JP4769788B2 - レーザ放射線のコヒーレンスを低減させるためのシステム - Google Patents

レーザ放射線のコヒーレンスを低減させるためのシステム Download PDF

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Publication number
JP4769788B2
JP4769788B2 JP2007500124A JP2007500124A JP4769788B2 JP 4769788 B2 JP4769788 B2 JP 4769788B2 JP 2007500124 A JP2007500124 A JP 2007500124A JP 2007500124 A JP2007500124 A JP 2007500124A JP 4769788 B2 JP4769788 B2 JP 4769788B2
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Japan
Prior art keywords
resonator
light
exposure apparatus
laser
projection exposure
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Expired - Fee Related
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JP2007500124A
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English (en)
Japanese (ja)
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JP2007528595A5 (enExample
JP2007528595A (ja
Inventor
ニルズ ディークマン
マンフレッド マウル
ダミアン フィオルカ
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2007528595A publication Critical patent/JP2007528595A/ja
Publication of JP2007528595A5 publication Critical patent/JP2007528595A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Lasers (AREA)
JP2007500124A 2004-02-26 2005-02-22 レーザ放射線のコヒーレンスを低減させるためのシステム Expired - Fee Related JP4769788B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102004009239 2004-02-26
DE102004009239.7 2004-02-26
PCT/EP2005/001797 WO2005083511A2 (de) 2004-02-26 2005-02-22 System zur reduzierung der kohärenz einer laserstrahlung

Publications (3)

Publication Number Publication Date
JP2007528595A JP2007528595A (ja) 2007-10-11
JP2007528595A5 JP2007528595A5 (enExample) 2008-04-10
JP4769788B2 true JP4769788B2 (ja) 2011-09-07

Family

ID=34894863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007500124A Expired - Fee Related JP4769788B2 (ja) 2004-02-26 2005-02-22 レーザ放射線のコヒーレンスを低減させるためのシステム

Country Status (5)

Country Link
US (1) US7593095B2 (enExample)
EP (1) EP1721217A2 (enExample)
JP (1) JP4769788B2 (enExample)
KR (1) KR101109354B1 (enExample)
WO (1) WO2005083511A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5622126B2 (ja) * 2005-11-15 2014-11-12 株式会社ニコン 面位置検出装置、露光装置、およびデバイスの製造方法
JP5622068B2 (ja) 2005-11-15 2014-11-12 株式会社ニコン 面位置検出装置、露光装置、およびデバイスの製造方法
US7948606B2 (en) * 2006-04-13 2011-05-24 Asml Netherlands B.V. Moving beam with respect to diffractive optics in order to reduce interference patterns
US7649676B2 (en) * 2006-06-14 2010-01-19 Asml Netherlands B.V. System and method to form unpolarized light
NL2004483A (nl) * 2009-05-26 2010-11-30 Asml Holding Nv Pulse stretcher with reduced energy density on optical components.
JP7311586B2 (ja) * 2018-08-22 2023-07-19 エーエスエムエル ネザーランズ ビー．ブイ． パルスストレッチャーおよび方法
US20250205786A1 (en) * 2022-04-01 2025-06-26 Nikon Slm Solutions Ag Method of operating an irradiation system, irradiation system and apparatus for producing a three-dimensional work piece

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01198759A (ja) * 1988-02-03 1989-08-10 Nikon Corp 照明装置
JPH0311614A (ja) * 1989-06-08 1991-01-18 Canon Inc 照明装置，投影露光装置及び素子製造方法
JPH03215930A (ja) * 1990-01-20 1991-09-20 Canon Inc 照明装置及びそれを用いた回路の製造方法
WO2003028073A1 (en) * 2001-09-26 2003-04-03 Nikon Corporation Aberration measuring device, aberration measuring method, regulation method for optical system, and exposure system provided with optical system regulated by the regulation method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
DE19508754C2 (de) 1995-03-10 1999-06-02 Ldt Gmbh & Co Verfahren und Vorrichtung zum Vermindern von Interferenzen eines kohärenten Lichtbündels
US6238063B1 (en) 1998-04-27 2001-05-29 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US6499295B1 (en) * 1998-08-06 2002-12-31 Mannesmann Rexroth Ag Hydro-transformer
DE19959742A1 (de) * 1999-12-10 2001-06-13 Zeiss Carl System zur Kompensation von Richtungs- und Positionsschwankungen eines von einem Laser erzeugten Lichtes

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01198759A (ja) * 1988-02-03 1989-08-10 Nikon Corp 照明装置
JPH0311614A (ja) * 1989-06-08 1991-01-18 Canon Inc 照明装置，投影露光装置及び素子製造方法
JPH03215930A (ja) * 1990-01-20 1991-09-20 Canon Inc 照明装置及びそれを用いた回路の製造方法
WO2003028073A1 (en) * 2001-09-26 2003-04-03 Nikon Corporation Aberration measuring device, aberration measuring method, regulation method for optical system, and exposure system provided with optical system regulated by the regulation method

Also Published As

Publication number Publication date
EP1721217A2 (de) 2006-11-15
US20070206381A1 (en) 2007-09-06
US7593095B2 (en) 2009-09-22
WO2005083511A3 (de) 2005-12-01
WO2005083511A2 (de) 2005-09-09
KR101109354B1 (ko) 2012-01-31
JP2007528595A (ja) 2007-10-11
KR20060129502A (ko) 2006-12-15

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