JP2015534653A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2015534653A5 JP2015534653A5 JP2015532407A JP2015532407A JP2015534653A5 JP 2015534653 A5 JP2015534653 A5 JP 2015534653A5 JP 2015532407 A JP2015532407 A JP 2015532407A JP 2015532407 A JP2015532407 A JP 2015532407A JP 2015534653 A5 JP2015534653 A5 JP 2015534653A5
- Authority
- JP
- Japan
- Prior art keywords
- optical
- optical system
- polarization
- mirror
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims description 52
- 238000009826 distribution Methods 0.000 claims description 15
- 230000010287 polarization Effects 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 8
- 238000005286 illumination Methods 0.000 claims description 5
- 238000003384 imaging method Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 claims 4
- 238000001393 microlithography Methods 0.000 claims 3
- 239000000463 material Substances 0.000 claims 2
- 238000011144 upstream manufacturing Methods 0.000 claims 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261706824P | 2012-09-28 | 2012-09-28 | |
| DE102012217769.8 | 2012-09-28 | ||
| US61/706,824 | 2012-09-28 | ||
| DE102012217769.8A DE102012217769A1 (de) | 2012-09-28 | 2012-09-28 | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| PCT/EP2013/069458 WO2014048828A1 (en) | 2012-09-28 | 2013-09-19 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015534653A JP2015534653A (ja) | 2015-12-03 |
| JP2015534653A5 true JP2015534653A5 (enExample) | 2016-08-18 |
| JP6140290B2 JP6140290B2 (ja) | 2017-05-31 |
Family
ID=50276225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015532407A Active JP6140290B2 (ja) | 2012-09-28 | 2013-09-19 | マイクロリソグラフィー投影露光装置用光学システム及びマイクロリソグラフィー露光方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9488918B2 (enExample) |
| JP (1) | JP6140290B2 (enExample) |
| KR (1) | KR101699639B1 (enExample) |
| DE (1) | DE102012217769A1 (enExample) |
| WO (1) | WO2014048828A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017032525A1 (en) * | 2015-08-21 | 2017-03-02 | Asml Netherlands B.V. | Lithographic method and apparatus |
| DE102019208961A1 (de) | 2019-06-19 | 2020-12-24 | Carl Zeiss Smt Gmbh | Projektionsoptik und Projektionsbelichtungsanlage mit einer solchen Projektionsoptik |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19535392A1 (de) | 1995-09-23 | 1997-03-27 | Zeiss Carl Fa | Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit |
| JP3652296B2 (ja) | 2001-10-26 | 2005-05-25 | キヤノン株式会社 | 光学装置 |
| DE10206061A1 (de) | 2002-02-08 | 2003-09-04 | Carl Zeiss Semiconductor Mfg S | Polarisationsoptimiertes Beleuchtungssystem |
| US20050134825A1 (en) * | 2002-02-08 | 2005-06-23 | Carl Zeiss Smt Ag | Polarization-optimized illumination system |
| WO2005026843A2 (en) | 2003-09-12 | 2005-03-24 | Carl Zeiss Smt Ag | Illumination system for a microlithography projection exposure installation |
| EP1668420B1 (en) | 2003-09-26 | 2008-05-21 | Carl Zeiss SMT AG | Exposure method as well as projection exposure system for carrying out the method |
| CN101799587B (zh) | 2004-01-16 | 2012-05-30 | 卡尔蔡司Smt有限责任公司 | 光学系统、投影系统及微结构半导体部件的制造方法 |
| DE102004011733A1 (de) | 2004-03-04 | 2005-09-22 | Carl Zeiss Smt Ag | Transmissionsfiltervorrichtung |
| US7317539B2 (en) * | 2004-08-23 | 2008-01-08 | Asml Netherlands B.V. | Polarizing beam splitter device, interferometer module, lithographic apparatus, and device manufacturing method |
| TWI453796B (zh) | 2005-01-21 | 2014-09-21 | 尼康股份有限公司 | 偏光變更單元以及元件製造方法 |
