TW201115279A - Laser exposure apparatus - Google Patents

Laser exposure apparatus Download PDF

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Publication number
TW201115279A
TW201115279A TW99103204A TW99103204A TW201115279A TW 201115279 A TW201115279 A TW 201115279A TW 99103204 A TW99103204 A TW 99103204A TW 99103204 A TW99103204 A TW 99103204A TW 201115279 A TW201115279 A TW 201115279A
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TW
Taiwan
Prior art keywords
laser light
eye lens
fly
lens
incident
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TW99103204A
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Chinese (zh)
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TWI463270B (en
Inventor
Yuji Tanada
Daisuke Ishii
Koichi Kajiyama
Michinobu Mizumura
Makoto Hatanaka
Kohei Matsui
Takeshi Ikeda
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V Technology Co Ltd
Toppan Printing Co Ltd
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Publication of TW201115279A publication Critical patent/TW201115279A/en
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Publication of TWI463270B publication Critical patent/TWI463270B/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G02B19/0014Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0052Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938Using specific optical elements
    • G02B27/095Refractive optical elements
    • G02B27/0955Lenses
    • G02B27/0961Lens arrays
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70083Non-homogeneous intensity distribution in the mask plane
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70191Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Optical Scanning Systems (AREA)

Abstract

The device is provided with a first fly eye lens (2) to enlarge the cross-sectional shape of a laser beam, a first light path difference adjustment member (3) that is provided on the laser beam incident side of the first fly eye lens (2) and creates phase differences in the laser beam that enters each condenser lens (2a) of the first fly eye lens (2), a condenser lens (4) for transforming the laser beam exiting the light path difference adjustment member (3) into parallel light, a second fly eye lens (6) to produce uniform light intensity distribution by the laser beam in a photomask illumination area, and a second light path difference adjustment member (7) that is provided on the laser beam incident side of the second fly eye lens (6) and creates phase differences in the laser beam that enters each condenser lenses (6a) of the second fly eye lens (6). As a result, interference patterns in the laser beam created by the first fly eye lens are averaged out, and uneven lighting by the laser beam is reduced.

Description

201115279 六、發明說明: 【發明所屬之技術領域】 本發明係關於/種雷射曝光裝置’其具有於與雷射 光的光軸略呈直交之面内併排地配置有複數個聚光透 鏡之蠅眼透鏡,詳而言之’係關於一種可使蠅吸透鏡所 產生之雷射光的干涉條紋均勻化,並減少雷射光的照度 不均勻以均勻地進行曝光之雷射曝光裝置。 【先前技術】 習知的雷射曝光裝置為了將雷射光均勻地照射& 被曝光體上’而利用可擴大雷射光徑之擴束器及用以使 光徑擴大後的雷射光強度分佈均勻化之蠅眼透鏡等光 學積分器等。再者,亦有為了將因雷射光之同調性(可 干涉性)而使得蠅眼透鏡的透過光互相干涉所產生之干 涉條紋降低’而在擴束器與蠅眼透鏡之間設置光線路經 差調整組件(例如參照日本特開2004-12757號公報)。 然而,此種習知的雷射曝光裝置,由於光線路徑差 調整組件只設置在擴束器與蠅眼透鏡之間,故無法完全 去除因蠅眼透鏡的透過光所產生之干涉條紋,且會因些 微殘存的干涉條紋而使得被曝光體上發生照度不均勻 的情況,而難以形成微細圖樣。 因此,本發明鑑於上述問題點,其目的在於提供一 種可使因绳眼透鏡所產生之雷射光的干涉條紋均勻 化’並減少雷射光的照度不均勻以均勻地進行曝光之雷 3 201115279 射曝光裝置。 【發明内容】 為達成上述目的,本發明之雷射曝光裝置,係具 備:雷射光源’係用以放射雷射光;第1蠅眼透鏡,係 於與該雷射光的光軸略呈直交之面内併排地配置有複 數個透鏡,將射出光暫時聚集後呈放射狀地散射以擴大 雷射光的剖面形狀;第1相位差產生機構,係設置於該 第1蠅眼透鏡之雷射光入射侧處,以使分別射入至該第 1蠅眼透鏡的各聚光透鏡之雷射光產生相位差;聚光透 鏡’係使從該第1蠅眼透鏡射出而擴大剖面形狀之雷射 光成為平行光;第2蠅眼透鏡,係於與該聚光透鏡的光 軸略呈直交之面内併排地配置有複數個透鏡,以使利用 雷射光所照射之光罩照射區域内的光強度分佈均勻 化;以及第2相位差產生機構,係設置於該第2蠅眼透 鏡之雷射光入射侧處,以使分別射入至該第2蠅眼透鏡 的各聚光透鏡之雷射光產生相位差。 藉由此種結構,從雷射光源放射出雷射光,並在不 擴大其光束徑的狀態下使其入射至設置於第1蠅眼透 鏡的雷射光入射側之第1相位差產生機構,以利用該第 1相位差產生機構,來使分別射入至與第1蠅眼透鏡的 光轴略呈直交之面内併排配置的複數個聚光透鏡之雷 射光產生相位差,並降低從第1蠅眼透鏡所射出之雷射 光的同調性,再利用第1蠅眼透鏡將各聚光鏡的射出光 4 201115279 暫時聚光後,使其呈放射狀地散射以擴大雷射光的剖面 形狀’利用聚光鏡來使剖面形狀擴大後之雷射光成為平 行光,並利用設置於第2蠅眼透鏡的雷射光入射側之第 2相位差產生機構,來使分別射入至與第2蠅眼透鏡的 光軸略呈直交之面内併排配置的複數個聚光透鏡之雷 射光產生相位差後,再次降低從第2蠅眼透鏡所射出之 雷射光的同調性,以利用第2蠅眼透鏡來使光強度分佈 均勻化而照射在光罩上。藉此,由於利用第1及第2兩 個相位差產生機構來使分別射入至第1及第2蠅眼透鏡 的各聚光鏡之複數道雷射光產生相位差,可減少從第1 及第2蠅眼透鏡所射出之雷射光的同調性,故可較習知 技術更加減少產生於照射區域之干涉條紋。又,和使用 一個蠅眼透鏡的情況相比,可使雷射光之強度分佈更加 均勻化’並更加減少照度的不均勻。因此,可均勻地照 射在光罩上以均勻地進行曝光,並易於對被曝光體進行 微細圖樣的曝光。