TW571344B - Manufacturing method for projection optic system - Google Patents

Abstract

The present invention is a manufacturing method for projection optical system, which can substantially ensure excellent optical performance without the influence of birefringence even using the crystal material having intrinsic birefringence, such as fluorite. The projection optic system is used to form image the image of the first surface onto the second surface according to the light with specific wavelength. The manufacturing method includes the following steps: a designing step S1, including an auxiliary step for both evaluating the first polarizing component and the light of the second polarizing component different from the first polarizing component, and configuring the crystal axis orientation of refractive member in the projection optic system containing at least the crystal material of the isometric system, so as to obtain the specific design data; a crystal material preparation step S2 for preparing the crystal material of the isometric system; a crystal axis measuring step S3 for measuring the crystal axis of the crystal material of the isometric system; a refractive member forming step S4 for forming the refractive member with specific shape by the crystal material of the isometric system based on the design data; and, an assembly step S5 for configuring the refractive member according to the crystal axis orientation of the refractive member obtained from the design step.

Description

571344 A7 B7 V. Description of the Invention (1) [Technical Field of the Invention] The present invention relates to a projection optical system, a manufacturing method of the projection optical system, and an exposure device of the projection optical system, and more particularly to a device suitable for photolithography ( photolithography) The projection optical system of an exposure device used in the manufacture of micro devices such as semiconductor elements or liquid crystal display elements. [Prior art] When forming tiny patterns of electronic devices (microdevices) such as semiconductor integrated circuits or liquid crystal displays, generally, a light-shielding mask drawn by expanding the pattern to be formed by a projection exposure device to about 4 to 5 times is used. (Hereinafter referred to as a reticule.) A method of reducing the exposure and transferring it to a photosensitive substrate (substrate to be exposed) such as a wafer. This type of projection exposure device has been developed by shifting the exposure wavelength used to the short wavelength side. Currently, the exposure wavelength is mainly 248 nm of KrF (fluoride) excimer laser, but the shorter wavelength of 193 nm of ArF (argon fluoride) excimer laser is also being put into practical use. In addition, there has been a projection exposure device using a light source with a wavelength of light in a vacuum ultraviolet field, such as a F2 laser with a wavelength of 157 nm or a Kr2 laser with a wavelength of 146 nm and an Ar2 laser with a wavelength of 126 nm. In addition, the introduction of a large-aperture (NA) projection optical system can also achieve high-resolution, so not only to promote the development of a shorter exposure wavelength, but also to develop a projection optical system with a larger aperture. As mentioned above, for exposure light with a short wavelength in the ultraviolet field, optical materials (lens materials) with good transmittance or uniformity are naturally limited. For ______ _ 4 _ This paper size applies Chinese National Standard (CNS) Α4 size (210 X 297 mm) A7

= For ArF excimer laser as the light source of the projection optical system, the lens material can also use synthetic quartz glass, but only one kind of lens material: still, can not be done to completely correct chromatic aberrations, and part Lenses must be used: Calcium Knot: Yue (fluorite). On the other hand, for projection optical systems using F2 laser as the light source, the available lens materials are essentially limited to calcium crystals (fluorite). [[Problems to be Solved by the Invention] It is reported in a close article that for ultraviolet light having a short wavelength as described above, even if it is a calcium fluoride crystal (fluorite) of a hexagonal crystal system, there is inherent birefringence1 For optical systems that require ultra-high precision, such as the projection A system used to manufacture electronic devices, the aberration caused by the birefringence of lens materials is a fatal problem. Therefore, the effect of birefringence can be substantially avoided. The lens structure and lens design are indispensable. In view of the above-mentioned problems, an object of the present invention is to provide a person who can ensure good optical performance without being affected by the consistency of J i refraction even when a crystalline material such as fluorite has inherent birefringence. [Solutions for solving the problem]-In order to achieve the above-mentioned object, the method for manufacturing an invention-based shadow optical system according to the scope of application of the present invention for patent application, the projection optical system uses the light of the root and chirp wavelength to make the first surface image The projection light imaged on the second surface: Department j, which contains a refractive member made of at least •: Tera crystal system crystalline material that is transmissive to light of the above specific wavelengths, which is characterized by including-and: t process' It includes setting the at least one of the above-mentioned at least one of the above-mentioned j44 invention evaluation while evaluating the light of the first polarized light component and the second polarized light component that is different from the first polarized light. To obtain a specific setting = daily-axis axis order, which is used to prepare the above-mentioned equiaxed crystal system &amp; 2 'Crystal Material Preparation Worker, which is used to determine the above-mentioned equiaxed crystal system :: 枓 :: 轴: 定 定Process belts, T $ ， 甘 # Λ 枓 Village crystal axis; the above-mentioned design number obtained by the above-mentioned order of the refractive member according to the above-mentioned ... installation process; a shaped refractive member; pieces = draw orientation and configure the above-mentioned refractive index Process income The refraction structure η t :: t: Ming 'can be used to evaluate the polarization axis assembly angle of the refraction member composed of the birefringent material of 10,000 m crystalline material because it can evaluate the polarization components. The process of ensuring good optical properties and refraction: refracting member of the emissivity distribution, and the above-mentioned specific-, knowledge-based, and design data obtained in the above-mentioned design process are determined. Refraction structure with a specific refractive index profile: The correction angle optimizes the matching angle of the iso-sleeve crystal material: the birefringence effect is lost, so it can ensure a good optical performance. The second special application of the scope of the invention: the invention of the third item is related to the above-mentioned specific birefringence distribution, which is the above-mentioned special birefringence distribution of stress, birefringence, and / or the special birefringence distribution caused by the stress, and the refraction caused by the upper U At least one of the birefringence distributions of the thin film of the member. 571344 Five invention descriptions (The fourth invention of the scope of interest is in the relevant patent application ^ Λ Ming, the above-mentioned refractive member with a specific birefringence distribution is made of quartz Composition of doped quartz. ^ "The invention of the 5th invention in the original patent application is related to the patent application, and the effective diameter of the refracting member of any of the y π patent fe distributions in the 2nd to 4th patents is f The buckle is from the above first surface: One: When the emitted light beam passes through the refractive member with the stress birefringence distribution, when the full beam diameter is #, the following conditional expression should be satisfied: .6 &lt; ^ p / (z) c ^ 1 According to the present invention, the refraction member having a stress birefringence distribution can be positioned at a sufficient position to correct the birefringence caused by the equiaxed crystal material with the refraction member having the stress birefringence distribution. The most suitable position is required, and 5F can be used to maximize the birefringence correction ability of the refractive member with a stress birefringence distribution. The invention in item 6 of the scope of patent application of the present invention is in The invention according to any one of items 1 to 5, further comprising an aspheric surface forming step of forming a surface shape of at least one optical member in the above-mentioned projection optical system into an aspherical shape, and the aspheric shape is in accordance with the above It is determined by the design data obtained in the design process. According to the present invention, it is possible to aspherically correct a scalar component aberration (aberration that does not depend on the direction of polarization) in aberration caused by an equiaxed crystalline material. The invention in item 7 of the scope of patent application of the present invention is in the invention in item 6 of the scope of patent application, and the aspheric shape is related to the above-mentioned optical component. This paper uses the Chinese National Standard (CNS) A4 specification (210 X 297 public). 571) 571344 V. Description of the invention (The light & axis has an asymmetric aspherical shape. 之 The invention in the eighth patent application of the present invention is an invention in any one of the related patent scopes = 1 to J The above-mentioned assembling step includes: an optical moon dagger, a secondary auxiliary step, which measures the pre-assembled projection optical system, and / or a photon to generate the optical member adjustment auxiliary step. The optical performance of the measurement laboratory 2 is in accordance with the specific optical performance, and the position and / or posture of at least one optical member in the projection optical system is changed; and an aspheric force assisting step is to make the optical performance determined in accordance with special characteristics Sufficient optical performance, the surface shape of at least one optical member in the above-mentioned projection optical system is formed into an aspherical shape. When manufacturing a projection optical system, for example, low-order aberrations can be corrected by adjusting the position and posture of the optical member, and high-order aberrations can be corrected based on the aspheric surface set by the measured optical performance. Optical performance due to assembly errors of optical components, etc. ^ The invention of the 9th invention belongs to the patent scope of the related patent, page 8 (In the invention, the above-mentioned aspheric shape system is also considered by the above-mentioned design process. It is determined by design data. According to the present invention, aberrations caused by assembly errors and the like of optical members and scalar component aberrations in aberrations caused by inherent birefringence of an equiaxed crystal material can be used. The invention in item 10 of the scope of patent application of the present invention relates to the invention in any one of the leaflets in the patent scope of the invention. The above-mentioned assembling process includes an adjustment of the optical axis of the refracting member composed of the above-mentioned crystal extraction system. The dimensions of the surrounding azimuth are in accordance with the Chinese National Standard (CNS) A4 specifications (210X297m m installed 8-571344 A7 B7) V. Description of the invention (6-digit angle adjustment auxiliary tool … 'According to the present invention, when assembling a projection optical system, optical performance degradation caused by an error in the crystal axis orientation of a refractive member composed of an isoaxial crystal system and a crystalline material can be corrected. The invention of item 11 of the patent scope is the invention of item 10 of the related patent application scope. The above-mentioned assembly process includes a polarizing optical property measurement assisting process, which is used to measure the above-mentioned pre-assembled light about the light of a plurality of polarizing components. The optical performance of the projection optical system, and the azimuth angle adjustment auxiliary step adjusts the ten-degree angle of the refraction member composed of the equiaxed crystal system according to the measured plurality of polarizing components &lt; optical performance. The optical performance of a plurality of polarizing components is made to conform to a specific value. According to the present invention, when the projection optical system is assembled, the aberrations of the projection optical system with respect to a plurality of polarized light components are measured, and the crystal axis orientation of the refractive member composed of an equiaxed crystal material is adjusted based on the measurement results. Angle, the aberrations of these plural polarization components can be corrected well, and the aberrations of the scalar components can also be corrected well. The invention of item 2 of the patent application scope of invention is the invention of item 10 of the related patent application scope. The above assembly process includes an optical performance measurement auxiliary process, which is used to measure the optical performance of the above-mentioned projection optical system after assembly. Performance, and the above-mentioned azimuth angle adjustment auxiliary step is adjusted according to the above-mentioned measured <optical performance M consisting of the top material and the top material shooting member to adjust the two azimuth angles so that the optical performance of the projection optical system conforms to a specific value. -9-Standards for this paper (CNS) A4 specification (21G_X297) 5. Invention description (7) According to the present invention, since the projection optical system is measured when the projection optical system is measured, the aberration of the academic system is measured. And according to the measurement result, the azimuth angle of the crystal axis of the equiaxed crystal system is adjusted, so that the projection optical system &lt; aberration can be corrected well. It is measured in the reason of the 12th item in the scope of the patent application. Projection optics: System wide 1 aberration ', and according to the measurement result of the scalar aberration, the azimuth angle of the crystal axis of the refracting member composed of the crystal material of the temple axis crystal system is appropriate. The scalar aberration obtained through the measurement is predicted to predict a plurality of The square of the azimuth angle of the crystal axis of the deflection member = 1 = the material is composed of refraction, which is better for hunting. This can simplify the projection optical system. 0 μ The invention claimed in the patent scope item is related to the patent scope. In the invention of any one of the smart items, the crystal material of the equiaxed crystal system described above contains fluorinated # 5 or barium fluoride. The invention claimed in claim No. 14 of the present invention is related to the claimed item No. 23 Any—in the invention, the above The specific wavelength is a wavelength below 2000. The invention of claim 15 of the present invention is a projection optical system manufactured in accordance with the manufacturing method of the invention of any of claims 1 to 14. In order to achieve the above, For the purpose, the invention of claim 16 of the present invention applied for a patent range is a foot projection optical system for imaging an image of a first surface on a second surface according to light of a specific wavelength, and is characterized by: equiaxed crystal refraction The structure is composed of at least one isometric axis 571344 which is transmitted to the light of the above specific wavelength. (5) The invention description (8) and the amorphous refraction component is used to compensate the price == invention. The optical performance S due to the inherent birefringence can ensure good optical performance. The degradation of the dagger, the invention of the patent application No. 17 of the invention patent application, and the invention of the page, the above isometric crystal system refractive member system ^ [100] Or optically, it is roughly consistent with the optical axis of the isometric crystal-based refractive member of this crystal axis.], "Shangmi Temple" Yi, the present invention "is formed so that the crystal ::] is equivalent to the W axis, which is the same as the above. Wait Axial crystal system refraction == ί 目 付 can make the axis angle of the equiaxed crystal system refraction member become a larger angle relative to the optical axis. Second = The intrinsic birefringence of the Japanese-Japanese refraction member of the Shinji axis. The invention of item 18 is a crystal-based refraction member, which contains a plurality of isotropic crystal-refraction structures; the crystal axis orientation of the formation member is less than or equal to that of the projection member, and each is set so that Γ can be caused by the intrinsic birefringence of the upper lens. In other words, according to the present invention, the combination of the plurality of equiaxed crystal system refractions can substantially eliminate the inherent refraction of the plurality of equiaxed crystal system refraction members, because the birefringence of the amorphous refractive member can be reduced. : Good optical performance. Male I will ensure 11-this paper ruler Qi Cai s ® home standard (CI ^ S ?? 10 X 297 mm) 571344 V. Description of the invention (September, the scope of patent declared in January of January 9th In the invention on page 18 of the related patent application, the above-mentioned equiaxed crystal-based refractive member "light" relative to light is set by the above-mentioned crystal axis azimuth system to reduce the aforementioned optical performance degradation caused by inherent refraction. The maximum value of the angle of the axis is super Do not degrees. Since the maximum angle of the light relative to the optical axis through the isometric crystal-based refractive member exceeding M degrees is easy to reach the inherent birefringence of the shadow #, the present invention will apply for a patent | The 8-hectare correction method is applicable to the maximum angle of more than 20 degrees "isometric crystal system refractive member, thereby reducing the effect of birefringence. The invention of item 20 of the scope of patent application of the invention is the above-mentioned equiaxed crystal in which the orientation of the crystal axis is set to reduce the above-mentioned optical performance degradation due to the inherent birefringence in the invention on page 18 or 19 of the related patent application. The refraction member is disposed between the 曈 position on the most side of the second surface and the second surface in the projection optical system. Since the equiaxed crystal-based refractive member provided between the pupil position on the second-most surface side and the second surface in the projection optical system is susceptible to inherent birefringence shadowing, the present invention will apply for the 17th item in the scope of patent application. The correction method is suitable to be arranged between the pupil position on the second side and the second side, so as to reduce the influence of radiation. The invention according to item 21 of the present invention is the invention of any one of items 18 to 20 of the related application. The above-mentioned plurality of isometric crystal-based refractive members have: a -group light transmitting member, which is formed In order to make its crystal axis [100] or a crystal axis that is optically equivalent to the crystal axis [100] substantially coincide with the optical axis; and the first: a group light transmission member formed so that its crystallographer or optically The crystal axis equivalent to the crystal axis [100] is roughly consistent with the optical axis; and the above 12 paper sizes are applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 571344

The first group of light-transmitting members and the second group of light-transmitting members have substantially 45 relative to each other with the optical axis as the center. Location relationship.

The invention according to claim 22 in the present invention is related to the invention in any one of claims 18 to 21 in the claimed invention, wherein the above-mentioned plurality of equiaxed crystal-based refractive members have a third group of light transmitting members, Its system is formed such that its crystal axis [111] or a crystal axis which is optically equivalent to this crystal axis [1 i η substantially coincides with the optical axis; and a fourth group of light transmitting members is formed such that its crystal axis The crystal axis which is optically equivalent to the crystal axis [ill] is approximately consistent with the optical axis; and the third group of light transmitting members and the fourth group of light transmitting members have the optical axis as the center and rotate relatively only relative to each other 6 〇. Location relationship. The invention according to claim 23 of the present invention is the invention according to any one of claims 18 to 22 of the related patent application, wherein the plurality of isometric crystal-based refractive members have: a fifth group of light transmitting members, which are formed In order to make its crystal axis [110] or a crystal axis that is optically equivalent to the crystal axis [11 〇] substantially coincide with the optical axis; and a sixth group of light transmitting members, it is formed such that its crystal axis [11〇 ] Or the crystal axis equivalent to the crystal axis [11 〇] and the optical axis are substantially consistent; and the fifth group of light transmitting members and the sixth group of light transmitting members have the optical axis as the center and are substantially only opposite to each other. Ground rotation 90. Location relationship. The invention according to claim 24 of the present invention is the invention according to any one of claims 18 to 20 of the related patent application, wherein the plurality of isometric crystal-based refractive members have: a first group of light transmitting members, which are formed In order to make its crystal axis [100] or a crystal axis that is optically equivalent to the distant crystal axis [100] and the optical axis substantially coincide, and the five-group light transmitting member, it is formed such that its crystal axis [ 11 〇] or a crystal axis that is optically equivalent to the crystal axis [11 〇] is approximately consistent with the optical axis. -13-This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm) 571344 A7

^ 25 inventions in the patent scope of the invention are related to the scope of the 24 patents in the invention. <In the invention, the above-mentioned plurality of equiaxed crystal-based refractive members and three groups of light-transmitting members' are formed so that their crystal axes [called Or optical; l The crystal axis equivalent to the crystal axis [111] and the optical axis roughly match. The invention according to claim 26 of the present invention is the invention described in any one of claims 18 to 25 of the relevant patent scope. The crystal axis is set in such a manner as to reduce the degradation of the optical performance due to the inherent birefringence. The above-mentioned plurality of equiaxed crystals are a refractive member having a seventh group of light transmitting members which are formed so that a specific crystal axis substantially coincides with the optical axis; and an eighth group of light transmitting members which are formed as Make the specific crystal axis approximately coincide with the optical axis; and assuming that the light path length corresponding to the maximum aperture of the above-mentioned projection optical system passes through the seventh group of light transmitting members (〇ptical path length # L7, corresponding to the above-mentioned projection optical system) The maximum path length of the light with the largest aperture passing through the eighth group of light transmitting members is L8, and the above-mentioned specific wavelength is also required to satisfy the following conditional expression: | L7-L8 | U &lt; 3 X 1〇 + 5 The invention is to define the most appropriate optical path length when using a plurality of equiaxed crystal-based refractive members to offset the negative effects caused by the mutual birefringence of each other. In the twenty-sixth invention of the scope of the related patent application, the maximum value of the angle of the light passing through the light transmitting members of the seventh group and the eighth group with respect to the optical axis is more than 20 degrees. The invention relates to the invention in the 26th or 27th of the scope of patent application. The seventh group and the eighth group are transmitted through the light. -14-571344 A7 B7 V. Description of the invention (12 components are arranged in the above-mentioned projection optical system. The position of the pupil on the second face side and the above-mentioned second face. The invention claims the invention of item 29 of the patent [|] is among the inventions of any of the 16th to 28th in the scope of the patent application, and has more It is used to reduce the aspheric surface of the scalar component in the degradation of optical performance caused by the above-mentioned solid birefringence. According to the present invention, the polarization aberration caused by not only the inherent birefringence, but also the The aberration of the scalar component can also be corrected, so that it can ensure better optical performance. The invention in the 30th invention in the scope of patent application of the present invention is the invention in the 29th scope of the patent application, and the aspheric surface is about the design The optical axis of the above-mentioned aspherical refractive member has a rotationally asymmetric shape. F The invention according to the 31st invention patent scope is the invention of any one of the 16th to 3G patent scopes, the above-mentioned amorphous refractive member It has a stress birefringence distribution. According to the present invention, a birefringent knife cloth with easily controlled birefringence can be used to correct the effect of birefringence caused by equiaxed crystal materials. ^ The 32nd invention patent In the invention of the 31st member of the scope of the patent application, the above-mentioned stress birefringence distribution is caused by at least one of the density distribution due to impurities and thermal history during the manufacture of the amorphous refractive member. The 33 inventions are among the invention patents of any of the 16 to 32 applications, the above-mentioned amorphous optical structure quartz or fluorine-doped quartz. The 34th invention of the scope of patent application of the present invention is related to the patent application range of 15 10X297 ^) gutter 571344 5. Description of the invention (13 16th to 33th inventions, the above is fortunately crystallized dance or barium fluoride .7 The medical department has a mouse to achieve the above-mentioned purpose, "the invention claims the scope of the patent," a projection optical system characterized in that the image of the first surface is imaged on the second surface according to light of a specific wavelength. And it has a double crystal refraction member composed of the above-mentioned specific = light transmissive twin crystal. Twin crystal refers to two crystals of the same phase that are connected to each other at a specific common =? =: Turn 18 °. Orientation relationship, or connected in-phase ": two mirror image relationship with respect to the crystal plane of the special （(image㈤ 川 ㈤) 0. The right ^ double crystal is used as the crystalline refractive member in the projection optical 使 and makes 7 , 'You can make the birefringence influence mutually change before and after the double crystal plane or the double crystal realm, to the opposite direction'. Therefore, for the entire crystalline refraction member, you can V degrade the optical performance due to the inherent birefringence of the optical system. Optical performance: In the cylinder ~ perimeter = medium The 36th invention of Γ 利范 园 is in the related patent application 'You 明 Ming, the double crystal boundary or the double crystal plane of the above-mentioned double crystal refraction member is set to reduce the inherent performance degradation due to the above-mentioned double crystal. 丨In particular, in the present invention, the position of the double crystal boundary or the double crystal plane of the birefringent member should be a position capable of correcting the degradation of the optical performance caused by the inherent birefringence of the above-mentioned twin crystal. The present invention applies for a patent The invention of the 37th scope is among the inventions of any of the 16th to 36th of the scope of the application for patents. The wavelength of the above-mentioned specific wavelength is a wavelength below 200 nm. -16 This paper applies the Chinese National Standard (CNS) A4 Specifications (21 × 297 mm) 571344

