WO2002093257A2 - Projektionsbelichtungsanlage der mikrolithographie, - Google Patents
Projektionsbelichtungsanlage der mikrolithographie, Download PDFInfo
- Publication number
- WO2002093257A2 WO2002093257A2 PCT/EP2002/004900 EP0204900W WO02093257A2 WO 2002093257 A2 WO2002093257 A2 WO 2002093257A2 EP 0204900 W EP0204900 W EP 0204900W WO 02093257 A2 WO02093257 A2 WO 02093257A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- force introduction
- optical element
- optical
- optical system
- force
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
Definitions
- the invention relates to a projection exposure system of microlithography according to the preamble of claims 1 and 41, an optical system, in particular a microlithographic projection objective, according to the preamble of claims 9 and 12, a manufacturing method of a microlithography projection object according to the preamble of claim 42 as well as a microlithographic structuring method according to the preamble of claim 44.
- the object of the invention is therefore to provide a compensation of this disturbance by direction-dependent birefringence, with which even high-aperture projection lenses can be operated optimally.
- the voltage birefringence can be set by means of the piezo control unit 157.
- the contact body 385 is made of resilient material. On its side facing away from the lever body 379, the contact body 385 has a contact nose 389, which on the Chamfer surface 373 of the correction element 344 rests.
- the force introduction device 570 has a support ring 594, which is arranged coaxially with respect to the optical axis 571 around the peripheral surface 572 of the correction element 544.
- a plurality of piezo actuators 595 which are variable in length in the radial direction with respect to the optical axis 571, are supported on the inner lateral surface of the support ring 594.
- the piezo actuators 595 are connected to the control device 584 via control lines 583.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Lens Barrels (AREA)
Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2003-7000622A KR20030019577A (ko) | 2001-05-15 | 2002-05-04 | 마이크로리토그래피 투사 조명 시설, 광학 시스템,마이크로리토그래피-렌즈 시스템의 제조 방법 및마이크로리토그래픽 구조화 방법 |
JP2002589877A JP2004525527A (ja) | 2001-05-15 | 2002-05-04 | マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法 |
EP02769464A EP1390813A2 (de) | 2001-05-15 | 2002-05-04 | Projektionsbelichtungsanlage der mikrolithographie |
US10/714,573 US6879379B2 (en) | 2001-05-15 | 2003-11-14 | Projection lens and microlithographic projection exposure apparatus |
US10/906,737 US20050134967A1 (en) | 2001-05-15 | 2005-03-03 | Projection lens and microlithographic projection exposure apparatus |
US11/101,235 US7170585B2 (en) | 2001-05-15 | 2005-04-07 | Projection lens and microlithographic projection exposure apparatus |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10123725.1 | 2001-05-15 | ||
DE10123725A DE10123725A1 (de) | 2001-05-15 | 2001-05-15 | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/714,573 Continuation US6879379B2 (en) | 2001-05-15 | 2003-11-14 | Projection lens and microlithographic projection exposure apparatus |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2002093257A2 true WO2002093257A2 (de) | 2002-11-21 |
WO2002093257A3 WO2002093257A3 (de) | 2003-09-25 |
WO2002093257A8 WO2002093257A8 (de) | 2003-12-31 |
Family
ID=7684936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2002/004900 WO2002093257A2 (de) | 2001-05-15 | 2002-05-04 | Projektionsbelichtungsanlage der mikrolithographie, |