又,第1蠅眼透鏡係同時具有可使雷 射光均勻化與擴大光束徑之功能,故不需另外具備擴束 器,而可減少零件數量。 又,該聚光透鏡之雷射光入射側處係設置有相 光軸呈傾斜並以光軸為中心而進行迴轉之透明的平行 平面迴轉板。藉此,可使設置於聚光透鏡之雷射光入射 側處且相對於光軸傾斜地配置之透明的平行平面姆# 板以光轴為中心而進行迴轉,以改變入射至第2罐眼遷 鏡之雷射光的入射角度。因此,可使利用從第2绳目艮透 201115279 鏡之各聚光鏡射出的雷射光所照射之光罩上的照射區 域隨著平行平面迴轉板的迴轉而微動,以使產生於光罩 上的照射區域之雷射光的干涉條紋均勻化且變得不明 顯。藉此,可更加減少雷射光的照度不均勻,並將被曝 光體更均勻地曝光。 【實施方式】 以下,根據添附圖式詳細說明本發明實施形態。圖 1係顯示本發明之雷射曝光裝置的第1實施形態之前視 圖。該雷射曝光裝置係透過光罩來將雷射光照射在被曝 光體上並加以曝光,其具有雷射光源1、第1蠅眼透鏡 2、第1光線路徑差調整組件3、第1聚光鏡4、平行平 面迴轉板5、第2蠅眼透鏡6、第2光線路徑差調整組 件7及第2聚光鏡8。 上述雷射光源1為紫外線脈衝式雷射發振器,可使 用準分子雷射或YAG(yttrium aluminium garnet;紀鋁石 榴石)雷射等。 上述雷射光源1之雷射光放射方向前方處設置有 第1蠅眼透鏡2。該第1蠅眼透鏡2係可將從雷射光源 1所放射之雷射光暫時聚光後,使其呈放射狀地散射而 發揮擴大雷射光剖面形狀之擴束器功能,並使後述第2 罐眼透鏡6之入射侧面内的光強度分佈均勻化,而於與 雷射光的光軸略呈直交之面内陣列式(例如縱3個X橫3 個)地併排配置有複數個聚光鏡2a者。 201115279 一上述第1繩眼透鏡2之雷射光入射側處設置有第1 光線路徑差雜組件3。該帛1光線路徑差調整組件3 係用以減;從第1繩眼透鏡2射出之雷射錢同調性, 並抑制從第1㈣透鏡2的各聚光鏡2a射出之複數道 雷射光在第2蠅眼透鏡6的人射側面上互相干涉的情 況而為用以使分別射入至第i織眼透鏡2的各聚光鏡 2a之複數道雷射光產生相位差之第1相位差產生機構。 具體來說,第1光線路徑差調整組件3設置有對應 於第1繩眼透鏡2的各聚光鏡2a,其係平行於光軸之轴 方向的長度各自相異且折射率大於〗之細長狀透明組 件3a(例如石英玻璃或透明玻璃等),而具有可改變分別 射入至第1養透鏡2的各聚光鏡2a^複數道雷射光 的光學路徑長度之功能。 於上述雷射光的進行方向,在第i蠅眼透鏡2的下 游側設置有第1聚光鏡4。該第丨聚光鏡4係用以使從 第1蠅眼透鏡2射出的放射狀雷射光成為平行光,而係 於光的入射側處為平坦的平凸透鏡,以使其前焦點位置 約略與第1蠅眼透鏡2的後焦點位置一致。 上述第1蠅眼透鏡2與第1聚光鏡4之間的光線路 徑上設置有平行平面迴轉板5 ^該平行平面迴轉板5係 用以改變入射至後述第2蠅眼透鏡6之雷射光的入射角 度,而設置有相對於光軸呈傾斜的透明圓板(例如玻 璃),其係以光軸為中心而進行迴轉。藉以使光罩9上 之雷射光的照射區域微動,以使產生於光罩9上之第2 叫吻79 崎目艮透鏡6所產生之雷射光的干涉條紋均勻化且變得 不明顯。又,可減少經由第1光線路牷差調整組件3而 從第1蠅眼透鏡2所放射出之雷射光的照度不均勻。 圖2係顯示平行平面迴轉板5的位置與入射至第2 續眼透鏡6之雷射光的入射角度及光罩9上照射區域變 化的關係之說明圖。 當平行平面迴轉板5以光轴為中心而進行迴轉 時,平行平面迴轉板5係如圖2(a)之前視圖中以箭頭所 不般地來回移動。此時,當平行平面迴轉板5位於同圖 (a)中以實線所示之位置時,雷射光會因該平行平面迴轉 板5而如實線所示般地折射,並以一定的入射角度入射 至第2蠅眼透鏡6的聚光鏡6a。 另一方面,當平行平面迴轉板5迴轉而達到圖2(a) 中以虛線所示之位置時,雷射光會因該平行平面迴轉板 5而如虛線所示般地折射,旅以與上述相異之入射角度 入射至上述聚光鏡6a。其結果為,利用從第2蠅眼透鏡 6射出的雷射光所照射之光罩9上的照射區域1〇,會從 同圖(b)中實線所示之區域移動至虛線所示之區域。如此 地’藉由迴轉平行平面迴轉板5來改變入射至第2绳目『 透鏡6之雷射光的入射角度,可將第1蠅眼透鏡2所^ 出之雷射光的強度不均勻加以均勻化,並使光單9上的 照射區域10微動,則可使因從第2蠅眼透鏡6 、 複數道雷射光的干涉,而導致產生於光罩9上之 的 紋的明暗模様及照度不均勻加以均勻化且變得不明I條 201115279 於上述雷射光的進行方向,在第1聚光鏡4的下游 侧設置有第2蠅眼透鏡6。該第2蠅眼透鏡6係用以使 光罩9之照射區域1〇内的光強度分佈均勻化,而於與 雷射光的光軸略呈直交之面内陣列式(例如縱12個X橫 4個)地併排配置有複數個聚光鏡6a,其係將相同的二 個蠅眼透鏡加以組合所形成之雙蠅眼透鏡。 上述第2蠅眼透鏡6之雷射光入射侧處設置有第2 光線路徑差調整組件7。該第2光線路徑差調整組件7 係用以減少從第2蠅眼透鏡6射出之雷射光的同調性’ 並抑制從第2蠅眼透鏡6的各聚光鏡6a射出之複數道 雷射光在光罩9上互相干涉,而為用以使分別射入至第 2蠅眼透鏡6的各聚光鏡6a之複數道雷射光產生相位差 之第2相位差產生機構。 具體來說,第2光線路徑差調整組件7係分別對應 於第2繩眼透鏡6的縱4列聚光鏡6a’將平行於光軸之 轴方向的長度各自相異且折射率大於1之板狀透明組 件7a(例如石英玻璃或透明玻璃等)横向地重疊所形 成’而具有可改變分別射入至第2蠅眼透鏡6的各聚光 鏡6a之縱4列雷射光於横向方向相鄰之列與列之間的 光學路徑長度之功能。 於上述雷射光的進行方向,在第2蠅眼透鏡6的下 游側设置有第2聚光鏡8。該第2聚光鏡8係用以使從 第2蠅眼透鏡6射出的雷射光成為平行光而垂直入射至 光罩9,其係將光的入射侧為平坦的二片平凸透鏡加以 201115279 ==置點位置約略與第__ 為用以使光線路徑產生折射:二中反 接下纟針對上述結構之雷射曝絲置的動作加以 說明。 光源' 1所放射之雷射光會在二個反射鏡 而入射至第1光線路徑差調整組件3。該第 1光線路彳&差調整組件3係對應於第〗繩眼透鏡2的各 聚光鏡2a,將平行於光軸之軸方向的長度各自相異且折 射率大於1之複數個透明組件3&加以組合所構成,故 從第1光線路徑差調整組件3的複數個透明組件3a射 出的複數道雷射光,其彼此間的相位會有所差異。 從第1光線路徑差調整組件3的複數個透明組件 3a射出的複數道雷射光,會分別射入至與丨蠅眼透鏡2 相對應之聚光鏡2a。然後,從第丨蠅眼透鏡2的各聚光 鏡2a射出的複數道雷射光分別聚光在各聚光鏡%的後 焦點後,會呈放射狀地散射。此時,由於入射至第i蠅 眼透鏡2的各聚光鏡2a之各雷射光,其彼此間的相位 會有差異,故可減少從第1蠅眼透鏡2所射出之雷射光 的同調性。因此,利用從各聚光鏡2a射出的複數道雷 射光所照射之第2蠅眼透鏡6上,各雷射光的干涉會被 抑制且干涉條紋的產生會被抑制’而可略均勻地照射在 第2蠅眼透鏡6上。 從第1蠅眼透鏡3射出的放射狀雷射光藉由第i聚 201115279 光鏡4成a 7而入射至I仃光後’ θ經由第2光線路徑差調整組件 射光入射2 2賴透鏡6。此時,第1聚光鏡4之雷 軸呈傾斜1處係設置有將透明圓板(例如麵)相對於光 也配置之平行平面迴轉板5,由 = 故會在平行平面迴轉板 的位置之雷射光的主光線之人射至第1聚光鏡4 發生變化。===第1聚光鏡4的半徑方向 6之雷射^此’㈣’人射至第2蝶眼透鏡 蠅眼透射角度會發生變化。同時,人射至第2 、兄之雷射光的照度不均勻會被均勻化。 行於ί軸I從第1聚光鏡4射出的雷射光,在將平 複數個==:=自相異且折射率大於1之 整组件7声^ 、、且σ所構成第2光線路徑差調 眼透鏡道雷射光而照射在第2绳 7的錢明組:=:2光線路徑差調整組件 里,故從h 1 各雷射光的光學路裡長度各自相 ⑽處會件7射_射光彼此 所射出之雷射=二Γ,可減少從第2繩眼透鏡6 的各聚弁„且可抑制從第2蠅眼透鏡6 ^鏡如射出而照射在光軍9上之各雷射光的干 3 2㈣透鏡6的各聚光鏡如射出之雷射光分 ::=:=7焦點後,會呈放射狀地 射鏡13。然後,雷射光以平面反 201115279 射鏡13被反射後,藉由第2聚光鏡8而成為平行光胜 略垂直地入射至光罩9,而均勻地照射在光罩9上。 此處,上述第1實施形態中,第2光線路徑差調整 組件7係將光軸方向的長度相異且縱方向呈長板狀之 透明組件7a横向地重疊所構成,相對於縱向地併排於 第2繩眼透鏡6之各聚光鏡6a,會入射有同相位的雷射 光’而相對於横向地併排之各聚光鏡6a,會入射有相位 相異之雷射光,故於光罩9上的照射區域10處’雖然 是非常些微但仍會有產生從縱向地併排於第2蠅眼透 鏡6的各聚光鏡6a射出之同相位雷射光所造成的干涉 條紋之虞。然而,上述第i實施形態中,第i聚光鏡4 入射側處係設置有平行平面迴轉板5,並將其以光軸為 中心而進行迴轉,故入射至第2蠅眼透鏡6之雷射光的 入射角度會發生變化。因此,如圖2(b)所示,可使利用 光罩9上之雷射光所照射的照射區域10微動,來將上 述干涉條紋的明暗模様加以均勻化且變得不明顯,並將 雷射光的照度不均勻加以均勻化以均勻地進行曝光。 圖3係顯示本發明之雷射曝光裝置的第2實施形態 之前視圖。該第2實施形態中,與第1實施形態之相異 點為’係取代第2聚光鏡8而於平面反射鏡13之位置 置有準直透鏡丨4。此時,使準直透鏡14的前焦點位 置約略與第2蠅眼透鏡6的後焦點位置一致。藉以使從 第2繩眼透鏡6射出的雷射光成為平行光而垂直入射至 光罩9。 12 201115279 此外,上述第1及第2實施形態中’係針對 … 線路徑差調整組件7為將分別對應於第2蠅眼 2光 縱4列聚光鏡6a而在其平行於光軸之軸方向的鏡6的 自相異之板狀透明組件7a横向地重疊所形成的^度各 :明’但本發明祕定於此,而亦可為將對應=加2 艮透鏡ό之各聚光鏡如而在其平行於光軸之輛 的長度各自相異之細長狀透明組件加以組合所形向 =,由於從第2蠅眼透鏡6的各聚光鏡6&所射出之= 雷射光的相位係完全不同,故可降低各雷射光 上發生干涉之虞。 