CN102354045B - 成像光学系统、投射曝光设备、及微结构部件生产方法 - Google Patents

成像光学系统、投射曝光设备、及微结构部件生产方法 Download PDF

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Publication number
CN102354045B
CN102354045B CN201110371663.0A CN201110371663A CN102354045B CN 102354045 B CN102354045 B CN 102354045B CN 201110371663 A CN201110371663 A CN 201110371663A CN 102354045 B CN102354045 B CN 102354045B
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China
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imaging optical
optical system
thing
image
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Expired - Fee Related
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CN201110371663.0A
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English (en)
Chinese (zh)
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CN102354045A (zh
Inventor
汉斯-于尔根.曼
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/084—Catadioptric systems using more than three curved mirrors on-axis systems with at least one of the mirrors having a central aperture

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201110371663.0A 2007-10-26 2008-10-02 成像光学系统、投射曝光设备、及微结构部件生产方法 Expired - Fee Related CN102354045B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US98285007P 2007-10-26 2007-10-26
DE102007051669A DE102007051669A1 (de) 2007-10-26 2007-10-26 Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
DE102007051669.1 2007-10-26
US60/982,850 2007-10-26

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN200880113386XA Division CN101836151B (zh) 2007-10-26 2008-10-02 成像光学系统、包括该类型的成像光学系统的用于微光刻的投射曝光设备、以及利用该类型的投射曝光设备生产微结构部件的方法

Publications (2)

Publication Number Publication Date
CN102354045A CN102354045A (zh) 2012-02-15
CN102354045B true CN102354045B (zh) 2014-09-24

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ID=40490317

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201110371663.0A Expired - Fee Related CN102354045B (zh) 2007-10-26 2008-10-02 成像光学系统、投射曝光设备、及微结构部件生产方法
CN200880113386XA Expired - Fee Related CN101836151B (zh) 2007-10-26 2008-10-02 成像光学系统、包括该类型的成像光学系统的用于微光刻的投射曝光设备、以及利用该类型的投射曝光设备生产微结构部件的方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN200880113386XA Expired - Fee Related CN101836151B (zh) 2007-10-26 2008-10-02 成像光学系统、包括该类型的成像光学系统的用于微光刻的投射曝光设备、以及利用该类型的投射曝光设备生产微结构部件的方法

Country Status (7)

Country Link
US (1) US8558991B2 (enExample)
JP (1) JP5431345B2 (enExample)
KR (1) KR101542268B1 (enExample)
CN (2) CN102354045B (enExample)
DE (1) DE102007051669A1 (enExample)
TW (1) TWI443474B (enExample)
WO (1) WO2009052925A1 (enExample)

Families Citing this family (8)

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Publication number Priority date Publication date Assignee Title
US20090305171A1 (en) 2008-06-10 2009-12-10 Nikon Corporation Apparatus for scanning sites on a wafer along a short dimension of the sites
EP2598931B1 (en) 2010-07-30 2020-12-02 Carl Zeiss SMT GmbH Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
DE102010043498A1 (de) * 2010-11-05 2012-05-10 Carl Zeiss Smt Gmbh Projektionsobjektiv einer für EUV ausgelegten mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zum optischen Justieren eines Projektionsobjektives
DE102011076752A1 (de) * 2011-05-31 2012-12-06 Carl Zeiss Smt Gmbh Abbildende Optik
EP2579100A3 (en) 2011-10-03 2017-12-06 ASML Holding N.V. Inspection apparatus, lithographic apparatus, and device manufacturing method
DE102012206153A1 (de) * 2012-04-16 2013-10-17 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
US9448343B2 (en) * 2013-03-15 2016-09-20 Kla-Tencor Corporation Segmented mirror apparatus for imaging and method of using the same
CA2998101C (en) 2014-09-08 2022-12-06 Christopher Robert Debone Grid tied, real time adaptive, distributed intermittent power

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CN1704797A (zh) * 2004-06-01 2005-12-07 大日本网目版制造株式会社 投影光学系统和图形描画装置

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TW448487B (en) * 1997-11-22 2001-08-01 Nippon Kogaku Kk Exposure apparatus, exposure method and manufacturing method of device
JPH1184249A (ja) * 1998-07-10 1999-03-26 Nikon Corp 露光装置、及び該装置を用いた露光方法
DE19846928A1 (de) * 1998-10-12 2000-04-13 Zeiss Carl Fa Abbildungssystem mit einem Zylinderlinsenarray
JP2000284494A (ja) * 1999-03-31 2000-10-13 Seiko Epson Corp 露光装置
US6600608B1 (en) 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
US6611316B2 (en) 2001-02-27 2003-08-26 Asml Holding N.V. Method and system for dual reticle image exposure
JP4178862B2 (ja) * 2001-08-01 2008-11-12 カール・ツァイス・エスエムティー・アーゲー Ｅｕｖフォトリソグラフィ用の反射投影レンズ
JP2004107011A (ja) * 2002-09-18 2004-04-08 Asmo Co Ltd 給紙装置
JP2004252363A (ja) * 2003-02-21 2004-09-09 Canon Inc 反射型投影光学系
JP4314054B2 (ja) 2003-04-15 2009-08-12 キヤノン株式会社 露光装置及びデバイスの製造方法
JP2005166897A (ja) * 2003-12-02 2005-06-23 Canon Inc 露光装置
KR101179350B1 (ko) * 2004-01-14 2012-09-11 칼 짜이스 에스엠티 게엠베하 반사굴절식 투영 대물렌즈
US20060082905A1 (en) * 2004-10-14 2006-04-20 Shafer David R Catadioptric projection objective with an in-line, single-axis configuration
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US7916270B2 (en) * 2006-03-03 2011-03-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR20090007277A (ko) * 2006-04-14 2009-01-16 가부시키가이샤 니콘 노광 장치, 디바이스 제조 방법 및 노광 방법
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US6627365B1 (en) * 1998-03-20 2003-09-30 Nikon Corporation Photomask and projection exposure apparatus
CN1704797A (zh) * 2004-06-01 2005-12-07 大日本网目版制造株式会社 投影光学系统和图形描画装置

Non-Patent Citations (1)

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Title
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Also Published As

Publication number Publication date
US8558991B2 (en) 2013-10-15
CN101836151B (zh) 2012-12-05
KR20100069700A (ko) 2010-06-24
CN102354045A (zh) 2012-02-15
KR101542268B1 (ko) 2015-08-06
DE102007051669A1 (de) 2009-04-30
CN101836151A (zh) 2010-09-15
TWI443474B (zh) 2014-07-01
TW200923596A (en) 2009-06-01
WO2009052925A1 (en) 2009-04-30
JP2011501446A (ja) 2011-01-06
US20100231884A1 (en) 2010-09-16
JP5431345B2 (ja) 2014-03-05

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