Country Status (7)
Country | Link |
---|---|
US (3) | US6879379B2 (de) |
EP (1) | EP1390813A2 (de) |
JP (1) | JP2004525527A (de) |
KR (1) | KR20030019577A (de) |
DE (1) | DE10123725A1 (de) |
TW (1) | TWI266149B (de) |
WO (1) | WO2002093257A2 (de) |
Cited By (20)
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US6754902B2 (en) * | 2002-04-03 | 2004-06-22 | Industrial Technology Research Institute | Driving mechanism for optical head of optical disc driver |
US6775063B2 (en) | 2001-07-10 | 2004-08-10 | Nikon Corporation | Optical system and exposure apparatus having the optical system |
US6831731B2 (en) | 2001-06-28 | 2004-12-14 | Nikon Corporation | Projection optical system and an exposure apparatus with the projection optical system |
US6844982B2 (en) | 2002-04-26 | 2005-01-18 | Nikon Corporation | Projection optical system, exposure system provided with the projection optical system, and exposure method using the projection optical system |
US6844915B2 (en) | 2001-08-01 | 2005-01-18 | Nikon Corporation | Optical system and exposure apparatus provided with the optical system |
US6870668B2 (en) | 2000-10-10 | 2005-03-22 | Nikon Corporation | Method for evaluating image formation performance |
US6917458B2 (en) | 2001-06-01 | 2005-07-12 | Asml Netherlands B.V. | Correction of birefringence in cubic crystalline optical systems |
WO2005071671A2 (en) * | 2004-01-16 | 2005-08-04 | Koninklijke Philips Electronics N.V. | Optical system |
US6958864B2 (en) | 2002-08-22 | 2005-10-25 | Asml Netherlands B.V. | Structures and methods for reducing polarization aberration in integrated circuit fabrication systems |
US6970232B2 (en) | 2001-10-30 | 2005-11-29 | Asml Netherlands B.V. | Structures and methods for reducing aberration in integrated circuit fabrication systems |
US6995908B2 (en) | 2001-10-30 | 2006-02-07 | Asml Netherlands B.V. | Methods for reducing aberration in optical systems |
EP1780570A2 (de) * | 2001-06-01 | 2007-05-02 | ASML Netherlands B.V. | Kompensation der Doppelbrechung in kubisch kristallinen Projektionslinsen und optischen Systemen |
WO2008012022A1 (de) | 2006-07-24 | 2008-01-31 | Carl Zeiss Smt Ag | Optische vorrichtung und verfahren zur korrektur bzw. verbesserung des abbildungsverhaltens einer solchen vorrichtung |
DE102006047665A1 (de) * | 2006-09-28 | 2008-04-03 | Carl Zeiss Smt Ag | Optisches System für eine Mikrolithographieanlage mit verbesserten Abbildungseigenschaften und Verfahren zum Verbessern der Abbildungseigenschaften des optischen Systems |
DE102007014587A1 (de) | 2007-03-23 | 2008-09-25 | Carl Zeiss Smt Ag | Doppelbrechende Verzögerungsplattenanordnung |
US7453641B2 (en) | 2001-10-30 | 2008-11-18 | Asml Netherlands B.V. | Structures and methods for reducing aberration in optical systems |
DE102008054818A1 (de) | 2008-01-29 | 2009-07-30 | Carl Zeiss Smt Ag | Verfahren zum Manipulieren eines optischen Systems, sowie optisches System |
US20100045952A1 (en) * | 2003-05-30 | 2010-02-25 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus |
US7940375B2 (en) | 2004-03-04 | 2011-05-10 | Carl Zeiss Smt Gmbh | Transmission filter apparatus |
US8854602B2 (en) * | 2003-11-24 | 2014-10-07 | Asml Netherlands B.V. | Holding device for an optical element in an objective |
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US7239447B2 (en) * | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
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US7460206B2 (en) * | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