九罩9 又,上述實施形態中,係針對相位差產生機構為光 線路徑差調整組件的情況加以說明’但本發明不限定於 此,而亦可為對應於蝇眼透鏡之各聚光鏡所設置之相位 板0 【圖式簡單說明】 圖1係顯示本發明之雷射曝光裝置的第1實施形態 之前視圖。 圖2(a)、2(b)係顯示上述雷射曝光裝置之平行平面 迴轉板的位置與入射至第2蠅眼透鏡之雷射光的入射 角度及光罩上照射區域變化的關係之說明圖。 圖3係顯示本發明之雷射曝光裝置的第2實施形態 之前視圖。 13 201115279 【主要元件符號說明】 1 雷射光源 2 第1蠅眼透鏡 2a 聚光鏡 3 第1光線路徑差調整組件 3a 透明組件 4 第1聚光鏡 5 平行平面迴轉板 6 第2蠅眼透鏡 6a 聚光鏡 7 第2光線路徑差調整組件 7a 透明組件 8 第2聚光鏡 9 光罩 10 照射區域 11 > 12 ' 13 平面反射鏡 14 準直透鏡201115279 VI. Description of the Invention: [Technical Field] The present invention relates to a laser exposure apparatus that has a plurality of concentrating lenses arranged side by side in a plane orthogonal to the optical axis of the laser light. The eye lens, in detail, is a laser exposure apparatus that uniformizes the interference fringes of the laser light generated by the fly sucking lens and reduces the uneven illumination of the laser light to uniformly expose the light. [Prior Art] A conventional laser exposure apparatus uses a beam expander that can expand a laser light path and a laser light intensity distribution that is used to widen an optical path in order to uniformly illuminate the laser light onto the object to be exposed Optical integrators such as fly-eye lenses. Furthermore, in order to reduce the interference fringes caused by the interference of the transmitted light of the fly-eye lens due to the homology (interference) of the laser light, an optical path is provided between the beam expander and the fly-eye lens. The difference adjustment component (for example, refer to Japanese Laid-Open Patent Publication No. 2004-12757). However, in the conventional laser exposure apparatus, since the light path difference adjusting component is disposed only between the beam expander and the fly's eye lens, the interference fringes generated by the transmitted light of the fly's eye lens cannot be completely removed, and The illuminance unevenness occurs on the object to be exposed due to the slight residual interference fringes, and it is difficult to form a fine pattern. Accordingly, the present invention has been made in view of the above problems, and an object thereof is to provide a Ray 3 201115279 exposure which can uniformize the interference fringe of laser light generated by a rope lens and reduce uneven illumination of the laser light. Device. SUMMARY OF THE INVENTION To achieve the above object, a laser exposure apparatus according to the present invention includes a laser light source for radiating laser light, and a first fly-eye lens that is slightly orthogonal to an optical axis of the laser light. A plurality of lenses are arranged side by side in the plane, and the emitted light is temporarily collected and radially scattered to expand the cross-sectional shape of the laser light. The first phase difference generating mechanism is disposed on the incident side of the laser light incident on the first fly-eye lens. In order to generate a phase difference between the laser beams of the respective condensing lenses that are incident on the first fly's eye lens, the condensing lens is configured to expand the cross-sectional shape of the laser light from the first fly's eye lens into parallel light. The second fly-eye lens is provided with a plurality of lenses arranged side by side in a plane orthogonal to the optical axis of the collecting lens to uniformize the light intensity distribution in the irradiation area of the reticle irradiated by the laser light. And a second phase difference generating means provided on the incident side of the laser beam incident on the second fly's eye lens to cause a phase difference between the laser beams incident on the respective condensing lenses of the second fly's eye lens. With such a configuration, the laser beam is emitted from the laser light source, and the first phase difference generating means is provided on the incident side of the laser light incident on the first fly's eye lens without expanding the beam diameter. By the first phase difference generation means, the laser light of the plurality of condensing lenses which are respectively arranged in the plane orthogonal to the optical axis of the first fly's eye lens is