JP2008546007A5 - - Google Patents
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- JP2008546007A5 JP2008546007A5 JP2008512758A JP2008512758A JP2008546007A5 JP 2008546007 A5 JP2008546007 A5 JP 2008546007A5 JP 2008512758 A JP2008512758 A JP 2008512758A JP 2008512758 A JP2008512758 A JP 2008512758A JP 2008546007 A5 JP2008546007 A5 JP 2008546007A5
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- 230000007547 defect Effects 0.000 claims description 70
- 238000000034 method Methods 0.000 claims description 55
- 230000001419 dependent effect Effects 0.000 claims description 34
- 230000004075 alteration Effects 0.000 claims description 33
- 230000000694 effects Effects 0.000 claims description 28
- 238000003384 imaging method Methods 0.000 claims description 10
- 238000011144 upstream manufacturing Methods 0.000 claims description 6
- 238000001393 microlithography Methods 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 description 27
- 210000001747 pupil Anatomy 0.000 description 14
- 239000000463 material Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 230000032683 aging Effects 0.000 description 3
- 201000009310 astigmatism Diseases 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004643 material aging Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012887 quadratic function Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US68571605P | 2005-05-27 | 2005-05-27 | |
| US60/685,716 | 2005-05-27 | ||
| PCT/EP2006/004929 WO2006125617A2 (en) | 2005-05-27 | 2006-05-24 | Method for improving the imaging properties of a projection objective, and such a projection objective |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008546007A JP2008546007A (ja) | 2008-12-18 |
| JP2008546007A5 true JP2008546007A5 (enExample) | 2012-08-02 |
| JP5527970B2 JP5527970B2 (ja) | 2014-06-25 |
Family
ID=36764394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008512758A Active JP5527970B2 (ja) | 2005-05-27 | 2006-05-24 | 投影対物系の結像特性を改良する方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US7777963B2 (enExample) |
| EP (1) | EP1883861B1 (enExample) |
| JP (1) | JP5527970B2 (enExample) |
| KR (1) | KR101346402B1 (enExample) |
| TW (1) | TWI454731B (enExample) |
| WO (1) | WO2006125617A2 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI454731B (zh) | 2005-05-27 | 2014-10-01 | Zeiss Carl Smt Gmbh | 用於改進投影物鏡的成像性質之方法以及該投影物鏡 |
| JP5069232B2 (ja) | 2005-07-25 | 2012-11-07 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の投影対物レンズ |
| DE102006047666A1 (de) * | 2006-09-28 | 2008-04-03 | Carl Zeiss Smt Ag | Projektionsobjektiv für eine Mikrolithographieanlage mit verbesserten Abbildungseigenschaften und Verfahren zum Verbessern der Abbildungseigenschaften des Projektionsobjektives |
| ATE554427T1 (de) | 2007-01-22 | 2012-05-15 | Zeiss Carl Smt Gmbh | Verfahren zur verbesserung von bildgebungseigenschaften eines optischen systems und optisches system |
| US7929115B2 (en) | 2007-06-01 | 2011-04-19 | Carl Zeiss Smt Gmbh | Projection objective and projection exposure apparatus for microlithography |
| DE102007027200A1 (de) * | 2007-06-13 | 2008-12-18 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie |
| JP2009004509A (ja) * | 2007-06-20 | 2009-01-08 | Canon Inc | 露光装置およびデバイス製造方法 |
| DE102008001909A1 (de) | 2007-07-11 | 2009-01-15 | Carl Zeiss Smt Ag | Kompensation von durch Linsenerwärmung hervorgerufener Bildfehler bei verdrehter Multipolbeleuchtung |
| DE102008021833B4 (de) * | 2007-12-19 | 2010-04-22 | Carl Zeiss Smt Ag | Verfahren zur Einstellung einer Beleuchtungswinkelverteilung und gleichzeitig einer Intensitätsverteilung über ein in ein Bildfeld abzubildendes Objektfeld |
| JP5511199B2 (ja) * | 2009-02-25 | 2014-06-04 | キヤノン株式会社 | 投影光学系、露光装置、およびデバイス製造方法 |
| JP5656682B2 (ja) * | 2011-02-22 | 2015-01-21 | キヤノン株式会社 | 反射屈折光学系及びそれを有する撮像装置 |