The invention of claim 38 in the scope of patent application of the present invention is a projection exposure device for projecting an image of a projection original arranged on a first side according to light of a specific wavelength to a workpiece arranged on a second side, and is characterized by: It has: a light source for supplying the above-mentioned light with a sufficient wavelength; it has been placed in the optical path between the light source and the first surface, so that the above-mentioned light from the above-mentioned light source is guided to the above-mentioned original optical optical system; And a projection optical system arranged in the optical path between the above-mentioned first surface and the above-mentioned f-two surfaces so as to form an image of the above-mentioned projection master on the above-mentioned first surface in any one of claims 15 to 37 . The invention in item 39 of the scope of patent application of the present invention is a projection exposure method, which is characterized by projecting and exposing an image of a projection original arranged on a first side to a workpiece arranged on a second side according to light of a specific wavelength, and having: A process of supplying light of the above-mentioned specific wavelength; a process of illuminating the above-mentioned projection original using the above-mentioned light of the specific wavelength; and applying any one of items 15 to 37 of the scope of patent application based on the light from the above-mentioned illuminated original of the projection The projection optical system is a step of forming an image of the projection original plate on the second surface. Further, in the present invention, the so-called first group of light transmitting members and the second group of light transmitting members have relative rotations of approximately 45 relative to the optical axis. The positional relationship means that the relative angle with respect to the optical axis of a specific crystal axis (for example, crystal axis [〇1〇], [〇〇 丨], ⑴ 卜 ^, or [Oil]) as the center is approximately 45 . . The specific crystal axis refers to a crystal axis that faces a different direction from the optical axis of the first group of light transmitting members and the second group of light transmitting members 4. In addition, if the crystal axis [100] is used as the optical axis, the rotational asymmetry due to the influence of birefringence centered on the optical axis will be 90. Appears on a periodic basis, so it has the optical axis as the center and returns only relatively relatively.

Ground rotation 60. The positional relationship of Nichi-ji means that it has a rotation around 60 °, which is roughly centered around the optical axis. + (η χ 12〇.) has the same positional relationship (η is an integer). When A7 B7 turns 45, it means that it has a spine that is roughly opposite to the center of the optical axis. The positional relationship of 45 + (ηχ 90 °) is the same (η is an integer). In addition, in this private day + _, ,, and leap month, the so-called three-group light-transmitting members and the fourth group of light-transmitting t members are generally only relatively opposite to each other around the optical axis. The relative angles of the positions,, and% are not about 60, which are centered on the optical axis of a specific crystal axis (for example, the crystal axis [-111], [11 -1], or [+]). . The 4 special day-to-day axis refers to the crystal axis that is different from the light axis of the third group of light transmitting members and the fourth group of light transmitting members. In addition, if the crystal axis [111] is light, the rotation asymmetry of the birefringence effect with the optical axis as the center will appear at 120 weeks / months, so it has the optical axis as the center and is only relatively opposed. In the present invention, the so-called fifth group of light transmitting members and the sixth group of light transmitting members are rotated substantially relative to each other with the optical axis as the center. The positional relationship means that the relative angles around the optical axis of a specific crystal axis (such as crystal axis [001], Bu 丨 丨 丨], [-110]) or [Ml]) are approximately 9 °. . . The Sun's θ axis of Wentejing refers to a crystal axis facing a direction different from the optical axis of the fifth group of light transmitting members and the sixth group of light transmitting members. In addition, if the crystal axis [丨 丨 〇] is used as the optical axis, the rotation asymmetry of the birefringence effect with the optical axis as the center will appear at a period of 180 °, so it has the optical axis as the center and is only relatively opposed. Ground rotation 90. In the positional relationship, it means that it has a rotation of approximately 90 relative to the optical axis. + (nX 18〇.) has the same positional relationship (0 is an integer). -18-Degree applies to China National Standard (CNS) A4 specification (210X 297 male

Fifth, the description of the invention (16) [Implementation Mode of the Invention] System I: 'I scheme, which illustrates the projection optical system of the first embodiment of the present invention. Square: 10,000 / ^ A detailed description of the projection optics according to this embodiment. System description 4 π, li ~ 'For its outline, please refer to FIG. 1 briefly; I :; 1 is a schematic flowchart showing the projection optical system &lt; Yes, there was a grudge against "The manufacturing method of projection optical system;" § a calculation process, a crystalline material preparation step S2, a crystal axis measurement step S3, a refractive member formation step S4, and an assembly step S5. In step S1, when the projection optical system is timed using ray tracing software, a plurality of polarized light components are used to implement the projected light:! The light is traced to calculate the aberrations under the respective polarized light components, preferably ^ The wavefront aberrations of the per-polarized component are outweighed (wave_F_abCain). : Then, according to the plural aberrations, each of the aberrations and the plurality of polarized components are "synthetic scalar aberrations of the synthesized scalar components, and perform the flat optical estimation of the projection optical system, while using the plurality of optical components constituting the projection optical system. (Refraction member, reflection structure #, diffraction member, etc.) parameters are optimized to obtain design data composed of these parameters. In addition to using the conventional surface shape of the optical component, the surface separation of the optical component, the refractive index of the optical component, etc., if the optical component is a crystalline material, plus its crystal axis orientation as a parameter, use 0 for the crystalline material. In the preparation step S2, an equiaxed crystal system having light transmittance for a wavelength used by the projection optical system is prepared (the unit lengths of the crystal axes are the same as each other, and the angles formed by the crystal axes at the intersections of the respective crystal axes are all 90. 571344 V. Description of the crystalline material of the invention (17, mouth system). In the crystal wheel, the crystal measurement of the crystalline material is prepared. The method of determining the orientation of the crystal axis through the crystalline material preparation process is two direct methods :, (— 测: And according to the known crystal wheel orientation :; fold ::: determine the biaxial refraction of the crystalline material T to determine the relationship between the crystal axis orientation and the ::, and prepare the process S4, it will go through the crystalline material preparation process. Counting mr (Yan Xuncheng has the parameters obtained in the design process (Let S3 and refraction in this embodiment, the crystal axis measurement process first, ... the order before and after the implementation of step S4 is either-can be In the case where the step S4 of the formation of the refractive member is performed first, the crystal axis of the crystalline material having the shape of the process may be measured. For example, if the crystal axis is used to measure the fold: ΐ: Γ &quot; Information on the orientation of the main crystal axis, the The crystal axis measured after the refractive member is formed is sufficient. J, 'and the mounting step S5, the processed refractive member is assembled in the lens barrel of the projection optical system according to the design data obtained by the design process. At this time, it should be The crystal axis of the refractive member composed of the equiaxed crystal system crystal material is positioned at a position that can be consistent with the crystal axis orientation in the design data obtained by the design process. The above is the manufacture of the projection optical system according to an embodiment of the present invention. The method is briefly explained, and its detailed steps are described below with reference to Figs. 2 to 8. Fig. 2 is a flow chart schematically showing the design process s 1. As shown in Fig. 2, the design process S 1 has an initial value of input design parameters. Step s 11; According to setting -20-This paper size applies Chinese National Standard (CNS) A4 specification (210X 297 mm) 571344 A7

a: And estimate the optical properties of the projection optical system under a plurality of polarized light components =-^^; determine whether the optical performance calculated in step 2 is in: "step S13 in the rules; and after this step When it is judged that ^ is within the pre- $ specifications, step S14 of changing design parameters is performed. In this embodiment, the 'design parameters may use, for example, the surface shape, surface interval, eccentricity of the optical member (lens, reflecting surface, etc.) constituting the projection optics ... nothing, the inclination with respect to W, and the optical axis as the center ^ Azimuth, folding, birefringence distribution, reflectance, transmittance, transmittance distribution, effective diameter, tolerance, etc., or the film structure formed on the surface of these optical components, that is, the number of film layers, the thickness of each layer, and the material of each layer (If necessary, also use the absorption coefficient of each layer). Next, referring to FIG. 3 and FIG. 4, the steps for evaluating the optical performance of the projection optical system under a plurality of polarized light components are described as follows. FIG. 3 is an example of an optical performance evaluation point of the projection optical system, and FIG. 4 is a flowchart for explaining the details of step S12. As shown in FIG. 3, this embodiment uses an evaluation point W0 on the optical axis Ax of the image plane W as the second surface of the projection optical system aperture, and an arbitrary image height (for example, the highest peripheral image height) on the image plane. The evaluation point Wi is used as the evaluation point. However, the evaluation point Wi of an arbitrary image height on the image plane W is not limited to one point, and a plurality of evaluation points of an arbitrary image frame may be used. In addition, the imaging light beam incident on the evaluation point w0 corresponds to the light beam from the point R0 on the optical axis Ax on the object plane R as the first surface of the projection optical system, and the imaging light beam incident on the evaluation point Wi corresponds to the light from Beams at the height of any object on the object surface R ... ~ In addition, the plurality of polarizing components in step S12 can be used, for example, in

Decoration Police-21-A7 B7, Description of the Invention (19) The X-polarized light that oscillates in a specific X direction in a plane where the optical axis of the shadow optical system is normal, and γ that is orthogonal to the X direction in the plane Directional γ-polarized light component. In addition, a plurality of polarized light components can also be used. The R polarized light knife that vibrates in a direction containing the optical axis (radiation direction R) in a plane where the optical axis is a line, and the polarized light component has a vibration direction orthogonal to the R polarized light component. As the β polarization component (a polarization component having a vibration direction of 0 in the tangential direction), it is also possible to use both the XY polarization component and the R0 polarization component (that is, four polarization components). Then, in this embodiment, the phase distribution w0 (p, 0) (wi, $) of the exit pupil PS of the projection optical system PL is obtained for each of the plurality of polarized light components, but the distribution is the phase distribution at The exit pupil plane PS is represented by polar coordinates M 0). Among them, P is a normalized pupil radius normalizing the radius of the exit pupil plane pig to 1, and 0 is the center of the exit pupil plane pS, typically the sagittal angle of the polar coordinates with the optical axis as the origin. (Step S121) In step S121, the design parameters of the projection optical system pl are input to the computer. The design parameter, if the step S121 is implemented immediately after the step S11 of FIG. 2, serves as an initial value of the design parameter input for the step S1 丨 if the step S121 is implemented after the step S 14 of FIG. 2, It serves as the design parameter after the change in step S14. According to the above design parameters, the light rays introduced from the object side (the reticle surface R side) of the projection optical system PL are first ray traced to obtain the complex of these light rays on the object surface (wafer surface W). The necessary information is in amplitude. (Step S122)-Next, the electronic computer performs ray tracing and calculates the incidence of the imaging beam incident on the arbitrary evaluation target image point Xi (for example, the highest peripheral image height) as shown in Figure 2 571344 A7 B7 V. Invention Description (2). The first polarization direction phase distribution WHi (P, 0) and the second polarization direction phase distribution WVi (p, 0) and the first polarization direction phase distribution WHO (p , 0) and the second polarization direction phase distribution WV0 (ρ, Θ). The so-called "first polarization direction" and "second polarization direction" are two polarization directions orthogonal to each other on the exit pupil plane PS. For example, the above-mentioned XY polarization direction, R0 polarization direction, or XY and R0 polarized in both directions. In this embodiment, the complex amplitudes to be obtained when calculating these phase distributions are not only for the end of the exit pupil plane PS of the projection optical system PL, but also include the entire domain of the exit pupil plane PS. The ray tracing of the imaging beam incident on the image point Xi of the evaluation target shown in Fig. 3 is that the beam LFi emitted from the conjugate point Ri on Xi is emitted at different exit angles and passes through the different positions of the pupil plane PS. Each of the rays is implemented separately (in addition, the maximum exit angle of the rays to be ray traced depends on the numerical aperture of the image side of the projection optical system PL). In this embodiment, although ray tracing is performed on an optical member made of an equiaxed crystal system crystal material with inherent birefringence, the birefringence distribution of the crystal axis of an optical member such as this was previously described in 2001. The 2nd International Symposium on 1 57 nm Lithography, held on May 15th, was performed by John Burnett of the National Institute of Standards and Technology (NIST) and others ( John H. Burnett et al.). Therefore, the light beam Lfi can be obtained through ray tracing like this in projection optics-23-This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 571344 A7 B7 V. Description of the invention (21) The exit pupil of the system PL The first polarization direction complex amplitude distribution and the second polarization direction complex amplitude distribution of the plane PS. From these distributions, the first polarization direction phase distribution and the second polarization direction phase distribution can be obtained respectively, and the exit pupils are respectively The polar coordinates (p, 0) on the plane PS represent the first polarization direction phase distribution WHi (P, 0) and the second polarization direction phase distribution W Vi (p) of these distributors as the imaging beam incident on the evaluation target image point Xi. , 0). Where p is the normalized pupil radius normalizing the radius of the exit pupil plane PS to 1, and $ is the sagittal angle of the polar coordinates with the center of the exit pupil plane PS as the origin. In addition, the ray tracing of the imaging beam incident on the central image height X0 is similarly emitted from the light beam LfO emitted from the conjugate point R0 of X0 at different exit angles, and will pass through the exit pupil plane PS. Each light at the position is implemented separately. The complex amplitude distribution of the first polarization direction and the complex amplitude distribution of the second polarization direction of the light beam LH are obtained, and these distributions are represented by polar coordinates (P, 0) on the exit pupil plane PS as incident central image height X0. The first polarization direction phase distribution WHO (ρ, θ) and the second polarization direction phase distribution WVO (ρ, 0) of the imaging beam of. (Step S123) Next, the electronic computer calculates the average phase distribution WAi (p, 0) of the evaluation target image point Xi and the average phase distribution WAO (p, 0) of the center image height X0 by the following equations (1) and (2). ) 〇 (1) WAi (ρ &gt; θ) = (WVi (p &gt; 0) + WHi (p ^ θ)) / 2 (2) WAO (p, θ) = (WVO (p, 0) + WHO (p, 0)) / 2 That is, the average phase distribution WAi (p, 0) is an intermediate value distribution obtained by aligning the coordinates of WVi (p, 0) and WVO (P, Θ). _-24-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 571344 22 Description of the invention and then the average phase distributions WAi (p, 0) and WAO (p,) obtained are obtained RMS value (root mean square value) wai, waO. These RMS values are equivalent to wavefront aberrations of the projection optical system PL. (Step S124) Next, the electronic computer is about to refer to WVi (p, 0), WHi (p, 0), wv0 (p, 0), WH0 (p0) obtained in step s22 and the following formula (3 ) (4) Obtain the retardation (retardation) distribution of the evaluation target image point χί, θ), and the retardation distribution δψ0, 0) from the evaluation image point χ0 on the optical axis. (3) 5Wi (p &gt; 0) = wVi (p &gt; 0) .WHi (p ^ Θ) (4) 5W0 (p, 0) = wv〇 (p, 0) -WHO (p, 0) also That is, the delay distribution 5Wi (p, 0) is a differential distribution obtained by matching the coordinates of WVi (p, 0) and WVi (p, ⑴), and the delay distribution δ W0 (p, 0) is the WVO (p , 0) Differential scores obtained by matching the coordinates of Wv0 (p, 0). Then, 'require the obtained delay scores WSWi (p, 0), δλνο (P, 0) and the respective RMS values of 3wi, δ \ νΟ. Generally speaking, if the delay is large, the contrast of the pattern image will decrease, so the RMS value of the delay distribution 5Wi (P, 0) and the RMS value of the delay distribution 5W0 (ρ, 0) are indicating that the evaluation target is being evaluated. Defects of image point image contrast and evaluation of image point image contrast on the optical axis. (Step S125) The electronic computer is about to calculate its RMS value 5W0 and its exit pupil with reference to the delay profile 5 WO obtained in step S124. The in-plane average value a [δλ ¥ 0], and the PSF (point spread function) value is calculated by the following formula (5): L___-25 _ This paper size applies the Chinese National Standard (CNS) Α4 specification (210 X 297)

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Line 571344 A7 __________ 发明, description of the invention (23) (5) PSF = 1- (4 7Γ 2 · 6w02 + 2 7Γ 2 · Α [δWO] 2) / 2 This PSF value is equivalent to the point image intensity distribution due to the delay The approximate value of the maximum value. The smaller the PSF value, the more the point image intensity distribution is degraded. In addition, in this embodiment, it is also possible to obtain the following evaluation indicators (a), (b), and (c) by adding to each of the above-mentioned obtained wai. (a) Make WAi (p, 0) the RMS value of each item obtained by Zernicke expansion, or / and group the plurality of items obtained by Zernick expansion to group the RMS values of each item. (b) Make WAO (p, 0) the 111 ^ 3 value of each item obtained by Zernike expansion, or / and the RMS value of each item obtained by grouping the Zernike expansion. (c) The average phase distribution AWAi (ρ, Θ) along the evaluation target image point based on the evaluation image point χ0 on the optical axis or / and the RMS value of the average phase distribution occupies eight. (d) AWAi (p, the scale of the items obtained by Zernike expansion ... ^ value or / and the RMS values of the items obtained by grouping the plurality of items obtained by Zernike expansion. The optical performance calculated in step S12 (such as the average phase distribution, the delay distribution, the RMS value, and the PSF value of these). In step S13, it is determined whether the calculated optical performance is within a specific specification. If it is within the specification, the output Design data (design parameters), and then end the design process S1. If the calculated optical performance is not within a specific specification, control is moved to step s 14. At step S14, at least one of the design parameters of the projection optical system is changed. Part-26-

571344 A7

After the division, control is shifted to step S12. In this embodiment, this loop is repeatedly performed until the calculated optical performance is within a specific specification. In addition, when changing the design parameters, it is also possible to initially change only the surface shape of the optical components (lens, reflecting surface, etc.) constituting the projection optical system, the _plane interval, the "amount, the inclination with respect to the optical axis" , Refractive index, effective control, tolerance and other parameters of an optical system composed of amorphous materials, and correct the aberration of the scalar component in the optical performance of the projection optical system, and then change the birefringence of the thin film structure and optical components The rate distribution is based on the azimuth and other parameters with the optical axis as the center, and the method of correcting scalar component aberration and aberration of polarized light.