phase-shifted, and is lowered from the first The coherence of the laser light emitted by the fly-eye lens, and the first fly-eye lens is used to temporarily condense the light emitted by each condensing lens 4 201115279 and then radially scatter it to expand the cross-sectional shape of the laser light. The laser light that has been enlarged in cross-sectional shape is parallel light, and is incident on the optical axis of the second fly-eye lens by the second phase difference generating mechanism provided on the incident side of the laser light incident on the second fly-eye lens. When the laser light of the plurality of condensing lenses arranged side by side in the orthogonal plane produces a phase difference, the homology of the laser light emitted from the second fly's eye lens is again lowered to use the second fly's eye lens to distribute the light intensity All Homogenize and illuminate the reticle. In this way, the first and second phase difference generating means are used to reduce the phase difference of the plurality of laser beams incident on the respective condensing mirrors of the first and second fly's eye lenses, thereby reducing the first and second steps. The coherence of the laser light emitted by the fly's eye lens can reduce the interference fringes generated in the illuminated area more than the prior art. Further, the intensity distribution of the laser light can be made more uniform than in the case of using a fly-eye lens, and the unevenness of the illuminance is further reduced. Therefore, it can be uniformly irradiated on the reticle to uniformly perform exposure, and it is easy to expose the exposed body to a fine pattern. Further, since the first fly-eye lens system has the function of uniformizing the laser light and expanding the beam diameter, it is not necessary to additionally provide a beam expander, and the number of parts can be reduced. Further, on the incident side of the laser light incident on the condensing lens, a parallel planar slewing plate in which the phase of the optical axis is inclined and which is rotated around the optical axis is provided. Thereby, a transparent parallel plane surface plate disposed at the incident side of the laser light of the condensing lens and obliquely arranged with respect to the optical axis can be rotated around the optical axis to change the incidence to the second can-eye mirror The angle of incidence of the laser light. Therefore, the irradiation area on the reticle irradiated by the laser light emitted from the second rope through the condensing mirror of the 201115279 mirror can be slightly moved in accordance with the rotation of the parallel plane slewing plate, so that the irradiation generated on the reticle is irradiated. The interference fringes of the laser light in the region are uniform and become inconspicuous. Thereby, the illuminance unevenness of the laser light can be further reduced, and the exposed body can be more uniformly exposed. [Embodiment] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a front view showing a first embodiment of a laser exposure apparatus according to the present invention. The laser exposure apparatus irradiates laser light onto the object to be exposed and exposes it through a reticle, and has a laser light source 1, a first fly-eye lens 2, a first light path difference adjustment unit 3, and a first condensing mirror 4. The parallel plane rotary plate 5, the second fly-eye lens 6, the second light path difference adjustment unit 7, and the second condensing mirror 8. The above-mentioned laser light source 1 is an ultraviolet pulse type laser oscillator, and an excimer laser or a YAG (yttrium aluminium garnet) laser can be used. The first fly's eye lens 2 is disposed in front of the laser light source in the direction in which the laser light is radiated. The first fly-eye lens 2 can temporarily condense the laser light emitted from the laser light source 1 and radially scatter it, thereby exhibiting a beam expander function for expanding the cross-sectional shape of the laser light, and will be described later. The light intensity distribution in the incident side surface of the can eye lens 6 is uniform, and a plurality of condensing mirrors 2a are arranged side by side in an array pattern (for example, three vertical X and three horizontal) in a plane orthogonal to the optical axis of the laser light. . 