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US8830580B2 (en) | 2011-10-27 | 2014-09-09 | Eastman Kodak Company | Low thermal stress catadioptric imaging optics |
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US10732336B2 (en) * | 2017-02-02 | 2020-08-04 | Corning Incorporated | Method of assembling optical systems and minimizing retardance distortions in optical assemblies |
Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4993823A (en) * | 1989-06-29 | 1991-02-19 | Eastman Kodak Company | Method for correction of distortions of an imaging device |
EP0480616A2 (de) * | 1990-10-08 | 1992-04-15 | Canon Kabushiki Kaisha | Projektionsbelichtungsapparat mit einer Vorrichtung zur Ausgleichung der Verzeichnung einer Projektionslinse |
EP0678768A2 (de) * | 1994-04-22 | 1995-10-25 | Canon Kabushiki Kaisha | Projektionsbelichtungsgerät und Herstellungsverfahren für eine Mikrovorrichtung |
DE19535392A1 (de) * | 1995-09-23 | 1997-03-27 | Zeiss Carl Fa | Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit |
DE19637563A1 (de) * | 1996-09-14 | 1998-03-19 | Zeiss Carl Fa | Doppelbrechende Planplattenanordnung und DUV-Viertelwellenplatte |
DE19807120A1 (de) * | 1998-02-20 | 1999-08-26 | Zeiss Carl Fa | Optisches System mit Polarisationskompensator |
EP0952490A2 (de) * | 1998-04-23 | 1999-10-27 | Canon Kabushiki Kaisha | Linsenfassung mit Element zum Ausrichten der Projektionsrichtung |
EP0961149A2 (de) * | 1998-05-29 | 1999-12-01 | Carl Zeiss | Katadioptrisches Projektionsobjektiv mit adaptivem Spiegel und Projektionsbelichtungsverfahren |
WO2000031592A1 (en) * | 1998-11-23 | 2000-06-02 | Koninklijke Philips Electronics N.V. | Method of detecting aberrations of an optical imaging system |
EP1014139A2 (de) * | 1998-12-23 | 2000-06-28 | Carl Zeiss | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie, mit einer optischen Halterung mit Aktuatoren |
JP2000331927A (ja) * | 1999-03-12 | 2000-11-30 | Canon Inc | 投影光学系及びそれを用いた投影露光装置 |
EP1063684A1 (de) * | 1999-01-06 | 2000-12-27 | Nikon Corporation | Optisches projektions-system, herstellungsmethode, und verwendung in einem belichtungsapparat |
US6201634B1 (en) * | 1998-03-12 | 2001-03-13 | Nikon Corporation | Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element |
EP1115030A2 (de) * | 2000-01-05 | 2001-07-11 | Carl Zeiss | Optisches System |
Family Cites Families (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1332410A (en) | 1919-03-22 | 1920-03-02 | Oscero W Potts | Lens and method of making the same |
JPS5949508A (ja) | 1982-09-14 | 1984-03-22 | Sony Corp | 複屈折板の製造方法 |
AU646249B2 (en) | 1990-03-15 | 1994-02-17 | Werner Fiala | Multifocal bi-refringent lens with matched bi-refringence |
JP2894808B2 (ja) | 1990-07-09 | 1999-05-24 | 旭光学工業株式会社 | 偏光を有する光学系 |
JP3534363B2 (ja) | 1995-07-31 | 2004-06-07 | パイオニア株式会社 | 結晶レンズ及びこれを用いた光ピックアップ光学系 |
JP3623032B2 (ja) | 1995-12-15 | 2005-02-23 | フジノン佐野株式会社 | 複屈折板およびこれを用いた光学系 |
DE19704936A1 (de) | 1997-02-10 | 1998-08-13 | Zeiss Carl Fa | Optisches Glied und Herstellverfahren |
JP3413067B2 (ja) * | 1997-07-29 | 2003-06-03 | キヤノン株式会社 | 投影光学系及びそれを用いた投影露光装置 |
US6829041B2 (en) * | 1997-07-29 | 2004-12-07 | Canon Kabushiki Kaisha | Projection optical system and projection exposure apparatus having the same |
US6368763B2 (en) * | 1998-11-23 | 2002-04-09 | U.S. Philips Corporation | Method of detecting aberrations of an optical imaging system |
DE19942281A1 (de) | 1999-05-14 | 2000-11-16 | Zeiss Carl Fa | Projektionsobjektiv |