In the case of CaF2), fluorite has always been used to form refracting members with the crystal axis opening and the crystal axis equivalent to the crystal recognition axis [U1] as the optical axis. Therefore, it is accumulated when the crystal axis is the optical axis. Many production techniques are required to form refractive members. Therefore, when designing a projection optical system, for example, it can be designed in a state where the projection optical system emits optical structure composed of fluorite = optical axis-due to crystal master η], and the optical component of the fluorite In other words, the &quot; ten parameter uses the azimuth angle θ centered on the optical axis ^. 2 As mentioned above, in the design process S1, &amp; several &lt; 5 &gt; data of a projection optical system having computational school performance within a specific specification can be obtained (design east numbers: such as the optical components constituting the projection optical system, ( Surface, shape, interval, eccentricity, inclination with respect to the optical axis, azimuth with one axis as the center, refractive index, birefringence, light W, reflectance, transmission- 27-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 Public Love 571344 A7 B7) Description of the invention Emissivity transmittance distribution, effective diameter, tolerance, etc., or the film structure formed on the surface of these optical components, That is, the number of film layers, the thickness of each layer, the material of each layer (plus the absorption coefficient of each layer if necessary), etc. Next, the crystalline material preparation step S2 is described below with reference to the flowchart of FIG. 6. FIG. 6 shows the crystalline material preparation step S2. A detailed flow chart for preparing an equiaxed crystal material having a light transmittance at a wavelength for use in a projection optical system. An equiaxed crystal material such as this There are laurels (calcium fluoride; CaFO or barium fluoride (BaF2)). The following &lt; explained the case where fluorite is used as an equiaxed crystal material as an example. (Step S21) In step S2i The pre-treatment for deoxidizing the powder raw material is carried out. The right side is grown by the Bridgman method for the fluorite single crystal used in the ultraviolet or $ 2 ultraviolet field. Generally, artificial South-purity raw materials made of stone. And if it melts only a single crystal, it will tend to become cloudy and devitrified, so it has always been taken to add a cleaning agent and heat to prevent white turbidity. It can be used in fluorescent The representative purifying agent for the pretreatment or formation of stone monocrystalline feet is lead fluoride (pbF2). It is generally called a purifying agent according to the added substances that can react with the impurities contained in the raw material to remove it. In the pretreatment in this embodiment, firstly, the detergent is added to a high-purity powder raw material and mixed thoroughly. Then, the temperature is raised to a temperature above the melting point of the detergent and less than the melting point of the fluorite. Make it After deoxidation reaction. &Amp; After that, it can be directly cooled to room temperature to make a sintered body, or

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Line-28-571344 -29-Description of the invention (26 The temperature can be further increased to temporarily melt the raw materials, and then cooled to room temperature to form polycrystals. The sintered body formed by the deoxidation reaction as described above or The polycrystal is called a pretreatment product. (Step S22) Next, in step S22, the pretreatment product is used for crystal growth to obtain a single crystal bond (ingot). The method of crystal growth is known to be roughly divided into Melt solidification method, precipitation method by solid solution, precipitation method by gas, solid particle growth method, but in this embodiment, the crystal growth is performed by the vertical Bridgman method. First, the pretreated product is housed in a container and installed At a specific position in the vertical Bridgman device (crystal growth furnace). Then heat the pretreatment contained in the container to melt it. After the temperature reaches the melting point of the pretreatment product, crystallization will begin soon after a certain time俟 After melting, all the liquid crystals are slowly cooled to room temperature and taken out in the form of an ingot. (Step S23) In step S23, the ingot is cut into a size and shape approximately the same as those in the refractive member forming step S4 described later. The disc material of the same degree of the optical member to be produced will be formed in the refractive member forming process described later. If the optical member to be produced is a lens, the shape of the disc material should be formed into a cylindrical shape. The diameter and thickness of the cylindrical disc material are determined in accordance with the effective diameter (outer diameter) of the lens and the thickness in the direction of the optical axis. (Step S24) In step S24, the Qa ^ and Dingshi early ovules passed through Dengshili The cut disc material is actually annealed. After implementing this step, a 7% S21 ~ S24 can be made from a fluorite single paper γ material (CNS) A4_2ig ^^

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Line 571344 A7

Composition of crystalline material. Next, the crystal axis measurement laboratory is implemented as follows. The measurement is performed in the crystal shaft step S3. At this time, you can take the second measurement of the crystal axis of the crystalline material prepared by S2, and prepare = S2 and determine the orientation of the crystal axis indirectly. First, the first method of measuring the orientation of the crystal axis described as follows. The C system uses an x-ray crystal analysis method to directly measure a crystalline material ... imprint ... and further measure a crystal axis. Such a measuring method is, for example, a Laue method, which is well known. The following applies the Laue method as the first measuring method and is briefly described below with reference to FIG. 7. FIG. 7 is a diagram of a schematic camera. As shown in FIG. 7, the Laue camera for realizing the crystal axis measurement according to the Laue method has an X-ray source 100 for guiding the ray line 101 from the parent line source 100 to a sample. Collimator 102 ′ of crystalline material 103 and X-ray photosensitive member 105 for exposure to diffraction X-ray 104 diffracted by self-crystal material 103. Among them, although not shown in FIG. 7 In the first measurement method, first, the X-ray 1 〇1 is irradiated to the warp In the crystalline material 103 prepared in the crystalline material preparation step S2, a diffraction X-ray 104 is generated from the crystalline material 103. The diffraction X-ray 104 is used to expose the X-ray arranged on the incident side of the X-ray of the crystalline material 103. X-ray photosensitive member 105 such as a film or an imaging plate to make the pattern corresponding to the crystalline structure visible (Diffraction image) is formed on the X-ray photosensitive member 105. The diffraction image (Laue pattern), knot -30-This paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) 571344 V. Description of the invention (28 crystal material will be W when it is single crystal). In Taiyin, the shape is therefore called Laue spot (LaUe is known, so the Jinpo plant, Caike 4 Laoshi and its crystal Structural analysis Θ Laue spot when it is clear that the first axis of the crystal axis is measured in a direct way. The axis is tens of thousands. The method can also be used, such as ··, etching method, and is not limited to Lao. * 边 使Crystals are turning or vibrating. Zhao Chao · X knots «^^ (Weissenberg material: split ηΉ me— &quot; 1) and other X-ray crystal analysis methods, or the use of crystals appeared in two: ΓΓ Direct observation of the crystalline material Plastic deformation = mechanical; material: the surface with a unique shape of the image of E, and then 'by measuring the birefringence of ^ crystalline material to determine the orientation of the crystal axis indirectly the second measurement method is briefly described below. In the second measurement method, First, the orientation of the day-to-day axis of the material The relationship between the shots corresponds. At this time, the orientation of the crystal axis of the crystalline material sample should be determined by the first method described above. Then, the birefringence of each of the plurality of crystal axes of the crystalline material sample is measured. Figure 8 Series A schematic diagram showing the structure of a birefringence measuring machine. In FIG. 8, the light from the light source 110 is transformed from polarized photon 11 丨 into linearly polarized light having a vibration plane inclined only 7Γ / 4 from the horizontal direction (χ direction). The linearly polarized light is irradiated on the crystalline material sample 1 13 by the phase modulation of the photoelastic modulator 112. That is, the linearly polarized light having the phase changed is incident on the crystalline material sample 丨 i 3. The light transmitted through the crystalline material sample 113 is introduced into the photon detector 114, so that polarized light having a vibrating surface only in the horizontal direction (X direction) passes through the photon detector 114 and is detected by the photodetector 115. -31-'This paper size applies the Chinese National Standard (CNS) A4 specification (21 × 297) 571344 A7 _____ B7 V. Description of the invention (29) When the specific phase delay caused by the photoelastic modulator 1 12 By measuring the amount of light that can be detected by the photodetector u 5 while changing the phase delay amount, the direction of the phase delay (phase delay) axis and its refractive index, and the phase advance (phase advance; phase lead) refractive index of the axis. If there is birefringence in the sample, the phase of the two linearly polarized light orthogonal to the vibration surface (polarizing surface) of the sample due to the difference in refractive index will change. That is, relative to the polarized light on one side, the phase of the polarized light on the other side must be advanced or delayed. Therefore, the polarized light direction in which the phase is advanced is referred to as a phase axis, and the polarized light direction in which the phase is delayed is referred to as a phase axis. . In the present embodiment, the biaxial refraction measurement is performed on each crystal axis of the crystal material sample that has become a known crystalline material sample through the first measurement method described above, and the crystal axis orientation of the crystal material is doubled with its orientation. The relationship between the amount of refraction corresponds. At this time, in addition to the representative crystal axes such as [1〇〇] [1 1 0], and [111], the crystal axes of the crystalline material to be measured may also be [1 12], [2 1 〇], and [211] Equivalent crystal axes (According to crystal axes [〇1〇], [001] are crystal axes equivalent to the above-mentioned crystal axes [100]], and crystal axes [〇11], [101] are It is equivalent to the above-mentioned crystal axis [丨 丨 〇]. The crystal axis located in the middle of the measured crystal axis can also be interpolated using a specific interpolation formula. In the crystal axis measurement step S3 to which the first measurement method is applied, the birefringence measurement of the crystalline material prepared through the crystalline material preparation step S2 is performed using the birefringence measuring machine shown in Fig. 8. Since the corresponding relationship between the crystal axis orientation and birefringence has been prepared in advance, the corresponding relationship can be used to calculate the crystal axis orientation from the measured birefringence. As mentioned above, if the second measurement method is followed, even if it is not directly measured -32-This paper size applies the Chinese National Standard (CNS) A4 (210 X 297 mm) B7 V. Description of the invention (3〇) Crystal Orientation can also determine the crystal axis orientation of the crystalline material. Next, the refraction member forming process will be explained as a result of the preparation process through the crystalline material preparation step 82. = Force: Form a specific shape of the optical member by processing: The order of the member forming step S4, regardless of whether they are first For example, it is possible to adopt a method for forming a second member to perform the crystal axis measurement step after the first refraction step S4 of the crystal axis masonry member formation step S4 and perform the crystal axis measurement step simultaneously. Three methods of forming the magic and refraction members. 7 $ First, the method of forming the first component is explained as follows. In the first method, the disc material prepared through the crystalline material preparation process is subjected to grinding, grinding, and the like, so that the optical component conforms to the design data containing the parameters in the m direction obtained in the design process S1. At this time, a specific mark should be marked on the processed optical component so that the ^ orientation of the optical component cannot be identified. Specifically, on the 9th, the projection optical system is manufactured by using a crystalline material (typically a disc material) that has been subjected to a grinding process to determine the orientation of the crystallographic axis in the crystalline material preparation process, if necessary, to manufacture a projection optical system. Refraction member. That is, the conventional grinding process is used to polish the surface of each lens with the surface shape and surface interval in the design data to produce a refractive member with a specific shape. 7 At this time, it is repeatedly polished while measuring with an interferometer to make each The shape of the lens surface is close to the shape of the target surface (best fit spherical shape). In this way, when the surface shape error of each lens meets a specific range, the surface shape error of each lens is measured with the interferometer device of (31) as shown in Fig. 9 J == -33-571344 A7 B7. The interferometer device shown in Fig. 9 is suitable for measuring the surface shape of a spherical lens having a design value of a spherical surface. In FIG. 9, the emitted light from the interferometer device 122 is incident on a Fizeau lens 123 supported on a Fizeau stage 123a. The light reflected on the reference surface (Fizeau surface) of the Fizeau lens 123 will be returned to the interferometer device 122 as reference light. In Fig. 9, although a single lens is used to represent the Fizeau lens 123, the actual Fizeau lens is composed of a plurality of lenses (lens groups). On the other hand, the light transmitted through the Fizeau lens 123 is incident on the optical surface to be inspected of the lens 124 as the measurement light. The measurement light reflected from the optical surface of the test lens 124 is returned to the interferometer device 122 via the Fizeau lens 123. In this way, according to the phase deviation between the reference light and the measurement light returned to the interferometer device 122, it is possible to detect the wavefront aberration of the inspected lens 124 relative to the inspected optical surface, and then detect the surface shape of the inspected lens 124 Error (deviation from the best fit spherical surface in design). For details on measuring the surface shape error of a spherical lens by an interferometer, see, for example, Japanese Patent Laid-Open No. 7 "2 535, Japanese Patent Laid-Open No. 7-1 1 3609, Japanese Patent Laid-Open No. 丨 〇- 1 54657 and the like. In addition, if an interferometer is used to measure the surface shape error of the aspheric lens, a reference having a plane-shaped reference surface is set on the Fizeau stage 123 a in the dry / y meter device of FIG. 9 instead of the Fizeau lens 123. A member, and an aspheric wave forming member for converting the light transmitted through the reference member into an aspheric wave of a specific shape. The aspheric wave forming member system includes a lens, a wave plate, or a combination of these. It is used to transform a plane wave from a reference member into a non-linear surface shape corresponding to the optical surface of the object to be measured. Spherical-34 This paper size applies to China National Standard (CNS) A4 specifications (21〇 \ 297mm |) _ 571344 A7

Waver. For the measurement method of such an aspheric lens, refer to, for example, Japanese Patent Laid-Open No. i 0_2 6002, Japanese Patent Laid-Open No. 2 60024, and Japanese Patent Laid-Open No. 11-6784. _ Once the first member forming method in the refractive member forming step S4, the measurement and grinding are repeatedly performed until the measured surface shape conforms to the range of the special area. On the other hand, in recent years, it has been disclosed that there is a kind of holding lens In order to minimize the stress on the lens when waiting for an optical member, a plurality of ridges (ridges) are placed on the periphery of the lens, and the plurality of ridges are held by a retaining member (through = 鞑) that holds the lens. Remain freely movable (see Japanese Patent Publication No. 2 001-74991). Therefore, when such a plurality of bulges are processed into a mark that can also serve as an indicator of the orientation of the crystal axis of the optical member, it can double It is used to indicate the orientation of the crystal axis of the processed optical component. Furthermore, according to the above-mentioned optical component holding method, the relationship between the foot position and posture of the holding component and the optical component can be constant, Information on the orientation of the crystal axis of the optical member (marks, etc.) may be provided on the holding member. Next, the method of forming the second member is described below. In the second method of forming the Z method, preparation of the crystal material The disc material prepared in step S2 is subjected to grinding, grinding, etc. At this time, parameters such as the surface shape, the surface interval, and the effective diameter (outer diameter) in the design data obtained in the design step S1 are used (when the relevant crystal is not used). The axis direction parameter is used to perform processing. In addition, in the second member formation method, the measurement and polishing are repeated repeatedly in the same manner as the first member formation method until the surface shape falls within a specific range. Then use the first The standard for measuring the crystal axis of the pre-processed optical component is 35-X 297 ^ 17

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V. Description of the invention (S3) Orientation, and the information about the measured orientation of the crystal axis, such as marking on the pre-processed optical component with a mark or the like. As described above, according to this embodiment, the crystal axis orientation can be determined even after processing into a lens or the like. Furthermore, the first method of forming a member is to measure the orientation of the crystal axis after forming a refractive member from a crystalline material, but the measurement of the orientation of the crystal axis may also be performed during the formation of the refractive member (third method of forming a member ).

Then, in the assembly step S5, the position of each optical component is positioned so that the position of the optical axis in the vertical direction and the rotation angle (azimuth angle) around the optical axis are in accordance with the design parameters obtained through the design process 51. And assembled into a projection light system. As described above, if the manufacturing method of the projection optical system according to the first embodiment is used, it is possible to evaluate the cause due to the plurality of polarizing components; = birefringence effect of axial crystalline materials such as fluorite or barium fluoride Next, in order to make the above-mentioned birefringence effect extremely small, the supporting angle of the crystal axis of the refractive member composed of the above-mentioned equiaxed # -based crystalline material is determined, because of good optical performance. Cui Bao

In the first embodiment described above, the method of optimizing the crystal axis orientation of the refractive member of an equiaxed crystal system crystal material and reducing the projection optical and system aberrations is adopted. However, it is still only required to optimize the crystal axis orientation. The optical performance of Article 7. π &amp; ", time, rain foot, heart, and wind" under the brother "will explain the manufacturing method of the projection optical system using the amorphous refraction member to degrade the performance in advance. = The deterioration of the academic performance is due to the ㈣ birefringence of the equal υ refraction member composed of isocrystalline crystal material.说 明加 解 依 -36-This paper rule Qi Cai @ @ 家 标准 _ 了 1 ^ 格 (21〇X 297 公 红 571571344 V. Description of the invention (34) Before the method of manufacturing the projection optical system, the content, the first For an overview, refer to FIG. 10. The following briefly explains how to make it easier to understand the projection optical system of the second embodiment of the present invention: FIG. W is a diagram showing the figure. The outline of the manufacturing method is shown in FIG. The projection light of the form is in addition to the manufacturing method of the first embodiment, and includes a material preparation step S2, a crystal axis measurement step ^ ten steps S1, a crystal sequence S4, and an assembly step _, and has Non: two pounds = step S7 for measuring the birefringence of the piece forming process, and step S4 of the first refractive member forming step S2 in the second refraction structure. The procedure for forming the piece is the same, but in this implementation = 2: The member forming step S8 is confusing, and the folding piece forming order S4 (the name is renamed to the first refractive member forming step μ is no longer used. The following 'explains the part which is different from the manufacturing method of the first embodiment. First, Step S1 is also counted for optimized investment. The number of optical systems, in addition to the design parameters of the first embodiment, is added to the birefringence of amorphous materials such as quartz or quartz doped with fluorine. As shown in Figure 11 (a), the projection optical system An optical system having a plurality of refractive members ji and 12 composed of an equiaxed crystal material and a refractive member 13 composed of quartz or an amorphous material doped with fluorite or the like will be described. The crystalline material of the system is, for example, the first refraction member ^ made of fluorite and the second refraction member 12 so that their crystal axis [111] is arranged to coincide with the optical axis Ax, and the second refraction member 12 is aligned with the optical axis Ax Centered with respect to the first refracting structure -37-571344 A7