201115279 The first ray path difference component 3 is provided at the incident side of the laser light of the first eye lens 2 described above. The 光线1 ray path difference adjusting unit 3 is configured to reduce the laser money homology emitted from the first rope lens 2, and suppress the plurality of laser light emitted from the condensing mirrors 2a of the first (four) lens 2 in the second fly. In the case where the human lens side faces of the eye lens 6 interfere with each other, the first phase difference generation means for causing a phase difference between the plurality of laser beams that are incident on the respective condensing mirrors 2a of the i-th lens 2 is generated. Specifically, the first light path difference adjustment unit 3 is provided with each of the condensing mirrors 2a corresponding to the first eye lens 2, which is different in length from the axial direction of the optical axis, and has a refractive index larger than that of the elongated shape. The module 3a (for example, quartz glass or transparent glass) has a function of changing the optical path length of each of the condensing beams 2a and the plurality of laser beams respectively incident on the first lenticular lens 2. In the direction in which the laser light is emitted, the first condensing mirror 4 is provided on the downstream side of the i-eye eye lens 2. The second condensing mirror 4 is configured to make the radial laser light emitted from the first fly's eye lens 2 into parallel light, and to be a flat plano-convex lens at the incident side of the light so that the front focus position is approximately the first The back focus position of the fly's eye lens 2 is uniform. A parallel plane rotary plate 5 is disposed on a light path between the first fly's eye lens 2 and the first condensing lens 4. The parallel planar rotary plate 5 is for changing the incidence of laser light incident on the second fly's eye lens 6 to be described later. The angle is provided with a transparent circular plate (for example, glass) inclined with respect to the optical axis, which is rotated around the optical axis. The irradiation area of the laser light on the mask 9 is slightly moved so that the interference fringes of the laser light generated by the second kiss 79 generated by the mask 9 are made uniform and become inconspicuous. Further, the illuminance unevenness of the laser light emitted from the first fly's eye lens 2 via the first optical path coma adjustment unit 3 can be reduced. Fig. 2 is an explanatory view showing the relationship between the position of the parallel plane rotary plate 5 and the incident angle of the laser light incident on the second continuation lens 6, and the change of the irradiation area on the reticle 9. When the parallel plane rotary plate 5 is rotated about the optical axis, the parallel planar rotary plate 5 is moved back and forth by an arrow as shown in the front view of Fig. 2(a). At this time, when the parallel plane rotary plate 5 is located at the position indicated by the solid line in the same diagram (a), the laser light is refracted by the parallel plane rotary plate 5 as indicated by the solid line, and at a certain angle of incidence. The condensing mirror 6a is incident on the second fly's eye lens 6. On the other hand, when the parallel plane rotary plate 5 is rotated to reach the position shown by the broken line in Fig. 2(a), the laser light is refracted by the parallel plane rotary plate 5 as indicated by the broken line, and the above A different incident angle is incident on the condensing mirror 6a. As a result, the irradiation area 1 上 on the reticle 9 irradiated with the laser light emitted from the second fly-eye lens 6 moves from the area indicated by the solid line in the same figure (b) to the area indicated by the broken line. . By changing the incident angle of the laser light incident on the second string "lens 6" by rotating the parallel plane slewing plate 5, the intensity unevenness of the laser