TWI266149B - Microlithographic projection illumination system, optical system, method for the production of a microlithographic projection lens system and microlithographic structuring method - Google Patents

Microlithographic projection illumination system, optical system, method for the production of a microlithographic projection lens system and microlithographic structuring method Download PDF

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Publication number
TWI266149B
TWI266149B TW091108888A TW91108888A TWI266149B TW I266149 B TWI266149 B TW I266149B TW 091108888 A TW091108888 A TW 091108888A TW 91108888 A TW91108888 A TW 91108888A TW I266149 B TWI266149 B TW I266149B
Authority
TW
Taiwan
Prior art keywords
force
projection
projection lens
optical element
lens
Prior art date
Application number
TW091108888A
Other languages
English (en)
Chinese (zh)
Inventor
Martin Brunotte
Jurgen Hartmaier
Hubert Holderer
Winfried Kaiser
Alexander Kohl
Original Assignee
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag filed Critical Zeiss Carl Smt Ag
Application granted granted Critical
Publication of TWI266149B publication Critical patent/TWI266149B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Lens Barrels (AREA)
TW091108888A 2001-05-15 2002-04-29 Microlithographic projection illumination system, optical system, method for the production of a microlithographic projection lens system and microlithographic structuring method TWI266149B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10123725A DE10123725A1 (de) 2001-05-15 2001-05-15 Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren

Publications (1)

Publication Number Publication Date
TWI266149B true TWI266149B (en) 2006-11-11

Family

ID=7684936

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091108888A TWI266149B (en) 2001-05-15 2002-04-29 Microlithographic projection illumination system, optical system, method for the production of a microlithographic projection lens system and microlithographic structuring method

Country Status (7)

Country Link
US (3) US6879379B2 (enExample)
EP (1) EP1390813A2 (enExample)
JP (1) JP2004525527A (enExample)
KR (1) KR20030019577A (enExample)
DE (1) DE10123725A1 (enExample)
TW (1) TWI266149B (enExample)
WO (1) WO2002093257A2 (enExample)

Cited By (1)

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Publication number Priority date Publication date Assignee Title
CN115684203A (zh) * 2019-02-17 2023-02-03 科磊股份有限公司 利用空间变化偏振转子及偏振器进行敏感性粒子检测

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115684203A (zh) * 2019-02-17 2023-02-03 科磊股份有限公司 利用空间变化偏振转子及偏振器进行敏感性粒子检测

Also Published As

Publication number Publication date
JP2004525527A (ja) 2004-08-19
DE10123725A1 (de) 2002-11-21
WO2002093257A2 (de) 2002-11-21
WO2002093257A8 (de) 2003-12-31
EP1390813A2 (de) 2004-02-25
US7170585B2 (en) 2007-01-30
US20050264786A1 (en) 2005-12-01
US6879379B2 (en) 2005-04-12
US20050134967A1 (en) 2005-06-23
US20040150806A1 (en) 2004-08-05
KR20030019577A (ko) 2003-03-06
WO2002093257A3 (de) 2003-09-25

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