| WO2006111319A2 (en) * | 2005-04-20 | 2006-10-26 | Carl Zeiss Smt Ag | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system |
| DE102006038643B4 (de) | 2006-08-17 | 2009-06-10 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| DE102007012564A1 (de) | 2007-03-13 | 2008-09-25 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102007043958B4 (de) | 2007-09-14 | 2011-08-25 | Carl Zeiss SMT GmbH, 73447 | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102008009601A1 (de) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| WO2009152867A1 (en) * | 2008-06-20 | 2009-12-23 | Carl Zeiss Smt Ag | Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method |
| DE102008002749A1 (de) | 2008-06-27 | 2009-12-31 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die Mikrolithografie |
| DE102008054844B4 (de) * | 2008-12-17 | 2010-09-23 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie mikrolithographisches Projektionsbelichtungsverfahren |
| US20110037962A1 (en) | 2009-08-17 | 2011-02-17 | Nikon Corporation | Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method |
| EP2369413B1 (en) * | 2010-03-22 | 2021-04-07 | ASML Netherlands BV | Illumination system and lithographic apparatus |
| DE102010029339A1 (de) | 2010-05-27 | 2011-12-01 | Carl Zeiss Smt Gmbh | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| DE102010029905A1 (de) | 2010-06-10 | 2011-12-15 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| KR20140069152A (ko) * | 2011-09-16 | 2014-06-09 | 가부시키가이샤 니콘 | 조명 광학 장치, 광학계 유닛, 조명 방법, 및 노광 방법 및 장치 |
| DE102012206154A1 (de) | 2012-04-16 | 2013-06-06 | Carl Zeiss Smt Gmbh | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| DE102012214198A1 (de) | 2012-08-09 | 2013-05-29 | Carl Zeiss Smt Gmbh | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
-
2012
- 2012-09-28 DE DE102012217769.8A patent/DE102012217769A1/de not_active Withdrawn
-
2013
- 2013-09-19 KR KR1020157005671A patent/KR101699639B1/ko not_active Expired - Fee Related
- 2013-09-19 WO PCT/EP2013/069458 patent/WO2014048828A1/en not_active Ceased
- 2013-09-19 JP JP2015532407A patent/JP6140290B2/ja active Active
-
2015
- 2015-01-30 US US14/610,212 patent/US9488918B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6199591B2 (ja) | 光源装置および露光装置 | |
| JP5706519B2 (ja) | マイクロリソグラフィ投影露光装置の光学系 | |
| JP2015132848A5 (ja) | 照明光学系、露光装置、照明方法、露光方法、およびデバイス製造方法 | |
| JP2014534643A5 (enExample) | ||
| JP2008538452A5 (enExample) | ||
| CN102549461A (zh) | 用于微光刻的照明光学单元 | |
| US9817317B2 (en) | Optical system of a microlithographic projection exposure apparatus | |
| JP2015511770A5 (enExample) | ||
| JPH11312631A5 (ja) | 照明光学系、露光装置および照明光学系の光路調整方法 | |
| TW201115279A (en) | Laser exposure apparatus | |
| JP4431497B2 (ja) | 光学撮像系、とくにカタディオプトリック縮小対物レンズ | |
| JP2016503186A5 (enExample) | ||
| JP6510979B2 (ja) | マイクロリソグラフィ投影露光装置の光学系 | |
| JP2005141158A5 (enExample) | ||
| JP2015534653A5 (enExample) | ||
| TWI474134B (zh) | 微影投影曝光設備的光學系統 | |
| JP6140290B2 (ja) | マイクロリソグラフィー投影露光装置用光学システム及びマイクロリソグラフィー露光方法 | |
| JP2007227973A (ja) | 光遅延素子、照明光学装置、露光装置及び方法、並びに半導体素子製造方法 | |
| JP2022505432A (ja) | 光学系、特にマイクロリソグラフィ用の光学系 | |
| JP2007528595A5 (enExample) | ||
| WO2019228529A1 (zh) | 一种照明系统、曝光系统及光刻设备 | |
| KR101999553B1 (ko) | 조명 광학장치, 노광장치, 및 물품의 제조방법 | |
| TW202328751A (zh) | Euv照明設備和設計用於在euv中操作微影投影曝光設備的操作方法 | |
| JP5861897B2 (ja) | マイクロリソグラフィ投影露光装置のための光学系 | |
| TW202326298A (zh) | 光學元件組，特別是用於微影投影曝光設備的照明裝置 |