light emitted by the first fly-eye lens 2 can be made uniform. When the irradiation area 10 on the light sheet 9 is slightly moved, the brightness and darkness of the pattern generated on the mask 9 and the illuminance are uneven due to the interference from the second fly's eye lens 6 and the plurality of laser light beams. It is uniformized and becomes unclear. In the direction in which the above-described laser light is emitted, the second fly-eye lens 6 is provided on the downstream side of the first condensing mirror 4. The second fly-eye lens 6 is used to make the light intensity distribution in the irradiation region 1 of the mask 9 uniform, and is arrayed in a plane that is slightly orthogonal to the optical axis of the laser light (for example, 12 X horizontally). Four (4) side by side are arranged with a plurality of condensing mirrors 6a, which are twin eye lenses formed by combining the same two fly's eye lenses. The second light path difference adjustment unit 7 is provided on the incident side of the laser light incident on the second fly's eye lens 6. The second ray path difference adjusting unit 7 is configured to reduce the homology of the laser light emitted from the second fly's eye lens 6 and suppress the plurality of laser light emitted from the condensing mirrors 6a of the second fly's eye lens 6 in the reticle. The second phase difference generating means for generating a phase difference between the plurality of laser beams for the respective condensing mirrors 6a incident on the second fly's eye lens 6 is interfered by each other. Specifically, the second ray path difference adjustment unit 7 corresponds to a plate shape in which the lengths of the longitudinal collinear mirrors 6a' of the second umbilical lens 6 are different from each other in the axial direction parallel to the optical axis, and the refractive index is larger than 1. The transparent member 7a (for example, quartz glass or transparent glass, etc.) is laterally overlapped to form 'there are four columns of laser light that can change the respective condensing mirrors 6a respectively incident on the second fly's eye lens 6 in the lateral direction and The function of the optical path length between columns. The second condensing mirror 8 is provided on the downstream side of the second fly-eye lens 6 in the direction in which the above-described laser light is emitted. The second condensing mirror 8 is configured such that the laser light emitted from the second fly's eye lens 6 is parallel light and is incident perpendicularly to the reticle 9, and the two convex lenticular lenses whose light is incident on the side are set to 201115279 == The positional approximation and the __ are used to refract the ray path: the reverse action of the second ridge is directed to the action of the laser exposure of the above structure. The laser light emitted from the light source '1 is incident on the first light path difference adjusting unit 3 at the two mirrors. The first optical path 彳 & difference adjustment unit 3 corresponds to each of the condensing mirrors 2a of the second eye lens 2, and a plurality of transparent components 3 &amps having different lengths in the axial direction parallel to the optical axis and having a refractive index greater than one. In combination, the plurality of laser beams emitted from the plurality of transparent modules 3a of the first ray path difference adjusting unit 3 have different phases. The plurality of laser beams emitted from the plurality of transparent members 3a of the first light path difference adjusting unit 3 are respectively incident on the condensing mirror 2a corresponding to the fly-eye lens 2. Then, the plurality of laser beams emitted from the respective condensing mirrors 2a of the second fly's eye lens 2 are respectively condensed at the back focus of each of the condensing mirrors, and are radially scattered. At this time, since the respective laser beams incident on the condensing mirror 2a of the i-ray eye lens 2 differ in phase from each other, the homology of the laser light emitted from the first fly-eye lens 2 can be reduced. Therefore, the interference of each of the laser beams is suppressed