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571344 V. Description of the invention (36 = figure can be understood, as for the first and second refractive members &quot;, = ::: the largest crystal axis [11 °], the influence of Tao is already 1 'part will remain on the peripheral area Or the refractive index Λ emissivity is smaller than the refraction abundance of polarized light in the material diameter direction. In other words, the crystal axis angle of the refraction member composed of crystalline material depends on the angle of the temple axis and may be subject to a certain process = [ The apparent crystal axis is to ensure perfect imaging performance (optical dual energy). In the case of the influence of the laser beam, it is difficult to use this embodiment. For this embodiment, the structure of the amorphous material is different. D is used to cancel the birefringence distribution due to the refraction members u and M. Fig. U⑷ shows the birefringence of the refraction member 13 = = = to give the desired birefringence to the refraction member composed of amorphous material: 2: two, method Two are described in the amorphous material preparation step S6 described below. The above-mentioned step S1 is used to calculate the refractive distribution of amorphous ::: structure: Γ. Specifically, it refers to the refractive member = meter. Data) 'And as in the first embodiment, the mode is folded: In the second mode, It is also possible to optimize parameters other than the parameters of the birefringence distribution made of amorphous materials (parameters the same as the first parameter), and for her / ^ # ^^ 6, ^, ^ (residual6ΓΓ〇; ^ Γϊ Γ! The parameters of the birefringence distribution of the refractive member composed of the crystalline material are the most: two ;: 39-&gt; &lt; 297 mm) i Paper size is applicable to a standard (CNS) 571344 A7 B7 Fifth invention description (37 positive method. In addition, similar to the first embodiment, the following method can also be adopted, ^ knife only changes the optical components (lens, reflecting surface temple) constituting the projection optical system <surface shape, surface Interval, eccentricity, and tilt relative to the optical axis: The optical core made of amorphous material, such as effective diameter, tolerance, etc. has "parameters" and corrects the scalar component aberration in the optical performance of the projection optical system, and then changes the film by Structure, birefringence distribution of optical components: methods for correcting scalar components and polarization aberrations as parameters such as the azimuth of the center. Furthermore, the crystal axis of a refractive component composed of an equiaxed crystal material is used: Bit optimization Result 'If it is not only polarized aberration, but even scalar aberration will remain, it can also be used to form the projection optics and system components: the optical surface (lens surface, reflective surface) of the component, which is used to correct this: Quantitative image aspheric surface. This aspherical surface can also serve as an aspheric surface (typically a rotationally asymmetric shape with respect to the optical axis) for correction of residual aberration calculated in step S526 through an assembly process described later, or it can be provided separately. If the eight-open setting is used, the aspheric shape (rotationally symmetrical or rotationally asymmetrical shape with respect to the second axis) can be added as a design parameter in advance in the design process 81. Next, the amorphous material preparation process S6 is explained as follows. In this embodiment, the amorphous material is quartz or fluorine-doped quartz (hereinafter referred to as modified; Wu). However, this type of quartz or modified quartz is different from optical crystals and does not appear in the physical phase state. Birefringence. ~ Of course, in quartz or modified quartz, if there are impurities mixed in it, or in cold binding -40-571344 A7 B7 V. Description of the invention (38) &quot; 'When the quartz formed at high temperature, , But it will show birefringence. Therefore, in this embodiment, a method of adjusting the amount or type of impurities to be incorporated in the ingot and the thermal history is adopted to generate the desired birefringence distribution from quartz or modified quartz. The above impurities can use OH, C1, metal impurities, and dissolved gases. If a direct method is adopted, the content of the impurities is hundreds of ppm or more of 0H, followed by tens of ppm (^ If the impurities are mixed in the ingot, the thermal expansion coefficient of the material will change soon. Therefore, for example, when annealing is performed to cool the material, the shrinkage degree of the impurity-doped portion will increase, which will cause the degree of shrinkage. As for the internal stress caused by different stress birefringence. Regarding the thermal history, whether it is the direct method, the VAD (vapor axial depositi) method, the sol · gel (soi gei) method, Any manufacturing method such as a plasma burner method may exist. In this embodiment, a Si compound gas that is a raw material of quartz flows out of the torch (for the Si compound, it is used 〇2, 'and supply Quartz is synthesized by the flame hydrolysis method of quartz deposition in a heated combustion gas (0 2 gas and H 2 gas) and t / in) flame to obtain an ingot. After the step, the ingot is cut out to obtain the ingot. Disc material, and then perform annealing treatment (or slow cooling) of the disc material. In this embodiment, the synthesis conditions during the synthesis of quartz and the thermal history conditions during the annealing treatment are adjusted so that the quartz The birefringence distribution of the refraction member constitutes the birefringence score 41-571344 calculated through the design process §1. 5. Description of invention (39). At this time, the parameters of the synthesis conditions are such as the structure of the torch, the gas flow rate, and the exhaust gas. Flow rate, light shaking mode, etc. In addition, such synthetic annealing conditions can also be obtained by trial and error method (try and error method), or determined by using empirical formulas. In this embodiment, for example, the axis of symmetry of the birefringence distribution of an amorphous material composed of, for example, quartz or modified quartz is consistent with the optical axis of a refractive member formed of the amorphous material. Therefore, when synthesizing quartz, The ingot is synthesized with the turning edge, so that the impurity concentration and physical property distribution in the ingot are center-symmetric. 2 Therefore, the center position of the ingot (approximately the center of rotation during synthesis) Symbol) is the center of the stress distribution, so in the later-mentioned second refractive member forming step, it is preferable to form the refractive member based on the central position (so that the central position is aligned below the optical axis). Therefore, it is preferable to set the central position It is marked on the raw material cut out by the key. During the annealing treatment, the shape of the raw material cut out from the ingot is cut into a cylindrical disk material, and it is heated in the center of the furnace with a symmetrical temperature distribution. In this case, it is preferable to perform the annealing treatment while turning the disc material. The following describes the birefringence measurement step 37. In this birefringence measurement step S7, the measurement is performed through the amorphous material preparation step. The birefringence distribution of #crystalline material made of quartz or modified; The measurement of the birefringence distribution can be performed using the birefringence measuring machine shown in Fig. 8, and the measuring method is as described above, so it will not be described. In addition, it is preferable to use a method such as marking the disc material so that the amorphous material has information about the position of the axis of symmetry of the birefringence distribution known through the measurement. 571344

In addition, in this birefringence measurement step, it is desirable that the refractive index distribution of the amorphous material is also measured at the same time. The method of measuring the refractive index of the amorphous material = the logarithmic value and the refractive index profile is described below with reference to FIG. 12. Fig. 12 is a diagram schematically showing an interferometer device for measuring the absolute value of the refractive index and the refractive index distribution. In Fig. 12, the amorphous material 133 of the object to be inspected is placed at a specific position in the sample case 132 filled with the oil 131. The light emitted from the interferometer device 135 controlled by the control system 134 is made incident on a Fizeau flat plate (Fizeau plane) 136 supported on the Fizeau stage 136a. At this time, the light reflected by the Fizeau plate 136 will be returned to the interferometer device 135 as reference light. On the other hand, the light transmitted through the Fizeau plate 136 is incident on the object 133 in the sample box 132 as the measurement light. The light transmitted through the test object 133 is reflected by the reflection plane 137 and returns to the interferometer device 135 via the test object n) and the Fizeau plate 136. In this way, the wavefront aberration caused by the refractive index distribution of the amorphous optical member 133 can be measured based on the phase deviation of the reference light and the measurement light returned to the interferometer device 135. Please refer to Japanese Patent Application Laid-Open No. 8-5505 for details on how to use the interferometer to determine the refractive index uniformity. Next, a second refractive member forming step S8 for forming a refractive member from an amorphous material will be described below. In the second refraction member forming step S8, a birefringence measurement step S7 is used in which a birefringent distribution or refractive index distribution of an amorphous material (typical = disc material) has been ground as necessary, To manufacture the lenses for the projection optical system. That is, according to the traditional polishing process, the surface of each lens is ground and processed in the design data as the target.

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5. Description of the invention (41) A refractive member having a lens surface with a specific shape is manufactured. This second refraction member forming step is the same as the first refraction member forming step (the first embodiment forms the refraction member forming step, and is repeatedly polished while measuring the surface shape of each lens with an interferometer, so that each of the transparencies &gt; & amp Dinghezhu ^^ "The surface shape is close to the target surface shape (best fit spherical shape is performed in this way, when the surface shape error of each lens falls within a specific range, and the first refractive member forming step (the refractive member forming step of the first embodiment) S4) Similarly, the surface shape error of each lens is measured using a precise interferometer device as shown in Fig. 9. In the second refractive member forming step S8, it is also necessary to repeatedly perform measurement and polishing until the measured surface shape can be measured. It conforms to a specific range. Next, refer to FIG. 13 for explanation of the assembly process of the first embodiment: FIG. 13 is a flowchart showing the details of the assembly process S5 of the projection optical system manufacturing method of the second embodiment. A general flowchart A diamond block is used to represent the judgment process', but for the convenience of illustration, the judgment process is represented by a hexagon in FIG. 13 (for example, 13 of 3514, S517, s522, MU, S532) 〇 (Step S510) In step S5 10, according to the crystal axis measurement step S3, the crystal axis of the refracting member made of the material of. For the information, the surface shape and surface spacing of the processed refracting member measured in step S4 of the first refracting member 2 are sufficient, and the birefringence measurement step is used to measure the refracting member made of amorphous material. Of the refractive index and distribution of birefringence and the distribution of birefringence, and the information about the shape and spacing of the processed refractive members measured in the first refractive member forming step S8; and by using an electronic computer 571344 A7

Simulation operation to predict the use of these parameters (surface shape, inter-surface = ::: =, crystal axis orientation, birefringence, birefringence distribution, etc.) "Preconstruction: and the optical that can be obtained when the projection optical system is assembled performance. First, after sighing the parameters of the optical components of the projection optical system in accordance with the design data obtained in the design process S1, the optical performance of the projection optical system obtained by adding the above information to each optical component is given. At this time, the evaluation value of the optical performance of the projection optical system can use the above-mentioned average phase distribution, retardation distribution, RMS value, pSF value, etc. of these. (Step S511) In step S511, the simulation operation is used to obtain the distance between each optical member, the eccentricity with respect to the optical axis, and the perimeter of the optical axis. Optical angle of the projection optical system PL when the assembly angle is changed. According to the optical components prepared through the above steps S2 to S4 and S6 to S8, it will inevitably cause heterogeneity of refractive index distribution or birefringence distribution, or manufacturing errors such as surface shape, surface interval, and crystal axis orientation. Therefore, just changing the azimuth angle (assembly angle) around the optical axis of the optical component is enough to change the characteristics of the projection optical system PL. Therefore, in this step, the distance, the eccentricity, and the assembly angle of each optical member are optimized so as to optimize the optical performance. (Step S512) In step S512, the optical member is assembled according to the optimized interval and eccentricity of the optical member and the assembly angle obtained through the simulation operation, and the optical member is assembled according to the optimized interval and eccentricity of the optical member and the assembly angle. In the lens barrel used to hold each optical component. —__-45-This paper size applies to China National Standard (CNS) Α4 size (210 X 297 mm)

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(Step S513) a In step S513, the wave aberration is measured using the aberration measuring device shown in Fig. 14. The aberration measuring device shown in Fig. 14 belongs to the principle using the phase recovery method. As shown in the figure, the pattern forming surface of the pattern ⑹41 is located on the object surface of the projection optical system PL, and the object optical system 143 &lt; the front focus position is positioned at the imaging position (image plane) of the projection optical system PL, and then illuminated by The illumination light emitted from the light source 140 illuminates a small hole 142 formed in the pattern plate 141 to generate an ideal spherical wave. As soon as this ideal surface wave passes through the projection optical system pL, it will be affected by the aberrations remaining in the projection optical system PL, and the ideal spherical wavefront shape will change. The object optical system 143 condenses light that has passed through the projection optical system, and the imaging signal obtained by photographing the image with the imaging element 144 will have its intensity distribution changed according to the residual aberration of the projection optical system PL. Therefore, for image signals containing residual aberration information about the projection optical system PL, according to a specific operation of the phase recovery method, the residual aberrations of the projection optical system can be obtained. For details of the phase recovery method described above, refer to the patent specification of U.S. Patent No. 4,309,602. When measuring the residual aberration of the projection optical system PL, as shown in FIG. 4, not only should the small hole 142 formed in the pattern plate 141 be positioned on the optical axis AX of the projection optical system pL, but also the The small hole ι42 is used to measure the wavefront aberration in a state where a plurality of measurement points are located in a plane orthogonal to the optical axis Ax. Therefore, in this step, the position of the small hole 142 is moved to the measurement point in the plane orthogonal to the optical axis AX, and the wavefront aberration is measured. However, instead of moving the pattern plate 141, it is also possible to form a plurality of small holes in the pattern plate 141, and according to _________- 46-This paper is suitable for financial standards ® Family Standard (⑽) A4 Specification _ (2ΐ () Love)_

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A method for measuring the wavefront aberration is provided in the source 140 to limit the illumination area and to illuminate only one small hole at a time. (Step S514) Step S514 determines whether the measurement of the wavefront aberration can be performed on all 4 points on the image plane of the projection optical system. According to the aberration measuring device shown in FIG. 14: according to the phase recovery method, a specific operation is performed on the imaging signal obtained by the imaging element 144 to obtain a residual aberration of the projection optical system PL but a residual of the projection optical system PL If the aberration is too large, the phase is restored / still unable to restore the wavefront. Therefore, in step SM4, it is judged whether or not the fixed point can be used to measure the wavefront aberration. As a result, even if it is impossible to carry out the test, and the second test point is judged to be only one (the judgment result is "; No"), control must be moved to step S515. (Step S515) 敕 At step S515 ', at least the interval adjustment of the optical axis direction of each optical component is performed 2: the position adjustment (eccentricity adjustment) in the orthogonal plane of the optical axis of each optical component, and the azimuth around the optical axis of the optical component Adjust one of the tasks to adjust the optical performance of the projection scholarship system, and then move the control to step 2 and 3. These steps S513 to S515 are repeatedly performed until it is judged in the step training = aberration material is implemented at all measurement points. At this time, if it is determined in step s5M that the aberration measurement can be performed at all measurement points: OK "), control is transferred to step S516. (Step S516) and (Step S516 '), the aberration of the foot wavefront is measured using the aberration measuring device described above. -47: 297 mm) This paper has a standard size (210: ^ 44

(Step S517) In step S517, it is determined whether or not the wavefront aberration measured through step 3516 is within the specifications. This step S5 17 is used to determine whether the optical performance of the projection optical system has been adjusted to be sufficient for implementation of the high-precision aberration J foot described below. If the determination result is r NG ”, control is shifted to step s5 1 8, and if the determination Wf result is“ 0 κ ”, control is shifted to step 19. (Step S518) In step S518, at least the interval adjustment of the optical axis direction of each optical member, the position adjustment (eccentricity adjustment) in the orthogonal plane of the optical axis of each optical member, and the azimuth adjustment around the optical axis of each optical member are performed. One of them, to adjust the optical performance of the optical system to the optical system, and then move the control to step $ 5 16. (Step S519) The above-mentioned steps S516 to S518 are repeatedly performed. When the optical performance of the projection optical system is adjusted to a level sufficient for performing aberration measurement with high precision described later, control is shifted to step S519. Step S519 is performed using a wavefront aberration measuring machine such as the Fizeau interferometer method disclosed in Japanese Patent Laid-Open No. i 0-38757, or disclosed in Japanese Patent Laid-Open No. 2 000-9761 6. A PDI (Phase Diffraction Interferometer) method is used to measure the wavefront aberrations with high accuracy. In this case, in this embodiment, the wavefront aberration is measured for each of the plurality of polarization components of the projection optical system. Specifically, the above-mentioned XY polarization component or R0 polarization component can be used. In addition, in this embodiment, it can also replace the wavefront aberration measurement of each of the plurality of polarized components, or it can be added to it -48-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 571344 A7

She uses non-polarized light components (for example, the above-mentioned χγ polarized light component and Han0 polarized light component). (Step S520) In step S520, a fitting of the cylindrical function system Zη ㈦ of Zernicke (Fiuing) is performed on the measured wavefront aberration, and the expansion coefficient for each term is obtained, Then, each component of the wavefront aberration is calculated (if necessary, each component of the wavefront aberration by polarized light is also calculated). The wavefront aberration fitting of Zernike's cylindrical function system Zn (p, ... is briefly described below. First set the polar coordinates on the emission surface, and let w (p, ㈥ represent the wavefront image. Among them p is the normalized pupil radius where the exit pupil surface PS specification becomes 1. β is the vector angle of the polar coordinates. Next, using Zernike's cylindrical function system Zη (ρ, 0), the wavefront aberration w (p , ㈦ is expanded as shown in the following formula: ⑹ W (ρ, θ) = Σ (: ηZη (ρ, Θ) = C1Z1 (p, 0) + C2Z2 (p, 0) + ... ••• + CnZn ( p, 0) In addition, since the cylindrical function system related to Zernike's cylindrical function system Zn⑺ and 各项 is well known, it will not be described in detail f. Next, the projection optical system of this embodiment There is an external adjustment device, and the optical performance (magnification, aberration, etc.) can be adjusted after the projection optical system is mounted on the exposure device body. Such external adjustment devices can be controlled by actuators, or A device for manually adjusting the postures of the optical components constituting the projection optical system, or a device Among the optical components constituting the projection optical system, the most side is located on the first side and / or the second side -49-This paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) 571344 5. Description of the invention (47 ) And other optical components that have optical characteristics that are different from the optical component, etc. μ The external adjustment device is briefly described below with reference to FIG. 15. This embodiment of the grudge projection optical system is a The plurality of optical members 2 丨 to 27 are arranged along the optical axis direction (Z direction), but the optical member 21 on the R side of the first surface and the optical member 22 on the w side of the second surface may be opposite to each other. The projection optical system PL can be exchanged freely. Moreover, the five lenses 23 to 27 of the plurality of optical components can be adjusted by the actuators 28 to 32 along the optical axis direction (Z direction), and along with the The direction in which the optical axis is orthogonal (χγ direction) is the position of the rotation direction (Θχ, 0y direction). Among them, the holding member 33 for holding the optical member 22 on the W side of the second surface is configured to be opposite to each other. In composition One part 34 of the lens barrel of the shadow optical system pL can be freely attached and detached. In this embodiment, since the positions of the five lenses can be freely adjusted in the z direction, the ex direction, and the 0y direction, five rotational asymmetric aberrations can be corrected (Magnification, low-order distortion, low-order coma aberration, low-order image plane curvature, and low-order spherical aberration.) In addition, in this embodiment, five lenses are configured as positions $, which can be freely adjusted, but the positions can be freely adjusted. The number of lenses is not limited to five. In addition, in this book, at least one of the optical member on the R side of the first surface and the optical member on the W side of the second surface is configured to be compatible with The optical components with different birefringence and birefringence distribution of the optical components can be changed freely. This optical member can be applied through the same steps as the above-mentioned crystalline material preparation step S2, crystal axis measurement step S3, and first refractive member formation step S4 = an equiaxed crystal-based crystalline material (e.g., fluorescein> Barium), or through the preparation process S6 with the above-mentioned amorphous material, double folding ___- 50-This paper size applies ㈣S Standard (CNS) A4 specification (21GX297 public love) ^ 1344

S7 and the first refracting member form a crystalline material (quartz, modified quartz). In addition, regarding the optical member on the ruler side of the first surface and / or the optical member on the w side of the second surface, the The position, gimbal tilt, and position in the ζ direction may be adjusted relative to the projection optical system y. If this configuration is adopted, for example, the asymmetrical polarization aberration is rotated in the projection optical system P, the position of the 1st structural member 21 or 22 having a specific refractive index ^ can be adjusted, and the rotationally asymmetric polarization can be corrected. Aberration. At this time, if the optical member located on the w side of the second surface is a flat plane plate ', adjusting the inclination of θχ and the direction can correct the eccentric coma aberration. In addition, if the optical component on the w side of the second surface is adjusted to change its refractive power (interchangeable with optical components with different refractive powers), it can be adjusted = j whitezval sum of the optical system PL. Furthermore, although not shown in FIG. 15, a toric surface optical surface (refractive surface, reflective surface, etc.) is provided on a part of the optical member constituting the projection optical system PL, and the optical member is adjusted. The azimuth around the optical axis Aχ can correct astigmatism on the optical axis. (Step S521) Please refer to FIG. 13 again. In step S521, if the projection optical system has each component value of the wavefront aberration calculated in step S520, the wavefront adjusted by using the external adjustment device described above is predicted by simulation operation. Aberrations (or components of wavefront aberrations). Specifically, it is based on the calculated component values of the wavefront aberrations as starting points for parameters of the external adjustment device (the amount of movement of the lenses 23 to 27, the surface shape of the optical members 21 and / or 22, the refractive index, Refractive index distribution, bi-51-This paper is compliant with National Standards (CNS) A4 specifications (21GX 297 public 571344 A7 -_________ B7 V. Explanation of the invention (49) Refractive index, birefringent distribution) is optimized and calculated The aberration of the projection optical system in the simulation operation after the diameter is optimized. In addition, in the external shading device, if the birefringence and the optical components with different distributions are not exchanged, the wavefront aberration to be predicted can be only a scalar component. (Step S522) In step S522, it is determined whether the aberration predicted by the simulation operation is within a specific range. If the result of the determination in step 3522 is "shame", control is transferred to step S523. Otherwise, If the judgment result in this step S522 is "0K", then control is moved to step S529. (Step S523) In step S523, it is judged whether or not the optical axis direction interval # 1 of each optical component can be adjusted by implementing, Of optical components The position adjustment (deflection ~ correction) in the orthogonal plane of the axis and the adjustment of the azimuth angle around the optical axis of each optical component correct the aberrations predicted in the front f step S 5 2 2. The judgment result of this step s 5 2 3 If it is “OK”, then control is moved to step S524, otherwise, if the judgment result is “ng”, then control is moved to step S525. (Step S524) In step S524, at least the optical axis direction of each optical component is adjusted. Adjusting the interval, adjusting the position in the plane orthogonal to the optical axis of each optical component (eccentricity adjustment), and adjusting the azimuth angle around the optical axis of each optical component to correct the aberration of the projection optical system, and then moving the control Go to step S516. According to these steps S5 16 ~ S524, it is used to find out whether the projection optical system can be used without forming an aspheric surface on the optical component of the projection optical system or exchanging the optical component with a different birefringence distribution. Optical components improved to

