JP2011502275A5 - - Google Patents

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Publication number
JP2011502275A5
JP2011502275A5 JP2010530304A JP2010530304A JP2011502275A5 JP 2011502275 A5 JP2011502275 A5 JP 2011502275A5 JP 2010530304 A JP2010530304 A JP 2010530304A JP 2010530304 A JP2010530304 A JP 2010530304A JP 2011502275 A5 JP2011502275 A5 JP 2011502275A5
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JP
Japan
Prior art keywords
optical system
imaging
imaging optical
mirrors
light
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JP2010530304A
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English (en)
Japanese (ja)
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JP2011502275A (ja
JP5653755B2 (ja
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Priority claimed from DE102007051671A external-priority patent/DE102007051671A1/de
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Publication of JP2011502275A5 publication Critical patent/JP2011502275A5/ja
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JP2010530304A 2007-10-26 2008-10-11 結像光学系及び投影露光装置 Active JP5653755B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US98279307P 2007-10-26 2007-10-26
DE102007051671A DE102007051671A1 (de) 2007-10-26 2007-10-26 Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
DE102007051671.3 2007-10-26
US60/982,793 2007-10-26
PCT/EP2008/008619 WO2009052962A1 (en) 2007-10-26 2008-10-11 Imaging optical system and projection exposure installation

Publications (3)

Publication Number Publication Date
JP2011502275A JP2011502275A (ja) 2011-01-20
JP2011502275A5 true JP2011502275A5 (enExample) 2011-11-24
JP5653755B2 JP5653755B2 (ja) 2015-01-14

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ID=40514165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010530304A Active JP5653755B2 (ja) 2007-10-26 2008-10-11 結像光学系及び投影露光装置

Country Status (8)

Country Link
US (2) US8605255B2 (enExample)
EP (1) EP2203785A1 (enExample)
JP (1) JP5653755B2 (enExample)
KR (2) KR20160018817A (enExample)
CN (2) CN102749810A (enExample)
DE (1) DE102007051671A1 (enExample)
TW (1) TWI402629B (enExample)
WO (1) WO2009052962A1 (enExample)

Families Citing this family (14)

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KR101592136B1 (ko) 2007-10-26 2016-02-04 칼 짜이스 에스엠티 게엠베하 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 갖는 마이크로리소그래피용 투영 노광 장치
DE102007051671A1 (de) 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
KR101542272B1 (ko) 2007-10-26 2015-08-06 칼 짜이스 에스엠티 게엠베하 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 구비하는 마이크로리소그래피용 투영 노광 장치
DE102009046685A1 (de) 2009-11-13 2011-05-26 Carl Zeiss Smt Gmbh Abbildende Optik
DE102009047179B8 (de) * 2009-11-26 2016-08-18 Carl Zeiss Smt Gmbh Projektionsobjektiv
EP2598931B1 (en) 2010-07-30 2020-12-02 Carl Zeiss SMT GmbH Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
DE102011083888A1 (de) * 2011-09-30 2013-04-04 Carl Zeiss Smt Gmbh Abbildende katoptrische EUV-Projektionsoptik
DE102012202675A1 (de) * 2012-02-22 2013-01-31 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik
US9291751B2 (en) 2013-06-17 2016-03-22 Carl Zeiss Smt Gmbh Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit
DE102013107192A1 (de) 2013-07-08 2015-01-08 Carl Zeiss Laser Optics Gmbh Reflektives optisches Element für streifenden Einfall im EUV-Wellenlängenbereich
DE102013213544A1 (de) * 2013-07-10 2015-01-15 Carl Zeiss Smt Gmbh Tragsystem und Projektionsbelichtungsanlage
DE102013224435A1 (de) * 2013-11-28 2015-05-28 Carl Zeiss Smt Gmbh Messanordnung zur Messung optischer Eigenschaften eines reflektiven optischen Elements, insbesondere für die Mikrolithographie
CN108594411B (zh) * 2018-06-04 2023-06-02 凯迈（洛阳）测控有限公司 一种长焦距、大口径、多视场中波红外光学系统
DE102024109828A1 (de) * 2024-04-09 2025-10-09 Carl Zeiss Meditec Ag Pupillenrelay, Verwendung desselben, Scannervorrichtung, ophthalmologische Vorrichtung, Verfahren zum Abbilden eines Lichtstrahls

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US6920199B2 (en) * 2002-02-20 2005-07-19 Gkss-Forschungszentrum Geesthacht Gmbh Mirror element for the reflection of x-rays
JP2004022945A (ja) 2002-06-19 2004-01-22 Canon Inc 露光装置及び方法
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JP5106858B2 (ja) * 2003-12-15 2012-12-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 高開口数と平面状端面とを有する投影対物レンズ
WO2005098504A1 (en) 2004-04-08 2005-10-20 Carl Zeiss Smt Ag Imaging system with mirror group
ATE411543T1 (de) 2004-12-15 2008-10-15 Europ Agence Spatiale Weitwinkel-vierspiegelteleskop mit asphärischen ausserachsenspiegeln
JP5366405B2 (ja) * 2004-12-23 2013-12-11 カール・ツァイス・エスエムティー・ゲーエムベーハー 遮光瞳を有する高開口率対物光学系
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
EP2192446B1 (en) * 2005-03-08 2011-10-19 Carl Zeiss SMT GmbH Microlithography projection system with an accessible aperture stop
US7336416B2 (en) * 2005-04-27 2008-02-26 Asml Netherlands B.V. Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
JP4918542B2 (ja) 2005-05-13 2012-04-18 カール・ツァイス・エスエムティー・ゲーエムベーハー ６枚の反射鏡を備えたｅｕｖ投影光学系
TWI451125B (zh) * 2005-09-13 2014-09-01 卡爾蔡司Ｓｍｔ有限公司 顯微蝕刻投影光學系統、包含此一光學系統之顯微蝕刻工具、使用此一顯微蝕刻工具於顯微蝕刻生產微結構元件之方法、藉此一方法所生產之微結構元件以及於此一光學系統中設計一光學表面的方法
DE102006017336B4 (de) 2006-04-11 2011-07-28 Carl Zeiss SMT GmbH, 73447 Beleuchtungssystem mit Zoomobjektiv
EP1930771A1 (en) * 2006-12-04 2008-06-11 Carl Zeiss SMT AG Projection objectives having mirror elements with reflective coatings
DE102007051671A1 (de) 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
KR101592136B1 (ko) 2007-10-26 2016-02-04 칼 짜이스 에스엠티 게엠베하 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 갖는 마이크로리소그래피용 투영 노광 장치
KR101542272B1 (ko) 2007-10-26 2015-08-06 칼 짜이스 에스엠티 게엠베하 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 구비하는 마이크로리소그래피용 투영 노광 장치

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