의 제조 방법 및마이크로리토그래픽 구조화 방법 Withdrawn KR20030019577A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10123725.1 2001-05-15
DE10123725A DE10123725A1 (de) 2001-05-15 2001-05-15 Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
PCT/EP2002/004900 WO2002093257A2 (de) 2001-05-15 2002-05-04 Projektionsbelichtungsanlage der mikrolithographie,

Publications (1)

Publication Number Publication Date
KR20030019577A true KR20030019577A (ko) 2003-03-06

Family

ID=7684936

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2003-7000622A Withdrawn KR20030019577A (ko) 2001-05-15 2002-05-04 마이크로리토그래피 투사 조명 시설, 광학 시스템,마이크로리토그래피-렌즈 시스템의 제조 방법 및마이크로리토그래픽 구조화 방법

Country Status (7)

Country Link
US (3) US6879379B2 (enExample)
EP (1) EP1390813A2 (enExample)
JP (1) JP2004525527A (enExample)
KR (1) KR20030019577A (enExample)
DE (1) DE10123725A1 (enExample)
TW (1) TWI266149B (enExample)
WO (1) WO2002093257A2 (enExample)

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US20050134967A1 (en) 2005-06-23
US6879379B2 (en) 2005-04-12
WO2002093257A2 (de) 2002-11-21
WO2002093257A3 (de) 2003-09-25
WO2002093257A8 (de) 2003-12-31
TWI266149B (en) 2006-11-11
US20040150806A1 (en) 2004-08-05
JP2004525527A (ja) 2004-08-19
US20050264786A1 (en) 2005-12-01
DE10123725A1 (de) 2002-11-21
EP1390813A2 (de) 2004-02-25

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