| CN104537182B (zh) * | 2015-01-05 | 2017-11-24 | 中国科学院光电技术研究所 | 一种透镜热变形对光学系统成像结果影响的分析方法 |
| JP2017102275A (ja) * | 2015-12-02 | 2017-06-08 | 株式会社ニコン | 投影光学系、投影光学系の調整方法、露光装置、露光方法、およびデバイス製造方法 |
| JP2017102274A (ja) * | 2015-12-02 | 2017-06-08 | 株式会社ニコン | 投影光学系、投影方法、投影光学系の調整方法、露光装置、露光方法、およびデバイス製造方法 |
| JP2017102273A (ja) * | 2015-12-02 | 2017-06-08 | 株式会社ニコン | 投影光学系、投影方法、投影光学系の調整方法、露光装置、露光方法、およびデバイス製造方法 |
| JP6744797B2 (ja) * | 2016-10-07 | 2020-08-19 | リコーインダストリアルソリューションズ株式会社 | 投射光学系および投射装置および撮像装置 |
| DE102023204235A1 (de) | 2023-05-08 | 2024-11-14 | Carl Zeiss Smt Gmbh | Lithographiesystem mit abspaltbaren Linsen |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4226507A (en) * | 1979-07-09 | 1980-10-07 | The Perkin-Elmer Corporation | Three actuator deformable specimen |
| US4993823A (en) * | 1989-06-29 | 1991-02-19 | Eastman Kodak Company | Method for correction of distortions of an imaging device |
| US5995263A (en) * | 1993-11-12 | 1999-11-30 | Nikon Corporation | Projection exposure apparatus |
| JPH1039208A (ja) * | 1996-07-23 | 1998-02-13 | Nikon Corp | 投影光学系 |
| JP4096399B2 (ja) | 1998-04-09 | 2008-06-04 | 株式会社ニコン | 大口径ズームレンズ |
| DE19827603A1 (de) * | 1998-06-20 | 1999-12-23 | Zeiss Carl Fa | Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie |
| DE19859634A1 (de) * | 1998-12-23 | 2000-06-29 | Zeiss Carl Fa | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie |
| US6600608B1 (en) * | 1999-11-05 | 2003-07-29 | Carl-Zeiss-Stiftung | Catadioptric objective comprising two intermediate images |
| KR100854052B1 (ko) * | 1999-12-29 | 2008-08-26 | 칼 짜이스 에스엠테 아게 | 인접한 비구면 렌즈 표면을 구비한 투사 대물 렌즈 |
| JP4809987B2 (ja) * | 2000-03-30 | 2011-11-09 | キヤノン株式会社 | 光学要素の支持構造、それを用いた露光装置及び半導体デバイスの製造方法 |
| EP1344111A1 (de) * | 2000-12-22 | 2003-09-17 | Carl Zeiss SMT AG | Objektiv mit mindestens einer asphärischen linse |
| CN100346150C (zh) | 2000-12-28 | 2007-10-31 | 株式会社尼康 | 成象状态调节法、曝光法及设备以及器件制造方法 |
| AU2002243903A1 (en) | 2001-02-08 | 2002-08-19 | Sciperio, Inc. | Genetically configured antenna and/or frequency selection surface |
| DE10120446C2 (de) * | 2001-04-26 | 2003-04-17 | Zeiss Carl | Projektionsbelichtungsanlage sowie Verfahren zur Kompensation von Abbildungsfehlern in einer Projektionsbelichtungsanlage, insbesondere für die Mikro-Lithographie |
| DE10143385C2 (de) * | 2001-09-05 | 2003-07-17 | Zeiss Carl | Projektionsbelichtungsanlage |
| AU2003211559A1 (en) * | 2002-03-01 | 2003-09-16 | Nikon Corporation | Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method, exposure device, program, and device manufacturing method |
| DE10210899A1 (de) | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refraktives Projektionsobjektiv für Immersions-Lithographie |
| US20030234918A1 (en) * | 2002-06-20 | 2003-12-25 | Nikon Corporation | Adjustable soft mounts in kinematic lens mounting system |
| JP2005536775A (ja) | 2002-08-23 | 2005-12-02 | 株式会社ニコン | 投影光学系、フォトリソグラフィ方法および露光装置、並びに露光装置を用いた方法 |
| JP2004317534A (ja) * | 2003-04-11 | 2004-11-11 | Nikon Corp | 反射屈折型の結像光学系、露光装置、および露光方法 |
| US7436484B2 (en) * | 2004-12-28 | 2008-10-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| TWI454731B (zh) | 2005-05-27 | 2014-10-01 | Zeiss Carl Smt Gmbh | 用於改進投影物鏡的成像性質之方法以及該投影物鏡 |
-
2006
- 2006-05-23 TW TW095118286A patent/TWI454731B/zh active
- 2006-05-24 KR KR1020077029676A patent/KR101346402B1/ko active Active
- 2006-05-24 US US11/915,191 patent/US7777963B2/en active Active
- 2006-05-24 WO PCT/EP2006/004929 patent/WO2006125617A2/en not_active Ceased
- 2006-05-24 EP EP06753829.8A patent/EP1883861B1/en not_active Not-in-force
- 2006-05-24 JP JP2008512758A patent/JP5527970B2/ja active Active
-
2010
- 2010-07-14 US US12/836,176 patent/US9069263B2/en active Active
-
2015
- 2015-06-01 US US14/727,352 patent/US9581813B2/en not_active Expired - Fee Related
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