WO2001001182A1 (en) | 1999-06-25 | 2001-01-04 | Corning Incorporated | Birefringence minimizing fluoride crystal optical vuv microlithography lens elements and optical blanks therefor |
DE19929403A1 (de) | 1999-06-26 | 2000-12-28 | Zeiss Carl Fa | Objektiv, insbesondere Objektiv für eine Halbleiter-Lithographie-Projektionsbelichtungsanlage und Herstellungverfahren |
EP1139138A4 (de) | 1999-09-29 | 2006-03-08 | Nikon Corp | Projektionsbelichtungsverfahren, vorrichtung und optisches projektionssystem |
JP2001108801A (ja) | 1999-10-08 | 2001-04-20 | Tsuguo Fukuda | 真空紫外領域用光学部材および光学部材用コーティング材 |
DE50012452D1 (de) * | 1999-12-29 | 2006-05-11 | Zeiss Carl Smt Ag | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
US6397401B2 (en) * | 2000-05-02 | 2002-06-04 | Timothy A. Belcher | 2-layer firefighter garment |
US7239447B2 (en) * | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
JP2004531764A (ja) | 2001-05-16 | 2004-10-14 | コーニング インコーポレイテッド | 好ましい結晶方位をもつ立方晶系結晶材料光学素子 |
JP2003050349A (ja) | 2001-05-30 | 2003-02-21 | Nikon Corp | 光学系および該光学系を備えた露光装置 |
US6683710B2 (en) | 2001-06-01 | 2004-01-27 | Optical Research Associates | Correction of birefringence in cubic crystalline optical systems |
JP3639807B2 (ja) | 2001-06-27 | 2005-04-20 | キヤノン株式会社 | 光学素子及び製造方法 |
WO2003003429A1 (fr) | 2001-06-28 | 2003-01-09 | Nikon Corporation | Systeme de projection optique, systeme d'exposition et procede |
US6788389B2 (en) | 2001-07-10 | 2004-09-07 | Nikon Corporation | Production method of projection optical system |
US6775063B2 (en) | 2001-07-10 | 2004-08-10 | Nikon Corporation | Optical system and exposure apparatus having the optical system |
TW571344B (en) | 2001-07-10 | 2004-01-11 | Nikon Corp | Manufacturing method for projection optic system |
JP4238727B2 (ja) | 2001-07-17 | 2009-03-18 | 株式会社ニコン | 光学部材の製造方法 |
US6785051B2 (en) | 2001-07-18 | 2004-08-31 | Corning Incorporated | Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures |
JP2003050993A (ja) | 2001-08-06 | 2003-02-21 | Omron Corp | 指紋読取方法および指紋読取装置 |
FR2828933A1 (fr) | 2001-08-27 | 2003-02-28 | Corning Inc | Procede de determination de la qualite optique d'un monocristal de fluorure et element optique |
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US7075721B2 (en) * | 2002-03-06 | 2006-07-11 | Corning Incorporated | Compensator for radially symmetric birefringence |
JP2003309059A (ja) | 2002-04-17 | 2003-10-31 | Nikon Corp | 投影光学系、その製造方法、露光装置および露光方法 |
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-
2001
- 2001-05-15 DE DE10123725A patent/DE10123725A1/de not_active Withdrawn
-
2002
- 2002-04-29 TW TW091108888A patent/TWI266149B/zh not_active IP Right Cessation
- 2002-05-04 EP EP02769464A patent/EP1390813A2/de not_active Withdrawn
- 2002-05-04 KR KR10-2003-7000622A patent/KR20030019577A/ko not_active Application Discontinuation
- 2002-05-04 WO PCT/EP2002/004900 patent/WO2002093257A2/de active Application Filing
- 2002-05-04 JP JP2002589877A patent/JP2004525527A/ja active Pending
-
2003
- 2003-11-14 US US10/714,573 patent/US6879379B2/en not_active Expired - Fee Related
-
2005
- 2005-03-03 US US10/906,737 patent/US20050134967A1/en not_active Abandoned
- 2005-04-07 US US11/101,235 patent/US7170585B2/en not_active Expired - Fee Related
Patent Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4993823A (en) * | 1989-06-29 | 1991-02-19 | Eastman Kodak Company | Method for correction of distortions of an imaging device |