by the second fly's eye lens 6 irradiated by the plurality of laser beams emitted from the respective condensing mirrors 2a, and the generation of the interference fringes is suppressed, and the second eye can be slightly uniformly irradiated. Fly eye lens 6 on. The radial laser light emitted from the first fly's eye lens 3 is incident on the first light by the i-th 201115279 light microscope 4, and then θ is incident on the second light-receiving lens 6 via the second light-path difference adjustment unit. At this time, the lightning axis of the first condensing mirror 4 is inclined at one place, and a parallel plane rotating plate 5 in which a transparent circular plate (for example, a surface) is disposed with respect to light is provided, and the position of the rotating plate in the parallel plane is reversed by = The person who emits the chief ray of light changes to the first condensing mirror 4 and changes. ===The radial direction of the first condensing mirror 4 is 6 lasers. This is the (four)' person's shot to the second sphenoid lens. The angle of transmission of the fly's eye changes. At the same time, the uneven illumination of the light emitted by the person to the 2nd and the brother's laser will be uniformized. The laser light emitted from the first condensing mirror 4 on the ί axis I is equal to the second ray path difference which is composed of a plurality of ==:= self-dissimilar and refractive index greater than 1 The eye lens is irradiated with the laser light and is irradiated on the second rope 7 in the Qianming group:=:2 ray path difference adjustment unit. Therefore, from the optical path lengths of each of the laser light, the respective phases (10) of the laser light beams are emitted from each other. The emitted laser = two turns can reduce the convergence of each of the laser light from the second eye lens 6 and can suppress the laser light emitted from the second fly-eye lens 6 3 2 (four) each condensing mirror of the lens 6 such as the emitted laser light::=:=7 after the focus, the radiation will be radiated to the mirror 13. Then, the laser light is reflected by the plane anti-201115279 mirror 13 by the second The condensing mirror 8 is incident on the reticle 9 in a parallel manner, and is uniformly incident on the reticle 9. Here, in the first embodiment, the second ray path difference adjusting unit 7 is in the optical axis direction. The transparent members 7a having different lengths and long slits in the longitudinal direction are laterally overlapped, and are arranged side by side in the longitudinal direction of the second eye lens 6 The light microscope 6a is incident on the same phase of the laser light', and the different condensing mirrors 6a are arranged side by side with respect to the laterally arranged condensing mirrors 6a, and the incident light is incident on the illuminating area 10 on the reticle 9 although it is very slight. However, interference fringes caused by the same-phase laser light emitted from the respective condensing mirrors 6a of the second fly-eye lens 6 in the longitudinal direction may be generated. However, in the above-described first embodiment, the i-th condensing mirror 4 is on the incident side. Since the parallel plane rotary plate 5 is provided and rotated around the optical axis, the incident angle of the laser light incident on the second fly's eye lens 6 changes. Therefore, as shown in Fig. 2(b) The micro-motion of the irradiation region 10 irradiated by the laser light on the reticle 9 can be made to uniformize the light-dark mode of the interference fringe and become inconspicuous, and the illuminance unevenness of the laser light is made uniform to uniformly Fig. 3 is a front view showing a second embodiment of the laser exposure apparatus of the present invention. In the second embodiment, the difference from the first embodiment is that the second condensing mirror 8 is replaced by the plane. Mirror 13 position The collimator lens 置4 is placed. At this time, the front focus position of the collimator lens 14 is approximately coincident with the back focus position of the second fly's eye lens 6, so that the laser light emitted from the second eye