571344 A7 B7 V. Description of the invention (50) To what extent is the process. If it is judged in the above step S523 that it is impossible to correct only the aberrations judged to be abnormal depending on the interval adjustment, eccentricity adjustment and azimuth adjustment of the optical components, then control is transferred to the following step S525. (Step S525) In step S525, a simulation operation is performed to predict the interval adjustment of the optical axis direction of each optical member, the position adjustment (eccentric correction) in the orthogonal plane of the optical axis of each optical member, and the periphery of the optical axis of each optical member. The wavefront aberration (or components of the wavefront aberration after adjustment of the azimuth angle, if necessary, the components of the wavefront aberration per polarized light). Specifically, t is optimized by taking the starting point of each component value of the calculated wavefront aberration as 4 and using the interval adjustment amount, eccentricity adjustment amount, and azimuth adjustment amount of each optical member as parameters to optimize it, and then The aberrations of the optimized projection optical system are shown. (Step S526) In step S526 ', the aspherical shape of the residual aberration ("residual component") of the investment system predicted in step ⑽ can be calculated and the aspheric shape and /: Ge: refraction distribution. In this step S526 According to the aberrations to be corrected, you can choose ^ aspherical optical members and / or change the bi-folded cloth 0 Figure ⑽ '' to explain the aspherical optical members and / or change the double lambda Component diagram. The projection optical system shown in FIG. 16 is the light of :::: The first side of the &quot; side is provided with a pre-reflective member with negative refraction ... an optical member e2 with positive refraction, Binding with self-n-size scale 53-X 297 ^ 57 571344 A7 ____ B7 V. Description of the invention (5 彳) Optical member e3 with refractive power, optical member e4 with aperture stop 3 and positive refractive power. The light path from the two different object points Q1, Q2 on the first surface R when passing through the projection optical system PL is described below. The symbol u in the figure is the light path of the light beam emitted from the object point Q1, and the symbol Dagger 2 is the light path of the light beam emitted from the object point。 from the optical axis The light at the point Q1 at the intersection of χ with the first surface r is diffused or focused every time it passes through the optical members el to e4 and is imaged at the intersection of the optical axis Aχ and the second surface w. Assume that the optical member el The effective diameter of ~ e4 is more than 1 ~ 04. In addition, the beam diameter of the light beam L1 when passing through each optical member ei ~ e4 is 0L1 1 ~ 0L1 4, and the beam diameter of the light beam L2 when passing through each optical member el ~ e5 is 0L2 1 ~ 0L2 4. In terms of the optical path when the light beams LI and L2 pass through the optical member ei, the ratio of the beam diameter 0L1 1 to the effective diameter of the optical member el and the beam diameter 0L2 1 to the effective diameter of the optical member el The ratio is about 0.25, and the position of the light beam L1 passing through the optical member el and the position of the light beam L2 passing through the optical member el are different from each other. On the other hand, as for the light paths when the light beams L1 and L2 pass through the optical member e4, the relative The ratio of the beam diameter L1 5 of the effective diameter 04 of the optical member e4 and the ratio of the beam diameter L2 4 to the effective diameter 04 of the optical member e4 is approximately close to 1, and the beam L1 passes through the optical member e4. The position is approximately the same as the position where the light beam L2 passes through the optical member e4. Therefore, when calculating the aspheric surface of the optical member in the projection optical system PL in step S526 and calculating the birefringence amount and distribution in the projection optical system PL, it should be selected by considering the passage path of the light beam illustrated in FIG. 16 before taking into consideration Optical components that can effectively correct aberrations. -54-This paper size applies Chinese National Standard (CNS) A4 specifications (210 X 297 mm) 571344 A7 __ B7 V. Description of the invention (52) For example, to correct the image plane coordinates In the case of highly dependent aberrations (scalar aberrations such as distortion, image plane-curvature, and polarized aberrations (effect of birefringence) according to image plane coordinates), if the beam L1 from the object point Q 1 is supplied, And the light beam L2 from the object point Q2 will pass through the aspheric surface of the optical member (lens surface, reflective surface, etc.) of the separated optical member ei, or change the birefringence distribution of the optical member e. Correct aberrations with high image plane dependency. If you want to correct aberrations with high pupil coordinate dependence (for example, scalar aberrations, eccentric deafness aberrations, scalar aberrations, etc., polarizing aberrations with less image plane dependence (the effect of birefringence)), The light beam L 丨 at the object point Q1 and the light beam L2 from the object point Q2 will pass through the comprehensive optical member to set an aspheric surface on the optical surface, or change the birefringence distribution of the optical member e4, which can effectively Correct aberrations with high pupil coordinate dependence. As for the correction of image plane dependency and pupil coordinate dependency close to the same aberration (such as _: shape aberration, etc.), the beam ^ 1 from the object point q 1 and the beam L 2 from the object point Q 2 The degree of overlap is aspherical on the optical surface of the intermediate optical member (such as optical member e2, etc.), or the degree of overlap of the light beam L1 from the object point Q1 and the light beam L2 from the object point q2 is changed to be intermediate. The birefringence distribution of the optical member (such as the optical member e2, etc.) can effectively correct aberrations of image plane dependency and pupil coordinate dependency close to the same degree. Therefore, in step S526, in order to correct the scalar aberration, it is appropriate to calculate the aspheric shape on the optical surfaces of at least three optical members of the plurality of optical members el to e4 * in the projection optical system PL. As for the correction of polarized aberrations (the effect of birefringence), most of them will have high pupil coordinate dependence (image plane -55-

V. The effect of invention description (53)), so the polarization aberration (a plurality of optical components of the birefringence optical system PL should be calculated based on at least one optical standard with low dependency on the el to e4). The amount of refraction and distribution are suitable. An optical element made of a material having a birefringence amount and distribution as described above is not specified, and the effective diameter of the optical member is specified by the first -When the light beam emitted from the point passes through the optical member, the beam diameter should be set so that it can be arranged at a position that can satisfy the following conditional expression. (7) 0.6 &lt; φρ / φ〇 £ 1 The birefringence distribution of the optical member is arranged at a position that satisfies the formula (2), which can effectively correct the polarization aberration (the effect of birefringence) caused by the refractive member composed of the crystal material of the material crystal system. For the correction effect of polarization aberration (the effect of birefringence), it is sufficient to set the lower limit of the above formula (7) to 0.7. In addition, polarized light having a high dependence on pupil coordinates (low dependence on image plane coordinates) can be used. Aberration (of birefringence Impact) The optical component made of amorphous material with the required birefringence and distribution should be placed within 150 mm from the pupil position of the self-projection optical system. And if you want to correct the comet more effectively If the aberrations of image plane coordinates such as shape aberration and pupil coordinates are close to the same degree, the overlap between the light beam L1 from the object point Q1 and the light beam L2 from the object point Q2 is calculated as the middle two. The aspheric shape of the optical surface of each optical component is appropriate, so in step S526, it is appropriate to calculate the aspheric shape of at least four optical components of the plurality of optical components el to e4 of the projection optical system PL. In addition, the aspheric surface formed on the optical member el ~ e4 can be used relative to -56-This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 571344 5. Description of the invention (54, symmetrical or non-symmetrical) Any one of the symmetry. It can also form an aspheric surface irregularly (P near the ground) according to the occurrence of the second image. Similarly, set the optical configuration pair φ64 "birefringence distribution" can also be relative to the optical axis Ax is right Or non-eye ": Any of the two. It can also have an irregular J (Ik machine) birefringence distribution according to the polarization aberrations that occur. Calculate via step S526 &gt; Non-I Ding is different and aspherical And the amount and distribution of birefringence are not limited to the purpose of correcting all aberrations. The wavefront of the PL system of the prior learning system is only used to correct specific residual aberrations. ⑽ &amp; Blood ΊThe correction of the wavefront aberration by the Zhouzheng device is | ^, and the correction is performed in step S526, but it can also be adjusted by an external adjustment device. In addition, in the month of January, due to the imaging fFT, the residual wavefront aberration is If the two imaging m are ignored, they can be corrected without facing or giving a birefringence distribution measure. i into aspheric (step S527) Please refer to FIG. 13 again. In step S527, the optical surface β κ Α of the optical component is selected by S526 (transmitting surface of S526, etc.), and processed into an aspheric shape that is different from step S526. If the field ’% building block # 加 舡 音 八 士 7 ^ S526 乂 更 特 疋 的 布布’, it is ready to have calculated by step _6; Jin shot! And the distribution of "optical materials" (step S528) and the implementation of optical materials (two steps): a two-shape aspherical optical component system At this time, the assembly error is unlikely to be large # Α ^ 〃 Ren This is what happened at this time ... Use the aberration measuring device shown in Figure 14 to fix it 1 ---______-57 This paper is suitable for two scales 571344

: "Because, in this embodiment, the control shift (step S529) = t" S522, if the aberration of the simulation operation _ lies in the specific hand = within (when the judgment result is "οκ"), it is It means that the optical characteristics of the projection optical system have been adjusted to be finely adjustable by the external adjustment device. Therefore, the installation of the external adjustment device is implemented with its initial adjustment. 〇 ′ 、 中 夕 卜 # The adjustment processing of the response amounts of the actuators 28 to 32 shown in the figure to the control signals. Specifically, for example, the output of the actuators 28 to 32 should be increased by a control system (not shown) (_ "When the control signal, the actuators 28 to 32 still * can increase i _ according to the indication of the control signal = Therefore, it is necessary to adjust the response amount of the actuator 28 to 32 relative to the control amount of the control system. However, since the control k number output by the control system is a signal used to make the optical performance of the projection optical system variable, therefore 泫The initial trimming is to obtain the correlation between the adjustment amount borrowed from the external adjustment device and the performance change amount of the projection optical system PL. However, if the actuators 28 to 32 are installed, only the adjustment using the external adjustment device is performed (Step S530) Dialing step S529-end, the wavefront aberration measurement is performed using the wavefront aberration measuring machine which was used in the above step S516. At this time, the same can be performed for the measured result as in the above step S520. The wavefront aberration is fitted with Zernike's cylindrical function system Zη (ρ, Θ), the expansion coefficient Cn (Zernike coefficient) for each term is obtained, and the components of the wavefront aberration are calculated. (Step S531) -58-This The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 571344 A7 B7 V. Description of the invention (56) ---- The above step S530—end, it is judged whether the aberration of the projection optical system lies in the specification If the judgment result of step 3531 is "ng", then control is transferred to step S532, otherwise, if the judgment result of step 3531 is "〇κ", the manufacture of the projection optical system PL is completed. (Step S532) In In step S52, after performing the adjustment using the external adjustment device described above, the control is moved to step S529. Here, steps s529 to s532 are repeatedly performed until the judgment result of step S531 becomes rOK ". Furthermore, in Although the assembly process of the second embodiment described above adjusts the wavefront aberration using a plurality of polarized light components, the wavefront aberration can also be measured using only non-two light components. At this time, only the wavefront is used. The standard components of the aberrations are known, so only the parameters of the optical components that affect the polarizing components of the wavefront aberrations are obtained. The correlation between the parameters and the scalar components of the wavefront aberrations is used in each step It is only necessary to change the parameters of the optical components in the above. In summary, if the manufacturing method of the projection optical system according to the second embodiment is used, it is possible to evaluate the origin of, for example, camping stone, barium oxide, etc., because a plurality of polarizing components can be evaluated. The birefringence effect of the axial crystal system crystalline material, while setting the crystal axis assembly angle of the refractive member composed of the isoaxial crystal system crystalline material, set the birefringence effect (polarization aberration) to be extremely small, and it can be amorphous The refraction member is used to compensate for the refraction effect (polarization aberration) that cannot be completely corrected by the optimization method based on the orientation of the crystal axis alone. Therefore, it is possible to ensure good optical performance. Implementation form or ______- 59-This paper size applies to China National Standard (CNS) Α4 size (210 X 297 mm) 571344

The exposure apparatus of the projection optical system manufactured in the second embodiment is described below with reference to FIG. FIG. 17 is a diagram schematically showing an exposure apparatus according to a third embodiment: In FIG. 17, pulse light from a light source 40 composed of A ”(argon fluoride) excimer laser that supplies pulse light having a wavelength of, for example, 193 nm, It travels in the direction of the parent and is deflected via the bend 41 of the optical path, that is, incident on the% photon element at the turret 42 of the doe (Diffractive Optical Element). Far D 0 A The turntable 42 is provided with a plurality of diffractive optical elements of different types. These diffractive optical elements can transform an incident light beam into a specific cross-sectional shape such as a circle in the far field of the diffractive optical element. Beams with a shaped profile, a belt-like profile, and a multi-pole profile (for the eccentric plural poles of the reference optical axis). The divergent beam from this diffractive optical element is condensed by a condenser lens group 43 and focused in a miniature The far-field area of the diffractive optical element is formed near the position of the micro fly 's-eye lens 44. Among them, the so-called miniature fly-eye lens 44 is integrally formed on one or a plurality of substrates and arranged in two. Dimensional matrix A plurality of lens surfaces. However, instead of the miniature fly-eye lens 44, a fly-eye lens having a plurality of lens elements integrated into a quadratic matrix may be used. In addition, it is arranged between the diffractive optical element and the miniature fly-eye lens 44. For the condenser lens group, a variable-focus optical system such as a multi-focus optical system that can continuously change the focal length by moving the lens in the direction of the optical axis, or a multi-focus optical system that can change the focal length discontinuously by replacing the lens Then, a secondary light source (surface light source) composed of a plurality of light source images can be formed on the exit surface side of the miniature fly-eye lens 44. However, it can also be adopted in the miniature fly-60 &quot; This paper size is applicable to China National Standard (CNS) A4 Specification (210 X 297 Public Love :)

Binding

571344 A7 ____B7 V. Description of the Invention (58) The way in which the position of the incident surface of the eye lens 44 (or fly-eye lens) forms a virtual image of a plurality of light sources. The light from the secondary light source is condensed by a condenser lens optical system 45 to illuminate the variable field diaphragm 46 in an overlapping manner. Then, the light from the variable field diaphragm 46 passes through the blindness of the conjugate system of the opening portion of the variable field diaphragm 46 and the reticle r which is arranged on the first surface as the original projection. The imaging optical systems 47a to 47c reach the reticle r. According to this embodiment, two optical path bending mirrors 48a and 48b are arranged in the concealed imaging optical systems 47a to 47c to deflect the optical path by approximately 180. . By the light from the concealed imaging optical systems 47a to 47c, a slit-shaped light field (irradiation range) can be formed in a part of the pattern formation area on the reticle R, for example. The light from this light field passes through the projection optical system PL produced by the manufacturing method according to the first or second embodiment described above and reaches the wafer disposed on the second surface of the projection optical system as a workpiece (photosensitive substrate). W, and an image of a slit-like pattern in the field is formed on the wafer W. In this embodiment, the reticle stage RS for supporting the reticle R on the first side and the wafer stage WS for supporting the wafer W on the second side are both Moving freely in the Y direction, so if the magnification of the projection optical system is β, if the reticle stage RS and the wafer stage WS are moved under the magnification β and exposure is performed, it can be formed on the wafer w A shape obtained by sweeping the slit-shaped imaging area in the Y direction is typically formed by forming a pattern image in a pattern formation area of a reticle r in a rectangular shooting area. After the scanning exposure of a shooting area is finished, the wafer stage is driven -61-This paper size applies Chinese National Standard (CNS) A4 (210 X 297 mm) 571344 A7-______ B7 V. Description of the invention (I9) &quot; —1 ''-Second, the scanning exposure for other shooting areas is implemented, so that multiple shooting areas are opened &gt; approximately complete on the wafer. In addition, in this embodiment, the projection optical system manufactured by the manufacturing methods of the first and second embodiments is applied to a scanning exposure device as an example, but the manufacturing method of the first and second embodiments is described. The prepared projection optical system can also be applied to a whole wafer exposure type projection exposure device. In addition, in the projection exposure apparatus of this embodiment, at least the illumination optical systems 41 to 47 (: part of the reticle R used as the projection original plate for illuminating the arrangement #first surface according to the light from the light source) In particular, in the part where the light energy will become high, an optical member composed of a crystal material of an equiaxed crystal system (such as fluorite) is used. An illumination optical system like this has a required optical performance that is better than that of a projection optical system. Therefore, this embodiment does not consistently implement measures for optimizing the crystal axis orientation of the crystallographic material of the equiaxial crystal system of the illumination optical system so as to reduce the influence of birefringence (polarization aberration). However, what is required for the illumination optical system When the optical performance is high, as in the first and second embodiments, the day-to-day axis orientation of the equiaxed crystal material can be optimized, or the cause can be corrected by using an optical member made of an amorphous material. The influence of birefringence (polarization aberration) on equiaxed crystal materials. In this embodiment, although the light source is an ArF excimer laser that supplies pulsed light with a wavelength of 193 nm However, the light source can also be applied to, for example, an F2 laser that supplies pulsed light at a wavelength of 157, a Kr2 laser that supplies light at a wavelength of 147 nm, and an A2 laser that supplies light at a typical wavelength of 126 nm. For example, if the light source is used, a wavelength of 157 nm can be supplied Pulsed light F2 laser-62-This paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) 571344 5. Description of the invention (60), lighting optical system 41 ~ 47c Red ^ 肀 &lt; Fluorite or oxygen crystal crystalline materials can be used as the first transmission member 'or gas-doped quartz (modified quartz) Yi Erjiu Γ The optical material of the miniature eyelet lens 44 should be easy to process Due to the advantages of light and light, it is advisable to use modified quartz. II: The fourth embodiment is a shirt optical system using a refracting member composed of a double crystal. The projection optical system of the form; The figure shows that the figure of the four consecutive Shi Pyou Yu ,, ··. The projection optical system according to the following description can also be used as the projection optical system of the projection exposure device of the above-mentioned four modes of projection. Figure 18 shows that the display has The schematic structure of a refracting member 51 composed of a twin crystal and a projection optical system composed of an amorphous material &lt; refraction member 52 is shown in the figure. The figure 5 shows the crystal axis of the crystal 5u of the refracting member 51. Fig. 18 shows that π is refracting. The crystal axis of the 5lb crystal of the member 51. The coordinate systems of these figures ^ 8⑷ ~ ⑷ are universal as shown in Figure 7JT. As shown in Figs. 18 (a) ~ (c), the refracting member 51 composed of a double crystal, The two crystals of the same phase, which are connected by the twin crystal plane or the twin crystal boundary 50S, 51b has a rotation around a specific common low-index crystal axis (the crystal axis [111] in this embodiment) 180 Those who have an orientation relationship, or whose two crystal systems of the same phase are connected, have a mirror relationship with respect to a specific crystal axis ({1 1 1} plane in this example). In this structure, the refracting member 51 composed of twin crystals, the two crystals 51 &amp; and 5 lb of the crystal axis [in] are aligned with the optical axis Aχ, and the crystal 5ib is in the χγ plane relative to the crystal 5U Rotate 180 ° around the optical axis. . This is the same as the crystal axis [111] of the two crystals 51a, 51b and the optical axis Ax, and the crystal -63-This paper size applies the Chinese National Standard (CMS) A4 specification (210X297 mm) 571344

