JP2007528595A5 - - Google Patents

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Publication number
JP2007528595A5
JP2007528595A5 JP2007500124A JP2007500124A JP2007528595A5 JP 2007528595 A5 JP2007528595 A5 JP 2007528595A5 JP 2007500124 A JP2007500124 A JP 2007500124A JP 2007500124 A JP2007500124 A JP 2007500124A JP 2007528595 A5 JP2007528595 A5 JP 2007528595A5
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JP
Japan
Prior art keywords
resonator
light
exposure apparatus
projection exposure
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007500124A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007528595A (ja
JP4769788B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2005/001797 external-priority patent/WO2005083511A2/de
Publication of JP2007528595A publication Critical patent/JP2007528595A/ja
Publication of JP2007528595A5 publication Critical patent/JP2007528595A5/ja
Application granted granted Critical
Publication of JP4769788B2 publication Critical patent/JP4769788B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2007500124A 2004-02-26 2005-02-22 レーザ放射線のコヒーレンスを低減させるためのシステム Expired - Fee Related JP4769788B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102004009239 2004-02-26
DE102004009239.7 2004-02-26
PCT/EP2005/001797 WO2005083511A2 (de) 2004-02-26 2005-02-22 System zur reduzierung der kohärenz einer laserstrahlung

Publications (3)

Publication Number Publication Date
JP2007528595A JP2007528595A (ja) 2007-10-11
JP2007528595A5 true JP2007528595A5 (enExample) 2008-04-10
JP4769788B2 JP4769788B2 (ja) 2011-09-07

Family

ID=34894863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007500124A Expired - Fee Related JP4769788B2 (ja) 2004-02-26 2005-02-22 レーザ放射線のコヒーレンスを低減させるためのシステム

Country Status (5)

Country Link
US (1) US7593095B2 (enExample)
EP (1) EP1721217A2 (enExample)
JP (1) JP4769788B2 (enExample)
KR (1) KR101109354B1 (enExample)
WO (1) WO2005083511A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5622126B2 (ja) * 2005-11-15 2014-11-12 株式会社ニコン 面位置検出装置、露光装置、およびデバイスの製造方法
JP5622068B2 (ja) 2005-11-15 2014-11-12 株式会社ニコン 面位置検出装置、露光装置、およびデバイスの製造方法
US7948606B2 (en) * 2006-04-13 2011-05-24 Asml Netherlands B.V. Moving beam with respect to diffractive optics in order to reduce interference patterns
US7649676B2 (en) * 2006-06-14 2010-01-19 Asml Netherlands B.V. System and method to form unpolarized light
NL2004483A (nl) * 2009-05-26 2010-11-30 Asml Holding Nv Pulse stretcher with reduced energy density on optical components.
JP7311586B2 (ja) * 2018-08-22 2023-07-19 エーエスエムエル ネザーランズ ビー．ブイ． パルスストレッチャーおよび方法
US20250205786A1 (en) * 2022-04-01 2025-06-26 Nikon Slm Solutions Ag Method of operating an irradiation system, irradiation system and apparatus for producing a three-dimensional work piece

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2590510B2 (ja) * 1988-02-03 1997-03-12 株式会社ニコン 照明装置
JP2969718B2 (ja) * 1990-01-20 1999-11-02 キヤノン株式会社 照明装置及びそれを用いた回路の製造方法
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
JP2770984B2 (ja) * 1989-06-08 1998-07-02 キヤノン株式会社 照明装置，投影露光装置及び素子製造方法
DE19508754C2 (de) 1995-03-10 1999-06-02 Ldt Gmbh & Co Verfahren und Vorrichtung zum Vermindern von Interferenzen eines kohärenten Lichtbündels
US6238063B1 (en) 1998-04-27 2001-05-29 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US6499295B1 (en) * 1998-08-06 2002-12-31 Mannesmann Rexroth Ag Hydro-transformer
DE19959742A1 (de) * 1999-12-10 2001-06-13 Zeiss Carl System zur Kompensation von Richtungs- und Positionsschwankungen eines von einem Laser erzeugten Lichtes
TW561254B (en) * 2001-09-26 2003-11-11 Nikon Corp Aberration measuring device, aberration measuring method, regulation method for optical system, and exposure system provided with optical system regulated by the regulation method

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