lens 6 becomes parallel light. In addition, in the above-described first and second embodiments, the line path difference adjustment unit 7 is configured to correspond to the second fly eye 2 light vertical column condensing mirror 6a. The self-dissimilar plate-like transparent member 7a of the mirror 6 parallel to the axial direction of the optical axis is formed by laterally overlapping each other: the light is clear, but the present invention is secreted here, and the corresponding = plus 2 艮Each of the condensing mirrors of the lens 组合 is combined with an elongated and transparent member whose length is parallel to the optical axis, and is formed by the condensing mirrors 6 & from the second fly-eye lens 6 The phase of the emitted light is completely different, so the interference of interference on each laser light can be reduced. In the above-described embodiment, the case where the phase difference generating means is the light path difference adjusting means will be described. However, the present invention is not limited thereto, and may be provided for each condensing mirror corresponding to the fly's eye lens. Phase Plate 0 [Brief Description of the Drawings] Fig. 1 is a front view showing a first embodiment of the laser exposure apparatus of the present invention. 2(a) and 2(b) are explanatory diagrams showing the relationship between the position of the parallel plane slewing plate of the laser exposure apparatus and the incident angle of the laser light incident on the second fly's eye lens and the change of the irradiation area on the reticle. . Fig. 3 is a front view showing a second embodiment of the laser exposure apparatus of the present invention. 13 201115279 [Description of main component symbols] 1 Laser light source 2 First fly's eye lens 2a Condenser 3 First light path difference adjustment unit 3a Transparent part 4 First condensing mirror 5 Parallel plane slewing plate 6 Second fly's eye lens 6a Condenser 7 2 ray path difference adjustment component 7a transparent component 8 second condensing mirror 9 reticle 10 irradiation area 11 > 12 ' 13 plane mirror 14 collimating lens

Claims (1)

201115279 七 申請專利範圍: 1. 一種雷射曝光裝置,係具備: 雷射光源,係用以放射雷射光; 第1蠅眼透鏡,係於與該雷射光的光軸略呈直 交之面内併排地配置有複數個透鏡,將射出光暫時 聚集後呈放射狀地散射以擴大雷射光的剖面形狀; 第1相位差產生機構,係設置於該第丨蠅眼透鏡 之雷射光入射侧處,以使分別射入至該第1蠅眼透 鏡的各聚光透鏡之雷射光產生相位差; 聚光透鏡,係使從該第1蠅眼透鏡射出而擴大 剖面形狀之雷射光成為平行光; 第2蠅眼透鏡,係於與該聚光透鏡的光軸略呈 直交之面内併排地配置有複數個透鏡,以使利用雷 射光的光罩之照射區域内的光強度分佈均勻化;以 及 第2相位差產生機構,係設置於該第2蠅眼透鏡 之雷射光入射侧處,以使分別射入至該第2蠅眼透 鏡的各聚光透鏡之雷射光產生相位差。 2.如申請專利範圍第1項之雷射曝光裝置,其中該聚 光透鏡之雷射光入射側處係設置有相對於光軸呈 傾斜並以光軸為中心而進行迴轉之透明的平行平 面迴轉板。 15201115279 Seven patent application scope: 1. A laser exposure device, comprising: a laser light source for radiating laser light; a first fly-eye lens, side by side in a plane perpendicular to the optical axis of the laser light a plurality of lenses are disposed, and the emitted light is temporarily collected and radially scattered to expand the cross-sectional shape of the laser light; and the first phase difference generating mechanism is disposed at the incident side of the laser light of the first fly eye lens to The laser light of each of the condensing lenses respectively incident on the first fly-eye lens generates a phase difference; and the condensing lens causes the laser light that is emitted from the first fly-eye lens to expand the cross-sectional shape to become parallel light; The fly-eye lens is provided with a plurality of lenses arranged side by side in a plane orthogonal to the optical axis of the collecting lens to uniformize the light intensity distribution in the irradiation region of the mask using the laser light; and the second The phase difference generating means is provided on the incident side of the laser light incident on the second fly's eye lens so that the laser light incident on each of the condensing lenses of the second fly's eye lens has a phase difference. 2. The laser exposure apparatus according to claim 1, wherein the laser light incident side of the condensing lens is provided with a transparent parallel plane which is inclined with respect to the optical axis and which is rotated around the optical axis. board. 15
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