5 1 b is rotated 60 relative to the crystal 5 1 a in the χγ plane ^ Υ ten planes with the anterior axis as the center. Therefore, U ′ is substantially the same as the projection optical system shown in the figure above, and the birefringence effect (polarized image) is substantially eliminated by the crystal 51a and the crystal 51b. However, at this time, similarly to the above embodiment, the optical member 52 made of an amorphous material can be used to correct the birefringence effect (polarization aberration) through the crystals. As described above, in this embodiment, the influence of birefringence will be changed to the opposite direction before and after the double crystal plane or the double crystal boundary, so that the entire crystalline refractive member can reduce the optical performance degradation caused by the intrinsic birefringence. This ensures the optical performance of the projection optical system. The embodiment disclosed in the above embodiment is an example in which the crystal axis [1U] of an optical member composed of an equiaxed crystal system crystal material is substantially consistent with the optical axis, but the crystal axis that is to be consistent with the optical axis is not limited to crystal The axis [m] and a crystal axis equivalent to the crystal axis [in]. In the following, as a fifth embodiment, a specific first group of optical axis and crystal axis [100] or optical axis [100] is specified in a plurality of refractive members composed of an equiaxed crystal system crystal material. ] Equivalent to the crystal axis, so that the optical axis of the specific second group which is different from the first group and the crystal axis [100] or the optical axis equivalent to the crystal axis [100] are substantially the same And the first group and the second group are rotated relative to the optical axis by approximately 45 relative to each other. An example is given. FIG. 19 is a diagram for explaining the method of the fifth embodiment, which shows the birefringence distribution with respect to the incident angle of light in the same manner as in the above-mentioned FIGS. 11 (b) to (e). The birefringence distribution of a group of refractive members will become as shown in Figure 19 (a), and the birefringence score of the second group of refractive members will be _____- 64-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 571344 A7 B7 62 The invention description will be as shown in Figure 19 (b). As a result, the birefringence distribution of the first group of refractive members and the second group of refractive members as a whole is as shown in Fig. 19 (c). Please refer to Figs. 19 (a) and 19 (b), in the fifth embodiment of the "hand", which corresponds to and? The area of the crystal axis [100] whose axes are aligned will become a region with a large refractive index without birefringence. The area corresponding to the crystal axes [lu],, Bu, ΠM] will become a region with a smaller refractive index without birefringence. As for the region III corresponding to the crystal axis [101], [1 (Μ], [11〇], [Η〇], the refractive index for the circumferential polarization (Θ polarization) will be larger, and for the diameter universal polarization ( R polarized light) is a birefringent region with a relatively low refractive index. From the above, it can be known that the lens elements of each group will be at an angle of 45 from the optical axis. (Crystal axis [100]] and the angle of the crystal axis []. ) Region is most affected by birefringence. In contrast, referring to FIG. 19 (0), it is known that the first group of refractive members and the third group of refractive members are rotated relative to each other around the optical axis by 45 °. With regard to the entire group of refractive members and the second group of refractive members, _ can be equivalent = the crystal axis where the light birefringence is the largest [101], [1 (M), [11〇], [Bulletin ~ θ makes At a distance of 45 ° from the optical axis, that is, the region leaving from the optical axis, a birefringent region having a larger refractive index for circumferential polarized light (Θ polarized light) than radial refractive light (R polarized light) remains. In this case, the maximum angle between the optical axis of each lens element and the light beam in a ^ projection optical system 'is about 35 ~ 40 °. Therefore, the fifth The method of applying morphology can ensure good optical performance under the influence of birefringence, which is not substantially affected by the crystal axis ... ㈨- 十 ⑴ 十 ^. In addition, in the foregoing, the first group refractive member and The second group of refractive members each has a plurality of or a plurality of refractive members. Group refractive members 571344 A7

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Rotate relative to the optical axis only by 60. . Among them, the crystal axis which is optically equivalent to the crystal axis [1 1 1] is the crystal axis [_m], [Μ 1], [11-1]. In the method of the sixth embodiment, the sum of the thicknesses along the optical axis of the first group of refractive members and the sum of the thicknesses along the optical axis of the second group of refractive members should preferably be substantially equal, and the light along the third group of refractive members The sum of the thickness of the axis Z and the thickness of the optical axis of the fourth group of refractive members should be approximately equal. Next, as a seventh embodiment, the optical axis and crystal axis of at least one of the plurality of refractive members made of a crystal material of an equiaxed crystal system are [100] (or optically connected to the crystal axis [ 100] An equivalent crystal axis) example is explained below. Referring to FIG. 11 (b) and FIG. 11 (c), it can be known that since the optical axis of the refractive member is matched with the crystal axis [111], it corresponds to the crystal axis [110], [101], [011] with the largest birefringence. The area exists at a pitch of 120 °, so that the birefringence effect with a distribution of 30 in the pupil plane, that is, the effect that the image will produce coma aberration on the image plane (wafer plane) is about to appear. In contrast, referring to FIG. 19 (b) and FIG. 19 (b), it can be seen that since the optical axis of the refractive member coincides with the crystal axis [100], it corresponds to the crystal axis [101], [10- 1], [110], [1-10] are 90. The existence at the pitch ′ makes the effect of birefringence with a distribution of 40 in the pupil plane imminent. At this time, the pattern to be projected on the wafer is dominated by the vertical and horizontal patterns. As long as the distribution is 40, the appearance of the image will not affect the astigmatism of the vertical and horizontal patterns. The collapse of the image will not become significant. . Therefore, it is adopted that at least one of a plurality of refracting members composed of a crystal-based crystalline material is folded. _-67-This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm)

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571344 V. Description of the Invention (65) The method of the seventh embodiment in which the optical axis of the radiating member and the crystal axis [100] (or the crystal axis optically equivalent to the crystal axis [100]) are consistent can be used in essence. It is not affected by birefringence and ensures good optical performance. Next, as the eighth embodiment, at least the optical axis and the crystal axis [Π0] of the specific fifth group among the plurality of refractive members made of a crystal material of the equiaxed crystal system [110] or the optical axis [110] ] Equivalent to the crystal axis, so that the optical axis and crystal axis [丨 丨 0] of the specific sixth group, which are different from the fifth group, are equivalent to the crystal axis [110]. The fifth group and the sixth group are roughly matched, and the relative rotation is only 90 with the optical axis as the center. An example is shown below. Fig. 20 is a diagram for explaining the technique of the eighth embodiment of the present invention, and shows the birefringence distribution with respect to the incident angle of light in the same manner as Figs. 11 (b) to 11 (e) and Fig. 19 described above. In the method of the eighth embodiment, the birefringence distribution in the fifth group of refractive members will become as shown in FIG. 2O, and the birefringence distribution in the sixth group = radiating members will become as shown in FIG. 2G (b). Shown. As a result, the birefringence distribution of the entire fifth group of refractive members and the sixth county refractive member will be as shown in Fig. 20 (c). Please refer to Figure 20⑷ and ⑷. In the method of the eighth embodiment, the area corresponding to the crystal axis [11 ()] corresponding to the optical axis will be the direction for one side "the refractive index of the polarized light is large and for the other- The direction of the square (orthogonal direction = direction) of the polarized light refraction is smaller than the birefringent area. The homogeneous phase should be in the crystal phase%] _] (region, which will become a region with a large refractive index without bifurcation. As for the region corresponding to the crystal axis [m] JL ^ j I11 · 1], it will have a refractive index Smaller area without birefringence. -68-The paper size of this paper is applicable to the family standard (CNS) M specification (Magic χχ 公公 丁丁 571344 A7

2 = relative ', referring to FIG. 2Q, it is known that the fifth group refractive member and the third group refractive member are rotated relative to the optical axis by only 90. At this time, as far as the group refractive member and the first group refractive member are concerned, the influence of the crystal axis [110] where the refraction is the largest can be eliminated, and the refractive index in the vicinity of the optical axis has a middle refractive index without birefringence. region. That is, if the method of the :: embodiment is adopted, it is possible to ensure good optical performance without substantially receiving birefringence. In the eighth embodiment, the method '形态 is thick along the optical axis of the fifth group of refractive members2, and the sum of the thickness of the center and the optical axis of the sixth group of refractive members is also substantially equal, and especially in the eighth Since the method of applying the shape is because the birefringence area is located at the central part (the optical axis and its vicinity), it is more suitable to apply a thin central part of the self-directing lens. 〃 Furthermore, a method appropriately selected from one of the four methods described above, or a combination of a plurality of methods selected from the four methods may be used. In addition, in a refractive member made of an equiaxed crystal-based crystalline material, if the maximum angle of the light passing through the refractive member with respect to the optical axis exceeds 20 °. Regardless of its position, it is still susceptible to birefringence. Therefore, the maximum angle of the light passing through the image with respect to the optical axis will exceed 20 °. The refraction member composed of the equiaxed crystal system crystalline material may be applied alone or in combination with the methods shown in the diagrams and the methods shown in the fifth to eighth embodiments. This makes it possible to more perfectly reduce the influence of birefringence and ensure optical performance. In addition, a projection optical system with a large image-side aperture is positioned more closely than the pupil position (the pupil position on the most image side (second surface side) in the case of a plurality of imaging optical systems with intermediate imaging points). The lens on the two sides is -69-This paper size is applicable to the Chinese National Standard (CNS) A4 specification (21〇X 297 public copy) 571344 A7 —--------- B7 V. Description of the invention (67 The maximum angle of the light passing through the optical axis tends to be larger. The refracting member formed by the refracting member 舳 crystal-based crystalline material disposed between the position of the second surface side and the second surface is singly or in combination. The method shown in the fifth to eighth embodiments It is appropriate to apply. : This structure can more perfectly reduce the influence of birefringence and ensure optical performance. In addition, among the plurality of refractive members composed of an equiaxed crystal system crystalline material, a seventh group of light-emitting members formed so that a specific crystal axis thereof substantially coincides with an optical axis is formed with a specific crystal The eighth group of light-transmitting members whose axes are approximately coincident with the optical axis. It is assumed that the light path length when the light corresponding to the maximum aperture of the projection optical system passes through the seventh group of light-transmitting members is L7, and the light corresponding to the maximum aperture of the projection optical system. When passing through the above eighth group of light transmitting members, 2 the optical path length is L8, and the light of a specific wavelength is; when, it should meet the following conditional expressions:, ... (9) | L7-L8 | a &lt; 3X 10 ” Structure, even if it is a projection optical system with a large aperture on the image side, the influence of birefringence can be reduced by 14 light transmitting members of the seventh and eighth groups. In addition, if the effect of birefringence is to be further reduced, it should be The upper limit of the above formula (9) is set to 2.6X 10+ 5. [Examples] Examples based on specific numerical values will be described below. Fig. 21 shows a lens structure of a projection optical system according to a first embodiment of the present invention. Fig. Projected light of this embodiment The optical material of the system uses quartz SiO2 and fluorite CaF2 to project the image of the reticle R arranged on the first side onto the wafer W arranged on the second side. -70-This paper Standards apply to China National Standard (CNS) A4 specifications (210X 297 mm) / 1344 A7

The projection optical system has, in order from the ruler side, a first lens group G1 having a positive refractive power, a second lens having a negative refractive power, and a third lens group having a positive refractive power. Alas. The first lens group in Langzhong has a lens Lpu formed of laoshi with positive refractive power. The third lens group G3 contains fluorite-containing lenses ^^, Lpi3, Lpi4, and Lpi5. The two-aperture diaphragm AS system has been placed in the third lens group. In the first embodiment, a light source system (the reference wavelength of gram is 193.3 μm excimer laser) is a telecentric optical system of both sides. Then, in the first embodiment, the light beam of the focal stop emitted from the first lens group G1 with the positive refractive power is transmitted to the second lens group G2, and the positive distortion aberration is generated in advance to compensate for this. The second and third lenses = G /: G3 produces "negative distortion aberration. The second mirror group G2 with negative refractive power is mainly involved in the correction of # 兹瓦 和 (心 ㈣_) to realize the flatness of :: xiang. The third lens group G3 with a positive refractive power is based on the light beam transmitted from the lens-lens group G2, which mainly suppresses the generation of spherical images and uses a focal beam to provide an image on the second surface. On the function. It is well known that ArF quasi-knife lasers, quartz optical materials can cause changes in radiation such as absorption or compression. However, in this embodiment, at least one piece of Laoshi photonic material is used for the _ lens group having a positive refractive power: the aberration of the irradiation variation caused by the quartz optical material can be suppressed. The beam at the center of the axis (part of the M is far away from the beam passing through the periphery, so when the first lens group G1 changes in illumination, 'the aberration or the center of the projection area and the surrounding paper size are suitable for the paper standard.] (Jin --- 571344 A7

The aberration will become I, and the aberration fluctuation will be changed. Therefore, the use of fluorite in the first lens group G1 can effectively suppress the deterioration of aberrations caused by irradiation variations. In addition, in the projection optical system of this embodiment, it is preferable that at least one lens component of the lens components formed of laurel in the first lens group G1 has a positive refractive power. As described above, #the aberration degradation due to irradiation variations such as coma aberration of the first lens group or the difference between the center and the periphery of the projection area is larger than that caused by other lens groups. Especially the convex lens, because the length of the optical path of the learning material is to pass through the center of its optical axis: than the beam passing through its circumference &amp; is $, because &amp; is easily affected by the change of the radiation of the learning material. In this way, from the viewpoint of effectively controlling the change in aberrations caused by changes in illumination, fluorite optical materials should still use a lens with positive refractive power. And from the viewpoint of having an achromatic effect by the refractive index difference from quartz &lt; from the viewpoint, fluorite optical materials should also be used for lenses with a positive refractive power. The third lens group G3 should preferably have at least one lens component formed of the above-mentioned fluorite. In the projection optical system of this embodiment, since the light beam diverged by the second lens group G2 is converged by the third lens group G3, the irradiation energy density of each lens of the third lens group G3 is necessarily increased. This will constitute a cause of compression, which is one of the variations in irradiation. However, if a fluorite optical material is used for the third lens group, the effect of reducing the compression effect can be obtained. In addition, if the optical material with a high thickness is used near the surface where the irradiation energy density is concentrated, the optical material can be used to correct the compression more effectively. The characteristic values of the projection optical system of the first embodiment are shown in the table. In Table 1, / 3 is the projection magnification (horizontal magnification) and NA is the image side (second side) aperture. L __- 72-Chinese National Standard (CNS) for this paper

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571344 V. Description of the invention (70), B is the diameter of the image circle on the image plane. Another table! The medium code indicates the direction along which the light travels from the reticle of the object surface (the first surface) to the image plane (the second surface), and the order from the reticle side, and r indicates the radius of curvature of each surface (non- In the case of a spherical surface, the radius of curvature of the vertex), d is the surface interval of each surface on the optical axis. τ In Table 2, aspherical coefficients of each aspheric surface are shown. Let the height perpendicular to the optical axis be y and the distance along the optical axis from the joint plane from the vertex of the aspheric surface to the position on the aspheric surface south of y (the amount of sag; Z is the magic radius of the top curvature) Is r, the conic coefficient is κ, n times the aspheric coefficient is A ~ F, the aspheric surface is expressed by the following formula (10): (10) Z = (y2 / r) / [l + {1- (1 + K) · y2 / r2} 1/2]

+ A · y4 + B · y6 + C · y8 + D · yi〇 + E · yi2 + F · yM In Table 2, £ 111 represents each aspherical coefficient column} 〇m. The unit of the radius of curvature and the interval between the characteristic values of this embodiment can be, for example, mm. The refractive index of each optical material at a wavelength of 193.3 nm is: Si〇2 1.5603261 CaF2 1.5014548 [Table 1] β = -0.25 ΝΑ = 0 · 78 Β = 27.4 surface code curvature radius surface interval optical material 56.57 571344 A7 B7 V. Invention Description (71) 1 388.465 23.27 Si02 2 177.000 42.53 3 -120.028 15.00 Si02 4 -752.332 16.54 5 -193.722 44.12 Si02 6 -192.988 1.00 7 -799.710 42.35 S1O2 8 -240.979 1.00 9 666.130 51.12 Si02 10 -543.380 1.00 11 299.996 49 12 00 1.00 13 276.988 35.60 Si02 14 991.456 1.00 15 252.935 30.34 CaF2 16 574.560 30.59 17 687.760 19.37 S1O2 18 143.863 30.27 19 -399.976 15.00 Si02 20 170.000 87.67 21 -128.314 26.18 Si02 22 804.730 21.59 23 -02.00 0.00.50 51.47 35.89 CaF2 26 -250.424 1.02 -74-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

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571344 A7 B7 27 00 41.69 CaF2 28 -262.449 13.09 29 290.060 56.21 S1O2 30 1757.000 26.96 31 00 15.03 Si02 32 276.988 34.69 33 533.910 48.23 Si02 34 -471.548 15.61 35 00 32.96 Si02 36 -490.708 2.60 3 7 199.138 42.55306. 3.65 39 170.020 49.30 Si02 40 300.000 1.66 41 154.428 45.93 CaF2 42 522.270 5.77 43 00 60.00 CaF2 44 1687.460 11.35

5. Description of the invention (72) [Table 2] (aspherical coefficient) [area code 2] K = 0.000000 Α = -0.106010E-06 Β = 0.204228Ε-11 〇0.588237E-16 D = 0.1 12269E-20 Order

-75-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 571344 A7 B7 V. Description of the invention (73) [face code 1 4] K = 0.000000 Α = 0.417491E-08 Β = 0.51411 IE-13 O-0.666592E-18 D = 0.141913E-22 [face code 2 0] K = 0.000000 Α = 0.166854Ε-07 Β = 0.370389E-12 〇-0.138273E-16 D = -0.3041 13E-20 [Face code 2 4] Κ = 0.000000 Α = 0.361963Ε-07 Β = -0.679214E-12 C = -0.128267E-16 D = 0.908964E-21 Ε = -0.121007E-25 [Face code 4 0] Κ = 0.000000 Α = -0.179608Ε-07 Β = 0.1149941E-12 C = -0.128914E-17 D = -0.506694E-21 Ε = 0.204017E-25 F = -0.73001 1E-30 -76-Applicable to the paper size China National Standard (CNS) A4 specification (210X297 mm)

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571344 V. Description of the invention (74) In the adjustment of the optical material constituting the projection optical system, the azimuth angle of the lens component LP11 ~ LP15 (the rotation centered around the optical axis and the negative effect caused by birefringence is corrected (polarized light) Aberration). For the lens component wbca composed of Lao Shi, the two fluorite &lt; crystal axis Π11] are consistent with the optical axis and their respective azimuth angles are the same. Point image intensity distribution. The maximum value of the PSF according to the figure MF is 90.72. Figure 22 (b) shows the azimuth of the lens component LP14 made of fluorite for the lens component Lp &quot; ~~ ', and for other fluorite lenses The components UMi to LP13 and LP15 are relatively rotated around the optical axis by 18 °. The U-image intensity distribution is on the optical axis. The maximum value of pSF in Fig. 22⑻ is M · &quot;. From these Figs. 22⑷ and 22 (b ) It can be seen that when the lens axis azimuth angles of the lens components LP11 to LP15 made of fluorite are all the same (in the case of Fig. 22), the 3Θ component of the scalar component aberration is large, and the PSF value is as low as 90. In contrast, if the azimuth angle of the lens component LP14 is Other fluorite lens components LP11 to LP13 and LP15 are rotated relative to the optical axis by 18 °. (When the relative tenor angle between the lens component 1 ^ 14 and the laurel lens components Lpu ~ Lpi3 and Lpi5 is 60.) Equivalent, that is, in the case of FIG. 22 (b)), the 30 component of the scalar component aberration becomes smaller, and the PSF value will rise to about 96 · 4. In this way, the crystal axis of the equiaxed crystal material is changed. The azimuth angle can improve the optical performance of the projection optical system. ~ Figure 22 is for the state of Figure 22 (b) (the azimuth angle of the lens component ^ 14 is relative to other Lao Shi lens components LP11 ~ LP13, ^^ relative to each other around the optical axis The state of rotation 180) plus __77 made of quartz in the projection optical system-This paper size applies to China National Standard (CNS) A4 (210X 297 mm) 571344

