JP2016503186A5 - - Google Patents

Download PDF

Info

Publication number
JP2016503186A5
JP2016503186A5 JP2015546938A JP2015546938A JP2016503186A5 JP 2016503186 A5 JP2016503186 A5 JP 2016503186A5 JP 2015546938 A JP2015546938 A JP 2015546938A JP 2015546938 A JP2015546938 A JP 2015546938A JP 2016503186 A5 JP2016503186 A5 JP 2016503186A5
Authority
JP
Japan
Prior art keywords
optical system
light
reflecting surface
reflecting surfaces
polarization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015546938A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016503186A (ja
JP6510979B2 (ja
Filing date
Publication date
Priority claimed from DE102012223233.8A external-priority patent/DE102012223233A1/de
Application filed filed Critical
Publication of JP2016503186A publication Critical patent/JP2016503186A/ja
Publication of JP2016503186A5 publication Critical patent/JP2016503186A5/ja
Application granted granted Critical
Publication of JP6510979B2 publication Critical patent/JP6510979B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2015546938A 2012-12-14 2013-12-03 マイクロリソグラフィ投影露光装置の光学系 Active JP6510979B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261737153P 2012-12-14 2012-12-14
US61/737,153 2012-12-14
DE102012223233.8A DE102012223233A1 (de) 2012-12-14 2012-12-14 Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102012223233.8 2012-12-14
PCT/EP2013/075383 WO2014090635A1 (en) 2012-12-14 2013-12-03 Optical system of a microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2016503186A JP2016503186A (ja) 2016-02-01
JP2016503186A5 true JP2016503186A5 (enExample) 2018-04-19
JP6510979B2 JP6510979B2 (ja) 2019-05-08

Family

ID=50821372

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015546938A Active JP6510979B2 (ja) 2012-12-14 2013-12-03 マイクロリソグラフィ投影露光装置の光学系

Country Status (6)

Country Link
US (1) US9720327B2 (enExample)
JP (1) JP6510979B2 (enExample)
CN (1) CN104854510B (enExample)
DE (1) DE102012223233A1 (enExample)
TW (1) TWI592766B (enExample)
WO (1) WO2014090635A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102374206B1 (ko) 2017-12-05 2022-03-14 삼성전자주식회사 반도체 장치 제조 방법
JP7102218B2 (ja) * 2018-05-09 2022-07-19 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及び方法
US10962885B2 (en) * 2018-09-28 2021-03-30 Taiwan Semiconductor Manufacturing Co., Ltd. Extreme ultraviolet (EUV) polarization splitter
DE102019200193B3 (de) * 2019-01-09 2020-02-06 Carl Zeiss Smt Gmbh Optisches System für eine Projektionsbelichtungsanlage
CN115901786A (zh) * 2022-12-09 2023-04-04 彩虹显示器件股份有限公司 一种线扫描相机检测玻璃边缘的装置及方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6108131A (en) * 1998-05-14 2000-08-22 Moxtek Polarizer apparatus for producing a generally polarized beam of light
US6208463B1 (en) 1998-05-14 2001-03-27 Moxtek Polarizer apparatus for producing a generally polarized beam of light
US6137618A (en) * 1999-02-08 2000-10-24 J. A. Woollam Co. Inc. Compact, high extinction coefficient combination brewster angle and other than brewster angle polarizing system, and method of use
EP1356476B1 (de) 2001-01-26 2006-08-23 Carl Zeiss SMT AG Schmalbandiger spektralfilter und seine verwendung
JP3652296B2 (ja) * 2001-10-26 2005-05-25 キヤノン株式会社 光学装置
GB2408588A (en) * 2003-11-27 2005-06-01 Sharp Kk Polarisation conversion optical system eg with dispersion compensation for liquid crystal projection
WO2006111319A2 (en) * 2005-04-20 2006-10-26 Carl Zeiss Smt Ag Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
US7525642B2 (en) * 2006-02-23 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102008009601A1 (de) * 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102008002749A1 (de) * 2008-06-27 2009-12-31 Carl Zeiss Smt Ag Beleuchtungsoptik für die Mikrolithografie
DE102008041801A1 (de) 2008-09-03 2010-03-04 Carl Zeiss Smt Ag Spektralfilter für die EUV-Mikrolithographie
JP4794649B2 (ja) * 2009-04-24 2011-10-19 株式会社アマダ レーザ加工用偏光変換器
DE102009045135A1 (de) 2009-09-30 2011-03-31 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Mikrolithographie
DE102011003928B4 (de) 2011-02-10 2012-10-31 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102012219936A1 (de) 2012-10-31 2014-04-30 Carl Zeiss Smt Gmbh EUV-Lichtquelle zur Erzeugung eines Nutz-Ausgabestrahls für eine Projektionsbelichtungsanlage
DE102013200137A1 (de) 2013-01-08 2013-11-14 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage
DE102013202645A1 (de) 2013-02-19 2014-02-27 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102013205957A1 (de) 2013-04-04 2014-04-30 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage

Similar Documents

Publication Publication Date Title
US10146135B2 (en) Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
JP5480232B2 (ja) 投影露光系、このような投影露光系の補助により微細構造の構成部材を製造する方法、このような系において使用するために適応させた偏光光学素子
JP5842615B2 (ja) 照明光学装置、照明方法、並びに露光方法及び装置
JP2011507293A5 (enExample)
TWI407267B (zh) 具有可調式光擴展性（ｅｔｅｎｄｕｅ）的脈衝調節器
JP6137179B2 (ja) マイクロリソグラフィ投影露光装置の光学系及びマイクロリソグラフィ露光方法
US9817317B2 (en) Optical system of a microlithographic projection exposure apparatus
JP2014534643A5 (enExample)
JP2016503186A5 (enExample)
TWI447434B (zh) 用於增加一脈衝式雷射光束之一脈衝長度之裝置及方法與微影裝置
JP6510979B2 (ja) マイクロリソグラフィ投影露光装置の光学系
JP5846471B2 (ja) 偏光影響光学装置及びマイクロリソグラフィ投影露光装置の光学系
US9091945B2 (en) Illumination system of a microlithographic projection exposure apparatus
JP6140290B2 (ja) マイクロリソグラフィー投影露光装置用光学システム及びマイクロリソグラフィー露光方法
JPH0666246B2 (ja) 照明光学系
JP2015534653A5 (enExample)
CN117980826A (zh) Euv照明设备和设计用于在euv中操作的微光刻投射曝光设备的操作方法
WO2014077404A1 (ja) 照明光学系及び照明方法、並びに露光方法及び装置