JP2004525527A - マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法 - Google Patents

マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法 Download PDF

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Publication number
JP2004525527A
JP2004525527A JP2002589877A JP2002589877A JP2004525527A JP 2004525527 A JP2004525527 A JP 2004525527A JP 2002589877 A JP2002589877 A JP 2002589877A JP 2002589877 A JP2002589877 A JP 2002589877A JP 2004525527 A JP2004525527 A JP 2004525527A
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Prior art keywords
force
optical system
optical
optical element
exposure apparatus
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Pending
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JP2002589877A
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Japanese (ja)
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JP2004525527A5 (enExample
Inventor
ブルノッテ，マーティン
ハルトマイヤー，ユルゲン
ホルデラー，フーベルト
カイザー，ヴィンフリート
コール，アレクサンダー
クグラー，イェンズ
マウル，マンフレッド
ヴァグナー，クリスティアン
Original Assignee
カール・ツアイス・エスエムテイ・アーゲー
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Publication of JP2004525527A publication Critical patent/JP2004525527A/ja
Publication of JP2004525527A5 publication Critical patent/JP2004525527A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Lens Barrels (AREA)
JP2002589877A 2001-05-15 2002-05-04 マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法 Pending JP2004525527A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10123725A DE10123725A1 (de) 2001-05-15 2001-05-15 Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
PCT/EP2002/004900 WO2002093257A2 (de) 2001-05-15 2002-05-04 Projektionsbelichtungsanlage der mikrolithographie,

Publications (2)

Publication Number Publication Date
JP2004525527A true JP2004525527A (ja) 2004-08-19
JP2004525527A5 JP2004525527A5 (enExample) 2005-12-22

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002589877A Pending JP2004525527A (ja) 2001-05-15 2002-05-04 マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法

Country Status (7)

Country Link
US (3) US6879379B2 (enExample)
EP (1) EP1390813A2 (enExample)
JP (1) JP2004525527A (enExample)
KR (1) KR20030019577A (enExample)
DE (1) DE10123725A1 (enExample)
TW (1) TWI266149B (enExample)
WO (1) WO2002093257A2 (enExample)

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JP2009540586A (ja) * 2006-06-16 2009-11-19 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の投影対物器械
JP2009545146A (ja) * 2006-07-24 2009-12-17 カール・ツァイス・エスエムティー・アーゲー 光学装置及び光学装置の結像挙動を補正又は改善する方法
JP2011508409A (ja) * 2007-11-20 2011-03-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系
JP2020507810A (ja) * 2017-02-02 2020-03-12 コーニング インコーポレイテッド 光学系の組立て方法および光学アセンブリでのリターダンスによる歪みを最小にする方法

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JP2009540586A (ja) * 2006-06-16 2009-11-19 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の投影対物器械
US8325426B2 (en) 2006-06-16 2012-12-04 Carl Zeiss Smt Gmbh Projection objective of a microlithographic projection exposure apparatus
JP2009545146A (ja) * 2006-07-24 2009-12-17 カール・ツァイス・エスエムティー・アーゲー 光学装置及び光学装置の結像挙動を補正又は改善する方法
JP2011508409A (ja) * 2007-11-20 2011-03-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系
US8379188B2 (en) 2007-11-20 2013-02-19 Carl Zeiss Smt Gmbh Optical system
JP2020507810A (ja) * 2017-02-02 2020-03-12 コーニング インコーポレイテッド 光学系の組立て方法および光学アセンブリでのリターダンスによる歪みを最小にする方法
JP7240321B2 (ja) 2017-02-02 2023-03-15 コーニング インコーポレイテッド 光学系の組立て方法および光学アセンブリでのリターダンスによる歪みを最小にする方法

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TWI266149B (en) 2006-11-11
EP1390813A2 (de) 2004-02-25
US20050264786A1 (en) 2005-12-01
KR20030019577A (ko) 2003-03-06
US7170585B2 (en) 2007-01-30
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US20040150806A1 (en) 2004-08-05
US6879379B2 (en) 2005-04-12

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