Among the lens components LSI to LS17, the lens components LS12 and LS14 in the vicinity of Hongri Soil Correction Co., Ltd. and M $ Ye wild in the eyes are given the maximum values to correct the Cymbidium and PSF values shown in Figure 22 (b) Become a 99 86, wide birefringent distributor. Take this optical performance. "I can improve the projection optical system even more. According to the example shown in Fig. 22, the method of matching the crystal axis [⑴] of the fluorite lens component in the projection optical system with the optical sleeve is adopted, but other crystal axes can also be adopted. A technique that matches the optical axis. Fig. 23 (a) shows the lens components LP11 to LP15 composed of fluorite similar to Fig. 22 (b), so that the crystal axis [⑴] of the laurel is aligned with the optical axis and the respective azimuth angles are aligned in the same-direction. The points are like intensity distribution. Fig. 23 (b) shows the optical axis of the lens components LP11, LP12, and LP13 and the crystal axis of the fluorite [100] among the lens components Lpn to Lpi5 composed of fluorite, and the optical axes of the lens components LP14 and LP15. An example that matches the crystal axis of fluorite [11〇]. In addition, for lens components LP11, Lpl2, and LP13 having a crystal axis [100] on the optical axis, the azimuths around the optical axis of the lens components LPU &amp; Lpi3 are made uniform, and the azimuth of the lens component LP12 is the optical axis As the center, the lens components LP11 and LP13 only rotate 45 relative to each other. . At the same time, for the lens components LP14 and LS15 that have the crystal axis [110] on the optical axis, the azimuth of the other lens component with the optical axis as the center is rotated relative to the other lens by 90 °. Referring to Figs. 23 (a) and 23 (b) as comparative examples, it can be seen that in the case of Fig. 23 (b), the maximum value of the P S F value is 9 9 · 4, and it has good optical properties. In addition, in Figure 23 (b), if you want to correct the remaining small polarized aberration components -78-This paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) 571344 A7 B7 76) 5. Description of the invention ( As in the case of FIG. 22 (c), a specific birefringence distribution can be given to at least one of the lens components LP1 to LP1 7 made of fluorite, thereby achieving further improvement in optical performance. It shows the lens structure of the projection optical system of the second embodiment of the present invention. The optical material of the projection optical system of this embodiment uses quartz Si02 and fluorite CaF2 to make the reticle disposed on the first side. An image of a ruler is projected on a wafer W disposed on the first surface. The projection optical system of the second embodiment includes a lens Lpi κ16 formed of laxite and having a positive refractive power, and a lens LSI ~ LS16 formed of quartz. The reference wavelength of the projection optical system of the second embodiment is 193.3 nm (ArF excimer laser), which is an optical system belonging to the focal stop. # Λ The characteristic values of the projection optical system of the second embodiment are shown in Table 3 below. Table 3 symbols The meaning is the same as in Table 1, so it will not be explained. In addition, the aspheric coefficient of each aspheric surface is shown in Table 4. The aspheric shape can be expressed by the above formula (10). In addition, the aspherical coefficients are described in Table 4. Em in the column represents 10m. Here, as one of the units of the radius of curvature and the interval between units in this implementation, snm can be made. In addition, the refractive index of each optical material with a wavelength of 193.3 is as follows Those mentioned in the first embodiment above. [Table 3] β = -0.25 ΝΑ = 0 · 85 Β = 23.4 area code curvature radius surface interval optical material 1 -16644.993 14.681 Si02 2 200.000 38.160 -97.636 39.394 Si02

571344 A7 B7 V. Description of the invention (77) 4 -3498.612 1.963 5 20854.806 47.225 CaF2 6 -189.240 1.000 7 -1848.127 33.691 S1O2 8 -335.321 1.000 9 1292.071 37.309 Si02 10 -600.215 1.331 11 492.732 38.730 Si02 12 -3044.576 48.326 13 CaF2 14 833.704 12.324 15 177.093 34.107 Si02 16 525.225 8.344 17 1357.022 39.940 Si02 18 104.862 40.492 19 -211.803 13.000 Si02 20 167.689 25.248 21 -172.613 14.042 Si02 22 207.257 6.376 23 377.821 Si.683 CaF2 24 -169.02.385. 85.157 25.157 27 504.576 50.802 CaF2 28 -308.601 1.000 29 1 127.574 30.958 S1O2 -80-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 571344 A7 B7 V. Description of the invention (78) 30 -781.573 19.652 31 763.980 52.719 Si02 32 -33 1.674 21.193 33 -211.490 25.066 Si02 34 -300.000 26.763 35 1063.093 41.880 Si02 36 -559.169 1.000 37 189.378 50.245 Si02 38 764.962 1.000 39 145.835 35.087 Si02 40 235.771 1.000 41 178.250 45.678 CaF2 42 406.631 6.433 43 -5014.697 43.998 CaF2 44 00 10.500 [Table 4] [face code 2] K = 0.000000 Α = -1.460090Ε-07 Β = 5.901790E-12 C = -2.851310E-16 D = 2.350150E-20 E = -2.375080E-24 F = 1.914710E-28 [face code 1 6] K = 0.000000 -81-This paper size applies to China National Standard (CNS) A4 (21〇x 297 mm) 571344 A7 B7 V. Invention Explanation (79) A = 2.294100E-08 B = -2.794170E-13 01.017110E-17 D = 5.514660E-22 E = -5.807000E-26 F = 4.364070E-30 [face code 2 2] K = 0.000000 Α = 7.1961350E-09 Β = -3.690120E-12 C = 1.927460E-17 D = 5.305600E-21 Ε = -2.919800E-26 F = -2.770450E-29 [face code 2 6] K = 0.000000 Α = 2.103660E-08 Β = -6.466850E-13 C = -6.55 1390E-18 D = 2.426880E-22 Ε = 1.189120E-27 F = -3.538550E-31 [Face code 1 4 0] K = 0.000000 Α = -1 · 693250Ε-08 Β = 6.620660Ε-13 -82-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 571344

C ==-9.551420E-18 D &quot; M.367360E-21 e == 1.080030E-25 F ==-4.1 15960E-30 :::: The lens is made by adjusting the lens formed in the optical material constituting the projection optical system The azimuth angles (with the optical axis as the center ^ rotation angle) of the components LP11 to Lpi6 correct the negative effect (polarization aberration) caused by birefringence. ^ 25 is shown for comparison, ignoring the inherent birefringence effect of Lao Shi, and obtained from the extraction of <point image intensity distribution. According to Fig. 25, the maximum psf is 99.97. Fig. 25 (b) shows that for the lens components LP11 to LP16 made of fluorite, the fluorite <crystal axis t in coincides with the optical axis and their respective azimuth angles are the same— A point image intensity distribution obtained on the optical axis when the directions are aligned. According to Figure 25, the maximum PSF is 94.57. FIG. 25 (c) shows the azimuth of the lens component LP11 among the lens components Lpn to Lpi6 made of fluorite, and the other fluorite lens components LP12 to LP14 and LP16 are relatively rotated around the optical axis as the center. . In addition, the azimuth of the lens component LP15 is relatively rotated relative to the other laurel lens components Lpi2 to Lpi4 and LP16 around the optical axis by 60. The point-like intensity distribution obtained on the optical axis at this time. The maximum PSF according to Figure 25 (c) is 95.86. From these Figs. 25 (b) and 25 (c), it can be seen that when the azimuth angles of the lens axes LP11 to LP10 made of fluorite are all the same (in the case of Fig. 25 (b)), its scalar component image The difference is large, and the pSF value is as low as 94.6. In contrast, if the azimuth of the lens component Lpi 丨 is transparent to other fluorite ______ 83-This paper is suitable for S ® Home Standard (CNS) A4 specifications (21GX297 public director) 571344 A7 ____B7 V. Description of the invention (81) Bismuth components LP12 ~ LP14, LP16 are relatively rotated around the optical axis by 60. The azimuth angle of the lens component LP15 is relatively rotated about 60 ° with respect to the other fluorite lens components LP12 to LP14 and LP16 around the optical axis. (Fig. 25 (c)% &amp; "The 30 component of the f component aberration becomes smaller, and the psF value also rises to about 95.8. In this way, the crystal axis azimuth of an equiaxed crystal material is changed. The optical performance of the projection optical system can be improved. Fig. 25 (d) shows the state of Fig. 25 (c) (the azimuth angles of the lens components Lpi 丨 and Lpi5 are centered on the optical axis with respect to other Lao Shi lens components LP12 ~ LP14, LP16 And the relative rotation of 60.) plus lens components LSI to LS 16 made of quartz in the projection optical system, the lens component LS 14 near the pupil is given to correct it as shown in Figure 22 (b) The birefringence profile of the aberrations. As a result, the maximum value of the PSF value becomes 99.82, which is compared with the ideal state of Fig. 25 (a), and the maximum value of PSF is 99 · 92 compared to the case of Fig. 25 (a). In Figure 25 (d), the maximum value of the PSF can be increased to approximately the same value, which obviously improves the optical performance of the projection optical system. According to the example of tf shown in Figure 25, the crystal of the component of the Laoshi lens in the projection optical system is used. The axis [111] is consistent with the optical axis, but other crystal axes can also be matched with the optical axis. Fig. 26 (a) shows that the optical axis of the lens components LP11 and LP12 of the fluorite lens components LP11 to LP16 of the projection optical system is consistent with the Laoshi crystal axis [110], and the lens components LP13 and LP14 are matched. The point image intensity distribution when the optical axis coincides with the fluorite crystal axis [100] and the optical axes of the lens components LS15 and LS16 coincide with the Laoshi crystal axis [111]. In the case of FIG. 26 (a), it is For lens components LP1 1 and LP 12 with crystal axis [1 10] on the optical axis, relative to -84-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm)

Binding

Line 571344 A7 _____ Β7 V. Description of the Invention (82) The azimuth of one lens component and the azimuth of the other lens component are centered around the optical axis and rotated only 90 degrees. . And for lens components LP13 and LP14 having a crystal axis [100] on the optical axis, the azimuth of the other lens component is rotated around the optical axis by 45 with respect to the azimuth of one lens component. In addition, for lens components lp 15 and LP16 that have a crystal axis [1 工 丨] on the optical axis, the azimuth of the other lens component is rotated around the optical axis by only 6 relative to the azimuth of the lens component of the other. 〇. . Referring to FIGS. 25 (b) and 26 (a) as comparative examples, it can be seen that in the case of FIG. 26 (a), the maximum value of the PSF value is 98 · 7ό, and it has good optical properties. Fig. 26 (b) shows the state of Fig. 26 (a) plus the lens components LSI to LS 16 made of quartz in the projection optical system, and the lens component LSI 4 near the pupil is provided to correct it in Fig. 26 ( a) The point image intensity distribution obtained on the optical axis for the required birefringence distribution of the aberrations shown. As a result, the maximum pSF value will become 99.76. Compared with the ideal state of Fig. 25 (a), the maximum value of psf is 99.92 compared to the case of Fig. 25 (a), and the maximum value of PSF can be raised to approximately the same value in Fig. 26 (b). Obviously Can further improve the optical performance of the projection optical system. The exposure apparatus of each of the above embodiments illuminates the reticle (light hood) by the lighting device (lighting process), and uses a projection optical system to expose the transfer pattern formed on the light hood to the photosensitive substrate (exposure process). Micro devices (semiconductor elements, imaging elements, liquid crystal display elements, thin-film magnetic heads, etc.) can be manufactured. Hereinafter, referring to the flowchart of FIG. 27, a specific circuit pattern is formed on a wafer or the like as a photosensitive substrate by using the exposure apparatus of each embodiment.

571344 V. Description of the Invention (83) An example of a method for manufacturing a semiconductor device as a micro device. First, in step 301 in FIG. 27, a film is evaporated on a batch of wafers; then in step 302, a photoresist material is coated on the metal film on the batch of wafers. Then, in step 303, using the exposure device of each embodiment, the image of the pattern on the hood is sequentially exposed through the projection optics ^ and transferred to each shooting area on the wafer of this batch: Ran = In step 304, after the development process of the photoresist material on the batch of wafers is performed, in step 305, an etching process is performed on the batch of wafers with the photoresist material = pattern as a light shield. In this way, a circuit pattern corresponding to the hood (patterned circuit pattern is formed in each imaging region on each wafer.) Afterwards, the circuit pattern formation of the upper layer and the like can be performed to obtain a device such as a semiconductor element. According to the above-mentioned method for manufacturing a semiconductor device, a semiconductor device having an extremely minute circuit pattern can be manufactured with a superior yield. In addition, in steps 301 to 305, although the metal is vapor-deposited on the wafer 'and After the photoresist material is coated on the metal film, the steps of exposure, development, and etching are performed. However, it is needless to say that before these steps, a silicon oxide film is formed on the wafer, and then light is applied to the silicon oxide film. Resistance material Then, each step of exposure, development, and etching is performed. In addition, in the exposure apparatus of each embodiment, a fixed pattern (circuit pattern, electrode pattern) can be formed on a substrate (glass substrate) to prepare a liquid crystal as a microdevice. Display element. Referring to the flowchart of FIG. 28, an example of the method at this time will be described. In FIG. 28, in the pattern forming step 401, the exposure device of each embodiment is used to carry out the pattern transfer exposure on the hood to the photosensitive Of the so-called photolithography of a flexible substrate (a glass substrate coated with photoresist material) ________-86-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 571344

The case was formed. By this photolithography pattern forming step, a specific pattern including a large number of electrodes can be formed on a photosensitive substrate. Thereafter, the substrate subjected to the exposure process is subjected to various processes such as a development process, an etching process, and a reticle peeling process to form a specific pattern t on the substrate, and then a subsequent color filter forming process 402 is performed.

Installed in the color filter forming step 402, forming a group of a plurality of dots corresponding to r (red), G (green), and B (blue) in a matrix or a plurality of G A color filter formed by the three groups of B and B bands arranged in the direction of the horizontal scanning line. Then, after the color filter forming step 4202, a liquid crystal cell assembling step 403 is performed. In the liquid crystal cell assembly step 403, a liquid crystal panel (liquid crystal cell) is assembled using a substrate having a specific pattern obtained in the pattern forming step 401 and a color filter obtained in the color filter forming step 402. In the liquid crystal cell assembling step 403, liquid crystal is injected into a substrate having a specific pattern obtained, for example, in the pattern forming step 401.

A liquid crystal panel (liquid crystal cell) is manufactured between the line plate and the color filters obtained in the color filter forming step 402. Then, in the module assembly process 404, the components such as a circuit and a backlight for causing the assembled liquid crystal panel (liquid crystal unit) to perform a display operation are installed, and a liquid crystal display element is manufactured. The manufacturing method can produce a liquid crystal display element with extremely minute circuit patterns with excellent yield. [Effects of the Invention] In summary, according to the present invention, even if a crystalline material such as fluorite has inherent birefringence, it can be substantially protected from birefringence. ________- 87-This paper is applicable to China National Standard (CNS) A4 specification (21〇X 297 public love) 571344

Description of the invention Ensure good optical performance under influence. [Brief description of the drawings] Fig. 1 is a schematic flowchart showing a manufacturing method of a projection optical system according to a first embodiment of the present invention. Fig. 2 is a flowchart schematically showing a design step S1 of the first embodiment of the present invention. Fig. 3 is a diagram showing an example of the optical performance evaluation points of the projection optical system according to the first embodiment of the present invention. Fig. 4 is a flowchart for explaining details of step S12 in the first embodiment of the present invention. Fig. 5 is a diagram illustrating a crystal axis orientation of an equiaxed crystal system crystalline material according to the first embodiment of the present invention. FIG. 6 is a flowchart showing details of the crystalline material preparation step S2 according to the first embodiment of the present invention. Fig. 7 is a diagram schematically showing a Laue camera. Fig. 8 is a schematic configuration diagram of a 7F birefringence measuring machine. Fig. 9 is a schematic configuration diagram showing an interferometer device for measuring a lens surface shape error. Fig. 10 is a schematic flowchart showing a manufacturing method of a projection optical system according to a second embodiment of the present invention. 11 (a) to 11 (e) are diagrams showing an example of a method for reducing the intrinsic birefringence by combining a plurality of equiaxed crystal system crystalline materials. Fig. 12 is a diagram schematically showing an interferometer device for measuring an absolute refractive index value and a refractive index distribution. __-88-&amp; Zhang scale is applicable to Chinese National Standard (CNS) Αίϋ (210 X ------------- 571344 A7 B7

Fig. 13 is a flowchart showing the details of the assembling process S5 of the manufacturing method of the projection optical system according to the second embodiment of the present invention. ° Figure! 4 is a diagram showing an aberration measuring device using the principle of the phase recovery method. Fig. 15 is a diagram schematically showing an external adjustment device of a projection optical system according to a second embodiment of the present invention. 16 (a) to 16 (c) are diagrams for explaining an optical member for forming an aspherical surface and / or an optical member for changing a birefringence distribution. Fig. 17 is a diagram schematically showing an exposure apparatus having a projection optical system manufactured in accordance with the first or second embodiment. Figs. 18 (a) to 18 (c) are diagrams showing the projection optical system as an example of the embodiment of a method for reducing the intrinsic birefringence by combining a plurality of equiaxed crystal system crystalline materials in a pattern. Figs. 19 (a) to 19 (c) are schematic diagrams showing an example of a method of reducing the intrinsic birefringence by combining a plurality of equiaxed crystal system crystalline materials to reduce the intrinsic birefringence. Figs. 20 (a) to 20 (c) are diagrams showing a projection optical system of a second embodiment as an example of a method of reducing intrinsic birefringence by combining a plurality of equiaxed crystal system crystalline materials. Fig. 21 is a diagram showing a lens structure of a projection optical system as a first embodiment of the numerical embodiment of the present invention. ... Figs. 22 (a) to 22 (c) show the point distribution of the projection optical system of the first embodiment. Figure 23 (a) and 23 (b) show the point image intensity of the projection optical system of the first embodiment-89-This paper is a standard for time and money (CNS) G ^ 1Qx 297 ⑹ 571344 A7 B7 V. DESCRIPTION OF THE INVENTION (87) Degree distribution. Fig. 24 is a diagram showing a lens structure of a projection optical system as a second embodiment of the numerical embodiment of the present invention. Figures 25 (a) to 25 (d) show the point image intensity distribution of the projection optical system of the second embodiment. Figures 26 (a) and 26 (b) show the point image intensity distribution of the projection optical system of the second embodiment. FIG. 27 is a flowchart of a method for manufacturing a semiconductor device as a micro device. Fig. 28 is a flow chart showing a method when a liquid crystal display element as a microdevice is to be produced. [Explanation of component symbols] R: Graticule W: Wafer PL: Projection optical system -90-This paper size applies to China National Standard (CNS) A4 (210X 297 mm)

Claims (1)

