JP2013530534A5 - - Google Patents
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- Publication number
- JP2013530534A5 JP2013530534A5 JP2013514638A JP2013514638A JP2013530534A5 JP 2013530534 A5 JP2013530534 A5 JP 2013530534A5 JP 2013514638 A JP2013514638 A JP 2013514638A JP 2013514638 A JP2013514638 A JP 2013514638A JP 2013530534 A5 JP2013530534 A5 JP 2013530534A5
- Authority
- JP
- Japan
- Prior art keywords
- raster
- illumination
- optical system
- angle
- illumination light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005286 illumination Methods 0.000 claims 47
- 230000003287 optical effect Effects 0.000 claims 21
- 238000009826 distribution Methods 0.000 claims 10
- 238000000034 method Methods 0.000 claims 9
- 230000007704 transition Effects 0.000 claims 7
- 238000003491 array Methods 0.000 claims 3
- 230000003213 activating effect Effects 0.000 claims 2
- 230000001419 dependent effect Effects 0.000 claims 2
- 210000001747 pupil Anatomy 0.000 claims 2
- 238000003384 imaging method Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000001393 microlithography Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 230000000007 visual effect Effects 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US35477210P | 2010-06-15 | 2010-06-15 | |
| DE102010030089A DE102010030089A1 (de) | 2010-06-15 | 2010-06-15 | Beleuchtungsoptik für die Mikro-Lithografie sowie Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
| DE102010030089.6 | 2010-06-15 | ||
| US61/354,772 | 2010-06-15 | ||
| PCT/EP2011/059427 WO2011157601A2 (en) | 2010-06-15 | 2011-06-08 | Illumination optical system for microlithography and projection exposure system with an illumination optical system of this type |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013530534A JP2013530534A (ja) | 2013-07-25 |
| JP2013530534A5 true JP2013530534A5 (enExample) | 2014-04-03 |
| JP5753260B2 JP5753260B2 (ja) | 2015-07-22 |
Family
ID=45020111
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013514638A Active JP5753260B2 (ja) | 2010-06-15 | 2011-06-08 | マイクロリソグラフィ用の照明光学系及びこの種の照明光学系を有する投影露光系 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9933704B2 (enExample) |
| EP (1) | EP2583141B1 (enExample) |
| JP (1) | JP5753260B2 (enExample) |
| DE (1) | DE102010030089A1 (enExample) |
| TW (1) | TWI539240B (enExample) |
| WO (1) | WO2011157601A2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014010552A1 (ja) * | 2012-07-10 | 2014-01-16 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
| JP5864771B2 (ja) * | 2012-10-08 | 2016-02-17 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の照明系 |
| DE102013213545A1 (de) | 2013-07-10 | 2015-01-15 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithografie |
| CN105612611B (zh) | 2013-08-09 | 2019-03-12 | 科磊股份有限公司 | 用于提高检测灵敏度的多点照明 |
| DE102014203348A1 (de) | 2014-02-25 | 2015-08-27 | Carl Zeiss Smt Gmbh | Bündelverteilungsoptik, Beleuchtungsoptik mit einer derartigen Bündelverteilungsoptik, optisches System mit einer derartigen Beleuchtungsoptik sowie Projektionsbelichtungsanlage mit einem derartigen optischen System |
| DE102014203347B4 (de) * | 2014-02-25 | 2017-09-14 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Mikro-Lithografie sowie Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
| US9575412B2 (en) * | 2014-03-31 | 2017-02-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and system for reducing pole imbalance by adjusting exposure intensity |
| DE102014219112A1 (de) | 2014-09-23 | 2016-03-24 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithographie sowie Hohlwellenleiter-Komponente hierfür |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6259513B1 (en) | 1996-11-25 | 2001-07-10 | Svg Lithography Systems, Inc. | Illumination system with spatially controllable partial coherence |
| JP3005203B2 (ja) * | 1997-03-24 | 2000-01-31 | キヤノン株式会社 | 照明装置、露光装置及びデバイス製造方法 |
| KR100576746B1 (ko) | 2001-06-01 | 2006-05-03 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피장치, 디바이스제조방법, 그 디바이스,제어시스템, 컴퓨터프로그램, 및 컴퓨터프로그램물 |
| JP2004245912A (ja) * | 2003-02-12 | 2004-09-02 | Ushio Inc | 光照射装置 |
| DE102004063848A1 (de) * | 2004-02-26 | 2005-09-15 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage |
| JP2006253529A (ja) * | 2005-03-14 | 2006-09-21 | Nikon Corp | 照明光学装置、露光装置、および露光方法 |
| WO2007093433A1 (de) | 2006-02-17 | 2007-08-23 | Carl Zeiss Smt Ag | Beleuchtungssystem für die mikro-lithographie, projektionsbelichtungsanlage mit einem derartigen beleuchtungssystem |
| US8587764B2 (en) | 2007-03-13 | 2013-11-19 | Nikon Corporation | Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US8937706B2 (en) | 2007-03-30 | 2015-01-20 | Asml Netherlands B.V. | Lithographic apparatus and method |
| US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| WO2009060744A1 (ja) * | 2007-11-06 | 2009-05-14 | Nikon Corporation | 照明光学装置及び露光装置 |
| US9636187B2 (en) | 2007-11-21 | 2017-05-02 | Misonix Incorporated | Atomized-fluid shield for surgery and method of use |
| EP2238513B1 (en) * | 2007-12-21 | 2011-11-02 | Carl Zeiss SMT GmbH | Illumination method |
| DE102008009600A1 (de) * | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| DE102009017941A1 (de) * | 2008-06-19 | 2009-12-24 | Carl Zeiss Smt Ag | Beleuchtungssystem für die Mikro-Lithographie sowie Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem |
| EP2146248B1 (en) * | 2008-07-16 | 2012-08-29 | Carl Zeiss SMT GmbH | Illumination system of a microlithographic projection exposure apparatus |
| DE102008042462B4 (de) * | 2008-09-30 | 2010-11-04 | Carl Zeiss Smt Ag | Beleuchtungssystem für die EUV-Mikrolithographie |
| DE102009009568A1 (de) * | 2008-10-20 | 2010-04-29 | Carl Zeiss Smt Ag | Optische Baugruppe zur Führung eines EUV-Strahlungsbündels |
-
2010
- 2010-06-15 DE DE102010030089A patent/DE102010030089A1/de not_active Withdrawn
-
2011
- 2011-06-08 WO PCT/EP2011/059427 patent/WO2011157601A2/en not_active Ceased
- 2011-06-08 JP JP2013514638A patent/JP5753260B2/ja active Active
- 2011-06-08 EP EP11723967.3A patent/EP2583141B1/en active Active
- 2011-06-15 TW TW100120852A patent/TWI539240B/zh active
-
2012
- 2012-11-20 US US13/681,938 patent/US9933704B2/en active Active
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