JP2011501446A5 - - Google Patents

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Publication number
JP2011501446A5
JP2011501446A5 JP2010530296A JP2010530296A JP2011501446A5 JP 2011501446 A5 JP2011501446 A5 JP 2011501446A5 JP 2010530296 A JP2010530296 A JP 2010530296A JP 2010530296 A JP2010530296 A JP 2010530296A JP 2011501446 A5 JP2011501446 A5 JP 2011501446A5
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JP
Japan
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field
optical system
image
imaging optical
imaging
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JP2010530296A
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English (en)
Japanese (ja)
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JP2011501446A (ja
JP5431345B2 (ja
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Priority claimed from DE102007051669A external-priority patent/DE102007051669A1/de
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Publication of JP2011501446A5 publication Critical patent/JP2011501446A5/ja
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Publication of JP5431345B2 publication Critical patent/JP5431345B2/ja
Expired - Fee Related legal-status Critical Current
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JP2010530296A 2007-10-26 2008-10-02 結像光学系、この種の結像光学系を含むマイクロリソグラフィのための投影露光装置、及びこの種の投影露光装置を用いて微細構造構成要素を生成する方法 Expired - Fee Related JP5431345B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US98285007P 2007-10-26 2007-10-26
DE102007051669A DE102007051669A1 (de) 2007-10-26 2007-10-26 Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
DE102007051669.1 2007-10-26
US60/982,850 2007-10-26
PCT/EP2008/008336 WO2009052925A1 (en) 2007-10-26 2008-10-02 Imaging optical system, projection exposure installation for micro-lithography comprising an imaging optical system of this type, and method for producing a microstructured component with a projection exposure installation of this type

Publications (3)

Publication Number Publication Date
JP2011501446A JP2011501446A (ja) 2011-01-06
JP2011501446A5 true JP2011501446A5 (enExample) 2011-10-27
JP5431345B2 JP5431345B2 (ja) 2014-03-05

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ID=40490317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010530296A Expired - Fee Related JP5431345B2 (ja) 2007-10-26 2008-10-02 結像光学系、この種の結像光学系を含むマイクロリソグラフィのための投影露光装置、及びこの種の投影露光装置を用いて微細構造構成要素を生成する方法

Country Status (7)

Country Link
US (1) US8558991B2 (enExample)
JP (1) JP5431345B2 (enExample)
KR (1) KR101542268B1 (enExample)
CN (2) CN102354045B (enExample)
DE (1) DE102007051669A1 (enExample)
TW (1) TWI443474B (enExample)
WO (1) WO2009052925A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090305171A1 (en) 2008-06-10 2009-12-10 Nikon Corporation Apparatus for scanning sites on a wafer along a short dimension of the sites
EP2598931B1 (en) 2010-07-30 2020-12-02 Carl Zeiss SMT GmbH Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
DE102010043498A1 (de) * 2010-11-05 2012-05-10 Carl Zeiss Smt Gmbh Projektionsobjektiv einer für EUV ausgelegten mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zum optischen Justieren eines Projektionsobjektives
DE102011076752A1 (de) * 2011-05-31 2012-12-06 Carl Zeiss Smt Gmbh Abbildende Optik
EP2579100A3 (en) 2011-10-03 2017-12-06 ASML Holding N.V. Inspection apparatus, lithographic apparatus, and device manufacturing method
DE102012206153A1 (de) * 2012-04-16 2013-10-17 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
US9448343B2 (en) * 2013-03-15 2016-09-20 Kla-Tencor Corporation Segmented mirror apparatus for imaging and method of using the same
CA2998101C (en) 2014-09-08 2022-12-06 Christopher Robert Debone Grid tied, real time adaptive, distributed intermittent power

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JP4178862B2 (ja) * 2001-08-01 2008-11-12 カール・ツァイス・エスエムティー・アーゲー Ｅｕｖフォトリソグラフィ用の反射投影レンズ
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JP2004252363A (ja) * 2003-02-21 2004-09-09 Canon Inc 反射型投影光学系
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WO2007094407A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
WO2007094414A1 (ja) * 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
US7916270B2 (en) * 2006-03-03 2011-03-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR20090007277A (ko) * 2006-04-14 2009-01-16 가부시키가이샤 니콘 노광 장치, 디바이스 제조 방법 및 노광 방법
DE102006022958A1 (de) * 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
KR100772701B1 (ko) 2006-09-28 2007-11-02 주식회사 하이닉스반도체 반도체 메모리 장치

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