571344 Patent Application No. 091114027 Chinese Patent Application Replacement (October 1992) 8 8 8 8 A B c D Patent application scope 1. A manufacturing method of a projection optical system, which is used to form an image of a first surface on a second surface according to light of a specific wavelength, and includes a light transmitting property for the light of the specific wavelength The refraction member composed of at least one equiaxed crystalline material is characterized in that it includes: a design process including a light edge for evaluating the first polarization component and a second polarization component that is different from the first polarization component. The auxiliary process of setting the crystal axis orientation of the refractive member composed of at least one equiaxed crystal system crystal material to obtain specific design data; the crystalline material preparation process is used to prepare the above equiaxed crystal system crystal material; crystal axis The measuring step is used to measure the crystal axis of the above-mentioned equiaxed crystal system crystalline material; the refracting member forming step is to form a specific shape of refraction from the above-mentioned equiaxed crystal system crystalline material according to the design data obtained in the above-mentioned design process. The component and the assembly process are based on the crystal axis of the refractive member obtained in the design process. The above-mentioned refractive members are arranged at different positions. 2. The manufacturing method of the projection optical system as described in the first item of the patent application scope, which further includes a step of preparing at least one refractive member having a specific refractive index profile, and the specific birefringent profile is based on the design process described above. The above design data is obtained. 3. For the manufacturing method of the projection optical system in the second scope of the patent application, the paper size applies to the Chinese National Standard (CNS) A4 (210 X 297 mm) 々, the specific birefringence distribution in the scope of the patent application is at least one of the fixed birefringence distribution of stress and the birefringence distribution of a thin film with a special X-ray weight:-widely applied for patents The third item of the optical optics system has a special birefringence of eight. It is doped with quartz. The refracting member is made of quartz or 5 .: Application: Item 4 of the patent scope of the projection optical system. The manufacturing method, and the above-mentioned first = Π :: = the effective beam birefringence member of the stress birefringence distribution above the beam ^ with ^, should meet the following conditional expressions. · Especially beam # 2 # 时 〇 · 6 &lt;彡 / 彡 c $ 1. 6. If the projected light in the scope of patent application No. 3 is assumed to have the above-mentioned stress birefringence 80,000 method, the effective force of the refracting member of the chirping, ^ ^ ^ 対 sheep knife cloth "on one side-the light beam emitted from the point By having a refractive member with a UI force and a refractive index profile, the following conditional expressions should be satisfied: · 亍 足 先 束 ☆ is # 时 〇 · 6 &lt;# p / 彡 cg 1 〇 7. 8. Manufacturing method of the learning system, which &lt; The refractive member is made of quartz or quartz doped with fluorine with a specific birefringence distribution in the projection light as described in item 2 of the patent application range. The manufacturing method of the system, the distributed refractive member is effective "" The light emitted by the account passes through the projection light having the scope of the patent application, assuming the above-mentioned stress birefringence 仏 is 0C 'from the above first surface _ -2-This paper size applies Chinese National Standard (CNS) A4 Specifications (210X 297 mm) D8 6. The refraction member whose beam diameter at the time of patent application is the above-mentioned stress birefringence distribution should satisfy the following conditional formula: 0.6 &lt; $ p / 彡 c $ 1 〇9. Tongzhiru Patent Application Scope 丨The projection optics and manufacturing method according to any one of 8 to 8, the central subsystem further includes an aspherical surface forming step of forming at least one refractive member &lt; surface shape into an aspherical shape in the above-mentioned projection optical system, and the aspheric shape It is determined according to the design data served by the above-mentioned design bed and preface. 10. The method of manufacturing a projection optical system according to item 9 of the scope of patent application, wherein the aspheric shape has an asymmetric aspheric shape with respect to the optical axis of the optical member. 11. The manufacturing method of the projection optical system according to item 9 of the scope of the patent application, wherein the assembly process has: / 'Optical performance measurement auxiliary process, which measures the optical performance of the above-mentioned projection optical system after assembly; optical component adjustment Auxiliary process' is to change the position and / or posture of at least one optical member in the above-mentioned projection optical system in order to make the above-mentioned optical performance measured to conform to the specific optical performance; and an aspheric surface processing auxiliary process is to make the The pre-measured optical properties conform to specific optical properties, and the surface shape of at least one optical member in the projection optical system is formed into an aspherical shape. 12 · If the method of manufacturing a projection optical system according to item 11 of the scope of patent application, the aspheric shape is also taken into account the design obtained from the above design process -3-This paper size applies Chinese National Standard (CNS) A4 specifications (210 X 297 mm) The data of the park and the patent application are determined. 13 ·: = Li: The Meiwan method of the projection optical system of the Yuanzhongzhong-item, the assembly process has the following auxiliary processes, which measure the optics of the pre-assembly system Performance; The auxiliary processing step described above is to change the position of at least one optical member of the above-mentioned projection light and / or for the purpose of combining the optical properties obtained by the measurement with :: to achieve sufficient optical performance. Posture; and; the auxiliary process of the dagger-worker 'is to make the above-mentioned light pre-determined, which conforms to a specific optical property, and to make a photon, and to make the above-mentioned projection optical system! "By dagger: an optical member The surface shape is formed as an aspheric shape. • The manufacturing method of the projection optical system in Item 13 of the Mouth Patent, the aspheric shape is also determined by considering the design data mentioned above. The assembling process of “the manufacturing method of the projection optical system” includes an azimuth angle adjustment auxiliary process for adjusting the azimuth angle around the optical axis of the cathodic member composed of the above-mentioned equiaxed crystal system. 16. For example, the assembly process in the manufacturer of the projection optical system applying for the scope of patent application 15 / 'It includes an auxiliary process for measuring polarized optical properties, which uses the light of several polarizing components to measure the two previously assembled parts. Million: the optical performance of the rear system, and the light to the above-mentioned azimuth adjustment auxiliary process is based on the above measured ~ about the optical performance of a plurality of polarizing components, and will be obtained from the above 2 isometric crystal -4-paper size Applicable to China National Standard (CNS) A4 specification (21〇χ 297 mm) 571344 8 8 8 8 A BCD 6. The scope of patent application is that the above azimuth angle of the above-mentioned refracting member is adjusted to enable optics regarding a plurality of polarized light components Performance meets specific values. 17. For the manufacturing method of the projection optical system according to item 15 of the scope of patent application, the assembly process includes an optical performance measurement auxiliary process, which is used to determine the optical performance of the above-mentioned projection optical system after assembly, and the above orientation The angle adjustment auxiliary step adjusts the azimuth angle of the refractive member composed of the equiaxed crystal system according to the measured optical performance to make the optical performance of the projection optical system conform to the characteristic value. 18. The manufacturing method of the projection optical system according to any one of claims 1 to 8, wherein the assembling process includes an azimuth for adjusting the azimuth around the optical axis of the refractive member composed of the above-mentioned isometric crystal system. Adjust auxiliary processes. 19. For example, the method for manufacturing a projection optical system according to item 18 of the scope of patent application, wherein the assembly process includes an auxiliary process for measuring polarized optical properties, which is used to measure the above-mentioned projected optics after being assembled with respect to a plurality of polarized light components. The optical performance of the system, and the azimuth angle adjustment auxiliary step adjusts the azimuth angle of the refraction member composed of the equiaxed crystal system to enable the plurality of polarized lights according to the optical performance of the plurality of polarized components obtained through the measurement. The optical properties of the components conform to the characteristic values. 20. For the manufacturing method of the projection optical system in item 18 of the scope of patent application, -5-This paper size is applicable to Chinese National Standard (CNS) A4 specification (210X 297 mm) 571344 The assembly process in the scope of patent application includes optical performance The above-mentioned projection optics for measuring the auxiliary tooling is used to measure the deafness and the above-mentioned azimuth angle adjustment auxiliary tool is to give birth to the moon, and the optical performance will be adjusted by the above-mentioned isometric crystal according to the above-mentioned measured azimuth angle Enabling so that the upper == 2 constitutes the characteristic value of the above-mentioned refractive member.乂 “The optical performance of the optical system of the shirt 21. A projection optical system, which uses the image of the surface to form a long light on the second surface to make the first-preceding system, which is characterized by an equiaxed crystal system Refraction member, and at least one etc. which is transmissive is composed of non-Japanese crystalline crystal materials for the specific wavelengths of light; the non-Japanese refraction member 'its system # 本, and the inherent characteristics of the refractive member Double Fold :: Compensation due to the above equiaxed crystal system amorphous material. u㈣ &amp; 22 required for optical performance degradation: Projection optical system of the scope of application for patent No. 2〗, its refractive index 系 is a refractive member 使其 which makes its crystal axis rigid or optically equivalent to this ^ [100] The crystal axis was roughly consistent with the above. /, The optical axis of the temple-axis crystal-based refractive member 23. For example, the projection optical system of the scope of patent application No. 21, wherein the isotropic crystal-based refractive member composed of the above-mentioned equiaxed crystal-based crystalline material includes a plurality of, etc. The axial crystal-based refractive members and the crystal axis orientations of the plurality of equiaxed crystal-based refractive members are each set to reduce the degradation of optical performance caused by the above-mentioned inherent birefringence. A The paper size applies to the Chinese National Standard (CNS) Α4 size (21 × 297 mm) The projection optical system of the first, second and third patents, wherein the above-mentioned equiaxed crystal-based refractive member due to the above-mentioned intrinsic birefringence can be reduced by setting the upper and lower digits of the upper 4 to 10 digits to reduce the photonic property 旎The maximum value of the angle of 25 + on the optical axis is more than 20 degrees. The projection optical system with the scope of application for patent No. 24, in which the crystal and the tens of thousands are set to the above-mentioned isometric crystal-based refractive member that can reduce the degradation of the above-mentioned optical bi-energy due to the above-mentioned inherent birefringence, and is arranged in the above-mentioned optical subsystem Between the pupil position on the side of the second surface and the second surface. : Projection optical system according to item 23 of the patent scope, where the above-mentioned crystal = ten thousand bits is set to reduce the above-mentioned light caused by the above-mentioned inherent birefringence: the above-mentioned isometric crystal-based refractive member whose performance is degraded is arranged in the above ~ Between the pupil position on the most second side of the optical system and the second side. •: The projection optical system of any one of items 23 to 26 of the 4th patent, /, the plurality of equiaxed crystal system refractive members have a group of light transmitting members, which are formed so that their crystal axes [ [00〇] or the crystal umbrella equivalent to the crystal axis [100] is substantially consistent with the light fortunate; and the first group of light transmitting members' its system is formed so that its crystal axis [100] or Optically, the crystal axis [100] is equivalent to the crystal axis that substantially matches the optical axis; and the first group of light transmitting members and the second group of light transmitting members have the optical axis as the center and rotate substantially only relative to each other by 45. Location relationship. In order to apply the projection system as described in any of the 23rd to 26th patent applications, the plurality of equiaxed refractive elements have: Pretend 571344 The scope of the patent application A BCD and the third group of light transmitting members are formed so that the crystal axis [iu] or the light axis j W Wenri axis [1 11] is equivalent to substantially the same optical axis; and The fourth group of light transmitting members is formed so that its crystal axis [111] or light is equivalent to the axis of the sun [111] and the crystal axis is substantially the same as the optical axis; and the third group of light transmitting members described above The fourth group of light transmitting members has an optical axis as a center and rotates substantially relative to each other only by 60. Location relationship. 29. The projection optical system according to item 27 of the patent application range, wherein the plurality of equiaxed crystal-based refractive members have a third group of light-transmitting members formed so that their crystal axes [ill] or light are on The crystal axis equivalent to the 4 Θ axis [111] is approximately the same as the optical axis; and the fourth group of light transmitting members is formed so that its crystal axis [ill] or light is above the 14 Brunei axis [111] The equivalent crystal axis is substantially the same as the optical axis; and the third group of light transmitting members and the fourth group of light transmitting members have the optical axis as the center and rotate relative to each other by approximately 60. Location relationship. 30. The projection optical system according to any one of claims 23 to 26, wherein the plurality of equiaxed crystal-based refractive members have: a fifth group of light-transmitting members formed so that their crystal axes [11 〇] or a crystal axis which is optically equivalent to the crystal axis [1 1 〇] is approximately the same as the optical axis; and a sixth group of light transmitting members is formed such that its crystal axis [丨 10] or optical axis is The crystal axis [1 1 〇] is equivalent to a crystal axis that substantially coincides with the optical axis; and that the fifth group of light transmitting members and the sixth group of light transmitting members have the optical axis as the center and rotate only relatively relative to each other by approximately 90. . Location relationship. 31. The projection optical system according to any one of the items 23 to 26 of the patent application scope, wherein the plurality of equiaxed crystal-based refractive members have: -8-This paper size is applicable to Chinese National Standard (CNS) A4 specifications ( 210X 297 mm) a wide group of light transmitting members, which are formed so that its crystallizer 00] or light is approximately the same as the crystal axis [100] and the optical axis is substantially the same; and / five groups of light transmission The component is formed such that its crystal axis is rigid or optical: the crystal axis which is equivalent to the crystal axis [110] is approximately the same as the optical axis. 32. If the projection optical system of item 3i of the scope of patent application, and the plural number 7 and the like # by "the refractive member has a third group of light transmitting members, its configuration is such that its crystal axis Π11] or optically with the The crystal axis [⑴] is equivalent to the crystal axis that is approximately the same as the optical axis. The projection optical system according to any of the items 23 to 26 of the scope of application for patents', which reduces the above-mentioned optical performance degradation caused by the above-mentioned inherent birefringence. &lt; The plurality of equiaxed crystal-based refractive members having the crystal axis orientation set thereon include: a seventh group of light transmitting members formed so that a specific crystal axis substantially coincides with the optical axis; and an eighth group The light-transmitting member is formed so that a specific crystal axis and the optical axis substantially coincide; and assuming that the light path length corresponding to the maximum numerical aperture of the above-mentioned projection optical system passes through the seventh group of light-transmitting members is l7, corresponding to When the maximum numerical aperture of the above-mentioned projection optical system passes through the eighth group of light transmitting members, the optical path length is L8, and when the specific wavelength is λ, the following conditional formula should be satisfied: | L7-L8 | / A &lt; 3 X 10 + 5 0 34 · The projection optical system according to item 27 of the scope of patent application, wherein the plurality of equiaxed crystal system folds of the above-mentioned equiaxed crystal system are set in a manner to reduce the above-mentioned optical performance degradation caused by the above-mentioned inherent birefringence. The seventh group of light transmitting members is formed so that a specific day-to-day axis and the optical axis substantially coincide; and the eighth group of light transmitting members is formed so that a specific crystal axis is substantially identical to the optical axis ; And the maximum numerical aperture of the projection optical system above, the light path length of the seventh group of light transmitting members of the spring group is L7, and the light corresponding to the maximum numerical aperture of the above projection optical system passes through the eighth group of light. When transmitting a member (the optical path length is L8, and the above-mentioned specific wavelength is also unavailable, the following conditional expressions must be satisfied ... | L7-L8 | / A &lt; 3 X 10 + 5 〇35 · As the projection of the scope of the patent application No. 28 An optical system in which the above-mentioned optical performance degradation caused by the above-mentioned intrinsic birefringence due to light glazing, γ, and y is reduced, and the above-mentioned plurality of equiaxed crystal systems having the above-mentioned crystal axis orientation are sighed: The seventh group of light transmitting members whose crystal axis is formed to be substantially coincident with the optical axis; and the eighth group of light transmitting structures which are formed so that a specific crystal axis is substantially identical to the optical axis; and it is assumed to correspond to the above-mentioned projection optics The optical path length of the group with the largest numerical aperture of the system when transmitting through the group of light is ... The path of light corresponding to the maximum numerical aperture of the system passing through the eighth group of transmitting members is Changchuan. The loading should meet the following conditional formula: Time 丨 L7-L8 | / λ &lt; 3 X 1〇 + 5. 36. If you apply for the projection optical system of the 29th scope of the patent, and Sinochem to reduce the above due to the inherent birefringence, the above crystal is set. Axial azimuth abruptly regressed 0 above multiple equiaxed crystals-10 paper size it / f] National Standard (CNS) A4 size (210 X 297 male 571344 A8 B8 C8 For the external component, you have to make a specific ke ^ especially transmissive component, whose system forms the J-axis's day-to-day axis and the optical axis are approximately the same; in terms of the system, the system is formed so that the special &amp; The transmission potential ^ and the wind are such that the crystal axis of the special lens is approximately the same as the optical axis; and it is assumed that the sheet corresponding to the above-mentioned projection optics hand cotton cotton ... the largest numerical aperture of the subsystem, the spring through the seven groups of light transmission members The description of the time and the "length" of the advance distance is L7, which corresponds to the maximum value of the jk technology with the prior learning system, the optical path when the special line without the red w 1 passes through the eighth group of transmission members | AT 8. When μ, +, and especially the column length is L8, when the specific wavelength is λ, the following conditional expressions must be satisfied:,, 'f | L7-L8 | / λ &lt; 3 X i〇 + 5. 37. :: Projection optical system according to item 33 of the patent, in which the light passing through "Π" and the above eighth group of light transmitting members with respect to the light Qin (the larger value of the angle is more than 20 degrees. 38. if applying for a patent The projection optical system of the item 34 of the range 'where the maximum transmission angle of the light-transmitting members, &amp;, Ran 1gan, &gt; through the 7th group and the 8th group mentioned above is more than 20 degrees. 39. If the projection optics of the 35th item of the scope of the application for patents, the system, the maximum value of the angle of the four angles of the light transmission member Ling, Mo, and Kaizu nine lines through the above-mentioned eighth group of light transmission elements, More than 20 degrees. 40. For example, the projection optical extraction of item 36 in the scope of the patent application ^ ^ In both, the seventh group and the eighth group of light-transmitting members described above are "Lingben" and "Quan" relative to The maximum value of the angle of light fortunate is more than 20 degrees. 41. For example, in the projection optics of the patent application scope No. 33, the jth group and the eighth group of light transmitting members are arranged in the above-mentioned 浐 p optical system t The position of the pupil on the side of the second surface and the second surface -11-This paper size applies to China National Standard (CNS) A4 (210X297 public love) Hold A BCD 571344 VI. Patent application range 42_ If the projection optical system group and the eighth group of light transmitting members of item 34 of the patent application range are located at the pupil position of the seventh and the above-mentioned second side of the above-mentioned one, In the two-side ^ optical system, 43. For example, any one of the items 21 to 26 in the patent application scope, 1. Among them, there is an aspheric surface for reducing the scalar component in the performance degradation of the inherent double-shadow optical system.丨 Induced optics 44. The projection optical system of item 43 of the scope of patent application is about the aspheric asymmetric shape of the well provided with the aspheric refractive member described above. Therefore, it has a rotation 45. As in any of the items 21 to 2 in the scope of the patent application, the "amorphous refractive member has a stress birefringence distribution" light to the system 46. If the scope of the patent application is 45 For the projection optical system, the birefringence distribution is caused by the above-mentioned density distribution caused by stress impurities, thermal history, and at least one of the f-components. 47. If any of the scope of application for patents Nos. 21 to 26— Item investment: Two, wherein I amorphous optical member is quartz or a stone doped with fluorine ', "" 48. For example, any one of items 21 to 26 in the scope of patent application. , Where the isometric crystal-based refractive member has a fluorinated dance or a gasification pin = "49 · A projection optical system for imaging an image of one side on a first surface according to light of a specific wavelength, which is characterized by having Double crystal refraction composed of double crystals that are transmissive to the upper: :: fixed-wavelength light: See the projection optical system such as the scope of patent application No. 49, in which the double crystal boundary or double crystal plane of the double θ refractive member Set to reduce factors ^ 12-This paper size applies Chinese National Standard (CNS) Α4 (210 X 297 mm) Deterioration of optical properties due to the inherent birefringence of twin crystals. A kind of shirt-exposure device, which is used for projecting and exposing an image of a projection original which has been placed on the first side to a workpiece disposed on the second side according to light of a specific wavelength, and is characterized by having: A light source of light of a specific wavelength; an illuminating optical system arranged in an optical path between the light source and the first surface to guide the light from the light source to the projection original plate, and arranged on the first surface and the first surface In the optical path between the two surfaces, a projection optical system for forming an image of the above-mentioned projection original on the above-mentioned second surface in any one of the scope of patent applications Nos. 21 to 50 is used. 52. The projection exposure device according to item 51 of the scope of patent application, wherein the wavelength of the specific wavelength is a wavelength below 200 nm. 53 · $ projection B exposure side> It is based on the light of a specific wavelength to expose the image of the projection original arranged on the first side to the workpiece arranged on the second side, which is characterized by: The process of light; the use of the above-mentioned light with a specific wavelength to illuminate the above-mentioned projection master; and the projection optics based on the light from the above-mentioned illuminated above-mentioned projection master to request any of the scope of patents 21 to 50 The system is a process of forming the image of the original technical film on the second surface. 54. The projection exposure method according to item 53 of the patent application scope, wherein the wavelength of the specific wavelength is a wavelength of 200 nm or less. -13-