EP0480616A2 (de) * | 1990-10-08 | 1992-04-15 | Canon Kabushiki Kaisha | Projektionsbelichtungsapparat mit einer Vorrichtung zur Ausgleichung der Verzeichnung einer Projektionslinse |
EP0678768A2 (de) * | 1994-04-22 | 1995-10-25 | Canon Kabushiki Kaisha | Projektionsbelichtungsgerät und Herstellungsverfahren für eine Mikrovorrichtung |
DE19535392A1 (de) * | 1995-09-23 | 1997-03-27 | Zeiss Carl Fa | Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit |
DE19637563A1 (de) * | 1996-09-14 | 1998-03-19 | Zeiss Carl Fa | Doppelbrechende Planplattenanordnung und DUV-Viertelwellenplatte |
DE19807120A1 (de) * | 1998-02-20 | 1999-08-26 | Zeiss Carl Fa | Optisches System mit Polarisationskompensator |
US6201634B1 (en) * | 1998-03-12 | 2001-03-13 | Nikon Corporation | Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element |
EP0952490A2 (de) * | 1998-04-23 | 1999-10-27 | Canon Kabushiki Kaisha | Linsenfassung mit Element zum Ausrichten der Projektionsrichtung |
EP0961149A2 (de) * | 1998-05-29 | 1999-12-01 | Carl Zeiss | Katadioptrisches Projektionsobjektiv mit adaptivem Spiegel und Projektionsbelichtungsverfahren |
WO2000031592A1 (en) * | 1998-11-23 | 2000-06-02 | Koninklijke Philips Electronics N.V. | Method of detecting aberrations of an optical imaging system |
EP1014139A2 (de) * | 1998-12-23 | 2000-06-28 | Carl Zeiss | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie, mit einer optischen Halterung mit Aktuatoren |
EP1063684A1 (de) * | 1999-01-06 | 2000-12-27 | Nikon Corporation | Optisches projektions-system, herstellungsmethode, und verwendung in einem belichtungsapparat |
JP2000331927A (ja) * | 1999-03-12 | 2000-11-30 | Canon Inc | 投影光学系及びそれを用いた投影露光装置 |
EP1115030A2 (de) * | 2000-01-05 | 2001-07-11 | Carl Zeiss | Optisches System |
Non-Patent Citations (6)
Title |
---|
BURNETT J H et al: "Intrinsic Birefringence in 157nm Materials", International SEMATECH 2nd International Symposium on 157nm Lithography, Dana Point, California, 15.05.2001 XP002218849 * |
BURNETT J H ET AL: "Intrinsic birefringence in calcium fluoride and barium fluoride" PHYSICAL REVIEW B (CONDENSED MATTER AND MATERIALS PHYSICS), 15 DEC. 2001, APS THROUGH AIP, USA, Bd. 64, Nr. 24, Seiten 241102/1-4, XP002218846 ISSN: 0163-1829 * |
NIcht-Vertrauliches Schreiben com 07.05.01 "Re:Birefringence of calcium fluoride" von Chris Van Peski von International SEMATECH zu den Vertretern con Litho. PAG (Project Advisory Group) XP002218847 * |
PATENT ABSTRACTS OF JAPAN vol. 1999, no. 05, 31. Mai 1999 (1999-05-31) -& JP 11 054411 A (CANON INC), 26. Februar 1999 (1999-02-26) * |
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 14, 5. März 2001 (2001-03-05) -& JP 2000 331927 A (CANON INC), 30. November 2000 (2000-11-30) * |
UNNO Y: "Distorted wave front produced by a high-resolution projection optical system having rotationally symmetric birefringence" APPLIED OPTICS, 1 NOV. 1998, OPT. SOC. AMERICA, USA, Bd. 37, Nr. 31, Seiten 7241-7247, XP002219376 ISSN: 0003-6935 * |
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Also Published As
Publication number | Publication date |
---|---|
US7170585B2 (en) | 2007-01-30 |
US20050264786A1 (en) | 2005-12-01 |
US20050134967A1 (en) | 2005-06-23 |
WO2002093257A3 (de) | 2003-09-25 |
US20040150806A1 (en) | 2004-08-05 |
US6879379B2 (en) | 2005-04-12 |
DE10123725A1 (de) | 2002-11-21 |
EP1390813A2 (de) | 2004-02-25 |
KR20030019577A (ko) | 2003-03-06 |
JP2004525527A (ja) | 2004-08-19 |
WO2002093257A8 (de) | 2003-12-31 |
TWI266149B (en) | 2006-11-11 |
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